EP2961602A1 - Revêtement antiréfléchissant - Google Patents

Revêtement antiréfléchissant

Info

Publication number
EP2961602A1
EP2961602A1 EP14756263.1A EP14756263A EP2961602A1 EP 2961602 A1 EP2961602 A1 EP 2961602A1 EP 14756263 A EP14756263 A EP 14756263A EP 2961602 A1 EP2961602 A1 EP 2961602A1
Authority
EP
European Patent Office
Prior art keywords
nonmetallic
layer
reflective coating
metal layer
group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP14756263.1A
Other languages
German (de)
English (en)
Inventor
Vladimir KLEPTSYN
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Lab-N-Fab LLC
Original Assignee
Lab-N-Fab LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lab-N-Fab LLC filed Critical Lab-N-Fab LLC
Publication of EP2961602A1 publication Critical patent/EP2961602A1/fr
Withdrawn legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
    • C23C28/345—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
    • C23C28/321—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer with at least one metal alloy layer
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
    • C23C28/322—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer only coatings of metal elements only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/111—Anti-reflection coatings using layers comprising organic materials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only
    • G02B1/115—Multilayers
    • G02B1/116—Multilayers including electrically conducting layers

Definitions

  • the invention relates to optical coatings, in particular, to anti-reflective optical coatings and can be used to avoid or largely decrease an ambient light reflection from displays and devices for optical communication and information processing.
  • a well known anti-reflective coating on a substrate described e.g. in P.W.Bauffle "Optical Coating Technology", pagel-3, fig.1-7 and page 4-11, section 4.3.2, published by SPIE, Washington, USA, 2004 includes one nonmetallic layer having a refractive index less than a substrate refractive index and of quarter-wave optical thickness (the optical thickness of layer is its physical thickness multiplied by the refractive index of the layer).
  • This known anti-reflective coating decreases an ambient light residual reflection to 1.5-2% instead of 4-5% of a bare substrate.
  • a drawback of this one-layer anti-reflective coating is a relatively high residual reflection.
  • Another well known anti-reflective coating on a substrate described e.g. in P.W.Bauffle "Optical Coating Technology", page 4-12, section 4.3.3.1, published by SPIE, Washington, USA, 2004 includes first nonmetallic layer having a refractive index greater than the substrate refractive index and second nonmetallic layer having a refractive index less than the refractive index of the first nonmetallic layer, wherein the first nonmetallic layer is placed between the second nonmetallic layer and a substrate.
  • This known anti-reflective coating decreases an ambient light residual reflection to 0.5-1% instead of 4-5% of a bare substrate.
  • a drawback of this two-layer anti-reflective coating is a pronounced color of reflected light instead of a needed neutral tint.
  • Another well known anti-reflective coating on a substrate described, e.g. in P.W.Baumeister "Optical Coating Technology", page 1-14, section 1.3.1.3, published by SPIE, Washington, USA, 2004 includes a set of alternate layers (not less than four layers) with a high and a low reflective indices.
  • This known anti-reflective coating decreases an ambient light residual reflection to 0.1-0.5% instead of 4-5% of a bare substrate.
  • a drawback of this multi-layer anti-reflective coating is a relatively high manufacture cost due to many layer deposition as well as adjustment difficulties.
  • An object of the invention is an anti-reflective coating supplying on a substrate providing an ambient light residual reflection for visible light as low as 0.1-0.5% at a needed neutral tint.
  • Another object of the invention while providing low ambient light residual reflection at a needed neutral tint is to minimize amount of layers (not more than three layers) anti-reflective coating consists of, which therefore ensures low cost.
  • these objects for visible light are reached with anti- reflective coating on a substrate including one metal layer of a thickness ranging from 2 to 5 nanometers and one nonmetallic layer having reflective index ranging from 1.3 to 1.6 and a thickness ranging from 40 to 80 nanometers, wherein the metal layer is placed between the nonmetallic layer and the substrate.
  • anti-reflective coating on substrate including one metal layer of a thickness ranging from 2 to 12 nanometers, first nonmetallic layer having refractive index not exceeding 1.7 and thickness ranges from 30 to 100 nanometers, second nonmetallic layer having refractive index greater than 1.7 and thickness ranges from 10 to 50 nanometers, with difference between refractive indices of second and first nonmetallic layers not less than 0.3, wherein second nonmetallic layer is placed on substrate, the metal layer is placed on second nonmetallic layer, and first nonmetallic layer is placed on the metal layer.
