EP2087151A4 - Dépôt électrolytique à rouleaux couplés pour la fabrication d'un film photovoltaïque - Google Patents
Dépôt électrolytique à rouleaux couplés pour la fabrication d'un film photovoltaïqueInfo
- Publication number
- EP2087151A4 EP2087151A4 EP07854221A EP07854221A EP2087151A4 EP 2087151 A4 EP2087151 A4 EP 2087151A4 EP 07854221 A EP07854221 A EP 07854221A EP 07854221 A EP07854221 A EP 07854221A EP 2087151 A4 EP2087151 A4 EP 2087151A4
- Authority
- EP
- European Patent Office
- Prior art keywords
- roll
- electroplating
- film manufacturing
- photovoltaic film
- photovoltaic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000009713 electroplating Methods 0.000 title 1
- 238000004519 manufacturing process Methods 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/0256—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by the material
- H01L31/0264—Inorganic materials
- H01L31/032—Inorganic materials including, apart from doping materials or other impurities, only compounds not provided for in groups H01L31/0272 - H01L31/0312
- H01L31/0322—Inorganic materials including, apart from doping materials or other impurities, only compounds not provided for in groups H01L31/0272 - H01L31/0312 comprising only AIBIIICVI chalcopyrite compounds, e.g. Cu In Se2, Cu Ga Se2, Cu In Ga Se2
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/12—Process control or regulation
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/10—Electroplating with more than one layer of the same or of different metals
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/48—After-treatment of electroplated surfaces
- C25D5/50—After-treatment of electroplated surfaces by heat-treatment
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
- C25D7/06—Wires; Strips; Foils
- C25D7/0614—Strips or foils
- C25D7/0635—In radial cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/036—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes
- H01L31/0392—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including thin films deposited on metallic or insulating substrates ; characterised by specific substrate materials or substrate features or by the presence of intermediate layers, e.g. barrier layers, on the substrate
- H01L31/03926—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including thin films deposited on metallic or insulating substrates ; characterised by specific substrate materials or substrate features or by the presence of intermediate layers, e.g. barrier layers, on the substrate comprising a flexible substrate
- H01L31/03928—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including thin films deposited on metallic or insulating substrates ; characterised by specific substrate materials or substrate features or by the presence of intermediate layers, e.g. barrier layers, on the substrate comprising a flexible substrate including AIBIIICVI compound, e.g. CIS, CIGS deposited on metal or polymer foils
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/541—CuInSe2 material PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Metallurgy (AREA)
- Materials Engineering (AREA)
- Electrochemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Crystallography & Structural Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Automation & Control Theory (AREA)
- Manufacturing & Machinery (AREA)
- Photovoltaic Devices (AREA)
- Electroplating Methods And Accessories (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US86216406P | 2006-10-19 | 2006-10-19 | |
PCT/US2007/081912 WO2008049103A2 (fr) | 2006-10-19 | 2007-10-19 | Dépôt électrolytique à rouleaux couplés pour la fabrication d'un film photovoltaïque |
Publications (2)
Publication Number | Publication Date |
