EP2567307A1 - Capacitive touch sensing structure, process of producing the same and touch sensing device using the same - Google Patents

Capacitive touch sensing structure, process of producing the same and touch sensing device using the same

Info

Publication number
EP2567307A1
EP2567307A1 EP10850975A EP10850975A EP2567307A1 EP 2567307 A1 EP2567307 A1 EP 2567307A1 EP 10850975 A EP10850975 A EP 10850975A EP 10850975 A EP10850975 A EP 10850975A EP 2567307 A1 EP2567307 A1 EP 2567307A1
Authority
EP
European Patent Office
Prior art keywords
touch sensing
direction electrode
capacitive touch
insulator
sensing structure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
EP10850975A
Other languages
German (de)
French (fr)
Other versions
EP2567307A4 (en
Inventor
Chenyu Liu
Luhsing Lee
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TPK Touch Solutions Inc
Original Assignee
TPK Touch Solutions Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TPK Touch Solutions Inc filed Critical TPK Touch Solutions Inc
Publication of EP2567307A1 publication Critical patent/EP2567307A1/en
Publication of EP2567307A4 publication Critical patent/EP2567307A4/en
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0443—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a single layer of sensing electrodes
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0446—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a grid-like structure of electrodes in at least two directions, e.g. using row and column electrodes
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04111—Cross over in capacitive digitiser, i.e. details of structures for connecting electrodes of the sensing pattern where the connections cross each other, e.g. bridge structures comprising an insulating layer, or vias through substrate

Definitions

  • the present invention generally relates to touch sensing devices for information inputting systems, and more particularly, to a touch sensing structure thereof and a process of producing the touch sensing structure.
  • touch sensing devices for example, touchpad, touch panel, touch screen
  • the capacitive touch sensing device includes a touch sensing structure, some wires, and a microprocessor.
  • the touch sensing structure connects to the microprocessor by the wires.
  • a projective capacitive touch sensing structure 1 is grid-like, and includes a substrate 6, a first direction electrode 2, a second direction electrode 3, an insulator 4, and a protective layer 5.
  • the first direction electrode 2 and the second direction electrode 3 are orthogonally placed on the substrate 6, and are insulated by the insulator 4.
  • the protective layer 5 is disposed on the second direction electrode 3 to protect the first direction electrode 2 and the second direction electrode 3.
  • a microprocessor (not shown in FIG.1 and FIG.2) is connected to the first direction electrode 2 and the second direction electrode 3 correspondingly.
  • the protective layer in the conventional projective capacitive touch sensing structure is a continuous flat structure, but the parts which need to be protected are only the crossing location of the first direction electrode 2 and the second direction electrode 3. Therefore, the utilization rate of the protective layer 5 is too low.
  • the projective capacitive touch sensing structure is assembled in a monitor (such as touch screen), all parts of the projective capacitive touch sensing structure are transparent in order to ensure the visibility and operability. Because the conventional projective capacitive touch sensing structure is a multilayer structure and the electrodes spread over visual area, with the effect of the different refraction of the material of each layer, the light transmittance of the projective capacitive touch sensing structure was limited. Therefore, the visibility of the monitor which combines the projective capacitive touch sensing structure is dropped.
  • a capacitive touch sensing structure which can reduce the material of the protective layer, a process of producing the same, and touch sensing devices using the same are provided.
  • a capacitive touch sensing structure includes a substrate, at least one first direction electrode, at least one insulator, at least one second direction electrode, and at least one protective block.
  • the first direction electrode is superposed on the substrate.
  • the insulator is superposed on the first direction electrode.
  • the second direction electrode is superposed on the insulator opposite to the first direction electrode and crosses the first direction electrode to form at least one location of crossing.
  • the protective block is disposed on the second direction electrode and covers the location of crossing.
  • a process of producing a capacitive touch sensing structure includes the steps of: (a) affixing at least one first direction electrode onto a substrate; (b) affixing at least one insulator onto the first direction electrode; (c) affixing at least one second direction electrode onto the insulator and crossing with the first direction electrode to form a location of crossing, and to make the first direction electrode and the second direction electrode located on opposite surfaces of the insulator; (d) affixing at least one protective block onto the second direction electrode, and the protective block covering the location of crossing.
  • a capacitive touch sensing device in another more aspect, includes at least one wire; a processor; a shell; and a capacitive touch sensing structure disposed in the shell.
  • the capacitive touch sensing structure includes a substrate; at least one first direction electrode, at least one insulator, at least one second direction electrode, and at least one protective block.
  • the first direction electrode is located on the substrate.
  • the insulator is located on the first direction electrode.
  • the second direction electrode is located on the insulator opposite to the first direction electrode and crossing the first direction electrode to form at least one location of crossing.
  • the protective block sets on the second direction electrode and covers the location of crossing.
  • the first direction electrode and second direction electrode of the capacitive touch sensing structure connect to processor by the wire.
  • FIG.1 shows a top view of a conventional projective capacitive touch sensing structure.
  • FIG.2 shows a cross sectional view of the conventional projective capacitive touch sensing structure shown in FIG.1 taken along the line A-A.
  • FIG.3 shows a top view of a capacitive touch sensing structure according to the first embodiment of the present invention.
  • FIG.4 shows a cross sectional view of the capacitive touch sensing structure shown in FIG.3 taken along the line B-B.
  • FIG.5 shows a cross sectional view of a capacitive touch sensing structure according to a second embodiment of the present invention.
  • FIG.6 shows a top view of a capacitive touch sensing structure according to a third embodiment of the present invention.
  • FIG.7 shows a cross sectional view of the capacitive touch sensing structure shown in FIG.6 taken along the line C-C.
