EP2215668A1 - Piezoelectric component with outer contacting having gas-phase deposition, method for manufacturing the component and use of the component - Google Patents
Piezoelectric component with outer contacting having gas-phase deposition, method for manufacturing the component and use of the componentInfo
- Publication number
- EP2215668A1 EP2215668A1 EP08856710A EP08856710A EP2215668A1 EP 2215668 A1 EP2215668 A1 EP 2215668A1 EP 08856710 A EP08856710 A EP 08856710A EP 08856710 A EP08856710 A EP 08856710A EP 2215668 A1 EP2215668 A1 EP 2215668A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- layer
- electrode
- piezoelectric
- outer electrode
- vapor deposition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/80—Constructional details
- H10N30/87—Electrodes or interconnections, e.g. leads or terminals
- H10N30/872—Connection electrodes of multilayer piezoelectric or electrostrictive devices, e.g. external electrodes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/01—Manufacture or treatment
- H10N30/06—Forming electrodes or interconnections, e.g. leads or terminals
- H10N30/063—Forming interconnections, e.g. connection electrodes of multilayered piezoelectric or electrostrictive parts
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/42—Piezoelectric device making
Definitions
- Piezoelectric device with external contact which has a vapor deposition, method of manufacturing the component and use of the component
- the invention relates to a piezoelectric component with external contact, which has a vapor deposition.
- a method for producing the component and a use of the component are presented.
- Piezoelectric components are used for example in automotive technology for controlling fuel injection valves.
- the core of these components is a piezoelectric element, in which an electrode layer and a further electrode layer are arranged one above the other. Between the electrode layers is a piezoelectric layer.
- the piezoelectric layer consists for example of a piezoceramic such as lead zirconate titanate (PZT).
- PZT lead zirconate titanate
- the piezoelectric components are designed in multi-layer design.
- Piezoelement stack arranged.
- electrode layers internal electrodes
- piezoelectric layers are alternately arranged one above the other.
- a so-called multi-layer capacitor structure is realized for contacting the electrode layers.
- the electrode layers are alternately at different side surfaces of the piezoelectric element and thus at different Side surfaces of the piezo element stack guided and contacted there electrically.
- the electrode layers do not delimit the piezoelectric layer arranged therebetween in a full-surface manner.
- the non-flat arrangement leads to piezoelectrically active and piezoelectrically inactive areas. In these areas different electrical fields are coupled. Due to the different electric fields, different deflections and thus mechanical stresses occur. This mechanical
- An alternative variant is the so-called fully active piezoelectric actuator.
- the electrode layers and the further electrode layers delimit the piezoelectric layers arranged therebetween in a full-surface manner.
- a substantially identical electric field is coupled into the entire piezoelectric layer.
- the electrode layers it is necessary for the electrode layers to be electrically individually controllable. It must be ensured that the electrode layers can be applied independently of one another with the corresponding electrical potentials.
- the object of the present invention is therefore to show how the electrode layers of a piezoelectric element of a piezoelectric component can be contacted electrically independently of one another and with a high current carrying capacity.
- a piezoelectric component is provided with at least one stacked piezoelectric element having at least one electrode layer with Elektrodenmate ⁇ al, at least one further electrode layer with further electrode material and at least one disposed between the electrode layers piezoelectric layer with piezoelectric material in the stacking direction, wherein the electrode layer to extends on at least one lateral surface portion of the piezoelectric element, on the lateral surface portion an electrical insulation layer is applied, for electrically contacting the electrode layer in the insulating layer at least one electrical via is present and the electrical via has at least one directly applied to the electrode layer electrically conductive vapor deposition layer.
- the further electrode layer is guided to a side surface of the piezoelectric element.
- the electrode layer extends to at least one further lateral surface section of the piezoelectric element, wherein a further electrical insulation layer is applied to the further lateral surface section, at least one further electrical via is present for the electrical contacting of the further electrode layer in the further insulation layer and the further electrical via is at least one has further, applied directly to the electrode layer electrically conductive vapor deposition layer.
