EP3170196A1 - Vacuum system, in particular a plasma system, having a completely enclosed chamber extruded profile - Google Patents
Vacuum system, in particular a plasma system, having a completely enclosed chamber extruded profileInfo
- Publication number
- EP3170196A1 EP3170196A1 EP15739229.1A EP15739229A EP3170196A1 EP 3170196 A1 EP3170196 A1 EP 3170196A1 EP 15739229 A EP15739229 A EP 15739229A EP 3170196 A1 EP3170196 A1 EP 3170196A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- chamber
- extruded profile
- vacuum
- vacuum chamber
- vacuum system
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000001125 extrusion Methods 0.000 claims description 11
- 238000001816 cooling Methods 0.000 claims description 7
- 238000003780 insertion Methods 0.000 claims description 7
- 230000037431 insertion Effects 0.000 claims description 7
- 238000004519 manufacturing process Methods 0.000 abstract description 9
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 238000009434 installation Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 238000003801 milling Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B5/00—Drying solid materials or objects by processes not involving the application of heat
- F26B5/04—Drying solid materials or objects by processes not involving the application of heat by evaporation or sublimation of moisture under reduced pressure, e.g. in a vacuum
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/16—Vessels; Containers
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61L—METHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS IN GENERAL; DISINFECTION, STERILISATION OR DEODORISATION OF AIR; CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES
- A61L2/00—Methods or apparatus for disinfecting or sterilising materials or objects other than foodstuffs or contact lenses; Accessories therefor
- A61L2/02—Methods or apparatus for disinfecting or sterilising materials or objects other than foodstuffs or contact lenses; Accessories therefor using physical phenomena
- A61L2/14—Plasma, i.e. ionised gases
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J19/087—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
- B01J19/088—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32458—Vessel
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/6719—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the construction of the processing chambers, e.g. modular processing chambers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J2219/0894—Processes carried out in the presence of a plasma
Definitions
- Vacuum system in particular plasma system, with a completely closed chamber extruded profile
- the invention relates to a vacuum system with a vacuum chamber, in which the parallel to the central vacuum chamber longitudinal axis extending outside of the vacuum chamber is integrally formed from a chamber extruded profile.
- the side walls of the vacuum chamber consist of a chamber extruded profile.
- the front sides of the vacuum chamber consist of a chamber extruded profile.
- Chamber extruded profiles are closed by bolted to the chamber extruded profile plates.
- the chamber extruded profile has at least one perpendicular to the end face of the chamber extruded profile trained outside, ie on a side wall, an opening for loading and unloading the vacuum chamber. The opening must be milled consuming in the chamber extruded profile.
- Object of the present invention is in contrast, a
- Vacuum system with a vacuum chamber in which the parallel to the central vacuum chamber longitudinal axis extending outside of the vacuum chamber is integrally formed from a chamber extruded profile, the chamber extruded across the central vacuum chamber longitudinal axis is formed completely closed and has a front reversibly open and closeable door.
- Chamber extrusion profile formed transversely to the central vacuum chamber longitudinal axis completely closed.
- Vacuum chamber via the end face which is formed in the form of a reversibly open and closeable door.
- the vacuum chamber may have a hinged door on a first end face. Such an attachable door can be used to lock the
- Vacuum chamber are sucked by a pump.
- the vacuum chamber may have a sliding door at a first end face. Both in the case of a hinged door and in the case of a sliding door, the vacuum chamber can be formed without hinges.
- the vacuum chamber preferably has a pivotably openable and closable door on a first end side.
- Swivel axis of the door is preferably transverse to the central
- Vacuum chamber longitudinal axis in particular perpendicular to an axis parallel to the central vacuum chamber longitudinal axis.
- the vacuum system can be structurally particularly simple and inexpensive.
- Chamber extruded profile the chamber extrusion profile on its outer side a longitudinal axis parallel to the central vacuum chamber extending first hinge projection, on which a first hinge for pivotal connection between the door and
- Chamber extruded profile is arranged.
- the chamber extruded profile can on its outer side a parallel to the central vacuum chamber longitudinal axis extending second
- Vacuum system having a first closure, which is arranged on a first closure holder projection, wherein the closure holder projection is formed parallel to the central vacuum chamber longitudinal axis on the neglectedse ite of the chamber extruded profile.
- the chamber extruded profile on its outside a parallel to the central vacuum chamber longitudinal axis extending second closure holder projection on which a second closure for closing the door on
- Chamber extruded profile is arranged.
- the second closure further increases the tightness between the door and the chamber extruded profile.
- the chamber extruded profile may further have on its outer side a parallel to the central vacuum chamber longitudinal axis extending cooling rib.
