EP2257856B1 - Integriertes einstellungselement und herstellungsverfahren dafür - Google Patents

Integriertes einstellungselement und herstellungsverfahren dafür Download PDF

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Publication number
EP2257856B1
EP2257856B1 EP09722049.5A EP09722049A EP2257856B1 EP 2257856 B1 EP2257856 B1 EP 2257856B1 EP 09722049 A EP09722049 A EP 09722049A EP 2257856 B1 EP2257856 B1 EP 2257856B1
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EP
European Patent Office
Prior art keywords
balance
regulating member
silicon
layer
pattern
Prior art date
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EP09722049.5A
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English (en)
French (fr)
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EP2257856A1 (de
Inventor
Pierre-André Bühler
Marco Verardo
Thierry Conus
Jean-Philippe Thiébaud
Jean-Bernard Peters
Pierre Cusin
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Nivarox Far SA
Nivarox SA
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Nivarox Far SA
Nivarox SA
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Priority to EP09722049.5A priority Critical patent/EP2257856B1/de
Publication of EP2257856A1 publication Critical patent/EP2257856A1/de
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    • G—PHYSICS
    • G04—HOROLOGY
    • G04D—APPARATUS OR TOOLS SPECIALLY DESIGNED FOR MAKING OR MAINTAINING CLOCKS OR WATCHES
    • G04D3/00—Watchmakers' or watch-repairers' machines or tools for working materials
    • G04D3/0002—Watchmakers' or watch-repairers' machines or tools for working materials for mechanical working other than with a lathe
    • G04D3/0035—Watchmakers' or watch-repairers' machines or tools for working materials for mechanical working other than with a lathe for components of the regulating mechanism
    • G04D3/0038—Watchmakers' or watch-repairers' machines or tools for working materials for mechanical working other than with a lathe for components of the regulating mechanism for balances
    • G—PHYSICS
    • G04—HOROLOGY
    • G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B17/00—Mechanisms for stabilising frequency
    • G04B17/04—Oscillators acting by spring tension
    • G04B17/06—Oscillators with hairsprings, e.g. balance
    • G04B17/063—Balance construction
    • G—PHYSICS
    • G04—HOROLOGY
    • G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B17/00—Mechanisms for stabilising frequency
    • G04B17/04—Oscillators acting by spring tension
    • G04B17/06—Oscillators with hairsprings, e.g. balance
    • G04B17/066—Manufacture of the spiral spring

Definitions

  • the invention relates to a regulating member and its method of manufacture and, more particularly, to a regulating member of the spring-balance type.
  • the regulating member of a timepiece generally comprises an inertia flywheel called a balance wheel and a resonator called a spiral. These pieces are decisive for the running quality of the timepiece. Indeed, they regulate the movement, that is to say they control the frequency of the movement.
  • the balance and the hairspring are different in nature, which makes it extremely difficult to perfect the regulating organ, which includes the own fabrications of the balance and the hairspring and their assembly substantially in resonance.
  • the balance and the hairspring have each been manufactured in various materials, in particular in order to limit the influence of a change in temperature without the resonance assembly difficulties disappearing.
  • EP0732635 discloses a method of manufacturing mono-block micro-mechanical silicon parts.
  • the object of the present invention is to overcome all or part of the aforementioned drawbacks by proposing a monobloc regulator which remains insensitive to temperature changes and which is obtained by means of a manufacturing process which minimizes the difficulties of assembly.
  • the invention relates to a one-piece regulating member comprising a balance made in a first layer of silicon-based material cooperating with a spiral, said spiral being made in a second layer of silicon-based material and comprising a spiral spring mounted coaxially on a ferrule, characterized in that it comprises a portion, forming an extension spacing of the ferrule, which is made in a third layer of silicon-based material and which is fixed between the ferrule and the ferrule, balance and in that the balance comprises a serge made in the first layer of silicon-based material and continuing in the second and third layers of silicon-based material to form said member integrally.
  • the invention also relates to a timepiece characterized in that it comprises a one-piece regulating member according to one of the preceding variants.
  • the invention relates to a generally annotated method 1 for manufacturing a regulating member 41, 41 ', 41 "for a timepiece movement.
  • Process 1 comprises successive steps intended to form at least one type of member (51 ", 41, 41 ', 41") monoblock which can be integrally formed of silicon-based materials.
  • the first step 100 is to provide a substrate 3 of the silicon-on-insulator type (also known as the acronym English SOI).
  • the substrate 3 comprises an upper layer 5 and a lower layer 7 each composed of a silicon-based material. Between the upper 5 and lower 7 layers, may extend an intermediate layer 9 composed of silicon dioxide (SiO 2 ).
  • the substrate 3 is chosen so that the height of the lower layer 7 corresponds to the height of a portion of the final regulator member 41, 41 ', 41 ". have a thickness sufficient to withstand the forces induced by the method 1.
  • a thickness may be for example between 300 and 400 microns.