---|---|
EP2087151A2 EP2087151A2 (fr) | 2009-08-12 |
EP2087151A4 true EP2087151A4 (fr) | 2012-03-28 |
Family
ID=39314859
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP07854221A Withdrawn EP2087151A4 (fr) | 2006-10-19 | 2007-10-19 | Dépôt électrolytique à rouleaux couplés pour la fabrication d'un film photovoltaïque |
Country Status (7)
Country | Link |
---|---|
US (1) | US20080093221A1 (fr) |
EP (1) | EP2087151A4 (fr) |
JP (1) | JP2010507909A (fr) |
KR (1) | KR20090098962A (fr) |
CN (1) | CN101583741B (fr) |
TW (1) | TW200832732A (fr) |
WO (1) | WO2008049103A2 (fr) |
Families Citing this family (44)
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EP2381015B1 (fr) | 2005-08-12 | 2019-01-16 | Modumetal, Inc. | Matériaux modulés de manière compositionnelle |
US7713773B2 (en) * | 2005-11-02 | 2010-05-11 | Solopower, Inc. | Contact layers for thin film solar cells employing group IBIIIAVIA compound absorbers |
US20070227633A1 (en) * | 2006-04-04 | 2007-10-04 | Basol Bulent M | Composition control for roll-to-roll processed photovoltaic films |
US7736913B2 (en) * | 2006-04-04 | 2010-06-15 | Solopower, Inc. | Composition control for photovoltaic thin film manufacturing |
US8648253B1 (en) | 2010-10-01 | 2014-02-11 | Ascent Solar Technologies, Inc. | Machine and process for continuous, sequential, deposition of semiconductor solar absorbers having variable semiconductor composition deposited in multiple sublayers |
US8465589B1 (en) | 2009-02-05 | 2013-06-18 | Ascent Solar Technologies, Inc. | Machine and process for sequential multi-sublayer deposition of copper indium gallium diselenide compound semiconductors |
US8202368B2 (en) * | 2008-04-15 | 2012-06-19 | Yakima Products, Inc. | Apparatus and methods for manufacturing thin-film solar cells |
US8207012B2 (en) * | 2008-04-28 | 2012-06-26 | Solopower, Inc. | Method and apparatus for achieving low resistance contact to a metal based thin film solar cell |
US20090266398A1 (en) * | 2008-04-28 | 2009-10-29 | Burak Metin | Method and Apparatus to Form Back Contacts to Flexible CIGS Solar Cells |
US20090266399A1 (en) * | 2008-04-28 | 2009-10-29 | Basol Bulent M | Metallic foil substrate and packaging technique for thin film solar cells and modules |
US20130230933A1 (en) * | 2008-09-06 | 2013-09-05 | Soltrium Technology, Ltd. Shenzhen | Methods for fabricating thin film solar cells |
US8318240B2 (en) * | 2008-11-17 | 2012-11-27 | Solopower, Inc. | Method and apparatus to remove a segment of a thin film solar cell structure for efficiency improvement |
US8318239B2 (en) * | 2008-11-17 | 2012-11-27 | Solopower, Inc. | Method and apparatus for detecting and passivating defects in thin film solar cells |
US7979969B2 (en) | 2008-11-17 | 2011-07-19 | Solopower, Inc. | Method of detecting and passivating a defect in a solar cell |
US20100200408A1 (en) * | 2009-02-11 | 2010-08-12 | United Solar Ovonic Llc | Method and apparatus for the solution deposition of high quality oxide material |
US20110177622A1 (en) * | 2009-12-28 | 2011-07-21 | Global Solar Energy, Inc. | Apparatus and methods of mixing and depositing thin film photovoltaic compositions |
WO2010126699A2 (fr) | 2009-04-29 | 2010-11-04 | Hunter Douglas Industries B.V. | Panneaux architecturaux à intercouches photovoltaïques organiques et leurs procédés de formation |
BR122013014461B1 (pt) | 2009-06-08 | 2020-10-20 | Modumetal, Inc | revestimento de multicamadas resistente à corrosão em um substrato e método de eletrodeposição para produção de um revestimento de multicamada |
FR2951022B1 (fr) * | 2009-10-07 | 2012-07-27 | Nexcis | Fabrication de couches minces a proprietes photovoltaiques, a base d'un alliage de type i-iii-vi2, par electro-depots successifs et post-traitement thermique. |
