EP2820453A1 - Réseau de diffraction et procédé de fabrication - Google Patents

Réseau de diffraction et procédé de fabrication

Info

Publication number
EP2820453A1
EP2820453A1 EP13708714.4A EP13708714A EP2820453A1 EP 2820453 A1 EP2820453 A1 EP 2820453A1 EP 13708714 A EP13708714 A EP 13708714A EP 2820453 A1 EP2820453 A1 EP 2820453A1
Authority
EP
European Patent Office
Prior art keywords
reflection
layer system
grating
substrate
diffraction grating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP13708714.4A
Other languages
German (de)
English (en)
Inventor
Frank Fuchs
Uwe D. ZEITNER
Ernst-Bernhard Kley
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fraunhofer Gesellschaft zur Forderung der Angewandten Forschung eV
Friedrich Schiller Universtaet Jena FSU
Original Assignee
Fraunhofer Gesellschaft zur Forderung der Angewandten Forschung eV
Friedrich Schiller Universtaet Jena FSU
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fraunhofer Gesellschaft zur Forderung der Angewandten Forschung eV, Friedrich Schiller Universtaet Jena FSU filed Critical Fraunhofer Gesellschaft zur Forderung der Angewandten Forschung eV
Publication of EP2820453A1 publication Critical patent/EP2820453A1/fr
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1861—Reflection gratings characterised by their structure, e.g. step profile, contours of substrate or grooves, pitch variations, materials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only
    • G02B1/115—Multilayers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D5/00—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
    • B05D5/06—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures to obtain multicolour or other optical effects
    • B05D5/061—Special surface effect
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0816—Multilayer mirrors, i.e. having two or more reflecting layers
    • G02B5/0825—Multilayer mirrors, i.e. having two or more reflecting layers the reflecting layers comprising dielectric materials only
    • G02B5/0833—Multilayer mirrors, i.e. having two or more reflecting layers the reflecting layers comprising dielectric materials only comprising inorganic materials only
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1847—Manufacturing methods
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1866—Transmission gratings characterised by their structure, e.g. step profile, contours of substrate or grooves, pitch variations, materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D2350/00—Pretreatment of the substrate
    • B05D2350/30—Change of the surface
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B2005/1804—Transmission gratings