  • the upper layer 5 is used as spacing means with respect to the lower layer 7. Therefore, the height of the upper layer 5 will be adapted according to the configuration of the regulating member 41, 41 ', 41 " According to said configuration, the thickness of the upper layer 5 can thus oscillate, for example, between 10 and 200 ⁇ m.
  • cavities 10, 11, 12, 13, 14 and 15 are selectively etched, for example by a deep reactive ion etching process (also known as DRIE), in the upper layer 5 of silicon-based material .
  • these cavities 10, 11, 12, 13, 14 and 15 form two patterns 17, 19 defining the inner and outer contours of silicon parts of the regulating member 41, 41 ', 41 ".
  • the patterns 17 and 19 are substantially in the form of coaxial cylinders with circular section, the pattern 17 having a larger diameter than that of the pattern 19.
  • the etching on the upper layer 5 leaves all freedom on the geometry of the patterns 17 and 19.
  • the patterns 17 and 19 are not necessarily circular but, for example, elliptical or have a non-circular inner diameter.
  • material bridges 18 are left in order to maintain the regulating member 41, 41 ', 41 "at the time of manufacture of the substrate 3.
  • material bridges 18 which remain respectively between each of the consecutive cavities 12, 13, 14 and 15 distributed in an arc around the periphery of the pattern 17.
  • a third step 102 as visible in figure 3 an additional layer 21 of silicon-based material is added to the substrate 3.
  • the additional layer 21 is fixed on the upper layer 5 by means of a fusion welding of silicon (also known by the acronym SFB) .
  • Step 102 advantageously allows the upper layer 5 to be covered by bonding with a very strong adhesion, in particular the upper faces of the patterns 17 and 19 on the lower face of the additional layer 21.
  • the additional layer 21 may, for example, comprise a thickness between 100 and 150 ⁇ m.
  • cavities 20, 22 and 24 are selectively etched, for example, by a method of the DRIE type similar to that of step 101, into the additional layer 21 of silicon-based material. These cavities 20, 22 and 24 make it possible to form three patterns 23, 25 and 27 defining the inner and outer contours of silicon parts of the regulating member 41, 41 ', 41 ".
  • the patterns 23 and 25 are substantially in the form of coaxial cylinders with a circular section and, the pattern 27, substantially in the form of a spiral.
  • the etching on the additional layer 21 leaves complete freedom on the geometry of the patterns 23, 25 and 27.
  • the patterns 23 and 25 are not necessarily circular but, for example, elliptical or have a non-circular inner diameter.
  • inner diameters 10 and 24 which are not necessarily circular but, for example, polygonal which could improve the transmission of rotational force with an axis 49 of corresponding shape.
  • each diameter 10, 24 may not be of identical shape.
  • the pattern 23 made in the additional layer 21 is of similar shape and substantially perpendicular to the pattern 19 made in the upper layer 5.
  • the cavities 10 and 24 respectively forming the inside diameter of the patterns 19 and 23 communicate together and are substantially one above the other.
  • the units 23 and 19 form the shell 55, 55 ', 55 "of the regulating member 41, 41', 41" which extends in height on the layers 5 and 21.
  • the pattern 25 made in the additional layer 21 is of similar shape and substantially perpendicular to the pattern 17 made in the upper layer 5.
  • the patterns 25 and 17 form part of the serge 47, 47 ', 47 "of the balance 43, 43', 43" of the regulating member 41, 41 ', 41 "which extends in height in particular on the layers 5 and 21.
  • the material bridges 18 are not reproduced and that the cavity 22 in the additional layer 21 forms a continuous ring unlike the cavities 12, 13, 14 and 15 which open out under it to the figure 4 .
  • the patterns 23 and 27 are etched at the same time and form a single piece in the additional layer 21.
  • the units 23 and 27 form the spiral spring 53, 53 ', 53 "and the upper part of the shell 55, 55', 55" of the regulating member 41, 41 ', 41 ".
  • external curve of the pattern 27 shown in FIG. figure 4 is open. This last characteristic associated with the spacing with respect to the lower layer 7 produced by the pattern 19 makes it possible to embellish said external curve by means of a raquet.
  • the etching on the additional layer 21 leaves all freedom on the geometry of the pattern 27.
  • the pattern 27 may not have an open external curve but, for example, have on the end the outer curve a bead adapted to serve as a fixed attachment point, that is to say without the need for raquetry.
  • the pattern 27 may also comprise an internal turn comprising a Grossmann type curve to improve its concentricity of development as explained in the document EP 1 612 627 .
  • the patterns 23 and 27 etched in the additional layer 21 are only connected by the underside of the pattern 23, with a very strong adhesion, above the etched pattern 19 of the upper layer. 5 (the pattern 19 is itself connected, with a very strong adhesion, to the lower layer 7).
  • the patterns 23 and 27 are therefore no longer in direct contact with the additional layer 21.