  • FIG.8 shows a top view of a capacitive touch sensing structure according to a fourth embodiment of the present invention.
  • FIG.9 shows a cross sectional view of the capacitive touch sensing structure shown in FIG.8 taken along the line D-D.
  • FIG.10 shows a top view of a capacitive touch sensing structure according to a fifth embodiment of the present invention.
  • FIG.11 shows a cross sectional view of the capacitive touch sensing structure shown in FIG.10 taken along the line E-E.
  • FIG.12a-12d is a flow chart of a process of producing the first embodiment of the present invention.
  • FIG.13a-13d is a flow chart of a process of producing the fourth embodiment of the present invention.
  • FIG.14a-14d is a flow chart of another process of producing the fourth embodiment of the present invention.
  • FIG.15 is a schematic diagram of a touch sensing device using the capacitive touch sensing structure of the present invention.
  • FIG.16 is another schematic diagram of a touch sensing device using the capacitive touch sensing structure of the present invention.
  • FIG.17 is another more schematic diagram of a touch sensing device using the capacitive touch sensing structure of the present invention.
  • the capacitive touch sensing structure of the present invention comprises a substrate, at least one first direction electrode disposed on the substrate, at least one insulator disposed on the first direction electrode, at least one second direction electrode superposed on the insulator.
  • the first direction electrode and the second direction electrode are crossed to form a crossing and disposed on the opposite sides of the insulator respectively. Therefore, the first direction electrode and the second direction electrode are insulated by the insulator.
  • the capacitive touch sensing structure also comprises a protective block which is disposed on the second direction electrode for covering the crossing to reduce the material.
  • a capacitive touch sensing structure 100 includes a substrate 110, at least one first direction electrode 120, at least one second direction electrode 130, at least one insulator 140 and at least one protective block 150.
  • first direction electrodes 120 are superposed on the surface of the substrate 110.
  • the insulators 140 are disposed on the surface of the first direction electrodes 120.
  • the second direction electrodes 130 are superposed on the insulators 140 opposite to the first direction electrodes 120.
  • the first direction electrodes 120 and the second direction electrodes 130 are crossed to form a plurality of locations of crossings and insulated by the insulators 140.
  • the protective blocks 150 are disposed on the surface of the second direction electrodes 130, and cover the locations of crossings.
  • the insulators 140 are located between the first direction electrodes 120 and the second direction electrodes 130, and disposed at the locations of crossings to insulate the first direction electrodes 120 from the second direction electrodes 130.
  • Each of the insulators 140 is in the form of a sheet.
  • each of the protective blocks 150 covers the corresponding insulator 140 and the part of second direction electrode 130 which located on the surface of the insulator 140.
  • each of the protective blocks 250 only covers the part of second direction electrode 230 which located on the surface of the insulator 240.
  • a capacitive touch sensing structure 300 includes a substrate 310, first direction electrodes 320, second direction electrodes 330, a insulator 340 and protective blocks 350.
  • the insulator 340 is a continuous flat structure defining at least one pair of through holes 341.
  • the pair of through holes 341 is defined at both two sides of a first direction electrode 320 and just located at the location of crossing of the first direction electrode 320 and the second direction electrode 330.
  • a second direction electrode 330 passes through the pair of through holes 341, thus the insulator 340 is placed between the first direction electrode 320 and the second direction electrode 330 at the location of crossing.
  • the part of the second direction electrode 330 outside the pair of through holes 341 is placed between the substrate 310 and the insulator 340, while the part between the pair of through holes 341 is superposed on the insulator 340 opposite to the first direction electrode 320.
  • the first direction electrode 320 can be insulated from the second direction electrode 330 by the insulator 340.
  • Each protective block 350 is superposed on the surface of the second direction electrode 330 which located on insulator 340, and covers the part of second direction electrode 330 protruding from the pair of through holes 341.
  • a capacitive touch sensing structure 400 includes a substrate 410, first direction electrodes 420, second direction electrodes 430, a plurality of insulators 440 and a plurality of protective blocks 450.
  • each first direction electrode 420 includes at least two first direction conductive units 422 and at least one first direction wire 421; and each second direction electrode 430 includes at least two second direction conductive units 432 and at least one second direction wire 431.
  • the first direction conductive units 422 are separated from each other and connected by the first direction wire 421; similarly, the second direction conductive units 432 are separated from each other and connected by the second direction wire 431.
  • Each insulator 440 is superposed on the surface of the first direction wire 421, and the second direction wire 431 crosses on the surface of the insulator 440, so that the first direction electrode 420 can be insulated from the second direction electrode 430.
  • Each of the insulators 440 is in the form of a sheet.
  • each protective block 450 can cover the part of second direction wire 431 which located on the insulator 440, or the corresponding insulator 440 and the second direction wire 431 which located on the insulator 440.
  • a capacitive touch sensing structure 500 includes a substrate 510, first direction electrodes 520, second direction electrodes 530, a insulator 540 and a plurality of protective blocks 550.
  • a first direction electrode 520 includes at least two first direction conductive units 522 and at least one first direction wire 521; and a second direction electrode 530 includes at least two second direction conductive units 532 and at least one second direction wire 531.
  • the first direction conductive units 522 are separated from each other, and connected by the first direction wire 521; similarly, the second direction conductive units 532 are separated from each other, and connected by the second direction wire 531.
  • the first direction conductive units 522, the first direction wire 521, and the second direction conductive units 532 are located on the same side of the surface of substrate 510.
  • the second direction wire 531 passes through the through holes 541 in succession to connect the second direction conductive units 532, thus the insulator 540 is placed between the first direction wire 521 and the second direction wire 531 at the location of crossing for isolating the first direction electrode 520 and the second direction electrode 530.
