EP2633528A1 - Resiststruktur zur herstellung einer röntgenoptischen gitterstruktur - Google Patents
Resiststruktur zur herstellung einer röntgenoptischen gitterstrukturInfo
- Publication number
- EP2633528A1 EP2633528A1 EP11770377.7A EP11770377A EP2633528A1 EP 2633528 A1 EP2633528 A1 EP 2633528A1 EP 11770377 A EP11770377 A EP 11770377A EP 2633528 A1 EP2633528 A1 EP 2633528A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- resist
- webs
- resist structure
- stabilizing
- structure according
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K2207/00—Particular details of imaging devices or methods using ionizing electromagnetic radiation such as X-rays or gamma rays
- G21K2207/005—Methods and devices obtaining contrast from non-absorbing interaction of the radiation with matter, e.g. phase contrast
Definitions
- the present invention relates to a resist pattern for producing an X-ray optical grating structure.
- X-rays are used.
- optical grids are used, the structure and in particular the aspect ratio special requirements are made because the quality of the term in the jargon as Differential Phase Contrast Imaging (DPCI) imaging method with X-radiation decisively on the height of the optical grating structures depends.
- DPCI Differential Phase Contrast Imaging
- the absorption of the deposited in the resist structure in the web gaps material (usually gold) in the range should be greater than 80%.
- X-ray energy for which the tomographic structure is optimally designed and referred to as design energies, ranges from 20 keV to 60 keV, with the polychromatic radiation of the x-ray tube also providing energies up to about 10 keV above the design energy are present. This means that the thickness of the absorbing gold at least 100 ⁇ and thus the height of the resist structure must be more than 100 ⁇ .
- V (Imax-l-min) / (Imax + Imine) (1)
- I max is the maximum intensity value and I m i n is the minimum intensity value in the generated X-ray image.
- Dl 10 2009 019 595 AI discloses a resist structure for producing a X-ray optical grating structure comprising a plurality of webs and the webs stabilizing beams, wherein the webs are arranged perpendicular to the substrate and beams are inserted between the webs.
- the object of the invention is to provide a resist structure for producing an X-ray optical grating structure to propose that avoids the disadvantages and limitations listed.
- the production of X-ray optical grating structures with aspect ratios of more than 500 is to be made possible without the grid bars bending, or the stabilizing structure has an adverse effect on the visibility.
- the invention is based on the idea that stabilizing beams are introduced into the resist structure.
- the webs of the Resisregal are attached at a first angle a on the substrate and the stabilizing beam with a second angle ß.
- between a and ß at least a distance of 20 ° and at most a distance of 70 °, preferably from 40 ° to 50 °, in order to obtain the best possible stabilizing effect.
- the ratio of the height h of the webs to the width b 'of the web gaps has a value of 10 to 500.
- the distance between two adjacent stabilizing bars in the range between twice and 20 times the gap width, and the perimeter diameter d of each bar is between 1 ⁇ and
- each stabilizing beam penetrates at least two webs.
- the total height of the stabilizing beam is at most 20% of the lattice height and preferably at most 10% of the lattice height and thus has only a slight influence on the visibility.
- Such resist structures are suitable for the production of X-ray optical grating structures.
- the height of the material deposited in the web gaps is maximally reduced by the value d ', which results from d' * d * 1 / cos ⁇ (2), where d is the circumference diameter of the beam.
- the stabilizing effect of the bars is completely preserved, since the arrangement of the bars results in a stabilization of the entire area.
- Another advantage is that the height of the stabilizing beams can be repeated at will and thus significantly higher structures than previously possible.
- N x d there is a height change of N x d, which corresponds to a few% of the total height and has only a negligible effect on the visibility.
- the present resist structure has further stabilizing beams which are arranged at an angle ⁇ 'and wherein the angle ⁇ ' does not have the same value as one of the angles a or ß.
- the resist structure consists of a negative resist material.
- the described resist structures are also suitable for the production of gratings for neutron imaging.
- Fig. 1 shows schematically an embodiment of a resist structure
- the resist structures shown in the example are particularly suitable for the production of X-ray optical grating structures made of gold.
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- High Energy & Nuclear Physics (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
Abstract
Description
Claims
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102010049994A DE102010049994B3 (de) | 2010-10-28 | 2010-10-28 | Resiststruktur zur Herstellung einer röntgenoptischen Gitterstruktur |
PCT/EP2011/005141 WO2012055495A1 (de) | 2010-10-28 | 2011-10-13 | Resiststruktur zur herstellung einer röntgenoptischen gitterstruktur |
Publications (2)
Publication Number | Publication Date |
---|---|
EP2633528A1 true EP2633528A1 (de) | 2013-09-04 |
EP2633528B1 EP2633528B1 (de) | 2018-07-18 |
Family
ID=44802023
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP11770377.7A Not-in-force EP2633528B1 (de) | 2010-10-28 | 2011-10-13 | Resiststruktur zur herstellung einer röntgenoptischen gitterstruktur |
Country Status (3)
Country | Link |
---|---|
EP (1) | EP2633528B1 (de) |
DE (1) | DE102010049994B3 (de) |
WO (1) | WO2012055495A1 (de) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102015217201B3 (de) * | 2015-09-09 | 2017-01-05 | Karlsruher Institut für Technologie | Photoresiststruktur und Verfahren zu ihrer Herstellung |
CN110088846A (zh) | 2016-12-15 | 2019-08-02 | 皇家飞利浦有限公司 | 用于x射线成像的光栅结构 |
EP3745420A1 (de) | 2019-05-27 | 2020-12-02 | Koninklijke Philips N.V. | Stabilisierte gitterstrukturen |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2009116956A1 (en) * | 2008-03-20 | 2009-09-24 | National University Of Singapore | A metamaterial and methods for producing the same |
DE102009019595B4 (de) * | 2009-04-30 | 2013-02-28 | Forschungszentrum Karlsruhe Gmbh | Gitter mit großem Aspektverhältnis, insbesondere zur Verwendung als röntgenoptisches Gitter in einem CT-System, hergestellt durch ein Lithographieverfahren |
-
2010
- 2010-10-28 DE DE102010049994A patent/DE102010049994B3/de not_active Expired - Fee Related
-
2011
- 2011-10-13 WO PCT/EP2011/005141 patent/WO2012055495A1/de active Application Filing
- 2011-10-13 EP EP11770377.7A patent/EP2633528B1/de not_active Not-in-force
Non-Patent Citations (1)
Title |
---|
See references of WO2012055495A1 * |
Also Published As
Publication number | Publication date |
---|---|
WO2012055495A1 (de) | 2012-05-03 |
DE102010049994B3 (de) | 2012-05-10 |
EP2633528B1 (de) | 2018-07-18 |
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