  • the pattern 25 is no longer in direct contact with the additional layer 21 but only connected, with a very strong adhesion, to the pattern 17 etched of the upper layer 5.
  • the method 1 may comprise a fifth step 104 which consists in oxidizing at least the pattern 27, that is to say the spiral spring 53, 53 ', 53 "of the regulating member 41, 41', 41a to adjust its thermoelastic coefficient but also to make it mechanically more resistant, such an oxidation step is explained in particular in the patent EP 1 422 436 .
  • the method 1 advantageously allows to produce only the spiral 51 '"as visible in FIG. figure 16 .
  • one of the advantages of the method 1 is to be able to adapt the height of the pattern 19 of the shell 55, 55 ', 55 “, 55”' protruding spiral spring 53, 53 ', 53 “, 53”' directly by choosing the thickness of the upper layer 5.
  • step 103 or 104 it is sufficient to stop the process 1 at step 103 or 104 by providing the intermediate step of forming bridges of material.
  • Such material bridges may in particular be formed either on the pattern 19 during step 101 or on the pattern 27 at the end, for example, of the last turn during step 103.
  • the penultimate step of the method 1 could then consist in removing the lower layer 7, for example, by etching and / or mechanical etching.
  • step 106 the hairspring 51 "'thus obtained would be released.
  • the method 1 may comprise three embodiments A, B and C as illustrated in FIG. the figure 9 .
  • each of the three embodiments A, B and C ends with the same final step 106 of freeing the substrate 3 the regulator 41, 41 "41" manufactured.
  • the release step 106 can then be simply performed by providing a force to the regulating member 41, 41 ', 41 "capable of breaking its material bridges 18.
  • This effort can, for example, be generated manually by a operator or by machining.
  • cavities 26, 28, 29, 30, 31 and 32 are selectively etched, for example, by a method of the DRIE type similar to that of steps 101 and 103, in the lower layer 7 of silicon-based material. These cavities 26, 28, 29, 30, 31 and 32 make it possible to form a pattern 34 defining the inner and outer contours of a silicon part of the regulating member 41.
  • the pattern 34 is substantially in the form of a rim with four arms 40, 42, 44, 46.
  • the etching on the lower layer 7 leaves all freedom on the geometry of the pattern 34.
  • the number and geometry of the arms can be different just as the rim is not necessarily circular but, for example, elliptical.
  • the arms 40, 42, 44, 46 may be slender in order to allow their axial and / or radial deformation in the event of shock transmitted to the regulating member.
  • part of the pattern 34 made in the lower layer 7 is of similar shape and substantially perpendicular to the patterns 17 and 25 made respectively in the upper and additional layers 5 and 21.
  • the pattern 34 forms, with the patterns 17 and 25, the balance 43 of the regulating member 41, the serge 47 therefore extends in height over all of the layers 5, 7 and 21.
  • the cavity 26 of the pattern 34 is substantially in extension of the cavities 10 and 24 forming the inner diameter of the patterns 19 and 23.
  • the successive cavities 24, 10 and 26 thus form a suitable internal diameter. receiving the balance shaft 49 of the regulating member 41.
  • a monoblock regulator 41 integrally formed of silicon-based materials is obtained, as visible in FIGS. Figures 10 and 11 . It is therefore clear that there is no longer any problem of assembly because it is directly achieved during the manufacture of the regulating member 41.
  • the latter comprises a rocker 43 whose hub 45 is connected firstly radially to the serge 47 by four arms 40, 42, 44 and 46 and, on the other hand, axially, to the hairspring 51 which comprises a hairspring 53 and a shell 55.
  • the serge 47 is formed by the peripheral ring of the pattern 34 of the lower layer 7 but also by the patterns 17 and 25 of the respective upper and additional layers 21.
  • the ferrule 55 is formed by the pattern 23 of the additional layer 21 and the pattern 19 of the upper layer 5.
  • this pattern 19 is used as spacing means between the spiral 51 and the balance 43 so as to be able, for example, to pit the spiral spring 53 using a snowshoe.
  • the pattern 19 is also useful as a guide means of the hairspring 51 by increasing the height of the shell 55.
  • the etching on the additional layer 21 leaves complete freedom on the geometry of the spiral spring 53.
  • the spiral spring 53 may not have an open external curve but, for example, comprise on the end of the outer curve a bead adapted to serve as a fixed attachment point, that is to say without the need for raquetry.
  • the regulating member 41 is adapted to receive a balance shaft 49 through the cavities 24, 10 and 26.
  • the regulating member 41 being in one piece, it is not necessary to fix the axis balance 49 to the ferrule 55 and balance 43 but only to one of them.
  • the balance shaft 49 is fixed on the inner diameter 26 of the rocker arm 43, for example by means of elastic means 48 etched into the silicon-based hub 45 during the step 105.
  • elastic means 48 can for example, take the form of those disclosed in the Figures 10A to 10E patent EP 1 655 642 or those disclosed in the Figures 1, 3 and 5 patent EP 1 584 994 .