  • the protective blocks 550 are superposed on the surface of corresponding insulator 540, and cover the second direction wire 531.
  • All parts of the capacitive touch sensing structure of the present invention can be made of transparent material or opaque material depending on appliance requirements.
  • the opaque conductive material can be metal such like copper, aluminum, gold and so on;
  • the transparent conductive material for making electrodes can be ITO(Indium Tin Oxides) or others.
  • the insulator can use resin or glass, which is transparent or opaque.
  • the capacitive touch sensing structure can be used in computer to make touchpad when it is opaque, and can also be used in monitor or other display devices to make touch screen when it is transparent.
  • the light transmittance of the transparent capacitive touch sensing structure can be improved.
  • it can reduce the amount of material for making the protective block whether the material is transparent or opaque, and the cost of production is reduced accordingly.
  • a process of producing a capacitive touch sensing structure above-mentioned including the following steps: (a) affixing at least one first direction electrode onto the surface of a substrate; (b) affixing at least one insulator onto the surface of first direction electrode;(c) affixing at least one second direction electrode onto the insulator and crossing with the first direction electrode to form a crossing, the first direction electrode and the second direction electrode located on opposite surfaces of the insulator; (d) affixing at least one protective block onto the second direction electrode, the protective block cover the location of crossing.
  • a process of producing the capacitive touch sensing structure 100 according to the first embodiment of the present invention including the following steps: in step S110, as shown in FIG.12a, affixing at least one first direction electrode 120 onto the surface of a substrate 110; in step S120, as shown in FIG.12b, affixing at least one insulator 140 onto the surface of first direction electrode 120; in step S130, as shown in FIG.12c, affixing at least one second direction electrode 130 on the insulators 140, wherein the second direction electrode 130 crosses with the first direction electrode 120 to form a plurality of crossings corresponding with the insulators 140 to make the first direction electrode 120 insulated from the second direction electrode 130; in step S140, as shown in FIG.12d, affixing each of the protective blocks 150 at the corresponding crossing of the second direction electrode 130 and the first electrode 120 for covering the corresponding insulators 140 and the second direction electrode 130 .
  • first direction electrode includes at least two first conductive direction units and one first direction wire which connects the first conductive direction units and the second direction electrode includes at least two second conductive direction units and one second direction wire which connects the second conductive direction units.
  • the process includes the following steps: (a) affixing a plurality of first direction wires onto the surface of a substrate; (b) affixing a plurality of insulators onto the surface of each first direction wire; (c) affixing a plurality of second direction wires onto each insulator and crossing with the first direction wires to form a plurality of locations of crossings, wherein the first direction wires and the second direction wires located on opposite surfaces of the insulators respectively; (d) affixing a plurality of protective blocks onto each second direction wires, each of the protective block covers the location of crossing.
  • the process may further include the step of affixing the first conductive direction units and the second conductive direction units.
  • FIGs.13a-13d and FIGs.14a-14d show more detailed steps of the exemplary embodiment and illustrate the main difference of affixing of first conductive direction units and second conductive direction units in different steps in the process of producing the capacitive touch sensing structure.
  • a process of producing the fourth embodiment of the capacitive touch sensing structure includes four steps: in step S210, as shown in FIG.13a, affixing at least two first conductive direction units 422, at least one first direction wire 421 connecting the first conductive direction units 422, and at least two second conductive direction units 432 onto the surface of substrate 410; in step S220, as shown in FIG.13b, affixing a plurality of insulators 440 onto the surface of first direction wire 421; in step S230, as shown in FIG13c, affixing at least one second direction wire 431 on the insulators 440 to connect the second conductive direction units 432; in step S240, as shown in FIG13d, affixing a plurality of protective blocks 450 onto the surface of the second direction wire 431 for covering the corresponding insulators 440 and the second direction wire 431.
  • step S310 as shown in FIG.14a, affixing at least one first direction wire 421 onto the surface of a substrate 410; in step S320, as shown in FIG.14b, affixing a plurality of insulators 440 onto the surface of the first direction wire 421; in step S330, as shown in FIG.14c, affixing at least two first conductive direction units 422 disposed on the surface of substrate 410 and connected to the first direction wire 421, at least two second conductive direction units 432 onto the surface of substrate 410, and at least one second direction wire 431 onto the insulators 440 for connecting the second conductive direction units 432; in step S340, as shown in FIG.14d, affixing a plurality of protective blocks 450 onto the surface of the second direction wire 431 for covering the corresponding insulators 440 and the second direction wire 431.
  • the process of producing the fifth embodiment of the capacitive touch sensing structure is similar to that of the fourth embodiment, the difference between the fifth embodiment and the fourth embodiment is that during the second step, the insulator 540 includes at least one pair of through holes 541 defining on both sides of the first direction wire 521.
  • the method of photolithography or printing can be introduced into above-mentioned process of producing the capacitive touch sensing structure of the present invention.
  • the touch sensing device 10 includes a capacitive touch sensing structure 11, wires 12, a processor 13 and a shell 14.
  • the shell 14 is used for storing the touch sensing structure 11, the wires 12 and the processor 13.
  • the capacitive touch sensing structure 11 is near the inner surface 14a of the shell 14, and the first direction electrode and second direction electrode of the capacitive touch sensing structure 11 are connected to the processor 13 by the wires 12. While a conductive object touches the inner surface 14a of the shell 14, the capacitive touch sensing structure 11 generates an electric signal transmitted to the processor 13 by the wires 12, and the processor 13 determines the coordinate of touching location according to the electric signal.
  • the touch sensing device 20 includes a capacitive touch sensing structure 21, wires 22, a processor 23 and a display unit 25 having a polarizer 24.