- the chamber extruded profile on its outer side a plurality of parallel to the central
- Vacuum chamber longitudinal axis extending cooling fins on. Due to the cooling fin (s), water cooling can be dispensed with in many applications.
- the vacuum system preferably has a housing.
- the chamber extruded profile on its outside a parallel to the central Having vacuum chamber longitudinal axis extending first fastening projection.
- the first attachment projection facilitates the assembly of the vacuum chamber to the housing, so that assembly costs are reduced.
- the Kammerstrangpressprofii on its outer side a parallel to the central vacuum chamber longitudinal axis extending second mounting projection for attaching the vacuum chamber to the housing of the vacuum system.
- the vacuum chamber is structurally particularly simple and at the same time securely attached to the housing of the vacuum system.
- the Kammerstrangpressprofii has on its inner side a plurality of opposite parallel to the central
- Chamber extrusions this way several plate mounts are made, whereby the production of the vacuum system is significantly simplified.
- Extruded profiles can be a flange for insertion and or
- Vacuum chamber takes place when the chamber extruded profile
- Aluminum or an aluminum alloy is formed.
- the production of the vacuum system is further significantly simplified if the vacuum system has a housing in which the
- Vacuum chamber is added, with a parallel to the center
- Vacuum chamber longitudinal axis extending part of the housing is designed in the form of a housing extrusion profile.
- the production of the vacuum system is simplified in that not only a significant part of the vacuum chamber, namely the
- Chamber extruded but also a part of the housing, namely the housing extruded profile can be produced by an extrusion process.
- Chamber extruded profile formed integrally with the housing of the extruded profile.
- the vacuum system can be designed in the form of a vacuum dryer.
- the vacuum system can for this purpose have a pump for at least partial evacuation of the vacuum chamber. Furthermore, the vacuum system can for this purpose have a pump for at least partial evacuation of the vacuum chamber. Furthermore, the vacuum system can for this purpose have a pump for at least partial evacuation of the vacuum chamber. Furthermore, the vacuum system can for this purpose have a pump for at least partial evacuation of the vacuum chamber. Furthermore, the vacuum system can for this purpose have a pump for at least partial evacuation of the vacuum chamber. Furthermore, the
- Vacuum system have a heater.
- the extruded profile can be nickel-plated at least on its inside to avoid corrosion. Preferably, the entire
- the vacuum system is designed in the form of a plasma system.
- at least one plasma electrode can be arranged in this case.
- the vacuum system in the form of a plasma system may further comprise a pump, a vent valve, a gas flow meter, a pressure gauge and / or a high voltage power supply.
- the vacuum system has a housing extruded profile.
- the chamber extruded profile can be connected to the housing extruded profile.
- the chamber extruded profile can be welded and / or screwed to the housing extruded profile.
- FIG. 1 shows a perspective view of a vacuum system in the form of a plasma system; a plan view of a first chamber extruded profile; a top view of the first chamber extruded profile according to Figure 2, wherein the first chamber extruded profile is attached to a first housing extruded profile; and a plan view of a second chamber extruded profile which is integrally formed with a second housing extruded profile.
- FIG. 1 shows a vacuum system 10 with a vacuum chamber 12.
- the vacuum chamber 12 is largely surrounded by a housing 14.
- the vacuum chamber 12 has a door 16 which is pivotally openable and closable by means of hinges 18, 20.
- the hinges 18, 20 are one end on the door 16 and other ends on one
- Chamber extruded profile 22 (see Figure 2) attached.
- closures 24, 26 are provided.
- the closures 24, 26 are a Ends am
- Chamber extruded 22 (see Figure 2) attached and engage other ends with closed door 16 in corresponding brackets of the door 16 a.
- the vacuum chamber 12 is arranged horizontally, ie a central one
- Vacuum chamber longitudinal axis 28 extends in the operating state of
- the vacuum system 10 has a pressure indicator 30, a timer 32,
- the pressure display 30 is used to display the internal pressure of the vacuum chamber 12.
- the timer 32 is the
- the gas flow measuring devices 34, 36 By the gas flow measuring devices 34, 36, the gas flow can be adjusted and controlled in the vacuum chamber 12.
- the high-voltage control 38 serves to supply power to a plasma electrode (not shown) in the vacuum chamber 12.
- FIG. 2 shows the chamber extruded profile 22
- Chamber extruded profile 22 is uniformly formed in the direction of the central vacuum chamber longitudinal axis 28, which is shown only point-shaped in Figure 2. Furthermore, the chamber extruded profile 22 is formed symmetrically to a central vacuum chamber longitudinal plane 40. The chamber extruded profile 22 is formed of aluminum.
- the chamber extruded profile 22 has on its outer side a first hinge projection 42 and a second hinge projection 44.