  • the cavities 24 and 10 have sections of larger dimensions than that of the cavity 26 to prevent the balance shaft 49 is in bold contact with the ferrule 55.
  • the method 1 comprises, after the step 103 or 104, a sixth step 107, as visible in FIG. figure 6 , consisting in implementing a process of the LIGA type (a well-known acronym derived from German "röntgenLIthographie, Galvanoformung &Abformung").
  • LIGA a well-known acronym derived from German "röntgenLIthographie, Galvanoformung &Abformung”
  • Such a process comprises a succession of steps making it possible to electrodeposit in a particular form a metal on the lower layer 7 of the substrate 3 with the aid of a photostructured resin.
  • the deposited metal may be, for example, gold or nickel or one of their alloys.
  • step 107 may consist of depositing a castellated ring 61 and / or a cylinder 63.
  • the ring 61 comprises a series of pads 65 substantially in a circular arc and is intended to advantageously increase the mass of the future balance 43 '.
  • a first characteristic of the invention therefore consists in increasing the mass of the rocker arm 43 'with the aid of metal obtained by electroplating in order to increase the inertia of the future rocker arm 43'.
  • the metal deposited on the lower layer 7 has a spacing between each pad 65 able to compensate for the thermal expansion of the ring 61.
  • the cylinder 63 is intended to receive, advantageously, by driving a balance shaft 49.
  • another disadvantage of silicon lies in its very weak areas of elastic and plastic which makes it very brittle.
  • Another characteristic of the invention is therefore to achieve the clamping of the balance shaft 49 not against the silicon-based material of the rocker arm 43 'but on the inside diameter 67 of the metal cylinder 63 electrodeposited during the step 107.
  • the cylinder 63 obtained by electrodeposition allows complete freedom as to its geometry .
  • the inner diameter 67 is not necessarily circular but, for example, polygonal which could improve the transmission of rotational force with an axis 49 of corresponding shape.
  • a seventh step 108 similar to the step 105 visible at the figure 5 cavities are selectively etched, for example, by a method of the DRIE type, in the lower layer 7 of silicon-based material. These cavities make it possible to form a balance pattern similar to the pattern 34 of embodiment A. As illustrated in the example of FIGS. Figures 12 and 13 the pattern obtained may be substantially in the form of a four-armed rim 40 ', 42', 44 ', 46'. However, advantageously according to the method 1, the etching on the lower layer 7 leaves all freedom on the geometry of the pattern 34. Thus, in particular, the number and the geometry of the arms can be different just as the rim is not necessarily circular but for example, elliptical. In addition, the arms 40 ', 42', 44 ', 46' may be slender in order to allow their axial and / or radial deformation in the event of shock transmitted to the regulating member.
  • a part of the rocker pattern produced in the lower layer 7 is of similar shape and substantially vertically above the patterns 17 and 25 made respectively during the steps 101 and 103 in the upper and additional layers 5 and 21.
  • the balance pattern forms, with the patterns 17 and 25 and the metal parts 61 and / or 63, the balance 43 'of the regulating member 41' whose serge 47 'therefore extends in height over all the layers 5, 7 and 21 and metal parts 61 and / or 63.
  • the successive cavities thus form an inside diameter adapted to receive the balance shaft 49 of the regulating member 41 '.
  • bridges 18 may not be reproduced in the lower layer 7 either.
  • a one-piece regulator 41 'formed of silicon-based materials with one or two parts 61, 63 is obtained.
  • metal as visible to Figures 12 and 13 . It is therefore understood that there is no longer a problem of assembly because it is directly achieved during the manufacture of the regulating member 41 '.
  • the latter comprises a rocker arm 43 'whose hub 45' is connected on the one hand radially to the serge 47 'by four arms 40', 42 ', 44' and 46 'and, on the other hand, axially to the spiral 51 which comprises a spiral spring 53 'and a ferrule 55'.
  • the serge 47 ' is formed by the peripheral ring of the balance pattern of the lower layer 7 but also by the patterns 25 and 17 of the respective upper and additional layers 21 and, optionally, the metal part 61.
  • the shell 55 ' is formed by the pattern 23 of the additional layer 21 and the pattern 19 of the upper layer 5.
  • this pattern 19 is used as spacing means between the spiral 51' and the balance 43 'so as to pit the spiral spring 53' with a raquetetterie.
  • the pattern 19 is also useful as a guiding means of the hairspring 51 'by increasing the height of the shell 55'.
  • the etching on the additional layer 21 leaves complete freedom on the geometry of the spiral spring 53 '.
  • the spiral spring 53 ' may not have an open external curve but, for example, have on the end of the external curve a bead adapted to serve as a fixed attachment point, that is to say without the need for raquetry.
  • the regulating member 41 ' is able to receive a balance shaft 49 in its inside diameter.
  • the regulating member 41 ' being in one piece, it is not necessary to fix the balance pin 49 to the shell 55' and the balance 43 'but only to one of the two.