- a method for producing the piezoelectric component is also specified with the following method steps: a) providing at least one stacked piezoelectric element with an electrode layer, at least one further electrode layer and at least one arranged between the electrode layers piezoelectric layer, wherein the electrode layer up to a b) applying at least one electrical insulation layer to the surface section such that the electrode layer is freely accessible, c) applying an electrical via with at least one vapor deposition layer on the electrode layer by means of a gas phase deposition method and d) applying an outer electrode, see above that the outer electrode and the electrode layer are electrically contacted indirectly via the through-connection and the outer electrode and the further electrode sh not electrically isolated from each other.
- a piezoelectric element which has at least one further electrode layer, which extends to a further surface portion of the piezoelectric element.
- the following further method steps are carried out: b ') applying at least one further electrical insulation layer on the further surface section such that the further electrode layer is freely accessible, c') applying a further electrical via with at least one further vapor deposition layer on the further electrode layer by means of a further vapor deposition Method and d ') applying a further outer electrode, so that the further outer electrode and the further electrode layer indirectly via the further through-contacting electrically contacted and the further outer electrode and the electrode layer are electrically isolated from each other.
- the vapor deposition layer is metallic. Possible gas phase deposition methods for producing the vapor deposition layer are PVD (physical vapor deposition), for example sputtering or vapor deposition, or MOCVD (metal organic chemical vapor deposition).
- the contact area between an external contact and the electrode layer is relatively small, since an electrode layer generally only has a layer thickness of 2 ⁇ m to 4 ⁇ m.
- the metallic particles of the external contact with 5 microns to 20 microns are relatively large, so that it usually comes only to selective contact between the external contact and the electrode layer. With the help of the metallic vapor deposition layer, it is ensured that the exposed electrode layers are contacted completely flat. Thus, the contact area between the very small metal particles of the external contact and the electrode layers of the piezoelectric element is increased.
- the insulating layer may be made of any insulating material, such as glass, ceramic and plastic.
- the insulation layer can already be applied pre-structured.
- the insulation layer is a structured film.
- an insulating film can be laminated unstructured and subsequently structured. Openings are created in the insulation film. The opening succeeds, for example, by laser ablation. It is also conceivable that a photosensitive insulation film is used. The photosensitive insulating film is photo-patterned so that the electrode layers are exposed at the respective surface portions.
- the insulation layer can also be applied structured. This succeeds, for example, with the aid of the ink-jet method.
- an outer electrode with Kunststoffmaschinesmate ⁇ al indirectly over the Gas phase deposition layer with the electrode layer and / or on the further surface portion a further outer electrode with werteremmaschiner mecanicsmaterral indirectly via the further through-connection with the further electrode layer are electrically connected.
- a further outer electrode with werteremmaschiner mecanicsmaterral indirectly via the further through-connection with the further electrode layer are electrically connected.
- the piezoelectric component may have a single piezoelectric element described above.
- the piezoelectric component has a plurality of stacked piezo elements.
- the piezoelectric component has a multilayer construction with superimposed electrode layers and piezoelectric layers.
- a piezoelectric component wherein a plurality of piezoelectric elements is arranged one above the other to form a piezoelectric element stack such that the surface sections of the piezoelectric elements form a common stacked surface section, the insulation layers of the piezoelectric elements form a common stacked insulation layer Outside electrodes of the piezoelectric elements form a common stack outer electrode (collecting outer electrode), which is applied to the common stack insulating layer, that the common stack outer electrode and the electrode layers of the piezoelectric elements electrically contacted via the vias of the piezoelectric elements and the common stacking Outer electrode and the other electrode layers of the piezoelectric elements are electrically isolated from each other.
- the plurality of piezoelectric elements is arranged to the piezoelectric element stack such that the further surface sections of the piezoelectric elements form a common further stacked surface section, the further insulation layers of the piezoelectric elements form a common further stacked insulation layer, the further external electrodes of the piezoelectric elements form a common further stack Form outside electrode (collecting outer electrode), which is applied to the common further stack insulating layer, that the common further stack outer electrode and the further electrode layers of the piezoelectric elements electrically contacted via the further vias of the piezoelectric elements and the common further stack outer electrode and the electrode layers of the piezoelectric elements are electrically isolated from each other.
