EP3430864B1 - Buse plasma et procede d'utilisation de la buse plasma - Google Patents

Buse plasma et procede d'utilisation de la buse plasma Download PDF

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Publication number
EP3430864B1
EP3430864B1 EP17712057.3A EP17712057A EP3430864B1 EP 3430864 B1 EP3430864 B1 EP 3430864B1 EP 17712057 A EP17712057 A EP 17712057A EP 3430864 B1 EP3430864 B1 EP 3430864B1
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European Patent Office
Prior art keywords
electrode
counter
plasma
nozzle
jet
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EP17712057.3A
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German (de)
English (en)
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EP3430864A1 (fr
Inventor
Wolfgang Viöl
Martin BELLMANN
Christian Ochs
Marcus HARMS
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Fraunhofer Gesellschaft zur Forderung der Angewandten Forschung eV
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Fraunhofer Gesellschaft zur Forderung der Angewandten Forschung eV
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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/32—Plasma torches using an arc
    • H05H1/34—Details, e.g. electrodes, nozzles
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • H05H1/2431—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes using cylindrical electrodes, e.g. rotary drums
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • H05H1/2439—Surface discharges, e.g. air flow control
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • H05H1/2443—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes the plasma fluid flowing through a dielectric tube
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • H05H1/2443—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes the plasma fluid flowing through a dielectric tube
    • H05H1/2465—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes the plasma fluid flowing through a dielectric tube the plasma being activated by inductive coupling, e.g. using coiled electrodes
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/32—Plasma torches using an arc
    • H05H1/34—Details, e.g. electrodes, nozzles
    • H05H1/3478—Geometrical details

