EP1982347A1 - Device for coupling between a plasma antenna and a power signal generator - Google Patents

Device for coupling between a plasma antenna and a power signal generator

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Publication number
EP1982347A1
EP1982347A1 EP07712164A EP07712164A EP1982347A1 EP 1982347 A1 EP1982347 A1 EP 1982347A1 EP 07712164 A EP07712164 A EP 07712164A EP 07712164 A EP07712164 A EP 07712164A EP 1982347 A1 EP1982347 A1 EP 1982347A1
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EP
European Patent Office
Prior art keywords
electrodes
laser
plasma
antenna
power signal
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Granted
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EP07712164A
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German (de)
French (fr)
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EP1982347B1 (en
Inventor
Emmanuel Marquis
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Thales SA
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Thales SA
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Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy

Definitions

  • the present invention relates to a coupling device between a plasma antenna and a power signal generator, and to a method of using a plasma antenna comprising such a coupling device.
  • plasma antennas for example according to US Pat. No. 3,404,403.
  • This patent describes a plasma antenna comprising a pulsed laser source, means for focusing the antenna. laser beam at different points for ionizing a column of air and means for coupling a signal at the base of the ionized air column, said column acting as a radiating element for transmitting and / or receiving a radio signal.
  • Plasma antennas are also known from US Pat. No. 6,087,993 and French Patent No. 2,863,782.
  • the object is to make the antenna movable and to reduce the length of the air column.
  • a femtosecond laser is used to generate a filament in the ionized air column.
  • the plasma antennas described in these documents and operating by air ionization are stealthy and require no infrastructure, unlike conventional antennas.
  • the coupling between the plasma column and the electric power generator that generates the signal to be transmitted is not optimized.
  • the above-mentioned French patent discloses a capacitive (of the order of a few pF) or inductive coupling device whose impedance is very low, which significantly degrades the power transfer between the electric generator and the antenna.
  • the subject of the present invention is a coupling device between a plasma column acting as an antenna and a power signal generator, which device allows a very good power transfer between the electric generator and the plasma column when the latter is formed.
  • the present invention also relates to an antenna using such a device, antenna can operate at very low frequencies.
  • the present invention relates to a method of forming a plasma column to form an antenna.
  • the coupling device is associated with at least one laser and it is characterized in that it comprises at least two conductive electrodes each pierced by a hole, these holes being coaxial, the electrodes being connected to one another. part of a continuous high voltage source and secondly to a power signal generator, the laser (s) being arranged (s) so that its (their) beam arrives along the axis of said holes of the electrodes.
  • FIG. 1 is a simplified diagram of a device according to the invention for the creation of a plasma antenna
  • FIGS. 2 to 6 are simplified diagrams of the device of FIG. 1 showing the different successive phases of a example of implementation of the invention for the creation of a plasma antenna
  • FIG. 7 is a simplified chronogram illustrating the phases of implementation of FIGS. 2 to 6,
  • FIG. 8 is a simplified diagram of a variant of the device of the invention.
  • FIG. 9 is a timing diagram of a variant of the method of the invention, with two laser shots.
  • the present invention is described below with reference to the creation of an ionized air column, and it is understood that the ionization of this column can be reduced to a filament ionization at the axis of symmetry, as described in the above-mentioned French patent, when a femtosecond laser is used.
  • the preferred embodiment of the device of the invention as described below, comprises two electrodes pierced with coaxial holes, but the device of the invention may comprise a number more high electrodes.
  • the device described below is shown in a position oriented so that the plasma column that it can create is vertical, but it is understood that this device can have any other orientation, so that the antenna for example horizontal.
  • the plasma antenna obtained according to the invention is described here as an emission antenna, but it is understood that it can also be used in reception, provided, of course, to keep the low generator connected or connected. very low frequency described below.
  • the device shown in figural comprises two metal plates 1, 2 forming electrodes and each pierced with a hole 3, 4 respectively, the two holes being coaxial, their common axis being referenced 5.
  • the shape of these electrodes is not critical. They may for example be circular or polygonal.
  • the holes 3 and 4 are preferably drilled in the center of these electrodes.
  • the electrodes 1 and 2 are connected on the one hand via ballast resistors 6, 7 respectively to a high voltage source 8, a resistor 9 being connected between the two electrodes, at their junction with the resistors 6 and 7. the following figures, this resistance 9 is not shown, but it is understood that it may be present.
  • the positive pole of the source 8 is preferably connected to the electrode 2 (in particular when these electrodes are arranged horizontally and at a short distance from the ground).
  • the electrodes 1 and 2 are connected via continuous insulation capacitors 10, 11 respectively and a line 12, preferably coaxial, to a transmitter of low or very low frequency power and high peak voltage 13, which may be near or far from the electrodes 1, 2 of the antenna.
  • the shield of line 12 is grounded.