Definitions

  • the invention relates to a diffraction grating and a method for its production.
  • Diffraction gratings are characterized by a periodic arrangement of a unit cell. This causes a periodic disturbance of the propagation of an electromagnetic wave, in particular light. The influence of the propagation of the electromagnetic wave is effected either by a local change of the absorption or the propagation velocity of the wave striking the grating. Such a periodic disturbance is produced, for example, by a change in the local refractive index of an otherwise homogeneous and typically transparent medium. In this case, the diffraction grating is called an index grid or volume grating.
  • the diffraction grating is a transmissive or
  • the desired optical effect of a diffraction grating usually consists of light incident on the diffraction grating with a high efficiency in a desired
  • n P m / P in , where Pi n is the light power incident on the grating and P m is the m-th
  • the index contrast i. the difference in refractive indices ⁇ of the grating regions is typically relatively small in bulk gratings, e.g. B. ⁇ ⁇ 0.1, so that for a high diffraction efficiency, the thickness of the index modulated region must be large. This leads to low bandwidths of
  • surface gratings typically have one
  • a surface grid also has the disadvantage of a sensitive surface, which is difficult to clean when dirty. This is disadvantageous in many applications.
  • the invention has for its object to provide an improved diffraction grating, which is increased by an
  • Diffraction efficiency and a comparatively insensitive Surface distinguishes. Furthermore, an advantageous method for producing such a diffraction grating should be specified. These tasks are performed by a diffraction grating and a
  • the diffraction grating comprises a substrate and a grid region having in a direction parallel to the substrate a periodic arrangement of first regions with a first grid material and second regions with a second grid material, wherein the first grid material and the second grid material comprise solid materials different refractive indices are.
  • the diffraction grating comprises a reflection-reducing or reflection-increasing layer system which has at least two layers with different refractive indices and is arranged on a side of the grating region facing away from the substrate.
  • Reflection-enhancing layer system is preferred
  • the grating region is arranged in the diffraction grating between the substrate and the reflection-reducing or reflection-increasing layer system, the grating region is advantageously protected from external influences,
  • the reflection-reducing or reflection-increasing layer system on the side facing away from the substrate side of the grating region also serves advantageously to increase the diffraction efficiency of the diffraction grating.
  • the diffraction grating can be any suitable diffraction grating.
  • the diffraction grating can be any suitable diffraction grating.
  • reflection-reducing layer system By reducing the reflection of incident radiation increases
  • the diffraction grating is a reflection grating in which the rear side of the substrate facing away from the grating region is the light entry surface and light exit surface.
  • the layer system on the side facing away from the substrate side of the grid region is a reflection-increasing layer system. Increasing the reflection of the light on the back of the grating area increases the diffraction efficiency.
  • a further layer system is arranged between the substrate and the grid region, which comprises at least two layers with different layers
  • the grating region is thus surrounded on both sides by layer systems of at least two layers each having different refractive indices.
  • the diffraction grating is a
  • each reflection-reducing layer systems are.
  • each reflection-reducing layer system on the substrate is arranged, each reflection-reducing layer systems are.
  • the reflection-reducing layer system between the substrate and the grating region advantageously reduces the reflection of the radiation transmitted by the grating region at the transition to the substrate.
  • the substrate of the diffraction grating is preferably a transparent substrate, in particular a glass, for example silica glass, or a transparent one
  • the diffraction grating is a reflection grating in which the grating region
  • reflection-enhancing layer system is and the other
  • Layer system is a reflection-reducing layer system.
  • the reflection of the incident light is advantageously reduced and, on the other hand, the reflection at the rear side of the grating region is increased.
  • the diffraction grating is a reflection grating, in which the side of the layer system facing away from the substrate, that on the substrate
  • the light entrance surface is arranged opposite side of the grid region, the light entrance surface and light exit surface.
  • Layer system on the side facing away from the substrate side of the grid region is in this embodiment reflection-reducing layer system and the further layer system a reflection-increasing layer system.
  • the reflection of the incident light is advantageously reduced and, on the other hand, the reflection at the rear side of the grating region is increased. In this way, the diffraction efficiency is improved.
  • the first grid material, from which the first areas of the grid area are formed, has a refractive index ni> 1.