Definitions

  • the invention relates to a plasma nozzle for generating a plasma jet with at least one electrode, a casing concentrically surrounding the electrode, a discharge chamber being formed between the electrode and the casing, and the discharge chamber having an inlet opening for a process gas and a nozzle opening for the exit of the plasma jet and the sheathing contains or consists of a dielectric and a first counter-electrode ring-shaped surrounding the discharge chamber in a first longitudinal section.
  • the invention also relates to a method for using the plasma nozzle for treating a surface of a workpiece or a workpiece with the plasma jet thus generated.
  • the plasma jet In the case of such a treatment of a workpiece, surface activation and / or functionalization and ultra-fine cleaning of the treated surface by the plasma jet take place.
  • the plasma can be operated with an inert gas or a reactive gas, so that physical and / or chemical processes take place on the surface of the workpiece to be treated. This improves the adhesion between materials, for example in the case of paintwork or adhesive bonds on plastic surfaces.
  • plasmas to non-conductive workpieces of high material thickness or complicated geometries can be carried out, for example, with known plasma nozzles (jet systems) according to US 6,677,550 B2 or U.S. 5,961,772 be made.
  • the sheathing itself forms the counter-electrode, so that thermal arc discharges form between the electrode and the counter-electrode after exposure to a high voltage.
  • the resulting plasma is expelled from the nozzle by the gas flow.
  • remote systems These jet systems are therefore referred to as remote systems, and the plasmas generated in the process are referred to as "remote plasma". Since the reactive species are not generated directly on the workpiece surface, but at some distance from it, these species can react on the way to the surface, for example with the ambient air or the electrode walls of the remote system. So only a small proportion of this species can react with the surface. This reduces the efficiency of the plasma treatment. Further devices for generating a plasma jet by means of a dielectric hindered discharge can be found in the patents KR 2014 0101235 A , JP 2007 207475 A and CN 201 528 464 U known.
  • devices for generating sliding discharges on the surface of the workpiece to be cleaned or the formation of dielectrically impeded discharges on the surface of the workpiece to be cleaned are known from the prior art.
  • high-voltage electrodes arranged parallel to the surface to be treated are at different electrical potentials and use the workpiece to be treated as a bridging medium for generating discharge filaments.
  • only sliding discharges can be achieved with discharge distances of around 1 mm. These methods are therefore only suitable for flat surfaces with low shape tolerances, since the plasma cannot penetrate into undercuts or depressions and the distance between the high-voltage electrodes must be precisely regulated.
  • dielectrically impeded or barrier discharges the workpiece held in the discharge gap must also be thin in order to generate and maintain the discharge with manageable electrical voltages.
  • the object of the present invention is thus to provide a cleaning method and a cleaning device for activating or ultra-fine cleaning of a surface, which allows an improved, in particular more efficient treatment of the surface and can be used universally on flat or even uneven surfaces of workpieces.
  • a plasma nozzle for generating a plasma jet contains at least one electrode.
  • the electrode can be elongated or rod-shaped.
  • the electrode can be hollow or contain a cavity.
  • the at least one electrode is surrounded by a casing, so that a discharge chamber is formed between the electrode and the casing.
  • the casing and the electrode can be arranged concentrically with one another. According to the invention it is proposed that the sheathing contain or consist of a dielectric.
  • the discharge chamber further has at least one inlet opening for a process gas and a nozzle opening for the exit of the plasma jet.
  • the device according to the invention has at least one first counter-electrode, which surrounds the discharge chamber in a ring-shaped manner in a first longitudinal section.
  • the first counter electrode is electrically insulated from the electrode by the sheathing.
  • there is a second counter-electrode which surrounds the discharge chamber in a second longitudinal section in an annular manner.
  • the counter-electrodes can also be arranged concentrically to the electrode and the casing.
  • a method according to the invention for using or operating a plasma nozzle according to the invention has the following method steps: Supplying a process gas having a flow through the inlet opening into the discharge chamber and generating an electrical potential difference between an electrode and / or a first counterelectrode and / or a second counterelectrode, so that a plasma is formed in the discharge chamber by igniting dielectrically impeded discharges in the process gas in the discharge chamber, and generating a plasma jet from the flow plasma expelled from the nozzle opening.
  • a plasma jet is thus generated by means of a dielectrically impeded discharge (Dielectric Barrier Discharge or DBD) (DBD-Jet).
  • the discharge filaments of the DBD are generated by applying a high electrical voltage between the electrode and the counter electrode or electrodes.
  • DBD dielectric Barrier Discharge
  • discharge filaments are generated in the process gas in which only low temperatures prevail relative to thermal arc discharges.