  • the distance D between the electrodes 1 and 2 is a function of the value of the high voltage of the source 8. In general, this distance D must be greater than the breakdown distance between the electrodes in the environment in the absence of plasma column, and be smaller than the breakdown distance between the electrodes in the presence of the plasma column.
  • a priming laser 14 is disposed under the electrode 1, so that the axis of the beam that it produces coincides with the axis 5 at least just before reaching the electrode 1.
  • a mirror is provided which returns its output beam along the axis 5.
  • a semi-transparent mirror on the axis 5 if the we want to use two lasers. Two lasers can be used for example by dedicating one to shots and the other to the maintenance of the ionized column forming antenna.
  • the electrodes 1 and 2 are circular and have a diameter of a few tens of cm to a few meters, their mutual distance D is about 50 cm to 1 m, the diameter of the holes 3 and 5 is about 1 cm.
  • the voltage of the source 8 is about 10 to 20 kV, and the power supplied by the transmitter 13 can be between a few hundred Watts and a few MW. The average power it delivers must be sufficient to maintain the plasma generated by the high voltage source 8.
  • the laser 14 is fired, focused on the axis 5, beyond the electrode 2. This firing simultaneously produces a discharge between the electrodes 1 and 2 (ionized air column 17 between these electrodes) and the formation of an ionized column 18, thinner than the column 17, centered on the axis 5.
  • the generator 13 is activated, which injects power into the "virtual" antenna Constituted by the plasma columns 17 and 18 and which maintains the ionization of these columns, because, as illustrated in FIG. 7, the instantaneous potential difference VQ C between the electrodes 1 and 2 is constant from the instant Tl (see relations below). It will be noted that a minimum time must be respected between instants T1 and T2 (typically of the order of a few tens of nanoseconds) in order for the plasma column to be well established between electrodes 1 and 2.
  • the signal delivered by the transmitter 13 can be written in the form:
  • VA C A cos ( ⁇ t), while the voltage applied by the source 8 to the electrodes 1 and 2 is of the form - / + VDC-
  • FIG. 8 shows a variant of the device of FIGS. 1 to 6.
  • a first laser firing (Tl) is carried out, focused on the axis 5 between the two electrodes, then a second laser shot (T2) focused on the same axis 5, but beyond the electrode 2, then activates the generator 13 (T3).
  • T5 The plasma antenna disappears (T5) shortly after the end of the activation of the generator 13 (T4).
  • FIG 2 after activating the high voltage source 8 (TO), the laser 14 is activated (T1) to perform a first "shot” focused on the axis 5, between the electrodes 1 and 2, to create by high discharge voltage a thin column of conductive plasma 15 between these two electrodes.
  • Figure 3 the laser firing causes the high voltage discharge 16 in the plasma column 15, between the electrodes 1 and 2.
  • FIGS. 2 to 4 A second shot of the laser 14 (T2), focussed on the axis
  • FIG. 6 the transmitter 13 (T3), which injects the alternative power into the "virtual" antenna constituted by the plasma columns 17 and 18 and which maintains the ionization of these columns, is activated because, as illustrated in FIG. 9, the instantaneous potential difference V DC between the electrodes 1 and 2 is constant from the instant T1 (as explained above with reference to FIG. 7).
  • the device of the invention in addition to the advantages inherent to the actual plasma antenna, the conductive coupling between the electrodes and the antenna, a very good efficiency of the power transfer between the generator 13 and the generator is obtained.
  • the antenna (these electrodes being brought to the same instantaneous AC potential, practically all the alternative power is injected into the antenna).
  • this device is very economical, since it only requires a source of high voltage at low power.

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
  • Variable-Direction Aerials And Aerial Arrays (AREA)
  • Radar Systems Or Details Thereof (AREA)
  • Burglar Alarm Systems (AREA)
  • Electron Sources, Ion Sources (AREA)

Abstract

The present invention relates to a device for coupling between a plasma column functioning as an antenna and a power signal electrical generator, associated with a laser, and this device is characterized in that it comprises at least two conducting electrodes (1, 2) each drilled with a hole (3, 4), these holes being coaxial, the electrodes being connected on the one hand to a high DC voltage source (8) and on the other hand to an AC power signal source (13), the laser (lasers) being disposed in such a way that its (their) beam arrives along the axis (5) of said holes of the electrodes.

Description

DISPOSITIF DE COUPLAGE ENTRE UNE ANTENNE A PLASMA ET UN GENERATEUR DE SIGNAL DE PUISSANCE DEVICE FOR COUPLING BETWEEN A PLASMA ANTENNA AND A POWER SIGNAL GENERATOR
La présente invention se rapporte à un dispositif de couplage entre une antenne à plasma et un générateur de signal de puissance, ainsi qu'à un procédé d'utilisation d'une antenne à plasma comportant un tel dispositif de couplage.The present invention relates to a coupling device between a plasma antenna and a power signal generator, and to a method of using a plasma antenna comprising such a coupling device.