  • the balance shaft 49 is preferably fixed to the inner diameter 67 of the metal part 63, for example by driving.
  • the cavities 24 and 10 have sections of larger dimensions than the inner diameter 67 of the metal portion 63 to prevent the balance shaft 49 is in bold contact with the ferrule 55 '.
  • the balance shaft 49 thus receives force from the regulating member 41 'only, preferably, via the metal portion 63 of the hub 45' of the balance 43 '.
  • the inertia of the balance 43 ' is advantageously amplified. Indeed, the density of a metal being much greater than that of silicon, the mass of the balance 43 'is increased and, incidentally, also its inertia.
  • the method 1 comprises, after the step 103 or 104, in a sixth step 109, as visible at the figure 7 , selectively etching cavities 60 and / or 62, for example, by a DRIE-type method, to a limited depth in the lower layer 7 of silicon-based material.
  • These cavities 60, 62 make it possible to form recesses able to serve as containers for at least one metal part.
  • the cavities 60 and 62 obtained can be shaped respectively ring and disk.
  • the etching on the lower layer 7 leaves complete freedom on the geometry of the cavities 60 and 62.
  • the method 1 comprises the implementation of a galvanic growth type or LIGA type process for filling cavities 60 and / or 62 in a particular metal form.
  • the deposited metal may be, for example, gold or nickel or one of their alloys.
  • step 110 may consist in depositing a crenellated ring 64 in the cavity 60 and / or a cylinder 66 in the cavity 62.
  • the ring 64 comprises a series of pads 69 substantially in a circular arc and is intended to advantageously increase the mass of the future beam 43.
  • a disadvantage of silicon lies in its low
  • a characteristic of the invention therefore consists in increasing the weight of the rocker arm 43 "with the aid of metal obtained by electroplating in order to increase the inertia of the future rocker arm 43".
  • the metal deposited on the lower layer 7 has a spacing between each stud 69 able to compensate for the thermal expansions of the ring 64.
  • the cylinder 66 is intended to receive, advantageously, by driving a balance shaft 49.
  • an advantageous characteristic according to the invention is to achieve the clamping of the balance shaft 49 not against the silicon-based material but on the inside diameter 70 of the metal cylinder 66 electrodeposited during step 110.
  • the cylinder 66 obtained by electroplating leaves full freedom as to its geometry.
  • the inner diameter 70 is not necessarily circular but, for example, polygonal which could allow to improve the transmission of rotational force with an axis 49 of corresponding shape.
  • the method 1 may comprise, in an eighth step 111, polishing the metal deposit or deposits 64, 66 made during step 110 in order to make them planar.
  • a ninth step 112 similar to steps 105 or 108, in particular visible in FIG. figure 5 cavities are selectively etched, for example, by a method of the DRIE type, in the lower layer 7 of silicon-based material. These cavities make it possible to form a balance pattern similar to the pattern 34 of embodiment A.
  • the pattern obtained may be substantially four-armed rim shape 40 ", 42", 44 ", 46".
  • the etching on the lower layer 7 leaves all freedom on the geometry of the pattern 34.
  • the number and the geometry of the arms 40 ", 42", 44 ", 46” can be different just as the rim is not necessarily circular but, for example, elliptical.
  • the arms may be slender to allow their axial deformation and / or radial in case of shock transmitted to the regulating member.
  • the rocker pattern produced in the lower layer 7 is of similar shape and substantially perpendicular to the patterns 17 and 25 made respectively during the steps 101 and 103 in the upper and additional layers 5 and 21.
  • the pendulum pattern forms, with the patterns 17 and 25 and the metal parts 64 and / or 66, the balance 43 "of the regulating member 41" whose serge 47 "therefore extends in height over all the layers 5 , 7 and 21.
  • the successive cavities thus form an inside diameter capable of receiving the balance shaft 49 of the regulating member 41.
  • a one-piece regulator 41 formed of silicon-based materials with one or two metal parts 64, 66 as visible at Figures 14 and 15 . It is thus understood that there is no longer any problem of assembly because it is directly carried out during the manufacture of the regulating member 41 "which comprises a rocker arm 43" whose hub 45 "is connected on the one hand radially to the serge 47 “by four arms 40", 42 “, 44” and 46 “and, on the other hand, axially, to the spiral 51" which comprises a spiral spring 53 "and a ferrule 55".
  • the serge 47 is formed by the peripheral ring of the pendent pattern of the lower layer 7, but also by the patterns 25 and 17 of the respective upper and additional layers 21 and, optionally, of the metallic part. 64.
  • the shell 55 is formed by the pattern 23 of the additional layer 21 and the pattern 19 of the upper layer 5.
  • this pattern 19 is used as spacing means between the spiral 51" and the balance 43 "in order to be able, for example, to pit the spiral spring 53" by means of a racket.
  • the pattern 19 is also useful as a guide means of the spiral 51 "by increasing the height of the ferrule 55".
