EP2020672A3 - Hochfrequenzgenerator für Ionen- und Elektronenquellen - Google Patents
Hochfrequenzgenerator für Ionen- und Elektronenquellen Download PDFInfo
- Publication number
- EP2020672A3 EP2020672A3 EP08013495A EP08013495A EP2020672A3 EP 2020672 A3 EP2020672 A3 EP 2020672A3 EP 08013495 A EP08013495 A EP 08013495A EP 08013495 A EP08013495 A EP 08013495A EP 2020672 A3 EP2020672 A3 EP 2020672A3
- Authority
- EP
- European Patent Office
- Prior art keywords
- frequency generator
- coupling
- resonant circuit
- frequency
- ion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000008878 coupling Effects 0.000 abstract 6
- 238000010168 coupling process Methods 0.000 abstract 6
- 238000005859 coupling reaction Methods 0.000 abstract 6
- 239000003990 capacitor Substances 0.000 abstract 2
- 230000005284 excitation Effects 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
- H01J27/16—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F03—MACHINES OR ENGINES FOR LIQUIDS; WIND, SPRING, OR WEIGHT MOTORS; PRODUCING MECHANICAL POWER OR A REACTIVE PROPULSIVE THRUST, NOT OTHERWISE PROVIDED FOR
- F03H—PRODUCING A REACTIVE PROPULSIVE THRUST, NOT OTHERWISE PROVIDED FOR
- F03H1/00—Using plasma to produce a reactive propulsive thrust
- F03H1/0006—Details applicable to different types of plasma thrusters
- F03H1/0018—Arrangements or adaptations of power supply systems
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Combustion & Propulsion (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Plasma Technology (AREA)
- Electron Sources, Ion Sources (AREA)
- Circuit Arrangements For Discharge Lamps (AREA)
Abstract
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102007036592.8A DE102007036592B4 (de) | 2007-08-02 | 2007-08-02 | Hochfrequenzgenerator für Ionen- und Elektronenquellen |
Publications (3)
Publication Number | Publication Date |
---|---|
EP2020672A2 EP2020672A2 (de) | 2009-02-04 |
EP2020672A3 true EP2020672A3 (de) | 2010-11-10 |
EP2020672B1 EP2020672B1 (de) | 2020-05-06 |
Family
ID=39944376
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP08013495.0A Active EP2020672B1 (de) | 2007-08-02 | 2008-07-26 | Hochfrequenzgenerator für Ionen- und Elektronenquellen |
Country Status (4)
Country | Link |
---|---|
US (1) | US8294370B2 (de) |
EP (1) | EP2020672B1 (de) |
DE (1) | DE102007036592B4 (de) |
RU (1) | RU2461908C2 (de) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102011076404B4 (de) | 2011-05-24 | 2014-06-26 | TRUMPF Hüttinger GmbH + Co. KG | Verfahren zur Impedanzanpassung der Ausgangsimpedanz einer Hochfrequenzleistungsversorgungsanordnung an die Impedanz einer Plasmalast und Hochfrequenzleistungsversorgungsanordnung |
RU2499320C2 (ru) * | 2011-11-28 | 2013-11-20 | Ильшат Гайсеевич Мусин | Индуктивно-емкостный генератор (lc-генератор) |
EP3340746B1 (de) | 2016-12-22 | 2021-05-05 | Technische Hochschule Mittelhessen | Steuerungseinheit zur steuerung eines hochfrequenzgenerators |
KR20180109351A (ko) * | 2017-03-28 | 2018-10-08 | 엘에스산전 주식회사 | 비례공명 전류제어기 |
DE102017107177A1 (de) | 2017-04-04 | 2018-10-04 | Tesat-Spacecom Gmbh & Co. Kg | Frequenzregelung für einen Frequenzgenerator eines Ionentriebwerks |
RU2695541C1 (ru) * | 2018-07-02 | 2019-07-24 | Акционерное общество "Концерн "Созвзедие" | Устройство ввода энергии в газоразрядную плазму |