Les antennes radioélectriques classiques (métalliques) fonctionnent généralement dans une bande de fréquences étroite, et leurs dimensions sont inversement proportionnelles à la longueur d'onde de fonctionnement. Dans les domaines des basses fréquences (« L. F. »), très basses fréquences (« V. L. F. ») et extrêmement basses fréquences(« E. L. F. »), la hauteur des antennes de type quart d'onde devrait atteindre plusieurs centaines de mètres à plusieurs centaines de kilomètres (par exemple 750 m à 100 kHz), ce qui rend leur construction très difficile ou même irréalisable. De plus, elles ne peuvent en aucun cas être facilement déplaçables. Or, ces domaines de fréquences sont utilisés notamment pour les communications avec les sous-marins en plongée.Conventional (metallic) radio antennas generally operate in a narrow frequency band, and their dimensions are inversely proportional to the operating wavelength. In the areas of low frequencies ("LF"), very low frequencies ("VLF") and extremely low frequencies ("ELF"), the height of quarter-wave antennas should reach several hundred meters to several hundred kilometers (for example 750 m at 100 kHz), which makes their construction very difficult or even impracticable. Moreover, they can not in any case be easily moved. However, these frequency areas are used in particular for communications with submarines underwater.
Pour résoudre ces problèmes, il est connu d'utiliser des antennes dites « antennes à plasma », par exemple d'après le brevet US 3 404 403. Ce brevet décrit une antenne à plasma comprenant une source laser puisée, des moyens pour focaliser le faisceau laser en différents points pour ioniser une colonne d'air et des moyens pour coupler un signal à la base de la colonne d'air ionisée, cette colonne faisant fonction d'élément rayonnant pour émettre et/ou recevoir un signal radioélectrique. On connaît également des antennes à plasma d'après le brevet US 6 087 993 et le brevet FR 2 863 782. Dans le premier document, il s'agit de rendre l'antenne déplaçable et de diminuer la longueur de la colonne d'air ionisée en modulant le courant d'excitation du générateur d'ionisation et en concentrant la production d'électrons dans au moins une partie de cette colonne. Dans le second, on emploie un laser femtoseconde pour générer un filament dans la colonne d'air ionisée.To solve these problems, it is known to use antennas known as "plasma antennas", for example according to US Pat. No. 3,404,403. This patent describes a plasma antenna comprising a pulsed laser source, means for focusing the antenna. laser beam at different points for ionizing a column of air and means for coupling a signal at the base of the ionized air column, said column acting as a radiating element for transmitting and / or receiving a radio signal. Plasma antennas are also known from US Pat. No. 6,087,993 and French Patent No. 2,863,782. In the first document, the object is to make the antenna movable and to reduce the length of the air column. ionized by modulating the excitation current of the ionization generator and concentrating the production of electrons in at least a portion of this column. In the second, a femtosecond laser is used to generate a filament in the ionized air column.
Les antennes à plasma décrites dans ces documents et fonctionnant par ionisation d'air sont furtives et ne nécessitent aucune infrastructure, à l'inverse des antennes classiques. Cependant, dans toutes ces antennes à plasma connues, le couplage entre la colonne de plasma et le générateur électrique de puissance qui génère le signal à émettre n'est pas optimisé. En effet, par exemple le susdit brevet français décrit un dispositif de couplage capacitif (de l'ordre de quelques pF) ou inductif dont l'impédance est très faible, ce qui dégrade nettement le transfert de puissance entre le générateur électrique et l'antenne. La présente invention a pour objet un dispositif de couplage entre une colonne de plasma faisant fonction d'antenne et un générateur de signal de puissance, dispositif qui permette un très bon transfert de puissance entre le générateur électrique et la colonne de plasma lorsque celle-ci est formée. La présente invention a également pour objet une antenne utilisant un tel dispositif, antenne pouvant fonctionner à de très basses fréquences. Enfin, la présente invention a pour objet un procédé de formation d'une colonne de plasma en vue de constituer une antenne.The plasma antennas described in these documents and operating by air ionization are stealthy and require no infrastructure, unlike conventional antennas. However, in all these known plasma antennas, the coupling between the plasma column and the electric power generator that generates the signal to be transmitted is not optimized. Indeed, for example the above-mentioned French patent discloses a capacitive (of the order of a few pF) or inductive coupling device whose impedance is very low, which significantly degrades the power transfer between the electric generator and the antenna. . The subject of the present invention is a coupling device between a plasma column acting as an antenna and a power signal generator, which device allows a very good power transfer between the electric generator and the plasma column when the latter is formed. The present invention also relates to an antenna using such a device, antenna can operate at very low frequencies. Finally, the present invention relates to a method of forming a plasma column to form an antenna.