WO2011142804A1 (fr) * | 2010-05-10 | 2011-11-17 | The University Of Toledo | Cellules photovoltaïques souples et modules présentant une adhésivité améliorée |
BR112012029813A2 (pt) | 2010-05-26 | 2017-03-07 | Univ Toledo | estrutura de célula fotovoltaica, método para fazer uma camada de interface de dispersão de luz para uma célula fotovoltaica e estrutura de célula fotovoltaica (pv) tendo uma camada de interface de dispersão |
US8304272B2 (en) | 2010-07-02 | 2012-11-06 | International Business Machines Corporation | Germanium photodetector |
CN101974772B (zh) * | 2010-08-11 | 2012-06-27 | 中国科学院半导体研究所 | 氮化镓基垂直结构发光二极管转移衬底的二次电镀方法 |
US20120055612A1 (en) | 2010-09-02 | 2012-03-08 | International Business Machines Corporation | Electrodeposition methods of gallium and gallium alloy films and related photovoltaic structures |
US8545689B2 (en) * | 2010-09-02 | 2013-10-01 | International Business Machines Corporation | Gallium electrodeposition processes and chemistries |
US8426725B2 (en) | 2010-12-13 | 2013-04-23 | Ascent Solar Technologies, Inc. | Apparatus and method for hybrid photovoltaic device having multiple, stacked, heterogeneous, semiconductor junctions |
KR101154774B1 (ko) | 2011-04-08 | 2012-06-18 | 엘지이노텍 주식회사 | 태양전지 및 이의 제조방법 |
KR101257819B1 (ko) | 2011-06-20 | 2013-05-06 | 성안기계 (주) | 롤투롤 CdS 증착 방법 및 시스템 |
KR101885821B1 (ko) | 2011-06-21 | 2018-09-10 | 삼성디스플레이 주식회사 | 유기 발광 표시 장치 및 그 제조 방법 |
US9112095B2 (en) * | 2012-12-14 | 2015-08-18 | Intermolecular, Inc. | CIGS absorber formed by co-sputtered indium |
US10472727B2 (en) | 2013-03-15 | 2019-11-12 | Modumetal, Inc. | Method and apparatus for continuously applying nanolaminate metal coatings |
BR112015022235A2 (pt) | 2013-03-15 | 2017-07-18 | Modumetal Inc | revestimentos nanolaminados |
WO2014145588A1 (fr) | 2013-03-15 | 2014-09-18 | Modumetal, Inc. | Revêtement nanostratifié de chrome et de nickel ayant une dureté élevée |
WO2014145771A1 (fr) | 2013-03-15 | 2014-09-18 | Modumetal, Inc. | Compositions électrodéposées et alliages nanostratifiés pour des articles préparés par des procédés de fabrication additive |
EA201500947A1 (ru) * | 2013-03-15 | 2016-03-31 | Модьюметл, Инк. | Устройство и способ электроосаждения нанослоистого покрытия |
AR102068A1 (es) | 2014-09-18 | 2017-02-01 | Modumetal Inc | Métodos de preparación de artículos por electrodeposición y procesos de fabricación aditiva |
EP3194642A4 (fr) | 2014-09-18 | 2018-07-04 | Modumetal, Inc. | Procédé et appareil d'application en continu de revêtements métalliques nanostratifiés |
CN105170576B (zh) * | 2015-05-11 | 2017-11-14 | 柏弥兰金属化研究股份有限公司 | 卷对卷聚酰亚胺膜的清洗方法及其*** |
CA3036191A1 (fr) | 2016-09-08 | 2018-03-15 | Modumetal, Inc. | Procedes pour obtenir des revetements stratifies sur des pieces et articles fabriques a partir de ceux-ci |
KR20180078674A (ko) * | 2016-12-30 | 2018-07-10 | (주) 다쓰테크 | 다층 금속박막 형성을 위한 다층 금속박막 형성 장치 및 방법 |
CN110637107B (zh) | 2017-03-24 | 2022-08-19 | 莫杜美拓有限公司 | 具有电镀层的升降柱塞以及用于生产其的***和方法 |
US11286575B2 (en) | 2017-04-21 | 2022-03-29 | Modumetal, Inc. | Tubular articles with electrodeposited coatings, and systems and methods for producing the same |
KR102492733B1 (ko) | 2017-09-29 | 2023-01-27 | 삼성디스플레이 주식회사 | 구리 플라즈마 식각 방법 및 디스플레이 패널 제조 방법 |
US11519093B2 (en) | 2018-04-27 | 2022-12-06 | Modumetal, Inc. | Apparatuses, systems, and methods for producing a plurality of articles with nanolaminated coatings using rotation |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4318938A (en) * | 1979-05-29 | 1982-03-09 | The University Of Delaware | Method for the continuous manufacture of thin film solar cells |