  • the capacitive touch sensing structure 21 is set in the display unit 25, and it is on the inner surface 24a of the polarizer 24.
  • the capacitive touch sensing structure 21 is made of transparent material.
  • the first direction electrode and second direction electrode of the capacitive touch sensing structure 21 are connected to the processor 23 by the wires 22.
  • a conductive object can touch the polarizer 24 straightly to do the operation of touch.
  • the display unit 25 is a LCD unit.
  • the touch sensing device 30 includes a capacitive touch sensing structure 31, wires 32, a processor 33 and a display unit 35.
  • the capacitive touch sensing structure 31 is transparent, and is set on the outer surface of the display unit 35.
  • the first direction electrode and second direction electrode of the capacitive touch sensing structure 31 are connected to the processor 33 by the wires 32.
  • the display unit 35 is a LCD unit.
  • the capacitive touch sensing structure used in the above-mentioned touch sensing device can be any one of the embodiments of the capacitive touch sensing structure.
  • the material for making the protective layer is reduced, so the cost of production is reduced accordingly.
  • the capacitive touch sensing structure is transparent, the light transmittance of the capacitive touch sensing structure is improved.
  • the display effect of display devices using the touch sensing structure is improved as well.
  • the first direction electrode or the second direction electrode of the capacitive touch sensing structure of the present invention includes at least one electrode. Furthermore, the amount of the insulators, through holes, and protective blocks depend on the amount of the first direction electrodes and second direction electrodes. Besides, the amount of the first direction electrodes and second direction electrodes depend on the resolution and size of the touch sensing structure. The higher the resolution or the larger the size is, the larger the amount is.

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  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Human Computer Interaction (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Position Input By Displaying (AREA)
  • Switches That Are Operated By Magnetic Or Electric Fields (AREA)

Abstract

The present invention relates to a capacitive touch sensing structure. The capacitive touch sensing structure includes a substrate, at least one first direction electrode, at least one insulator, at least one second direction electrode, and at least one protective block. The first direction electrode is superposed on the substrate. The insulator is superposed on the first direction electrode. The second direction electrode is superposed on the insulator opposite to the first direction electrode and crosses the first direction electrode to form at least one location of crossing. The protective block is disposed on the second direction electrode and covers the location of crossing.

Description

    CAPACITIVE TOUCH SENSING STRUCTURE, PROCESS OF PRODUCING THE SAME AND TOUCH SENSING DEVICE USING THE SAME CAPACITIVE TOUCH SENSING STRUCTURE, PROCESS OF PRODUCING THE SAME AND TOUCH SENSING DEVICE USING THE SAME
  • BACKGROUND OF THE INVENTION
  • Field of the Invention
  • The present invention generally relates to touch sensing devices for information inputting systems, and more particularly, to a touch sensing structure thereof and a process of producing the touch sensing structure.
  • Description of the Related Art
  • Technologies by way of touching with fingers, stylus, or the like, to control electronic systems are widely used in daily lives and works. Generally, the electronic systems use touch sensing devices (for example, touchpad, touch panel, touch screen) to detect a touch action in order to generate an electrical signal for an operation which follows up the touch action.
  • According to principles of operation, there are many types of touch sensing methods, such as capacitive sensing type, resistive sensing type, optical sensing type, electromagnetic sensing type, acoustic sensing type and so on. The capacitive touch sensing device is used more widely than others. The capacitive touch sensing device includes a touch sensing structure, some wires, and a microprocessor. The touch sensing structure connects to the microprocessor by the wires. When a user touches the surface of the capacitive touch sensing device with conductive objects such as fingers or conductive stylus, causing a change in voltage, the microprocessor detects the location being touched, according to the change in voltage.
  • In order to fit different types of electronic systems, many types of capacitive touch sensing structure are provided, and one of them is the projective capacitive touch sensing structure. Referring to FIG.1 and FIG.2, a projective capacitive touch sensing structure 1 is grid-like, and includes a substrate 6, a first direction electrode 2, a second direction electrode 3, an insulator 4, and a protective layer 5. The first direction electrode 2 and the second direction electrode 3 are orthogonally placed on the substrate 6, and are insulated by the insulator 4. The protective layer 5 is disposed on the second direction electrode 3 to protect the first direction electrode 2 and the second direction electrode 3. In addition, a microprocessor (not shown in FIG.1 and FIG.2) is connected to the first direction electrode 2 and the second direction electrode 3 correspondingly. When the projective capacitive touch sensing structure 1 is touched, the first direction electrode 2 and the second direction electrode 3 generate touch signals. The touch signals are transmitted to the microprocessor by wires, and the microprocessor determines the location being touched according to the touch signals.
  • However, the protective layer in the conventional projective capacitive touch sensing structure is a continuous flat structure, but the parts which need to be protected are only the crossing location of the first direction electrode 2 and the second direction electrode 3. Therefore, the utilization rate of the protective layer 5 is too low. In addition, when the projective capacitive touch sensing structure is assembled in a monitor (such as touch screen), all parts of the projective capacitive touch sensing structure are transparent in order to ensure the visibility and operability. Because the conventional projective capacitive touch sensing structure is a multilayer structure and the electrodes spread over visual area, with the effect of the different refraction of the material of each layer, the light transmittance of the projective capacitive touch sensing structure was limited. Therefore, the visibility of the monitor which combines the projective capacitive touch sensing structure is dropped.
  • SUMMERY OF THE INVENTION
  • According to an embodiment of present invention, a capacitive touch sensing structure which can reduce the material of the protective layer, a process of producing the same, and touch sensing devices using the same are provided.
