EP3140127B1 - Multi-layer body and method for the production thereof - Google Patents

Multi-layer body and method for the production thereof Download PDF

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Publication number
EP3140127B1
EP3140127B1 EP15724532.5A EP15724532A EP3140127B1 EP 3140127 B1 EP3140127 B1 EP 3140127B1 EP 15724532 A EP15724532 A EP 15724532A EP 3140127 B1 EP3140127 B1 EP 3140127B1
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EP
European Patent Office
Prior art keywords
layer
partial
metallic
region
lacquer
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EP15724532.5A
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German (de)
French (fr)
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EP3140127A1 (en
Inventor
Reto KARRER WALKER
Andreas Schilling
René Staub
Christina Streb
Christian Saxer
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OVD Kinegram AG
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OVD Kinegram AG
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Application filed by OVD Kinegram AG filed Critical OVD Kinegram AG
Priority to PL15724532T priority Critical patent/PL3140127T3/en
Priority to SI201531203T priority patent/SI3140127T1/en
Priority to RS20200213A priority patent/RS59973B1/en
Publication of EP3140127A1 publication Critical patent/EP3140127A1/en
Application granted granted Critical
Publication of EP3140127B1 publication Critical patent/EP3140127B1/en
Priority to HRP20200694TT priority patent/HRP20200694T1/en
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B42BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42DBOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30Identification or security features, e.g. for preventing forgery
    • B42D25/36Identification or security features, e.g. for preventing forgery comprising special materials
    • B42D25/373Metallic materials
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M1/00Inking and printing with a printer's forme
    • B41M1/26Printing on other surfaces than ordinary paper
    • B41M1/28Printing on other surfaces than ordinary paper on metals
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M3/00Printing processes to produce particular kinds of printed work, e.g. patterns
    • B41M3/14Security printing
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M3/00Printing processes to produce particular kinds of printed work, e.g. patterns
    • B41M3/14Security printing
    • B41M3/144Security printing using fluorescent, luminescent or iridescent effects
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M3/00Printing processes to produce particular kinds of printed work, e.g. patterns
    • B41M3/14Security printing
    • B41M3/148Transitory images, i.e. images only visible from certain viewing angles
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00Duplicating or marking methods; Sheet materials for use therein
    • B41M5/0041Digital printing on surfaces other than ordinary paper
    • B41M5/0047Digital printing on surfaces other than ordinary paper by ink-jet printing
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00Duplicating or marking methods; Sheet materials for use therein
    • B41M5/0041Digital printing on surfaces other than ordinary paper
    • B41M5/0058Digital printing on surfaces other than ordinary paper on metals and oxidised metal surfaces
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B42BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42DBOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/20Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof characterised by a particular use or purpose
    • B42D25/21Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof characterised by a particular use or purpose for multiple purposes
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B42BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42DBOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30Identification or security features, e.g. for preventing forgery
    • B42D25/328Diffraction gratings; Holograms
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B42BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42DBOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30Identification or security features, e.g. for preventing forgery
    • B42D25/337Guilloche patterns
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B42BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42DBOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30Identification or security features, e.g. for preventing forgery
    • B42D25/36Identification or security features, e.g. for preventing forgery comprising special materials
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B42BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42DBOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30Identification or security features, e.g. for preventing forgery
    • B42D25/36Identification or security features, e.g. for preventing forgery comprising special materials
    • B42D25/364Liquid crystals
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B42BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42DBOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30Identification or security features, e.g. for preventing forgery
    • B42D25/36Identification or security features, e.g. for preventing forgery comprising special materials
    • B42D25/378Special inks
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B42BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42DBOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30Identification or security features, e.g. for preventing forgery
    • B42D25/36Identification or security features, e.g. for preventing forgery comprising special materials
    • B42D25/378Special inks
    • B42D25/382Special inks absorbing or reflecting infrared light
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B42BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42DBOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30Identification or security features, e.g. for preventing forgery
    • B42D25/36Identification or security features, e.g. for preventing forgery comprising special materials
    • B42D25/378Special inks
    • B42D25/387Special inks absorbing or reflecting ultraviolet light
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B42BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42DBOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/40Manufacture
    • B42D25/405Marking
    • B42D25/43Marking by removal of material
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B42BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42DBOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/40Manufacture
    • B42D25/405Marking
    • B42D25/43Marking by removal of material
    • B42D25/435Marking by removal of material using electromagnetic radiation, e.g. laser
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B42BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42DBOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/40Manufacture
    • B42D25/405Marking
    • B42D25/43Marking by removal of material
    • B42D25/445Marking by removal of material using chemical means, e.g. etching
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B44DECORATIVE ARTS
    • B44FSPECIAL DESIGNS OR PICTURES
    • B44F1/00Designs or pictures characterised by special or unusual light effects
    • B44F1/08Designs or pictures characterised by special or unusual light effects characterised by colour effects
    • B44F1/10Changing, amusing, or secret pictures