  • the etching on the additional layer 21 leaves all freedom on the geometry of the spiral spring 53 "Thus, in particular, the spiral spring 53" may not have an open external curve but, for example , comprise on the end of the outer curve a bead adapted to serve as a fixed attachment point, that is to say without the need for raquetry.
  • the regulating member 41 is adapted to receive a balance pin 49 in its inside diameter
  • the regulating member 41 being in one piece, it is not necessary to fix the balance shaft 49 to the 55 "ferrule and the 43" balance but only to one of the two.
  • the balance shaft 49 is fixed on the inner diameter 70 of the metal part 66, for example by driving.
  • the cavities 24 and 10 have sections of larger dimensions than the inner diameter 70 of the metal portion 66 to prevent the balance shaft 49 is in bold contact with the ferrule 55 " .
  • the balance axis 49 therefore receives effort from the regulating member 41 "that, preferably, via the metal portion 66 of the hub 45" of the balance 43 ".
  • the inertia of the balance 43 is advantageously amplified, since the density of a metal being much greater than that of silicon, the mass of the balance 43" is increased and, incidentally, also its inertia.
  • the final regulating member 41, 41 'and 41 is thus assembled before being structured, that is to say before being etched and / or or modified by electrodeposition. This advantageously allows to minimize the dispersions caused by the current assemblies of a balance with a spiral.
  • the present invention is not limited to the illustrated example but is susceptible of various variations and modifications that will occur to those skilled in the art.
  • the patterns 17 and 25 etched in steps 101 and 103 in the layers 5 and 21 may not be limited to a plane surface state but may incorporate at least one ornament in said steps for decorating at least one of the faces.
  • serge 47, 47 ', 47 which can be useful especially in the case of timepieces of the skeleton type.
  • metal parts 63, 66 electrodeposited according to the embodiments B and C are interchanged, that is to say that the projecting portion 63 of the mode B is replaced by the integrated part 66 of the mode C or conversely (which requires only a slight adaptation of the method 1) or even that the portion 66 integrated in the hub protrudes from the lower layer 7.
  • the metal parts 61, 64 electrodeposited in the embodiments B and C are interchanged, that is to say that the projecting portion 61 of the B mode is replaced by the integrated part. 64 of mode C or vice versa or even that the portion 64 integrated in the serge protrudes from the lower layer 7.
  • the method 1 can furthermore provide, a posteriori of the release step 106, a step of adapting the frequency of the regulating member 41, 41 ', 41 ". for engraving, for example by laser, recesses 68 able to modify the operating frequency of said regulating member.
  • recesses 68 as illustrated in the example of Figures 10 and 11 , could, for example, be made on one of the peripheral walls of the pattern 34 belonging to the serge 47, 47 ', 47 "and / or on one of the electroplated metal parts 61, 64.
  • regulating structures of the flyweight type can also be considered to increase the inertia and adjust the frequency.
  • a conductive layer is deposited on at least a portion of the regulator member 41, 41 ', 41 "in order to avoid isochronism problems, Such a layer may be of the type disclosed in the document EP 1 837 722 .
  • a polishing step of the type of step 111 can also be carried out between step 107 and step 108. It can also be envisaged that a step of producing a metal deposit 63, 66, of the type obtained by the embodiments B or C, is carried out not on the balance but, in the case of the manufacture of the single spiral 51 "', on the additional layer 21 so as to be able to drive an axis not against the material to silicon base of the inner diameter of the shell 55 '"but against said metal deposit.

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Claims (23)

  1. Einteiliges Regulatororgan (41, 41', 41"), das eine Unruh (43, 43', 43") umfasst, die in einer ersten Schicht (7) aus einem Material auf Siliciumbasis ausgebildet ist und mit einer Spirale (51, 51', 51") zusammenwirkt, wobei die Spirale in einer zweiten Schicht (21) aus einem Material auf Siliciumbasis ausgebildet ist und eine Spiralfeder (53, 53', 53") umfasst, die koaxial auf einer Spiralrolle (55, 55', 55") angeordnet ist, dadurch gekennzeichnet, dass das einteilige Regulatororgan (41, 41', 41") einen Teil (19) umfasst, der eine Beabstandung in Verlängerung der Spiralrolle (55, 55', 55") bildet, der in einer dritten Schicht (5) aus einem Material auf Siliciumbasis ausgebildet ist und der zwischen der Spiralrolle (55, 55', 55") und der Unruh (43, 43', 43") befestigt ist, und dass die Unruh (43, 43', 43") einen Radkranz (47, 47', 47") umfasst, der in der ersten Schicht (7) aus einem Material auf Siliciumbasis ausgebildet ist und in die zweite und in die dritte Schicht (21, 5) aus einem Material auf Siliciumbasis fortgesetzt ist, um das Organ in einteiliger Weise zu bilden.
