ES2023577A6 - Procedimiento para la deposicion indirecta o directa de una capa tecnica de cromo duro, muy estable frente a la corrosion. - Google Patents
Procedimiento para la deposicion indirecta o directa de una capa tecnica de cromo duro, muy estable frente a la corrosion.Info
- Publication number
- ES2023577A6 ES2023577A6 ES9002531A ES9002531A ES2023577A6 ES 2023577 A6 ES2023577 A6 ES 2023577A6 ES 9002531 A ES9002531 A ES 9002531A ES 9002531 A ES9002531 A ES 9002531A ES 2023577 A6 ES2023577 A6 ES 2023577A6
- Authority
- ES
- Spain
- Prior art keywords
- pulse frequency
- critical pulse
- deposition
- direct
- plating layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000000034 method Methods 0.000 title abstract 4
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 title abstract 2
- 229910052804 chromium Inorganic materials 0.000 title abstract 2
- 239000011651 chromium Substances 0.000 title abstract 2
- 238000005260 corrosion Methods 0.000 title abstract 2
- 230000007797 corrosion Effects 0.000 title abstract 2
- 238000007747 plating Methods 0.000 title abstract 2
- 238000004070 electrodeposition Methods 0.000 title 1
- 230000001419 dependent effect Effects 0.000 abstract 2
- 230000008021 deposition Effects 0.000 abstract 2
- 239000003792 electrolyte Substances 0.000 abstract 2
- BDHFUVZGWQCTTF-UHFFFAOYSA-N sulfonic acid Chemical compound OS(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-N 0.000 abstract 2
- 125000001931 aliphatic group Chemical group 0.000 abstract 1
- 125000004432 carbon atom Chemical group C* 0.000 abstract 1
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 abstract 1
- 239000011696 chromium(III) sulphate Substances 0.000 abstract 1
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 abstract 1
- 229910052736 halogen Chemical class 0.000 abstract 1
- 150000002367 halogens Chemical class 0.000 abstract 1
- 150000003839 salts Chemical class 0.000 abstract 1
- 229910021653 sulphate ion Inorganic materials 0.000 abstract 1
- -1 sulphate ions Chemical class 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/04—Electroplating: Baths therefor from solutions of chromium
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/04—Electroplating: Baths therefor from solutions of chromium
- C25D3/10—Electroplating: Baths therefor from solutions of chromium characterised by the organic bath constituents used
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/10—Electroplating with more than one layer of the same or of different metals
- C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
- C25D5/14—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium two or more layers being of nickel or chromium, e.g. duplex or triplex layers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/18—Electroplating using modulated, pulsed or reversing current
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating Methods And Accessories (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Abstract
PROCEDIMIENTO PARA LA DEPOSICION INDIRECTA O DIRECTA DE UNA CAPA TECNICA DE CROMO DURO, MUY ESTABLE FRENTE A LA CORROSION. PROCEDIMIENTO PARA LA DEPOSICION INDIRECTA O DIRECTA DE UNA CAPA TECNICA DE CROMO DURO MUY ESTABLE FRENTE A LA CORROSION SOBRE LA SUPERFICIE DE UNA PIEZA DE TRABAJO HECHA DE METAL, A PARTIR DE UN ELECTROLITO DE TRABAJO ACUOSO, QUE CONTIENE ACIDO CROMICO E IONES SULFATO. DURANTE LA DEPOSICION SE TRABAJA CON CORRIENTE CONTINUA PULSANTE QUE TIENE UNA FRECUENCIA DE PULSACION EN EL INTERVALO ENTRE UNA FRECUENCIA DE PULSACION CRITICA INFERIOR, DEPENDIENTE DE LA DENSIDAD DE CORRIENTE CATODICA ESCOGIDA Y UN PUNTO CRITICO SUPERIOR DE FRECUENCIA DE PULSACION, DEPENDIENTE DEL RENDIMIENTO DE CORRIENTE OPTIMIZADO A LA MISMA DENSIDAD DE CORRIENTE. SE INDICA COMO SE DETERMINAN LA FRECUENCIA DE PULSACION CRITICA INFERIOR Y EL PUNTO CRITICO SUPERIOR DE FRECUENCIA DE PULSACION. EN EL INTERVALO ENTRE LA FRECUENCIA DE PULSACION CRITICA INFERIOR Y EL PUNTO CRITICO SUPERIOR DE FRECUENCIA DEPULSACION, LA DURACION DE CONEXION SE ESCOGE TAN BAJA QUE SE EFECTUA UNA DEPOSICION BRILLANTE PRACTICAMENTE EXENTA DE FISURAS.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE3933896A DE3933896C1 (es) | 1989-10-11 | 1989-10-11 |
Publications (1)
Publication Number | Publication Date |
---|---|
ES2023577A6 true ES2023577A6 (es) | 1992-01-16 |
Family
ID=6391241
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ES9002531A Expired - Lifetime ES2023577A6 (es) | 1989-10-11 | 1990-10-05 | Procedimiento para la deposicion indirecta o directa de una capa tecnica de cromo duro, muy estable frente a la corrosion. |