Definitions

  • the invention relates to a multilayer body and a method for its production.
  • ODD optically variable elements
  • diffractive elements diffractive elements
  • partially metallized layers printed features
  • WO 2008/017362 A2 describes a method for producing a multilayer body and a multilayer body.
  • WO 2006/046216 A2 describes a safety device and a safety support that includes it.
  • WO 2009/080262 A1 describes a security element and a method for its production.
  • WO 2006/084686 A2 describes a multilayer body and a method for producing a multilayer body.
  • WO 2009/109343 A2 describes a method for producing a film element.
  • WO 2011/006634 A2 describes a method for producing a multilayer body and a multilayer body.
  • Register or register accuracy is to be understood as the positional arrangement of layers lying one above the other or next to one another relative to one another while observing a desired position tolerance.
  • the term "register” comes from the register marks or tax marks used, by means of which the position tolerance can be measured and checked.
  • Such a method for producing a multilayer body in the form of a security element is defined in claim 1.
  • a multilayer body obtainable in this way is used in the form of a security element, in particular for a security document, in particular a bank note, a security, an identification document, a visa document, a passport, a vignette, a certificate or a credit card.
  • the partial demetallization of the metal layer thus takes place in several steps and can therefore be carried out in different ways for the different areas of the multilayer body.
  • This increases the design options for the multilayer body.
  • the demetallization can be carried out in the register to a different layer than in the second area. This enables particularly complex and appealing designs.
  • the partial lacquer layer as a mask to structure the metal layer in the second area, it is possible to arrange the two layers exactly in register with one another. It is particularly important that the partial lacquer layer extends not only into those areas that are covered by the metal layer, but also into the areas that are not covered by the metal layer. The partial lacquer layer thus overlaps the metal layer partially, perpendicular to a surface spanned by the metal layer or the partial lacquer layer.
  • step b) it is also possible in step b) to partially demetallize the metal layer to form a first and second region of the multilayer body, and then in step c) to carry out a partial lacquer layer in the second region and, if appropriate, in the first region of the multilayer body to form a to apply second optical information in the second area and optionally a first optical information in the first area, the partial lacquer layer extending at least partially beyond the metal layer in the second area and optionally in the first area.
  • the final structuring of the metal layer is thus optionally carried out in both areas using the partial lacquer layer. In this way, layer structures made of metal and lacquer, which are arranged perfectly in register, result in a particularly appealing optical design.
  • the partial lacquer layer When the partial lacquer layer is used as a mask, it is to be understood here that when the metal layer is structured, it is either selectively retained in the areas covered by the partial lacquer layer or is selectively removed. The structuring therefore results in a defined positional relationship between the two layers, so that these are arranged in register with one another, for example, for a viewer to connect seamlessly to one another.
  • the partial demetallization of the metal layer is preferably carried out by etching. It is expedient if the partial lacquer layer is an etching resist or comprises an etching resist.
  • An etching resist is understood to mean a substance that is resistant to an etchant and that can protect a substance that is sensitive to the etchant from attack by the etchant where it covers it.
  • an etchant is applied to the resulting layer stack, which is the Removed metal layer where it is not covered by the partial paint layer.
  • the etching resist is preferably a lacquer, which in particular can comprise binders, dyes, pigments, in particular colored or achromatic pigments, effect pigments, thin film layer systems, cholesteric liquid crystals and / or metallic or non-metallic nanoparticles.
  • the partial lacquer layer not only fulfills a protective function when structuring the metal layer, but can also have a decorative effect. It is also possible for several different etching resists, for example resist lacquers with different colors, to be used in order to produce further visual effects.
  • resist lacquers can also be designed in such a way that they serve as a manipulation indicator when attempts are made to manipulate the security document. For example, attempts can be made to change or remove or make an entry, such as a validity date or a photo, or make it invisible, using organic solvents or oxidizing agents.
  • the resist lacquers can be designed, for example, to be soluble in alcohols, so that they dissolve when exposed to alcohol and the dye migrates, so that the printed image of the etching resist flows visibly and blurs.
  • resist lacquers can have other substances which, when exposed to certain chemicals, exhibit a visually recognizable color reaction, for example a color change. Such substances are known, for example, as "solvent reactive inks".
  • the etchant used to structure the metal layer depends on the composition of this layer or this layer system.
  • Sodium hydroxide, potassium hydroxide, sodium carbonate, tetramethylammonium hydroxide or sodium ethylenediaminetetraacetate are suitable, for example.
  • acidic etching media can also be used, such as sulfuric acid, hydrochloric acid, phosphoric acid or strong oxidizing agents, such as sodium persulfate, hydrogen peroxide, or a chronological sequence of different etching media or a combination of the aforementioned media.
  • etchants for example, etch resists based on PVC (polyvinylchloride), polyester resins, acrylates are suitable, with further film-forming substances such as nitrocellulose typically being admixed.
  • PVC polyvinylchloride
  • polyester resins for example, polyester resins, acrylates are suitable, with further film-forming substances such as nitrocellulose typically being admixed.
  • the etching can be supported by mechanical agitation, for example by brushing, moving the etching bath or ultrasound treatment.
  • Usual temperatures for the etching process are preferably between 15 ° C and 75 ° C.
  • the metal layer in the second region is partially demetallized before the partial lacquer layer is applied in step c).
  • the metal layer is then only partially present in the second area, so that the partial lacquer layer extends partly over the metal layer and partly in regions in which the metal layer is not present. This ensures that the above-mentioned effect can be achieved after structuring the metal layer using the partial lacquer layer.
  • the partial demetallization is preferably relatively roughly structured, while finer structures are only introduced in step d).
  • the partial demetallization of the metal layer in the second region is preferably carried out by etching.
  • the etching agents and process parameters already described in the first area on the basis of partial demetalizing can be used here.
  • an etchant in particular an alkali
  • the etchant therefore only comes into contact with the metal layer in the areas to be removed, so that no protective lacquers, resists, masks or the like are necessary.
  • a photoresist prefferably applied to the second region and to be exposed using an exposure mask before the etching.
  • a photoresist changes its chemical and / or physical properties when exposed in a certain wavelength range, so that the different properties of the exposed and unexposed areas can be used to selectively remove the photoresist in one of the areas. For example, when the photoresist is exposed, its solubility changes compared to a solvent that can be used after the exposure to develop the photoresist. In the case of positive photoresists, the exposed area is selectively removed in the development step following the exposure, and in the case of negative photoresists, the unexposed area.
  • Suitable positive photoresists are, for example, AZ 1518 or AZ 4562 from AZ Electronic Materials based on phenolic resin / diazoquinone.
  • Suitable negative photoresists are, for example, AZ nLOF 2000 or ma-N 1420 from micro resist technology GmbH, for example based on cinnamic acid derivatives. These can preferably be exposed by irradiation with light in a wavelength range from 250 nm to 440 nm. The dose required depends on the respective layer thicknesses, the wavelength of the exposure and the sensitivity of the photoresists.
  • Tetramethylammonium hydroxide for example, is suitable for developing these photoresists. Development is preferably carried out at temperatures from 15 ° C. to 65 ° C. for a preferred development time from 2 seconds to a few minutes. Here, too, the development process and the associated local removal of the photoresist can again be supported by mechanical agitation, such as brushing, wiping, flow with the development medium or ultrasound treatment.
  • the photoresist can also contain binders, dyes, pigments, in particular colored pigments, effect pigments, thin film systems, cholesteric liquid crystals and / or metallic or non-metallic nanoparticles, in order to achieve additional decorative effects.
  • the exposure mask is formed by a further partial lacquer layer applied to the substrate before the metal layer is applied.
  • This coating layer which serves as an exposure mask, can be used for visible light must be transparent, translucent or opaque, but must have components such as pigments or the like that block the exposure wavelength (e.g. in the ultraviolet spectral range) to such an extent that a masking function or a contrast difference can be achieved during exposure.
  • the further partial lacquer layer expediently comprises a protective lacquer.
  • Protective lacquer is to be understood here as a substance which absorbs in a wavelength range used for exposing the photoresist.
  • the partial layers are irradiated over the entire area with light of this wavelength range, preferably perpendicular to the layer plane.
  • Typical wavelengths used for the exposure are, for example, 250 nm to 420 nm.
  • the exposure is preferably carried out with a dose of 10 mJ / cm 2 to 500 mJ / cm 2 .
  • the exposure times result from the sensitivity of the materials used and the power of the available exposure source.
  • the further partial lacquer layer is present, less light of this wavelength reaches the photoresist, so that in a subsequent etching process the metal layer can be structured in register with the further partial lacquer layer.
  • an etching resist is partially applied to the second region before the etching and is removed again after the etching.
  • the etching then takes place as already described in the structuring of the first area.
  • a partial layer of a wash varnish is applied to the substrate before the metal layer is applied, and is removed using a solvent after the metal layer has been applied.
  • the wash varnish must therefore be soluble in the solvent.
  • wash varnishes are based, for example, on polyvinyl alcohol (PVA) or polyvinyl pyrrolidone (PVP) and can additionally contain fillers which facilitate later removal of the wash varnish.
  • PVA polyvinyl alcohol
  • PVP polyvinyl pyrrolidone
  • the wash varnish is removed in a solvent bath or by spraying with solvent, preferably at temperatures from 15 ° C. to 65 ° C.
  • the removal of the wash varnish can be supported mechanically, for example by brushing, moving the solvent bath, spraying or ultrasound treatment.
  • the metal layer In areas where the metal layer is applied to the wash varnish, the metal layer is removed together with the wash varnish. The metal layer therefore only remains in areas in which it does not overlap with the partial layer of wash lacquer. So there is a negative to the overlap areas.
  • the partial demetallization of the metal layer in the second region is also possible for the partial demetallization of the metal layer in the second region to be carried out by laser ablation.
  • this makes it possible to easily produce individualized multilayer bodies which differ in the shape of their partial metal layers. For example, personalization information can thus be introduced into the multilayer body.
  • Another possibility for partially demetallizing the metal layer in the second region is the application, in particular printing, of a partial oil layer before the application of the metal layer.
  • the metal does not adhere to the substrate when the metal layer is applied, for example by vapor deposition or sputtering, so that the desired structuring is achieved already during the production of the metal layer.
  • the partial demetallization of the metal layer in several steps as described above, it is also possible to carry out the partial demetallization of the metal layer in the first and second region in a common operation.
  • a comparatively large-area partial demetallization of the metal layer on the substrate is carried out in order to create the first and second regions as separate metallized regions.
  • the remaining metallized first and second areas are, for example, approximately 1 cm 2 to 5 cm 2 in size.
  • the partial lacquer layer can overlap completely or only partially with the metal layer of the first and / or second region.
  • the partial lacquer layer extends not only into those areas that are covered by the metal layer of the first and / or second area, but also into the areas that are not covered by the metal layer.
  • the partial lacquer layer thus overlaps the metal layer of the first and / or second region completely or only partially, perpendicular to an area spanned by the metal layer or the partial lacquer layer.
  • the first area and the second area can be structured largely independently of one another, but fewer process steps are required.
  • the substrate is or comprises a replication layer with a surface relief molded into a surface facing the metal layer.
  • the replication layer can consist of a thermoplastic, ie thermally curable or dryable replication lacquer or a radiation-curable, in particular UV-curable replication lacquer or a mixture of such lacquers.
  • the surface relief introduced into the replication layer preferably forms an optically variable element, in particular a hologram, Kinegram® or Trustseal®, a preferably linear or crossed sinusoidal diffraction grating, a linear or crossed one- or multi-stage rectangular grating, a zero-order diffraction structure, an asymmetrical sawtooth Relief structure, a blaze grating, a preferably isotropic or anisotropic, matt structure, or a light-diffractive and / or refractive and / or light-focusing micro- or nanostructure, a binary or continuous Fresnel lens, a binary or continuous Fresnel freeform surface, a microprism structure or a combination structure from it.
  • an optically variable element in particular a hologram, Kinegram® or Trustseal®, a preferably linear or crossed sinusoidal diffraction grating, a linear or crossed one- or multi-stage rectangular grating, a zero-order diffraction structure
  • Such structures or combinations thereof can be used to achieve a variety of optical effects which are also difficult to imitate and cannot be copied or can only be copied with difficulty using conventional optical copying methods, so that a particularly forgery-proof multilayer body results.
  • the surface relief comprises a partial area with a depth-to-width ratio of 0.15 to 1.5, preferably 0.2 to 0.5, which is complementary to the first optical information.
  • the depth-to-width ratio enables the transparency of a metal layer applied to the surface relief to be varied.
  • This differently transparent metal layer can therefore itself serve as an exposure mask in order to structure another layer.
  • the structuring thus takes place in the register for the differently transparent areas of the metal layer and thus for the different areas of the surface relief, so that there are seamless transitions between result in different areas of the surface relief and the further layer.
  • a photoresist is applied to the metal layer and exposed from the side of the substrate, and the metal layer is then partially demetallized by etching.
  • the photoresists and etchants correspond to the variants described above. In this way, the metal layer is structured even in register with the surface relief.
  • At least one further partial lacquer layer is preferably applied to the multilayer body in order to form at least one further piece of optical information. In this way, complex and appealing designs can be realized, which enable the production of a particularly forgery-proof multilayer body.
  • a layer thickness of the partial lacquer layer and / or the at least one further partial lacquer layer is expediently 0.2 ⁇ m to 10 ⁇ m, preferably 0.3 ⁇ m to 3 ⁇ m, more preferably 0.5 ⁇ m to 1.5 ⁇ m.
  • the at least one further partial lacquer layer comprises colorants, in particular colored or achromatic pigments and / or effect pigments, thin-film systems, cholesteric liquid crystals, dyes and / or metallic or non-metallic nanoparticles.
  • the colorants can be excited in the ultraviolet spectrum for fluorescence and / or phosphorescence, in particular in the visible spectrum. It is also expedient if the colorants in the infrared spectrum can be excited to emit in the visible spectrum by means of the anti-Stokes effect. Means can also be added that have a machine-verifiable emission spectrum that is only partially or not at all in the visible spectrum.
  • the partial lacquer layer and / or the at least one further partial lacquer layer is preferably applied by printing, in particular by gravure printing, flexographic printing, offset printing, letterpress printing, screen printing, pad printing, inkjet printing and / or laser printing.
  • partial lacquer layer and / or the at least one further partial lacquer layer is radiation-hardened, in particular by UV or electron radiation.
  • At least one individualization feature is preferably applied to the multilayer body, in particular by inkjet and / or laser printing.
  • the multilayer body can be assigned to a specific security document, which also increases the security against forgery.
  • the substrate comprises a wax layer and / or a release layer and / or a protective layer, in particular a protective lacquer layer.
  • Wax and release layers can serve for the detachable arrangement of the multilayer body on a carrier, from which the multilayer body is detached prior to its attachment, for example on a security document.
  • the layer structure can also be designed such that detachment from the carrier is prevented.
  • the multilayer body remains on the carrier, or the carrier is part of the multilayer body, which is transferred to the security document.
  • the wax layer and the release layer are omitted, since no release has to be ensured.
  • additional layers can be introduced which ensure increased interlayer adhesion between the support and the replication layer.
  • the wax layer can only be partially present, so that detachment can only take place locally, while no detachment takes place in other areas.
  • the application to a security document takes place together with the carrier.
  • Such structures are, for example used to indicate attempts at manipulation. If an attempt is made to remove the security element from the security document, the release layer and / or protective layer and / or replication layer remain on the security document in those areas with locally applied wax layer, while in those areas without wax layer the layer composite is detached from the substrate together with the carrier can. The security feature is visibly damaged by this manipulation attempt.
  • the multilayer body can be transferred to a substrate, which is processed into a security document only in a later step.
  • the multilayer body can be applied to a transparent, translucent or opaque plastic layer, in particular made of polycarbonate or polyester, polypropylene or polyethylene, such as Teslin®, which are only connected to other plastic layers to form a document body in further processing steps, for example by lamination and / or back injection.
  • Typical thicknesses of the plastic layers are between 25 ⁇ m and 150 ⁇ m, preferably between 50 ⁇ m and 100 ⁇ m.
  • the layers can be transparent or contain fillers. Furthermore, they can be designed such that they can be blackened by means of a laser beam.
  • the protective layer which can also have a multi-layer structure, preferably forms a visible side of the multi-layer body, so that it is protected against mechanical or chemical damage.
  • Acrylic or polyester with additional film-forming components such as nitrocellulose, for example, can be used as a protective lacquer Systems, chemically curing systems, for example based on isocyanate, are used.
  • a layer thickness of the replication layer and / or the protective lacquer layer is preferably 0.3 ⁇ m to 3 ⁇ m, preferably 0.5 ⁇ m to 1.5 ⁇ m.
  • a layer thickness of the wax layer and / or the release layer is preferably 0.01 ⁇ m to 0.3 ⁇ m, preferably 0.1 ⁇ m to 0.2 ⁇ m.
  • layers of silicone or an acrylic polymer / acrylic copolymer can also be used.
  • the release layer can also be part of the protective lacquer layer.
  • the substrate comprises a removable carrier layer, in particular made of PET, PEN or PP. This protects the multilayer body from being attached to its final place of use and can serve as mechanical stabilization during the manufacture of the multilayer body.
  • a layer thickness of the carrier layer is expediently 5 ⁇ m to 75 ⁇ m, preferably 10 ⁇ m to 50 ⁇ m, more preferably 12 ⁇ m to 25 ⁇ m.
  • the partial metal layer preferably consists of aluminum, copper, chromium, silver and / or gold and / or an alloy thereof.
  • the partial metal layer can also consist of different metals in some areas in order to produce special optical effects.
  • a layer thickness of the metal layer is expediently 10 nm to 200 nm, preferably 10 nm to 50 nm, further preferably 15 nm to 35 nm.
  • an in particular transparent protective lacquer layer in particular made of PVC, PET, acrylate, nitrocellulose, cellulose acetobutyrate, or mixtures thereof, is arranged in the first region on the partial metal layer.
  • the protective layer can also consist of a UV or electron beam curing lacquer.
  • Such a protective lacquer layer can protect the metal layer in the first area during the structuring of the second area, so that the structures introduced first in the first area are retained.
  • a layer thickness of the protective lacquer layer is expediently 0.2 ⁇ m to 10 ⁇ m, preferably 0.3 ⁇ m to 3 ⁇ m, further preferably 0.5 ⁇ m to 1.5 ⁇ m.
  • first and / or second and / or further optical information is in the form of at least one motif, pattern, in particular a guilloche pattern, symbol, image, logo or alphanumeric character, in particular numbers and / or letters.
  • the optical information can also complement such a motif, pattern, symbol, image, logo or alphanumeric characters, in particular numbers or letters.
  • a graphic element produced in this way which arises from the interaction of several layers, is particularly difficult to reproduce and is therefore particularly forgery-proof.
  • first and / or second and / or further optical information is in the form of a one- or two-dimensional line and / or dot screen
  • the line and / or dot screen preferably has a pitch of less than 300 ⁇ m, preferably less than 200 ⁇ m and more than 25 ⁇ m, preferably more than 50 ⁇ m.
  • Transformed line grids are also possible, for example with wavy lines, which can also have a variable line width.
  • the points of a grid of points can have any geometries and / or sizes and do not have to be circular disk-shaped.
  • dot grids made of triangular, rectangular, any polygonal, star-shaped or in the form of symbols are also possible.
  • the dot matrix can also be brewed from differently sized and / or differently shaped dots. Especially when such a raster interacts with a graphic element in the respective other layer or in the respective other layer system, further graphic effects, such as, for example, halftone images, can be generated.
  • Such grids have an effect on other graphic elements that are overlaid by the grid, but are no longer perceived as such even with the naked human eye.
  • the first and / or second and / or further optical information preferably comprises at least one machine-readable feature, in particular a barcode. This enables the multilayer body to be authenticated quickly and easily, which can also be done, for example, with a mobile device such as a cell phone, PDA or the like.
  • an adhesive layer in particular made of PVC, polyester, Acrylates, cellulose esters, natural resins, ketone resins, polyamide, polyurethane, epoxy resins, or mixtures thereof. This serves to connect the multilayer body to an object or document for the authentication of which the multilayer body is to be used. It is advantageous if a layer thickness of the adhesive layer is 0.5 ⁇ m to 25 ⁇ m, preferably 1 ⁇ m to 15 ⁇ m.
  • the adhesive layer can also be multi-layer, in particular made of different materials, the aforementioned layer thickness values relating to the total thickness of the adhesive layer (s).
  • a bond with the substrate to which the feature is to be applied can be achieved, for example, by printing a UV-curing adhesive on the substrate, pressing the multilayer body onto the adhesive, and curing the UV-curing adhesive by means of UV radiation , The PET carrier film can then be removed (cold foil or cold stamping).
  • reflection layers made of a highly refractive material can be applied at least in some areas.
  • HRI High Refractive Index
  • high-index materials are zinc sulfide or titanium dioxide, which are usually applied by vapor deposition or sputtering.
  • Such layers can be applied before the metal layers are applied or after their partial metallization or after printing processes. Are located If these layers are placed directly on optical diffraction structures, further optical effects can be achieved which further increase the security of the multilayer body.
  • This visual effect is characterized by a high level of security against counterfeiting and easy verifiability.
  • a carrier layer 11 with a transfer layer 12 is first provided.
  • the carrier layer 11 preferably consists of polyester, in particular PET, and has a layer thickness of 6 ⁇ m to 75 ⁇ m, preferably 12 ⁇ m to 25 ⁇ m.
  • the transfer layer 12 can have a wax layer, a release layer, a protective lacquer layer and a replication layer, which forms the surface of the transfer layer 12 facing away from the carrier layer 11.
  • a layer thickness of the replication layer and / or the protective lacquer layer is preferably 0.3 ⁇ m to 3 ⁇ m, preferably 0.5 ⁇ m to 1.5 ⁇ m.
  • a layer thickness of the wax layer and / or the release layer is preferably 0.01 ⁇ m to 0.3 ⁇ m, preferably 0.1 ⁇ m to 0.2 ⁇ m.
  • layers of silicone or a Acrylic polymer / acrylic copolymer can be used.
  • the release layer can also be part of the protective lacquer layer.
  • the replication layer consists, for example, of a thermoplastic or a radiation- or temperature-hardenable replication lacquer. Diffractive structures are then molded into the replication layer, for example by stamping with a metallic stamping tool.
  • the surface relief introduced into the replication layer preferably forms an optically variable element, in particular a hologram, Kinegram® or Trustseal®, a preferably linear or crossed sinusoidal diffraction grating, a linear or crossed single- or multi-stage rectangular grating, a zero-order diffraction structure, an asymmetrical relief structure, a blaze grating, preferably an isotropic or anisotropic, matt structure, or a light-diffractive and / or refractive and / or light-focusing micro- or nanostructure, a binary or continuous Fresnel lens, a binary or continuous Fresnel freeform surface, a microprism structure or a combination structure thereof ,
  • the surface relief forms first optical information in a first region 2 of the multilayer body, which is provided by structures with a depth-to-width ratio of 0.15 to 1.5, preferably 0.2 to 0 , 5, and a spatial frequency, preferably at least 1000 lines / mm to 5000 lines / mm is formed.
  • a metal layer 13 is produced on the replication layer of the transfer layer 12, which is not the case, for example, by vapor deposition shown substrate can take place.
  • the vapor deposition is preferably carried out in a vacuum by thermal evaporation, by means of electron beam evaporation or by means of sputtering.
  • the metal layer 13 can preferably consist of aluminum, copper, chromium, silver and / or gold and / or an alloy thereof.
  • the partial metal layer can also consist of different metals in some areas in order to produce special optical effects.
  • a layer thickness of the metal layer 13 is expediently 10 nm to 100 nm, preferably 15 nm to 35 nm, in particular when aluminum is used.
  • the metal layer 13 is then partially removed using known methods, for example by partially applying an etching resist after the vapor deposition and subsequent etching, including removing the etching resist; by partially applying a wash varnish before evaporation and washing (lift-off) after evaporation or by partially applying a photoresist after evaporation and then exposing and subsequently removing the exposed or unexposed components of the photoresist depending on the type (positive, negative) photoresist.
  • known methods for example by partially applying an etching resist after the vapor deposition and subsequent etching, including removing the etching resist; by partially applying a wash varnish before evaporation and washing (lift-off) after evaporation or by partially applying a photoresist after evaporation and then exposing and subsequently removing the exposed or unexposed components of the photoresist depending on the type (positive, negative) photoresist.
  • the transparency of the metal layer 13 applied to the surface relief can be varied by the depth-to-width ratio of the surface relief of the replication layer in the first region 2. This different transparency can therefore serve itself as an exposure mask in order to apply one to the metal layer 13 Structure photoresist. During the subsequent etching, the metal layer 13 therefore remains in the first region 2 in register with the first optical information 131 specified in the replication layer.
  • the substrate is not vapor-deposited over the entire surface, rather the metal layer 13 is partially generated in particular in the second region 3 of the multilayer body 1.
  • Various methods are known for this, such as, for example, shielding by means of an accompanying mask or pressure of an oil, which prevents the deposition of the metal layer in the vapor deposition process.
  • the structuring of the metal layer 13 is therefore preferably carried out separately for the first region 2 and the second region 3, with only a rough structuring preferably being carried out in the second region.
  • the structuring can, however, also take place in a common work step.
  • a transparent protective lacquer 14 is applied to the metal layer 13 in the first region 2 in the next process step. This protects the already finished structured metal layer 13 in the first region 2 in the following etching processes.
  • the layer thickness of the protective lacquer layer 14 is 0.2 ⁇ m to 10 ⁇ m, preferably 0.5 ⁇ m to 1.5 ⁇ m.
  • a partial lacquer layer 15 is printed in such a way that it extends beyond the metal layer 13 in this area, but also parts of the metal layer 13 can be uncovered.
  • the lacquer layer 15 forms second optical information 151, in the example shown Guilloche pattern from fine lines.
  • the pressure of the lacquer layer 15 can also overlap areas of area 2 (not shown here).
  • the lacquer layer 15 acts as an etching resist and preferably comprises a lacquer which in particular comprises binders, dyes, pigments, in particular colored or achromatic pigments, effect pigments, thin-film layer systems, cholesteric liquid crystals and / or metallic or non-metallic nanoparticles.
  • Suitable paints are formulated, for example, on the basis of PVC, polyester or acrylates.
  • the partial lacquer layer 15 thus not only fulfills a protective function when structuring the metal layer 13, but can itself have a decorative effect. It is also possible that several different lacquers, for example with different colors, are used in order to produce further visual effects.
  • a further partial lacquer layer 16 is then applied, which forms further optical information 161. This is in Fig. 4 shown.
  • the lacquer layer 16 overlaps both the first region 2 and the second region 3.
  • a lacquer is used for the lacquer layer 16, the dyes or pigments of which cannot be seen in the visual spectrum, but which are caused by UV radiation for fluorescence and / or luminescence are stimulable.
  • a suitable varnish is composed, for example, of acrylate with nitrocellulose as a film former and admixed UV-active pigment. Such pigments can be, for example, Lumilux® pigments from Honeywell.
  • the further optical information 161 can therefore only be seen under a UV light source and serves as an additional security feature. Furthermore, the emission of fluorescence can be different depending on the wavelength of the UV light source. For example, it can be red when excited at 365 nm and green when excited at a wavelength of 254 nm and thus serve as a further security feature.
  • the further optical information 161 can represent a machine-readable pattern such as a bar code.
  • a further partial lacquer layer 17 can now be applied.
  • a varnish is used again, the colorant of which can be seen by the human eye.
  • the further partial lacquer layer 17 forms further optical information 171, here a pattern of stars, which partially overlays the optical information 131, 151 and 161 and forms a background for this.
  • the lacquer layers 15, 16, 17 are preferably applied by gravure printing, flexographic printing, screen printing, pad printing, offset printing, letterpress printing, ink jet printing and / or laser printing.
  • the layer thickness of the lacquer layers 15, 16, 16 is 0.3 ⁇ m to 3 ⁇ m, preferably 0.5 ⁇ m to 1.5 ⁇ m.
  • UV radiation curing can take place, in particular by UV radiation at wavelengths from 200 nm to 415 nm.
  • primers can be applied to improve the layer adhesion.
  • lacquers based on PVC, polyester or acrylates are suitable for this purpose in layer thicknesses of 0.01 ⁇ m to 1 ⁇ m, preferably from 0.02 ⁇ m to 0.2 ⁇ m.
  • an adhesive layer 18 is applied to the printing layers, with which the finished multilayer body 1 can be attached, for example, to a security document.
  • PVC polyvinyl chloride
  • polyester acrylates, cellulose esters, natural resins, ketone resins, polyamide, polyurethane, epoxy resins, or mixtures thereof are suitable as adhesives.
  • the layer thickness of the adhesive layer is 1 ⁇ m to 25 ⁇ m, preferably 1 ⁇ m to 15 ⁇ m.
  • the background of the decor is from the star-shaped patterns of the lacquer layer 17 are formed.
  • the optical information 161 which is only visible under UV radiation, and is formed by the lacquer layer 16 lies above this.
  • the foreground of the decor is formed by the guilloche lines of the first optical information 131 and the second optical information.
  • the first and second optical information items can also form further features.
  • the first optical information 131 also comprises a revolving microtext with reversal of contrast on the basis of asymmetrical structures.
  • This contrast reversal can be implemented, for example, with blaze or so-called sawtooth structures.
  • the same blaze structure is used for the contour and the filling of the microtext, these being attached rotated by 180 ° relative to one another.
  • Typical parameter values for the blaze structures to be used are line numbers in the range from 500 lines / mm to 1500 lines / mm and structure depths in the range from 200 nm to 500 nm.
  • the contrast reversal can be achieved with such colored or coarser achromatic blaze structures.
  • further security features are arranged, which are formed by the metal layer 13 in cooperation with the replication layer.
  • These can be, for example, micro- or nanostructures, DACs (diffractive area code), diffractive fine line effects (e.g. Transformations, transformations, pump effects, etc.) based on colored or achromatic microstructures, binary or continuous Fresnel freeform surfaces, image flip effects, or others that are either visible to the naked eye or with simple additional aids (e.g. magnifying glass) act recognizable, or recognizable with special aids (e.g. microscope), or purely machine-readable security structures.
  • DACs diffractive area code
  • diffractive fine line effects e.g. Transformations, transformations, pump effects, etc.
  • image flip effects e.g. Transformations, transformations, pump effects, etc.
  • image flip effects e.g. Transformations, transformations, pump effects, etc.
  • diffractive fine line effects for example transformations, transformations, pump effects or the like
  • colored or achromatic microstructures binary or continuous Fresnel freeform surfaces
  • image flip effects or Other security structures, micro or nanotext information, dynamic color effects or the like, which can either be seen with the naked eye or can be recognized with simple additional aids (for example a magnifying glass) or can be recognized with special aids (for example a microscope), or can be read by machine only, or can be provided.
  • micro- or nanotext information with quasi-continuous size variation can be provided, in the range from 3 ⁇ m to 2 mm, preferably in the range from 10 ⁇ m to 500 ⁇ m, further preferably in the range from 20 ⁇ m to 150 ⁇ m.
  • the multilayer body 1 can now be applied to a security document 4, for example an identification document, as in FIG Fig. 7 shown. This can be done, for example, by hot stamping or by lamination, lamination, back injection, UV transfer (cold stamping). Laminating the multilayer body 1 into the security document 4 is also possible.
  • the carrier can be peeled off after application or can remain on the substrate.
  • the security element 4 can further layers or layers applied are protected, for example by a protective film laminated over them.
  • the security feature 4 can be transferred to a further transfer layer in a first step and transferred to the substrate to be secured together with the transfer layer in a next step.
  • a security document 4 is applied in such a way that the multilayer body 1 overlaps an identification photo 41 so that it cannot be removed without the security document 4 and / or the multilayer body 1 being destroyed.
  • the multilayer body 1 can itself be partially overprinted with additional security features 42, 43. This can be done for example in inkjet printing, offset printing, letterpress printing or steel engraving.
  • the security features 42, 43 can also contain individualized information and ensure that the multilayer body 1 cannot be removed from the security document 4.
  • the necessary personalization information for the security document 4 can also be printed in the area 44 of the security document.
  • One possible method is to print the personalization information using inkjet printing. If printing is also to take place over the security feature, water-based inks in particular require a special receptive layer or an ink acceptance layer so that the print can dry in a sufficiently short time.
  • Such layers consist for example of a swellable layer, a microporous layer or a combination of both.
  • Swellable layers typically consist of polyvinyl alcohol, polyvinyl pyrrolidone, gelatin derivatives, or cellulose esters or from mixtures thereof. Layer thicknesses are typically in the range of 3 ⁇ m to 10 ⁇ m.
  • Porous layers consist, for example, of polyvinyl alcohols with large amounts of fillers. Such layers have typical layer thicknesses from 5 ⁇ m to 25 ⁇ m, preferably from 5 ⁇ m to 15 ⁇ m.
  • Such layers are advantageously part of the multilayer body 1, so that they form the uppermost layer after being applied to the security document 4.
  • such layers can also be applied to the security document 4 after application, for example by means of gravure printing, pad printing, screen printing or flexographic printing.
  • such layers can be applied as a dry transfer layer by means of a separate transfer process, for example by means of hot stamping or UV transfer (cold stamping).
  • Another area 45 is available for the attachment of machine-readable data.
  • biometric data of the holder of the security document 4 can be stored here.
  • Machine-detectable information can be printed in area 44, for example in the form of a 1D or 2D barcode.
  • Information that clearly identifies the document such as, for example, the document number and / or parts of the personal data, is particularly advantageously encrypted using cryptographic methods and printed on the document as machine-detectable information. Using suitable algorithms, the correctness of the data can then be checked and the authenticity of the entries can be verified.
  • the document number is also in the area of the multilayer body 1, i.e. is introduced overlapping with the multilayer body 1. It is particularly advantageous to introduce it using a technique that leads to an irreversible change in the multilayer body 1, for example using a laser.
  • partial areas of the metal layers in the first and / or second area can be processed by means of laser radiation, in particular after application of the multilayer body 1 to the security document 4, and the metal can thus be removed.
  • This is particularly suitable for introducing an individual identifier, such as a number. If this processing is carried out in the second section, the color printing can be seen in the areas freed from the metal, which contributes to a further increase in security.
  • by adapting the laser parameters only the metal layer can be removed locally or at the same time the color layer, so that partial areas can be colored or not colored within a number, which can be used to further increase security. Such processing can take place in the multilayer body 1 before it is applied to a substrate or only afterwards.

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Description

Die Erfindung betrifft einen Mehrschichtkörper sowie ein Verfahren zu dessen Herstellung.The invention relates to a multilayer body and a method for its production.