  • Areas of the grid area are formed, has a
  • the first and second regions in the grating region thus advantageously form a periodic arrangement of regions with alternately low
  • the difference of the refractive indices ⁇ n2 - ni> 0.4.
  • ⁇ > 0.4 makes it possible in particular, a high diffraction efficiency with a comparatively thin
  • Grid area advantageously simplifies the production of the grid area.
  • Expansion of the first and second regions in the direction perpendicular to the substrate direction is preferably between 200 nm and 2000 nm.
  • the periodic arrangement of the first areas and second areas in the grid area preferably has one
  • Period length of less than 5 ⁇ , more preferably of less than 1 ⁇ on.
  • the dielectric materials may in particular be oxides, nitrides, oxynitrides or fluorides such as, for example, SiO 2 , TiO 2 , Ta 2 O 5 , SiN, SiON or MgF 2 .
  • the first grid material is preferably a material with a comparatively low refractive index ni, the
  • the first grid material can be, for example, a silicon oxide,
  • the second grid material advantageously has a comparatively high refractive index n 2 , which is, for example, n 2 > 1.6.
  • Grid material may be, for example, titanium dioxide (TiO 2 ) or tantalum pentoxide (Ta 2 Os).
  • the at least two layers of the reflection-reducing or reflection-increasing layer system and / or of the further layer system are in each case dielectric layers.
  • the dielectric layers may comprise dielectric materials in the form of oxides, nitrides, oxynitrides or fluorides, such as SiO 2 , TiO 2 , Ta 2 Os, SiN, SiON or MgF 2 .
  • Grid material and / or the second layer material is equal to the second grid material.
  • At least one layer material of the reflection-reducing or reflection-increasing layer system and / or of the further layer system equal to a grid material, or even both layer materials are equal to the grid materials.
  • Layer system and / or the further layer system advantageously contain at least three, preferably at least four or more preferably even at least five layers with alternating refractive indices.
  • the reflection-reducing or reflection-increasing layer system and / or the further layer system are each optical
  • Interfacial layer systems consisting of alternating layers with alternating low refractive index and high
  • the thicknesses of the alternating layers of the layer systems are dependent on the wavelength at which the
  • Diffraction grating should be used for a maximum
  • Simulation calculations for example by means of RCWA (Rigorous Coupled Wave Analysis) taking into account all layers of the diffraction grating including the Grid area.
  • RCWA Ragorous Coupled Wave Analysis
  • Bandwidth of the reflection or transmission maximum can be increased.
  • the solid material of the substrate or the solid material of the layer applied to the substrate acts as a first grid material.
  • the generation of the periodic arrangement of recesses is preferably carried out by means of a lithographic
  • a grid region is created by filling the recesses with a further solid material, which acts as a second grid material.
  • the first grid material and the second grid material have different refractive indices. Refilling the
  • Recesses with the other solid material is preferably carried out by atomic layer deposition (ALD, Atomic Layer Deposition). This procedure is especially good
  • Reflection-increasing layer system the at least two
  • Reflection-increasing layer system thus follows the grid area as seen from the substrate and is preferably arranged on the grid area.
  • a further layer system comprising at least two layers with different layers
  • Layer system may be a reflection-enhancing layer system in the case of a reflection grating or a reflection-reducing layer system, in particular in the case of
  • the further layer system is arranged between the substrate and the grid region and can be applied in particular to the substrate.
  • reflection-enhancing layer system or further
  • Coating method in particular with PVD or CVD methods such as thermal evaporation,
  • Electron beam evaporation or sputtering done.
  • Figure 1 is a schematic representation of a cross section through a diffraction grating according to a
  • Figure 2 is a schematic representation of the diffraction efficiency of the diffraction grating of Figure 1 as a function of the wavelength.
  • the diffraction grating 10 shown in FIG. 1 has a
  • Substrate 1 a grating region 3, a reflection-reducing layer system 4 on a side facing away from the substrate 1 side of the grating region 3 and a further reflection-reducing layer system 2 between the substrate 1 and the grating region 3.
  • the diffraction grating 10 is a transmission grating, so that the substrate 1 is a transparent substrate.
  • the substrate 1 of the diffraction grating 10 is a substrate of silica glass (fused
  • silica silica
  • another substrate 1, preferably made of a glass or a transparent one could also be used
  • the grid region 3 has a periodic arrangement of first regions 31 of a first grid material and second regions 32 of a second grid material.
  • the thickness of the grating region 3 of the diffraction grating 10 is preferably between 200 nm and 2000 nm and the
  • Period length less than 5 ym, preferably less than 1 ym.
  • the thickness of the grating region is 1012 nm and the period length of the grating region is 1012 nm