  • the plasmas generated in this way are therefore non-thermal plasmas in which the reactive species generated are not in thermal equilibrium with their locally surrounding process gas. Due to the dielectric hindrance, the discharge process in the individual discharge filaments is so short in time that no thermal equilibrium can develop.
  • Such plasmas, or a plasma jet generated from them can therefore be used as directly acting plasmas for surface treatment. The possibility of generating plasma close to the surface without damaging the surface enables efficient treatment.
  • the plasma nozzle according to the invention thus combines the Advantages of well-known plasma jets such as high gap clearance with the efficiency of sliding discharges or barrier discharges on the surface of the workpiece.
  • the plasma nozzle according to the invention therefore also enables workpieces to be treated on an industrial scale, since greater spacing tolerances between the plasma nozzle and workpiece are possible than with known sliding discharges and greater workpiece thicknesses than with known barrier discharges.
  • High spacing and shape tolerances which occur especially with mass-produced goods such as semi-finished extrusions, require pretreatment systems in inline operation that implement efficient activation / functionalization in the highest possible tolerance ranges and, at the same time, perform ultra-fine cleaning of the surface.
  • the plasma nozzle according to the invention can be used as such a pretreatment system. Environmentally harmful and costly wet chemical processes for surface treatment can thus be replaced.
  • the use of the plasma nozzle according to the invention in a manner similar to a sliding discharge source enables two-dimensional applications.
  • the second counter electrode is arranged on the nozzle opening in such a way that the nozzle opening runs centrally through the counter electrode.
  • Discharge filaments of the DBD are not only created in the discharge chamber, but also directly in the area of the nozzle opening and can thus affect the surface of the workpiece to be treated. In this way, both chemical and physical influences can occur on the surface occur.
  • the reactive species generated in this way can interact directly with the surface in the plasma jet without first coming into contact with the ambient air or other reaction partners.
  • the second counter-electrode can have a ring surface that is widened in the shape of a plate. This has the advantage that discharge filaments can be generated directly on a surface to be treated. The normal to the plate surface should be roughly parallel to the direction of the plasma jet. With this embodiment of the invention, electrically insulating workpieces with material thicknesses of more than 10 mm can also be treated with a DBD, since the workpiece no longer has to be completely received in the discharge gap.
  • the surface of the second counter electrode can be covered by the casing.
  • the casing thus forms a continuous dielectric that shields the electrode surface from the discharge chamber and the workpiece. This allows simple design and manufacture and reliable operation of the plasma nozzle.
  • the sheathing of a generic plasma nozzle is formed from a dielectric, the counterelectrodes being electrically insulated by the sheathing from the electrode for generating dielectrically impeded discharges in the process gas between the electrode and the counterelectrode.
  • the dielectric can contain a glass, a ceramic, or a polymer.
  • the polymer can be or contain polytetrafluoroethylene (PTFE).
  • the electrode in the discharge space is coated with a dielectric.
  • This additional coating causes an even more homogeneous discharge characteristic of the plasma generated by the DBD.
  • the coating can contain or consist of a polymer or a ceramic.
  • the coating can contain polytetrafluoroethylene or an oxide or an oxynitride.
  • the inlet opening of at least one gas feed-through can be formed in the electrode.
  • the gas feedthroughs can advantageously comprise a plurality of bores which are arranged radially symmetrically in the electrode, a uniform flow of the process gas through the discharge chamber is achieved. This also leads to a particularly homogeneous and stable plasma jet.
  • a plasma nozzle housing can be present, the counter electrodes being fixed between the casing and the plasma nozzle housing by means of a potting compound. In this way, inexpensive production of the plasma nozzle is possible and parasitic discharges in the interior of the plasma nozzle are avoided.
  • the first counter-electrode when the device is in operation, can be at a ground potential and the second counter-electrode can be at a floating potential.
  • a plasma jet is expelled from the nozzle, which can have a range of more than 10 mm or more than 20 mm or more than 30 mm.
  • the second counterelectrode when the device is in operation, can be at ground potential and the first counterelectrode can be at ground potential a floating potential.
  • the plasma filaments slide over the underside of the plasma nozzle or over the partial surface of the casing that runs parallel to the plate surface of the second electrode. In this case, sliding discharges can be generated on the workpiece at a distance of about 1 mm to about 3 mm.
  • the first counter-electrode and the second counter-electrode can be at a ground potential when the device is in operation. In this operating state, a discharge is generated between the first counter-electrode and the electrode in the interior of the discharge space, the plasma of which is expelled from the plasma nozzle.