  • Fig.l shows a first embodiment of anti-reflective coating consisting of one nonmetallic layer having refractive index of not greater than 1.6 and one metal layer of a thickness ranging from 2 to 5 nanometers placed between the nonmetallic layer and substrate.
  • Fig.2 shows ambient visible light reflection spectrum of anti-reflective coating according to Fig.l.
  • Fig.3 shows a second embodiment of anti-reflective coating consisting of the first nonmetallic layer having refractive index of not greater than 1.7 and the second nonmetallic layer having refractive index of greater than 1.7 and one metal layer, wherein the second nonmetallic layer is placed on substrate, the metal layer is placed on second nonmetallic layer, first nonmetallic layer is placed on the metal layer.
  • Fig.4 shows ambient visible light reflection spectrum of anti-reflective coating according to Fig.3.
  • Fig.l a first embodiment of anti-reflective coating on substrate 3 for visible light including one metal layer 1 of a thickness ranging from 2 to 5 nanometers and one nonmetallic layer 2 having reflective index ranging from 1.3 to 1.6 and a thickness ranging from 40 to 80 nanometers, wherein the metal layer 1 is placed between the nonmetallic layer 2 and a substrate 3 is shown.
  • Anti-reflective coating works as follows.
  • the ambient white light 4 enters into the anti-reflective coating and is reflected from each interface: "air-nonmetallic layer 2", “nonmetallic layer 2 - metal layer 1", “metal layer 1 - substrate 3".
  • a total intensity of reflected light 5 is a very low at certain and properly chosen thickness and refractive index of the nonmetallic layer 1 and optical properties of metal and its thickness.
  • Metal layer preferably, is made of the metals chosen from a group comprising: gold Au, silver Ag, aluminum Al, copper Cu, chromium Cr, titanium Ti, nickel Ni, manganese Mn, molybdenum Mo, bismuth Bi, tin Sn, rhodium Rh, platinum Pt, antimony Sb and any alloy or solid solution of mentioned substances.
  • the metal layer 1 can include additionally sub-layers that have a thickness of not greater than 1 nanometer and made of materials selected from a group comprising: chromium Cr, titanium Ti, nickel Ni, vanadium V, zirconium Zr, hafnium Hf, niobium Nb, molybdenum Mo, and any mixture, alloy or solid solution of mentioned substances.
  • Thickness of metal layer 1 depends on which metal is used as well as on thickness and refractive index of nonmetallic layer 2 and ranges from 2 to 5 nanometers. Metal thickness lower than 2 nanometers has no significant influence on a visible reflection vs nonmetallic layer only. Metal thickness higher than 5 nanometers increases a visible reflection at "blue” and “red” wavelength ranges and, therefore, a total reflection of visible white light; also undesirable pronounced color of reflected light is generated.
  • Known methods are used for a deposition of metal layer 1 on substrate 3: thermal evaporation, evaporation by an electronic beam, deposition by pulverization, by an ion beam, by cathode pulverization, by vapor phase chemical deposition assisted by plasma, etc.
  • Nonmetallic layer 2 is made of substances selected from group comprising magnesium, calcium, barium, aluminum, lanthanum fluorides MgF 2 , CaF 2 , AIF 3 , LaF 3 , Si0 2 , and any mixture, alloy, or solid solution of mentioned substances. Also organic polymer group comprising of acrylate- and fluoro-polymers are used. Other materials having refractive index not exceeding 1.6 and not mentioned here are possible to use.
  • Thickness of nonmetallic layer 2 depends on type of nonmetallic substance, mainly on its refractive index, as well as on thickness and type of metal layer 1 and ranges from 40 to 80 nanometers.
  • Known methods are used for a deposition of nonmetallic layer 2: thermal evaporation, evaporation by an electronic beam, by pulverization by an ion beam, by cathode pulverization, by vapor phase chemical deposition assisted by plasma, etc. Also wet coating methods are used.
  • Substrate 3 (a display or other device outer surface) is made from a dielectric material, for example, from glass or polymer.
  • Fig.2 an ambient visible light reflection spectrum of anti-reflective coating according to Fig.l is depicted. It is clearly seen that a residual reflection of white light does not exceed 0.35% and has an almost neutral tint (due to a uniform reflection within the visible spectrum range).
  • a second embodiment of the invention is shown, This anti-reflective coating on substrate 3 for visible light, including one metal layer 1 of a thickness ranging from 2 to 12 nanometers, first nonmetallic layer 2 having refractive index not exceeding 1.7 and thickness ranges from 30 to 100 nanometers, second nonmetallic layer 6 having refractive index greater than 1.7 and thickness ranges from 10 to 50 nanometers, with difference between refractive indices of second and first nonmetallic layers not less than 0.3, wherein second nonmetallic layer 6 is placed on substrate 3, the metal layer 1 is placed on second nonmetallic layer 6, and first nonmetallic layer 2 is placed on the metal layer 1.