  • In one aspect, a capacitive touch sensing structure includes a substrate, at least one first direction electrode, at least one insulator, at least one second direction electrode, and at least one protective block. The first direction electrode is superposed on the substrate. The insulator is superposed on the first direction electrode. The second direction electrode is superposed on the insulator opposite to the first direction electrode and crosses the first direction electrode to form at least one location of crossing. The protective block is disposed on the second direction electrode and covers the location of crossing.
  • In another aspect, a process of producing a capacitive touch sensing structure includes the steps of: (a) affixing at least one first direction electrode onto a substrate; (b) affixing at least one insulator onto the first direction electrode; (c) affixing at least one second direction electrode onto the insulator and crossing with the first direction electrode to form a location of crossing, and to make the first direction electrode and the second direction electrode located on opposite surfaces of the insulator; (d) affixing at least one protective block onto the second direction electrode, and the protective block covering the location of crossing.
  • In another more aspect, a capacitive touch sensing device includes at least one wire; a processor; a shell; and a capacitive touch sensing structure disposed in the shell. The capacitive touch sensing structure includes a substrate; at least one first direction electrode, at least one insulator, at least one second direction electrode, and at least one protective block. The first direction electrode is located on the substrate. The insulator is located on the first direction electrode. The second direction electrode is located on the insulator opposite to the first direction electrode and crossing the first direction electrode to form at least one location of crossing. The protective block sets on the second direction electrode and covers the location of crossing. The first direction electrode and second direction electrode of the capacitive touch sensing structure connect to processor by the wire.
  • BRIEF DESCRIPTION OF THE DRAWINGS
  • FIG.1 shows a top view of a conventional projective capacitive touch sensing structure.
  • FIG.2 shows a cross sectional view of the conventional projective capacitive touch sensing structure shown in FIG.1 taken along the line A-A.
  • FIG.3 shows a top view of a capacitive touch sensing structure according to the first embodiment of the present invention.
  • FIG.4 shows a cross sectional view of the capacitive touch sensing structure shown in FIG.3 taken along the line B-B.
  • FIG.5 shows a cross sectional view of a capacitive touch sensing structure according to a second embodiment of the present invention.
  • FIG.6 shows a top view of a capacitive touch sensing structure according to a third embodiment of the present invention.
  • FIG.7 shows a cross sectional view of the capacitive touch sensing structure shown in FIG.6 taken along the line C-C.
  • FIG.8 shows a top view of a capacitive touch sensing structure according to a fourth embodiment of the present invention.
  • FIG.9 shows a cross sectional view of the capacitive touch sensing structure shown in FIG.8 taken along the line D-D.
  • FIG.10 shows a top view of a capacitive touch sensing structure according to a fifth embodiment of the present invention.
  • FIG.11 shows a cross sectional view of the capacitive touch sensing structure shown in FIG.10 taken along the line E-E.
  • FIG.12a-12d is a flow chart of a process of producing the first embodiment of the present invention.
  • FIG.13a-13d is a flow chart of a process of producing the fourth embodiment of the present invention.
  • FIG.14a-14d is a flow chart of another process of producing the fourth embodiment of the present invention.
  • FIG.15 is a schematic diagram of a touch sensing device using the capacitive touch sensing structure of the present invention.
  • FIG.16 is another schematic diagram of a touch sensing device using the capacitive touch sensing structure of the present invention.
  • FIG.17 is another more schematic diagram of a touch sensing device using the capacitive touch sensing structure of the present invention.
  • DETAILED DESCRIPTION OF THE INVENTION
  • The capacitive touch sensing structure of the present invention comprises a substrate, at least one first direction electrode disposed on the substrate, at least one insulator disposed on the first direction electrode, at least one second direction electrode superposed on the insulator. The first direction electrode and the second direction electrode are crossed to form a crossing and disposed on the opposite sides of the insulator respectively. Therefore, the first direction electrode and the second direction electrode are insulated by the insulator. The capacitive touch sensing structure also comprises a protective block which is disposed on the second direction electrode for covering the crossing to reduce the material.
  • Referring to FIG.3 and FIG.4, a capacitive touch sensing structure 100 according to the first embodiment of the present invention includes a substrate 110, at least one first direction electrode 120, at least one second direction electrode 130, at least one insulator 140 and at least one protective block 150. Generally, there are a plurality of first direction electrodes 120 and a plurality of second direction electrodes 130. The first direction electrodes 120 are superposed on the surface of the substrate 110. The insulators 140 are disposed on the surface of the first direction electrodes 120. The second direction electrodes 130 are superposed on the insulators 140 opposite to the first direction electrodes 120. The first direction electrodes 120 and the second direction electrodes 130 are crossed to form a plurality of locations of crossings and insulated by the insulators 140. The protective blocks 150 are disposed on the surface of the second direction electrodes 130, and cover the locations of crossings. The insulators 140 are located between the first direction electrodes 120 and the second direction electrodes 130, and disposed at the locations of crossings to insulate the first direction electrodes 120 from the second direction electrodes 130. Each of the insulators 140 is in the form of a sheet.
  • Depending on the requirement of process, there are different ways of setting the protective blocks. According to the first embodiment shown in FIG.4, each of the protective blocks 150 covers the corresponding insulator 140 and the part of second direction electrode 130 which located on the surface of the insulator 140. Referring to FIG.5, in the second embodiment of the present invention, each of the protective blocks 250 only covers the part of second direction electrode 230 which located on the surface of the insulator 240.