- Form outside electrode collector outer electrode
- the vapor deposition layer and / or the further vapor deposition layer have a layer thickness selected from the range of 10 nm to 5 ⁇ m and in particular a layer thickness selected from the range of 50 nm to 2 ⁇ m. Higher or lower layer thicknesses may also be provided.
- the vapor deposition layers may each comprise a single layer of a metal deposit.
- the vapor deposition layer and / or the further vapor deposition layer have a multilayer structure with a plurality of partial vapor deposition layers.
- the lowest partial contacting layer which is applied directly to a surface portion, consists of a well-adhering layer of titanium, of chromium or of a chromium-nickel alloy.
- a layer for improving the electrical conductivity is deposited.
- the via can also be galvanically reinforced.
- the plated through hole has a galvanic reinforcement applied to the vapor deposition layer.
- the galvanic reinforcement is, for example, an electrodeposited copper layer.
- Layer thickness of this layer is several microns, for example, 10 microns and more.
- the metals mentioned can moreover also be used in the further, electrically conductive components of the piezoelectric
- Contacting material at least one selected from the group consisting of chromium, gold, copper, nickel, palladium, platinum, titanium and silver metal.
- the metals mentioned may be present alone or together with other metals as an alloy.
- the electrode layers and other electrode layers do not limit the piezoelectric layer vollflachig.
- the electrode layer and the further electrode layer bound the piezoelectric layer completely flat.
- the piezoelectric component is fully active.
- the insulation layer, the further insulation layer, the outer electrode and / or the further outer electrode are made stretchable. This means that these components of the expansion and contraction of the
- a stretchable embodiment relates, for example, the materials used.
- an insulating material is particularly suitable an elastomer, for example a
- Silicone elastomer The same applies to the outer electrodes. In a particular embodiment, therefore, the outer electrode and / or the further outer electrode on an electrically conductive adhesive.
- the conductive adhesive preferably has a silicone elastomer. It is also conceivable that the outer electrode maybeeist a flexible metal mesh.
- These components are longitudinal or transverse to the stacking direction of the piezoelectric element or to Stacking direction of the piezo element stack structured.
- the structurings are designed in such a way that the mechanical tensile stresses occurring in the piezoelement stack or in the piezoelement stack due to the expansion and contraction are converted into shear stresses in the abovementioned components.
- a cross-structuring also leads to an efficient mechanical decoupling of the expansion and contraction of the piezoelectric element or the piezoelectric element stack. A tensile load of the components is reduced.
- the shape of the via can be used to reduce tensile stresses.
- the plated-through hole and / or the further plated-through hole have a trapezoidal cross-section.
- the strains occurring as a result of the electrical activation of the electrode layers are not transformed into pure tensile stresses, but predominantly into bending stresses within the vapor deposition layer. Bending stresses, in particular under fatigue loads, as may occur in piezoelectric components, are for the mostly metallic materials of the
- Gas phase deposition layer easier to endure than pure tensile stresses. Thus, the reliability of the vapor deposition layer and thus the total contact of the electrode layers is increased.
- the vapor deposition layers can be limited to the respective electrode layer to be contacted.
- the vapor deposition is generated only in the opening of the insulating layer or the further insulating layer. This is achieved by covering the areas to which no vapor deposition is to be applied. A cover when applying the other ingredients, such as the insulation layer can also be useful.
- the insulating layer the further insulating layer, the via, the further via, the outer electrode and / or the further outer electrode is a mask used.
- the mask may be designed such that the gas phase deposits arise only m the openings of the insulating layer.
- the gas phase deposits are also produced on the insulating layer. The result is a piezoelectric component in which the
- Gas phase deposition layer on the insulation layer and / or the further via on the further insulation layer extend.