Mehrschichtkörper als Sicherheitselement sind dem Stand der Technik als bekannt zu entnehmen und werden weithin zum Fälschungsschutz von Banknoten, Wertpapieren, Ausweisdokumenten oder auch zur Authentifizierung von Produkten verwendet. Sie beruhen auf einer Kombination von mehreren funktionalen Schichten, die beispielsweise optisch variable Elemente (OVD = Optical Variable Devices), diffraktive Elemente, partiell metallisierte Schichten oder gedruckte Merkmale aufweisen können.Multilayer bodies as security elements are known from the prior art and are widely used for counterfeiting protection of banknotes, securities, identification documents or also for the authentication of products. They are based on a combination of several functional layers, which can have, for example, optically variable elements (OVD = Optical Variable Devices), diffractive elements, partially metallized layers or printed features.

Es ist dabei bekannt, solche Mehrschichtkörper durch die sequentielle Applikation einzelner Schichten unter Aufbau der gewünschten Schichtabfolge zu erzeugen. Um besonders fälschungssichere Mehrschichtkörper zu erhalten, ist es dabei wünschenswert, Merkmale der einzelnen Schichten nahtlos ineinander übergehen zu lassen. Mit anderen Worten sollen die Schichten möglichst genau im Register zueinander angeordnet werden.It is known to produce such multilayer bodies by the sequential application of individual layers while building up the desired layer sequence. In order to obtain multilayer bodies which are particularly secure against forgery, it is desirable to include features of the to allow individual layers to merge seamlessly. In other words, the layers should be arranged in register with one another as precisely as possible.

WO 2008/017362 A2 beschreibt ein Verfahren zur Herstellung eines Mehrschichtkörpers sowie einen Mehrschichtkörper. WO 2008/017362 A2 describes a method for producing a multilayer body and a multilayer body.

WO 2006/046216 A2 beschreibt eine Sicherheitsvorrichtung und eine Sicherheitsunterstützung, die diese beinhaltet. WO 2006/046216 A2 describes a safety device and a safety support that includes it.

WO 2009/080262 A1 beschreibt ein Sicherheitselement und ein Verfahren zu seiner Herstellung. WO 2009/080262 A1 describes a security element and a method for its production.

WO 2006/084686 A2 beschreibt einen Mehrschichtkörper sowie ein Verfahren zur Herstellung eines Mehrschichtkörpers. WO 2006/084686 A2 describes a multilayer body and a method for producing a multilayer body.

WO 2009/109343 A2 beschreibt ein Verfahren zur Herstellung eines Folienelements. WO 2009/109343 A2 describes a method for producing a film element.

WO 2011/006634 A2 beschreibt ein Verfahren zur Herstellung eines Mehrschichtkörpers sowie einen Mehrschichtkörper. WO 2011/006634 A2 describes a method for producing a multilayer body and a multilayer body.

Unter Register oder Registergenauigkeit ist die lagegenaue Anordnung von übereinander oder nebeneinander liegenden Schichten relativ zueinander unter Einhaltung einer gewünschten Lagetoleranz zu verstehen. Der Begriff "Register" stammt von den dabei zum Einsatz kommenden Registermarken oder auch Steuermarken, anhand derer die Lagetoleranz gemessen und kontrolliert werden kann.Register or register accuracy is to be understood as the positional arrangement of layers lying one above the other or next to one another relative to one another while observing a desired position tolerance. The term "register" comes from the register marks or tax marks used, by means of which the position tolerance can be measured and checked.

Bei einem sequentiellen Aufbau des Mehrschichtkörpers ist dies jedoch nicht immer zu bewerkstelligen, da die zur Erzeugung jeder individuellen Schicht verwendeten Verfahren bezüglich der relativen Lage der Schichten zueinander toleranzbehaftet sind. Dadurch können die gewünschten nahtlosen Übergänge zwischen den Merkmalen nicht zuverlässig erreicht werden, was die Fälschungssicherheit sowie das optische Erscheinungsbild eines solchen Mehrschichtkörpers beeinträchtigt.With a sequential construction of the multilayer body, however, this cannot always be accomplished, since the methods used to produce each individual layer are subject to tolerances with regard to the relative position of the layers to one another. As a result, the desired seamless transitions between the features cannot be reliably achieved, which impairs the security against forgery and the visual appearance of such a multilayer body.

Dies gilt insbesondere dann, wenn in verschiedenen Bereichen des Mehrschichtkörpers verschiedene Schichten jeweils im Register zueinander angeordnet werden sollen.This applies in particular if different layers are to be arranged in register with one another in different areas of the multilayer body.

Es ist somit Aufgabe der vorliegenden Erfindung, ein Verfahren zum Herstellen eines Mehrschichtkörpers anzugeben, welches die Herstellung eines Mehrschichtkörpers mit verbesserter Fälschungssicherheit ermöglicht. Es ist ferner Aufgabe der vorliegenden Erfindung, einen besonders fälschungssicheren Mehrschichtkörper anzugeben.It is therefore an object of the present invention to provide a method for producing a multilayer body which enables the production of a multilayer body with improved security against forgery. It is also an object of the present invention to provide a particularly forgery-proof multilayer body.

Erfindungsgemäß wird diese Aufgabe mit dem Gegenstand der Ansprüche 1 und 9 gelöst.According to the invention, this object is achieved with the subject matter of claims 1 and 9.

Ein solches Verfahren zum Herstellen eines Mehrschichtkörpers in Form eines Sicherheitselements ist in Anspruch 1 definiert.Such a method for producing a multilayer body in the form of a security element is defined in claim 1.

Man erhält so einen in Anspruch 9 definierten Mehrschichtkörper, wobei die partielle Lackschicht im zweiten Bereich im perfekten Register, d.h. ohne die o.g. bisherigen Toleranzen, zur partiellen Metallschicht angeordnet ist und wobei sich die partielle Lackschicht sowohl in Bereiche erstreckt, die von der Metallschicht bedeckt sind als auch in nicht von der Metallschicht bedeckte Bereiche.This gives a multilayer body as defined in claim 9, the partial lacquer layer in the second region being arranged in the perfect register, ie without the above-mentioned tolerances, with the partial metal layer, and the partial lacquer layer both extending into regions which are covered by the metal layer as well as in areas not covered by the metal layer.

Ein derart erhältlicher Mehrschichtkörper findet in Form eines Sicherheitselements Anwendung, insbesondere für ein Sicherheitsdokument, insbesondere eine Banknote, ein Wertpapier, ein Ausweisdokument, ein Visumsdokument, einen Reisepass, eine Vignette, ein Zertifikat oder eine Kreditkarte.A multilayer body obtainable in this way is used in the form of a security element, in particular for a security document, in particular a bank note, a security, an identification document, a visa document, a passport, a vignette, a certificate or a credit card.

Die partielle Demetallisierung der Metallschicht erfolgt also in mehreren Schritten und kann damit für die unterschiedlichen Bereiche des Mehrschichtkörpers auf verschiedene Art durchgeführt werden. Dies erhöht die Gestaltungsmöglichkeiten für den Mehrschichtkörper. So kann beispielsweise im ersten Bereich die Demetallisierung im Register zu einer anderen Schicht durchgeführt werden als im zweiten Bereich. Damit werden besonders komplexe und ansprechende Designs möglich.The partial demetallization of the metal layer thus takes place in several steps and can therefore be carried out in different ways for the different areas of the multilayer body. This increases the design options for the multilayer body. In the first area, for example, the demetallization can be carried out in the register to a different layer than in the second area. This enables particularly complex and appealing designs.

Indem die partielle Lackschicht als Maske verwendet wird, um die Metallschicht im zweiten Bereich zu strukturieren, wird es ermöglicht, die beiden Schichten exakt im Register zueinander anzuordnen. Dabei ist es insbesondere von Bedeutung, dass sich die partielle Lackschicht nicht nur in diejenigen Bereiche erstreckt, die von der Metallschicht bedeckt sind, sondern auch in die von der Metallschicht nicht bedeckten Bereiche. Die partielle Lackschicht überlappt also die Metallschicht teilweise, senkrecht zu einer von der Metallschicht bzw. der partiellen Lackschicht aufgespannten Fläche.By using the partial lacquer layer as a mask to structure the metal layer in the second area, it is possible to arrange the two layers exactly in register with one another. It is particularly important that the partial lacquer layer extends not only into those areas that are covered by the metal layer, but also into the areas that are not covered by the metal layer. The partial lacquer layer thus overlaps the metal layer partially, perpendicular to a surface spanned by the metal layer or the partial lacquer layer.

Es ist dabei alternativ auch möglich, in Schritt b) ein partielles Demetallisieren der Metallschicht zur Ausbildung eines ersten und zweiten Bereichs des Mehrschichtkörpers durchzuführen und anschließend in Schritt c) eine partielle Lackschicht im zweiten Bereich und gegebenenfalls im ersten Bereich des Mehrschichtkörpers zur Ausbildung einer zweiten optischen Information im zweiten Bereich und gegebenenfalls einer ersten optischen Information im ersten Bereich aufzubringen, wobei sich die partielle Lackschicht zumindest teilweise über die Metallschicht im zweiten Bereich und gegebenenfalls im ersten Bereich hinaus erstreckt. Die endgültige Strukturierung der Metallschicht erfolgt dabei also gegebenenfalls in beiden Bereichen anhand der partiellen Lackschicht. Hierdurch erhält man in beiden Bereichen perfekt registergenau angeordnete Schichtstrukturen aus Metall und Lack, die ein besonders ansprechendes optisches Design ergeben.Alternatively, it is also possible in step b) to partially demetallize the metal layer to form a first and second region of the multilayer body, and then in step c) to carry out a partial lacquer layer in the second region and, if appropriate, in the first region of the multilayer body to form a to apply second optical information in the second area and optionally a first optical information in the first area, the partial lacquer layer extending at least partially beyond the metal layer in the second area and optionally in the first area. The final structuring of the metal layer is thus optionally carried out in both areas using the partial lacquer layer. In this way, layer structures made of metal and lacquer, which are arranged perfectly in register, result in a particularly appealing optical design.

Unter einer Verwendung der partiellen Lackschicht als Maske ist hierbei zu verstehen, dass beim Strukturieren der Metallschicht diese in denjenigen Bereichen, die von der partiellen Lackschicht bedeckt sind, entweder selektiv erhalten bleibt oder selektiv entfernt wird. Es ergibt sich daher bei der Strukturierung eine definierte Lagebeziehung zwischen den beiden Schichten, so dass diese registergenau zueinander angeordnet sind, beispielsweise für einen Betrachter nahtlos aneinander anschließen.When the partial lacquer layer is used as a mask, it is to be understood here that when the metal layer is structured, it is either selectively retained in the areas covered by the partial lacquer layer or is selectively removed. The structuring therefore results in a defined positional relationship between the two layers, so that these are arranged in register with one another, for example, for a viewer to connect seamlessly to one another.

Das partielle Demetallisieren der Metallschicht erfolgt bevorzugt durch Ätzen. Dabei ist es zweckmäßig, wenn die partielle Lackschicht ein Ätzresist ist, bzw. einen Ätzresist umfasst.The partial demetallization of the metal layer is preferably carried out by etching. It is expedient if the partial lacquer layer is an etching resist or comprises an etching resist.

Unter einem Ätzresist soll dabei eine Substanz verstanden werden, die gegenüber einem Ätzmittel beständig ist und die eine gegenüber dem Ätzmittel empfindliche Substanz vor einem Angriff durch das Ätzmittel dort schützen kann, wo sie diese bedeckt.An etching resist is understood to mean a substance that is resistant to an etchant and that can protect a substance that is sensitive to the etchant from attack by the etchant where it covers it.

Bei dieser Ausführungsform wird nach Erzeugen der beiden Schichten also ein Ätzmittel auf den resultierenden Schichtstapel angewendet, das die Metallschicht dort entfernt, wo sie nicht von der partiellen Lackschicht bedeckt ist.In this embodiment, after the two layers have been produced, an etchant is applied to the resulting layer stack, which is the Removed metal layer where it is not covered by the partial paint layer.

Der Ätzresist ist dabei vorzugsweise ein Lack, der insbesondere Bindemittel, Farbstoffe, Pigmente, insbesondere bunte oder unbunte Pigmente, Effektpigmente, Dünnfilmschichtsysteme, cholesterische Flüssigkristalle und/oder metallische oder nichtmetallische Nanopartikel umfassen kann. Damit erfüllt die partielle Lackschicht nicht nur eine Schutzfunktion beim Strukturieren der Metallschicht, sondern kann selbst eine dekorative Wirkung entfalten. Es ist auch möglich, dass mehrere verschiedene Ätzresists, beispielsweise Resistlacke mit unterschiedlicher Farbgebung, verwendet werden, um weitere visuelle Effekte zu erzeugen.The etching resist is preferably a lacquer, which in particular can comprise binders, dyes, pigments, in particular colored or achromatic pigments, effect pigments, thin film layer systems, cholesteric liquid crystals and / or metallic or non-metallic nanoparticles. The partial lacquer layer not only fulfills a protective function when structuring the metal layer, but can also have a decorative effect. It is also possible for several different etching resists, for example resist lacquers with different colors, to be used in order to produce further visual effects.

Diese Resistlacke können auch derart ausgestaltet sein, dass sie bei Manipulationsversuchen am Sicherheitsdokument als Manipulationsindikator dienen. So kann beispielsweise versucht werden, mit organischen Lösemitteln oder Oxidationsmitteln eine Eintragung, wie beispielsweise ein Gültigkeitsdatum oder ein Foto, zu verändern oder zu entfernen oder unsichtbar zu machen. Gegen derartige Manipulationsversuche können die Resistlacke beispielsweise löslich in Alkoholen ausgestaltet sein, so dass sie sich bei Alkoholeinwirkung auflösen und der Farbstoff migriert, so dass das Druckbild des Ätzresists visuell erkennbar verfließt bzw. verschwimmt. Weiterhin können solche Resistlacke weitere Substanzen aufweisen, die bei Einwirkung von bestimmten Chemikalien eine visuell erkennbare Farbreaktion, z.B. eine Farbveränderung zeigen. Solche Substanzen sind beispielsweise als "solvent reactive inks" bekannt.
Das zum Strukturieren der Metallschicht verwendete Ätzmittel hängt dabei von der Zusammensetzung dieser Schicht bzw. dieses Schichtsystems ab.
These resist lacquers can also be designed in such a way that they serve as a manipulation indicator when attempts are made to manipulate the security document. For example, attempts can be made to change or remove or make an entry, such as a validity date or a photo, or make it invisible, using organic solvents or oxidizing agents. Against such manipulation attempts, the resist lacquers can be designed, for example, to be soluble in alcohols, so that they dissolve when exposed to alcohol and the dye migrates, so that the printed image of the etching resist flows visibly and blurs. Furthermore, such resist lacquers can have other substances which, when exposed to certain chemicals, exhibit a visually recognizable color reaction, for example a color change. Such substances are known, for example, as "solvent reactive inks".
The etchant used to structure the metal layer depends on the composition of this layer or this layer system.

Es eignet sich beispielsweise Natriumhydroxid, Kaliumhydroxid, Natriumcarbonat, Tetramethylammoniumhydroxid oder Natrium-Ethylendiamintetraacetat.Sodium hydroxide, potassium hydroxide, sodium carbonate, tetramethylammonium hydroxide or sodium ethylenediaminetetraacetate are suitable, for example.

Je nach Material der Metallschicht oder Legierung können jedoch auch saure Ätzmedien zum Einsatz kommen, wie beispielsweise Schwefelsäure, Salzsäure, Phosphorsäure oder auch starke Oxidationsmittel, wie beispielsweise Natriumpersulfat, Wasserstoffperoxid, oder auch eine zeitliche Abfolge verschiedener Ätzmedien oder auch eine Kombination der vorgenannten Medien.Depending on the material of the metal layer or alloy, acidic etching media can also be used, such as sulfuric acid, hydrochloric acid, phosphoric acid or strong oxidizing agents, such as sodium persulfate, hydrogen peroxide, or a chronological sequence of different etching media or a combination of the aforementioned media.

Für solche Ätzmittel eignen sich beispielsweise Ätzresiste auf der Basis von PVC (Polyvinylchlorid), Polyesterharzen, Acrylaten, wobei typischerweise weitere filmbildende Substanzen wie Nitrozellulose beigemischt sein können.For such etchants, for example, etch resists based on PVC (polyvinylchloride), polyester resins, acrylates are suitable, with further film-forming substances such as nitrocellulose typically being admixed.

Das Ätzen kann dabei durch mechanische Agitation, beispielsweise durch Bürsten, Bewegen des Ätzbades oder Ultraschallbehandlung unterstützt werden. Übliche Temperaturen für den Ätzvorgang liegen bevorzugt zwischen 15°C und 75°C.The etching can be supported by mechanical agitation, for example by brushing, moving the etching bath or ultrasound treatment. Usual temperatures for the etching process are preferably between 15 ° C and 75 ° C.

Es ist weiter zweckmäßig, wenn vor dem Aufbringen der partiellen Lackschicht in Schritt c) die Metallschicht im zweiten Bereich partiell demetallisiert wird. Die Metallschicht ist dann also im zweiten Bereich nur teilweise vorhanden, so dass die partielle Lackschicht sich teilweise über der Metallschicht und teilweise in Regionen, in denen die Metallschicht nicht vorhanden ist, erstreckt. Damit wird sichergestellt, dass der oben genannte Effekt nach dem Strukturieren der Metallschicht anhand der partiellen Lackschicht erzielt werden kann. Das partielle Demetallisieren erfolgt dabei bevorzugt relativ grob strukturiert, während feinere Strukturen erst in Schritt d) eingebracht werden.It is furthermore expedient if the metal layer in the second region is partially demetallized before the partial lacquer layer is applied in step c). The metal layer is then only partially present in the second area, so that the partial lacquer layer extends partly over the metal layer and partly in regions in which the metal layer is not present. This ensures that the above-mentioned effect can be achieved after structuring the metal layer using the partial lacquer layer. The partial demetallization is preferably relatively roughly structured, while finer structures are only introduced in step d).

Bevorzugt erfolgt das partielle Demetallisieren der Metallschicht im zweiten Bereich durch Ätzen. Hierbei können die bereits anhand des partiellen Demetallisierens im ersten Bereich beschriebenen Ätzmittel und Verfahrensparameter Anwendung finden.The partial demetallization of the metal layer in the second region is preferably carried out by etching. The etching agents and process parameters already described in the first area on the basis of partial demetalizing can be used here.

Dabei ist es möglich, dass im zweiten Bereich ein Ätzmittel, insbesondere eine Lauge, auf die Metallschicht gedruckt wird, insbesondere durch Flexodruck oder Tiefdruck oder Siebdruck. Das Ätzmittel kommt also nur in den zu entfernenden Bereichen mit der Metallschicht in Kontakt, so dass keine Schutzlacke, Resists, Masken oder dergleichen notwendig sind.It is possible for an etchant, in particular an alkali, to be printed on the metal layer in the second region, in particular by flexographic printing or gravure printing or screen printing. The etchant therefore only comes into contact with the metal layer in the areas to be removed, so that no protective lacquers, resists, masks or the like are necessary.

Es ist ferner möglich, dass vor dem Ätzen ein Photoresist auf den zweiten Bereich aufgebracht und unter Verwendung einer Belichtungsmaske belichtet wird.It is also possible for a photoresist to be applied to the second region and to be exposed using an exposure mask before the etching.

Ein Photoresist ändert bei Belichtung in einem bestimmten Wellenlängenbereich seine chemischen und/oder physikalischen Eigenschaften, so dass die unterschiedlichen Eigenschaften der belichteten und unbelichteten Bereiche ausgenutzt werden können, um in einem der Bereiche den Photoresist selektiv zu entfernen. Beispielsweise verändert sich beim Belichten des Fotolacks dessen Löslichkeit gegenüber einem Lösemittel, welches nach der Belichtung zum Entwickeln des Photoresists verwendet werden kann. Bei positiven Photoresists wird bei dem an die Belichtung anschließenden Entwicklungsschritt selektiv der belichtete Bereich entfernt, bei negativen Photoresists der unbelichtete Bereich.A photoresist changes its chemical and / or physical properties when exposed in a certain wavelength range, so that the different properties of the exposed and unexposed areas can be used to selectively remove the photoresist in one of the areas. For example, when the photoresist is exposed, its solubility changes compared to a solvent that can be used after the exposure to develop the photoresist. In the case of positive photoresists, the exposed area is selectively removed in the development step following the exposure, and in the case of negative photoresists, the unexposed area.

