EP3670453A3 - Ultra-high purity tungsten chlorides - Google Patents

Ultra-high purity tungsten chlorides Download PDF

Info

Publication number
EP3670453A3
EP3670453A3 EP19216858.1A EP19216858A EP3670453A3 EP 3670453 A3 EP3670453 A3 EP 3670453A3 EP 19216858 A EP19216858 A EP 19216858A EP 3670453 A3 EP3670453 A3 EP 3670453A3
Authority
EP
European Patent Office
Prior art keywords
ppm
tungsten
preferably less
pentachloride
high purity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
EP19216858.1A
Other languages
German (de)
French (fr)
Other versions
EP3670453A2 (en
Inventor
Xiaoxi Wu
Sergei Ivanov
Neil Osterwalder
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Versum Materials US LLC
Original Assignee
Versum Materials US LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Versum Materials US LLC filed Critical Versum Materials US LLC
Publication of EP3670453A2 publication Critical patent/EP3670453A2/en
Publication of EP3670453A3 publication Critical patent/EP3670453A3/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01GCOMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G41/00Compounds of tungsten
    • C01G41/04Halides
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D7/00Sublimation
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
    • C23C16/08Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metal halides
    • C23C16/14Deposition of only one other metal element
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00Physical properties of inorganic compounds
    • C01P2006/80Compositional purity
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P10/00Technologies related to metal processing
    • Y02P10/20Recycling

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

Condensable metal halide materials, such as but not limited to tungsten hexachloride and tungsten pentachloride can be used deposit films metal or metal containing films in a chemical vapor deposition (CVD) or atomic layer deposition process. Described herein are high purity tungsten hexachloride and tungsten pentachloride systems and methods to purify tungsten hexachloride and tungsten pentachloride raw materials. There is provided a purified tungsten hexachloride and tungsten pentachloride containing less than 10 ppm, preferably less than 5 ppm, more preferably less than 1 ppm, and most preferably less than 0.5 ppm of iron and/or molybdenum; and less than 10 ppm, preferably less than 5 ppm of all other trace metals combined including but not limited to aluminum, potassium and sodium.
EP19216858.1A 2018-12-17 2019-12-17 Ultra-high purity tungsten chlorides Pending EP3670453A3 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201862780417P 2018-12-17 2018-12-17
US16/710,834 US11932553B2 (en) 2018-12-17 2019-12-11 Ultra-high purity tungsten chlorides

Publications (2)

Publication Number Publication Date
EP3670453A2 EP3670453A2 (en) 2020-06-24
EP3670453A3 true EP3670453A3 (en) 2020-09-23

Family

ID=68944142

Family Applications (1)

Application Number Title Priority Date Filing Date
EP19216858.1A Pending EP3670453A3 (en) 2018-12-17 2019-12-17 Ultra-high purity tungsten chlorides

Country Status (5)

Country Link
US (1) US11932553B2 (en)
EP (1) EP3670453A3 (en)
KR (2) KR102362782B1 (en)
CN (2) CN115626662A (en)
TW (1) TWI831894B (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112028023B (en) * 2020-09-15 2021-04-23 湖南澎越新材料有限公司 Method and device for purifying and pulverizing metal chloride
CN113337717B (en) * 2021-06-11 2022-07-19 南昌航空大学 Method for separating and recovering valuable metals in electroplating sludge by adopting combined chlorinating agent
CN113651362B (en) * 2021-08-27 2023-02-17 福建福豆新材料有限公司 Preparation and purification method of tungsten pentachloride
CN114790009B (en) * 2022-05-18 2024-03-12 江苏南大光电材料股份有限公司 Purification method of high-purity tungsten hexacarbonyl
US20240123391A1 (en) * 2022-10-05 2024-04-18 Entegris, Inc. Tungsten precursors and related methods
WO2024076601A1 (en) * 2022-10-05 2024-04-11 Entegris, Inc. Tungsten precursors and related methods

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3066010A (en) * 1959-04-13 1962-11-27 Stauffer Chemical Co Purification of metal chlorides
US10100406B2 (en) * 2015-04-17 2018-10-16 Versum Materials Us, Llc High purity tungsten hexachloride and method for making same

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2743169A (en) 1944-09-02 1956-04-24 John C Hecker Horizontal sublimation apparatus
US3066019A (en) * 1959-03-17 1962-11-27 Textor Hans-Dieter Process for the generation of gaseous fuel containing carbon-monoxide
SU134257A1 (en) 1960-03-03 1960-11-30 В.И. Гольдин The method of purification of chlorine derivatives (chlorides or oxychlorides) of molybdenum or tungsten
SE327286B (en) * 1968-09-12 1970-08-17 Nordstjernan Rederi Ab
US4478600A (en) 1971-09-14 1984-10-23 Aluminum Company Of America Process for recovery of aluminum chloride
FR2376076A1 (en) * 1976-12-30 1978-07-28 Metaux Speciaux Sa PROCESS FOR PREPARING ANHYDROUS METAL CHLORIDES FROM USED CATALYSTS
US4913778A (en) * 1989-01-02 1990-04-03 Westinghouse Electric Corp. Molten salt scrubbing of zirconium or hafnium tetrachloride
JPH06296710A (en) * 1993-04-15 1994-10-25 Japan Atom Energy Res Inst Method of eliminating chlorine from harmful organic chlorine compound to be harmless
EP3409647A4 (en) 2016-01-28 2019-08-21 JX Nippon Mining & Metals Corporation High purity tungsten pentachloride and method for synthesizing same
EP3453679B1 (en) 2016-12-05 2023-04-05 JX Nippon Mining & Metals Corporation Method for producing high-purity tungsten pentachloride
CN108298586B (en) 2018-03-29 2019-12-31 绿菱电子材料(天津)有限公司 Preparation method of tungsten pentachloride

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3066010A (en) * 1959-04-13 1962-11-27 Stauffer Chemical Co Purification of metal chlorides
US10100406B2 (en) * 2015-04-17 2018-10-16 Versum Materials Us, Llc High purity tungsten hexachloride and method for making same

Also Published As

Publication number Publication date
KR102362782B1 (en) 2022-02-11
CN115626662A (en) 2023-01-20
US11932553B2 (en) 2024-03-19
TW202023952A (en) 2020-07-01
CN111320209A (en) 2020-06-23
KR20220024299A (en) 2022-03-03
US20200189928A1 (en) 2020-06-18
TWI831894B (en) 2024-02-11
KR102512447B1 (en) 2023-03-20
KR20200074894A (en) 2020-06-25
EP3670453A2 (en) 2020-06-24

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