  2. Regulatororgan nach Anspruch 1, dadurch gekennzeichnet, dass die Unruh (43, 43', 43") ein Loch (26) aufweist, das den Innendurchmesser (24, 10) der Spiralrolle (55, 55', 55") verlängert, um darin eine Unruhwelle (49) aufzunehmen.
  3. Regulatororgan nach Anspruch 2, dadurch gekennzeichnet, dass die Unruhwelle (49) an der Unruh (43, 43', 43") befestigt ist.
  4. Regulatororgan nach Anspruch 3, dadurch gekennzeichnet, dass die Unruhwelle (49) an der Unruh (43', 43") durch Einpressen in eine metallische Auflage (63, 66), die auf Höhe des Lochs ausgebildet ist, befestigt ist.
  5. Regulatororgan nach einem der Ansprüche 2 bis 4, dadurch gekennzeichnet, dass der Querschnitt des Innendurchmessers (24, 10) der Spiralrolle (55, 55', 55") größer als jener des Lochs (26, 63, 66) der Unruh (43, 43', 43") ist, um starke Kontakte zwischen der Unruhwelle (49) und dem Innendurchmesser (24, 10) der Spiralrolle (55, 55', 55") zu vermeiden.
  6. Regulatororgan nach einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass der Radkranz (47, 47', 47") der Unruh (43, 43', 43") durchgehend ist und eine Anpassungsvorrichtung (61, 64, 68) aufweist, die das Trägheitsmoment der Unruh verändern kann.
  7. Regulatororgan nach Anspruch 6, dadurch gekennzeichnet, dass der Radkranz (47, 47', 47") mit der Nabe (45, 45', 45") der Unruh (43, 43', 43") durch wenigstens einen Arm (40, 42, 44, 46, 40', 42', 44', 46', 40", 42", 44", 46"), der dünn ist, um seine axiale und/oder radiale Verformung im Fall eines an die Unruh (41, 41', 41 ") übertragenen Stoßes zuzulassen, verbunden ist.
  8. Regulatororgan nach Anspruch 6 oder 7, dadurch gekennzeichnet, dass die Anpassungsvorrichtung Aussparungen (60, 68) aufweist, die an dem Radkranz (47, 47") der Unruh (43, 43") ausgebildet sind, um die Trägheit der Unruh einstellen zu können.
  9. Regulatororgan nach Anspruch 8, dadurch gekennzeichnet, dass die Aussparungen (60) ein Material mit höherer Dichte als jenes des Radkranzes (47") der Unruh (43") enthalten, um die Trägheit der Unruh zu erhöhen.
  10. Regulatororgan nach Anspruch 6 oder 7, dadurch gekennzeichnet, dass die Anpassungsvorrichtung Erhebungen (61) aufweist, die an dem Radkranz (47') der Unruh (43') ausgebildet sind und ein Material mit einer höheren Dichte als jenes des Radkranzes (47') aufweisen, um die Trägheit der Unruh zu erhöhen.
  11. Regulatororgan nach Anspruch 9 oder 10, dadurch gekennzeichnet, dass das Material mit höherer Dichte auf Höhe des Radkranzes (47', 47") in Form eines gezahnten Rings (61, 64) verteilt ist, der eine Folge von Klötzchen (65, 69) aufweist, die in einem regelmäßigen Intervall beabstandet sind, um die Wärmeausdehnung des Materials auszugleichen.
  12. Regulatororgan nach einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass die innere Windung der Spiralfeder (53, 53', 53") eine Kurve des Grossmann-Typs aufweist, um die Konzentrizität der Abwicklung der Spirale zu verbessern.
  13. Regulatororgan nach einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass die Spiralfeder (53, 53', 53") wenigstens einen Teil auf Siliciumdioxid-Basis aufweist, um sie mechanisch widerständiger zu machen und um ihren thermoelastischen Koeffizienten einzustellen.
  14. Zeitmessgerät, dadurch gekennzeichnet, dass es ein Regulatororgan (41, 41', 41 ") nach einem der vorhergehenden Ansprüche umfasst.
  15. Verfahren zum Herstellen (1) eines einteiligen Regulatororgans (41, 41', 41 "), das die folgenden Schritte umfasst:
    a) Bereitstellen (100) eines Substrats (3), das eine obere Schicht (5) und eine untere Schicht (7) aus Materialien auf Siliciumbasis aufweist;
    b) selektives Ätzen (101) wenigstens eines Hohlraums (10, 11) in die obere Schicht (5), um das Muster eines ersten Teils (19) einer Spiralrolle (55, 55', 55") und eines ersten Teils (17) einer Unruh (43, 43', 43") des Organs aus einem Material auf Siliciumbasis zu definieren;
    dadurch gekennzeichnet, dass es außerdem die folgenden Schritte umfasst:
    c) Befestigen (102) einer zusätzlichen Schicht (21) aus einem Material auf Siliciumbasis durch Silicium-Fusionsbonden auf der geätzten oberen Schicht (5) des Substrats (3);
    d) selektives Ätzen (103) wenigstens eines Hohlraums (20, 24) in der zusätzlichen Schicht (21), um das Muster (19, 23) der ersten Teile der Spiralrolle (55, 55', 55") und der Unruh (43, 43', 43") fortzusetzen und um das Muster (27) einer Spiralfeder (53, 53', 53") des Organs aus Materialien auf Siliciumbasis zu definieren;
    e) selektives Ätzen (105, 108, 112) wenigstens eines Hohlraums (26, 28, 29, 30, 31, 32) in der unteren Schicht (7), um den letzten Teil (34) der Unruh (43, 43', 43") des Organs aus Materialien auf Siliciumbasis zu definieren;
    f) Freigeben des Regulatororgans (41, 41', 41 ") von dem Substrat (3).
