ES2076450T3 - Polimeros mixtos. - Google Patents

Polimeros mixtos.

Info

Publication number
ES2076450T3
ES2076450T3 ES91121086T ES91121086T ES2076450T3 ES 2076450 T3 ES2076450 T3 ES 2076450T3 ES 91121086 T ES91121086 T ES 91121086T ES 91121086 T ES91121086 T ES 91121086T ES 2076450 T3 ES2076450 T3 ES 2076450T3
Authority
ES
Spain
Prior art keywords
mixed polymers
moles
carbonic acid
unsaturated carbonic
serve
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES91121086T
Other languages
English (en)
Inventor
Recai Dr Sezi
Horst Borndorfer
Hellmut Dr Ahne
Siegfried Dr Birkle
Eberhard Kuhn
Rainer Dr Leuschner
Eva Rissel
Michael Dr Sebald
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens AG
Original Assignee
Siemens AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens AG filed Critical Siemens AG
Application granted granted Critical
Publication of ES2076450T3 publication Critical patent/ES2076450T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/265—Selective reaction with inorganic or organometallic reagents after image-wise exposure, e.g. silylation
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • C08F220/1804—C4-(meth)acrylate, e.g. butyl (meth)acrylate, isobutyl (meth)acrylate or tert-butyl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/04—Anhydrides, e.g. cyclic anhydrides
    • C08F222/06—Maleic anhydride
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Inorganic Chemistry (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)

Abstract

NUEVOS COPOLIMEROS QUE PUEDEN SERVIR COMO POLIMEROS BASE PARA UNA RESISTENCIA ALTAMENTE SOLUBLE Y QUE SE CONSTITUYEN POR 40 HASTA 99% DE LOS MOLES DE UN ESTER DE BUTILO TERCIARIO DE UN ACIDO CARBONICO NO SATURADO Y 1 HASTA 60% DE LOS MOLES DE UN ANHIDRIDO DE UN ACIDO CARBONICO NO SATURADO.
ES91121086T 1990-12-20 1991-12-09 Polimeros mixtos. Expired - Lifetime ES2076450T3 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE4041000 1990-12-20

Publications (1)

Publication Number Publication Date
ES2076450T3 true ES2076450T3 (es) 1995-11-01

Family

ID=6420920

Family Applications (1)

Application Number Title Priority Date Filing Date
ES91121086T Expired - Lifetime ES2076450T3 (es) 1990-12-20 1991-12-09 Polimeros mixtos.

Country Status (5)

Country Link
US (2) US5616667A (es)
EP (1) EP0492255B1 (es)
JP (1) JP3283555B2 (es)
DE (1) DE59106537D1 (es)
ES (1) ES2076450T3 (es)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0952166B1 (de) * 1998-04-24 2003-06-25 Infineon Technologies AG Filmbildende Polymere
KR100498440B1 (ko) 1999-11-23 2005-07-01 삼성전자주식회사 백본이 환상 구조를 가지는 감광성 폴리머와 이를포함하는 레지스트 조성물
DE10137376A1 (de) * 2001-07-31 2003-02-27 Infineon Technologies Ag Geklebte Chip- und Waferstapel
SG11201704236VA (en) 2014-12-18 2017-07-28 Evonik Oil Additives Gmbh Method for the preparation of copolymers of alkyl methacrylates and maleic anhydride

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3184440A (en) * 1962-07-17 1965-05-18 Grace W R & Co Interpolymer comprising acrylic acid, an acrylic acid ester and a maleic anhydride derivative and a process of preparation
DE1495850A1 (de) * 1964-12-12 1969-11-13 Bayer Ag Verfahren zur Herstellung von Maleinsaeureanhydrid-Copolymerisaten
US3677991A (en) * 1968-08-14 1972-07-18 Dow Chemical Co Anionic acrylate latexes that possess sensitivity to alkalinity
US4491628A (en) * 1982-08-23 1985-01-01 International Business Machines Corporation Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone
US4868259A (en) * 1986-05-15 1989-09-19 The Goodyear Tire & Rubber Company Emulsion polymerization process
DE58908411D1 (de) * 1989-03-20 1994-10-27 Siemens Ag Hochauflösender Photoresist.
DE59010728D1 (de) * 1989-04-24 1997-07-31 Siemens Ag Verfahren zur Erzeugung ätzresistenter Strukturen
DE3913434A1 (de) * 1989-04-24 1990-10-25 Siemens Ag Trockenwickelbares resistsystem
ES2103262T3 (es) * 1989-04-24 1997-09-16 Siemens Ag Procedimiento de fotoestructuracion.
US5221787A (en) * 1989-12-22 1993-06-22 General Electric Company Method of preparing maleic anhydride terpolymers

Also Published As

Publication number Publication date
EP0492255B1 (de) 1995-09-20
US5703186A (en) 1997-12-30
JPH059231A (ja) 1993-01-19
US5616667A (en) 1997-04-01
JP3283555B2 (ja) 2002-05-20
EP0492255A1 (de) 1992-07-01
DE59106537D1 (de) 1995-10-26

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