EP2586052B1 - Dispositif permettant de structurer des surfaces de corps solides au moyen de faisceaux ioniques provenant d'un spectre de faisceaux ioniques - Google Patents

Dispositif permettant de structurer des surfaces de corps solides au moyen de faisceaux ioniques provenant d'un spectre de faisceaux ioniques Download PDF

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Publication number
EP2586052B1
EP2586052B1 EP11732397.2A EP11732397A EP2586052B1 EP 2586052 B1 EP2586052 B1 EP 2586052B1 EP 11732397 A EP11732397 A EP 11732397A EP 2586052 B1 EP2586052 B1 EP 2586052B1
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Prior art keywords
ion
ion beam
gap
magnet
spectrum
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EP11732397.2A
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German (de)
English (en)
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EP2586052A1 (fr
Inventor
Günter ZSCHORNACK
Mike Schmidt
Frank Grossmann
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Dreebit GmbH
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Dreebit GmbH
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/05—Electron or ion-optical arrangements for separating electrons or ions according to their energy or mass
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching for evaporating or etching
    • H01J37/3056—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching for evaporating or etching for microworking, e.g. etching of gratings, trimming of electrical components
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/26—Mass spectrometers or separator tubes
    • H01J49/28—Static spectrometers
    • H01J49/284—Static spectrometers using electrostatic and magnetic sectors with simple focusing, e.g. with parallel fields such as Aston spectrometer
    • H01J49/286—Static spectrometers using electrostatic and magnetic sectors with simple focusing, e.g. with parallel fields such as Aston spectrometer with energy analysis, e.g. Castaing filter
    • H01J49/288—Static spectrometers using electrostatic and magnetic sectors with simple focusing, e.g. with parallel fields such as Aston spectrometer with energy analysis, e.g. Castaing filter using crossed electric and magnetic fields perpendicular to the beam, e.g. Wien filter
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/05—Arrangements for energy or mass analysis
    • H01J2237/055—Arrangements for energy or mass analysis magnetic
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/05—Arrangements for energy or mass analysis
    • H01J2237/057—Energy or mass filtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/31749—Focused ion beam