Geeignete positive Photoresists sind beispielsweise AZ 1518 oder AZ 4562 von AZ Electronic Materials auf Basis von Phenolharz/Diazochinon. Geeignete negative Fotolacke sind beispielsweise AZ nLOF 2000 oder ma-N 1420 von micro resist technology GmbH beispielsweise auf Basis von Zimtsäurederivaten. Diese können vorzugsweise durch Bestrahlung mit Licht in einem Wellenlängenbereich von 250nm bis 440nm belichtet werden. Die benötigte Dosis richtet sich nach den jeweiligen Schichtdicken, der Wellenlänge der Belichtung und der Empfindlichkeit der Photoresists.Suitable positive photoresists are, for example, AZ 1518 or AZ 4562 from AZ Electronic Materials based on phenolic resin / diazoquinone. Suitable negative photoresists are, for example, AZ nLOF 2000 or ma-N 1420 from micro resist technology GmbH, for example based on cinnamic acid derivatives. These can preferably be exposed by irradiation with light in a wavelength range from 250 nm to 440 nm. The dose required depends on the respective layer thicknesses, the wavelength of the exposure and the sensitivity of the photoresists.

Zur Entwicklung dieser Photoresists eignet sich beispielsweise Tetramethylammoniumhydroxid. Die Entwicklung erfolgt bevorzugt bei Temperaturen von 15°C bis 65°C für eine bevorzugte Entwicklungszeit von 2 Sekunden bis zu wenigen Minuten. Auch hier kann der Entwicklungsvorgang und die damit einhergehende lokale Entfernung des Photoresists wieder durch mechanische Agitation, wie beispielsweise Bürsten, Wischen, Anströmen mit dem Entwicklungsmedium oder Ultraschallbehandlung unterstützt werden.Tetramethylammonium hydroxide, for example, is suitable for developing these photoresists. Development is preferably carried out at temperatures from 15 ° C. to 65 ° C. for a preferred development time from 2 seconds to a few minutes. Here, too, the development process and the associated local removal of the photoresist can again be supported by mechanical agitation, such as brushing, wiping, flow with the development medium or ultrasound treatment.

Auch der Photoresist kann insbesondere Bindemittel, Farbstoffe, Pigmente, insbesondere farbige Pigmente, Effektpigmente, Dünnfilmschichtsysteme, cholesterische Flüssigkristalle und/oder metallische oder nichtmetallische Nanopartikel enthalten, um zusätzliche dekorative Effekte zu erfüllen.The photoresist can also contain binders, dyes, pigments, in particular colored pigments, effect pigments, thin film systems, cholesteric liquid crystals and / or metallic or non-metallic nanoparticles, in order to achieve additional decorative effects.

Es ist dabei zweckmäßig, wenn die Belichtungsmaske durch eine vor dem Aufbringen der Metallschicht auf das Substrat aufgebrachte weitere partielle Lackschicht gebildet wird. Die Belichtung erfolgt dann also von der Substratseite her. Diese als Belichtungsmaske dienende Lackschicht kann für sichtbares Licht transparent, transluzent oder opak sein, muss jedoch Bestandteile wie Pigmente oder ähnliches aufweisen, die die Belichtungswellenlänge (z.B. im ultravioletten Spektralbereich) so stark blockieren, dass eine Maskierungsfunktion bzw. ein Kontrastunterschied bei der Belichtung erreicht werden kann.It is expedient if the exposure mask is formed by a further partial lacquer layer applied to the substrate before the metal layer is applied. The exposure then takes place from the substrate side. This coating layer, which serves as an exposure mask, can be used for visible light must be transparent, translucent or opaque, but must have components such as pigments or the like that block the exposure wavelength (e.g. in the ultraviolet spectral range) to such an extent that a masking function or a contrast difference can be achieved during exposure.

Zweckmäßigerweise umfasst die weitere partielle Lackschicht dabei einen Schutzlack. Unter Schutzlack soll dabei eine Substanz verstanden werden, welche in einem zum Belichten des Photoresists verwendeten Wellenlängenbereich absorbiert. Bei der Belichtung werden die partiellen Schichten vollflächig mit Licht dieses Wellenlängenbereichs bestrahlt, vorzugsweise senkrecht zur Schichtebene. Übliche für die Belichtung verwendete Wellenlängen sind beispielsweise 250 nm bis 420 nm. Vorzugsweise erfolgt die Belichtung mit einer Dosis von 10 mJ/cm2 bis 500 mJ/cm2. Die Belichtungszeiten ergeben sich aus den Empfindlichkeiten der verwendeten Materialien und der Leistung der zur Verfügung stehenden Belichtungsquelle.The further partial lacquer layer expediently comprises a protective lacquer. Protective lacquer is to be understood here as a substance which absorbs in a wavelength range used for exposing the photoresist. During the exposure, the partial layers are irradiated over the entire area with light of this wavelength range, preferably perpendicular to the layer plane. Typical wavelengths used for the exposure are, for example, 250 nm to 420 nm. The exposure is preferably carried out with a dose of 10 mJ / cm 2 to 500 mJ / cm 2 . The exposure times result from the sensitivity of the materials used and the power of the available exposure source.

Wo die weitere partielle Lackschicht vorliegt, erreicht also weniger Licht dieser Wellenlänge den Photoresist, so dass in einem anschließenden Ätzvorgang die Metallschicht im Register zu der weiteren partiellen Lackschicht strukturiert werden kann.Where the further partial lacquer layer is present, less light of this wavelength reaches the photoresist, so that in a subsequent etching process the metal layer can be structured in register with the further partial lacquer layer.

Es ist alternativ natürlich auch möglich, eine externe, separate Belichtungsmaske zu verwenden, die auf den Photoresist aufgelegt wird.Alternatively, it is of course also possible to use an external, separate exposure mask which is placed on the photoresist.

Es ist ferner bevorzugt, dass vor dem Ätzen ein Ätzresist partiell auf den zweiten Bereich aufgebracht wird und nach dem Ätzen wieder entfernt wird.It is further preferred that an etching resist is partially applied to the second region before the etching and is removed again after the etching.

Das Ätzen erfolgt dann wie bereits bei der Strukturierung des ersten Bereichs beschrieben.The etching then takes place as already described in the structuring of the first area.

Alternativ ist es auch möglich, dass das partielle Demetallisieren der Metallschicht im zweiten Bereich durch Lift-Off erfolgt.Alternatively, it is also possible for the partial demetallization of the metal layer in the second area to take place by means of lift-off.

Bei Lift-Off-Verfahren wird eine partielle Schicht aus einem Waschlack vor dem Aufbringen der Metallschicht auf das Substrat aufgetragen und nach dem Aufbringen der Metallschicht mittels eines Lösemittels entfernt. Der Waschlack muss also in dem Lösemittel löslich sein.In the lift-off method, a partial layer of a wash varnish is applied to the substrate before the metal layer is applied, and is removed using a solvent after the metal layer has been applied. The wash varnish must therefore be soluble in the solvent.

Bevorzugt wird aus Umweltschutzgründen Wasser als Lösemittel verwendet. Geeignete Waschlacke sind beispielsweise auf Basis von Polyvinylalkohol (PVA) oder Polyvinylpyrrolidon (PVP) aufgebaut und können zusätzlich Füllstoffe enthalten, die das spätere Entfernen des Waschlacks erleichtern.For environmental reasons, water is preferably used as the solvent. Suitable wash varnishes are based, for example, on polyvinyl alcohol (PVA) or polyvinyl pyrrolidone (PVP) and can additionally contain fillers which facilitate later removal of the wash varnish.

Das Entfernen des Waschlacks erfolgt in einem Lösemittelbad oder durch Besprühen mit Lösemittel, vorzugsweise bei Temperaturen von 15°C bis 65°C. Wie auch beim Ätzen, kann die Entfernung des Waschlacks mechanisch unterstützt werden, beispielsweise durch Bürsten, Bewegen des Lösemittelbades, Besprühen oder Ultraschallbehandlung.The wash varnish is removed in a solvent bath or by spraying with solvent, preferably at temperatures from 15 ° C. to 65 ° C. As with etching, the removal of the wash varnish can be supported mechanically, for example by brushing, moving the solvent bath, spraying or ultrasound treatment.

In Bereichen, wo die Metallschicht auf dem Waschlack aufgetragen ist, wird die Metallschicht zusammen mit dem Waschlack entfernt. Die Metallschicht verbleibt also nur in Bereichen, in denen sie nicht mit der partiellen Schicht aus Waschlack überlappt. Es entsteht also ein Negativ zu den Überlappungsbereichen.In areas where the metal layer is applied to the wash varnish, the metal layer is removed together with the wash varnish. The metal layer therefore only remains in areas in which it does not overlap with the partial layer of wash lacquer. So there is a negative to the overlap areas.

Es ist ferner möglich, dass das partielle Demetallisieren der Metallschicht im zweiten Bereich durch Laserablation erfolgt. Dies ermöglicht es insbesondere, auf einfache Weise individualisierte Mehrschichtkörper herzustellen, die sich in der Form Ihrer partiellen Metallschichten unterscheiden. Damit können beispielsweise Personalisierungsinformationen in den Mehrschichtkörper eingebracht werden.It is also possible for the partial demetallization of the metal layer in the second region to be carried out by laser ablation. In particular, this makes it possible to easily produce individualized multilayer bodies which differ in the shape of their partial metal layers. For example, personalization information can thus be introduced into the multilayer body.

Ein weitere Möglichkeit zum partiellen Demetallisieren der Metallschicht im zweiten Bereich ist das Aufbringen, insbesondere Drucken, einer partiellen Ölschicht vor dem Aufbringen der Metallschicht.Another possibility for partially demetallizing the metal layer in the second region is the application, in particular printing, of a partial oil layer before the application of the metal layer.

Wo die partielle Ölschicht aufgebracht wird, haftet das Metall beim Aufbringen der Metallschicht, beispielsweise durch Aufdampfen oder Sputtern, nicht am Substrat, so dass die gewünschte Strukturierung bereits bei der Herstellung der Metallschicht erreicht wird.Where the partial oil layer is applied, the metal does not adhere to the substrate when the metal layer is applied, for example by vapor deposition or sputtering, so that the desired structuring is achieved already during the production of the metal layer.

Alternativ dazu, die partielle Demetallisierung der Metallschicht in mehreren Schritten auszuführen wie zuvor beschrieben, ist es auch möglich, die partielle Demetallisierung der Metallschicht im ersten und zweiten Bereich in einem gemeinsamen Arbeitsgang durchzuführen. Dafür wird zuerst eine vergleichsweise großflächige partielle Demetallisierung der Metallschicht auf dem Substrat durchgeführt, um den ersten und zweiten Bereich als separate metallisierte Bereiche zu schaffen. Die verbleibenden metallisierten ersten und zweiten Bereiche sind beispielsweise ungefähr 1 cm2 bis 5 cm2 groß.As an alternative to performing the partial demetallization of the metal layer in several steps as described above, it is also possible to carry out the partial demetallization of the metal layer in the first and second region in a common operation. For this purpose, a comparatively large-area partial demetallization of the metal layer on the substrate is carried out in order to create the first and second regions as separate metallized regions. The remaining metallized first and second areas are, for example, approximately 1 cm 2 to 5 cm 2 in size.

Danach erfolgt im ersten und zweiten Bereich eine weitere partielle Demetallisierung der Metallschicht wie zuvor nur anhand des zweiten Bereichs beschrieben. D.h. unter Zuhilfenahme einer partiellen Lackschicht, beispielsweise eines Ätzresists oder Photoresists oder Lift-Off-Lackes werden der großflächige erste und zweite Bereich nochmals kleinflächiger feinstrukturiert. Dabei kann, wie zuvor bezüglich des zweiten Bereichs beschrieben, die partielle Lackschicht vollständig oder nur teilweise mit der Metallschicht des ersten und/oder zweiten Bereichs überlappen. Dabei erstreckt sich die partielle Lackschicht nicht nur in diejenigen Bereiche, die von der Metallschicht des ersten und/oder zweiten Bereichs bedeckt sind, sondern auch in die von der Metallschicht nicht bedeckten Bereiche. Die partielle Lackschicht überlappt also die Metallschicht des ersten und/oder zweiten Bereichs vollständig oder nur teilweise, senkrecht zu einer von der Metallschicht bzw. der partiellen Lackschicht aufgespannten Fläche. Auch auf diese Weise lassen sich der erste Bereich und der zweite Bereich weitgehend unabhängig voneinander strukturieren, wobei aber weniger Prozessschritte benötigt werden.This is followed by a further partial demetallization of the metal layer in the first and second areas, as previously described only with reference to the second area. Ie with the help of a partial layer of lacquer, For example, an etch resist or photoresist or lift-off varnish, the large-area first and second areas are fine-structured again with a small area. As described above with regard to the second region, the partial lacquer layer can overlap completely or only partially with the metal layer of the first and / or second region. The partial lacquer layer extends not only into those areas that are covered by the metal layer of the first and / or second area, but also into the areas that are not covered by the metal layer. The partial lacquer layer thus overlaps the metal layer of the first and / or second region completely or only partially, perpendicular to an area spanned by the metal layer or the partial lacquer layer. In this way too, the first area and the second area can be structured largely independently of one another, but fewer process steps are required.

Je nach Position der partiellen Lackschicht relativ zur Position der Metallschicht des ersten und/oder zweiten Bereichs lassen sich im ersten und zweiten Bereich unterschiedliche optische Erscheinungsbilder der resultierenden feinstrukturierten Metallschicht erzeugen.Depending on the position of the partial lacquer layer relative to the position of the metal layer of the first and / or second area, different optical appearances of the resulting finely structured metal layer can be produced in the first and second area.

Es ist ferner bevorzugt, wenn das Substrat eine Replizierschicht mit einem in einer zur Metallschicht weisenden Oberfläche eingeformten Oberflächenrelief ist oder umfasst. Die Replizierschicht kann aus einem thermoplastischen, d.h. thermisch härtbaren oder trockenbaren Replizierlack oder einem strahlenhärtbaren, insbesondere UV-härtbaren Replizierlack oder einer Mischung aus solchen Lacken bestehen.It is further preferred if the substrate is or comprises a replication layer with a surface relief molded into a surface facing the metal layer. The replication layer can consist of a thermoplastic, ie thermally curable or dryable replication lacquer or a radiation-curable, in particular UV-curable replication lacquer or a mixture of such lacquers.

Vorzugsweise bildet das in die Replizierschicht eingebrachte Oberflächenrelief ein optisch variables Element, insbesondere ein Hologramm, Kinegram® oder Trustseal®, ein vorzugsweise lineares oder gekreuztes sinusförmiges Beugungsgitter, ein lineares oder gekreuztes ein- oder mehrstufiges Rechteckgitter, eine Beugungsstruktur Nullter Ordnung, eine asymmetrische Sägezahn-Reliefstruktur, ein Blaze-Gitter, eine vorzugsweise isotrope oder anisotrope, Mattstruktur, oder eine lichtbeugende und/oder lichtbrechende und/oder lichtfokussierende Mikro- oder Nanostruktur, eine binäre oder kontinuierliche Fresnelllinse, eine binäre oder kontinuierliche Fresnel-Freiformfläche, eine Mikroprismenstruktur oder eine Kombinationsstruktur daraus aus.The surface relief introduced into the replication layer preferably forms an optically variable element, in particular a hologram, Kinegram® or Trustseal®, a preferably linear or crossed sinusoidal diffraction grating, a linear or crossed one- or multi-stage rectangular grating, a zero-order diffraction structure, an asymmetrical sawtooth Relief structure, a blaze grating, a preferably isotropic or anisotropic, matt structure, or a light-diffractive and / or refractive and / or light-focusing micro- or nanostructure, a binary or continuous Fresnel lens, a binary or continuous Fresnel freeform surface, a microprism structure or a combination structure from it.

Durch solche Strukturen oder Kombinationen daraus lassen sich vielfältige optische Effekte erzielen, die zudem schwer nachzuahmen und mit üblichen optischen Kopiermethoden nicht oder nur schwer kopierbar sind, so dass sich ein besonders fälschungssicherer Mehrschichtkörper ergibt.Such structures or combinations thereof can be used to achieve a variety of optical effects which are also difficult to imitate and cannot be copied or can only be copied with difficulty using conventional optical copying methods, so that a particularly forgery-proof multilayer body results.

Es ist dabei vorteilhaft, wenn das Oberflächenrelief einen Teilbereich mit einem Tiefen-zu-Breiten-Verhältnis von 0,15 bis 1,5, bevorzugt von 0,2 bis 0,5 umfasst, welcher komplementär zu der ersten optischen Information ist.It is advantageous if the surface relief comprises a partial area with a depth-to-width ratio of 0.15 to 1.5, preferably 0.2 to 0.5, which is complementary to the first optical information.

Durch das Tiefen-zu-Breiten-Verhältnis kann die Transparenz einer auf das Oberflächenrelief aufgetragenen Metallschicht variiert werden. Diese unterschiedlich transparente Metallschicht kann daher in der Folge selbst als Belichtungsmaske dienen, um eine weitere Schicht zu strukturieren. Die Strukturierung erfolgt somit im Register zu den unterschiedlich transparenten Bereichen der Metallschicht und damit zu den unterschiedlichen Bereichen des Oberflächenreliefs, so dass sich nahtlose Übergänge zwischen unterschiedlichen Bereichen des Oberflächenreliefs und der weiteren Schicht ergeben.The depth-to-width ratio enables the transparency of a metal layer applied to the surface relief to be varied. This differently transparent metal layer can therefore itself serve as an exposure mask in order to structure another layer. The structuring thus takes place in the register for the differently transparent areas of the metal layer and thus for the different areas of the surface relief, so that there are seamless transitions between result in different areas of the surface relief and the further layer.

Dabei ist es vorteilhaft, wenn zum partiellen Demetallisieren der Metallschicht im ersten Bereich ein Photoresist auf die Metallschicht aufgetragen und von der Seite des Substrats her belichtet wird und die Metallschicht anschließend durch Ätzen partiell demetallisiert wird.It is advantageous if, in order to partially demetallize the metal layer in the first region, a photoresist is applied to the metal layer and exposed from the side of the substrate, and the metal layer is then partially demetallized by etching.

Die Photoresists und Ätzmittel entsprechen dabei den oben beschriebenen Varianten. Auf diese Weise wird die Metallschicht selbst im Register zu dem Oberflächenrelief strukturiert.The photoresists and etchants correspond to the variants described above. In this way, the metal layer is structured even in register with the surface relief.

Bevorzugt wird zumindest eine weitere partielle Lackschicht zur Ausbildung zumindest einer weiteren optischen Information auf den Mehrschichtkörper aufgebracht. Hierdurch lassen sich komplexe und ansprechende Designs verwirklichen, die die Herstellung eines besonders fälschungssicheren Mehrschichtkörpers ermöglichen.At least one further partial lacquer layer is preferably applied to the multilayer body in order to form at least one further piece of optical information. In this way, complex and appealing designs can be realized, which enable the production of a particularly forgery-proof multilayer body.

Zweckmäßigerweise beträgt eine Schichtdicke der partiellen Lackschicht und/oder der zumindest einen weiteren partiellen Lackschicht 0,2 µm bis 10 µm, bevorzugt 0,3 µm bis 3 µm, weiter bevorzugt 0,5 µm bis 1,5 µm.A layer thickness of the partial lacquer layer and / or the at least one further partial lacquer layer is expediently 0.2 μm to 10 μm, preferably 0.3 μm to 3 μm, more preferably 0.5 μm to 1.5 μm.