  16. Herstellungsverfahren nach Anspruch 15, dadurch gekennzeichnet, dass es außerdem nach dem Schritt d) den folgenden Schritt umfasst:
    g) Oxidieren der Spiralfeder (53, 53', 53") des Organs aus einem Material auf Siliciumbasis, um ihren thermoelastischen Koeffizienten einzustellen, jedoch auch, um sie mechanisch widerständiger zu machen.
  17. Herstellungsverfahren nach Anspruch 15 oder 16, dadurch gekennzeichnet, dass es außerdem vor dem Schritt e) den folgenden Schritt umfasst:
    h) selektives Ablagern (107, 110) wenigstens einer Metallschicht (61, 63, 64, 66) auf der unteren Schicht (7), um das Muster wenigstens eines Teils aus Metall des Organs zu definieren.
  18. Herstellungsverfahren nach Anspruch 17, dadurch gekennzeichnet, dass der Schritt h) die folgende Phase umfasst:
    i) Aufwachsenlassen (107) der Ablagerung durch aufeinander folgende metallische Schichten wenigstens teilweise auf der Oberfläche der unteren Schicht (7), um einen metallischen Teil (61) zu bilden, der dazu bestimmt ist, die Masse der Unruh (43') aus Materialien auf Siliciumbasis zu erhöhen.
  19. Herstellungsverfahren nach Anspruch 17 oder 18, dadurch gekennzeichnet, dass der Schritt h) die folgende Phase umfasst:
    i') Aufwachsenlassen (107) der Ablagerung durch aufeinander folgende metallische Schichten wenigstens teilweise auf der Oberfläche der unteren Schicht (7), um einen zweiten metallischen Teil (63) zu bilden, der dazu bestimmt ist, durch Einpressen eine Welle (49) aufzunehmen.
  20. Herstellungsverfahren nach Anspruch 17, dadurch gekennzeichnet, dass der Schritt h) die folgenden Phasen umfasst:
    j) selektives Ätzen (109) wenigstens eines Hohlraums (60) in der unteren Schicht (7), der dazu bestimmt ist, den wenigstens einen Teil aus Metall aufzunehmen;
    k) Aufwachsenlassen (110) der Ablagerung durch aufeinander folgende metallische Schichten wenigstens teilweise in dem wenigstens einen Hohlraum, um einen metallischen Teil (64) zu bilden, der dazu bestimmt ist, die Masse der Unruh (43") aus Materialien auf Siliciumbasis zu erhöhen.
  21. Herstellungsverfahren nach Anspruch 17 oder 20, dadurch gekennzeichnet, dass der Schritt h) die folgenden Phasen umfasst:
    j') selektives Ätzen (109) wenigstens eines Hohlraums (62) in der unteren Schicht (7), der dazu bestimmt ist, den wenigstens einen Teil aus Metall aufzunehmen;
    k') Aufwachsenlassen (110) der Ablagerung durch aufeinander folgende metallische Schichten wenigstens teilweise in dem wenigstens einen Hohlraum, um einen zweiten metallischen Teil (63) zu bilden, der dazu bestimmt ist, durch Einpressen eine Welle (49) aufzunehmen.
  22. Herstellungsverfahren nach einem der Ansprüche 17 bis 21, dadurch gekennzeichnet, dass dem Schritt h) der folgende Schritt folgt:
    I) Polieren (111) der metallischen Ablagerung (61, 63, 64, 66).
  23. Herstellungsverfahren nach einem der Ansprüche 15 bis 22, dadurch gekennzeichnet, dass mehrere Regulatororgane (41, 41', 41") auf demselben Substrat (3) ausgebildet sind.
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US8523426B2 (en) 2013-09-03
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JP2011526676A (ja) 2011-10-13
WO2009115463A1 (fr) 2009-09-24
US20110103197A1 (en) 2011-05-05
EP2104008A1 (de) 2009-09-23
JP5134137B2 (ja) 2013-01-30
CN101978326A (zh) 2011-02-16
CN101978326B (zh) 2013-01-02
RU2010142920A (ru) 2012-04-27
RU2473947C2 (ru) 2013-01-27
TW201001106A (en) 2010-01-01
EP2257856A1 (de) 2010-12-08

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