Definitions

  • the invention relates to a device for structuring solid surfaces with ion beams from an ion beam spectrum, wherein the ion beam spectrum consists of ions with different charge states and different masses, comprising an assembly for generating the ion beam spectrum with ions of different charge states and masses with one cathode, several drift tube sections, a collector and an array of ion extraction and focusing lenses on a common beam axis and a permanent magnet system about the common beam axis, wherein the generated ion beam spectrum is extracted in the array of extraction and focusing lenses and focused from there on a subsequent Wien filter, for charge state and mass separation an extracted and focused ion beam, at least one deflector stigmatizing, positioning and deflecting the ion beam, and at least one objective that finely focuses the ion beam onto a very small solid surface, wherein the Wien filter is constructed of a two-segment electrode assembly and a two-pole magnet assembly having an applied electric field E orthogonal to the ion beam spectral direction
  • a collimator diaphragm for passing the ion beam spectrum and on the output side contains a mass separation aperture, with which the ion beam spectrum is decomposed into its ion beams according to mass and charge state.
  • the electron impact ion source With this electron impact ion source, low charged to highly charged ions can be generated into an ion beam which is accelerated by the system of consecutive drift tubes under ultrahigh vacuum conditions and which is focused by magnetic fields from a permanent magnet system.
  • the electron impact ion source makes it possible to extract ion beams with emittances on the order of 10 ⁇ mm mrad and better.
  • the extracted ion beam consists of a spectrum of different ions, i. consists of projectiles of different masses and states of charge, so that the structuring of solid surfaces can be performed only with relatively low resolution.
  • An irradiation device is in the document US 5,849,093 A described, which serves for the cleaning and smoothing of solid surfaces by ions from plasma ion sources, wherein in the irradiation device, the ions by classical ion optics as an ion beam, consisting of different, extracted from the plasma ion source ions are shot at a solid or the ions from the same source charge state by a dipole magnet are also performed on the solid.
  • a plant for X-ray radiography with highly charged ions is in the document US 6,115,452 A described, wherein in the system, a beam of highly charged ions by a masking with the aid of a diaphragm to beam diameter of 1 to 250 microns or larger is formed and a target for the production of X-radiation excited.
  • One problem is that the masking of the beam with the help of a diaphragm destroys a significant proportion of the beam intensity.
  • a time-of-flight ion-emission microscope is in the publication US 6,288,394 B1 described in which focused charged ions are used as the excitation medium.
  • the production of the highly charged ions takes place with a cryogenic EBIT.
  • Individual ion charge states are separated by a dipole magnet.
  • a focusing lens is used, which requires up to 40 kV lens potential.
  • a method and a device for positionally accurate positioning of individual ions on substrate surfaces are in the document DE 103 47 969 A1 described, wherein the device is part of a working according to the AFM scanning device.
  • Focussed ion beam - FIB Other methods and devices for obtaining focused ion beams are, for example, in the documents Gianuzzi, Steve: Introduction to Focussed Ion Beams, Springerverlag, 2005 and Orloff, Utlaut, Swanson: High Resolution Focussed Ion Beams, Kluwer Academic / Plenum Publishers, 2003 , in which primarily liquid metal ion sources are used, which produce only low-charged ions of a few elements.
  • the ion source mentioned above is also a liquid metal ion source.
  • the liquid metal ion source does not have a broad range of elements and charge states that are important for adjusting penetration depth and sputtering rate for corresponding solid state surface treatments.
  • the device comprises an EBIS ion source, a mass filter with beam apertures arranged in front and behind, a deflector and lenses, the EBIS ion source comprising a cathode, a drift tube section, a collector and an ion lens on a common axis and a magnet system around the common axis.
  • the associated mass filter is designed as a Wien filter, in which electrodes and magnets are arranged aligned such that the resulting electric field and the magnetic field forming are directed perpendicular to each other and to the direction of movement of the ion beam.
  • the incident in a vacuum-loaded housing through an input-side aperture through the ion beam is deflected and separated by the fields and a part of the ion beam leaves the housing through an output side arranged aperture for further focusing.
  • the invention has for its object to provide a device for structuring solid surfaces with ion beams from an ion beam spectrum, which is designed such that both the ion beam spectrum widened elements used as well as an improvement of the processing of solid surfaces is achieved.