Le dispositif de couplage conforme à l'invention est associé à au moins un laser et il est caractérisé en ce qu'il comporte au moins deux électrodes conductrices percées chacune d'un trou, ces trous étant coaxiaux, les électrodes étant reliées d'une part à une source de haute tension continue et d'autre part à un générateur de signal de puissance, le(s) laser(s) étant disposé(s) de façon que son (leur) faisceau arrive selon l'axe desdits trous des électrodes.The coupling device according to the invention is associated with at least one laser and it is characterized in that it comprises at least two conductive electrodes each pierced by a hole, these holes being coaxial, the electrodes being connected to one another. part of a continuous high voltage source and secondly to a power signal generator, the laser (s) being arranged (s) so that its (their) beam arrives along the axis of said holes of the electrodes.
La présente invention sera mieux comprise à la lecture de la description détaillée d'un mode de réalisation, pris à titre d'exemple non limitatif et illustré par le dessin annexé, sur lequel :The present invention will be better understood on reading the detailed description of an embodiment, taken by way of nonlimiting example and illustrated by the appended drawing, in which:
- la figure 1 est un schéma simplifié d'un dispositif conforme à l'invention pour la création d'une antenne à plasma, les figures 2 à 6 sont des schémas simplifiés du dispositif de la figure 1 montrant les différentes phases successives d'un exemple de mise en œuvre de l'invention pour la création d'une antenne à plasma,FIG. 1 is a simplified diagram of a device according to the invention for the creation of a plasma antenna, FIGS. 2 to 6 are simplified diagrams of the device of FIG. 1 showing the different successive phases of a example of implementation of the invention for the creation of a plasma antenna,
- la figure 7 est un chronogramme simplifié illustrant les phases de mise en œuvre des figures 2 à 6,FIG. 7 is a simplified chronogram illustrating the phases of implementation of FIGS. 2 to 6,
- la figure 8 est un schéma simplifié d'une variante du dispositif de l'invention, etFIG. 8 is a simplified diagram of a variant of the device of the invention, and
- la figure 9 est un chronogramme d'une variante du procédé de l'invention, avec deux tirs laser.- Figure 9 is a timing diagram of a variant of the method of the invention, with two laser shots.
La présente invention est décrite ci-dessous en référence à la création d'une colonne d'air ionisée, et il est bien entendu que l'ionisation de cette colonne peut se réduire à une ionisation filamenteuse au niveau de l'axe de symétrie, comme décrit dans le susdit brevet français, lorsque l'on utilise un laser du type femtoseconde. Il est également bien entendu que le mode de réalisation préféré du dispositif de l'invention, tel que décrit ci-dessous, comporte deux électrodes percées de trous coaxiaux, mais le dispositif de l'invention peut comporter un nombre plus élevé d'électrodes. Le dispositif décrit ci-dessous est représenté dans une position orientée de façon que la colonne de plasma qu'il permet de créer soit verticale, mais il est bien entendu que ce dispositif peut avoir n'importe quelle autre orientation, afin que l'antenne soit par exemple horizontale. L'antenne à plasma obtenue selon l'invention est décrite ici en tant qu'antenne d'émission, mais il est bien entendu qu'elle peut également être utilisée en réception, à condition, bien entendu, de garder branché le générateur basse ou très basse fréquence décrit ci-dessous.The present invention is described below with reference to the creation of an ionized air column, and it is understood that the ionization of this column can be reduced to a filament ionization at the axis of symmetry, as described in the above-mentioned French patent, when a femtosecond laser is used. It is also understood that the preferred embodiment of the device of the invention, as described below, comprises two electrodes pierced with coaxial holes, but the device of the invention may comprise a number more high electrodes. The device described below is shown in a position oriented so that the plasma column that it can create is vertical, but it is understood that this device can have any other orientation, so that the antenna for example horizontal. The plasma antenna obtained according to the invention is described here as an emission antenna, but it is understood that it can also be used in reception, provided, of course, to keep the low generator connected or connected. very low frequency described below.
Le dispositif représenté en fïgurel comporte deux plaques métalliques 1, 2 formant électrodes et percées chacune d'un trou 3, 4 respectivement, les deux trous étant coaxiaux, leur axe commun étant référencé 5. La forme de ces électrodes n'est pas critique. Elles peuvent par exemple être circulaires ou polygonales. Les trous 3 et 4 sont percés de préférence au centre de ces électrodes.The device shown in figural comprises two metal plates 1, 2 forming electrodes and each pierced with a hole 3, 4 respectively, the two holes being coaxial, their common axis being referenced 5. The shape of these electrodes is not critical. They may for example be circular or polygonal. The holes 3 and 4 are preferably drilled in the center of these electrodes.