- the hinges 18, 20 are mounted on the hinge projections 42, 44.
- the chamber extrusion profile 22 also has a first closure holder projection 46 on which the first closure 24 (see FIG. 1) is mounted.
- the second closure 26 is fastened to a second closure holder projection 48.
- the projections 42, 44, 46, 48 allow a structurally simple and at the same time very dense arrangement of the door 16 (see Figure 1) on the
- Chamber extruded profile 22 in a pivotable arrangement.
- this may have on its outer side one or more cooling ribs 50, 52, 54 (in FIG. 2)
- the chamber extrusion press profile 22 has on its inside a plurality of insertion recesses, in each of which a plate (not shown) can be inserted. For reasons of clarity, only a first insertion recess 56 and a second one are shown in FIG.
- Insertion recess 58 provided with a reference numeral.
- Insert recesses 56, 58 are opposite each other
- the chamber extruded profile 22 For fastening the chamber extruded profile 22 to the housing 14 (see FIG. 1), the chamber extruded profile 22 is provided
- FIG. 3 shows the chamber extruded profile 22 via
- Fastener 64, 66 is mounted on a housing extrusion profile 68.
- the housing extruded profile 68 constitutes a part of the housing 14 (see FIG. 1).
- the fastening means 64, 66 are designed in the form of screws.
- FIG. 4 shows a second chamber extruded profile 70 and a second housing extruded profile 72, wherein the extruded profiles 70, 72, in contrast to the extruded profiles 22, 68 (see FIG. 3), are integrally formed with one another.
- the invention relates to a vacuum system, in particular in the form of a plasma system.
- the vacuum system has a vacuum chamber.
- the side walls of the vacuum chamber are formed in the form of a continuous closed chamber extruded profile.
- a first end face of the chamber extruded profile is preferably closed with a plate.
- a second end face of the chamber extruded profile which is opposite the first end face, has a reversibly openable and closable door.
- the door is preferably fixed by at least one hinge pivotally mounted on the chamber extruded profile. The completely closed transversely to the longitudinal axis of the chamber extruded profile
- the vacuum chamber is at least partially received in a housing which is at least partially also formed in the form of an extruded profile.
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Analytical Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Plasma & Fusion (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Health & Medical Sciences (AREA)
- Organic Chemistry (AREA)
- Toxicology (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Engineering & Computer Science (AREA)
- Molecular Biology (AREA)
- Mechanical Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Veterinary Medicine (AREA)
- Animal Behavior & Ethology (AREA)
- Plasma Technology (AREA)
- Pressure Vessels And Lids Thereof (AREA)
- Physical Vapour Deposition (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
Description
Claims
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102014213942.2A DE102014213942B4 (en) | 2014-07-17 | 2014-07-17 | Vacuum system, in particular plasma system, with a completely closed chamber extruded profile |
PCT/EP2015/065968 WO2016008844A1 (en) | 2014-07-17 | 2015-07-13 | Vacuum system, in particular a plasma system, having a completely enclosed chamber extruded profile |
Publications (2)
Publication Number | Publication Date |
---|---|
EP3170196A1 true EP3170196A1 (en) | 2017-05-24 |
EP3170196B1 EP3170196B1 (en) | 2018-05-02 |
Family
ID=53682673
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP15739229.1A Active EP3170196B1 (en) | 2014-07-17 | 2015-07-13 | Vacuum system, in particular a plasma system, having a completely enclosed chamber extruded profile |
Country Status (7)
Country | Link |
---|---|
US (1) | US10041730B2 (en) |
EP (1) | EP3170196B1 (en) |
CN (1) | CN106537551B (en) |
DE (1) | DE102014213942B4 (en) |
ES (1) | ES2670703T3 (en) |
TR (1) | TR201810324T4 (en) |
WO (1) | WO2016008844A1 (en) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102014213942B4 (en) * | 2014-07-17 | 2016-01-28 | Christof-Herbert Diener | Vacuum system, in particular plasma system, with a completely closed chamber extruded profile |
JP1562489S (en) * | 2015-08-14 | 2016-11-07 | ||