  • Wienfilter which is used for the charge state and mass separation of an extracted and focused ion beam, at least one deflector stigmatizing, positioning and deflecting the ion beam, and at least one objective, which finely focuses the ion beam onto a very small solid surface
  • the Wien filter is constructed of an electrode assembly having at least two segments and at least one two-pole magnet arrangement, wherein an applied electric field E orthogonal to the moving direction of the ion beam spectrum and a magnetic field B orthogonal to the direction of movement of the ion beam spectrum and orthogonal to the electric field E is aligned, provided and on the input side contains a collimator diaphragm for passing the ion beam spectrum and on the output side a mass separation diaphragm, with which the ion beam spectrum is decomposed into its ion beams according to mass and charge state, wherein according to the characterizing part of patent claim 1 in the Wien filter, a first magnet is fixedly disposed within an iron yoke, which has a beam
  • the Wien filter has a primary magnetic pole gap with a fixed gap distance a around the beam axis and a secondary magnetic pole gap with a variable gap width b, whereby the magnetic field strength B in the primary magnetic pole gap can be varied as a function of the set gap width b of the secondary magnetic pole gap.
  • the gap width b of the secondary magnetic pole gap can be adjusted by extending and retracting the movable pole piece to which the magnet is attached to the iron yoke.
  • the Wien filter has an applied electric field E orthogonal to the moving direction of the ion beam spectrum and a magnetic field B orthogonal to the moving direction of the ion beam spectrum and orthogonal to the electric field E.
  • the shape and size of the lens and shutter elements can be variable.
  • the aperture behind the Wien filter on the beam axis may have an aperture of variable diameter and function in conjunction with the Wien filter as a mass separation aperture.
  • the device is a compact assembly that combines the capabilities of a device for focusing and charge state and mass separation of ion beams with the benefits of EBIT as a source of ions of different chemical elements in a wide range of charge states.
  • the beam stop has two functions, on the one hand serving for further collimation of the ion beam, and on the other hand, in combination with the Wien filter, selecting a single ion beam by blanking out the remaining ion beams.
  • the subsequent deflector arrangement can consist of at least two electrostatic deflectors arranged one behind the other, wherein the deflectors consist of at least four cylindrically arranged segments or preferably have eight cylindrically arranged segments.
  • the device can operate in a pressure range of 10 -7 to 10 -11 mbar, wherein ions of all present in the periodic table elements with low to high charge states generated, focused and mass-separated can be used for structuring.
  • the device according to the invention makes use, in addition to the property of producing a selected focused ion beam, of the fact that each ion depends on its charge state, which is low but also very high the assembly for generating an ion beam spectrum can be set, has stored a charge state-dependent potential energy in the ion beam, which is released in the interaction with solid surfaces to be processed.
  • the charge state and the mass of the projectile can be varied over a wide range and thus also the linearly dependent kinetic energy of the projectiles.
  • the invention makes it possible to work with different currents of highly charged ions or else in the single-ion irradiation regime.
  • the device according to the invention is a very compact source of arbitrarily charged ions including ion selection and focusing to Which can be converted from one element to another without a long service life and for the operation of which almost all elements of the periodic system with almost all charge states are available.
  • This also includes, inter alia, noble gas ions such as helium, neon, argon or xenon, which thus are available as focused ion beams in contrast to the operation with liquid metal ion sources.
  • the invention makes it possible that, with the selection of individual ion charge states, projectiles with different amounts of stored potential energies and kinetic energies are available for the operation of the device.
  • the focusing of ion beams after generation, focusing and separation of the ion beams are included.
  • the device essentially allows the generation of charge- or mass-separated beams of ions with approximately any state of charge and mass.