- the invention provides the following particular advantages:
- the electrode layers can be contacted individually and reliably, while at the same time providing efficient electrical insulation to the adjacent electrode layers.
- FIG. 1 shows a stacked piezoelement in a lateral cross section.
- FIG. 2 shows a piezoelectric element stack from the side.
- FIG. 3 shows a section of the piezoelement stack from the side.
- FIG. 4 shows a detail of a further piezoelement stack from the side.
- the core of the piezoelectric component 1 is a stacked piezoelectric element 10 which comprises an electrode layer 12, a further electrode layer 13 and a piezoelectric layer 14 arranged in the stacking direction 11 between the two electrodes.
- the electrode material of the electrode layer and the further electrode material of the further electrode layer are each a silver-palladium alloy.
- the piezoelectric material of the piezoelectric layer is lead zirconate titanate, ie a piezoceramic.
- the piezo element is monolithic.
- each case a piezoelectric component in monolithic multilayer construction. It is a plurality of piezo elements in the
- Stacking direction 101 arranged one above the other to a piezoelectric element stack 100.
- the end of the piezoelectric element stack forms in each case a cover plate 110.
- These cover plates also consist of lead zirconate titanate.
- the cover plates are piezoelectrically inactive since no electric field is coupled in here.
- the piezo element stacks are monolithic.
- the monolithic piezoelectric element stacks are achieved by printing ceramic green films with electrode material and with further electrode material and stacking them on top of one another. The result is a multilayer, piezoceramic
- the sintering creates a monolithic piezoelectric element stack.
- the printing of the ceramic green films is carried out in such a way that in the piezo elements of the piezoelectric element stack, the electrode layer and / or the further electrode layer delimit the respective adjacent piezoelectric layer in a full-surface manner.
- the electrode layer extends to a lateral surface portion 15 of the piezoelectric element.
- the further electrode layer extends to a further lateral surface section 16 of the piezoelectric element.
- An insulating layer 19 is applied to the surface section 15 and a further insulation layer 20 is applied to the further surface section.
- the insulating material and the further insulation material are each a silicone elastomer.
- the insulating material is a glass in each case.
- the insulating material is lead zirconate titanate.
- the insulation layer has an opening on the surface portion above the electrode layer.
- the electrical feedthrough 17 is incorporated, wherein the gas phase deposition layer 170 is applied directly to the extending to the surface portion electrode layer.
- an outer electrode 21 is applied on the insulating layer and the vapor deposition layer such that the outer electrode and the electrode layer are indirectly connected to each other electrically via the via.
- the outer electrode and the further electrode layer are electrically isolated from each other.
- the outer electrode consists according to a first embodiment of an electrically conductive silicone elastomer.
- the outer electrode is a metal mesh soldered to the vapor deposition layer.
- connection has a trapezoidal cross-section 25.
- the further electrode layer is led to a further lateral surface section 16 of the piezoelectric element.
- a further insulation layer 20 For electrical contacting or insulation, a further insulation layer 20, a further plated-through hole 18, a further on the further surface portion
- Gas phase deposition layer 180 and a further outer electrode 22 is present.
- the vapor deposition layers are titanium layers produced by sputtering with a layer thickness 171 and a further layer thickness 181 of 1 ⁇ m.
- the layers consist of a chromium-nickel alloy with layer thicknesses of likewise 1 ⁇ m.
- the vapor deposition layer is multi-layered ( Figure 4). It consists of several partial gas phase deposition layers.
- the piezoelectric elements are arranged one above the other such that the surface sections of the piezoelectric elements form a common stacked surface section 102.
- the insulating layers of the piezoelectric elements lead to a common stacked insulating layer 104.
- the outer electrodes of the piezoelectric elements to a common
- Stack outer electrode 106 summarized. The same applies to the further electrode layers: The further surface sections of the piezoelectric elements form a further common stacked surface section 103, the further insulation layers of the piezoelectric elements, a further common stacked insulation layer 105 and the further outer electrodes of the piezoelectric elements form another stacked outer electrode 107
- the stack outer electrode is an electrical connection element 108 attached. Em corresponding further electrical
- Connection element 109 is attached to the further stack outer electrode. About these connection elements, the voltage supply of the electrode layers and the other takes place Electrode layers. Due to the arrangement of the electrode layers and the further electrode layers and due to their electrical contact or isolation, these can be applied to the electrode layers and the further electrode layers with different electrical potentials.