WO2001057932A1 (fr) * | 2000-02-07 | 2001-08-09 | Cis Solartechnik Gmbh | Substrat metallique souple pour cellules solaires cis et son procede de production |
US20020011419A1 (en) * | 1998-02-17 | 2002-01-31 | Kozo Arao | Electrodeposition tank, electrodeposition apparatus, and electrodeposition method |
US20050202589A1 (en) * | 2004-03-15 | 2005-09-15 | Basol Bulent M. | Technique and apparatus for depositing thin layers of semiconductors for solar cell fabrication |
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US4282073A (en) * | 1979-08-22 | 1981-08-04 | Thomas Steel Strip Corporation | Electro-co-deposition of corrosion resistant nickel/zinc alloys onto steel substrates |
US4581108A (en) * | 1984-01-06 | 1986-04-08 | Atlantic Richfield Company | Process of forming a compound semiconductive material |
DE3583142D1 (de) * | 1984-11-22 | 1991-07-11 | Kawasaki Steel Co | Verfahren zur herstellung gefaerbter rostfreier stahlmaterialien und vorrichtung zu deren kontinuierlichen herstellung. |
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EP0794270B1 (fr) * | 1996-03-06 | 2000-06-14 | Canon Kabushiki Kaisha | Procédé de production d'un film mince d'oxyde de zinc et procédé de production d'un substrat d'un dispositif semi-conducteur pour la production d'un dispositif de conversion photo-électrique en utilisant ce film |
JPH09321326A (ja) * | 1996-05-30 | 1997-12-12 | Yazaki Corp | Cis薄膜太陽電池の製造方法、及び銅−インジウム−セレン三元合金の形成方法 |
JP3249408B2 (ja) * | 1996-10-25 | 2002-01-21 | 昭和シェル石油株式会社 | 薄膜太陽電池の薄膜光吸収層の製造方法及び製造装置 |
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US7736940B2 (en) * | 2004-03-15 | 2010-06-15 | Solopower, Inc. | Technique and apparatus for depositing layers of semiconductors for solar cell and module fabrication |
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US20070093006A1 (en) * | 2005-10-24 | 2007-04-26 | Basol Bulent M | Technique For Preparing Precursor Films And Compound Layers For Thin Film Solar Cell Fabrication And Apparatus Corresponding Thereto |
-
2007
- 2007-10-19 WO PCT/US2007/081912 patent/WO2008049103A2/fr active Application Filing
- 2007-10-19 TW TW096139256A patent/TW200832732A/zh unknown
- 2007-10-19 CN CN200780044723XA patent/CN101583741B/zh not_active Expired - Fee Related
- 2007-10-19 JP JP2009533561A patent/JP2010507909A/ja active Pending
- 2007-10-19 US US11/875,784 patent/US20080093221A1/en not_active Abandoned
- 2007-10-19 KR KR1020097010132A patent/KR20090098962A/ko active IP Right Grant
- 2007-10-19 EP EP07854221A patent/EP2087151A4/fr not_active Withdrawn
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4318938A (en) * | 1979-05-29 | 1982-03-09 | The University Of Delaware | Method for the continuous manufacture of thin film solar cells |
US20020011419A1 (en) * | 1998-02-17 | 2002-01-31 | Kozo Arao | Electrodeposition tank, electrodeposition apparatus, and electrodeposition method |
WO2001057932A1 (fr) * | 2000-02-07 | 2001-08-09 | Cis Solartechnik Gmbh | Substrat metallique souple pour cellules solaires cis et son procede de production |
US20050202589A1 (en) * | 2004-03-15 | 2005-09-15 | Basol Bulent M. | Technique and apparatus for depositing thin layers of semiconductors for solar cell fabrication |
Non-Patent Citations (2)
Title |
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Also Published As
Publication number | Publication date |
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CN101583741A (zh) | 2009-11-18 |
TW200832732A (en) | 2008-08-01 |
JP2010507909A (ja) | 2010-03-11 |
CN101583741B (zh) | 2011-09-28 |
WO2008049103A3 (fr) | 2008-07-03 |
US20080093221A1 (en) | 2008-04-24 |
WO2008049103A2 (fr) | 2008-04-24 |
KR20090098962A (ko) | 2009-09-18 |
EP2087151A2 (fr) | 2009-08-12 |
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