  • Anti-reflective coating works as follows.
  • the ambient white light 4 enters into the anti-reflective coating and is reflected from each interface: "air-nonmetallic layer 2", “nonmetallic layer 2 - metal layer 1", “metal layer 1 - second nonmetallic layer 6", “second nonmetallic layer 6 - substrate 3".
  • air-nonmetallic layer 2 enters into the anti-reflective coating and is reflected from each interface: "air-nonmetallic layer 2", “nonmetallic layer 2 - metal layer 1", “metal layer 1 - second nonmetallic layer 6", “second nonmetallic layer 6 - substrate 3".
  • the total intensity of reflected light 5 is very low with a proper choice of metal and nonmetallic materials, their thicknesses and refractive indices of nonmetallic layers 2 and 6.
  • Metal layer preferably, is made of the materials chosen from group comprising gold Au, silver Ag, aluminum Al, copper Cu, chromium Cr, titanium Ti, nickel Ni, manganese Mn, molybdenum Mo, bismuth Bi, tin Sn, rhodium h, platinum Pt, antimony Sb and any mixtures, alloys, solid solutions or intermetallic compounds of mentioned substances.
  • the metal layer 1 can include additionally sub-layers that have a thickness of not greater than 1 nanometer and made of materials selected from group comprising chromium Cr, titanium Ti, nickel Ni, vanadium V, zirconium Zr, hafnium Hf, niobium Nb, molybdenum Mo, and any mixtures, alloys, solid solutions, or intermetallic compounds of mentioned substances.
  • Thickness of the metal layer 1 depends on sort of metal and on thicknesses and refractive indices of nonmetallic layers 2 and 6, and ranges from 2 to 12 nanometers. Metal thickness lower than 2 nanometers has no significant influence on a visible reflection vs nonmetallic layers only. Metal thickness higher than 12 nanometers increases a visible reflection at "blue” and “red” wavelength ranges and, therefore, a total reflection of visible white light; also undesirable pronounced color of reflected light is generated.
  • Methods used for a deposition of metal layer 1 on nonmetallic layer 6 are known: magnetron sputtering, thermal evaporation, evaporation by an electronic beam, by pulverization, by an ion beam, by cathode pulverization, by (plasma enhanced) chemical vapor deposition, etc.
  • Methods used for a deposition of nonmetallic layers 2 and 6 are known: magnetron sputtering, thermal evaporation, electronic beam evaporation, sol-gel, (plasma enhanced) chemical vapor deposition, etc.
  • Nonmetallic layer 2 having refractive index not exceeding 1.7 is made of materials selected from group comprising magnesium, calcium, barium, aluminum, lanthanum fluorides MgF 2 , CaF 2 , BaF 2, AIF 3 , LaF 3 , silicon dioxide Si0 2 , and any mixture, alloy or solid solution of mentioned substances as well as organic polymer group comprising of acrylate- and fluoro-polymers. Also organic polymer group comprising of acrylate- and fluoro-polymers are used. Other materials having refractive index not exceeding 1.7 and not mentioned here are possible to use.
  • Second nonmetallic layer 6 having refractive index greater than 1.7 is made of materials selected from group comprising sapphire Al 2 0 3 , titanium dioxide Ti0 2 , zinc sulphide ZnS, tantalum pentoxide Ta 2 0 5 , zinc selenide ZnSe, gallium phosphide GaP, gallium nitride GaN, indium tin oxide ITO, niobium pentoxide Nb 2 0 5 , lead molibdate PbMo0 4 boron nitride BN, silicon nitride Si 3 N 4 , aluminum nitride AIN, silicon Si, germanium Ge, selenium Se, semiconductors A 3 B 5 type, semiconductors A 2 B 6 type, semiconductors A 5 B 6 type (arsenic, antimony and bismuth
  • Thickness of nonmetallic layer 6 depends on sort of nonmetallic materials of both layers 2 and 6 mainly on its reflective index and on thickness and sort of metal layer 1, and ranges from 10 to 50 nanometers.
  • Difference between refractive indices of second and first nonmetallic layers is not less than 0.3. Lower difference than 0.3 increases a visible reflection at "blue” and “red” wavelength ranges and, therefore, a total reflection of visible white light; also undesirable pronounced color of reflected light is generated.
  • Substrate (a display or other device outer surface) is made from dielectric material, for example, from glass or polymer.
  • Fig.4 an ambient light reflection spectrum of anti-reflective coating according to Fig.3 is depicted. It is clearly seen that a residual reflection of white light does not exceed 0.2% and has a neutral tint (due to a uniform reflection within the visible spectrum range).
  • anti-reflective coating an ambient light residual reflection as low as 0.1-0.5% at needed neutral tint. Also anti-reflective coating consists of not greater than three layers which therefore ensures low cost.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Laminated Bodies (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Optical Filters (AREA)