  • the second counter electrode forms a counter potential to the plasma emerging from the nozzle. In this way, sliding discharges are possible at a distance of about 3 mm to about 20 mm from the workpiece surface.
  • the process gas can be selected from argon and / or helium and / or ambient air and / or synthetic air and / or gas mixtures of nitrogen and oxygen in a mixing ratio of 90/10 or 95/5 volume percent.
  • Possible surface treatments with the plasma jet of a plasma nozzle according to the invention are all previous areas of application in which plasma is used, e.g. surface functionalization, surface activation, layer deposition, ultra-fine cleaning and / or disinfection.
  • FIG. 1 a sectional representation of a plasma nozzle 1 according to the invention during its use in the surface treatment of a workpiece 3 with a plasma jet 5 is shown.
  • the plasma nozzle 1 has a pin-shaped electrode 7 for applying a particularly pulsed high voltage.
  • This pin electrode 7 is therefore also referred to below as the high-voltage electrode.
  • the pin electrode 7 is concentrically surrounded by a casing 9 made of a dielectric material.
  • the casing 9 has a cylindrical basic shape.
  • a discharge chamber 11 is formed between the electrode 7 and the casing 9.
  • the discharge chamber 11 has an inlet opening 12 for a process gas, for example argon, helium and / or air, and a nozzle opening 14 for the plasma jet 5 to exit.
  • the plasma jet 5 is made up of plasma generated in the discharge chamber 11 and expelled from the nozzle opening 14 by a flow of the process gas generated.
  • the flowing process gas is shown symbolically in the figure by a block arrow in the area of the inlet opening 12.
  • a second metal counter-electrode 16 is provided which surrounds the discharge chamber 11 in a ring-shaped manner.
  • the second counterelectrode 16 is electrically insulated from the electrode 7 by the dielectric sheathing 9 in order to generate dielectrically impeded discharges in the process gas between the pin-shaped electrode 7 and the counterelectrode 16.
  • the second counter-electrode 16 can be connected to ground to generate the dielectrically impeded discharges, i. E. H. be electrically grounded, which is why it is also referred to below as a ground ring.
  • the electrical contact is not shown in the figure.
  • the second counter electrode 16 is arranged in the region of the nozzle opening 14 in such a way that the nozzle opening 14 runs centrally through the second counter electrode 16.
  • the second counter electrode 16 also has an annular surface 18 that is widened in the shape of a plate.
  • widened in the shape of a plate is understood to mean a ring with a shape whose radial ring width is greater than its axial ring height.
  • the ring surface 18 of the plate-shaped widened counter-electrode 16 facing away from the plasma jet direction is covered by the casing 9 and thus also shielded from the high-voltage electrode 7 by means of the dielectric of the casing 9.
  • the plasma nozzle 1 has a plate-shaped widening (underside of the plate) in its lower area, ie in the area of the nozzle opening 14.
  • the casing 9 is therefore also referred to below as a plate bar and the entire plasma nozzle 1 is also referred to below as a “disk jet”.
  • the surface normals of the ring surface 18, which is widened in the shape of a plate, and the correspondingly shaped underside of the plate run approximately parallel to the exit direction of the generated plasma jet 5.
  • the nozzle opening 14 extends radially centrally through the plate-shaped counter-electrode 16.
  • the plasma nozzle 1 furthermore has a first counter-electrode 20 made of metal, which can also be connected electrically to ground for operating the plasma nozzle 1.
  • This first counter-electrode 20 also surrounds the discharge chamber 11 in a ring shape and is insulated from the rod-shaped electrode 7 by the casing 9.
  • the first counter electrode 20 is arranged at the level of the rod-shaped electrode 7 and is also referred to below as the upper ground ring, whereas the second counter electrode 16 arranged in the area of the nozzle opening 14 is referred to as the lower ground ring.
  • the electrical ground potential of the ground can also be replaced by any other potential and / or both ground rings can be placed on different potentials, i.e. electrically connected to different voltage sources. For safety and application reasons, however, the earth potential is to be preferred.
  • the plasma nozzle 1 can therefore be referred to as a "double-mass disk jet".
  • a pre-discharge electrode is formed from the first counter-electrode 20 opposite the second counter-electrode 16 arranged in the region of the nozzle opening 14. That is, the plasma generated by discharges between the first counter-electrode 20 and the rod-shaped electrode 7 is transported by the flow of the process gas to the second counter-electrode 16 arranged in the area of the nozzle opening 14, which enables dielectrically impeded discharges to be ignited in the area of the last-mentioned second counter-electrode. ie a dielectrically impeded post-discharge is excited.
  • the high-voltage electrode 7 has gas feedthroughs 25 and thereby functions at the same time as a process gas feed, i.e. inlet opening 12. It is made of a conductive material, e.g. stainless steel, aluminum and / or brass.
  • the plate bar serves as a dielectric and is made of a dielectric material e.g. ceramic, glass, and / or polymer.
  • the upper ground ring is attached in the upper area of the plate rod sleeve, i.e. the cylindrical part of the casing 9 which forms the discharge chamber. Outside the discharge chamber 11, the ground rings are shielded from the high-voltage electrode 7 with an optional high-voltage-resistant potting compound 27 so that no parasitic discharges occur inside the part of the plasma nozzle 1 that forms an electrode head.
