EP3035128B1 - Method for producing a decorated component of a timepiece or piece of jewellery - Google Patents

Method for producing a decorated component of a timepiece or piece of jewellery Download PDF

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Publication number
EP3035128B1
EP3035128B1 EP14198634.9A EP14198634A EP3035128B1 EP 3035128 B1 EP3035128 B1 EP 3035128B1 EP 14198634 A EP14198634 A EP 14198634A EP 3035128 B1 EP3035128 B1 EP 3035128B1
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EP
European Patent Office
Prior art keywords
decoration
component
producing
resin
base substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
EP14198634.9A
Other languages
German (de)
French (fr)
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EP3035128A1 (en
Inventor
Marc Stranczl
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nivarox Far SA
Original Assignee
Nivarox Far SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nivarox Far SA filed Critical Nivarox Far SA
Priority to CH01958/14A priority Critical patent/CH710531A2/en
Priority to EP14198634.9A priority patent/EP3035128B1/en
Priority to US14/918,912 priority patent/US9766590B2/en
Priority to JP2015224486A priority patent/JP6133961B2/en
Priority to CN201510944696.8A priority patent/CN105711326B/en
Publication of EP3035128A1 publication Critical patent/EP3035128A1/en
Priority to HK16114468A priority patent/HK1226030A1/en
Application granted granted Critical
Publication of EP3035128B1 publication Critical patent/EP3035128B1/en
Active legal-status Critical Current
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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B44—DECORATIVE ARTS
    • B44C—PRODUCING DECORATIVE EFFECTS; MOSAICS; TARSIA WORK; PAPERHANGING
    • B44C5/00—Processes for producing special ornamental bodies
    • B44C5/04—Ornamental plaques, e.g. decorative panels, decorative veneers
    • B44C5/0415—Ornamental plaques, e.g. decorative panels, decorative veneers containing metallic elements
    • G—PHYSICS
    • G04—HOROLOGY
    • G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B45/00—Time pieces of which the indicating means or cases provoke special effects, e.g. aesthetic effects
    • G04B45/0076—Decoration of the case and of parts thereof, e.g. as a method of manufacture thereof
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B44—DECORATIVE ARTS
    • B44C—PRODUCING DECORATIVE EFFECTS; MOSAICS; TARSIA WORK; PAPERHANGING
    • B44C1/00—Processes, not specifically provided for elsewhere, for producing decorative surface effects
    • B44C1/22—Removing surface-material, e.g. by engraving, by etching
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B44—DECORATIVE ARTS
    • B44C—PRODUCING DECORATIVE EFFECTS; MOSAICS; TARSIA WORK; PAPERHANGING
    • B44C3/00—Processes, not specifically provided for elsewhere, for producing ornamental structures
    • B44C3/005—Removing selectively parts of at least the upper layer of a multi-layer article
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B44—DECORATIVE ARTS
    • B44C—PRODUCING DECORATIVE EFFECTS; MOSAICS; TARSIA WORK; PAPERHANGING
    • B44C5/00—Processes for producing special ornamental bodies
    • B44C5/04—Ornamental plaques, e.g. decorative panels, decorative veneers
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • G—PHYSICS
    • G04—HOROLOGY
    • G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B19/00—Indicating the time by visual means
    • G04B19/04—Hands; Discs with a single mark or the like
    • G04B19/042—Construction and manufacture of the hands; arrangements for increasing reading accuracy
    • G—PHYSICS
    • G04—HOROLOGY
    • G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B19/00—Indicating the time by visual means
    • G04B19/06—Dials
    • G04B19/10—Ornamental shape of the graduations or the surface of the dial; Attachment of the graduations to the dial
    • G04B19/103—Ornamental shape of the graduations or the surface of the dial; Attachment of the graduations to the dial attached or inlaid numbers
    • G—PHYSICS
    • G04—HOROLOGY
    • G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B19/00—Indicating the time by visual means
    • G04B19/06—Dials
    • G04B19/18—Graduations on the crystal or glass, on the bezel, or on the rim
    • G—PHYSICS
    • G04—HOROLOGY
    • G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B19/00—Indicating the time by visual means
    • G04B19/30—Illumination of dials or hands
    • G04B19/32—Illumination of dials or hands by luminescent substances
    • G—PHYSICS
    • G04—HOROLOGY
    • G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B37/00—Cases
    • G04B37/0008—Cases for pocket watches and wrist watches