Abstract

L'invention concerne des revêtements optiques et peut être utilisée pour réduire de façon significative le reflet de lumière visible provenant d'une surface externe d'afficheurs ou d'autres dispositifs optiques pour une communication optique et un traitement d'informations. Le revêtement antiréfléchissant dans divers modes de réalisation consiste en deux ou trois couches qui comprennent une couche de métal d'une épaisseur allant dans divers modes de réalisation de 2 à 12 nanomètres et une ou deux couches non métalliques possédant des indices de réfraction et des épaisseurs dans certaines plages, la couche métallique étant placée soit entre la couche non métallique et un substrat soit entre les couches non métalliques.
EP14756263.1A 2013-03-01 2014-02-26 Revêtement antiréfléchissant Withdrawn EP2961602A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201315089207A 2013-03-01 2013-03-01
PCT/US2014/018578 WO2014134124A1 (fr) 2013-03-01 2014-02-26 Revêtement antiréfléchissant

Publications (1)

Publication Number Publication Date
EP2961602A1 true EP2961602A1 (fr) 2016-01-06

Family

ID=51428749

Family Applications (1)

Application Number Title Priority Date Filing Date
EP14756263.1A Withdrawn EP2961602A1 (fr) 2013-03-01 2014-02-26 Revêtement antiréfléchissant

Country Status (6)

Country Link
EP (1) EP2961602A1 (fr)
JP (1) JP2016528516A (fr)
KR (1) KR20150126885A (fr)
CN (1) CN105163939B (fr)
AU (1) AU2014223560A1 (fr)
WO (1) WO2014134124A1 (fr)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102427151B1 (ko) * 2015-08-31 2022-07-28 엘지디스플레이 주식회사 표시 장치
KR102478211B1 (ko) * 2016-04-08 2022-12-20 필킹톤 그룹 리미티드 발광 다이오드 디스플레이 및 이를 포함하는 절연 유리 유닛
CN106067652B (zh) * 2016-07-29 2022-03-08 杭州科汀光学技术有限公司 一种用于准分子激光的双波长增透膜以及光学膜厚监控***
FR3054892A1 (fr) * 2016-08-02 2018-02-09 Saint Gobain Substrat muni d'un empilement a proprietes thermiques comportant au moins une couche comprenant du nitrure de silicium-zirconium enrichi en zirconium, son utilisation et sa fabrication.
CN106291908B (zh) * 2016-10-18 2021-05-11 中国科学院国家天文台南京天文光学技术研究所 用于大型天文望远镜主镜的金增强型反射膜系及制备方法
JP7117081B2 (ja) * 2017-05-12 2022-08-12 Hoya株式会社 防塵レンズ及びその製造方法
KR102395098B1 (ko) 2017-06-30 2022-05-06 삼성디스플레이 주식회사 표시장치 및 그 제조 방법
CN108196334A (zh) * 2018-01-05 2018-06-22 京东方科技集团股份有限公司 一种偏光片及其制备方法、显示装置
KR20210072864A (ko) 2019-12-09 2021-06-18 현대자동차주식회사 적외선용 무반사 렌즈
CN113320248A (zh) * 2021-07-04 2021-08-31 北京载诚科技有限公司 显示薄膜及显示组件