  • the potting compound 27 also serves to fix the compound rings between the casing 9 and the housing 29 of the plasma nozzle 1.
  • a plasma jet 5 with plasma generation from a dielectrically impeded discharge can be ignited between the high-voltage electrode 7 and the upper ground ring 20.
  • this DBD jet can be expelled from the nozzle opening 14 up to 50 mm.
  • This DBD jet can, for example, also be ignited with compressed air as the process gas.
  • the concentric lower mass ring 16 forces filaments of discharges expelled from the nozzle opening 14 to ignite on the underside of the plate, ie on the underside of the casing 9, which is widened in the manner of a plate and faces the workpiece.
  • a discharge can thus ignite, which after acts on the principle of a repeater.
  • the discharge between the upper ground ring 20 and the high-voltage electrode 7, or the plasma of this discharge generates a further discharge in the area of the lower ground ring 16 and is therefore repeated in the figurative sense.
  • the filaments of the discharges in the area of the lower mass ring 16 can come into direct contact with the surface to be treated. Such surface discharges are more efficient than remote plasmas. The reactive species in the plasma react to a large extent on their way to the workpiece surface with remote plasmas, which results in great efficiency losses in the activation of the surface. The latter is not the case with surface discharges.
  • the filaments come into contact with the surface in the event of surface discharges, which enables the surface to be finely cleaned.
  • One embodiment of the method according to the invention uses a DBD remote plasma as an ignition source and projects its potential onto the non-conductive surface of the workpiece. Since the non-conductive workpiece thus indirectly becomes a counter potential, also called floating potential, for the lower ground ring 16, tangential filaments of a discharge develop between the underside of the plate and the non-conductive workpiece. Depending on the distance between the underside of the plate and the workpiece, a largely homogeneous plasma discharge is formed over the surface of the underside of the plate (plate surface), supported by the back pressure of the continuously flowing process gas.
  • the pin-shaped electrode 7 of the plasma nozzle is off Figure 1 shown as a detailed representation.
  • the illustrated pin electrode 7 is designed to be radially symmetrical.
  • the pin electrode 7 On its electrode base 31 facing away from the tip 30 of the pin electrode 7, the pin electrode 7 has grooves 32, which serve to fix the pin electrode 7 in the casing 9 of the plasma nozzle.
  • gas feedthroughs 25 are arranged radially symmetrically within the pin electrode 7 in the region of the electrode base 31. These form the inlet opening of the plasma nozzle for the process gas.
  • the plasma nozzle according to the invention is off Figure 1 shown in different operating modes during operation. Due to the electrode configuration with a high voltage electrode and two counter electrodes, namely the upper and the lower ground ring, the "Disk-Jet" can be operated in three different modes. In the Figures 3a to c the three modes are shown. The electrical contact is shown in the form of a circuit diagram.
  • This plasma jet 40 has a length of up to 50 mm for the process gases argon, helium or air.
  • the "Disc-Jet” can be easily integrated into existing processes and, thanks to its effectiveness, can also be used under industrial conditions.
  • a plasma can be optimally applied using the "Disc-Jet” both on flat plate / foil material and on complex workpiece geometries or undercuts.
  • Figures 4a and b Quality parameters of work results in the surface treatment of workpieces as a function of operating parameters of the method according to the invention are shown in comparison in each case in a bar diagram.
  • Figure 4a shows the peeling resistance of water-based paints on PVC in comparison with surface treatment in the "DBD-Jet” and "Disc-Jet” operating modes with argon process gas.
  • the discharge of the "Disc-Jet" has the character of a sliding discharge and can be realized in free operation, ie without a workpiece under the source, with discharge distances of up to 20 mm between the nozzle opening and the workpiece surface.
  • a high level of clearance, ie penetration depth in surface gaps, is thus achieved on the basis of direct discharges, which enables the efficient treatment of profiled or structured surfaces or also workpieces with greater shape or position tolerances.
  • Figure 5a shows the two-dimensional formation of the sliding discharge of the "disc jet" on a workpiece surface.
  • the discharge distance is in accordance with Figures 4 constant 3 mm for flat treatment. A flat discharge over the workpiece surface can be clearly seen.
  • Figure 5b shows the discharge characteristics of the "Disk-Jet" in free operation (discharge without workpiece).
  • the filaments emerge from the mouth of the nozzle opening and after a certain distance ignite again up to the plate surface of the "disk jet".
  • the filaments slide over the surface of the workpiece and form a flat discharge that adapts to the size of the plate surface as the distance decreases.
  • Figure 5c shows the use of the "Disc-Jet" on a plastic profile with a 10 mm deep longitudinal groove with an undercut.
  • the plasma jet can be seen emerging from the nozzle mouth as a plasma bundle. This bundle forms a large base point on the bottom of the longitudinal groove, from which filaments ignite to the plate surface of the "disc jet".