  • Referring to FIG.6 and FIG.7, a capacitive touch sensing structure 300 according to the third embodiment of the present invention includes a substrate 310, first direction electrodes 320, second direction electrodes 330, a insulator 340 and protective blocks 350. Being different from the capacitive touch sensing structure 100 according to the first embodiment, the insulator 340 is a continuous flat structure defining at least one pair of through holes 341. The pair of through holes 341 is defined at both two sides of a first direction electrode 320 and just located at the location of crossing of the first direction electrode 320 and the second direction electrode 330. A second direction electrode 330 passes through the pair of through holes 341, thus the insulator 340 is placed between the first direction electrode 320 and the second direction electrode 330 at the location of crossing. The part of the second direction electrode 330 outside the pair of through holes 341 is placed between the substrate 310 and the insulator 340, while the part between the pair of through holes 341 is superposed on the insulator 340 opposite to the first direction electrode 320. As a result, the first direction electrode 320 can be insulated from the second direction electrode 330 by the insulator 340. Each protective block 350 is superposed on the surface of the second direction electrode 330 which located on insulator 340, and covers the part of second direction electrode 330 protruding from the pair of through holes 341.
  • Referring to FIG.8 and FIG.9, a capacitive touch sensing structure 400 according to the fourth embodiment of the present invention includes a substrate 410, first direction electrodes 420, second direction electrodes 430, a plurality of insulators 440 and a plurality of protective blocks 450. Being different from the capacitive touch sensing structure 100 according to the first embodiment, each first direction electrode 420 includes at least two first direction conductive units 422 and at least one first direction wire 421; and each second direction electrode 430 includes at least two second direction conductive units 432 and at least one second direction wire 431. The first direction conductive units 422 are separated from each other and connected by the first direction wire 421; similarly, the second direction conductive units 432 are separated from each other and connected by the second direction wire 431. Each insulator 440 is superposed on the surface of the first direction wire 421, and the second direction wire 431 crosses on the surface of the insulator 440, so that the first direction electrode 420 can be insulated from the second direction electrode 430. Each of the insulators 440 is in the form of a sheet.
  • Similar with the first embodiment and the second embodiment of the present invention, depending on the requirement of process, each protective block 450 can cover the part of second direction wire 431 which located on the insulator 440, or the corresponding insulator 440 and the second direction wire 431 which located on the insulator 440.
  • Referring to FIG.10 and FIG.11, a capacitive touch sensing structure 500 according to the fifth embodiment of the present invention, includes a substrate 510, first direction electrodes 520, second direction electrodes 530, a insulator 540 and a plurality of protective blocks 550. Being different from the capacitive touch sensing structure 300 according to the third embodiment, a first direction electrode 520 includes at least two first direction conductive units 522 and at least one first direction wire 521; and a second direction electrode 530 includes at least two second direction conductive units 532 and at least one second direction wire 531. The first direction conductive units 522 are separated from each other, and connected by the first direction wire 521; similarly, the second direction conductive units 532 are separated from each other, and connected by the second direction wire 531. The first direction conductive units 522, the first direction wire 521, and the second direction conductive units 532 are located on the same side of the surface of substrate 510. There is at least one pair of through holes 541 defined in the insulator 540 which located in both two sides of the first direction wire 521. The second direction wire 531 passes through the through holes 541 in succession to connect the second direction conductive units 532, thus the insulator 540 is placed between the first direction wire 521 and the second direction wire 531 at the location of crossing for isolating the first direction electrode 520 and the second direction electrode 530. The protective blocks 550 are superposed on the surface of corresponding insulator 540, and cover the second direction wire 531.
  • All parts of the capacitive touch sensing structure of the present invention (including the substrate, electrode, insulator, and protective block) can be made of transparent material or opaque material depending on appliance requirements. In which, the opaque conductive material can be metal such like copper, aluminum, gold and so on; the transparent conductive material for making electrodes can be ITO(Indium Tin Oxides) or others. The insulator can use resin or glass, which is transparent or opaque. For example, the capacitive touch sensing structure can be used in computer to make touchpad when it is opaque, and can also be used in monitor or other display devices to make touch screen when it is transparent. As a result of using the protective block which is superposed on the location of crossing according to the embodiments of the present invention instead of the continuous flat structure in conventional structure, the light transmittance of the transparent capacitive touch sensing structure can be improved. In addition, it can reduce the amount of material for making the protective block whether the material is transparent or opaque, and the cost of production is reduced accordingly.
  • A process of producing a capacitive touch sensing structure above-mentioned is provided as well, including the following steps: (a) affixing at least one first direction electrode onto the surface of a substrate; (b) affixing at least one insulator onto the surface of first direction electrode;(c) affixing at least one second direction electrode onto the insulator and crossing with the first direction electrode to form a crossing, the first direction electrode and the second direction electrode located on opposite surfaces of the insulator; (d) affixing at least one protective block onto the second direction electrode, the protective block cover the location of crossing.
  • Referring to FIGs.12a-12d, a process of producing the capacitive touch sensing structure 100 according to the first embodiment of the present invention including the following steps: in step S110, as shown in FIG.12a, affixing at least one first direction electrode 120 onto the surface of a substrate 110; in step S120, as shown in FIG.12b, affixing at least one insulator 140 onto the surface of first direction electrode 120; in step S130, as shown in FIG.12c, affixing at least one second direction electrode 130 on the insulators 140, wherein the second direction electrode 130 crosses with the first direction electrode 120 to form a plurality of crossings corresponding with the insulators 140 to make the first direction electrode 120 insulated from the second direction electrode 130; in step S140, as shown in FIG.12d, affixing each of the protective blocks 150 at the corresponding crossing of the second direction electrode 130 and the first electrode 120 for covering the corresponding insulators 140 and the second direction electrode 130 .