Definitions

  • the invention relates to a method for producing at least one component provided with a decoration of a timepiece or jewelry piece.
  • the invention also relates to a component provided with a decoration obtained according to the production process.
  • the bezel for example made of ceramic, can be marked in particular by gold, silver or platinum, with a marking in relief or in depth. If it is a deep marking, it is carried out by filling hollows previously formed on the support.
  • the principle used for carrying out this in-depth marking consists in first depositing a conductive layer by physical vapor deposition (PVD). Once the conductive layer is deposited, the hollows are filled with a metal by electroforming by immersing the part in a metal ion bath and passing an electric current through this bath. Thus the hollows are filled with metal to achieve said marking.
  • PVD physical vapor deposition
  • the object of the invention is therefore to propose a method for producing a component provided with a decoration of a timepiece or jewelry piece while overcoming the drawbacks of the aforementioned state of the art to facilitate the manufacture of such a decorated component, its reproducibility or its specificity.
  • the invention relates to a method for producing a component provided with a decoration of a timepiece or jewelry piece, which comprises the characteristics defined in independent claim 1.
  • An advantage of the process for producing a decorated component resides in the fact that it is possible to produce a decorative pattern in the upper part of the component very finely in the form of fine lace by a micromachining operation.
  • the decoration pattern is produced through the thickness of the upper part, which allows, when using a luminescent substance placed on a portion on the back of the upper part, to make said decoration visible even in the dark. .
  • the decorative pattern (s) are drawn or programmed on a computer.
  • the stored data of the reason (s) decor are supplied to a micro-machining machine so as to produce the upper part with the desired decor.
  • a technology of the LIGA type can be used to produce the upper part of the component.
  • a metal or semiconductor substrate such as silicon, on which a photosensitive resin is deposited.
  • This resin is illuminated through a mask representative of the pattern to be produced in the upper part. Galvanic growth of metal takes place in the open parts of the resin.
  • the base substrate is removed to obtain the upper part of the component.
  • This upper part of the pattern desired decoration is attached to a luminescent or colored substance or coated on its back with said substance.
  • the invention also relates to a decorated component obtained according to the production process, which comprises the characteristics mentioned in independent claim 9.
  • the decoration patterns relate to fine micrometric openings or openings, which are made in an upper part of the component by techniques defined as micromachining techniques.
  • the figures 1a and 1b show a first embodiment of a component 1 provided with a decoration in top view and in exploded simplified section for a timepiece or jewelry piece.
  • a decoration in top view and in exploded simplified section for a timepiece or jewelry piece.
  • the upper part 2 comprises a decorative motif 3, for example representing an image or several images.
  • the decoration is obtained by a micromachining technique, which can for example be a process of the LIGA-UV or DRIE type as explained below.
  • the decoration 3 is produced precisely and very finely in a micrometric manner through the material of the upper part 2 according to a desired programmed pattern.
  • the decorative motif is first of all drawn or programmed on a computer, and the memorized data of the design or motif are transmitted to a micromachining machine for the production of the decoration of the upper part 2.
  • the openings or micro-openings of decor 3 are shown very simplified on the figure 1b and do not directly correspond to the desired pattern shown in figure 1a .
  • the upper part 2 is fixed to a base support 5.
  • the upper part 2 is aligned by its axial opening 6 with another axial opening 7 of the support. base for its fixation.
  • a housing 8 in this base support 5 is also made, and is filled with a luminescent substance 4 or a desired paint.
  • the luminescent substance can be a defined Luminova substance, and it mainly comprises strontium aluminate or zinc sulfide depending on the desired color.
  • This substance 4 is deposited in the housing 8 of the base support 5 in particular up to the level of the opening of this housing 8.
  • the component 1 produced can advantageously be a watch hand.
  • the general shape of the upper part 2 may be similar to the general shape of the base support 5.
  • the openings 6 and 7 of substantially identical diameter allow the needle to be mounted on a drive shaft opening out of a dial. shows for example.
  • the drive shaft is fixed to one of the openings 6 and 7.
  • the finely crafted decoration 3 in the upper part can be very clearly visible also in the dark.
  • the component 1 provided with a decoration can be an applique, a dial, at least one date disc or other disc of a complication, such as for the display of the celestial vault with a starry sky in this way.
  • the component provided with a decoration can also be a part of the mechanism, such as a seconds wheel, an oscillating weight or another part, which must in principle be visible from the outside of the watch.
  • such a component 1 provided with a decoration can also be used in the field of the fight against any counterfeiting.
  • each pattern to be produced through the upper part 2 of the component 1 can be drawn on a computer and stored in a specific manner for each piece of timepiece or jewelry.
  • the decoration 3 is produced precisely in a micrometric manner, this complicates the production of any counterfeit.
  • the figures 2a and 2b show a second embodiment of a component 1 provided with a decoration in top view and in simplified section for a timepiece or jewelry piece.
  • a decoration in top view and in simplified section for a timepiece or jewelry piece.
  • FIG 2a there is an upper part 2 of component 1, which comprises a decor pattern 3.
  • This decor pattern 3 represents, for example, one image or several images.
  • the decoration is obtained by a technique of micromachining, which can for example be a LIGA-UV or DRIE type process as explained below.
  • the decoration 3 is produced precisely and very finely in a micrometric manner through the material of the upper part 2, which defines a fine lace.
  • the motif of the desired decoration 3 is first of all drawn or programmed on a computer, and the memorized data of the design or motif are transmitted to a micromachining machine for the production of the decoration of the upper part 2.
  • the openings or micro - decor 3 openings are shown very simplified on the figure 2b and do not correspond directly to the pattern shown in figure 2a .
  • the decoration 3 is coated with a luminescent substance 4 or with a colored substance, such as paint or colored lacquer.
  • the decoration 3 produced is considered transparent by making fine openings or decorative micrometric openings through the thickness of the upper part 2.
  • the substance coated on a portion of the back of the upper part 2 penetrates at least partially into the openings of the upper part. decor 3.
  • this substance 4 makes it possible to illuminate from below the decoration 3 produced through the fine openings of the upper part 2, in particular in the dark.
  • the axial opening 6 of the upper part 2 of the component 1 in the form of a needle allows the needle to be mounted on a drive shaft, which opens out from a watch dial.
  • the upper part 2 or the base substrate used to make the upper part 2 of the component 1 can be made of a metallic, semiconductor, ceramic, amorphous metal or other material.
  • ceramic material it concerns alumina, zirconia, magnesia, boron nitride, silicon nitride, silicon carbide, aluminum titanate and aluminum nitride, or other types of ceramic. he can even be provided to have an upper part 2 or base substrate made of amorphous metal, quartz, glass, sapphire, corundum or other type of precious stone.
  • a micromachining technique for producing in particular the upper part 2 of component 1 is, for example, the LIGA type process (Lithography, Galvanofomung und Abformung in German terminology).
  • a base substrate is used, which is preferably a semiconductor substrate, such as silicon, or even gallium arsenide, an upper layer of which can be conductive for performing the electroplating.
  • a metallic base substrate can also be taken, typically copper, which can avoid making a sacrificial conductive layer on the surface of the base substrate.
  • a photosensitive resin is deposited on the base substrate with the conductive layer on the surface.
  • This photosensitive resin can be a resin based on polyimide PMMA (poly-methyl methacrylate) or an octofunctional epoxy-based resin available from Shell Chemical under the reference SU-8 and a photoinitiator chosen from salts of triarylsulfonium.
  • This resin can be photopolymerized by means of ultra-violet (UV) radiation.
  • UV ultra-violet
  • a mask around the outline of the upper part 2 and of the motif of the decoration 3 to be produced on the base substrate is placed on the resin.
  • the mask may be a glass plate on which is produced a masking layer with opaque and transparent parts depending on the pattern to be produced.
  • Light radiation for example of the ultra-violet type, is directed onto the mask to irradiate parts of the resin which are not masked.
  • this type of resin used which is negative photosensitive resin, the non-irradiated parts can be removed by physical means or chemical. This makes it possible to define the shape of the upper part 2 with its decoration 3.
  • a positive photosensitive resin can also be used with a mask with a masking layer having opaque and transparent parts depending on the pattern to be produced.
  • This mask is the reverse of the mask used with negative resin. In this case, it is the irradiated parts of the resin that are removed.
  • an electroplating or electroplating operation is carried out. Growth of at least one metallic material takes place in the open parts of the resin from the conductive layer formed on the surface of the base substrate. Once the thickness of the deposited metal layer is sufficient, the upper part 2 is made with the desired decorative pattern 3 and can be detached from the base substrate while also removing the resin. The base metal or semiconductor material substrate can also be removed or removed before or after removal of the resin by a machining or selective dissolving operation.
  • the metallic materials deposited by the LIGA process can be nickel or nickel phosphorus alloys, or even copper-based alloys, gold or even steels. It can be used in principle any metal or metal alloy, which can be deposited by this galvanic process.
  • Another technique for producing the upper part 2 of component 1 consists in directly etching a base substrate in order to obtain the upper part directly.
  • the etching of the base substrate is a micromechanical machining.
  • the defined process DRIE Deep Reactive Ion Etching in English terminology
  • the base substrate must in principle be made of a material such as monocrystalline silicon, polycrystalline silicon, porous silicon, amorphous silicon, doped monocrystalline silicon, doped polycrystalline silicon, doped silicon carbide or not, silicon nitride doped or not or also on the basis of gallium arsenide.
  • quartz, photuran glass, and fragile materials such as sapphire, corundum for example.
  • a photosensitive resin of the negative or positive type must first be deposited on the base substrate, which is illuminated through a mask defining the contours of the pattern of the decoration 3 to be produced, as well as the periphery. of the upper part 2 to be made.
  • a photosensitive resin of the negative or positive type must first be deposited on the base substrate, which is illuminated through a mask defining the contours of the pattern of the decoration 3 to be produced, as well as the periphery. of the upper part 2 to be made.
  • a structured resin is used to obtain a mask of silicon oxide.
  • This silicon oxide mask will in turn be used as an etching mask for the defined DRIE process.
  • a silicon substrate is first taken, on which a silicon oxide (SiO2) of a certain thickness is produced.
  • a photosensitive resin is deposited and a structuring of this resin by photolithography is carried out.
  • Etching of the silicon oxide layer is performed by structuring the resin, which is subsequently removed.
  • a silicon substrate is obtained with an upper layer of structured silicon oxide. This structured layer of silicon oxide acts as a mask for etching the silicon in order to be able to produce the upper part 2.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Micromachines (AREA)
  • Adornments (AREA)