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Fluid Mechanics (AREA)
  • Geometry (AREA)
  • Plasma Technology (AREA)

Claims (15)

  1. Buse à plasma (1) pour générer un jet de plasma (5), comportant au moins
    une électrode (7),
    une enveloppe (9) entourant concentriquement l'électrode (7), une chambre de décharge (11) étant réalisée entre l'électrode (7) et l'enveloppe (9), et la chambre de décharge (11) présentant une ouverture d'entrée (12) pour un gaz de traitement et une ouverture de buse (14) pour la sortie du jet de plasma (5), et l'enveloppe (9) contenant un diélectrique ou étant constituée de celui-ci,
    une première contre-électrode (20) entourant en forme annulaire la chambre de décharge (11) dans une première portion longitudinale,
    dans laquelle
    la première contre-électrode (20) est isolée électriquement de l'électrode (7) par l'enveloppe (9), et
    en outre, il est prévu une seconde contre-électrode (16) qui entoure en forme annulaire la chambre de décharge (11) dans une seconde portion longitudinale,
    caractérisée en ce que
    la seconde contre-électrode (16) présente une surface annulaire (18) élargie en forme d'assiette.
  2. Buse à plasma (1) selon la revendication 1,
    dans laquelle la seconde contre-électrode (16) est disposée concentriquement par rapport à l'ouverture de buse (14).
  3. Buse à plasma (1) selon la revendication 1 ou 2,
    dans laquelle la normale à la surface annulaire (18), élargie en forme d'assiette, de la seconde contre-électrode (16) est approximativement parallèle à la direction de sortie du jet de plasma qui peut être généré.
  4. Buse à plasma (1) selon l'une des revendications 1 à 3,
    dans laquelle la surface annulaire (18) est recouverte par l'enveloppe (9).
  5. Buse à plasma (1) selon l'une des revendications 1 à 4,
    dans laquelle l'électrode (7) est revêtue d'un diélectrique, en particulier d'un diélectrique qui contient ou consiste en polytétrafluoroéthylène.
  6. Buse à plasma (1) selon l'une des revendications 1 à 5,
    dans laquelle l'ouverture d'entrée (12) est formée par au moins un passage à gaz (25) dans l'électrode (7).
  7. Buse à plasma (1) selon la revendication 6,
    dans laquelle les passages à gaz (25) sont disposés à symétrie radiale dans l'électrode (7).
  8. Buse à plasma (1) selon l'une des revendications 1 à 7,
    dans laquelle la première contre-électrode (20) et la seconde contre-électrode (16) peuvent être connectées à des potentiels électriques différents.
  9. Buse à plasma (1) selon l'une des revendications 1 à 8,
    dans laquelle est prévu un boîtier de buse à plasma (29), les contreélectrodes (16, 20) étant fixées entre l'enveloppe (9) et le boîtier de buse à plasma (29) au moyen d'une masse de scellement (27).
  10. Procédé d'utilisation d'une buse à plasma (1) selon l'une des revendications 1 à 9, comprenant les étapes consistant à :
    amener un gaz de traitement en écoulement à travers l'ouverture d'entrée (12) jusque dans une chambre de décharge (11) et
    générer une différence de potentiel électrique entre une électrode (7) disposée dans la chambre de décharge (11) et une seconde contre-électrode (16), de sorte qu'un plasma se forme dans la chambre de décharge (11) par amorçage de décharges à barrière diélectrique dans le gaz de traitement dans la chambre de décharge (11), et
    générer un jet de plasma (5) à partir du plasma expulsé par l'écoulement hors de l'ouverture de buse (14),
    caractérisé en ce que la seconde contre-électrode (16) présente une surface annulaire (18) élargie en forme d'assiette.
  11. Procédé selon la revendication 10,
    dans lequel le jet de plasma (5) agit sur une surface d'une pièce à œuvrer (3).
  12. Procédé selon l'une des revendications 10 ou 11,
    dans lequel est prévue en outre une première contre-électrode, la première contre-électrode (20) étant à un potentiel de masse et la seconde contre-électrode (16) étant à un potentiel flottant.
  13. Procédé selon l'une des revendications 10 ou 11,
    dans lequel est prévue en outre une première contre-électrode, la seconde contre-électrode (16) étant à un potentiel de masse et la première contre-électrode (20) étant à un potentiel flottant.
  14. Procédé selon l'une des revendications 10 ou 11,
    dans lequel est prévue en outre une première contre-électrode, la première contre-électrode (20) et la seconde contre-électrode (16) étant à un potentiel de masse.
  15. Procédé selon l'une des revendications 10 à 12,
    dans lequel le gaz de traitement est choisi parmi l'argon et/ou l'hélium et/ou l'air ambiant.
EP17712057.3A 2016-03-16 2017-03-15 Buse plasma et procede d'utilisation de la buse plasma Active EP3430864B1 (fr)

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EP16160623 2016-03-16
DE102016209097.6A DE102016209097A1 (de) 2016-03-16 2016-05-25 Plasmadüse
PCT/EP2017/056052 WO2017157975A1 (fr) 2016-03-16 2017-03-15 Buse à plasma

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CN108566714A (zh) * 2018-06-09 2018-09-21 贵州电网有限责任公司 一种等离子体射流装置
WO2023034209A1 (fr) * 2021-09-01 2023-03-09 Lam Research Corporation Buse à électrode-diélectrique pour traitement au plasma
CN115501361A (zh) * 2022-10-14 2022-12-23 嘉兴和禹净化科技有限公司 羟基等离子发生器和消毒净化设备

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KR20140101235A (ko) * 2013-02-08 2014-08-19 한국기계연구원 분사형 플라즈마 발생기

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CN108781498A (zh) 2018-11-09
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CN108781498B (zh) 2021-07-23
DK3430864T3 (da) 2022-02-21

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