EP2311078A4 - Patterned integrated circuit and method of production thereof - Google Patents

Patterned integrated circuit and method of production thereof

Info

Publication number
EP2311078A4
EP2311078A4 EP09771083A EP09771083A EP2311078A4 EP 2311078 A4 EP2311078 A4 EP 2311078A4 EP 09771083 A EP09771083 A EP 09771083A EP 09771083 A EP09771083 A EP 09771083A EP 2311078 A4 EP2311078 A4 EP 2311078A4
Authority
EP
European Patent Office
Prior art keywords
production
integrated circuit
patterned integrated
patterned
circuit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP09771083A
Other languages
German (de)
French (fr)
Other versions
EP2311078A1 (en
Inventor
Steven Grant Duvall
Pavel Khokhlov
Pavel I Lazarev
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carben Semicon Ltd
Original Assignee
Carben Semicon Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carben Semicon Ltd filed Critical Carben Semicon Ltd
Publication of EP2311078A1 publication Critical patent/EP2311078A1/en
Publication of EP2311078A4 publication Critical patent/EP2311078A4/en
Withdrawn legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/28Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
    • H01L21/283Deposition of conductive or insulating materials for electrodes conducting electric current
    • H01L21/288Deposition of conductive or insulating materials for electrodes conducting electric current from a liquid, e.g. electrolytic deposition
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/768Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
    • H01L21/76838Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the conductors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/52Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
    • H01L23/522Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
    • H01L23/532Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body characterised by the materials
    • H01L23/53204Conductive materials
    • H01L23/53276Conductive materials containing carbon, e.g. fullerenes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/02Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/12Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
    • H01L29/16Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only elements of Group IV of the Periodic System
    • H01L29/1606Graphene
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K10/00Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having a potential-jump barrier or a surface barrier
    • H10K10/40Organic transistors
    • H10K10/46Field-effect transistors, e.g. organic thin-film transistors [OTFT]
    • H10K10/462Insulated gate field-effect transistors [IGFETs]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/40Thermal treatment, e.g. annealing in the presence of a solvent vapour
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/621Providing a shape to conductive layers, e.g. patterning or selective deposition
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/60Organic compounds having low molecular weight
    • H10K85/615Polycyclic condensed aromatic hydrocarbons, e.g. anthracene
    • H10K85/621Aromatic anhydride or imide compounds, e.g. perylene tetra-carboxylic dianhydride or perylene tetracarboxylic di-imide
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/60Organic compounds having low molecular weight
    • H10K85/615Polycyclic condensed aromatic hydrocarbons, e.g. anthracene
    • H10K85/624Polycyclic condensed aromatic hydrocarbons, e.g. anthracene containing six or more rings
EP09771083A 2008-06-26 2009-06-26 Patterned integrated circuit and method of production thereof Withdrawn EP2311078A4 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US7607908P 2008-06-26 2008-06-26
PCT/US2009/048737 WO2009158552A1 (en) 2008-06-26 2009-06-26 Patterned integrated circuit and method of production thereof

Publications (2)

Publication Number Publication Date
EP2311078A1 EP2311078A1 (en) 2011-04-20
EP2311078A4 true EP2311078A4 (en) 2012-11-21

Family

ID=41444962

Family Applications (1)

Application Number Title Priority Date Filing Date
EP09771083A Withdrawn EP2311078A4 (en) 2008-06-26 2009-06-26 Patterned integrated circuit and method of production thereof

Country Status (2)

Country Link
EP (1) EP2311078A4 (en)
WO (1) WO2009158552A1 (en)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8865268B2 (en) 2009-04-28 2014-10-21 Nokia Corporation Method and apparatus
KR101758649B1 (en) 2010-03-31 2017-07-18 삼성전자주식회사 Method of manufacturing graphene using germanium layer
WO2011139236A1 (en) * 2010-05-05 2011-11-10 National University Of Singapore Hole doping of graphene
US20120305892A1 (en) * 2010-12-08 2012-12-06 Martin Thornton Electronic device, method of manufacturing a device and apparatus for manufacturing a device
CN102569169B (en) * 2010-12-28 2014-01-01 中芯国际集成电路制造(上海)有限公司 Interconnection method based on press printing technology
EP2535937B1 (en) 2011-06-17 2015-03-11 Friedrich-Alexander-Universität Erlangen-Nürnberg Electronic device
CN102364700B (en) * 2011-10-26 2013-03-27 常州天合光能有限公司 Solar cell reactive ion etching (RIE) technology temperature compensation method
AU2013277941B2 (en) 2012-06-21 2016-10-06 Monash University Conductive portions in insulating materials
EP2747132B1 (en) * 2012-12-18 2018-11-21 IMEC vzw A method for transferring a graphene sheet to metal contact bumps of a substrate for use in semiconductor device package
US9123753B2 (en) 2013-01-08 2015-09-01 Stmicroelectronics S.R.L. Nanoscale QCA-based logic gates in graphene technology
WO2017105470A1 (en) * 2015-12-17 2017-06-22 Intel Corporation Low-defect graphene-based devices & interconnects
CN105906467B (en) * 2016-04-27 2018-09-14 厦门大学 A kind of synthetic method of different three polyindene of organic photoelectrical material
US10918356B2 (en) 2016-11-22 2021-02-16 General Electric Company Ultrasound transducers having electrical traces on acoustic backing structures and methods of making the same
CN113921383B (en) * 2021-09-14 2022-06-03 浙江奥首材料科技有限公司 Copper surface passivation composition, application thereof and photoresist stripping liquid containing copper surface passivation composition

