EP4184550A4 - Dual-wall multi-structure quartz cylinder device - Google Patents

Dual-wall multi-structure quartz cylinder device Download PDF

Info

Publication number
EP4184550A4
EP4184550A4 EP21896282.7A EP21896282A EP4184550A4 EP 4184550 A4 EP4184550 A4 EP 4184550A4 EP 21896282 A EP21896282 A EP 21896282A EP 4184550 A4 EP4184550 A4 EP 4184550A4
Authority
EP
European Patent Office
Prior art keywords
dual
cylinder device
quartz cylinder
wall multi
structure quartz
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
EP21896282.7A
Other languages
German (de)
French (fr)
Other versions
EP4184550A1 (en
Inventor
Haiyang Liu
Dongdong HU
Xiaobo Liu
Shiran CHENG
Song Guo
Xiao Zhang
Lu Chen
Kaidong Xu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jiangsu Leuven Instruments Co Ltd
Original Assignee
Jiangsu Leuven Instruments Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jiangsu Leuven Instruments Co Ltd filed Critical Jiangsu Leuven Instruments Co Ltd
Publication of EP4184550A1 publication Critical patent/EP4184550A1/en
Publication of EP4184550A4 publication Critical patent/EP4184550A4/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/16—Vessels; Containers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32458—Vessel
    • H01J37/32477—Vessel characterised by the means for protecting vessels or internal parts, e.g. coatings
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/08—Ion sources; Ion guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
    • H01J37/32807—Construction (includes replacing parts of the apparatus)
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H01J37/32119—Windows
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32357—Generation remote from the workpiece, e.g. down-stream
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/02—Details
    • H01J2237/022—Avoiding or removing foreign or contaminating particles, debris or deposits on sample or tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/08—Ion sources
    • H01J2237/0815—Methods of ionisation
    • H01J2237/0817—Microwaves
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/31—Processing objects on a macro-scale
    • H01J2237/3151—Etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
    • H01J37/3056—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching for microworking, e. g. etching of gratings or trimming of electrical components
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32422—Arrangement for selecting ions or species in the plasma

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Combustion & Propulsion (AREA)
  • Drying Of Semiconductors (AREA)
  • Plasma Technology (AREA)
  • ing And Chemical Polishing (AREA)
EP21896282.7A 2020-11-30 2021-06-17 Dual-wall multi-structure quartz cylinder device Pending EP4184550A4 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN202011378056.2A CN112447486A (en) 2020-11-30 2020-11-30 Double-wall multi-structure quartz cylinder device
PCT/CN2021/100677 WO2022110774A1 (en) 2020-11-30 2021-06-17 Dual-wall multi-structure quartz cylinder device

Publications (2)

Publication Number Publication Date
EP4184550A1 EP4184550A1 (en) 2023-05-24
EP4184550A4 true EP4184550A4 (en) 2024-01-10

Family

ID=74738867

Family Applications (1)

Application Number Title Priority Date Filing Date
EP21896282.7A Pending EP4184550A4 (en) 2020-11-30 2021-06-17 Dual-wall multi-structure quartz cylinder device

Country Status (6)

Country Link
US (1) US20230352267A1 (en)
EP (1) EP4184550A4 (en)
JP (1) JP2023543888A (en)
KR (1) KR20230058703A (en)
CN (1) CN112447486A (en)
WO (1) WO2022110774A1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112447486A (en) * 2020-11-30 2021-03-05 江苏鲁汶仪器有限公司 Double-wall multi-structure quartz cylinder device

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000133497A (en) * 1998-10-29 2000-05-12 Toshiba Corp High-frequency discharge type plasma generation device
JP2008130430A (en) * 2006-11-22 2008-06-05 Ae Kiki Engineering Co Ltd High-frequency ionization source
US20090250340A1 (en) * 2005-09-09 2009-10-08 Naruyasu Sasaki Ion source and plasma processing apparatus

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5234529A (en) * 1991-10-10 1993-08-10 Johnson Wayne L Plasma generating apparatus employing capacitive shielding and process for using such apparatus
KR20050089516A (en) * 2004-03-05 2005-09-08 학교법인 성균관대학 Neutral beam source equipped with electro-magnet
CN102691100B (en) * 2011-03-22 2015-01-14 北京北方微电子基地设备工艺研究中心有限责任公司 Process chamber device and epitaxial equipment with it
CN102226271B (en) * 2011-05-11 2013-05-08 苏州凯西石英电子有限公司 Double-layer quartz tube
CN105148762A (en) * 2014-05-30 2015-12-16 盛美半导体设备（上海）有限公司 Uniform-airflow device
CN110491758A (en) * 2019-08-14 2019-11-22 江苏鲁汶仪器有限公司 A kind of the ion beam etching chamber and processing method of assembly cleaning liner
CN112447486A (en) * 2020-11-30 2021-03-05 江苏鲁汶仪器有限公司 Double-wall multi-structure quartz cylinder device

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000133497A (en) * 1998-10-29 2000-05-12 Toshiba Corp High-frequency discharge type plasma generation device
US20090250340A1 (en) * 2005-09-09 2009-10-08 Naruyasu Sasaki Ion source and plasma processing apparatus
JP2008130430A (en) * 2006-11-22 2008-06-05 Ae Kiki Engineering Co Ltd High-frequency ionization source

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of WO2022110774A1 *

Also Published As

Publication number Publication date
KR20230058703A (en) 2023-05-03
CN112447486A (en) 2021-03-05
WO2022110774A1 (en) 2022-06-02
US20230352267A1 (en) 2023-11-02
TW202230448A (en) 2022-08-01
EP4184550A1 (en) 2023-05-24
JP2023543888A (en) 2023-10-18

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