ES2190004T3 - Compuestos fotosensibles, composiciones de resina fotosensible y procedimiento de formacion de imagenes utilizando dichos compuestos o dichas composiciones. - Google Patents
Compuestos fotosensibles, composiciones de resina fotosensible y procedimiento de formacion de imagenes utilizando dichos compuestos o dichas composiciones.Info
- Publication number
- ES2190004T3 ES2190004T3 ES98108552T ES98108552T ES2190004T3 ES 2190004 T3 ES2190004 T3 ES 2190004T3 ES 98108552 T ES98108552 T ES 98108552T ES 98108552 T ES98108552 T ES 98108552T ES 2190004 T3 ES2190004 T3 ES 2190004T3
- Authority
- ES
- Spain
- Prior art keywords
- photosensible
- compounds
- compositions
- image formation
- formation procedure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/008—Azides
- G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Materials For Photolithography (AREA)
- Heterocyclic Carbon Compounds Containing A Hetero Ring Having Oxygen Or Sulfur (AREA)
- Nitrogen And Oxygen Or Sulfur-Condensed Heterocyclic Ring Systems (AREA)
Abstract
EL COMPUESTO FOTOSENSIBLE DE LA PRESENTE INVENCION COMPRENDE LA UNIDAD SIGUIENTE: Y ESTA PARTICULARMENTE EXPRESADA POR LA FORMULA SIGUIENTE: COMPOSICIONES DE RESINAS FOTOSENSIBLES DIFERENTES SE PUEDEN PREPARAR A PARTIR DE ESTE COMPUESTO DE RESINA FOTOSENSIBLE NOVEDOSO, Y LAS COMPOSICIONES DE RESINA FOTOSENSIBLES ASI OBTENIDAS NO PRESENTAN PROBLEMAS DE POLUCION AMBIENTAL, Y PRODUCIENDOSE CON UN PROCESO DE ALTA RESOLUCION CON UN ALTO NIVEL DE SENSIBILIDAD Y EXHIBIENDO EXCELENTES CARACTERISTICAS DE ADHESION A SUSTRATOS, REVESTIMIENTO Y ESTABILIDAD DURANTE SU ALMACENAMIENTO.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12186097A JP3163036B2 (ja) | 1997-05-13 | 1997-05-13 | 感光性化合物及び感光性樹脂 |
JP23749097A JP3856412B2 (ja) | 1997-09-02 | 1997-09-02 | パターン形成方法 |
PCT/JP1998/005028 WO2000028382A1 (en) | 1997-05-13 | 1998-11-09 | Photosensitive compounds, photosensitive resin compositions, and pattern formation method making use of the compounds or compositions |
Publications (1)
Publication Number | Publication Date |
---|---|
ES2190004T3 true ES2190004T3 (es) | 2003-07-16 |
Family
ID=27308567
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ES98108552T Expired - Lifetime ES2190004T3 (es) | 1997-05-13 | 1998-05-11 | Compuestos fotosensibles, composiciones de resina fotosensible y procedimiento de formacion de imagenes utilizando dichos compuestos o dichas composiciones. |
Country Status (7)
Country | Link |
---|---|
EP (1) | EP0878739B1 (es) |
CN (1) | CN1131461C (es) |
AU (1) | AU772375B2 (es) |
DE (1) | DE69809629T2 (es) |
ES (1) | ES2190004T3 (es) |
TW (1) | TW539923B (es) |
WO (1) | WO2000028382A1 (es) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0878739B1 (en) * | 1997-05-13 | 2002-11-27 | Toyo Gosei Kogyo Co., Ltd. | Photosensitive compounds, photosensitive resin compositions, and pattern formation method making use of the compounds or compositions |
JP4390237B2 (ja) | 2000-02-14 | 2009-12-24 | 東洋合成工業株式会社 | 感光性化合物及び感光性樹脂 |
JP3849641B2 (ja) | 2001-03-29 | 2006-11-22 | 日立化成工業株式会社 | 回路形成用感光性フィルム及びプリント配線板の製造法 |
JP4036440B2 (ja) * | 2002-03-29 | 2008-01-23 | 東洋合成工業株式会社 | 新規な感光性化合物及び感光性樹脂並びに感光性組成物 |
JP4637476B2 (ja) * | 2002-12-19 | 2011-02-23 | 東京応化工業株式会社 | ホトレジスト組成物の製造方法 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL270002A (es) * | 1960-10-08 | |||
JPS5239289B2 (es) * | 1974-07-01 | 1977-10-04 | ||
JPH0742329B2 (ja) * | 1986-03-18 | 1995-05-10 | 工業技術院長 | 感光性樹脂の製造方法 |
JPH02204750A (ja) * | 1989-02-03 | 1990-08-14 | Hitachi Ltd | 感光性組成物、及びそれを用いたパターン形成方法 |
JP3428715B2 (ja) * | 1994-02-23 | 2003-07-22 | 東洋合成工業株式会社 | 感光性樹脂組成物 |
US5866296A (en) * | 1996-01-25 | 1999-02-02 | Toyo Gosei Co., Ltd. | Photosensitive resin composition |
JP4093501B2 (ja) * | 1997-05-13 | 2008-06-04 | 東洋合成工業株式会社 | 感光性化合物及び感光性樹脂 |
EP0878739B1 (en) * | 1997-05-13 | 2002-11-27 | Toyo Gosei Kogyo Co., Ltd. | Photosensitive compounds, photosensitive resin compositions, and pattern formation method making use of the compounds or compositions |
-
1998
- 1998-05-11 EP EP98108552A patent/EP0878739B1/en not_active Expired - Lifetime
- 1998-05-11 ES ES98108552T patent/ES2190004T3/es not_active Expired - Lifetime
- 1998-05-11 DE DE69809629T patent/DE69809629T2/de not_active Expired - Fee Related
- 1998-05-12 TW TW087107268A patent/TW539923B/zh not_active IP Right Cessation
- 1998-05-13 CN CN98109835.5A patent/CN1131461C/zh not_active Expired - Fee Related
- 1998-11-09 WO PCT/JP1998/005028 patent/WO2000028382A1/en active IP Right Grant
- 1998-11-09 AU AU97628/98A patent/AU772375B2/en not_active Ceased
Also Published As
Publication number | Publication date |
---|---|
CN1203381A (zh) | 1998-12-30 |
CN1131461C (zh) | 2003-12-17 |
EP0878739B1 (en) | 2002-11-27 |
TW539923B (en) | 2003-07-01 |
AU9762898A (en) | 2000-05-29 |
AU772375B2 (en) | 2004-04-29 |
EP0878739A1 (en) | 1998-11-18 |
WO2000028382A1 (en) | 2000-05-18 |
DE69809629T2 (de) | 2003-09-11 |
DE69809629D1 (de) | 2003-01-09 |
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