Les électrodes 1 et 2 sont reliées d'une part via des résistances ballast 6, 7 respectivement à une source de haute tension 8, une résistance 9 étant branchée entre les deux électrodes, au niveau de leur jonction avec les résistances 6 et 7. Sur les figures suivantes, cette résistance 9 n'est pas représentée, mais il est bien entendu qu'elle peut être présente. Le pôle positif de la source 8 est relié, de préférence, à l'électrode 2 (en particulier lorsque ces électrodes sont disposées horizontalement et à faible distance du sol). D'autre part, les électrodes 1 et 2 sont reliées via des condensateurs d'isolation en continu 10, 11 respectivement et une ligne 12, de préférence coaxiale, à un émetteur de puissance basse ou très basse fréquence et à haute tension crête 13, qui peut être proche ou éloigné des électrodes 1, 2 de l'antenne. Le blindage de la ligne 12 est relié à la terre. La distance D entre les électrodes 1 et 2 est fonction de la valeur de la haute tension de la source 8. De façon générale, cette distance D doit être supérieure à la distance de claquage entre les électrodes dans le milieu ambiant en l'absence de colonne de plasma, et être inférieure à la distance de claquage entre les électrodes en présence de la colonne de plasma.The electrodes 1 and 2 are connected on the one hand via ballast resistors 6, 7 respectively to a high voltage source 8, a resistor 9 being connected between the two electrodes, at their junction with the resistors 6 and 7. the following figures, this resistance 9 is not shown, but it is understood that it may be present. The positive pole of the source 8 is preferably connected to the electrode 2 (in particular when these electrodes are arranged horizontally and at a short distance from the ground). On the other hand, the electrodes 1 and 2 are connected via continuous insulation capacitors 10, 11 respectively and a line 12, preferably coaxial, to a transmitter of low or very low frequency power and high peak voltage 13, which may be near or far from the electrodes 1, 2 of the antenna. The shield of line 12 is grounded. The distance D between the electrodes 1 and 2 is a function of the value of the high voltage of the source 8. In general, this distance D must be greater than the breakdown distance between the electrodes in the environment in the absence of plasma column, and be smaller than the breakdown distance between the electrodes in the presence of the plasma column.
Un laser d'amorçage 14 est disposé sous l'électrode 1, de façon que l'axe du faisceau qu'il produit soit confondu avec l'axe 5 au moins juste avant d'atteindre l'électrode 1. Ainsi, si l'on désire disposer le laser 14 de façon que son axe de sortie soit horizontal, on dispose alors un miroir qui renvoie son faisceau de sortie selon l'axe 5. On peut aussi disposer un miroir semi-transparent sur l'axe 5 si l'on veut utiliser deux lasers. On peut utiliser deux lasers par exemple en dédiant l'un aux tirs et l'autre à l'entretien de la colonne ionisée formant antenne. Selon des modes de réalisation typiques de l'invention, nullement limitatifs, les électrodes 1 et 2 sont circulaires et ont un diamètre de quelques dizaines de cm à quelques mètres, leur distance mutuelle D est d'environ 50 cm à Im, le diamètre des trous 3 et 5 est d'environ 1 cm. La tension de la source 8 est d'environ 10 à 20 kV, et la puissance fournie par l'émetteur 13 peut être comprise entre quelques centaines de Watts et quelques MW. La puissance moyenne qu'il délivre doit être suffisante pour entretenir le plasma engendré par la source haute tension 8.A priming laser 14 is disposed under the electrode 1, so that the axis of the beam that it produces coincides with the axis 5 at least just before reaching the electrode 1. Thus, if the it is desired to have the laser 14 so that its output axis is horizontal, then a mirror is provided which returns its output beam along the axis 5. It is also possible to have a semi-transparent mirror on the axis 5 if the we want to use two lasers. Two lasers can be used for example by dedicating one to shots and the other to the maintenance of the ionized column forming antenna. According to typical embodiments of the invention, which are in no way limiting, the electrodes 1 and 2 are circular and have a diameter of a few tens of cm to a few meters, their mutual distance D is about 50 cm to 1 m, the diameter of the holes 3 and 5 is about 1 cm. The voltage of the source 8 is about 10 to 20 kV, and the power supplied by the transmitter 13 can be between a few hundred Watts and a few MW. The average power it delivers must be sufficient to maintain the plasma generated by the high voltage source 8.
On va d'abord exposer à l'aide du schéma de la figure 6 et du chronogramme de la figure 7 les différentes phases successives de la création d'une antenne à plasma à l'aide du dispositif de l'invention, dans le cas d'un tir unique du laser 14. Ensuite, en référence aux figures 2 à 6 et au chronogramme de la figure 9, on exposera les différentes étapes de la formation de l'antenne plasma dans le cas de deux tirs du laser 14. Pour des raisons de présentation des explications, ces phases sont exposées consécutivement, mais il est bien entendu que dans les faits ces phases peuvent être simultanées ou quasi simultanées.We will first expose using the diagram of Figure 6 and the timing diagram of Figure 7 the different successive phases of the creation of a plasma antenna using the device of the invention, in the case A single shot of the laser 14. Next, with reference to FIGS. 2 to 6 and to the timing diagram of FIG. 9, the various steps of the formation of the plasma antenna will be explained in the case of two shots of the laser 14. reasons for presentation of the explanations, these phases are exposed consecutively, but it is understood that in fact these phases can be simultaneous or almost simultaneous.