EP3754187B1 (de) | 2019-06-18 | 2023-12-13 | ThrustMe | Hochfrequenzgenerator für eine plasmaquelle und verfahren zu dessen einstellung |
DE102020106692A1 (de) | 2020-03-11 | 2021-09-16 | Analytik Jena Gmbh | Generator für die Spektrometrie |
CN111577564A (zh) * | 2020-06-30 | 2020-08-25 | 中国人民解放军国防科技大学 | 单级复合双脉冲增强电离型感应式脉冲等离子体推力器 |
DE102020117402A1 (de) * | 2020-07-01 | 2022-01-05 | Analytik Jena Gmbh | Generator für die Spektrometrie |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4507588A (en) * | 1983-02-28 | 1985-03-26 | Board Of Trustees Operating Michigan State University | Ion generating apparatus and method for the use thereof |
DE19948229C1 (de) * | 1999-10-07 | 2001-05-03 | Daimler Chrysler Ag | Hochfrequenz-Ionenquelle |
US20030215373A1 (en) * | 2002-05-20 | 2003-11-20 | Reyzelman Leonid E. | Method and apparatus for VHF plasma processing with load mismatch reliability and stability |
US20070114945A1 (en) * | 2005-11-21 | 2007-05-24 | Mattaboni Paul J | Inductively-coupled RF power source |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
RU2095877C1 (ru) * | 1995-06-19 | 1997-11-10 | Государственный научно-исследовательский институт прикладной механики и электродинамики Московского авиационного института | Способ получения ионов и источник ионов для его осуществления |
US5965034A (en) * | 1995-12-04 | 1999-10-12 | Mc Electronics Co., Ltd. | High frequency plasma process wherein the plasma is executed by an inductive structure in which the phase and anti-phase portion of the capacitive currents between the inductive structure and the plasma are balanced |
US5824606A (en) * | 1996-03-29 | 1998-10-20 | Lam Research Corporation | Methods and apparatuses for controlling phase difference in plasma processing systems |
US5770922A (en) * | 1996-07-22 | 1998-06-23 | Eni Technologies, Inc. | Baseband V-I probe |
KR100542459B1 (ko) * | 1999-03-09 | 2006-01-12 | 가부시끼가이샤 히다치 세이사꾸쇼 | 플라즈마처리장치 및 플라즈마처리방법 |
DE10215660B4 (de) * | 2002-04-09 | 2008-01-17 | Eads Space Transportation Gmbh | Hochfrequenz-Elektronenquelle, insbesondere Neutralisator |
JP4901094B2 (ja) * | 2004-11-30 | 2012-03-21 | 株式会社Sen | ビーム照射装置 |
-
2007
- 2007-08-02 DE DE102007036592.8A patent/DE102007036592B4/de active Active
-
2008
- 2008-07-26 EP EP08013495.0A patent/EP2020672B1/de active Active
- 2008-07-30 US US12/182,645 patent/US8294370B2/en active Active
- 2008-07-31 RU RU2008131500/07A patent/RU2461908C2/ru active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4507588A (en) * | 1983-02-28 | 1985-03-26 | Board Of Trustees Operating Michigan State University | Ion generating apparatus and method for the use thereof |
DE19948229C1 (de) * | 1999-10-07 | 2001-05-03 | Daimler Chrysler Ag | Hochfrequenz-Ionenquelle |
US20030215373A1 (en) * | 2002-05-20 | 2003-11-20 | Reyzelman Leonid E. | Method and apparatus for VHF plasma processing with load mismatch reliability and stability |
US20070114945A1 (en) * | 2005-11-21 | 2007-05-24 | Mattaboni Paul J | Inductively-coupled RF power source |
Also Published As
Publication number | Publication date |
---|---|
DE102007036592B4 (de) | 2014-07-10 |
EP2020672A2 (de) | 2009-02-04 |
RU2461908C2 (ru) | 2012-09-20 |
EP2020672B1 (de) | 2020-05-06 |
DE102007036592A1 (de) | 2009-02-19 |
US20090058303A1 (en) | 2009-03-05 |
RU2008131500A (ru) | 2010-02-10 |
US8294370B2 (en) | 2012-10-23 |
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