- the surface section and the further surface section are arranged on different sides of the piezoelectric element. The contacting of the
- Electrode layers and the contacting of the further electrode layers takes place on different sides of the piezoelectric element and thus of the piezoelectric element stack.
- the electrical contacting of the electrode layer and the further electrode layer takes place from the same side of the piezoelectric element and thus from the same side of the piezoelectric element stack.
- the procedure is as follows: A sintered piezoelectric element stack with a corresponding number of piezoelectric elements is provided. The electrode layers and the further electrode layers of the piezoelectric elements completely flatten the respective piezoelectric layers.
- the insulation layers are applied.
- an insulating film is laminated onto the stack surface sections of the piezo element stack.
- the insulation film is opened by means of laser ablation on the surface sections, to serve the electrode layers and the other electrode layers are to be contacted.
- the vapor deposition layers are deposited by sputtering.
- the outer electrodes are applied to the gas phase insulator layers.
Abstract
Description
Claims
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102007058873A DE102007058873A1 (en) | 2007-12-06 | 2007-12-06 | Piezoelectric device with external contact, which has a vapor deposition, method of manufacturing the component and use of the component |
PCT/EP2008/065474 WO2009071426A1 (en) | 2007-12-06 | 2008-11-13 | Piezoelectric component with outer contacting having gas-phase deposition, method for manufacturing the component and use of the component |
Publications (1)
Publication Number | Publication Date |
---|---|
EP2215668A1 true EP2215668A1 (en) | 2010-08-11 |
Family
ID=40456692
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP08856710A Withdrawn EP2215668A1 (en) | 2007-12-06 | 2008-11-13 | Piezoelectric component with outer contacting having gas-phase deposition, method for manufacturing the component and use of the component |
Country Status (5)
Country | Link |
---|---|
US (1) | US8106566B2 (en) |
EP (1) | EP2215668A1 (en) |
JP (1) | JP2011507221A (en) |
DE (1) | DE102007058873A1 (en) |
WO (1) | WO2009071426A1 (en) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102011084107A1 (en) * | 2011-10-06 | 2013-04-11 | Continental Automotive Gmbh | Piezoelectric actuator |
CN104126234A (en) | 2012-02-24 | 2014-10-29 | 埃普科斯股份有限公司 | Method for producing electric contact of multilayer component and multilayer component with electric contact |
DE102012207598A1 (en) * | 2012-05-08 | 2013-11-14 | Continental Automotive Gmbh | Method for electrically contacting an electronic component as a stack and electronic component with a contacting structure |
DE102012105318A1 (en) | 2012-06-19 | 2013-12-19 | Epcos Ag | Method for producing a ceramic component and a ceramic component |
CN102758946B (en) * | 2012-07-22 | 2014-02-12 | 徐凯敏 | Piezoelectric-type electronic expansion valve |
WO2016141482A1 (en) * | 2015-03-09 | 2016-09-15 | The University Of British Columbia | Apparatus and methods for providing tactile stimulus incorporating tri-layer actuators |
DE102015218701A1 (en) * | 2015-09-29 | 2016-12-01 | Continental Automotive Gmbh | Electroceramic component, in particular multilayer piezoelectric actuator |
DE102015226143A1 (en) | 2015-12-21 | 2017-06-22 | Robert Bosch Gmbh | multilayer |
JP7056582B2 (en) * | 2017-01-04 | 2022-04-19 | 東洋紡株式会社 | Actuator |