  • Fig. 1 Device 20 for structuring a solid surface 18 with an ion beam 141 from an ion beam spectrum 14, wherein the ion beam spectrum 14 consists of ions with different charge states and different masses, has an assembly 21 for generating the ion beam spectrum 14 with ions of different charge states and masses with a cathode 1 , with three drift tube sections 21, 22, 23, with a collector 4 as well an arrangement 5 of ion extraction and focusing lenses on a common beam axis 15 and a permanent magnet system 3 about the common beam axis 15, wherein the generated ion beam spectrum 14 is extracted in the assembly 5 of extraction and focusing lenses and is focused from there to a subsequent Wien filter 7 used for charge state and mass separation of an extracted and focused ion beam 141, at least one deflector 9, 10 stigmatizing, positioning and deflecting the ion beam 141, and at least one objective 11, which fine-focuses the ion beam 141 onto a very small solid-state surface 18 in the focus 19, wherein the Wien filter 7 is composed
  • a first permanent magnet 30 is fixedly arranged within an iron yoke 35, which has a convergent pole piece 37 directed towards the beam axis 15, and a second permanent magnet 31 opposite the first permanent magnet, which is mounted peripherally with a first pole piece 34 movably mounted on the iron yoke 35 and provided with a fixedly arranged, directed to the beam axis 15 convergent second pole piece 36, wherein between the pole piece 37 and the second Polschuhteil 36 a primary magnetic gap 32 with a fixed gap distance a for the passage of the ion beam spectrum 14 along the beam axis 15 is present wherein between the two pole pieces 34, 36, a secondary magnetic pole gap 33 is provided with a variable gap width b, wherein the movement of the movable pole piece 34, the flux control of the magnetic field B in the secondary magnetic pole gap 33 and transmits simultaneously primary magnetic pole gap 32 with the gap distance a is variable.
  • the Wien filter 7 has a primary magnetic pole gap 32 with a fixed gap distance a about the beam axis 15 and a secondary magnetic pole gap with a variable gap width b, whereby depending on the set gap width b of the secondary magnetic pole gap 33, the magnetic field strength B in the primary magnetic pole gap 32 can be varied ,
  • the magnetic field B is realized by the two permanent magnets 30 and 31.
  • the magnetic field strength B in the primary magnetic pole gap 32 with the gap spacing a, which passes through the ion beam spectrum 14, is set by the variable gap width b of the secondary magnetic pole gap 33.
  • the gap width b of the secondary magnetic pole gap 33 can be adjusted by extending and retracting the movable pole piece 34 to which the magnet 30 is fixed to the iron yoke 35.
  • the closed magnetic flux guide is realized by an iron yoke 35 and two fixed pole pieces 36, 37.
  • the electric field E is applied in the conventional manner by applying a variable electric potential to the electrode assembly 70 in FIG Fig. 3 generated and can be changed by changing the electrical potential.
  • the Wien filter 7 has an applied electric field E orthogonal to the moving direction 73 of the ion beam spectrum 14 and a magnetic field B oriented orthogonally to the moving direction 73 of the ion beam spectrum 14 and orthogonal to the electric field E.
  • the trajectories of the ion beams 142, 143 terminate at the separation screen 8, whereas the charge state argon 16+ of the ion beam 141, which satisfies the Wien condition, passes the shutter 8 in a straight line through the associated aperture.
  • the Wien condition for the selected ion beam 141 can be adjusted with the predetermined charge state or for the given mass.
  • the shape and size of the lens and diaphragm elements can be variable.
  • the cylindrical lens segment 54 is adjoined by a collimator diaphragm 6, which has an aperture of variable diameter on the beam axis 15.
  • the collimator diaphragm 6 follows the Wien filter 7, whose magnetic poles can consist of permanent magnets or electromagnets.
  • the Wien filter 7 is followed by the aperture 8, which has an aperture of variable diameter on the beam axis 15 and works in conjunction with the Wien filter 7 as a mass separation aperture.
  • Fig. 4 the potential energies stored in iron ions and lead ions are given as a function of the ionic charge state q.
  • the kinetic as well as the potential energy amount of the projectile forming the ion beam 141 can be influenced very selectively, and thus also on the parameters - penetration depth and sputtering rate - in the solid surface 18 to be irradiated. Specific applications thus allow processes such as surface structuring, surface cleaning and ion beam-assisted Writing in micro and nano dimensions.
  • Fig. 5 the possible ion beam spectrum 14 of charge states for ion beams 141 focused and selected according to the invention is shown in a table for selected elements.
  • the beam aperture 8 has two functions. On the one hand, it serves to further collimate the ion beam 141. Furthermore, in combination with the Wien filter 7, it selects the individual ion beam 141 by blanking out the remaining components 142, 143.
  • the following deflector arrangement consists of two electrostatic deflectors 9 and 10 arranged one behind the other.
  • the deflectors 9 and 10 consist of at least four cylindrically arranged segments, advantageously have eight cylindrically arranged segments.
  • the device 20 operates in a pressure range of 10 -7 to 10 -11 mbar.
  • ions of all elements present in the periodic table with low to high charge states can be generated, focused and mass-separated.