  • There is an exemplary embodiment for producing a capacitive touch sensing structure when the first direction electrode includes at least two first conductive direction units and one first direction wire which connects the first conductive direction units and the second direction electrode includes at least two second conductive direction units and one second direction wire which connects the second conductive direction units. It includes the following steps: (a) affixing a plurality of first direction wires onto the surface of a substrate; (b) affixing a plurality of insulators onto the surface of each first direction wire; (c) affixing a plurality of second direction wires onto each insulator and crossing with the first direction wires to form a plurality of locations of crossings, wherein the first direction wires and the second direction wires located on opposite surfaces of the insulators respectively; (d) affixing a plurality of protective blocks onto each second direction wires, each of the protective block covers the location of crossing. The process may further include the step of affixing the first conductive direction units and the second conductive direction units.
  • FIGs.13a-13d and FIGs.14a-14d show more detailed steps of the exemplary embodiment and illustrate the main difference of affixing of first conductive direction units and second conductive direction units in different steps in the process of producing the capacitive touch sensing structure.
  • Referring to FIGs.13a-13d, a process of producing the fourth embodiment of the capacitive touch sensing structure includes four steps: in step S210, as shown in FIG.13a, affixing at least two first conductive direction units 422, at least one first direction wire 421 connecting the first conductive direction units 422, and at least two second conductive direction units 432 onto the surface of substrate 410; in step S220, as shown in FIG.13b, affixing a plurality of insulators 440 onto the surface of first direction wire 421; in step S230, as shown in FIG13c, affixing at least one second direction wire 431 on the insulators 440 to connect the second conductive direction units 432; in step S240, as shown in FIG13d, affixing a plurality of protective blocks 450 onto the surface of the second direction wire 431 for covering the corresponding insulators 440 and the second direction wire 431.
  • Referring to FIGs.14a-14d, another process of producing the fourth embodiment of the capacitive touch sensing structure including the following steps: in step S310 as shown in FIG.14a, affixing at least one first direction wire 421 onto the surface of a substrate 410; in step S320, as shown in FIG.14b, affixing a plurality of insulators 440 onto the surface of the first direction wire 421; in step S330, as shown in FIG.14c, affixing at least two first conductive direction units 422 disposed on the surface of substrate 410 and connected to the first direction wire 421, at least two second conductive direction units 432 onto the surface of substrate 410, and at least one second direction wire 431 onto the insulators 440 for connecting the second conductive direction units 432; in step S340, as shown in FIG.14d, affixing a plurality of protective blocks 450 onto the surface of the second direction wire 431 for covering the corresponding insulators 440 and the second direction wire 431.
  • The process of producing the fifth embodiment of the capacitive touch sensing structure is similar to that of the fourth embodiment, the difference between the fifth embodiment and the fourth embodiment is that during the second step, the insulator 540 includes at least one pair of through holes 541 defining on both sides of the first direction wire 521.
  • As the variation of manufacturing equipment, application environment or requirement of process, the method of photolithography or printing can be introduced into above-mentioned process of producing the capacitive touch sensing structure of the present invention.
  • Referring to FIG.15, there is a capacitive touch sensing device 10 using the capacitive touch sensing structure of the present invention. The touch sensing device 10 includes a capacitive touch sensing structure 11, wires 12, a processor 13 and a shell 14. The shell 14 is used for storing the touch sensing structure 11, the wires 12 and the processor 13. The capacitive touch sensing structure 11 is near the inner surface 14a of the shell 14, and the first direction electrode and second direction electrode of the capacitive touch sensing structure 11 are connected to the processor 13 by the wires 12. While a conductive object touches the inner surface 14a of the shell 14, the capacitive touch sensing structure 11 generates an electric signal transmitted to the processor 13 by the wires 12, and the processor 13 determines the coordinate of touching location according to the electric signal.
  • Referring to FIG.16, there is another capacitive touch sensing device 20 using the capacitive touch sensing structure of the present invention. The touch sensing device 20 includes a capacitive touch sensing structure 21, wires 22, a processor 23 and a display unit 25 having a polarizer 24. The capacitive touch sensing structure 21 is set in the display unit 25, and it is on the inner surface 24a of the polarizer 24. The capacitive touch sensing structure 21 is made of transparent material. The first direction electrode and second direction electrode of the capacitive touch sensing structure 21 are connected to the processor 23 by the wires 22. A conductive object can touch the polarizer 24 straightly to do the operation of touch. In a preferred embodiment, the display unit 25 is a LCD unit.
  • Referring to FIG.17, there is another more capacitive touch sensing device 30 using the capacitive touch sensing structure of the present invention. The touch sensing device 30 includes a capacitive touch sensing structure 31, wires 32, a processor 33 and a display unit 35. The capacitive touch sensing structure 31 is transparent, and is set on the outer surface of the display unit 35. The first direction electrode and second direction electrode of the capacitive touch sensing structure 31 are connected to the processor 33 by the wires 32. In a preferred embodiment, the display unit 35 is a LCD unit.
  • The capacitive touch sensing structure used in the above-mentioned touch sensing device can be any one of the embodiments of the capacitive touch sensing structure. As a result of the application of protective block, the material for making the protective layer is reduced, so the cost of production is reduced accordingly. If the capacitive touch sensing structure is transparent, the light transmittance of the capacitive touch sensing structure is improved. The display effect of display devices using the touch sensing structure is improved as well.
  • Whether the first direction electrode or the second direction electrode of the capacitive touch sensing structure of the present invention includes at least one electrode. Furthermore, the amount of the insulators, through holes, and protective blocks depend on the amount of the first direction electrodes and second direction electrodes. Besides, the amount of the first direction electrodes and second direction electrodes depend on the resolution and size of the touch sensing structure. The higher the resolution or the larger the size is, the larger the amount is.
