EP2572014A4 - Spotless arc directed vapor deposition (sa-dvd) and related method thereof - Google Patents
Spotless arc directed vapor deposition (sa-dvd) and related method thereofInfo
- Publication number
- EP2572014A4 EP2572014A4 EP11778439.7A EP11778439A EP2572014A4 EP 2572014 A4 EP2572014 A4 EP 2572014A4 EP 11778439 A EP11778439 A EP 11778439A EP 2572014 A4 EP2572014 A4 EP 2572014A4
- Authority
- EP
- European Patent Office
- Prior art keywords
- dvd
- vapor deposition
- related method
- directed vapor
- arc directed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/228—Gas flow assisted PVD deposition
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching
- H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching for evaporating or etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32055—Arc discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32321—Discharge generated by other radiation
- H01J37/3233—Discharge generated by other radiation using charged particles
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32357—Generation remote from the workpiece, e.g. down-stream
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3244—Gas supply means
- H01J37/32449—Gas control, e.g. control of the gas flow
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
- H01J37/32568—Relative arrangement or disposition of electrodes; moving means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
- H01J37/32614—Consumable cathodes for arc discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/006—Details of gas supplies, e.g. in an ion source, to a beam line, to a specimen or to a workpiece
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/31—Processing objects on a macro-scale
- H01J2237/3132—Evaporating
- H01J2237/3137—Plasma-assisted co-operation
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US33184410P | 2010-05-06 | 2010-05-06 | |
US36671110P | 2010-07-22 | 2010-07-22 | |
PCT/US2011/035581 WO2011140481A1 (en) | 2010-05-06 | 2011-05-06 | Spotless arc directed vapor deposition (sa-dvd) and related method thereof |
Publications (2)
Publication Number | Publication Date |
---|---|
EP2572014A1 EP2572014A1 (en) | 2013-03-27 |
EP2572014A4 true EP2572014A4 (en) | 2016-03-02 |
Family
ID=44904109
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP11778439.7A Withdrawn EP2572014A4 (en) | 2010-05-06 | 2011-05-06 | Spotless arc directed vapor deposition (sa-dvd) and related method thereof |
Country Status (4)
Country | Link |
---|---|
EP (1) | EP2572014A4 (en) |
CN (1) | CN103003467B (en) |
SG (1) | SG185413A1 (en) |
WO (1) | WO2011140481A1 (en) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2014014541A2 (en) * | 2012-04-27 | 2014-01-23 | Directed Vapor Technologies International | Wear resistant coatings and process for the application thereof |
JP5832985B2 (en) * | 2012-11-09 | 2015-12-16 | 住友重機械工業株式会社 | Deposition equipment |
ITBO20120695A1 (en) * | 2012-12-20 | 2014-06-21 | Organic Spintronics S R L | IMPULSED PLASMA DEPOSITION DEVICE |
WO2015073098A2 (en) | 2013-08-27 | 2015-05-21 | University Of Virginia Patent Foundation | Three-dimensional space frames assembled from component pieces and methods for making the same |
US10233533B2 (en) | 2014-01-09 | 2019-03-19 | United Technologies Corporation | Coating process using gas screen |
WO2016081048A1 (en) | 2014-09-04 | 2016-05-26 | University Of Virginia Patent Foundation | Impulse mitigation systems for media impacts and related methods thereof |
US10184759B2 (en) | 2015-11-17 | 2019-01-22 | University Of Virgina Patent Foundation | Lightweight ballistic resistant anti-intrusion systems and related methods thereof |
US11866816B2 (en) | 2016-07-06 | 2024-01-09 | Rtx Corporation | Apparatus for use in coating process |
EP3720984A4 (en) | 2017-12-06 | 2021-09-01 | Arizona Thin Film Research LLC | Systems and methods for additive manufacturing for the deposition of metal and ceramic materials |
US11056324B2 (en) * | 2018-08-13 | 2021-07-06 | Taiwan Semiconductor Manufacturing Co., Ltd. | System and method for particle control in MRAM processing |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0372069A (en) * | 1989-08-12 | 1991-03-27 | Nisshin Steel Co Ltd | Method for continuously vapor-depositing compound on metal strip |
US5614273A (en) * | 1993-10-27 | 1997-03-25 | Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung, E.V. | Process and apparatus for plasma-activated electron beam vaporization |