DE102018103949A1 (en) * | 2018-02-21 | 2019-08-22 | Christof-Herbert Diener | Low-pressure plasma chamber, low-pressure plasma system and method for producing a low-pressure plasma chamber |
EP3564538B1 (en) * | 2019-02-20 | 2021-04-07 | Pfeiffer Vacuum Gmbh | Vacuum system and method for manufacturing the same |
CN112414014A (en) * | 2020-11-13 | 2021-02-26 | 河南泓医药业有限公司 | Production device and production method of unique flavor powder (freeze-dried) |
Family Cites Families (23)
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US3795986A (en) * | 1971-12-13 | 1974-03-12 | Cenco Medical Health Supply Co | Modular compartment sublimator |
SE450692B (en) * | 1982-12-09 | 1987-07-20 | Rovac Technology Ab | DEVICE FOR POSSIBLE COMPRESSION TREATMENT IN A TREATMENT ROOM |
US4526670A (en) * | 1983-05-20 | 1985-07-02 | Lfe Corporation | Automatically loadable multifaceted electrode with load lock mechanism |
US5288218A (en) * | 1993-02-11 | 1994-02-22 | Mikron Industries | Extrusion calibrator |
WO1996022496A1 (en) * | 1995-01-20 | 1996-07-25 | Freezedry Specialties, Inc. | Freeze dryer |
US5746434A (en) * | 1996-07-09 | 1998-05-05 | Lam Research Corporation | Chamber interfacing O-rings and method for implementing same |
US6182851B1 (en) * | 1998-09-10 | 2001-02-06 | Applied Materials Inc. | Vacuum processing chambers and method for producing |
US6579579B2 (en) * | 2000-12-29 | 2003-06-17 | Alcan Technology & Management Ltd. | Container made of a light metal alloy and process for its manufacture |
US20030045098A1 (en) * | 2001-08-31 | 2003-03-06 | Applied Materials, Inc. | Method and apparatus for processing a wafer |
US8648977B2 (en) * | 2004-06-02 | 2014-02-11 | Applied Materials, Inc. | Methods and apparatus for providing a floating seal having an isolated sealing surface for chamber doors |
US8206075B2 (en) * | 2004-06-02 | 2012-06-26 | Applied Materials, Inc. | Methods and apparatus for sealing a chamber |
WO2007127286A2 (en) * | 2006-04-24 | 2007-11-08 | Medical Instill Technologies, Inc. | Needle penetrable and laser resealable lyophilization device and related method |
KR100892781B1 (en) * | 2007-02-12 | 2009-04-15 | 주식회사 휴먼메디텍 | Door for vacuum chamber |
DE102007021386A1 (en) * | 2007-05-04 | 2008-11-06 | Christof-Herbert Diener | Short-cycle low-pressure plasma system |
DE102007060515A1 (en) * | 2007-12-13 | 2009-06-18 | Christof-Herbert Diener | Surface treatment processes |
DE102009002337B4 (en) * | 2009-04-09 | 2013-07-11 | Christof-Herbert Diener | Indicator for monitoring a plasma |
WO2011099868A1 (en) * | 2010-02-12 | 2011-08-18 | Norsk Hydro Asa | Modular extrusion die |
CN202673051U (en) * | 2012-07-07 | 2013-01-16 | 东莞百进五金塑料有限公司 | Product surface spraying vacuum chamber movable trunnion air-tight door |
US10281538B2 (en) * | 2012-09-05 | 2019-05-07 | General Electric Company | Warm bore cylinder assembly |
CA2888741C (en) * | 2012-10-26 | 2022-01-04 | James J. Sanfilippo | Flexible package and method of making the same |
US10207850B2 (en) * | 2012-10-26 | 2019-02-19 | Primapak, Llc. | Flexible package and method of making same |
WO2014159696A1 (en) * | 2013-03-13 | 2014-10-02 | Stryker Corporation | Sterilization container capable of providing an indication regarding whether or not surgical instruments sterilized in the container were properly sterilized |
DE102014213942B4 (en) * | 2014-07-17 | 2016-01-28 | Christof-Herbert Diener | Vacuum system, in particular plasma system, with a completely closed chamber extruded profile |
-
2014
- 2014-07-17 DE DE102014213942.2A patent/DE102014213942B4/en not_active Expired - Fee Related
-
2015
- 2015-07-13 CN CN201580038540.1A patent/CN106537551B/en active Active
- 2015-07-13 ES ES15739229.1T patent/ES2670703T3/en active Active
- 2015-07-13 EP EP15739229.1A patent/EP3170196B1/en active Active
- 2015-07-13 TR TR2018/10324T patent/TR201810324T4/en unknown
- 2015-07-13 WO PCT/EP2015/065968 patent/WO2016008844A1/en active Application Filing
-
2017
- 2017-01-13 US US15/405,644 patent/US10041730B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
CN106537551A (en) | 2017-03-22 |
US20170122663A1 (en) | 2017-05-04 |
EP3170196B1 (en) | 2018-05-02 |
DE102014213942B4 (en) | 2016-01-28 |
WO2016008844A1 (en) | 2016-01-21 |
TR201810324T4 (en) | 2018-08-27 |
CN106537551B (en) | 2018-05-08 |
US10041730B2 (en) | 2018-08-07 |
ES2670703T3 (en) | 2018-05-31 |
DE102014213942A1 (en) | 2016-01-21 |
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