Description

L'invention concerne un procédé de réalisation d'au moins un composant muni d'un décor d'une pièce d'horlogerie ou de bijouterie.The invention relates to a method for producing at least one component provided with a decoration of a timepiece or jewelry piece.

L'invention concerne également un composant muni d'un décor obtenu selon le procédé de réalisation.The invention also relates to a component provided with a decoration obtained according to the production process.

Généralement dans tout procédé de réalisation d'un décor sur un composant d'une pièce d'horlogerie ou de bijouterie, il est difficile de structurer ledit décor pour pouvoir effectuer des découpes de fines dentelles ou pour pouvoir obtenir des microstructures. Plusieurs opérations de réalisation du décor sont également effectuées manuellement. Cela ne permet pas de reproduire facilement un même décor d'une pièce à une autre pièce, ce qui constitue un inconvénient.Generally, in any process for producing a decoration on a component of a timepiece or jewelry piece, it is difficult to structure said decoration in order to be able to cut fine lace or to be able to obtain microstructures. Several decorating operations are also performed manually. This does not easily reproduce the same decor from one room to another room, which is a drawback.

Dans la demande de brevet JP S60-17383 A , il est décrit un procédé de fabrication d'un cadran de montre muni d'un décor. Pour ce faire, des creux sont réalisés par gravure ou coupe mécanique selon un certain motif dans un substrat de base métallique du cadran. Une ou plusieurs peintures sont introduites dans les creux réalisés pour décorer ledit cadran de montre. Une opération de polissage peut encore être prévue pour finaliser le cadran décoré. Cependant il n'est également pas possible de réaliser un décor à motif fin sur ledit cadran, ce qui constitue un inconvénient.In the request of patent JP S60-17383 A , there is described a method of manufacturing a watch dial provided with a decoration. To do this, hollows are made by mechanical engraving or cutting in a certain pattern in a metal base substrate of the dial. One or more paints are introduced into the hollows made to decorate said watch face. A polishing operation can still be planned to finalize the decorated dial. However, it is also not possible to produce a decoration with a fine pattern on said dial, which constitutes a drawback.

Il est également connu dans l'état de la technique de réaliser une ou plusieurs pièces décoratives à monter sur une montre. Ces pièces décoratives consistent en l'incrustation d'éléments esthétiques sur une partie de la montre. Il peut s'agir d'une lunette de montre décorée de motifs, tels que des indices. La lunette, par exemple en céramique, peut être marquée notamment par de l'or, de l'argent ou du platine, avec un marquage en relief ou en profondeur. S'il s'agit d'un marquage en profondeur, il est réalisé par remplissage de creux préalablement formés sur le support.It is also known in the state of the art to produce one or more decorative pieces to be mounted on a watch. These decorative pieces consist of the inlaying of aesthetic elements on part of the watch. It can be a watch bezel decorated with patterns, such as clues. The bezel, for example made of ceramic, can be marked in particular by gold, silver or platinum, with a marking in relief or in depth. If it is a deep marking, it is carried out by filling hollows previously formed on the support.

Le principe utilisé pour la réalisation de ce marquage en profondeur consiste à déposer tout d'abord une couche conductrice par dépôt physique en phase vapeur (PVD). Une fois la couche conductrice déposée, les creux sont remplis d'un métal par électroformage en plongeant la pièce dans un bain à ions métalliques et à faire passer un courant électrique dans ce bain. Ainsi les creux se remplissent de métal pour réaliser ledit marquage. Cependant ce procédé est complexe et relativement lent à mettre en oeuvre pour réaliser la pièce décorative sur la montre, car il faut plusieurs étapes de réalisation, ce qui constitue un inconvénient. De plus, il n'est pas prévu d'obtenir de microstructures, ce qui constitue un autre inconvénient.The principle used for carrying out this in-depth marking consists in first depositing a conductive layer by physical vapor deposition (PVD). Once the conductive layer is deposited, the hollows are filled with a metal by electroforming by immersing the part in a metal ion bath and passing an electric current through this bath. Thus the hollows are filled with metal to achieve said marking. However, this process is complex and relatively slow to implement in order to produce the decorative part on the watch, since several production steps are required, which constitutes a drawback. In addition, it is not intended to obtain microstructures, which constitutes another drawback.

On peut citer à ce titre la demande de brevet EP 2 138 323 A1 , qui concerne une lunette de montre incrustée d'indices. Cependant comme précédemment mentionné, il n'est pas prévu d'obtenir facilement des microstructures ou de fines dentelles pour décorer un composant de la montre, ce qui constitue un inconvénient.We can cite as such the patent application EP 2 138 323 A1 , which concerns a watch bezel encrusted with indices. However, as previously mentioned, it is not intended to easily obtain microstructures or fine lace to decorate a component of the watch, which constitutes a drawback.

Il est également connu dans l'état de la technique la réalisation de pièces décoratives, qui sont constituées d'un substrat de base métallique, dans lequel sont incrustés des éléments, par exemple en verre. Pour ce faire, lesdits éléments sont disposés dans un moule et du métal liquide est coulé sur les éléments dans le moule. Une fois que le métal est solidifié, une opération de polissage doit encore être entreprise sur le substrat de base métallique, qui comprend les éléments décoratifs, pour le retrait d'un surplus de métal autour des éléments. Il n'est par contre pas possible de réaliser de fines décorations sur le substrat de base et de plus, les éléments décoratifs ne sont pas assurés d'être maintenus dans le substrat de base après polissage, ce qui constituent des inconvénients.It is also known in the state of the art the production of decorative pieces, which consist of a metal base substrate, in which elements, for example glass, are embedded. To do this, said elements are placed in a mold and liquid metal is poured on the elements in the mold. Once the metal is solidified, a further polishing operation must be undertaken on the metal base substrate, which includes the decorative elements, for the removal of excess metal around the elements. On the other hand, it is not possible to make fine decorations on the base substrate and, moreover, the decorative elements are not guaranteed to be maintained in the base substrate after polishing, which constitutes drawbacks.