Family Cites Families (21)
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US4932119A (en) * | 1989-03-28 | 1990-06-12 | Litton Systems, Inc. | Method of making standard electrodisplacive transducers for deformable mirrors |
US5969464A (en) * | 1989-04-18 | 1999-10-19 | Minolta Co., Ltd. | Drive device using electromechanical transducer and an apparatus employing the drive device |
JPH0354876A (en) * | 1989-07-22 | 1991-03-08 | Hitachi Metals Ltd | Laminate type displacement device |
JPH03248582A (en) * | 1991-01-23 | 1991-11-06 | Sumitomo Special Metals Co Ltd | Manufacture of piezoelectric laminated actuator |
DE4201937C2 (en) * | 1991-01-25 | 1997-05-22 | Murata Manufacturing Co | Piezoelectric laminated actuator |
JPH04333295A (en) * | 1991-05-09 | 1992-11-20 | Nec Corp | Electrostrictive effect element and manufacture thereof |
JPH06296049A (en) * | 1993-04-08 | 1994-10-21 | Honda Motor Co Ltd | Laminated type piezoelectric electrostrictive device |
JPH0722557U (en) * | 1993-09-21 | 1995-04-21 | 住友金属工業株式会社 | External electrodes for laminated piezoelectric components |
DE19753930A1 (en) * | 1997-12-05 | 1999-06-10 | Ceramtec Ag | Process for attaching external electrodes to solid state actuators |
JP2001210884A (en) * | 2000-01-26 | 2001-08-03 | Kyocera Corp | Stacked type piezoelectric actuator |
JP4467755B2 (en) * | 2000-10-11 | 2010-05-26 | 日本放送協会 | Multi-electrode piezoelectric device wiring method and multi-electrode piezoelectric device |
JP2002203999A (en) | 2000-11-06 | 2002-07-19 | Denso Corp | Laminated type piezoelectric-substance element and the manufacturing method thereof |
JP3964184B2 (en) | 2000-12-28 | 2007-08-22 | 株式会社デンソー | Multilayer piezoelectric actuator |
DE10324871A1 (en) | 2003-06-02 | 2005-01-05 | Siemens Ag | Electrotechnical product and method of making the product |
JP2005183478A (en) * | 2003-12-16 | 2005-07-07 | Ibiden Co Ltd | Stacked piezo-electric element |
JP4729260B2 (en) * | 2004-02-18 | 2011-07-20 | 富士フイルム株式会社 | Laminated structure and manufacturing method thereof |
EP1753039B1 (en) | 2004-03-29 | 2012-10-24 | Kyocera Corporation | Multilayer piezoelectric element |
JP2006303044A (en) * | 2005-04-18 | 2006-11-02 | Denso Corp | Laminated piezoelectric material element |
DE102006003070B3 (en) * | 2006-01-20 | 2007-03-08 | Siemens Ag | Electrical contacting of stack of electronic components e.g. for piezo actuator, by covering insulating layers with electrically conductive material which also fills contact holes |
ATE432537T1 (en) * | 2006-03-17 | 2009-06-15 | Delphi Tech Inc | PIEZOELECTRIC ACTUATOR |
DE102007008266A1 (en) | 2007-02-20 | 2008-08-21 | Siemens Ag | Piezoelectric actuator and method for producing a piezoelectric actuator |
-
2007
- 2007-12-06 DE DE102007058873A patent/DE102007058873A1/en not_active Withdrawn
-
2008
- 2008-11-13 US US12/734,976 patent/US8106566B2/en not_active Expired - Fee Related
- 2008-11-13 WO PCT/EP2008/065474 patent/WO2009071426A1/en active Application Filing
- 2008-11-13 EP EP08856710A patent/EP2215668A1/en not_active Withdrawn
- 2008-11-13 JP JP2010536396A patent/JP2011507221A/en active Pending
Non-Patent Citations (1)
Title |
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See references of WO2009071426A1 * |
Also Published As
Publication number | Publication date |
---|---|
US8106566B2 (en) | 2012-01-31 |
JP2011507221A (en) | 2011-03-03 |
WO2009071426A1 (en) | 2009-06-11 |
DE102007058873A1 (en) | 2009-06-10 |
US20100244636A1 (en) | 2010-09-30 |
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