Es ist dabei zweckmäßig, wenn die zumindest eine weitere partielle Lackschicht Farbmittel, insbesondere bunte oder unbunte Pigmente und/oder Effektpigmente, Dünnschichtfilmsysteme, cholesterische Flüssigkristalle, Farbstoffe und/oder metallische oder nichtmetallische Nanopartikel umfasst.It is expedient if the at least one further partial lacquer layer comprises colorants, in particular colored or achromatic pigments and / or effect pigments, thin-film systems, cholesteric liquid crystals, dyes and / or metallic or non-metallic nanoparticles.

Hierdurch können vielfältige optische Effekte erzielt werden, die sich mit dem Erscheinungsbild der Metallschicht und der partiellen Lackschicht, sowie dem Oberflächenrelief zum gewünschten Gesamtdekor ergänzen.As a result, a variety of optical effects can be achieved, which complement the appearance of the metal layer and the partial lacquer layer, as well as the surface relief for the desired overall decor.

Es ist weiter zweckmäßig, wenn die Farbmittel im ultravioletten Spektrum zur Fluoreszenz und/oder Phosphoreszenz, insbesondere im sichtbaren Spektrum, anregbar sind. Weiterhin ist es zweckmäßig, wenn die Farbmittel im infraroten Spektrum mittels Anti-Stokes-Effekt zur Emission im sichtbaren Spektrum angeregt werden können. Es können auch Mittel beigefügt werden, die ein maschinell verifizierbares Emissionsspektrum aufweisen, welches nur teilweise oder gar nicht im sichtbaren Spektrum liegt.It is furthermore expedient if the colorants can be excited in the ultraviolet spectrum for fluorescence and / or phosphorescence, in particular in the visible spectrum. It is also expedient if the colorants in the infrared spectrum can be excited to emit in the visible spectrum by means of the anti-Stokes effect. Means can also be added that have a machine-verifiable emission spectrum that is only partially or not at all in the visible spectrum.

Hierdurch können weitere Informationen eingebracht werden, die im normalen Tageslicht nicht sichtbar sind und erst bei geeigneter Beleuchtung erscheinen. Solche Informationen können dabei auch als maschinenlesbare Informationen ausgebildet werden, die bei der Betrachtung im Tageslicht das Gesamtdekor nicht stören. Auch damit kann die Fälschungssicherheit des Mehrschichtkörpers verbessert werden.In this way, additional information can be introduced that is not visible in normal daylight and only appears when the lighting is suitable. Such information can also be designed as machine-readable information that does not interfere with the overall decor when viewed in daylight. This also improves the security against forgery of the multilayer body.

Bevorzugt wird dabei die partielle Lackschicht und/oder die zumindest eine weitere partielle Lackschicht durch Drucken, insbesondere durch Tiefdruck, Flexodruck, Offsetdruck, Buchdruck, Siebdruck, Tampondruck, Tintenstrahldruck und/oder Laserdruck aufgebracht.The partial lacquer layer and / or the at least one further partial lacquer layer is preferably applied by printing, in particular by gravure printing, flexographic printing, offset printing, letterpress printing, screen printing, pad printing, inkjet printing and / or laser printing.

Es ist ferner zweckmäßig, wenn die partielle Lackschicht und/oder die zumindest eine weitere partielle Lackschicht strahlungsgehärtet wird, insbesondere durch UV- oder Elektronenstrahlung.It is also expedient if the partial lacquer layer and / or the at least one further partial lacquer layer is radiation-hardened, in particular by UV or electron radiation.

Bevorzugt wird ferner zumindest ein Individualisierungsmerkmal auf den Mehrschichtkörper aufgebracht wird, insbesondere durch Tintenstrahl- und/oder Laserdruck. Damit kann beispielsweise der Mehrschichtkörper einem bestimmten Sicherheitsdokument zugeordnet werden, was ebenfalls die Fälschungssicherheit erhöht.Furthermore, at least one individualization feature is preferably applied to the multilayer body, in particular by inkjet and / or laser printing. In this way, for example, the multilayer body can be assigned to a specific security document, which also increases the security against forgery.

Es ist weiter bevorzugt, wenn das Substrat eine Wachsschicht und/oder eine Ablöseschicht und/oder eine Schutzschicht, insbesondere eine Schutzlackschicht, umfasst.It is further preferred if the substrate comprises a wax layer and / or a release layer and / or a protective layer, in particular a protective lacquer layer.

Wachs- und Ablöseschichten können der ablösbaren Anordnung des Mehrschichtkörpers auf einem Träger dienen, von dem der Mehrschichtkörper vor seiner Anbringung, beispielsweise auf einem Sicherheitsdokument abgelöst wird.Wax and release layers can serve for the detachable arrangement of the multilayer body on a carrier, from which the multilayer body is detached prior to its attachment, for example on a security document.

Weiterhin kann der Schichtaufbau auch derart ausgestaltet sein, dass eine Ablösung vom Träger verhindert wird. Der Mehrschichtkörper verbleibt auf dem Träger, bzw. der Träger ist ein Teil des Mehrschichtkörpers, welcher auf das Sicherheitsdokument übertragen wird. In einem derartigen Fall entfallen die Wachsschicht und die Ablöseschicht, da keine Ablösung sichergestellt werden muss. Hingegen können zusätzliche Schichten eingebracht werden, die eine erhöhte Zwischenschichthaftung zwischen Träger und Replizierschicht sicherstellen.Furthermore, the layer structure can also be designed such that detachment from the carrier is prevented. The multilayer body remains on the carrier, or the carrier is part of the multilayer body, which is transferred to the security document. In such a case, the wax layer and the release layer are omitted, since no release has to be ensured. On the other hand, additional layers can be introduced which ensure increased interlayer adhesion between the support and the replication layer.

Weiterhin kann die Wachsschicht nur partiell vorhanden sein, so dass nur lokal eine Ablösung erfolgen kann, während in anderen Bereichen keine Ablösung erfolgt. Das Aufbringen auf ein Sicherheitsdokument erfolgt wiederum zusammen mit dem Träger. Derartige Aufbauten werden beispielsweise eingesetzt, um Manipulationsversuche anzuzeigen. Wird versucht, das Sicherheitselement von dem Sicherheitsdokument zu entfernen, so verbleiben in denjenigen Bereichen mit lokal aufgebrachter Wachsschicht die Ablöseschicht und/oder Schutzschicht und/oder Replizierschicht auf dem Sicherheitsdokument, während in jenen Bereichen ohne Wachsschicht der Schichtverbund zusammen mit dem Träger vom Substrat gelöst werden kann. Das Sicherheitsmerkmal wird durch diesen Manipulationsversuch erkennbar beschädigt.Furthermore, the wax layer can only be partially present, so that detachment can only take place locally, while no detachment takes place in other areas. In turn, the application to a security document takes place together with the carrier. Such structures are, for example used to indicate attempts at manipulation. If an attempt is made to remove the security element from the security document, the release layer and / or protective layer and / or replication layer remain on the security document in those areas with locally applied wax layer, while in those areas without wax layer the layer composite is detached from the substrate together with the carrier can. The security feature is visibly damaged by this manipulation attempt.

Weiterhin kann der Mehrschichtkörper auf ein Substrat übertragen werden, welches erst in einem späteren Schritt zu einem Sicherheitsdokument verarbeitet wird. So kann der Mehrschichtkörper beispielsweise auf eine transparente, transluzente oder opake Kunststofflage, insbesondere aus Polycarbonat oder Polyester, Polypropylen oder Polyethylen, wie beispielsweise Teslin® aufgebracht werden, welche erst in weiteren Verarbeitungsschritten mit weiteren Kunststofflagen zu einem Dokumentenkörper verbunden werden, beispielsweise durch Lamination und/oder Hinterspritzen. Typische Dicken der Kunststofflagen liegen zwischen 25 µm und 150 µm, vorzugsweise zwischen 50 µm und 100 µm. Die Lagen können transparent sein oder auch Füllstoffe enthalten. Weiterhin können sie derart ausgestaltet sein, dass sie mittels eines Laserstrahls geschwärzt werden können.Furthermore, the multilayer body can be transferred to a substrate, which is processed into a security document only in a later step. For example, the multilayer body can be applied to a transparent, translucent or opaque plastic layer, in particular made of polycarbonate or polyester, polypropylene or polyethylene, such as Teslin®, which are only connected to other plastic layers to form a document body in further processing steps, for example by lamination and / or back injection. Typical thicknesses of the plastic layers are between 25 µm and 150 µm, preferably between 50 µm and 100 µm. The layers can be transparent or contain fillers. Furthermore, they can be designed such that they can be blackened by means of a laser beam.

Die Schutzschicht, welche auch mehrschichtig ausgebildet sein kann, bildet dabei bevorzugt eine Sichtseite des Mehrschichtkörpers aus, so dass dieser vor mechanischer oder chemischer Beschädigung geschützt ist. Als Schutzlack können dabei beispielsweise Acrylat oder Polyester mit zusätzlichen filmbildenden Komponenten, wie beispielsweise Nitrozellulose, UV-härtende Systeme, chemisch härtende Systeme, beispielsweise auf Basis von Isocyanat, Verwendung finden.The protective layer, which can also have a multi-layer structure, preferably forms a visible side of the multi-layer body, so that it is protected against mechanical or chemical damage. Acrylic or polyester with additional film-forming components such as nitrocellulose, for example, can be used as a protective lacquer Systems, chemically curing systems, for example based on isocyanate, are used.

Vorzugsweise beträgt dabei eine Schichtdicke der Replizierschicht und/oder der Schutzlackschicht 0,3 µm bis 3 µm, bevorzugt 0,5 µm bis 1,5 µm. Vorzugsweise beträgt dabei eine Schichtdicke der Wachsschicht und/oder der Ablöseschicht 0,01 µm bis 0,3 µm, bevorzugt 0,1 µm bis 0,2 µm. Alternativ zur Wachsschicht und/oder der Ablöseschicht können auch Schichten aus Silikon oder einem Acrylpolymer/Acrylcopolymer verwendet werden. Die Ablöseschicht kann auch Teil der Schutzlackschicht sein.A layer thickness of the replication layer and / or the protective lacquer layer is preferably 0.3 μm to 3 μm, preferably 0.5 μm to 1.5 μm. A layer thickness of the wax layer and / or the release layer is preferably 0.01 μm to 0.3 μm, preferably 0.1 μm to 0.2 μm. As an alternative to the wax layer and / or the release layer, layers of silicone or an acrylic polymer / acrylic copolymer can also be used. The release layer can also be part of the protective lacquer layer.

Es ist ferner zweckmäßig, wenn das Substrat eine ablösbare Trägerlage, insbesondere aus PET, PEN oder PP, umfasst. Diese schützt den Mehrschichtkörper vor seiner Anbringung an seinem endgültigen Verwendungsort und kann als mechanische Stabilisierung während der Fertigung des Mehrschichtkörpers dienen.It is also expedient if the substrate comprises a removable carrier layer, in particular made of PET, PEN or PP. This protects the multilayer body from being attached to its final place of use and can serve as mechanical stabilization during the manufacture of the multilayer body.

Zweckmäßigerweise beträgt dabei eine Schichtdicke der Trägerlage 5 µm bis 75 µm, bevorzugt 10 µm bis 50 µm, weiter bevorzugt 12 µm bis 25 µm.A layer thickness of the carrier layer is expediently 5 μm to 75 μm, preferably 10 μm to 50 μm, more preferably 12 μm to 25 μm.

Vorzugsweise besteht die partielle Metallschicht aus Aluminium, Kupfer, Chrom, Silber und/oder Gold und/oder einer Legierung daraus. Die partielle Metallschicht kann auch bereichsweise aus unterschiedlichen Metallen bestehen, um besondere optische Effekte zu erzeugen.The partial metal layer preferably consists of aluminum, copper, chromium, silver and / or gold and / or an alloy thereof. The partial metal layer can also consist of different metals in some areas in order to produce special optical effects.

Zweckmäßigerweise beträgt eine Schichtdicke der Metallschicht 10 nm bis 200 nm, bevorzugt 10 nm bis 50 nm, weiter bevorzugt 15 nm bis 35 nm.A layer thickness of the metal layer is expediently 10 nm to 200 nm, preferably 10 nm to 50 nm, further preferably 15 nm to 35 nm.

Es ist ferner vorteilhaft, wenn im ersten Bereich eine insbesondere transparente Schutzlackschicht, insbesondere aus PVC, PET, Acrylat, Nitrozellulose, Celluloseseacetobutyrat, oder Mischungen daraus, auf der partiellen Metallschicht angeordnet ist. Die Schutzschicht kann jedoch auch aus einem UV- oder elektronenstrahlhärtenden Lack bestehen.It is also advantageous if an in particular transparent protective lacquer layer, in particular made of PVC, PET, acrylate, nitrocellulose, cellulose acetobutyrate, or mixtures thereof, is arranged in the first region on the partial metal layer. However, the protective layer can also consist of a UV or electron beam curing lacquer.

Eine solche Schutzlackschicht kann die Metallschicht im ersten Bereich während der Strukturierung des zweiten Bereichs schützen, so dass die zuerst im ersten Bereich eingebrachten Strukturen erhalten bleiben. Zweckmäßigerweise beträgt dabei eine Schichtdicke der Schutzlackschicht 0,2 µm bis 10 µm, bevorzugt 0,3 µm bis 3 µm, weiter bevorzugt 0,5 µm bis 1,5 µm.Such a protective lacquer layer can protect the metal layer in the first area during the structuring of the second area, so that the structures introduced first in the first area are retained. A layer thickness of the protective lacquer layer is expediently 0.2 μm to 10 μm, preferably 0.3 μm to 3 μm, further preferably 0.5 μm to 1.5 μm.

Es ist weiter vorteilhaft, wenn die erste und/oder zweite und/oder weitere optische Information in Form zumindest eines Motivs, Musters, insbesondere eines Guillochenmusters, Symbols, Bilds, Logos oder alphanumerischer Charaktere, insbesondere Zahlen und/oder Buchstaben, ausgebildet ist.It is further advantageous if the first and / or second and / or further optical information is in the form of at least one motif, pattern, in particular a guilloche pattern, symbol, image, logo or alphanumeric character, in particular numbers and / or letters.

Die optischen Informationen können sich auch zu einem solchen Motiv, Muster, Symbol, Bild, Logo oder zu alphanumerischen Charakteren, insbesondere Zahlen oder Buchstaben ergänzen. Ein derart erzeugtes graphisches Element, das durch die Zusammenwirkung mehrerer Schichten entsteht, ist besonders schwer zu reproduzieren und daher besonders fälschungssicher.The optical information can also complement such a motif, pattern, symbol, image, logo or alphanumeric characters, in particular numbers or letters. A graphic element produced in this way, which arises from the interaction of several layers, is particularly difficult to reproduce and is therefore particularly forgery-proof.

Es ist weiter vorteilhaft, wenn die erste und/oder zweite und/oder weitere optische Information in Form eines ein- oder zweidimensionalen Linien- und/oder Punktrasters ausgebildet ist, wobei das Linien- und/oder Punktraster bevorzugt eine Rasterweite von weniger als 300 µm, bevorzugt von weniger als 200 µm und von mehr als 25 µm, bevorzugt mehr als 50 µm aufweist.It is further advantageous if the first and / or second and / or further optical information is in the form of a one- or two-dimensional line and / or dot screen, the line and / or dot screen preferably has a pitch of less than 300 μm, preferably less than 200 μm and more than 25 μm, preferably more than 50 μm.

Hierbei sind auch transformierte Linienraster möglich, beispielsweise mit wellenförmigen Linien, welche auch eine variable Linienbreite aufweisen können. Die Punkte eines Punktrasters können beliebige Geometrien und/oder Größen aufweisen und müssen nicht kreisscheibenförmig sein. Beispielsweise sind auch Punktraster aus dreieckigen, rechteckigen, beliebig polygonalen, sternförmigen oder in Form von Symbolen ausgebildeten Punkten möglich. Das Punktraster kann auch aus unterschiedlich großen und/oder unterschiedlich geformten Punkten aufgebraut sein. Gerade wenn ein solches Raster mit einem graphischen Element in der jeweils anderen Schicht bzw. im jeweils anderen Schichtsystem zusammenwirkt, können weitere graphische Effekte, wie beispielsweise Halbtonbilder erzeugt werden.Transformed line grids are also possible, for example with wavy lines, which can also have a variable line width. The points of a grid of points can have any geometries and / or sizes and do not have to be circular disk-shaped. For example, dot grids made of triangular, rectangular, any polygonal, star-shaped or in the form of symbols are also possible. The dot matrix can also be brewed from differently sized and / or differently shaped dots. Especially when such a raster interacts with a graphic element in the respective other layer or in the respective other layer system, further graphic effects, such as, for example, halftone images, can be generated.

Solche Raster wirken sich auf andere graphische Elemente, die von dem Raster überlagert werden aus, werden aber selbst mit dem nackten menschlichen Auge nicht mehr als solche wahrgenommen.Such grids have an effect on other graphic elements that are overlaid by the grid, but are no longer perceived as such even with the naked human eye.

Bevorzugt umfasst die erste und/oder zweite und/oder weitere optische Information zumindest ein maschinenlesbares Merkmal, insbesondere einen Barcode. Dies ermöglicht eine schnelle und einfache Authentifizierung des Mehrschichtkörpers, was beispielsweise auch mit einem Mobilgerät wie einem Mobiltelefon, PDA oder dergleichen erfolgen kann.The first and / or second and / or further optical information preferably comprises at least one machine-readable feature, in particular a barcode. This enables the multilayer body to be authenticated quickly and easily, which can also be done, for example, with a mobile device such as a cell phone, PDA or the like.

Es ist weiterhin zweckmäßig, wenn auf der dem Substrat abgewandten Seite des Mehrschichtkörpers eine Kleberschicht, insbesondere aus PVC, Polyester, Acrylate, Zelluloseester, Naturharze, Ketonharze, Polyamid, Polyurethan, Epoxidharze, oder Mischungen daraus, angeordnet ist. Diese dient dem Verbinden des Mehrschichtkörpers mit einem Gegenstand oder Dokument zu dessen Authentifizierung der Mehrschichtkörper benutzt werden soll. Dabei ist es zweckmäßig, wenn eine Schichtdicke der Kleberschicht 0,5 µm bis 25 µm, bevorzugt 1 µm bis 15 µm beträgt. Die Kleberschicht kann dabei auch mehrschichtig, insbesondere aus unterschiedlichen Materialien, ausgeführt sein, wobei vorgenannte Schichtdicken-Werte die Gesamtdicke der Kleberschicht(en) betreffen.It is furthermore expedient if, on the side of the multilayer body facing away from the substrate, an adhesive layer, in particular made of PVC, polyester, Acrylates, cellulose esters, natural resins, ketone resins, polyamide, polyurethane, epoxy resins, or mixtures thereof, is arranged. This serves to connect the multilayer body to an object or document for the authentication of which the multilayer body is to be used. It is advantageous if a layer thickness of the adhesive layer is 0.5 μm to 25 μm, preferably 1 μm to 15 μm. The adhesive layer can also be multi-layer, in particular made of different materials, the aforementioned layer thickness values relating to the total thickness of the adhesive layer (s).

Vor dem Aufbringen des Klebers auf dem Mehrschichtkörperkönnen weitere Schichten aufgebracht werden, die beispielsweise die Zwischenschichthaftung verbessern oder die Stabilität erhöhen. Zur Erhöhung der Stabilität eignen sich insbesondere chemisch vernetzende Schichten oder strahlenhärtende Lacke.Before the adhesive is applied to the multilayer body, further layers can be applied which, for example, improve the interlayer adhesion or increase the stability. Chemically crosslinking layers or radiation-curing lacquers are particularly suitable for increasing the stability.