  • Diffraction grating 543 nm wherein the width of the first regions 31 is 0.44 times the period length.
  • the dimensions of the grating area are optimized so that a high
  • Diffraction efficiency in the wavelength range of 1000 nm to 1060 nm is achieved.
  • Diffraction grating 10 have different from each other
  • Grid material from which the first regions 31 are formed, a refractive index ni and the second grid material, from which the second regions 32 are formed, a
  • Diffraction efficiency can be achieved with the diffraction grating 10.
  • the first one the first one
  • the reflection-reducing layer system 4 is an interference layer system composed of a plurality of dielectric layers
  • the reflection-reducing layer system 4 has a high refractive index layer 43 of T 1 O 2, and a plurality of low refractive index layers 41 of S 1 O 2 and a plurality of high refractive index layers 42 of Ta 2 Os.
  • the reflection-reducing layer system 4 starting from the grating region 3 , comprises a 200 nm thick layer 43 of TiO 2 , an 88 nm thick layer 41 of SiO 2 , a 74 nm thick layer 42 of Ta 2 O, a 353 nm thick layer 41 Si0 2 , a 181 nm thick layer 42 of Ta 2 0s and a 172 nm thick layer 41 of Si0 2 .
  • reflection-reducing layer system 4 are optimized so that the reflection is minimized in the provided for the use of the grid wavelength range of 1000 nm to 1060 nm.
  • Layer system 4 can by a simulation calculation
  • Diffraction grating 10 including the grating area 3.
  • reflection-reducing layer system 4 reflection losses are reduced at a radiation entrance surface 11 of the diffraction grating 10 and in this way the diffraction efficiency of
  • Diffraction grating 10 increased. Furthermore, the grating region 3 by the reflection-reducing layer system 4 is advantageous against external influences, in particular against mechanical
  • the diffraction grating 10 is therefore particularly characterized in
  • a further reflection-reducing layer system 2 is advantageously arranged, which, like the reflection-reducing layer system 4, comprises an optical interference layer system comprising a plurality of layers
  • dielectric layers 21, 22 which alternately have a low and a high refractive index.
  • the layers are low
  • Refractive index layers 21 of S 1 O 2 and the high refractive index layers 22 of Ta 2 0s Refractive index layers 21 of S 1 O 2 and the high refractive index layers 22 of Ta 2 0s.
  • the further reflection-reducing layer system 2 contains, for example, starting from the substrate 1, a layer 280 of Ta 2 Os which is 280 nm thick, a 217 nm thick layer 21 of SiO 2 , a layer 22 of Ta 2 O 2 which is 77 nm thick, a layer 241 nm thick from S 10 2 , a 61 nm thick layer 22 of Ta 2 0s, a 96 nm thick layer 21 of S 1O 2 , a 119 nm thick
  • Layer 22 of Ta 2 0s a 281 nm thick layer 21 of S 1O 2 , a 177 nm thick layer 22 of Ta 2 0s and a 404 nm thick layer 21 of Si0 2 .
  • Layer system 2 as the grid area 3 subsequent layer system 4 a reflection-reducing layer system.
  • the layer system 2 between the substrate 1 and the grid region 3 as
  • the diffraction grating 10 is a reflection grating.
  • Layer system 2 like the individual layers 41, 42, 43 of the layer system 4, can be optimized with a simulation calculation in such a way that either a minimum reflection or a maximum reflection is achieved in a wavelength range provided for the use of the grating.
  • the grating region 3 may be formed directly in a layer on the substrate 1 or in a surface region of the substrate 1.
  • Exemplary embodiment for example, such that first the reflection-reducing layer system 2 is applied to the substrate 1.
  • the layer system 2 from the reflection-reducing layer system 2 is applied to the substrate 1.
  • Layers 21, 22 may, for. B. with vacuum coating methods such as thermal evaporation,
  • Electron beam evaporation or sputtering on the substrate 1 are deposited.
  • a layer of a first solid material which acts as the first grid material for the first regions 31 of the diffraction grating, is advantageously applied over the whole area to the first
  • a periodic arrangement of recesses is produced in the layer of the first grid material.
  • the recesses are preferably linear, the lines having the width of the second regions 32 provided for the diffraction grating.
  • the production of the recesses can be achieved, for example, by electron beam lithography in conjunction with a dry etching process
  • the second grating material may be T1O 2 , for example.
  • the filling of the recesses to form the second regions 32 is particularly advantageous
  • Atomic layer deposition This method is particularly well suited to fill comparatively deep areas of small width with a coating material.
  • the reflection-reducing layer system 4 is applied to the grid region 3. This can be done as in the case of the layer system 2 by a vacuum coating method.
  • the diffraction grating 10 according to the embodiment can be used in particular in ultrashort pulse compressor arrangements Laser pulses are used.
  • the diffraction grating 10 for example, for a
  • Pulse compressor arrangement for laser pulses with a central wavelength of 1030 nm provided.
  • the diffraction efficiency ⁇ of the diffraction grating 10 is -1. Diffraction order in transmission when illuminated with TE polarized light, d. H. at a parallel to the grid lines oriented field vector of the electric field, shown. With the diffraction grating 10 can in