Country Status (5)
Country | Link |
---|---|
JP (1) | JPH03207884A (es) |
DE (1) | DE3933896C1 (es) |
ES (1) | ES2023577A6 (es) |
FR (1) | FR2652825B1 (es) |
GB (1) | GB2236763B (es) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4011201C1 (en) * | 1990-04-06 | 1991-08-22 | Lpw-Chemie Gmbh, 4040 Neuss, De | Coating workpiece with chromium for improved corrosion resistance - comprises using aq. electrolyte soln. contg. chromic acid sulphate ions, and fluoro:complexes to increase deposition |
DE4125585A1 (de) * | 1990-10-20 | 1992-04-30 | Schaeffler Waelzlager Kg | Bauteil aus stahl mit galvanisch aufgebrachter korrosionsschutzschicht |
US5670265A (en) * | 1990-10-20 | 1997-09-23 | Ina Walzlager Schaeffler Kg | Steel component with an electroplated anti-corrosive coating and process for producing same |
USRE35860F1 (en) * | 1991-06-05 | 2001-01-02 | Timken Co | Corrosion-resistant zinc-nickel plated bearing races |
JPH05161904A (ja) * | 1991-12-12 | 1993-06-29 | Mishima Kosan Co Ltd | 冷間圧延用ロール |
US5352266A (en) * | 1992-11-30 | 1994-10-04 | Queen'university At Kingston | Nanocrystalline metals and process of producing the same |
IT1267394B1 (it) * | 1994-02-18 | 1997-02-05 | Ind S R L | Procedimento per la realizzazione di riporti galvanici compositi in cromo duro con una fase dispersa e riporto anti-usura realizzato con |
DE4430923C2 (de) * | 1994-08-31 | 1997-10-09 | Schaeffler Waelzlager Kg | Galvanisches Chrombad, Verfahren zur galvanischen Abscheidung von Chrom und Verwendung des Bades |
JP3918142B2 (ja) | 1998-11-06 | 2007-05-23 | 株式会社日立製作所 | クロムめっき部品、クロムめっき方法およびクロムめっき部品の製造方法 |
USRE40386E1 (en) | 1998-11-06 | 2008-06-17 | Hitachi Ltd. | Chrome plated parts and chrome plating method |
DE10006151A1 (de) * | 2000-02-11 | 2001-09-06 | Heinz Busch | System mit einem Träger und einer Hartstoffbeschichtung |
JP3423702B2 (ja) | 2000-08-29 | 2003-07-07 | 創輝株式会社 | 金属めっき方法 |
US20070068821A1 (en) | 2005-09-27 | 2007-03-29 | Takahisa Hirasawa | Method of manufacturing chromium plated article and chromium plating apparatus |
DE102004019370B3 (de) * | 2004-04-21 | 2005-09-01 | Federal-Mogul Burscheid Gmbh | Herstellung einer strukturierten Hartchromschicht und Herstellung einer Beschichtung |
KR102197508B1 (ko) | 2015-05-12 | 2020-12-31 | 히다치 오토모티브 시스템즈 가부시키가이샤 | 크롬 도금 부품의 제조 방법 및 크롬 도금 장치 |
KR20220043575A (ko) | 2020-09-29 | 2022-04-05 | 주식회사 원탑플레이팅 | 크롬 도금 부품의 제조 방법 및 크롬 도금 장치 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3232854A (en) * | 1959-06-05 | 1966-02-01 | Diamond Alkali Co | Chromium plating |
US4092226A (en) * | 1974-12-11 | 1978-05-30 | Nikolaus Laing | Process for the treatment of metal surfaces by electro-deposition of metal coatings at high current densities |
DE2604628A1 (de) * | 1976-02-06 | 1977-08-11 | Rosenloecher Claus | Verfahren zur unmittelbaren galvanischen hartverchromung von nickel |
JPS5914977B2 (ja) * | 1978-07-27 | 1984-04-06 | 三菱電機株式会社 | 温度制御装置 |
DE3402554A1 (de) * | 1984-01-26 | 1985-08-08 | LPW-Chemie GmbH, 4040 Neuss | Abscheidung von hartchrom auf einer metallegierung aus einem waessrigen, chromsaeure und schwefelsaeure enthaltenden elektrolyten |
US4789437A (en) * | 1986-07-11 | 1988-12-06 | University Of Hong Kong | Pulse electroplating process |
JPS6332874A (ja) * | 1986-07-24 | 1988-02-12 | Matsushita Electric Works Ltd | 蓄電池の温度センサ取付構造 |
IT1216808B (it) * | 1987-05-13 | 1990-03-14 | Sviluppo Materiali Spa | Processo di elettrodeposizione in continuo di cromo metallico e di ossido di cromo su superfici metalliche |
IT1215985B (it) * | 1988-03-04 | 1990-02-22 | Elca Srl | Procedimento elettrochimico per la realizzazione di rivestimenti di cromo e metalli simili mediante corrente pulsante ad inversione periodica della polarita' |
-
1989
- 1989-10-11 DE DE3933896A patent/DE3933896C1/de not_active Expired - Lifetime
-
1990
- 1990-10-03 GB GB9021528A patent/GB2236763B/en not_active Expired - Fee Related
- 1990-10-05 FR FR9012326A patent/FR2652825B1/fr not_active Expired - Fee Related
- 1990-10-05 ES ES9002531A patent/ES2023577A6/es not_active Expired - Lifetime
- 1990-10-11 JP JP2270685A patent/JPH03207884A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
GB2236763B (en) | 1993-11-17 |
FR2652825A1 (fr) | 1991-04-12 |
GB2236763A (en) | 1991-04-17 |
JPH03207884A (ja) | 1991-09-11 |
DE3933896C1 (es) | 1990-10-11 |
GB9021528D0 (en) | 1990-11-14 |
FR2652825B1 (fr) | 1993-12-24 |
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