Dans les documents US 2003/0007425 A1 , CH 155 823 , US 5,966,344 A et CH 314 048 , il est décrit la réalisation d'un composant de montre, tel qu'un cadran ou aiguille de montre. Il est effectué des trous traversants dans une plaque du composant pour définir un élément de décoration ou des indicateurs horaires pour un cadran de montre. Ces trous sont encore garnis d'une substance luminescente. Cependant, il n'est nullement prévu de réaliser un décor par micro-usinage de manière à obtenir des découpes de fines dentelles ou pour pouvoir obtenir des microstructures, ce qui constitue un inconvénient.In documents US 2003/0007425 A1 , CH 155 823 , US 5,966,344 A and CH 314 048 , there is described the production of a watch component, such as a watch dial or hand. Through holes are made in a component plate to define a decorative element or time indicators for a watch face. These holes are still lined with a luminescent substance. However, it is in no way intended to produce a decoration by micromachining so as to obtain cutouts of fine lace or to be able to obtain microstructures, which constitutes a drawback.

L'invention a donc pour but de proposer un procédé de réalisation d'un composant muni d'un décor d'une pièce d'horlogerie ou de bijouterie en palliant les inconvénients de l'état de la technique susmentionné pour faciliter la fabrication d'un tel composant décoré, sa reproductibilité ou sa spécificité.The object of the invention is therefore to propose a method for producing a component provided with a decoration of a timepiece or jewelry piece while overcoming the drawbacks of the aforementioned state of the art to facilitate the manufacture of such a decorated component, its reproducibility or its specificity.

A cet effet, l'invention concerne un procédé de réalisation d'un composant muni d'un décor d'une pièce d'horlogerie ou de bijouterie, qui comprend les caractéristiques définies dans la revendication indépendante 1.To this end, the invention relates to a method for producing a component provided with a decoration of a timepiece or jewelry piece, which comprises the characteristics defined in independent claim 1.

Des étapes particulières du procédé de réalisation d'un composant décoré sont définies dans les revendications dépendantes 2 à 8.Particular steps of the process for producing a decorated component are defined in dependent claims 2 to 8.

Un avantage du procédé de réalisation d'un composant décoré réside dans le fait qu'il est possible de réaliser un motif de décoration dans la partie supérieure du composant très finement sous forme de fines dentelles par une opération de micro-usinage. Le motif de décor est réalisé traversant l'épaisseur de la partie supérieure, ce qui permet, lors de l'emploi d'une substance luminescente placée sur une portion au dos de la partie supérieure, de rendre visible ledit décor même dans l'obscurité.An advantage of the process for producing a decorated component resides in the fact that it is possible to produce a decorative pattern in the upper part of the component very finely in the form of fine lace by a micromachining operation. The decoration pattern is produced through the thickness of the upper part, which allows, when using a luminescent substance placed on a portion on the back of the upper part, to make said decoration visible even in the dark. .

Avantageusement, le ou les motifs de décor sont dessinés ou programmés sur ordinateur. Les données mémorisées du ou des motifs de décor sont fournies à une machine de micro-usinage de manière à réaliser la partie supérieure avec le décor désiré.Advantageously, the decorative pattern (s) are drawn or programmed on a computer. The stored data of the reason (s) decor are supplied to a micro-machining machine so as to produce the upper part with the desired decor.

Avantageusement, il peut être utilisé une technologie du type LIGA pour réaliser la partie supérieure du composant. Pour ce faire, il est tout d'abord pris un substrat métallique ou semi-conducteur, tel que silicium, sur lequel une résine photosensible est déposée. Cette résine est illuminée à travers un masque représentatif du motif à réaliser dans la partie supérieure. Une croissance galvanique de métal s'opère dans les parties ouvertes de la résine. Par la suite, le substrat de base est retiré pour obtenir la partie supérieure du composant. Cette partie supérieure au motif de décoration souhaité est fixée sur une substance luminescente ou colorée ou enduite à son dos de ladite substance.Advantageously, a technology of the LIGA type can be used to produce the upper part of the component. To do this, it is first of all taken a metal or semiconductor substrate, such as silicon, on which a photosensitive resin is deposited. This resin is illuminated through a mask representative of the pattern to be produced in the upper part. Galvanic growth of metal takes place in the open parts of the resin. Subsequently, the base substrate is removed to obtain the upper part of the component. This upper part of the pattern desired decoration is attached to a luminescent or colored substance or coated on its back with said substance.

Avantageusement, il peut être utilisé une technologie du type DRIE de gravure sur un substrat semi-conducteur, tel que silicium pour réaliser la partie supérieure du composant avec le motif de décor.Advantageously, it can be used a technology of the DRIE type of etching on a semiconductor substrate, such as silicon, to produce the upper part of the component with the decorative pattern.

A cet effet, l'invention concerne également un composant décoré obtenu selon le procédé de réalisation, qui comprend les caractéristiques mentionnées dans la revendication indépendante 9.To this end, the invention also relates to a decorated component obtained according to the production process, which comprises the characteristics mentioned in independent claim 9.

Des formes particulières du composant décoré sont définies dans les revendications dépendantes 10 et 11.Particular shapes of the decorated component are defined in dependent claims 10 and 11.

Les buts, avantages et caractéristiques du procédé de réalisation d'un composant décoré d'une pièce d'horlogerie ou de bijouterie, ainsi que le composant décoré obtenu apparaîtront mieux dans la description suivante en regard des dessins sur lesquels :

  • les figures 1a et 1b représentent une vue de dessus et en coupe simplifiée d'une première forme d'exécution d'un composant de pièce de montre ou de bijouterie obtenu par le procédé de réalisation du composant selon l'invention, et
  • les figures 2a et 2b représentent une vue de dessus et en coupe simplifiée d'une seconde forme d'exécution d'un composant de pièce de montre ou de bijouterie obtenu par le procédé de réalisation du composant selon l'invention.
The aims, advantages and characteristics of the process for producing a decorated component of a timepiece or jewelry piece, as well as the decorated component obtained will appear better in the following description with regard to the drawings in which:
  • the figures 1a and 1b represent a view from above and in simplified section of a first embodiment of a component of a part of a watch or of jewelry obtained by the method for producing the component according to the invention, and
  • the figures 2a and 2b represent a view from above and in simplified section of a second embodiment of a component of a part of a watch or of jewelry obtained by the method for producing the component according to the invention.