Weiterhin ist es möglich, keinen Kleber aufzubringen. Ein Verbund mit dem Untergrund, auf das das Merkmal aufgebracht werden soll, kann beispielsweise erreicht werden, indem auf den Untergrund ein UV-härtender Kleber gedruckt wird, der Mehrschichtkörper auf den Kleber gepresst wird und der UV-härtende Kleber mittels UV-Bestrahlung ausgehärtet wird. Die Trägerfolie aus PET kann anschließend abgezogen werden (Cold Foil bzw. Kaltprägen).It is also possible not to apply any adhesive. A bond with the substrate to which the feature is to be applied can be achieved, for example, by printing a UV-curing adhesive on the substrate, pressing the multilayer body onto the adhesive, and curing the UV-curing adhesive by means of UV radiation , The PET carrier film can then be removed (cold foil or cold stamping).

Weiterhin können zumindest in Teilbereichen Reflexionsschichten aus einem hochbrechenden Material (HRI = High Refractive Index) aufgebracht werden. Beispiele für hochbrechende Materialien sind Zinksulfid oder Titandioxid, die üblicherweise durch Aufdampfen oder Sputtern aufgebracht werden. Solche Schichten können vor dem Aufbringen der Metallschichten oder nach deren Teilmetallisierung oder nach Druckprozessen aufgebracht werden. Befinden sich diese Schichten direkt auf beugungsoptischen Strukturen, lassen sich damit weitere optische Effekte erzielen, welche die Sicherheit des Mehrschichtkörpers weiter erhöhen.Furthermore, reflection layers made of a highly refractive material (HRI = High Refractive Index) can be applied at least in some areas. Examples of high-index materials are zinc sulfide or titanium dioxide, which are usually applied by vapor deposition or sputtering. Such layers can be applied before the metal layers are applied or after their partial metallization or after printing processes. Are located If these layers are placed directly on optical diffraction structures, further optical effects can be achieved which further increase the security of the multilayer body.

Solche beugungsoptischen Strukturen können beispielsweise Beugungsstrukturen Nullter Ordnung sein, mit denen sich ein Farbwechsel in der direkten Reflexion (Nullter Ordnung) bei einer Drehung des OVDs um 90 Grad in der Ebene, realisieren lässt. Hierbei erscheint beispielsweise eine Information "OK" in der normalen Betrachtungsposition grün auf einem roten Hintergrund, nach Drehung des OVDs insbesondere um 90 Grad in der Ebene, erscheint das "OK" rot auf einem grünen Hintergrund (auch andere Farbkombinationen sind möglich). Für die Information und den Hintergrund wird typischerweise die gleiche Beugungsstrukturen Nullter Ordnung verwendet, einmal in der 0 Grad-Orientierung, einmal in der 90 Grad-Orientierung. Die hierbei typischerweise verwendeten Parameterbereiche sind:

  • ZnS als hochbrechendes Material mit einer Schichtdicke im Bereich von 40 nm bis 100 nm.
  • Profilform der Beugungsstruktur: Lineare binäre Rechteckgitter oder lineare Sinusgitter
  • Spatialfrequenzbereich für die Beugungsstruktur Nullter Ordnung: 2500 Linien/mm bis 3100 Linien/mm.
  • Strukturtiefe für die Beugungsstruktur Nullter Ordnung: im Bereich von ca. 100 nm bis 200 nm
Such diffractive optical structures can be zero-order diffraction structures, for example, with which a color change in direct reflection (zero-order) can be implemented when the OVD is rotated by 90 degrees in the plane. Here, for example, information "OK" appears green in the normal viewing position on a red background, after turning the OVD in particular by 90 degrees in the plane, the "OK" appears red on a green background (other color combinations are also possible). The same zero order diffraction structures are typically used for the information and the background, once in the 0 degree orientation, once in the 90 degree orientation. The parameter ranges typically used here are:
  • ZnS as a high-index material with a layer thickness in the range from 40 nm to 100 nm.
  • Diffraction structure profile shape: linear binary rectangular gratings or linear sine gratings
  • Spatial frequency range for the zero order diffraction structure: 2500 lines / mm to 3100 lines / mm.
  • Structure depth for the zero order diffraction structure: in the range from approx. 100 nm to 200 nm

Dieser visuelle Effekt zeichnet sich durch eine hohe Fälschungssicherheit und eine einfache Überprüfbarkeit aus.This visual effect is characterized by a high level of security against counterfeiting and easy verifiability.

Die Erfindung wird nun anhand von Ausführungsbeispielen näher erläutert. Es zeigen

Fig. 1A-B
Ein erstes Zwischenprodukt bei der Durchführung eines Ausführungsbeispiels eines Verfahrens zum Herstellen eines Mehrschichtkörpers in schematischer Draufsicht und Schnittdarstellung;
Fig. 2A-B
Ein zweites Zwischenprodukt bei der Durchführung eines Ausführungsbeispiels eines Verfahrens zum Herstellen eines Mehrschichtkörpers in schematischer Draufsicht und Schnittdarstellung;
Fig. 3A-B
Ein drittes Zwischenprodukt bei der Durchführung eines Ausführungsbeispiels eines Verfahrens zum Herstellen eines Mehrschichtkörpers in schematischer Draufsicht und Schnittdarstellung;
Fig. 4A-B
Ein viertes Zwischenprodukt bei der Durchführung eines Ausführungsbeispiels eines Verfahrens zum Herstellen eines Mehrschichtkörpers in schematischer Draufsicht und Schnittdarstellung;
Fig. 5A-B
Ein fünftes Zwischenprodukt bei der Durchführung eines Ausführungsbeispiels eines Verfahrens zum Herstellen eines Mehrschichtkörpers in schematischer Draufsicht und Schnittdarstellung;
Fig. 6A-B
Ein mittels eines Ausführungsbeispiels eines Verfahrens zum Herstellen eines Mehrschichtkörpers gefertigter Mehrschichtkörper in schematischer Draufsicht und Schnittdarstellung;
Fig. 7
Ein Ausführungsbeispiel eines Sicherheitsdokuments mit einem Mehrschichtkörper nach Fig. 6.
The invention will now be explained in more detail on the basis of exemplary embodiments. Show it
1A-B
A first intermediate product in the implementation of an embodiment of a method for producing a multilayer body in a schematic top view and sectional view;
2A-B
A second intermediate product in the implementation of an embodiment of a method for producing a multilayer body in a schematic plan view and sectional view;
3A-B
A third intermediate product in the implementation of an embodiment of a method for producing a multilayer body in a schematic plan view and sectional view;
4A-B
A fourth intermediate product in the implementation of an embodiment of a method for producing a multilayer body in a schematic plan view and sectional view;
5A-B
A fifth intermediate in performing an embodiment of a method of manufacturing a Multi-layer body in a schematic top view and sectional view;
6A-B
A multilayer body produced by means of an exemplary embodiment of a method for producing a multilayer body in a schematic plan view and sectional illustration;
Fig. 7
An embodiment of a security document with a multi-layer body according to Fig. 6 ,

Zum Herstellen eines im Ganzen mit 1 bezeichneten Mehrschichtkörpers, der als Sicherheitselement für Banknoten, Wertpapiere, Ausweisdokumente, Visumsdokumente, Zertifikate, Tickets oder geschützte Produktverpackungen Verwendung finden kann, wird zunächst eine Trägerschicht 11 mit einer Transferlage 12 bereitgestellt.In order to produce a multi-layer body, generally designated 1, which can be used as a security element for banknotes, securities, identification documents, visa documents, certificates, tickets or protected product packaging, a carrier layer 11 with a transfer layer 12 is first provided.

Die Trägerschicht 11 besteht bevorzugt aus Polyester, insbesondere PET und weist eine Schichtdicke von 6 µm bis 75 µm, bevorzugt 12 µm bis 25 µm auf. Die Transferlage 12 kann eine Wachsschicht, eine Ablöseschicht, eine Schutzlackschicht und eine Replizierschicht, die die der Trägerschicht 11 abgewandte Oberfläche der Transferlage 12 bildet, aufweisen.The carrier layer 11 preferably consists of polyester, in particular PET, and has a layer thickness of 6 μm to 75 μm, preferably 12 μm to 25 μm. The transfer layer 12 can have a wax layer, a release layer, a protective lacquer layer and a replication layer, which forms the surface of the transfer layer 12 facing away from the carrier layer 11.

Vorzugsweise beträgt dabei eine Schichtdicke der Replizierschicht und/oder der Schutzlackschicht 0,3 µm bis 3 µm, bevorzugt 0,5 µm bis 1,5 µm. Vorzugsweise beträgt dabei eine Schichtdicke der Wachsschicht und/oder der Ablöseschicht 0,01 µm bis 0,3 µm, bevorzugt 0,1 µm bis 0,2 µm. Alternativ zur Wachsschicht und/oder der Ablöseschicht können auch Schichten aus Silikon oder einem Acrylpolymer/Acrylcopolymer verwendet werden. Die Ablöseschicht kann auch Teil der Schutzlackschicht sein.A layer thickness of the replication layer and / or the protective lacquer layer is preferably 0.3 μm to 3 μm, preferably 0.5 μm to 1.5 μm. A layer thickness of the wax layer and / or the release layer is preferably 0.01 μm to 0.3 μm, preferably 0.1 μm to 0.2 μm. As an alternative to the wax layer and / or the release layer, layers of silicone or a Acrylic polymer / acrylic copolymer can be used. The release layer can also be part of the protective lacquer layer.

Die Replizierschicht besteht beispielsweise aus einem thermoplastischen Kunststoff oder einem strahlungs- oder temperaturhärtbaren Replizierlack. In die Replizierschicht werden dann diffraktive Strukturen eingeformt, beispielsweise durch Prägen mit einem metallischen Prägewerkzeug.The replication layer consists, for example, of a thermoplastic or a radiation- or temperature-hardenable replication lacquer. Diffractive structures are then molded into the replication layer, for example by stamping with a metallic stamping tool.

Vorzugsweise bildet das in die Replizierschicht eingebrachte Oberflächenrelief ein optisch variables Element, insbesondere ein Hologramm, Kinegram® oder Trustseal®, ein vorzugsweise lineares oder gekreuztes sinusförmiges Beugungsgitter, ein lineares oder gekreuztes ein- oder mehrstufiges Rechteckgitter, eine Beugungsstruktur Nullter Ordnung, eine asymmetrische Reliefstruktur, ein Blaze-Gitter, eine vorzugsweise isotrope oder anisotrope, Mattstruktur, oder eine lichtbeugende und/oder lichtbrechende und/oder lichtfokussierende Mikro- oder Nanostruktur, eine binäre oder kontinuierliche Fresnelllinse, eine binäre oder kontinuierliche Fresnel-Freiformfläche, eine Mikroprismenstruktur oder eine Kombinationsstruktur daraus aus.The surface relief introduced into the replication layer preferably forms an optically variable element, in particular a hologram, Kinegram® or Trustseal®, a preferably linear or crossed sinusoidal diffraction grating, a linear or crossed single- or multi-stage rectangular grating, a zero-order diffraction structure, an asymmetrical relief structure, a blaze grating, preferably an isotropic or anisotropic, matt structure, or a light-diffractive and / or refractive and / or light-focusing micro- or nanostructure, a binary or continuous Fresnel lens, a binary or continuous Fresnel freeform surface, a microprism structure or a combination structure thereof ,

Zusätzlich oder alternativ zu solchen Strukturen bildet das Oberflächenrelief in einem ersten Bereich 2 des Mehrschichtkörpers eine erste optische Information aus, die durch Strukturen mit einem Tiefen-zu-Breiten-Verhältnis von 0,15 bis 1,5, bevorzugt von 0,2 bis 0,5, und einer Spatialfrequenz vorzugsweise mindestens 1000 Linien/mm bis 5000 Linien/mm gebildet wird.In addition or as an alternative to such structures, the surface relief forms first optical information in a first region 2 of the multilayer body, which is provided by structures with a depth-to-width ratio of 0.15 to 1.5, preferably 0.2 to 0 , 5, and a spatial frequency, preferably at least 1000 lines / mm to 5000 lines / mm is formed.

Nach dem Bereitstellen von Trägerschicht 11 und Transferlage 12 wird, wie in Fig. 1 gezeigt, auf der Replizierschicht der Transferlage 12 eine Metallschicht 13 erzeugt, was beispielsweise durch Aufdampfen auf ein nicht gezeigtes Substrat erfolgen kann. Das Aufdampfen erfolgt bevorzugt im Vakuum durch thermisches Verdampfen, mittels Elektronenstrahlverdampfung oder auch mittels Sputtern.After the provision of carrier layer 11 and transfer layer 12, as in Fig. 1 shown, a metal layer 13 is produced on the replication layer of the transfer layer 12, which is not the case, for example, by vapor deposition shown substrate can take place. The vapor deposition is preferably carried out in a vacuum by thermal evaporation, by means of electron beam evaporation or by means of sputtering.

Die Metallschicht 13 kann vorzugsweise aus Aluminium, Kupfer, Chrom, Silber und/oder Gold und/oder einer Legierung daraus bestehen. Die partielle Metallschicht kann auch bereichsweise aus unterschiedlichen Metallen bestehen, um besondere optische Effekte zu erzeugen.The metal layer 13 can preferably consist of aluminum, copper, chromium, silver and / or gold and / or an alloy thereof. The partial metal layer can also consist of different metals in some areas in order to produce special optical effects.

Zweckmäßigerweise beträgt eine Schichtdicke der Metallschicht 13 10 nm bis 100 nm, bevorzugt 15 nm bis 35 nm, insbesondere bei der Verwendung von Aluminium.A layer thickness of the metal layer 13 is expediently 10 nm to 100 nm, preferably 15 nm to 35 nm, in particular when aluminum is used.

Anschließend wird die Metallschicht 13 mittels bekannter Verfahren partiell entfernt, beispielsweise durch das partielle Auftragen eines Ätzresists nach dem Bedampfen und anschließendes Ätzen inklusive Entfernen des Ätzresists; durch das partielle Auftragen eines Waschlacks vor dem Bedampfen und Abwaschen (Lift-Off) nach dem Bedampfen oder durch partielles Auftragen eines Fotolacks nach dem Bedampfen und anschließendes Belichten und nachfolgendes Entfernen der belichteten oder unbelichteten Bestandteile des Fotolacks je nach Art (positiv, negativ) des Fotolacks.The metal layer 13 is then partially removed using known methods, for example by partially applying an etching resist after the vapor deposition and subsequent etching, including removing the etching resist; by partially applying a wash varnish before evaporation and washing (lift-off) after evaporation or by partially applying a photoresist after evaporation and then exposing and subsequently removing the exposed or unexposed components of the photoresist depending on the type (positive, negative) photoresist.

Durch das Tiefen-zu-Breiten-Verhältnis des Oberflächenreliefs der Replizierschicht im ersten Bereich 2 kann die Transparenz der auf das Oberflächenrelief aufgetragenen Metallschicht 13 variiert werden. Diese unterschiedliche Transparenz kann daher in der Folge selbst als Belichtungsmaske dienen, um einen auf die Metallschicht 13 aufgetragenen Photoresist zu strukturieren. Beim anschließenden Ätzen verbleibt die Metallschicht 13 im ersten Bereich 2 daher im Register zu der in der Replizierschicht vorgegebenen ersten optischen Information 131.The transparency of the metal layer 13 applied to the surface relief can be varied by the depth-to-width ratio of the surface relief of the replication layer in the first region 2. This different transparency can therefore serve itself as an exposure mask in order to apply one to the metal layer 13 Structure photoresist. During the subsequent etching, the metal layer 13 therefore remains in the first region 2 in register with the first optical information 131 specified in the replication layer.

Alternativ wird das Substrat nicht vollflächig bedampft, die Metallschicht 13 wird vielmehr insbesondere im zweiten Bereich 3 des Mehrschichtkörpers 1 partiell erzeugt. Es sind hierzu verschiedene Verfahren bekannt, wie beispielsweise Abschirmung mittels einer mitlaufenden Maske oder Druck eines Öls, welches die Abscheidung der Metallschicht im Aufdampfprozess verhindert.Alternatively, the substrate is not vapor-deposited over the entire surface, rather the metal layer 13 is partially generated in particular in the second region 3 of the multilayer body 1. Various methods are known for this, such as, for example, shielding by means of an accompanying mask or pressure of an oil, which prevents the deposition of the metal layer in the vapor deposition process.

Die Strukturierung der Metallschicht 13 erfolgt bevorzugt also getrennt für den ersten Bereich 2 und den zweiten Bereich 3, wobei im zweiten Bereich bevorzugt lediglich eine grobe Strukturierung durchgeführt wird. Die Strukturierung kann jedoch auch in einem gemeinsamen Arbeitsschritt erfolgen.The structuring of the metal layer 13 is therefore preferably carried out separately for the first region 2 and the second region 3, with only a rough structuring preferably being carried out in the second region. The structuring can, however, also take place in a common work step.

Wie in Fig. 2 gezeigt, wird im nächsten Verfahrensschritt ein transparenter Schutzlack 14 auf die Metallschicht 13 im ersten Bereich 2 aufgebracht. Dieser schützt in folgenden Ätzprozessen die bereits fertig strukturierte Metallschicht 13 im ersten Bereich 2. Die Schichtdicke der Schutzlackschicht 14 beträgt 0,2 µm bis 10 µm, bevorzugt 0,5 µm bis 1,5 µm.As in Fig. 2 shown, a transparent protective lacquer 14 is applied to the metal layer 13 in the first region 2 in the next process step. This protects the already finished structured metal layer 13 in the first region 2 in the following etching processes. The layer thickness of the protective lacquer layer 14 is 0.2 μm to 10 μm, preferably 0.5 μm to 1.5 μm.

Im zweiten Bereich 3 wird eine partielle Lackschicht 15 so aufgedruckt, dass sie sich über die Metallschicht 13 in diesem Bereich hinaus erstreckt, jedoch auch Teile der Metallschicht 13 unbedeckt lässt. Die Lackschicht 15 bildet eine zweite optische Information 151, im gezeigten Beispiel ein Guillochenmuster aus feinen Linien. Der Druck der Lackschicht 15 kann dabei auch Bereiche des Bereichs 2 überlappen (hier nicht gezeigt).In the second area 3, a partial lacquer layer 15 is printed in such a way that it extends beyond the metal layer 13 in this area, but also parts of the metal layer 13 can be uncovered. The lacquer layer 15 forms second optical information 151, in the example shown Guilloche pattern from fine lines. The pressure of the lacquer layer 15 can also overlap areas of area 2 (not shown here).

Die Lackschicht 15 wirkt in dem in den Figuren gezeigten Beispiel als Ätzresist und umfasst vorzugsweise einen Lack, der insbesondere Bindemittel, Farbstoffe, Pigmente, insbesondere bunte oder unbunte Pigmente, Effektpigmente, Dünnfilmschichtsysteme, cholesterische Flüssigkristalle und/oder metallische oder nichtmetallische Nanopartikel umfasst.In the example shown in the figures, the lacquer layer 15 acts as an etching resist and preferably comprises a lacquer which in particular comprises binders, dyes, pigments, in particular colored or achromatic pigments, effect pigments, thin-film layer systems, cholesteric liquid crystals and / or metallic or non-metallic nanoparticles.

Geeignete Lacke sind beispielsweise auf Basis von PVC, Polyester oder Acrylaten formuliert. Damit erfüllt die partielle Lackschicht 15 nicht nur eine Schutzfunktion beim Strukturieren der Metallschicht 13, sondern kann selbst eine dekorative Wirkung entfalten. Es ist auch möglich, dass mehrere verschiedene Lacke, beispielsweise mit unterschiedlicher Farbgebung, verwendet werden, um weitere visuelle Effekte zu erzeugen.Suitable paints are formulated, for example, on the basis of PVC, polyester or acrylates. The partial lacquer layer 15 thus not only fulfills a protective function when structuring the metal layer 13, but can itself have a decorative effect. It is also possible that several different lacquers, for example with different colors, are used in order to produce further visual effects.