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Electron Tubes For Measurement (AREA)

Claims (10)

  1. Dispositif (20) destiné à la structuration de surfaces solides (18) à l'aide de faisceaux ioniques (141) provenant d'un spectre de faisceaux ioniques (14), dans lequel le spectre de faisceaux ioniques (14) est composé d'ions ayant différents d'états de charge et des masses distinctes, comprenant le suivant:
    - un module (21) destiné à la génération du spectre de faisceaux ioniques (14) présentant des ions ayant différents états de charge et des masses distinctes avec une cathode (1), une pluralité de sections de tubes de glissement (21, 22, 23) et un collecteur (4),
    - un système d'aimants permanents (3) entourant un axe de rayonnement commun (15) ainsi qu'
    - un agencement (5) de lentilles d'extraction et de focalisation disposées sur ledit axe de rayonnement commun (15) permettant l'extraction et la focalisation du spectre de faisceaux ioniques (14) généré sur un filtre de Wien (7) consécutif étant conçu pour la séparation de l'état de charge et de la masse d'un faisceau ionique (141) extrait et focalisé, dans lequel ledit filtre de Wien (7)
    - est composé d'au moins un agencement d'électrodes (70) présentant au moins deux segments (71, 72) et au moins un ensemble magnétique bipolaire (30, 31), dans lequel un champ électrique E appliqué, étant disposé orthogonalement par rapport à la direction de mouvement (73) du spectre de faisceaux ioniques (14), et un champ magnétique B, étant orienté orthogonalement par rapport à la direction de mouvement (73) du spectre de faisceaux ioniques (14) et orthogonalement par rapport au champ électrique E, sont prévus, et
    - le filtre de Wien comprend un diaphragme de collimateur (6) sur le côté d'entrée permettant le passage du spectre de faisceaux ioniques (14) et un diaphragme de séparation de masses (8) sur le côté de sortie permettant la dispersion du spectre de faisceaux ioniques (14) en les faisceaux ioniques (141, 142, 143) individuels de celle-ci en fonction de la masse et l'état de charge,
    - au moins un déflecteur (9, 10) pour stigmatiser, positionner et dévier le faisceau ionique (141) et
    - au moins une lentille objective (11) pour la focalisation de manière fine du faisceau ionique (141) sur une surface solide (18) minuscule,
    caractérisé en ce qu'
    - un premier aimant (30) est agencé de manière fixe dans le filtre de Wien (7) dans un joug de fer (35) et présente un épanouissement polaire (37) étant dirigé vers l'axe de rayonnement (15) et étant conçu de façon convergente, et
    - un second aimant (31) faisant face au premier aimant, qui est monté sur le bord par une première partie d'épanouissement polaire (34) étant formée au joug de fer (35) de manière mobile, et qui est pourvu d'une seconde partie d'épanouissement polaire (36) étant agencée de manière fixe, dirigée vers l'axe de rayonnement (15) et étant conçue de façon convergente, est disposé, dans lequel
    - un entrefer d'aimant primaire (32) ayant une distance d'entrefer a fixe est pourvu entre l'épanouissement polaire (37) et la seconde partie d'épanouissement polaire (36) permettant le passage du spectre de faisceaux ioniques (14) longitudinalement le long de l'axe de rayonnement (15), et un entrefer d'aimant secondaire (33) ayant une largeur d'entrefer b variable est pourvu entre les deux parties d'épanouissement polaires (34, 36), et
    - le passage de flux du champ magnétique B dans l'entrefer d'aimant secondaire (33), de manière simultanément transmettant dans l'entrefer d'aimant primaire (32) ayant la distance d'entrefer a, est variable en réponse au mouvement de la partie d'épanouissement polaire (34) mobile.
  2. Dispositif (20) selon la revendication 1,
    caractérisé en ce que
    le filtre de Wien (7) présente un entrefer d'aimant primaire (32) ayant une distance d'entrefer a fixe autour de l'axe de rayonnement (15) et présente un entrefer d'aimant secondaire ayant une largeur d'entrefer b variable, dans lequel l'intensité du champ magnétique B dans l'entrefer d'aimant primaire (32) peut être variée en fonction du largeur d'entrefer b de l'entrefer d'aimant secondaire (33).
  3. Dispositif (20) selon l'une quelconque des revendications 1 à 2, caractérisé en ce que
    la largeur d'entrefer b de l'entrefer d'aimant secondaire (33) peut être réglée au niveau du joug de fer en rétractant et en déployant l'épanouissement polaire (34) mobile ayant l'aimant (30) fixé à celui-ci.
  4. Dispositif (20) selon l'une quelconque des revendications 1 à 3, caractérisé en ce qu'
    un agencement (12) pour focaliser le spectre de faisceaux ioniques (14) est prévu, comprenant la cathode (1), les segments de tubes de glissement (21, 22, 23) et le collecteur (4) étant disposés sur l'axe de rayonnement (15) et servant comme source ionique d'impact d'électrons, dans lequel le long de l'axe de rayonnement (15) le collecteur (4) jouxtent l'agencement (5) de lentilles d'extraction d'ions et de focalisation, qui comprend le suivant:
    a) un premier segment de lentilles cylindrique (51) ayant un diamètre intérieur variable ou constant le long de son extension axial,
    b) un second segment de lentilles cylindrique (52) ayant un diamètre intérieur constant le long de son extension axial,
    c) un troisième segment de lentilles cylindrique (53) ayant un diamètre intérieur constant le long de son extension axial, et
    d) un quatrième segment de lentilles cylindrique (54) ayant un diamètre intérieur constant le long de son extension axial,
    dans lequel le segment de lentilles cylindrique (54) jouxtent le diaphragme de collimateur (6) présentant une aperture ayant un diamètre variable sur l'axe de rayonnement (15).
  5. Dispositif (20) selon l'une quelconque des revendications 1 à 4,
    caractérisé en ce que
    les pôles magnétiques du filtre de Wien (7) sont composés d'aimants permanents ou d'électroaimants.
  6. Dispositif (20) selon l'une quelconque des revendications 1 à 5,
    caractérisé en ce que
    le diaphragme de séparation de masses (8) sur l'axe de rayonnement (15) présente une aperture ayant un diamètre variable, et en communication avec le filtre die Wien (7) fonctionne comme un diaphragme de séparation de masses.
  7. Dispositif (20) selon l'une quelconque des revendications 1 à 6,
    caractérisé en ce que
    le diaphragme de séparation de masses (8) a deux fonctions, d'une part servant pour collimater davantage le faisceau ionique (141) et d'autre part, en combinaison avec le filtre de Wien, permettant une sélection d'un faisceau d'une espèce ionique individuelle en masquant les espèces ioniques restantes (142, 143).
  8. Dispositif (20) selon l'une quelconque des revendications 1 à 7,
    caractérisé en ce qu'
    un agencement de déflecteurs est composé de deux déflecteurs électrostatiques étant agencés de manière consécutive (9, 10), dans lequel les déflecteurs (9, 10) sont composés d'au moins quatre segments disposés de forme cylindrique ou de préférence présentant huit segments disposés de forme cylindrique.
  9. Dispositif (20) selon l'une quelconque des revendications 1 à 8,
    caractérisé en ce que
    la lentille objective (11) est conçue avec les composants suivants:
    - un premier segment de lentille (111) ayant un diamètre intérieur constant,
    - un second segment de lentille (112) ayant un diamètre intérieur variable ou constant le long de son extension axial,
    - un troisième segment de lentille (113) ayant un diamètre intérieur variable ou constant le long de son extension axial.
  10. Dispositif (20) selon l'une quelconque des revendications 1 à 9,
    caractérisé en ce que
    le dispositif fonctionne dans une plage de pression allant de 10-7 à 10-11 mbar, dans lequel d'ions parmi tous les éléments présents dans le système periodique ayant des états de charge faibles jusqu'à fortes sont générés, focalisés et peuvent être utilisés de manière séparée en masses pour la structuration.
EP11732397.2A 2010-06-22 2011-06-15 Dispositif permettant de structurer des surfaces de corps solides au moyen de faisceaux ioniques provenant d'un spectre de faisceaux ioniques Not-in-force EP2586052B1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE201010030372 DE102010030372B4 (de) 2010-06-22 2010-06-22 Vorrichtung zur Strukturierung von Festkörperflächen mit Ionenstrahlen aus einem Ionenstrahlspektrum
PCT/EP2011/059939 WO2011160990A1 (fr) 2010-06-22 2011-06-15 Dispositif permettant de structurer des surfaces de corps solides au moyen de faisceaux ioniques provenant d'un spectre de faisceaux ioniques

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EP2586052A1 EP2586052A1 (fr) 2013-05-01
EP2586052B1 true EP2586052B1 (fr) 2014-08-20

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DE (1) DE102010030372B4 (fr)
WO (1) WO2011160990A1 (fr)

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CN114126178B (zh) * 2021-11-19 2023-01-13 北京航空航天大学 一种可变磁场的e×b探针

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JPS58169858A (ja) * 1982-03-31 1983-10-06 Jeol Ltd 荷電粒子フイルタ
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US6115452A (en) * 1998-01-08 2000-09-05 The Regents Of The University Of California X-ray radiography with highly charged ions
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US6288394B1 (en) * 1999-03-02 2001-09-11 The Regents Of The University Of California Highly charged ion based time of flight emission microscope
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EP2586052A1 (fr) 2013-05-01
WO2011160990A1 (fr) 2011-12-29
DE102010030372B4 (de) 2012-02-16

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