On suppose qu'initialement aucun des éléments 8, 13 et 14 n'est activé. Pour illustrer la chronologie des différentes phases, on se référera aux repères temporels TO à T4 du chronogramme de la figure 7. A l'instant TO, on active la source de haute tension 8.It is assumed that initially none of the elements 8, 13 and 14 is activated. To illustrate the chronology of the different phases, reference will be made to the time references TO to T4 of the timing diagram of FIG. 7. At time TO, the high voltage source 8 is activated.
A l'instant Tl, on effectue un tir du laser 14, focalisé sur l'axe 5, au-delà de l'électrode 2. Ce tir produit simultanément une décharge entre les électrodes 1 et 2 (colonne d'air ionisée 17 entre ces électrodes) et la formation d'une colonne ionisée 18, plus fine que la colonne 17, centrée sur l'axe 5. A l'instant T2, on active le générateur 13, qui injecte de la puissance dans l'antenne « virtuelle » constituée par les colonnes de plasma 17 et 18 et qui entretient l'ionisation de ces colonnes, car, comme illustré en figure 7, la différence de potentiel instantanée VQC entre les électrodes 1 et 2 est constante à partir de l'instant Tl (voir relations ci-dessous). On remarquera qu'il faut respecter entre les instants Tl et T2 un temps minimal (typiquement de l'ordre de quelques dizaines de nanosecondes) pour que la colonne de plasma soit bien établie entre les électrodes 1 et 2.At time T1, the laser 14 is fired, focused on the axis 5, beyond the electrode 2. This firing simultaneously produces a discharge between the electrodes 1 and 2 (ionized air column 17 between these electrodes) and the formation of an ionized column 18, thinner than the column 17, centered on the axis 5. At the instant T2, the generator 13 is activated, which injects power into the "virtual" antenna Constituted by the plasma columns 17 and 18 and which maintains the ionization of these columns, because, as illustrated in FIG. 7, the instantaneous potential difference VQ C between the electrodes 1 and 2 is constant from the instant Tl (see relations below). It will be noted that a minimum time must be respected between instants T1 and T2 (typically of the order of a few tens of nanoseconds) in order for the plasma column to be well established between electrodes 1 and 2.
Le signal délivré par l'émetteur 13 peut s'écrire sous la forme:The signal delivered by the transmitter 13 can be written in the form:
VAC = A cos (ωt), tandis que la tension appliquée par la source 8 aux électrodes 1 et 2 est de la forme -/+ VDC-VA C = A cos (ωt), while the voltage applied by the source 8 to the electrodes 1 and 2 is of the form - / + VDC-
Les potentiels instantanés des électrodes 1 et 2 sont de la forme : VE i - VΑc - VDC VE2 = VAC + VDC ce qui fait qu'il y a constamment la même différence de potentiel entre les électrodes 1 et 2.The instantaneous potentials of the electrodes 1 and 2 are of the form: VE i - VΑc - VDC VE 2 = V AC + VDC so that there is constantly the same potential difference between the electrodes 1 and 2.
En régime d'émission, les électrodes 1 et 2 étant portées au même potentiel alternatif, il n'y a pas de déperdition de puissance alternative, cette puissance étant injectée en quasi totalité dans l'antenne à plasma et contribuant à l'entretien du plasma.In transmission mode, the electrodes 1 and 2 being brought to the same AC potential, there is no loss of alternative power, this power being injected almost completely into the plasma antenna and contributing to the maintenance of the plasma.
A la fin de l'émission (T3), le signal de l'émetteur 13 étant supprimé, la colonne ionisée 18 formant antenne disparaît rapidement (entre T3 et T4), et par là- même l'antenne disparaît. On a représenté en figure 8 une variante du dispositif des figures 1 à 6.At the end of the transmission (T3), the signal of the transmitter 13 being suppressed, the ionized column 18 forming antenna disappears rapidly (between T3 and T4), and thereby the antenna disappears. FIG. 8 shows a variant of the device of FIGS. 1 to 6.