Dans la description suivante toutes les techniques de réalisation des motifs de décoration d'un composant de montre ou de bijouterie, qui sont bien connues dans l'état de la technique, ne seront relatées que de manière simplifiée. Les motifs de décoration concernent des fines ouvertures ou ouvertures micrométriques, qui sont réalisées dans une partie supérieure du composant par des techniques définies comme des techniques de micro-usinage.In the following description, all the techniques for producing patterns for decorating a watch or jewelry component, which are well known in the state of the art, will only be described in a simplified manner. The decoration patterns relate to fine micrometric openings or openings, which are made in an upper part of the component by techniques defined as micromachining techniques.

Les figures 1a et 1b représentent une première forme d'exécution d'un composant 1 muni d'un décor en vue de dessus et en coupe simplifiée éclatée pour une pièce d'horlogerie ou de bijouterie. Sur la figure 1a, on remarque une partie supérieure 2 du composant 1. La partie supérieure 2 comprend un motif de décor 3, représentant par exemple une image ou plusieurs images. Le décor est obtenu par une technique de micro-usinage, qui peut être par exemple un procédé du type LIGA-UV ou DRIE comme expliqué ci-après.The figures 1a and 1b show a first embodiment of a component 1 provided with a decoration in top view and in exploded simplified section for a timepiece or jewelry piece. On the figure 1a , there is an upper part 2 of the component 1. The upper part 2 comprises a decorative motif 3, for example representing an image or several images. The decoration is obtained by a micromachining technique, which can for example be a process of the LIGA-UV or DRIE type as explained below.

Comme on peut mieux le voir sur la figure 1b, le décor 3 est réalisé précisément et très finement de manière micrométrique à travers le matériau de la partie supérieure 2 selon un motif programmé désiré. Le motif de décoration est tout d'abord dessiné ou programmé sur un ordinateur, et les données mémorisées du dessin ou motif sont transmises à une machine de micro-usinage pour la réalisation du décor de la partie supérieure 2. Les ouvertures ou micro-ouvertures du décor 3 sont montrées très simplifiées sur la figure 1b et ne correspondent pas directement au motif souhaité représenté à la figure 1a.As can best be seen from the figure 1b , the decoration 3 is produced precisely and very finely in a micrometric manner through the material of the upper part 2 according to a desired programmed pattern. The decorative motif is first of all drawn or programmed on a computer, and the memorized data of the design or motif are transmitted to a micromachining machine for the production of the decoration of the upper part 2. The openings or micro-openings of decor 3 are shown very simplified on the figure 1b and do not directly correspond to the desired pattern shown in figure 1a .

Dans cette première forme d'exécution une fois le micro-usinage du décor 3 réalisé, la partie supérieure 2 est fixée sur un support de base 5. La partie supérieure 2 est alignée par son ouverture axiale 6 sur une autre ouverture axiale 7 du support de base pour sa fixation. Un logement 8 dans ce support de base 5 est également réalisé, et est rempli d'une substance luminescente 4 ou une peinture souhaitée. La substance luminescente peut être une substance définie Luminova, et elle comprend principalement de l'aluminate de strontium ou du sulfure de zinc en fonction de la couleur souhaitée. Cette substance 4 est déposée dans le logement 8 du support de base 5 notamment jusqu'au niveau de l'ouverture de ce logement 8. Une fois la partie supérieure 2 fixée sur la surface supérieure du support de base 5 pour couvrir l'ouverture du logement 8 avec la substance 4, le composant 1 est terminé.In this first embodiment, once the decoration 3 has been micromachined, the upper part 2 is fixed to a base support 5. The upper part 2 is aligned by its axial opening 6 with another axial opening 7 of the support. base for its fixation. A housing 8 in this base support 5 is also made, and is filled with a luminescent substance 4 or a desired paint. The luminescent substance can be a defined Luminova substance, and it mainly comprises strontium aluminate or zinc sulfide depending on the desired color. This substance 4 is deposited in the housing 8 of the base support 5 in particular up to the level of the opening of this housing 8. Once the upper part 2 is fixed to the upper surface of the base support 5 to cover the opening of the housing 8 with substance 4, component 1 is finished.

Comme montré sur les figures 1a et 1b, le composant 1 réalisé peut avantageusement être une aiguille de montre. La forme générale de la partie supérieure 2 peut être similaire à la forme générale du support de base 5. Les ouvertures 6 et 7 d'un diamètre sensiblement identique permettent de monter l'aiguille sur un axe d'entraînement débouchant d'un cadran de montre par exemple. De préférence, l'axe d'entraînement est fixé à une des ouvertures 6 et 7. De plus, dans le cas d'une substance luminescente 4 disposée sous la partie supérieure 2 visible de l'extérieur de la pièce d'horlogerie ou de bijouterie, le décor 3 finement réalisé dans la partie supérieure peut être très nettement visible également dans l'obscurité.As shown on figures 1a and 1b , the component 1 produced can advantageously be a watch hand. The general shape of the upper part 2 may be similar to the general shape of the base support 5. The openings 6 and 7 of substantially identical diameter allow the needle to be mounted on a drive shaft opening out of a dial. shows for example. Preferably, the drive shaft is fixed to one of the openings 6 and 7. In addition, in the case of a luminescent substance 4 placed under the upper part 2 visible from the outside of the timepiece or of jewelry, the finely crafted decoration 3 in the upper part can be very clearly visible also in the dark.

Bien entendu, le composant 1 muni d'un décor peut être une applique, un cadran, au moins un disque de quantième ou autre disque d'une complication, tel que pour l'affichage de la voute céleste avec un ciel étoilé de cette manière. Le composant muni d'un décor peut aussi être une pièce du mécanisme, telle qu'une roue des secondes, une masse oscillante ou une autre pièce, qui doit être en principe visible de l'extérieur de la montre.Of course, the component 1 provided with a decoration can be an applique, a dial, at least one date disc or other disc of a complication, such as for the display of the celestial vault with a starry sky in this way. . The component provided with a decoration can also be a part of the mechanism, such as a seconds wheel, an oscillating weight or another part, which must in principle be visible from the outside of the watch.

Il est encore à noter qu'un tel composant 1 muni d'un décor peut aussi être utilisé dans le domaine de la lutte de toute contrefaçon. Dans ce cas chaque motif à réaliser à travers la partie supérieure 2 du composant 1 peut être dessiné sur ordinateur et mémorisé de manière spécifique pour chaque pièce d'horlogerie ou de bijouterie. Cependant comme le décor 3 est réalisé précisément de manière micrométrique, cela complique la réalisation de toute contrefaçon.It should also be noted that such a component 1 provided with a decoration can also be used in the field of the fight against any counterfeiting. In this case each pattern to be produced through the upper part 2 of the component 1 can be drawn on a computer and stored in a specific manner for each piece of timepiece or jewelry. However, as the decoration 3 is produced precisely in a micrometric manner, this complicates the production of any counterfeit.