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040253820A1 (en) * 2003-06-12 2004-12-16 Deheer Walt A. Patterned thin film graphite devices and method for making same

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5926700A (en) * 1997-05-02 1999-07-20 Advanced Micro Devices, Inc. Semiconductor fabrication having multi-level transistors and high density interconnect therebetween
US7244669B2 (en) * 2001-05-23 2007-07-17 Plastic Logic Limited Patterning of devices
GB0622150D0 (en) * 2006-11-06 2006-12-20 Kontrakt Technology Ltd Anisotropic semiconductor film and method of production thereof

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040253820A1 (en) * 2003-06-12 2004-12-16 Deheer Walt A. Patterned thin film graphite devices and method for making same

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
F. MOLITOR ET AL: "Local gating of a graphene Hall bar by graphene side gates", PHYSICAL REVIEW B, vol. 76, no. 24, 1 December 2007 (2007-12-01), XP055034729, ISSN: 1098-0121, DOI: 10.1103/PhysRevB.76.245426 *
GU GONG ET AL: "Field effect in epitaxial graphene on a silicon carbide substrate", APPLIED PHYSICS LETTERS, AIP, AMERICAN INSTITUTE OF PHYSICS, MELVILLE, NY, US, vol. 90, no. 25, 19 June 2007 (2007-06-19), pages 253507 - 253507, XP012095422, ISSN: 0003-6951, DOI: 10.1063/1.2749839 *

Also Published As

Publication number Publication date
WO2009158552A1 (en) 2009-12-30
EP2311078A1 (en) 2011-04-20

Similar Documents

Publication Publication Date Title
EP2311078A4 (en) Patterned integrated circuit and method of production thereof
EP2469581A4 (en) Semiconductor element and production method thereof
HK1144124A1 (en) Semiconductor component and method of manufacture
HK1134145A1 (en) Pellicle and method of manufacturing same
EP2440704A4 (en) Novel paper and method of manufacturing thereof
PL2328424T3 (en) Confectionery and methods of production thereof
HK1144492A1 (en) Semiconductor component and method of manufacture
EP2357091A4 (en) Exterior part and method of manufacturing same
HK1141138A1 (en) Semiconductor component and method of manufacture
EP2418305A4 (en) Die and method of manufacturing same
ZA201102973B (en) Confectionery and methods of production thereof
GB0817366D0 (en) Confectionery and methods of production thereof
GB0817369D0 (en) Confectionery and methods of production thereof
HK1131696A1 (en) Semiconductor component and method of manufacture
HK1125739A1 (en) Semiconductor component and method of manufacture
EP2325061A4 (en) Airbag and method of manufacturing same
GB2489067B (en) Transistor and manufacturing method of the same
GB201008668D0 (en) Heatsink and method of fabricating same
EP2220585A4 (en) Electronic inlay structure and method of manufacture therof
HK1157904A1 (en) Method of manufacturing electronic cards
EP2284144A4 (en) Polyfluoro-1-alkane and method of manufacture therefor
HK1124432A1 (en) Semiconductor component and method of manufacture
EP2393154A4 (en) Electronic device and method of manufacturing same
PL2330919T3 (en) Confectionery and methods of production thereof
TWI351243B (en) Manufacturing method of electronic device

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

17P Request for examination filed

Effective date: 20110126

AK Designated contracting states

Kind code of ref document: A1

Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO SE SI SK TR

AX Request for extension of the european patent

Extension state: AL BA RS

DAX Request for extension of the european patent (deleted)
A4 Supplementary search report drawn up and despatched

Effective date: 20121024

RIC1 Information provided on ipc code assigned before grant

Ipc: H01L 29/16 20060101ALI20121019BHEP

Ipc: H01L 21/461 20060101AFI20121019BHEP

Ipc: H01L 51/05 20060101ALI20121019BHEP

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWN

18D Application deemed to be withdrawn

Effective date: 20130103