Sur cette figure 8, les mêmes éléments que ceux des figures 1 à 6 sont affectés des mêmes références numériques. Dans ce dispositif de la figure 8, afin d'introduire une asymétrie de potentiel continu entre les électrodes 1 et 2, on utilise à la place de la résistance 9 de la figure 1 un montage potentiométrique formé par exemple par une résistance fixe 19 en série avec une résistance variable 20, ces deux résistances étant branchées entre les électrodes 1 et 2, leur point commun étant relié à la terre. Le réglage du potentiomètre ainsi formé permet un réglage fin des potentiels appliqués aux électrodes 1 et 2, afin de compenser les pertes de courant continu absorbé par l'antenne conductrice à plasma. En effet, la résistance de fuite du côté de l'électrode 2 est plus faible.In this figure 8, the same elements as those of Figures 1 to 6 are assigned the same reference numerals. In this device of FIG. 8, in order to introduce a continuous potential asymmetry between the electrodes 1 and 2, instead of the resistor 9 of FIG. 1, a potentiometric circuit formed for example by a fixed resistor 19 in series is used. with a variable resistor 20, these two resistors being connected between the electrodes 1 and 2, their common point being connected to the ground. The adjustment of the potentiometer thus formed allows a fine adjustment of the potentials applied to the electrodes 1 and 2, in order to compensate for the losses of direct current absorbed by the plasma conducting antenna. Indeed, the leak resistance on the side of the electrode 2 is lower.
En variante de l'invention (voir chronogramme de la figure 9), après l'activation de la source de haute tension (TO), on effectue un premier tir laser (Tl), focalisé sur l'axe 5 entre les deux électrodes, puis un deuxième tir laser (T2) focalisé sur le même axe 5, mais au-delà de l'électrode 2, puis on active le générateur 13 (T3). L'antenne plasma disparaît (T5) peu après la fin de l'activation du générateur 13 (T4). Dans le détail les différentes étapes de ce processus sont les suivantes :As a variant of the invention (see timing diagram of FIG. 9), after activation of the high voltage source (TO), a first laser firing (Tl) is carried out, focused on the axis 5 between the two electrodes, then a second laser shot (T2) focused on the same axis 5, but beyond the electrode 2, then activates the generator 13 (T3). The plasma antenna disappears (T5) shortly after the end of the activation of the generator 13 (T4). In detail the different stages of this process are as follows:
Figure 2 : après avoir activé la source haute tension 8 (TO), le laser 14 est activé (Tl) pour effectuer un premier « tir » focalisé sur l'axe 5, entre les électrodes 1 et 2, afin de créer par décharge haute tension une fine colonne de plasma conducteur 15 entre ces deux électrodes. Figure 3 : le tir laser provoque la décharge haute tension 16 dans la colonne 15 de plasma, entre les électrodes 1 et 2.Figure 2: after activating the high voltage source 8 (TO), the laser 14 is activated (T1) to perform a first "shot" focused on the axis 5, between the electrodes 1 and 2, to create by high discharge voltage a thin column of conductive plasma 15 between these two electrodes. Figure 3: the laser firing causes the high voltage discharge 16 in the plasma column 15, between the electrodes 1 and 2.
Figure 4 : La décharge 16 a pour effet d'élargir la colonne de plasma conducteur entre les électrodes 1 et 2, la colonne élargie étant notée 17. On notera qu'après la création de l'antenne à plasma, il est possible de court-circuiter les condensateurs 10 et 1 1, et ce, jusqu'à la fin de l'utilisation de l'antenne à plasma. Le rôle du générateur haute tension 8 est alors d'entretenir la colonne ionisée 17 rendue conductrice. On notera que les phénomènes illustrés en figures 2 à 4 sont pratiquement simultanés, et ont été décomposés pour en faciliter la description. Figure 5 : On effectue un deuxième tir du laser 14 (T2), focalisé sur l'axeFigure 4: The discharge 16 has the effect of expanding the conductive plasma column between the electrodes 1 and 2, the enlarged column being noted 17. It will be noted that after the creation of the plasma antenna, it is possible to short -circuiter capacitors 10 and 1 1, and until the end of the use of the plasma antenna. The role of the high voltage generator 8 is then to maintain the ionized column 17 made conductive. It should be noted that the phenomena illustrated in FIGS. 2 to 4 are practically simultaneous, and have been decomposed to facilitate their description. Figure 5: A second shot of the laser 14 (T2), focussed on the axis
5, au-delà de l'électrode 2. Ce deuxième tir entraîne la formation d'une colonne de plasma 18 en continuité de conduction électrique avec la colonne 17. Etant donné que le laser 14 est préférentiellement du type femtoseconde, la colonne 18 se réduit alors à des filaments de plasma, comme décrit par exemple dans le susdit brevet français, et sa longueur peut atteindre plusieurs km, ce qui lui confère les caractéristiques nécessaires à une antenne basse (ou très basse) fréquence.5, beyond the electrode 2. This second shot causes the formation of a plasma column 18 in continuity of electrical conduction with the column 17. Since the laser 14 is preferably of the femtosecond type, the column 18 is reduced then to plasma filaments, as described for example in the aforesaid French patent, and its length can reach several km, which gives it the characteristics necessary for a low antenna (or low frequency).