Les figures 2a et 2b représentent une seconde forme d'exécution d'un composant 1 muni d'un décor en vue de dessus et en coupe simplifiée pour une pièce d'horlogerie ou de bijouterie. Comme précédemment sur la figure 2a, on remarque une partie supérieure 2 du composant 1, qui comprend un motif de décor 3. Ce motif de décor 3 représente par exemple une image ou plusieurs images. Le décor est obtenu par une technique de micro-usinage, qui peut être par exemple un procédé du type LIGA-UV ou DRIE comme expliqué ci-après.The figures 2a and 2b show a second embodiment of a component 1 provided with a decoration in top view and in simplified section for a timepiece or jewelry piece. As before on figure 2a , there is an upper part 2 of component 1, which comprises a decor pattern 3. This decor pattern 3 represents, for example, one image or several images. The decoration is obtained by a technique of micromachining, which can for example be a LIGA-UV or DRIE type process as explained below.

En regard de la figure 2b, le décor 3 est réalisé précisément et très finement de manière micrométrique à travers le matériau de la partie supérieure 2, ce qui définit une fine dentelle. Le motif du décor 3 désiré est tout d'abord dessiné ou programmé sur un ordinateur, et les données mémorisées du dessin ou motif sont transmises à une machine de micro-usinage pour la réalisation du décor de la partie supérieure 2. Les ouvertures ou micro-ouvertures du décor 3 sont montrées très simplifiées sur la figure 2b et ne correspondent pas directement au motif représenté à la figure 2a.Next to the figure 2b , the decoration 3 is produced precisely and very finely in a micrometric manner through the material of the upper part 2, which defines a fine lace. The motif of the desired decoration 3 is first of all drawn or programmed on a computer, and the memorized data of the design or motif are transmitted to a micromachining machine for the production of the decoration of the upper part 2. The openings or micro - decor 3 openings are shown very simplified on the figure 2b and do not correspond directly to the pattern shown in figure 2a .

Selon cette seconde forme d'exécution une fois le micro-usinage du décor 3 réalisé, au moins une portion du dos de la partie supérieure 2 est enduite d'une substance luminescente 4 ou d'une substance colorée, telle que de la peinture ou de la laque colorée. Le décor 3 réalisé est considéré comme transparent par réalisation des fines ouvertures ou ouvertures micrométriques décoratives à travers l'épaisseur de la partie supérieure 2. La substance enduite sur une portion du dos de la partie supérieure 2 pénètre au moins en partie dans les ouvertures du décor 3.According to this second embodiment, once the micromachining of the decoration 3 has been carried out, at least a portion of the back of the upper part 2 is coated with a luminescent substance 4 or with a colored substance, such as paint or colored lacquer. The decoration 3 produced is considered transparent by making fine openings or decorative micrometric openings through the thickness of the upper part 2. The substance coated on a portion of the back of the upper part 2 penetrates at least partially into the openings of the upper part. decor 3.

Dans le cas de l'emploi d'une substance luminescente (Luminova), cette substance 4 permet d'illuminer depuis dessous le décor 3 réalisé à travers les fines ouvertures de la partie supérieure 2, notamment dans l'obscurité. Comme précédemment l'ouverture axiale 6 de la partie supérieure 2 du composant 1 sous forme d'aiguille, permet de monter l'aiguille sur un axe d'entraînement, qui débouche d'un cadran de montre.In the case of the use of a luminescent substance (Luminova), this substance 4 makes it possible to illuminate from below the decoration 3 produced through the fine openings of the upper part 2, in particular in the dark. As previously, the axial opening 6 of the upper part 2 of the component 1 in the form of a needle allows the needle to be mounted on a drive shaft, which opens out from a watch dial.

La partie supérieure 2 ou le substrat de base utilisé pour réaliser la partie supérieure 2 du composant 1 peut être en matériau métallique, semi-conducteur, céramique, métal amorphe ou autre matériau. Concernant le matériau céramique, cela concerne l'alumine, la zircone, la magnésie, le nitrure de bore, le nitrure de silicium, le carbure de silicium, le titanate d'aluminium et le nitrure d'aluminium, ou d'autres types de céramique. Il peut même être prévu d'avoir une partie supérieure 2 ou substrat de base en métal amorphe, en quartz, en verre, en saphir, en corindon ou autre type de pierre précieuse.The upper part 2 or the base substrate used to make the upper part 2 of the component 1 can be made of a metallic, semiconductor, ceramic, amorphous metal or other material. Regarding ceramic material, it concerns alumina, zirconia, magnesia, boron nitride, silicon nitride, silicon carbide, aluminum titanate and aluminum nitride, or other types of ceramic. he can even be provided to have an upper part 2 or base substrate made of amorphous metal, quartz, glass, sapphire, corundum or other type of precious stone.

Une technique de micro-usinage pour réaliser notamment la partie supérieure 2 du composant 1 est par exemple le procédé du type LIGA (Lithographie, Galvanofomung und Abformung en terminologie allemande). Dans ce cas, il est utilisé un substrat de base, qui est de préférence un substrat semi-conducteur, tel que du silicium, voire de l'arséniure de gallium, dont une couche supérieure peut être conductrice pour effectuer la galvanoplastie. Cependant il peut aussi être pris un substrat de base métallique, typiquement du cuivre, ce qui peut éviter de réaliser une couche conductrice sacrificielle en surface du substrat de base.A micromachining technique for producing in particular the upper part 2 of component 1 is, for example, the LIGA type process (Lithography, Galvanofomung und Abformung in German terminology). In this case, a base substrate is used, which is preferably a semiconductor substrate, such as silicon, or even gallium arsenide, an upper layer of which can be conductive for performing the electroplating. However, a metallic base substrate can also be taken, typically copper, which can avoid making a sacrificial conductive layer on the surface of the base substrate.

Une résine photosensible est déposée sur le substrat de base avec la couche conductrice en surface. Cette résine photosensible peut être une résine à base de poly-imide PMMA (poly-méthyle méthacrylate) ou une résine à base d'époxy octofonctionnelle disponible chez Shell Chemical sous la référence SU-8 et d'un photo-initiateur choisi parmi les sels de triarylsulfonium. Cette résine peut être photo-polymérisée au moyen d'un rayonnement ultra-violet (UV). Cependant il peut aussi être imaginé d'avoir une résine sensible aux rayons X générés par un synchrotron, mais cette opération est trop onéreuse pour la réalisation de la partie supérieure 2 sur le substrat de base.A photosensitive resin is deposited on the base substrate with the conductive layer on the surface. This photosensitive resin can be a resin based on polyimide PMMA (poly-methyl methacrylate) or an octofunctional epoxy-based resin available from Shell Chemical under the reference SU-8 and a photoinitiator chosen from salts of triarylsulfonium. This resin can be photopolymerized by means of ultra-violet (UV) radiation. However, it can also be imagined to have a resin sensitive to X-rays generated by a synchrotron, but this operation is too expensive for the production of the upper part 2 on the base substrate.