  • Although the invention has been described in language specific to structural features and/or methodological acts, it is to be understood that the invention defined in the appended claims is not necessarily limited to the specific features or acts described. Rather, the specific features and acts are disclosed as example forms of implementing the claimed invention.

Claims (1)

1. A capacitive touch sensing structure comprising:
a substrate;
at least one first direction electrode superposed on the substrate;
at least one insulator superposed on the first direction electrode;
at least one second direction electrode superposed on the insulator opposite to the first direction electrode and crossing the first direction electrode to form at least one location of crossing; and
at least one protective block disposed on the second direction electrode and covering the location of crossing;
wherein the first direction electrode and the second direction electrode are insulated by the insulator.
2. A capacitive touch sensing structure according to claim 1, wherein the insulator is in the form of a sheet and set at the location of crossing, and the second direction electrode crosses the insulator.
3. A capacitive touch sensing structure according to claim 2, wherein the protective block covers the insulator and the part of second direction electrode which located on the surface of insulator.
4. A capacitive touch sensing structure according to claim 2, wherein the protective block is superposed on the insulator, and covers the part of second direction electrode which is superposed on the surface of insulator.
5. A capacitive touch sensing structure according to claim 1, wherein the insulator defines at least one pair of through holes at both sides of the first direction electrode and just located at the location of crossing, and the second direction electrode passes through the through holes.
6. A capacitive touch sensing structure according to claim 5, wherein the protective block covers the part of the second direction electrode protruding from the pair of through holes.
7. A capacitive touch sensing structure according to claim 2, wherein the first direction electrode comprises at least two first conductive direction units and one first direction wire connecting the first conductive direction units, and the second direction electrode comprises at least two second conductive direction units and at least one second direction wire connecting the second conductive direction units; the location of crossing is the location where the first direction wire crosses the second direction wire.
8. A capacitive touch sensing structure according to claim 1, wherein the protective block is made of transparent material.
9. A capacitive touch sensing structure according to claim 1, wherein the substrate, the first direction electrode, the second direction electrode and the insulator are made of transparent material.
10. A process of producing a capacitive touch sensing structure comprising the steps of:
(a) affixing at least one first direction electrode onto a substrate;
(b) affixing at least one insulator onto the first direction electrode;
(c) affixing at least one second direction electrode crossing the first direction electrode onto the insulator opposite to the first direction electrode to form at least one location of crossing;
(d) affixing at least one protective block covering the location of crossing onto the second direction electrode.
11. A process of producing the capacitive touch sensing structure according to claim 10, wherein the first direction electrode comprises at least two first conductive direction units and one first direction wire connecting the first conductive direction units, and the second direction electrode comprises at least two second conductive direction units and one second direction wire connecting the second conductive direction units; the step (a) is specifically affixing the first direction wire onto the substrate; the step (b) is specifically affixing the insulator onto the surface of the first direction wire; the step (c) is specifically affixing the second direction wire onto the insulator and crossing with the first direction wire to form the location of crossing, the first direction wire and the second direction wire located on opposite surfaces of the insulator; the step (d) is specifically affixing the protective block onto the second direction wire, and the protective block covers the location of crossing.
12. A process of producing the capacitive touch sensing structure according to claim 11, wherein the process further comprises the steps of: affixing the first conductive direction units onto the substrate; affixing the second conductive direction units onto the substrate.
13. A process of producing the capacitive touch sensing structure according to claim 10, wherein the insulator is in the form of a sheet.
14. A process of producing the capacitive touch sensing structure according to claim 10, wherein the insulator defines at least one pair of through holes at both sides of the first direction electrode and just located at the location of crossing, and the second direction electrode passes through the through holes.
15. A process of producing the capacitive touch sensing structure according to claim 10, wherein the process uses a method of photolithography or printing.
16. A capacitive touch sensing device comprising:
at least one wire;
a processor;
a shell; and
a capacitive touch sensing structure disposed in the shell, comprising:
a substrate;
at least one first direction electrode located on the substrate;
at least one insulator located on the first direction electrode;
at least one second direction electrode superposed on the insulator opposite to the first direction electrode and crossing the first direction electrode to form at least one location of crossing; and
at least one protective block set on the second direction electrode covering the location of crossing;
wherein the first direction electrode and second direction electrode of the capacitive touch sensing structure are connected to processor by the at least one wire.
17. A capacitive touch sensing device comprising:
at least one wire;
a processor;
a display unit; and
a capacitive touch sensing structure comprising:
a substrate;
at least one first direction electrode superposed on the substrate;
at least one insulator superposed on the first direction electrode;
at least one second direction electrode superposed on the insulator opposite to the first direction electrode and crossing the first direction electrode to form at least one location of crossing; and
at least one protective block which set on the second direction electrode covering the location of crossing;
wherein the capacitive touch sensing structure is made of transparent material and combined with the display unit, and the first direction electrode and second direction electrode of the capacitive touch sensing structure are connected to processor by the at least one wire.
18. A capacitive touch sensing device according to claim 17, wherein the display unit comprises a polarizer, and the capacitive touch sensing structure is disposed onto an inner surface of the polarizer.
19. A capacitive touch sensing device according to claim 17, wherein the display unit is a LCD unit.
EP10850975.3A 2010-05-04 2010-07-19 Capacitive touch sensing structure, process of producing the same and touch sensing device using the same Ceased EP2567307A4 (en)

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CN102236482A (en) 2011-11-09
CN102236482B (en) 2013-11-06
JP2013525925A (en) 2013-06-20
KR20130029388A (en) 2013-03-22
WO2011137606A1 (en) 2011-11-10

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