Nach Aufbringen und Aushärten der Lackschichten 14 und 15 erfolgt ein weiterer Ätzprozess. Dieser führt zu dem in Fig. 3 gezeigten Zwischenprodukt. Im ersten Bereich 2 bleibt aufgrund der Schutzlackschicht 14 die Struktur der Metallschicht 13 erhalten. Im zweiten Bereich 3 wird die Metallschicht 13 dort entfernt, wo sie nicht von der partiellen Lackschicht 15 bedeckt ist.After the lacquer layers 14 and 15 have been applied and hardened, a further etching process takes place. This leads to the in Fig. 3 intermediate shown. In the first region 2, the structure of the metal layer 13 is retained due to the protective lacquer layer 14. In the second area 3, the metal layer 13 is removed where it is not covered by the partial lacquer layer 15.

Wie in Fig. 3A zu erkennen, führt dies dazu, dass die Linienmuster der partiellen Lackschicht 15 von der Sichtseite des Mehrschichtkörpers, also aus Richtung der Trägerlage 11 gesehen, dort zu erkennen sind, wo sie nicht auf die Metallschicht 13 aufgetragen wurden. Dort, wo die Lackschicht 15 auf die Metallschicht 13 aufgetragen wurde, bleibt die Metallschicht 13 erhalten und das Linienmuster der Lackschicht 15 ist als Metallstruktur zu erkennen. Das Linienmuster der zweiten optischen Information 151 geht also nahtlos zwischen farbigem Lack und Metall ineinander über.As in Figure 3A to recognize, this means that the line patterns of the partial lacquer layer 15 can be seen from the visible side of the multilayer body, that is to say from the direction of the carrier layer 11, where they were not applied to the metal layer 13. Where the lacquer layer 15 has been applied to the metal layer 13, the metal layer 13 is retained and the line pattern of the lacquer layer 15 can be seen as a metal structure. The line pattern of the second optical information 151 thus merges seamlessly between colored paint and metal.

Anschließend wird eine weitere partielle Lackschicht 16 aufgetragen, die eine weitere optische Information 161 ausbildet. Dies ist in Fig. 4 dargestellt. Die Lackschicht 16 überlappt sowohl den ersten Bereich 2 als auch den zweiten Bereich 3. Für die Lackschicht 16 wird dabei ein Lack verwendet, dessen Farbstoffe oder Pigmente im visuellen Spektrum nicht zu erkennen sind, die aber durch UV-Bestrahlung zur Fluoreszenz und/oder Lumineszenz anregbar sind. Ein geeigneter Lack ist beispielsweisezusammengesetzt aus Acrylat mit Nitrozellulose als Filmbildner und beigemischtem UV-aktivem Pigment. Solche Pigmente können beispielsweise Lumilux®-Pigmente der Firma Honeywell sein. Weiterhin ist es auch möglich, farblose oder eingefärbte Drucklacke für verschiedene Druckverfahren, wie beispielsweise Tiefdruck, Flexodruck oder Offsetdruck, mit Pigmenten zu versehen. Derartige Lacke werden beispielsweise von der Firma Luminescence druckfertig angeboten.A further partial lacquer layer 16 is then applied, which forms further optical information 161. This is in Fig. 4 shown. The lacquer layer 16 overlaps both the first region 2 and the second region 3. A lacquer is used for the lacquer layer 16, the dyes or pigments of which cannot be seen in the visual spectrum, but which are caused by UV radiation for fluorescence and / or luminescence are stimulable. A suitable varnish is composed, for example, of acrylate with nitrocellulose as a film former and admixed UV-active pigment. Such pigments can be, for example, Lumilux® pigments from Honeywell. Furthermore, it is also possible to provide colorless or colored printing varnishes with pigments for various printing processes, such as gravure printing, flexographic printing or offset printing. Lacquers of this type are available, for example, from the Luminescence company ready for printing.

Die weitere optische Information 161 ist also nur unter einer UV-Lichtquelle zu erkennen und dient als zusätzliches Sicherheitsmerkmal. Weiterhin kann die Emission der Fluoreszenz in Abhängigkeit von der Wellenlänge der UV-Lichtquelle unterschiedlich sein. So kann sie beispielsweise Rot bei Anregung bei 365 nm und Grün bei Anregung bei einer Wellenlänge von 254 nm sein und so als weiteres Sicherheitsmerkmal dienen. Beispielsweise kann die weitere optische Information 161 ein maschinenlesbares Muster wie einen Barcode darstellen.The further optical information 161 can therefore only be seen under a UV light source and serves as an additional security feature. Furthermore, the emission of fluorescence can be different depending on the wavelength of the UV light source. For example, it can be red when excited at 365 nm and green when excited at a wavelength of 254 nm and thus serve as a further security feature. For example, the further optical information 161 can represent a machine-readable pattern such as a bar code.

Wie Fig. 5 zeigt, kann nun eine weitere partielle Lackschicht 17 aufgetragen werden. Hierfür wird wieder ein Lack verwendet, dessen Farbmittel mit dem menschlichen Auge zu erkennen sind. Die weitere partielle Lackschicht 17 bildet eine weitere optische Information 171 aus, hier ein Muster aus Sternen, welche die optischen Informationen 131, 151 und 161 teilweise überlagert und einen Hintergrund für diese bildet.How Fig. 5 shows, a further partial lacquer layer 17 can now be applied. For this purpose, a varnish is used again, the colorant of which can be seen by the human eye. The further partial lacquer layer 17 forms further optical information 171, here a pattern of stars, which partially overlays the optical information 131, 151 and 161 and forms a background for this.

Die Lackschichten 15, 16, 17 werden bevorzugt durch Tiefdruck, Flexodruck, Siebdruck, Tampondruck, Offsetdruck, Buchdruck, Tintenstrahldruck und/oder Laserdruck aufgebracht. Die Schichtdicke der Lackschichten 15, 16, 16 beträgt dabei 0,3 µm bis 3 µm, bevorzugt 0,5 µm bis 1,5 µm.The lacquer layers 15, 16, 17 are preferably applied by gravure printing, flexographic printing, screen printing, pad printing, offset printing, letterpress printing, ink jet printing and / or laser printing. The layer thickness of the lacquer layers 15, 16, 16 is 0.3 μm to 3 μm, preferably 0.5 μm to 1.5 μm.

Nach dem Drucken kann eine Strahlungshärtung, insbesondere durch UV-Bestrahlung bei Wellenlängen von 200 nm bis 415 nm erfolgen. Vor den einzelnen Druckschritten können noch Primer zur Verbesserung der Schichthaftung aufgetragen werden. Hierfür eignen sich beispielsweise Lacke auf Basis von PVC, Polyester oder Acrylaten in Schichtdicken von 0,01 µm bis 1 µm, bevorzugt von 0,02 µm bis 0,2 µm.After printing, radiation curing can take place, in particular by UV radiation at wavelengths from 200 nm to 415 nm. Before the individual printing steps, primers can be applied to improve the layer adhesion. For example, lacquers based on PVC, polyester or acrylates are suitable for this purpose in layer thicknesses of 0.01 μm to 1 μm, preferably from 0.02 μm to 0.2 μm.

Abschließend wird noch eine Kleberschicht 18 auf die Druckschichten aufgetragen, mit welcher der fertige Mehrschichtkörper 1 beispielsweise auf einem Sicherheitsdokument befestigt werden kann. Als Klebstoff eignet sich beispielsweise PVC, Polyester, Acrylate, Zelluloseester, Naturharze, Ketonharze, Polyamid, Polyurethan, Epoxidharze, oder Mischungen daraus. Die Schichtdicke der Kleberschicht beträgt dabei 1 µm bis 25 µm, bevorzugt 1 µm bis 15 µm.Finally, an adhesive layer 18 is applied to the printing layers, with which the finished multilayer body 1 can be attached, for example, to a security document. PVC, polyester, acrylates, cellulose esters, natural resins, ketone resins, polyamide, polyurethane, epoxy resins, or mixtures thereof are suitable as adhesives. The layer thickness of the adhesive layer is 1 µm to 25 µm, preferably 1 µm to 15 µm.

In Fig. 6A ist nun zu erkennen, wie die einzelnen Schichten des Mehrschichtkörpers 1 zusammenwirken. Der Hintergrund des Dekors wird von den sternförmigen Mustern der Lackschicht 17 gebildet. Über diesen liegt die lediglich bei UV-Bestrahlung sichtbare optische Information 161, die von der Lackschicht 16 gebildet wird. Der Vordergrund des Dekors wird von den Guillochenlinien der ersten optischen Information 131 und der zweiten optischen Information geformt.In Figure 6A it can now be seen how the individual layers of the multilayer body 1 interact. The background of the decor is from the star-shaped patterns of the lacquer layer 17 are formed. The optical information 161, which is only visible under UV radiation, and is formed by the lacquer layer 16 lies above this. The foreground of the decor is formed by the guilloche lines of the first optical information 131 and the second optical information.

Neben diesen Guillochenlinien können die erste und zweite optische Information noch weitere Merkmale ausbilden. Wie aus Fig. 6A ersichtlich, umfasst die erste optische Information 131 noch einen umlaufenden Mikrotext mit Kontrastumkehr auf der Basis von asymmetrischen Strukturen. Diese Kontrastumkehr kann beispielsweise mit Blaze- bzw. sogenannten Sägezahnstrukturen umgesetzt werden. Hierbei wird beispielsweise für die Kontur und die Füllung des Mikrotextes ein und dieselbe Blazestruktur verwendet, wobei diese um 180° gegeneinander verdreht angebracht werden. Dadurch ergibt sich eine typische Hell-Dunkel-Kontrastumkehr: In der normalen Betrachtungsposition erscheint beispielsweise die Füllung hell und die Kontur dunkel, nach einer 180° Drehung des OVDs in der Ebene erscheint die Kontur nun hell und die Füllung dunkel. Dieser visuelle Effekt zeichnet sich durch eine hohe Fälschungssicherheit und eine einfache Überprüfbarkeit aus. Typische Parameterwerte für die zu verwendenden Blazestrukturen sind Linienzahlen im Bereich von 500 Linien/mm bis 1500 Linien/mm und Strukturtiefen im Bereich von 200 nm bis 500 nm. Die Kontrastumkehr kann mit solchen farbigen oder auch mit gröberen achromatischen Blazestrukturen realisiert werden.In addition to these guilloche lines, the first and second optical information items can also form further features. How from Figure 6A As can be seen, the first optical information 131 also comprises a revolving microtext with reversal of contrast on the basis of asymmetrical structures. This contrast reversal can be implemented, for example, with blaze or so-called sawtooth structures. In this case, for example, the same blaze structure is used for the contour and the filling of the microtext, these being attached rotated by 180 ° relative to one another. This results in a typical reversal of light and dark contrast: in the normal viewing position, for example, the fill appears light and the contour dark, after a 180 ° rotation of the OVD in the plane, the contour now appears light and the fill dark. This visual effect is characterized by a high level of security against counterfeiting and easy verifiability. Typical parameter values for the blaze structures to be used are line numbers in the range from 500 lines / mm to 1500 lines / mm and structure depths in the range from 200 nm to 500 nm. The contrast reversal can be achieved with such colored or coarser achromatic blaze structures.

Im Zentrum der Guillochenlinien sind weitere Sicherheitsmerkmale angeordnet, die von der Metallschicht 13 im Zusammenwirken mit der Replizierschicht gebildet werden. Dabei kann es sich beispielsweise um Mikro- oder Nanostrukturen, DACs (diffractive area code), diffraktive Feinlinieneffekte (z.B. Transformationen, Verwandlungen, Pump-Effekte o.ä.) basierend auf farbigen oder achromatischen wirkenden Mikrostrukturen, binären oder kontinuierlichen Fresnel-Freiformflächen, Bildflipp-Effekte, oder auch andere entweder mit dem bloßen Auge erkennbare, oder mit einfachen zusätzlichen Hilfsmitteln (z.B. Lupe) erkennbare, oder mit speziellen Hilfsmitteln (z.B. Mikroskop) erkennbare, oder rein maschinenlesbare Sicherheitsstrukturen handeln.In the center of the guilloche lines, further security features are arranged, which are formed by the metal layer 13 in cooperation with the replication layer. These can be, for example, micro- or nanostructures, DACs (diffractive area code), diffractive fine line effects (e.g. Transformations, transformations, pump effects, etc.) based on colored or achromatic microstructures, binary or continuous Fresnel freeform surfaces, image flip effects, or others that are either visible to the naked eye or with simple additional aids (e.g. magnifying glass) act recognizable, or recognizable with special aids (e.g. microscope), or purely machine-readable security structures.

Auch im Bereich der zweiten optischen Information 151 können weitere Merkmale, wie beispielsweise diffraktive Feinlinieneffekte (z.B. Transformationen, Verwandlungen, Pump-Effekte o.ä.) basierend auf farbigen oder achromatischen wirkenden Mikrostrukturen, binären oder kontinuierlichen Fresnel-Freiformflächen, Bildflipp-Effekte, oder auch andere entweder mit dem bloßen Auge erkennbare, oder mit einfachen zusätzlichen Hilfsmitteln (z.B. Lupe) erkennbare, oder mit speziellen Hilfsmitteln (z.B. Mikroskop) erkennbare, oder rein maschinenlesbare Sicherheitsstrukturen, Mikro-oder Nanotext-Informationen, dynamische Farbeffekte oder dgl. vorgesehen sein. Insbesondere können Mikro-oder Nanotext-Informationen mit quasikontinuierlicher Größenvariation vorgesehen sein, im Bereich von 3 µm bis 2 mm, vorzugsweise im Bereich von 10 µm bis 500 µm, weiter vorzugsweise im Bereich von 20 µm bis 150 µm.In the area of the second optical information 151, further features, such as, for example, diffractive fine line effects (for example transformations, transformations, pump effects or the like) based on colored or achromatic microstructures, binary or continuous Fresnel freeform surfaces, image flip effects, or Other security structures, micro or nanotext information, dynamic color effects or the like, which can either be seen with the naked eye or can be recognized with simple additional aids (for example a magnifying glass) or can be recognized with special aids (for example a microscope), or can be read by machine only, or can be provided. In particular, micro- or nanotext information with quasi-continuous size variation can be provided, in the range from 3 μm to 2 mm, preferably in the range from 10 μm to 500 μm, further preferably in the range from 20 μm to 150 μm.

Der Mehrschichtkörper 1 kann nun auf ein Sicherheitsdokument 4, beispielsweise ein Ausweisdokument aufgebracht werden, wie in Fig. 7 dargestellt. Dies kann beispielsweise durch Heißprägen oder durch Auflaminieren, Einlaminieren, Hinterspritzen, UV-Transfer (Kaltprägen) erfolgen. Auch ein Einlaminieren des Mehrschichtkörpers 1 in das Sicherheitsdokument 4 ist möglich. Der Träger kann nach der Applikation abgezogen werden oder auf dem Substrat verbleiben. Weiterhin kann das Sicherheitselement 4 durch weitere aufgebrachte Lagen bzw. Schichten geschützt werden, beispielsweise durch eine darüber laminierte Schutzfolie. Weiterhin kann das Sicherheitsmerkmal 4 in einem ersten Schritt auf eine weitere Transferlage übertragen und in einem nächsten Schritt zusammen mit der Transferlage auf den zu sichernden Untergrund übertragen werden.The multilayer body 1 can now be applied to a security document 4, for example an identification document, as in FIG Fig. 7 shown. This can be done, for example, by hot stamping or by lamination, lamination, back injection, UV transfer (cold stamping). Laminating the multilayer body 1 into the security document 4 is also possible. The carrier can be peeled off after application or can remain on the substrate. Furthermore, the security element 4 can further layers or layers applied are protected, for example by a protective film laminated over them. Furthermore, the security feature 4 can be transferred to a further transfer layer in a first step and transferred to the substrate to be secured together with the transfer layer in a next step.

In dem in Fig. 7 dargestellten Ausführungsbeispiel für ein Sicherheitsdokument 4 wird der Mehrschichtkörper 1 so aufgebracht, dass er ein Identifikationsfoto 41 überlappt, so dass dieses nicht entfernt werden kann, ohne dass das Sicherheitsdokument 4 und/oder der Mehrschichtkörper 1 zerstört wird.In the in Fig. 7 The exemplary embodiment shown for a security document 4 is applied in such a way that the multilayer body 1 overlaps an identification photo 41 so that it cannot be removed without the security document 4 and / or the multilayer body 1 being destroyed.

Der Mehrschichtkörper 1 kann dabei in einem weiteren Schritt selbst noch mit weiteren Sicherheitsmerkmalen 42, 43 teilweise überdruckt werden. Dies kann beispielsweise im Tintenstrahldruck, Offsetdruck, Buchdruck oder Stahlstich erfolgen. Die Sicherheitsmerkmale 42, 43 können dabei auch individualisierte Informationen enthalten und stellen sicher, dass der Mehrschichtkörper 1 nicht vom Sicherheitsdokument 4 entfernt werden kann.In a further step, the multilayer body 1 can itself be partially overprinted with additional security features 42, 43. This can be done for example in inkjet printing, offset printing, letterpress printing or steel engraving. The security features 42, 43 can also contain individualized information and ensure that the multilayer body 1 cannot be removed from the security document 4.

Im Bereich 44 des Sicherheitsdokuments können ferner die notwendigen Personalisierungsinformationen für das Sicherheitsdokument 4 aufgedruckt werden. Eine mögliche Methode besteht im Aufdrucken der Personalisierungsinformation mittels Inkjet-Druck. Soll der Druck auch über dem Sicherheitsmerkmal erfolgen, benötigen insbesondere wasserbasierte Tinten eine spezielle rezeptive Schicht bzw. einer Farbannahmeschicht, damit der Druck in ausreichend kurzer Zeit trocknen kann. Derartige Schichten bestehen beispielsweise aus einer quellfähigen Schicht, einer mikroporösen Schicht oder aus einer Kombination von beiden. Quellfähige Schichten bestehen typischerweise aus Polyvinylalkohol, Polyvinylpyrrolidon, Gelatine-Derivaten, oder Cellulose-Ester oder auch aus Mischungen daraus. Schichtdicken liegen typischerweise im Bereich 3 µm bis 10 µm. Poröse Schichten bestehen beispielsweise aus Polyvinylalkoholen mit großen Mengen an Füllstoffen. Derartige Schichten weisen typische Schichtdicken von 5 µm bis 25 µm, bevorzugt von 5 µm bis 15 µm auf.The necessary personalization information for the security document 4 can also be printed in the area 44 of the security document. One possible method is to print the personalization information using inkjet printing. If printing is also to take place over the security feature, water-based inks in particular require a special receptive layer or an ink acceptance layer so that the print can dry in a sufficiently short time. Such layers consist for example of a swellable layer, a microporous layer or a combination of both. Swellable layers typically consist of polyvinyl alcohol, polyvinyl pyrrolidone, gelatin derivatives, or cellulose esters or from mixtures thereof. Layer thicknesses are typically in the range of 3 µm to 10 µm. Porous layers consist, for example, of polyvinyl alcohols with large amounts of fillers. Such layers have typical layer thicknesses from 5 μm to 25 μm, preferably from 5 μm to 15 μm.

Vorteilhafterweise sind solche Schichten ein Teil des Mehrschichtkörpers 1, sodass sie nach dem Aufbringen auf das Sicherheitsdokument 4 die oberste Lage bilden. Alternativ können solche Schichten auch nach dem Aufbringen auf das Sicherheitsdokument 4 aufgebracht werden, beispielsweise mittels Tiefdruck, Tampondruck, Siebdruck oder Flexodruck. Als weitere Alternative können solche Schichten als trockene Transferlage mittels eines separaten Transferverfahrens, wie beispielsweise mittels Heißprägung oder UV-Transfer (Kaltprägen), aufgebracht werden.Such layers are advantageously part of the multilayer body 1, so that they form the uppermost layer after being applied to the security document 4. Alternatively, such layers can also be applied to the security document 4 after application, for example by means of gravure printing, pad printing, screen printing or flexographic printing. As a further alternative, such layers can be applied as a dry transfer layer by means of a separate transfer process, for example by means of hot stamping or UV transfer (cold stamping).