Un masque au contour de la partie supérieure 2 et du motif du décor 3 à réaliser sur le substrat de base est disposé sur la résine. Le masque peut être une plaque de verre sur laquelle est réalisée une couche de masquage avec des parties opaques et transparentes selon le motif à réaliser. Un rayonnement lumineux par exemple du type ultra-violet est dirigé sur le masque pour irradier des parties de la résine non masquées. Avec ce type de résine utilisée, qui est une résine photosensible négative, les parties non irradiées peuvent être retirées par des moyens physiques ou chimiques. Cela permet de définir la forme de la partie supérieure 2 avec son décor 3.A mask around the outline of the upper part 2 and of the motif of the decoration 3 to be produced on the base substrate is placed on the resin. The mask may be a glass plate on which is produced a masking layer with opaque and transparent parts depending on the pattern to be produced. Light radiation, for example of the ultra-violet type, is directed onto the mask to irradiate parts of the resin which are not masked. With this type of resin used, which is negative photosensitive resin, the non-irradiated parts can be removed by physical means or chemical. This makes it possible to define the shape of the upper part 2 with its decoration 3.

Il est à noter qu'il peut aussi être utilisé une résine photosensible positive avec un masque avec une couche de masquage ayant des parties opaques et transparentes selon le motif à réaliser. Ce masque est l'inverse du masque utilisé avec la résine négative. Dans ce cas, ce sont les parties irradiées de la résine, qui sont retirées.It should be noted that a positive photosensitive resin can also be used with a mask with a masking layer having opaque and transparent parts depending on the pattern to be produced. This mask is the reverse of the mask used with negative resin. In this case, it is the irradiated parts of the resin that are removed.

Par la suite, il est effectué une opération de galvanoplastie ou électrodéposition. Une croissance d'au moins un matériau métallique s'opère dans les parties ouvertes de la résine depuis la couche conductrice réalisée en surface du substrat de base. Une fois que l'épaisseur de la couche métallique déposée est suffisante, la partie supérieure 2 est réalisée avec le motif de décor 3 souhaité et peut être détachée du substrat de base tout en retirant également la résine. Le substrat de base en métal ou en matériau semi-conducteur peut également être retiré ou supprimé avant ou après le retrait de la résine par une opération d'usinage ou de dissolution sélective.Subsequently, an electroplating or electroplating operation is carried out. Growth of at least one metallic material takes place in the open parts of the resin from the conductive layer formed on the surface of the base substrate. Once the thickness of the deposited metal layer is sufficient, the upper part 2 is made with the desired decorative pattern 3 and can be detached from the base substrate while also removing the resin. The base metal or semiconductor material substrate can also be removed or removed before or after removal of the resin by a machining or selective dissolving operation.

Il est à noter que les matériaux métalliques déposés par le procédé LIGA peuvent être des alliages de nickel ou nickel phosphore, ou encore des alliages à base de cuivre, or ou même des aciers. Il peut être utilisé en principe tout métal ou alliage métallique, qui peut être déposé par ce procédé galvanique.It should be noted that the metallic materials deposited by the LIGA process can be nickel or nickel phosphorus alloys, or even copper-based alloys, gold or even steels. It can be used in principle any metal or metal alloy, which can be deposited by this galvanic process.

Une autre technique de réalisation de la partie supérieure 2 du composant 1 consiste à graver directement un substrat de base pour obtenir directement la partie supérieure. La gravure du substrat de base est un usinage micromécanique. A ce titre, il est utilisé le procédé défini DRIE (Deep Reactive Ion Etching en terminologie anglaise). Pour ce faire, le substrat de base doit en principe être en matériau comme le silicium monocristallin, le silicium poly-cristallin, le silicium poreux, le silicium amorphe, le silicium monocristallin dopé, le silicium poly-cristallin dopé, le carbure de silicium dopé ou non, le nitrure de silicium dopé ou non ou également sur la base d'arséniure de gallium. Comme autre type de matériau susceptible d'être gravé, on peut encore citer le quartz, le verre photuran, et les matériaux fragiles comme le saphir, corindon par exemple.Another technique for producing the upper part 2 of component 1 consists in directly etching a base substrate in order to obtain the upper part directly. The etching of the base substrate is a micromechanical machining. As such, the defined process DRIE (Deep Reactive Ion Etching in English terminology) is used. To do this, the base substrate must in principle be made of a material such as monocrystalline silicon, polycrystalline silicon, porous silicon, amorphous silicon, doped monocrystalline silicon, doped polycrystalline silicon, doped silicon carbide or not, silicon nitride doped or not or also on the basis of gallium arsenide. As another type of material capable of being engraved, mention may also be made of quartz, photuran glass, and fragile materials such as sapphire, corundum for example.

Pour pouvoir graver le substrat, il doit tout d'abord être déposé une résine photosensible du type négatif ou positif sur le substrat de base, qui est illuminée à travers un masque définissant les contours du motif du décor 3 à réaliser, ainsi que le pourtour de la partie supérieure 2 à réaliser. En fonction du type de résine utilisée, il peut être prévu de retirer la résine irradiée et une opération de gravure est commencée dans la partie du substrat découvert. Par la suite, toute la résine peut être retirée afin d'obtenir le partie supérieure 2 du composant 1 avec le motif de décor 3 dans la partie supérieure 2.To be able to etch the substrate, a photosensitive resin of the negative or positive type must first be deposited on the base substrate, which is illuminated through a mask defining the contours of the pattern of the decoration 3 to be produced, as well as the periphery. of the upper part 2 to be made. Depending on the type of resin used, provision may be made to remove the irradiated resin and an etching operation is started in the portion of the exposed substrate. Subsequently, all the resin can be removed in order to obtain the upper part 2 of component 1 with the decor pattern 3 in the upper part 2.

Il est à noter qu'en réalité, une résine structurée est utilisée pour obtenir un masque d'oxyde de silicium. Ce masque d'oxyde de silicium sera à son tour utilisé comme masque de gravure pour le procédé défini DRIE. Pour ce faire selon une seconde variante du procédé défini DRIE, il est tout d'abord pris un substrat en silicium, sur lequel il est réalisé un oxyde de silicium (SiO2) d'une certaine épaisseur. Par la suite, une résine photosensible est déposée et une structuration de cette résine par photolithographie est effectuée. Une gravure de la couche d'oxyde de silicium est effectuée grâce à la structuration de la résine, qui est par la suite retirée. On obtient un substrat en silicium avec une couche supérieure d'oxyde de silicium structurée. Cette couche structurée d'oxyde de silicium fait office de masque pour la gravure du silicium pour pouvoir réaliser la partie supérieure 2.It should be noted that in reality, a structured resin is used to obtain a mask of silicon oxide. This silicon oxide mask will in turn be used as an etching mask for the defined DRIE process. To do this according to a second variant of the defined DRIE process, a silicon substrate is first taken, on which a silicon oxide (SiO2) of a certain thickness is produced. Subsequently, a photosensitive resin is deposited and a structuring of this resin by photolithography is carried out. Etching of the silicon oxide layer is performed by structuring the resin, which is subsequently removed. A silicon substrate is obtained with an upper layer of structured silicon oxide. This structured layer of silicon oxide acts as a mask for etching the silicon in order to be able to produce the upper part 2.