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5744227A (en) * 1995-04-03 1998-04-28 Southwall Technologies Inc. Antireflective coatings comprising a lubricating layer having a specific surface energy
US6764580B2 (en) * 2001-11-15 2004-07-20 Chungwa Picture Tubes, Ltd. Application of multi-layer antistatic/antireflective coating to video display screen by sputtering
US7199046B2 (en) * 2003-11-14 2007-04-03 Tokyo Electron Ltd. Structure comprising tunable anti-reflective coating and method of forming thereof
US7994600B2 (en) * 2005-12-21 2011-08-09 Texas Instruments Incorporated Antireflective coating
US8355418B2 (en) * 2009-09-17 2013-01-15 Soraa, Inc. Growth structures and method for forming laser diodes on {20-21} or off cut gallium and nitrogen containing substrates

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See references of WO2014134124A1 *

Also Published As

Publication number Publication date
CN105163939B (zh) 2017-09-29
WO2014134124A1 (fr) 2014-09-04
JP2016528516A (ja) 2016-09-15
KR20150126885A (ko) 2015-11-13
AU2014223560A1 (en) 2015-10-29
CN105163939A (zh) 2015-12-16

Similar Documents

Publication Publication Date Title
WO2014134124A1 (fr) Revêtement antiréfléchissant
TWI531821B (zh) 干涉濾光器、光模組及分析裝置
US11422290B2 (en) Antireflection film, optical element, and optical system
US7133197B2 (en) Metal-dielectric coating for image sensor lids
JP2004152727A (ja) 透明導電膜
RU2578071C1 (ru) Ir-отражающая и прозрачная система слоев, имеющая стабильную окраску, и способ ее изготовления, стеклоблок
EP2962136A1 (fr) Filtre couleur réfléchissant et dispositif d'affichage couleur
JP2009083183A (ja) 光学薄膜積層体
US11194078B2 (en) Antireflection film having silver-containing layer and fluorocarbon layer, method for producing antireflection film, optical element, and optical system
CN102375173A (zh) 干涉滤光片、光模块及分析装置
US11747520B2 (en) Optical thin film having metal layer containing silver and high standard electrode potential metal
JP2017030348A (ja) 積層膜及び熱線反射材
US10641927B2 (en) Optical thin film, optical element, optical system, and method for producing optical thin film
JP6302688B2 (ja) 高反射膜、高反射膜付き基板及び高反射膜の製造方法
US20140248507A1 (en) Anti-reflective coating
JP2004334012A (ja) 反射防止膜及び光学フィルター
JP6727454B2 (ja) 反射防止膜、光学素子および光学系
JP3221349B2 (ja) 熱線反射膜
WO2015053371A1 (fr) Conducteur transparent
JPH1130705A (ja) 反射防止膜を有する眼鏡プラスチックレンズ
KR20220042931A (ko) 다층 박막 코팅이 구비된 투명 기재
JPH052173A (ja) 液晶表示装置
WO2018135124A1 (fr) Miroir csp et procédé de production de substrat en verre avec film pour miroirs csp
TW202043841A (zh) 液體透鏡及具有低反射率電極結構之液體透鏡製品
CN114114743A (zh) 一种lcos显示装置及其制作方法

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

17P Request for examination filed

Effective date: 20150930

AK Designated contracting states

Kind code of ref document: A1

Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

AX Request for extension of the european patent

Extension state: BA ME

DAX Request for extension of the european patent (deleted)
STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWN

18D Application deemed to be withdrawn

Effective date: 20160901