Ein weiterer Bereich 45 steht für die Anbringung von maschinenlesbaren Daten zur Verfügung. Hier können beispielsweise biometrische Daten des Inhabers des Sicherheitsdokuments 4 gespeichert werden. Im Bereich 44 können maschinell erfassbare Informationen aufgedruckt sein, beispielsweise in der Form eines 1D- oder 2D-Barcodes. Besonders vorteilhaft werden dabei das Dokument eindeutig kennzeichnende Informationen, wie beispielsweise die Dokumentennummer und/oder Teile der Personaldaten, mittels kryptografischer Methoden verschlüsselt und als maschinell erfassbare Information auf das Dokument aufgedruckt. Mittels geeigneter Algorithmen kann anschließend die Stimmigkeit der Daten überprüft und so die Echtheit der Einträge verifiziert werden.Another area 45 is available for the attachment of machine-readable data. For example, biometric data of the holder of the security document 4 can be stored here. Machine-detectable information can be printed in area 44, for example in the form of a 1D or 2D barcode. Information that clearly identifies the document, such as, for example, the document number and / or parts of the personal data, is particularly advantageously encrypted using cryptographic methods and printed on the document as machine-detectable information. Using suitable algorithms, the correctness of the data can then be checked and the authenticity of the entries can be verified.

Vorteilhaft ist dabei, wenn die Dokumentennummer auch im Bereich des Mehrschichtkörpers 1, d.h. überlappend mit dem Mehrschichtkörper 1 eingebracht ist. Besonders vorteilhaft ist ein Einbringen mittels einer Technik, die zu einer nicht umkehrbaren Veränderung des Mehrschichtkörpers 1führt, beispielsweise mittels Laser.It is advantageous if the document number is also in the area of the multilayer body 1, i.e. is introduced overlapping with the multilayer body 1. It is particularly advantageous to introduce it using a technique that leads to an irreversible change in the multilayer body 1, for example using a laser.

Weiterhin können Teilbereiche der Metallschichten im ersten und oder zweiten Bereich insbesondere nach Applikation des Mehrschichtkörpers 1 auf das Sicherheitsdokument 4 mittels Laserstrahlung bearbeitet werden und so das Metall entfernt werden. Dies eignet sich insbesondere dazu, eine individuelle Kennzeichnung einzubringen, wie beispielsweise eine Nummer. Erfolgt diese Bearbeitung im zweiten Teilbereich, so wird in den vom Metall befreiten Bereichen der Farbdruck erkennbar, was zu einer weiteren Erhöhung der Sicherheit beiträgt. Weiterhin kann durch Anpassung der Laserparameter örtlich nur die Metallschicht entfernt werden oder zugleich die Farbschicht, sodass innerhalb einer Nummer Teilbereiche farbig oder nicht farbig ausgestaltet werden können, was zu einer weiteren Erhöhung der Sicherheit benutzt werden kann. Eine solche Bearbeitung kann bereits im Mehrschichtkörper 1 vor dem Aufbringen auf ein Substrat erfolgen oder erst danach.Furthermore, partial areas of the metal layers in the first and / or second area can be processed by means of laser radiation, in particular after application of the multilayer body 1 to the security document 4, and the metal can thus be removed. This is particularly suitable for introducing an individual identifier, such as a number. If this processing is carried out in the second section, the color printing can be seen in the areas freed from the metal, which contributes to a further increase in security. Furthermore, by adapting the laser parameters, only the metal layer can be removed locally or at the same time the color layer, so that partial areas can be colored or not colored within a number, which can be used to further increase security. Such processing can take place in the multilayer body 1 before it is applied to a substrate or only afterwards.

- Bezugszeichenliste- List of reference symbols

11
MehrschichtkörperMulti-layer body
1111
Trägerlagesupport layer
1212
Transferlagetransfer position
1313
Metallschichtmetal layer
131131
erste optische Informationfirst optical information
1414
Schutzlackprotective lacquer
1515
partielle Lackschichtpartial layer of paint
151151
zweite optische Informationsecond optical information
1616
partielle Lackschichtpartial layer of paint
161161
dritte optische Informationthird optical information
1717
partielle Lackschichtpartial layer of paint
171171
vierte optische Informationfourth optical information
1818
Kleberschichtadhesive layer
22
Bereich des MehrschichtkörpersArea of the multilayer body
33
Bereich des MehrschichtkörpersArea of the multilayer body
44
SicherheitsdokumentThe security document
4141
Fotophoto
4242
Sicherheitsmerkmalsafety feature
4343
Sicherheitsmerkmalsafety feature
4444
Bereich des SicherheitsdokumentsArea of the security document
4545
Bereich des SicherheitsdokumentsArea of the security document

Claims (15)

  1. Method for producing a multi-layer body (1) in the form of a security element, comprising the steps:
    a) generation of a metallic layer (13) on a substrate;
    b) partial demetallisation of the metallic layer (13) for forming a first piece of optical information (131) in a first region (2) of the multi-layer body (1);
    c) application of a partial lacquer layer (15) in a second region (3) of the multi-layer body (1) for forming a second piece of optical information (151), wherein the partial lacquer layer (15) at least partially extends beyond the metallic layer (13);
    d) structuring of the partial metallic layer (13) in the second region (3) by using the partial lacquer layer (15) as a mask, wherein the partial metallic layer (13) either selectively remains in the regions that are covered by the partial lacquer layer (15) or is selectively removed.
  2. Method according to claim 1,
    characterised in that
    the partial demetallisation in step b) takes place by etching.
  3. Method according to claim 2,
    characterised in that
    the partial lacquer layer (15) is an etch resist or comprises at least one etch resist, wherein the etch resist is preferably a lacquer, which comprises, in particular, binders, pigments, in particular multi-coloured or achromatic pigments and/or effect pigments, thin-film layer systems, cholesteric liquid crystals, dyes and/or metallic or non-metallic nanoparticles.
  4. Method according to one of the preceding claims,
    characterised in that,
    before the application of the partial lacquer layer (15) in step c), the metallic layer (13) is partially demetallised in the second region (3).
  5. Method according to claim 4,
    characterised in that
    the partial demetallisation of the metallic layer (13) in the second region (3) takes place by etching, wherein, in the second region (3), an etching agent, in particular a lye, is preferably printed onto the metallic layer (13), in particular by flexographic printing, or wherein a photoresist is preferably applied to the second region (3) before the etching and is exposed by using an exposure mask, and the exposure mask is preferably formed by means of a partial lacquer layer (15) applied to the substrate before the application of the metallic layer (13), or
    wherein an etch resist is preferably partially applied to the second region (3) before the etching and removed again after the etching.
  6. Method according to claim 4,
    characterised in that
    the partial demetallisation of the metallic layer (13) in the second region (3) takes place by means of lift-off or takes place by means of laser ablation or takes place by applying, in particular printing, a partial oil layer before the application of the metallic layer (13).
  7. Method according to one of claims 1 to 6,
    characterised in that
    the substrate is or comprises a replication layer having a surface relief moulded into a surface pointing towards the metallic layer (13), wherein the surface relief preferably comprises a partial region having a depth-to-width ratio of from 0.15 to 1.5, preferably from 0.2 to 0.5, which is complementary to the first piece of optical information (131), wherein a photoresist is preferably applied to the metallic layer (13) for the partial demetallisation of the metallic layer (13) in the first region and is exposed from the side of the substrate, and the metallic layer (13) is then partially demetallised by etching.
  8. Method according to one of claims 1 to 7,
    characterised in that
    at least one further partial lacquer layer (16, 17) is applied to the multi-layer body (1) for forming at least one further piece of optical information (161, 171), wherein the at least one further partial lacquer layer (16, 17) preferably comprises colourants, in particular multi-coloured or achromatic pigments and/or effect pigments, thin-film layer systems, cholesteric liquid crystals, dyes and/or metallic or non-metallic nanoparticles, and wherein further preferably the colourants can be energised in the ultraviolet and/or infrared spectrum for fluorescing and/or phosphorescing, in particular in the visible spectrum.
  9. Multi-layer body (1) in the form of a security element, wherein the multi-layer (1) comprises a substrate, a partial metallic layer and a partial lacquer layer (15), and wherein the partial metallic layer forms a first piece of optical information (131) in a first region (2), and the partial lacquer layer (15) forms a second piece of optical information (151) in a second region (3), and the partial lacquer layer (15) is arranged in register with the partial metallic layer in the second region (3),
    characterised in that
    the partial lacquer layer (15) extends both into regions that are covered by the metallic layer (13) and also into regions not covered by the metallic layer (13).
  10. Multi-layer body (1) according to claim 9,
    characterised in that
    the substrate is or comprises a replication layer having a surface relief, which is formed in a surface facing towards the metallic layer (13), wherein the surface relief introduced into the replication layer preferably forms an optically variable element, in particular a hologram, a preferably linear or crossed sinusoidal diffraction grating, a linear or crossed single- or multi-step rectangular grating, a zeroth order diffraction structure, an asymmetrical relief structure, a blazed grating, a preferably isotropic or anisotropic matt structure, or a light-diffracting and/or light-refracting and/or light-focusing microstructure or nanostructure, a binary or continuous Fresnel lens, a binary or continuous Fresnel freeform surface, a microprism structure or a combination structure thereof, and/or wherein the surface relief preferably comprises a partial region having a depth-to-width ratio of from 0.15 to 1.5, preferably from 0.2 to 0.5, which is complementary to the first piece of optical information (131).
  11. Multi-layer body (1) according to one of claims 9 or 10,
    characterised in that
    a layer thickness of the metallic layer (13) is from 10nm to 200nm, preferably from 10nm to 50nm, particularly preferably from 15nm to 35nm.
  12. Multi-layer body (1) according to one of claims 9 to 11,
    characterised in that
    at least one further partial lacquer layer (16, 17) is provided, which forms a further piece of optical information (161, 171).
  13. Multi-layer body (1) according to one of claims 9 to 12,
    characterised in that
    the partial lacquer layer (15) and/or the at least one further partial lacquer layer (16, 17) comprises colourants, in particular multi-coloured or achromatic pigments and/or effect pigments, thin-film layer systems, cholesteric liquid crystals, dyes and/or metallic or non-metallic nanoparticles, wherein the colourants can preferably be energised in the ultraviolet and/or infrared spectrum for fluorescing and/or phosphorescing, in particular in the visible spectrum.
  14. Multi-layer body (1) according to one of claims 9 to 13,
    characterised in that
    the first and/or second and/or further piece of optical information (131, 151, 161, 171) is formed in the shape of at least one motif, pattern, in particular a guilloche pattern, symbol, image, logo or alphanumerical characters, in particular numbers and/or letters, and/or is formed in the shape of one-dimensional or two-dimensional lined grid and/or dot grid, wherein the lined grid and/or dot grid preferably has a grid width of less than 300µm, preferably of less than 200µm and of more than 25µm, preferably more than 50µm, and/or comprises at least one machine-readable feature, in particular a barcode.
  15. Security document (4), in particular bank note, document of value, identity document, visa document, passport or credit card having a multi-layer body (1) according to one of claims 9 to 14.
EP15724532.5A 2014-05-07 2015-05-07 Multi-layer body and method for the production thereof Active EP3140127B1 (en)

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PL15724532T PL3140127T3 (en) 2014-05-07 2015-05-07 Multi-layer body and method for the production thereof
SI201531203T SI3140127T1 (en) 2014-05-07 2015-05-07 Multi-layer body and method for the production thereof
RS20200213A RS59973B1 (en) 2014-05-07 2015-05-07 Multi-layer body and method for the production thereof
HRP20200694TT HRP20200694T1 (en) 2014-05-07 2020-04-29 Multi-layer body and method for the production thereof

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DE102014106340.6A DE102014106340B4 (en) 2014-05-07 2014-05-07 Multi-layer body and process for its production and security document
PCT/EP2015/060050 WO2015169895A1 (en) 2014-05-07 2015-05-07 Multi-layer body and method for the production thereof

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AR (1) AR100330A1 (en)
CA (1) CA2946085C (en)
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Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102015015991A1 (en) * 2015-12-10 2017-06-14 Giesecke & Devrient Gmbh Security element with lenticular image
DE102016109633B4 (en) * 2016-05-25 2022-12-29 Leonhard Kurz Stiftung & Co. Kg Process for producing a volume hologram film with security elements designed as transfer sections
DE102017001348A1 (en) 2017-02-10 2018-08-16 Giesecke+Devrient Mobile Security Gmbh Generation of an optical security element
GB2562028B (en) * 2017-03-10 2022-02-23 Reproflex3 Ltd Improved De-Metallisation Method for Metallised Substrates, and De-Metallised Substrates Produced Thereby
DE102017106721A1 (en) 2017-03-29 2018-10-04 Leonhard Kurz Stiftung & Co. Kg Method for producing a multilayer film and a multilayer film, and a security element and a security document
DE102017005779A1 (en) 2017-06-19 2018-12-20 Giesecke+Devrient Mobile Security Gmbh Micro-optical element with color change
DE102017010744A1 (en) * 2017-11-21 2019-05-23 Giesecke+Devrient Currency Technology Gmbh Method for producing a security element with an opening in a metallic layer produced by laser radiation
US11167581B2 (en) 2018-04-06 2021-11-09 Proof Authentication Corporation Authentication hologram
JP2020075487A (en) * 2018-09-28 2020-05-21 三菱瓦斯化学株式会社 Multilayer body, authenticity discrimination method, authenticity discrimination system, and program
DE102018221975A1 (en) * 2018-12-17 2020-06-18 Bundesdruckerei Gmbh Hologram master for the production of individualized holograms with kinetic diffraction structures
DE102019109059A1 (en) * 2019-04-05 2020-10-08 Bundesdruckerei Gmbh ID, VALUE OR SECURITY DOCUMENT AND THE PROCESS AND DEVICE FOR PRODUCING SUCH
FR3103736B1 (en) 2019-11-29 2021-12-10 Idemia France Custom image formed from a metallic hologram
US20230018648A1 (en) * 2020-04-17 2023-01-19 Illinois Tool Works Inc. Embossed film assembly having pastel holographic security features
CN112406346A (en) * 2020-10-20 2021-02-26 航天信息股份有限公司 Printing method and system combining multiple printing modes based on positioning
DE102021002448A1 (en) * 2021-05-07 2022-11-10 Giesecke+Devrient Currency Technology Gmbh Multi-layer body and method for producing the same
KR102574400B1 (en) * 2021-06-21 2023-09-06 주식회사 씨에스와이 Etching method and apparatus of dental implant fixture
WO2023148511A1 (en) 2022-02-07 2023-08-10 Sun Chemical Corporation Water-based de-metallization resist

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0330733A1 (en) 1988-03-04 1989-09-06 GAO Gesellschaft für Automation und Organisation mbH Thread- or strip-like security element to be included in a security document, and a method of manufacturing same
WO2008017362A2 (en) 2006-08-09 2008-02-14 Ovd Kinegram Ag Method for producing a multi-layer body, and multi-layer body
EP1716007B1 (en) 2004-02-16 2008-07-09 Hueck Folien Ges.m.b.H Tamper-proof, color-shift security feature
WO2009053673A1 (en) 2007-10-23 2009-04-30 De La Rue International Limited Improvements in security elements
DE102007057658A1 (en) 2007-02-07 2009-06-04 Leonhard Kurz Stiftung & Co. Kg Security document in the form of a multilayer film body for viewing in incident light and in transmitted light, comprises a carrier film and a partial metallic reflective layer in a first region that is transparent or semi-transparent
WO2009080262A1 (en) 2007-12-20 2009-07-02 Giesecke & Devrient Gmbh Safety element and method for the production thereof

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
MY102798A (en) * 1987-12-04 1992-10-31 Portals Ltd Security paper for bank notes and the like
US20020130104A1 (en) * 2001-03-15 2002-09-19 Daniel Lieberman Demetallizing in register with a pre-printed web
KR100694336B1 (en) * 2002-08-28 2007-03-12 크레인 앤드 캄파니 인코퍼레이티드 Durable security devices and security articles employing such devices
FR2872322B1 (en) * 2004-06-23 2006-09-22 Arjowiggins Security Soc Par A ARTICLE SUCH AS A DATA CARRIER OR A PACKAGING DEVICE HAVING A SEMI-REFLECTIVE MULTILAYER INTERFERENCE STRUCTURE
EP1652688A1 (en) * 2004-10-29 2006-05-03 Arjowiggins Security Security device
ATE425017T1 (en) * 2004-10-29 2009-03-15 Hueck Folien Gmbh SAFETY ELEMENT
DE102005006277B4 (en) 2005-02-10 2007-09-20 Ovd Kinegram Ag Method for producing a multilayer body
DE102005025095A1 (en) * 2005-06-01 2006-12-07 Giesecke & Devrient Gmbh Data carrier and method for its production
CA2564764C (en) * 2005-10-25 2014-05-13 Jds Uniphase Corporation Patterned optical structures with enhanced security feature
FR2904723B1 (en) * 2006-08-01 2008-12-19 Arjowiggins Security Soc Par A SECURITY STRUCTURE, IN PARTICULAR FOR A DOCUMENT OF SECURITY AND / OR VALUE
JP4853177B2 (en) * 2006-08-23 2012-01-11 大日本印刷株式会社 Authenticity determination medium and article having the same, authenticity determination medium label, authenticity determination medium transfer sheet, and authenticity determination medium transfer foil
DE102007039996B4 (en) * 2007-02-07 2020-09-24 Leonhard Kurz Stiftung & Co. Kg Security element for a security document and method for its production
DE102008013073B4 (en) 2008-03-06 2011-02-03 Leonhard Kurz Stiftung & Co. Kg Process for producing a film element and film element
DE102008017652A1 (en) * 2008-04-04 2009-10-08 Leonhard Kurz Stiftung & Co. Kg Security element and method for producing a security element
DE102008036481A1 (en) * 2008-08-05 2010-02-11 Giesecke & Devrient Gmbh Method for producing security elements with matched motifs
DE102008036480A1 (en) 2008-08-05 2010-02-11 Giesecke & Devrient Gmbh Method for producing security elements with adapted motif layers
RU2531847C2 (en) * 2009-06-18 2014-10-27 Топпан Принтинг Ко., Лтд. Optical device and method of its fabrication
FR2948216B1 (en) 2009-07-17 2011-11-25 Arjowiggins Security SECURITY ELEMENT WITH PARALLAX EFFECT
DE102009033762A1 (en) 2009-07-17 2011-01-27 Leonhard Kurz Stiftung & Co. Kg Method for producing a multilayer body and multilayer body
BRPI0904979A2 (en) 2009-12-04 2011-07-19 Braskem Sa process for producing olefins, olefins, polyolefins, and use of polyolefins
JP2013222027A (en) * 2012-04-16 2013-10-28 Toppan Printing Co Ltd Display body and manufacturing method thereof
DE102013108666A1 (en) * 2013-08-09 2015-03-05 Leonhard Kurz Stiftung & Co. Kg Method for producing a multilayer body and multilayer body

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0330733A1 (en) 1988-03-04 1989-09-06 GAO Gesellschaft für Automation und Organisation mbH Thread- or strip-like security element to be included in a security document, and a method of manufacturing same
EP1716007B1 (en) 2004-02-16 2008-07-09 Hueck Folien Ges.m.b.H Tamper-proof, color-shift security feature
WO2008017362A2 (en) 2006-08-09 2008-02-14 Ovd Kinegram Ag Method for producing a multi-layer body, and multi-layer body
DE102007057658A1 (en) 2007-02-07 2009-06-04 Leonhard Kurz Stiftung & Co. Kg Security document in the form of a multilayer film body for viewing in incident light and in transmitted light, comprises a carrier film and a partial metallic reflective layer in a first region that is transparent or semi-transparent
WO2009053673A1 (en) 2007-10-23 2009-04-30 De La Rue International Limited Improvements in security elements
WO2009080262A1 (en) 2007-12-20 2009-07-02 Giesecke & Devrient Gmbh Safety element and method for the production thereof

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CA2946085C (en) 2022-08-30
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JP2017517415A (en) 2017-06-29
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US9975370B2 (en) 2018-05-22
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US20170066279A1 (en) 2017-03-09
EP3140127A1 (en) 2017-03-15

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