A partir de la description qui vient d'être faite, plusieurs variantes du procédé de réalisation d'un composant muni d'un décor d'une pièce d'horlogerie ou de bijouterie, et le composant obtenu peuvent être conçues par l'homme du métier sans sortir du cadre de l'invention définie par les revendications.From the description which has just been given, several variants of the method for producing a component provided with a decoration of a timepiece or jewelry piece, and the component obtained can be designed by those skilled in the art. trade without departing from the scope of the invention defined by the claims.

Claims (8)

  1. Method for producing a component (1) provided with a decoration (3) for a timepiece or piece of jewellery, the method includes the steps of:
    - taking a base substrate, and performing a micromachining operation on or in said base substrate in order to obtain an upper part (2) of the component, which is provided with a decoration (3) of micrometric structure traversing the thickness of the upper part (2) in a programmed pattern, and
    - fixing the upper part (2) on a luminescent or coloured substance (4), or coating a back portion of the upper part (2) with the luminescent or coloured substance (4),
    the method being characterized in that, after taking the base substrate and before fixing the upper part (2) on a luminescent or coloured substance or coating the back of the upper part (2) with the luminescent or coloured substance (4), the method includes the steps of:
    - depositing a layer of positive or negative photosensitive resin on the base substrate,
    - placing a contour mask of the upper part (2) and of the decorative pattern (3) to be made on the photosensitive resin,
    - illuminating the resin through the mask,
    - removing the illuminated resin portions, if the photosensitive resin is of the positive type, or removing the non-illuminated resin portions, if the photosensitive resin is of the negative type,
    - filling the portions removed from the resin with a metal, and
    - removing all the resin and detaching the upper part (2) with the obtained decorative pattern (3) from the base substrate.
  2. Method for producing a component (1) provided with a decoration (3) according to claim 1, wherein the base substrate is made of metallic material or includes a conductive surface layer of semiconductor material, characterized in that the upper part (2) with the decoration (3) is produced through the growth of at least one metallic material by an electroforming or electroplating operation in the open parts of the resin from the surface of the base substrate.
  3. Method for producing a component (1) provided with a decoration (3) according to claim 2, characterized in that once the upper part (2) with the decoration (3) has been made, the base substrate is removed or eliminated before or after removal of the resin by a machining or selective dissolution operation.
  4. Method for producing a component (1) provided with a decoration (3) according to claim 1, characterized in that the luminescent or coloured substance (4) is deposited in a housing (8) of a base support (5), and in that the upper part (2) with the created decoration (3), is fixed to the base support (5) to cover the opening of the housing (8) with the luminescent or coloured substance (4).
  5. Method for producing a component (1) provided with a decoration (3) according to claim 4, characterized in that the general shape of the upper part (2) is similar to the general shape of the base support (5), on which the upper part is fixed to obtain a component (1), which is a watch hand, and in that the substance (4) is a luminescent substance.
  6. Method for producing a component (1) provided with a decoration (3) according to claim 1, characterized in that a back portion of the upper part (2), on which the decoration is created, is coated with the luminescent or coloured substance (4), wherein the coloured substance is a paint or a coloured lacquer.
  7. Method for producing a component (1) provided with a decoration (3) according to claim 1, characterized in that the decorative pattern (3) is drawn on a computer, and in that stored decorative pattern data is transmitted to a micromachining machine to produce the upper part (2) with the decoration (3).
  8. Method for producing a component (1) provided with a decoration (3) according to claim 1, characterized in that the decorative pattern (3) is drawn in a specific manner for the timepiece or piece of jewellery equipped with said produced component (1) to prevent any counterfeiting.
EP14198634.9A 2014-12-17 2014-12-17 Method for producing a decorated component of a timepiece or piece of jewellery Active EP3035128B1 (en)

Priority Applications (6)

Application Number Priority Date Filing Date Title
CH01958/14A CH710531A2 (en) 2014-12-17 2014-12-17 Process for producing a component decorated with a timepiece or jewelery, and component produced by the method.
EP14198634.9A EP3035128B1 (en) 2014-12-17 2014-12-17 Method for producing a decorated component of a timepiece or piece of jewellery
US14/918,912 US9766590B2 (en) 2014-12-17 2015-10-21 Method of producing a decorated component for a timepiece or piece of jewellery, and component made by the method
JP2015224486A JP6133961B2 (en) 2014-12-17 2015-11-17 Method of manufacturing component with decoration for timer or accessory and component manufactured by the method
CN201510944696.8A CN105711326B (en) 2014-12-17 2015-12-16 Method for manufacturing decorative component for timepiece or piece of jewellery and component manufactured thereby
HK16114468A HK1226030A1 (en) 2014-12-17 2016-12-20 Method of producing a decorated component for a timepiece or piece of jewellery, and component made by the method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP14198634.9A EP3035128B1 (en) 2014-12-17 2014-12-17 Method for producing a decorated component of a timepiece or piece of jewellery

Publications (2)

Publication Number Publication Date
EP3035128A1 EP3035128A1 (en) 2016-06-22
EP3035128B1 true EP3035128B1 (en) 2020-09-16

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
EP14198634.9A Active EP3035128B1 (en) 2014-12-17 2014-12-17 Method for producing a decorated component of a timepiece or piece of jewellery

Country Status (6)

Country Link
US (1) US9766590B2 (en)
EP (1) EP3035128B1 (en)
JP (1) JP6133961B2 (en)
CN (1) CN105711326B (en)
CH (1) CH710531A2 (en)
HK (1) HK1226030A1 (en)

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EP3226084B1 (en) * 2016-03-29 2021-01-13 The Swatch Group Research and Development Ltd. Coloured timepiece component
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WO2019103977A1 (en) * 2017-11-21 2019-05-31 Firehouse Horology, Inc. Geometries for hairsprings for mechanical watches enabled by nanofabrication
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Also Published As

Publication number Publication date
CN105711326B (en) 2022-08-16
US20160179057A1 (en) 2016-06-23
JP6133961B2 (en) 2017-05-24
CH710531A2 (en) 2016-06-30
CN105711326A (en) 2016-06-29
EP3035128A1 (en) 2016-06-22
HK1226030A1 (en) 2017-09-22
US9766590B2 (en) 2017-09-19
JP2016114597A (en) 2016-06-23

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