US5736073A (en) * | 1996-07-08 | 1998-04-07 | University Of Virginia Patent Foundation | Production of nanometer particles by directed vapor deposition of electron beam evaporant |
US20050266163A1 (en) * | 2002-11-12 | 2005-12-01 | Wortman David J | Extremely strain tolerant thermal protection coating and related method and apparatus thereof |
WO2010099218A1 (en) * | 2009-02-24 | 2010-09-02 | University Of Virginia Patent Foundation | Coaxial hollow cathode plasma assisted directed vapor deposition and related method thereof |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5238546A (en) * | 1990-03-01 | 1993-08-24 | Balzers Aktiengesellschaft | Method and apparatus for vaporizing materials by plasma arc discharge |
US5478608A (en) * | 1994-11-14 | 1995-12-26 | Gorokhovsky; Vladimir I. | Arc assisted CVD coating method and apparatus |
EP0988407B9 (en) * | 1997-06-13 | 2004-12-15 | Unaxis Trading AG | Method for producing coated workpieces, which are coated with an epitactic layer |
US6391164B1 (en) * | 2000-06-23 | 2002-05-21 | Isak I. Beilis | Deposition of coatings and thin films using a vacuum arc with a non-consumable hot anode |
WO2007005832A2 (en) * | 2005-06-30 | 2007-01-11 | University Of Virginia Patent Foundation | Reliant thermal barrier coating system and related methods and apparatus of making the same |
-
2011
- 2011-05-06 SG SG2012081154A patent/SG185413A1/en unknown
- 2011-05-06 WO PCT/US2011/035581 patent/WO2011140481A1/en active Application Filing
- 2011-05-06 EP EP11778439.7A patent/EP2572014A4/en not_active Withdrawn
- 2011-05-06 CN CN201180022808.4A patent/CN103003467B/en not_active Expired - Fee Related
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0372069A (en) * | 1989-08-12 | 1991-03-27 | Nisshin Steel Co Ltd | Method for continuously vapor-depositing compound on metal strip |
US5614273A (en) * | 1993-10-27 | 1997-03-25 | Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung, E.V. | Process and apparatus for plasma-activated electron beam vaporization |
US5736073A (en) * | 1996-07-08 | 1998-04-07 | University Of Virginia Patent Foundation | Production of nanometer particles by directed vapor deposition of electron beam evaporant |
US20050266163A1 (en) * | 2002-11-12 | 2005-12-01 | Wortman David J | Extremely strain tolerant thermal protection coating and related method and apparatus thereof |
WO2010099218A1 (en) * | 2009-02-24 | 2010-09-02 | University Of Virginia Patent Foundation | Coaxial hollow cathode plasma assisted directed vapor deposition and related method thereof |
Non-Patent Citations (2)
Title |
---|
GOEDICKE K ET AL: "Plasma-activated high rate electron beam evaporation using a spotless cathodic arc", SURFACE AND COATINGS TECHNOLOGY, ELSEVIER, AMSTERDAM, NL, vol. 68-69, 1 December 1994 (1994-12-01), pages 799 - 803, XP027004444, ISSN: 0257-8972, [retrieved on 19941201] * |
See also references of WO2011140481A1 * |
Also Published As
Publication number | Publication date |
---|---|
WO2011140481A1 (en) | 2011-11-10 |
CN103003467A (en) | 2013-03-27 |
EP2572014A1 (en) | 2013-03-27 |
CN103003467B (en) | 2015-04-01 |
SG185413A1 (en) | 2012-12-28 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
17P | Request for examination filed |
Effective date: 20121017 |
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AK | Designated contracting states |
Kind code of ref document: A1 Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR |
|
RAP1 | Party data changed (applicant data changed or rights of an application transferred) |
Owner name: FRAUNHOFER-GESELLSCHAFT ZUR FOERDERUNG DER ANGEWAN Owner name: UNIVERSITY OF VIRGINIA PATENT FOUNDATION |
|
DAX | Request for extension of the european patent (deleted) | ||
RA4 | Supplementary search report drawn up and despatched (corrected) |
Effective date: 20160129 |
|
RIC1 | Information provided on ipc code assigned before grant |
Ipc: C23C 14/22 20060101ALI20160125BHEP Ipc: C23C 14/34 20060101AFI20160125BHEP Ipc: C23C 14/00 20060101ALI20160125BHEP Ipc: H01J 37/32 20060101ALI20160125BHEP Ipc: H01J 37/305 20060101ALI20160125BHEP Ipc: C23C 14/30 20060101ALI20160125BHEP |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: REQUEST FOR EXAMINATION WAS MADE |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWN |
|
18D | Application deemed to be withdrawn |
Effective date: 20171201 |