EP2211594A3 - Extreme ultraviolet light source device - Google Patents

Extreme ultraviolet light source device Download PDF

Info

Publication number
EP2211594A3
EP2211594A3 EP10000408A EP10000408A EP2211594A3 EP 2211594 A3 EP2211594 A3 EP 2211594A3 EP 10000408 A EP10000408 A EP 10000408A EP 10000408 A EP10000408 A EP 10000408A EP 2211594 A3 EP2211594 A3 EP 2211594A3
Authority
EP
European Patent Office
Prior art keywords
raw material
extreme ultraviolet
energy beam
electrodes
light source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP10000408A
Other languages
German (de)
French (fr)
Other versions
EP2211594B1 (en
EP2211594A2 (en
Inventor
Takuma Yokohama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ushio Denki KK
Original Assignee
Ushio Denki KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ushio Denki KK filed Critical Ushio Denki KK
Publication of EP2211594A2 publication Critical patent/EP2211594A2/en
Publication of EP2211594A3 publication Critical patent/EP2211594A3/en
Application granted granted Critical
Publication of EP2211594B1 publication Critical patent/EP2211594B1/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—X-ray radiation generated from plasma
    • H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—X-ray radiation generated from plasma
    • H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
    • H05G2/005—X-ray radiation generated from plasma being produced from a liquid or gas containing a metal as principal radiation generating component

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • X-Ray Techniques (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

The invention relates to an extreme ultraviolet light source device, comprising a pair of discharge electrodes (11, 12) arranged oppositely to each other, a pulsed power supply means (8) supplying pulsed power to said discharge electrodes (11, 12), a raw material supply means (11b, 12b) supplying a liquid or solid raw material for the emission of extreme ultraviolet radiation to said discharge electrodes (11, 12) and onto these electrodes (11, 12), and an energy beam radiating means (23a) radiating a focused energy beam (23) towards said raw material (11a) having been supplied onto said discharge electrodes (11, 12) to gasify said raw material (11a) and to start a discharge between said pair of electrodes (11, 12).The surface of said raw material (11a) is arranged at a position shifted from the focal point (P) of the energy beam (23) towards the irradiation entrance side of the energy beam (23).
EP10000408A 2009-01-21 2010-01-18 Extreme ultraviolet light source device Active EP2211594B1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009010691A JP5245857B2 (en) 2009-01-21 2009-01-21 Extreme ultraviolet light source device

Publications (3)

Publication Number Publication Date
EP2211594A2 EP2211594A2 (en) 2010-07-28
EP2211594A3 true EP2211594A3 (en) 2011-02-02
EP2211594B1 EP2211594B1 (en) 2011-08-10

Family

ID=42017302

Family Applications (1)

Application Number Title Priority Date Filing Date
EP10000408A Active EP2211594B1 (en) 2009-01-21 2010-01-18 Extreme ultraviolet light source device

Country Status (3)

Country Link
EP (1) EP2211594B1 (en)
JP (1) JP5245857B2 (en)
AT (1) ATE520289T1 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5659711B2 (en) * 2010-11-10 2015-01-28 ウシオ電機株式会社 Illuminance distribution detection method in extreme ultraviolet light source device and extreme ultraviolet light source device
WO2013072154A1 (en) 2011-11-15 2013-05-23 Asml Netherlands B.V. Radiation source and method for operating the same, lithographic apparatus comprising the radiation source, and device manufacturing method
DE102013204444A1 (en) * 2013-03-14 2014-09-18 Carl Zeiss Smt Gmbh Illumination optics for a mask inspection system and mask inspection system with such illumination optics
WO2015097820A1 (en) * 2013-12-26 2015-07-02 ギガフォトン株式会社 Target generating device
JP2023149175A (en) * 2022-03-30 2023-10-13 ウシオ電機株式会社 light source device

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20070090304A1 (en) * 2003-09-11 2007-04-26 Koninklijke Philips Electronics N.V. Method and apparatus for producing extreme ultraviolet radiation or soft x-ray radiation
US20080187105A1 (en) * 2005-05-19 2008-08-07 Koninklijke Philips Electronics, N.V. Gas Discharge Source, in Particular for Euv Radiation

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4052155B2 (en) 2003-03-17 2008-02-27 ウシオ電機株式会社 Extreme ultraviolet radiation source and semiconductor exposure apparatus
JP2005294087A (en) * 2004-04-01 2005-10-20 Nikon Corp Light source unit, illumination optical device, exposure device, and exposure method
KR101396158B1 (en) * 2006-05-16 2014-05-19 코닌클리케 필립스 엔.브이. A method of increasing the conversion efficiency of an euv lamp and soft x-ray lamp, and an apparatus for producing euv radiation and soft x-rays
JP2008270149A (en) * 2007-03-28 2008-11-06 Tokyo Institute Of Technology Extreme ultraviolet light source device and extreme ultraviolet light generating method
US7615767B2 (en) * 2007-05-09 2009-11-10 Asml Netherlands B.V. Radiation generating device, lithographic apparatus, device manufacturing method and device manufactured thereby

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20070090304A1 (en) * 2003-09-11 2007-04-26 Koninklijke Philips Electronics N.V. Method and apparatus for producing extreme ultraviolet radiation or soft x-ray radiation
US20080187105A1 (en) * 2005-05-19 2008-08-07 Koninklijke Philips Electronics, N.V. Gas Discharge Source, in Particular for Euv Radiation

Also Published As

Publication number Publication date
ATE520289T1 (en) 2011-08-15
EP2211594B1 (en) 2011-08-10
JP5245857B2 (en) 2013-07-24
EP2211594A2 (en) 2010-07-28
JP2010170772A (en) 2010-08-05

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