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)

Abstract

La présente invention concerne un réseau de diffraction (10) comportant un substrat (1), une zone de grille (3) qui présente un agencement périodique de premières zones (31) d'un premier matériau réticulaire et de deuxièmes zones (32) d'un second matériau réticulaire s'étendant dans une direction parallèle au substrat (1), le premier matériau réticulaire et le second matériau réticulaire étant des matériaux solides avec différents indices de réfraction, et un système de couches (4) réduisant ou accroissant les réflexions comprenant au moins deux couches (41, 42) ayant des indices de réfraction différents, le système de couches (4) réduisant ou accroissant les réflexions étant disposé sur une face de la zone de grille (3) opposée au substrat (1), et un système de couches (2) supplémentaire d'au moins deux couches (21, 22) ayant des indices de réfraction différents étant disposé entre le substrat (1) et la zone de grille (3). L'invention concerne également un procédé de fabrication du réseau de diffraction (10).
EP13708714.4A 2012-02-27 2013-02-25 Réseau de diffraction et procédé de fabrication Withdrawn EP2820453A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102012101555A DE102012101555B4 (de) 2012-02-27 2012-02-27 Beugungsgitter und Verfahren zu dessen Herstellung
PCT/EP2013/053715 WO2013127741A1 (fr) 2012-02-27 2013-02-25 Réseau de diffraction et procédé de fabrication

Publications (1)

Publication Number Publication Date
EP2820453A1 true EP2820453A1 (fr) 2015-01-07

Family

ID=47845934

Family Applications (1)

Application Number Title Priority Date Filing Date
EP13708714.4A Withdrawn EP2820453A1 (fr) 2012-02-27 2013-02-25 Réseau de diffraction et procédé de fabrication

Country Status (4)

Country Link
US (1) US20150022893A1 (fr)
EP (1) EP2820453A1 (fr)
DE (1) DE102012101555B4 (fr)
WO (1) WO2013127741A1 (fr)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113376716B (zh) * 2021-06-21 2022-12-30 中国科学院光电技术研究所 一种衍射光学器件表面增透膜的镀膜方法
US20220413194A1 (en) * 2021-06-29 2022-12-29 Himax Technologies Limited Diffractive optical element

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US20050275944A1 (en) * 2004-06-11 2005-12-15 Wang Jian J Optical films and methods of making the same
US20070290607A1 (en) * 2004-09-30 2007-12-20 Naotada Okada Organic electroluminescent display device

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JPH04211202A (ja) * 1990-03-19 1992-08-03 Canon Inc 反射型回折格子および該回折格子を用いた装置
US5119231A (en) * 1990-06-15 1992-06-02 Honeywell Inc. Hybrid diffractive optical filter
US20040047039A1 (en) * 2002-06-17 2004-03-11 Jian Wang Wide angle optical device and method for making same
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EP1597616A4 (fr) * 2003-02-10 2008-04-09 Nanoopto Corp Polariseur large bande universel, dispositifs comprenant ledit polariseur et procede de fabrication dudit polariseur
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Publication number Priority date Publication date Assignee Title
US20050275944A1 (en) * 2004-06-11 2005-12-15 Wang Jian J Optical films and methods of making the same
US20070290607A1 (en) * 2004-09-30 2007-12-20 Naotada Okada Organic electroluminescent display device

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Title
See also references of WO2013127741A1 *

Also Published As

Publication number Publication date
DE102012101555A1 (de) 2013-08-29
DE102012101555B4 (de) 2013-12-24
WO2013127741A1 (fr) 2013-09-06
US20150022893A1 (en) 2015-01-22

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