Figure 6 : on active l'émetteur 13 (T3), qui injecte de la puissance alternative dans l'antenne « virtuelle » constituée par les colonnes de plasma 17 et 18 et qui entretient l'ionisation de ces colonnes, car, comme illustré en figure 9, la différence de potentiel instantanée VDC entre les électrodes 1 et 2 est constante à partir de l'instant Tl (comme expliqué ci-dessus en référence à la figure 7).FIG. 6: the transmitter 13 (T3), which injects the alternative power into the "virtual" antenna constituted by the plasma columns 17 and 18 and which maintains the ionization of these columns, is activated because, as illustrated in FIG. 9, the instantaneous potential difference V DC between the electrodes 1 and 2 is constant from the instant T1 (as explained above with reference to FIG. 7).
En conclusion, grâce au dispositif de l'invention, outre les avantages inhérents à l'antenne à plasma proprement dite, le couplage conductif entre les électrodes et l'antenne, on obtient un très bon rendement du transfert de puissance entre le générateur 13 et l'antenne (ces électrodes étant portées au même potentiel alternatif instantané, pratiquement toute la puissance alternative est injectée dans l'antenne). En outre, ce dispositif est très économique, puisqu'il ne nécessite qu'une source de haute tension à basse puissance. In conclusion, thanks to the device of the invention, in addition to the advantages inherent to the actual plasma antenna, the conductive coupling between the electrodes and the antenna, a very good efficiency of the power transfer between the generator 13 and the generator is obtained. the antenna (these electrodes being brought to the same instantaneous AC potential, practically all the alternative power is injected into the antenna). In addition, this device is very economical, since it only requires a source of high voltage at low power.

Claims

REVENDICATIONS
1. Dispositif de couplage entre une colonne de plasma faisant fonction d'antenne et un générateur électrique de signal de puissance, associé à un laser, caractérisé en ce qu'il comporte au moins deux électrodes conductrices (1 , 2) percées chacune d'un trou (3, 4), ces trous étant coaxiaux, les électrodes étant reliées d'une part à une source de haute tension continue (8) et d'autre part à une source de signal alternatif de puissance (13), le(s) laser(s) étant disposé(s) de façon que son (leur) faisceau arrive selon l'axe (5) desdits trous des électrodes.1. Coupling device between a plasma column acting as an antenna and an electric power signal generator, associated with a laser, characterized in that it comprises at least two conductive electrodes (1, 2) each pierced by a hole (3, 4), these holes being coaxial, the electrodes being connected on the one hand to a DC high voltage source (8) and on the other hand to a source of AC power signal (13), the ( s) laser (s) being arranged (s) so that its (their) beam arrives along the axis (5) of said holes of the electrodes.
2. Dispositif selon la revendication 1, caractérisé en ce que le laser est un laser de type femtoseconde. 2. Device according to claim 1, characterized in that the laser is a femtosecond type laser.
3. Dispositif selon la revendication 1 ou 2, caractérisé en ce qu'il comporte entre les deux des électrodes un montage potentiométrique (19, 20) pour assurer un réglage fin des potentiels appliqués à ces électrodes.3. Device according to claim 1 or 2, characterized in that it comprises between the two electrodes a potentiometric arrangement (19, 20) to ensure a fine adjustment of the potentials applied to these electrodes.
4. Procédé d'utilisation d'une antenne à plasma comportant un dispositif de couplage selon l'une des revendications 1 à 3, caractérisé en ce qu'il comporte les étapes suivantes : activation de la source de haute tension, tir du laser, créant un plasma entre les électrodes et au-delà, sur l'axe (5) commun des trous des électrodes, activation du générateur de signal de puissance jusqu'à la fin de la période d'émission.4. A method of using a plasma antenna comprising a coupling device according to one of claims 1 to 3, characterized in that it comprises the following steps: activation of the high voltage source, firing of the laser, creating a plasma between the electrodes and beyond, on the common axis (5) of the electrode holes, activation of the power signal generator until the end of the emission period.
5. Procédé selon la revendication 4, caractérisé en ce qu'entre l'instant du tir laser et l'activation du générateur de signal de puissance, on respecte un temps minimal (Tm) de l'ordre de quelques dizaines de nanosecondes.5. Method according to claim 4, characterized in that between the instant of the laser firing and the activation of the power signal generator, a minimum time (Tm) of the order of a few tens of nanoseconds is respected.
6. Procédé d'utilisation d'une antenne à plasma comportant un dispositif de couplage selon l'une des revendications 1 à 3, caractérisé en ce qu'il comporte les étapes suivantes : activation de la source de haute tension, premier tir du laser, focalisé entre les électrodes, sur l'axe (5) commun des trous des électrodes, deuxième tir du laser, focalisé au-delà de la deuxième électrode, sur le même axe commun, activation du générateur de signal de puissance jusqu'à la fin de la période d'émission. 6. A method of using a plasma antenna comprising a coupling device according to one of claims 1 to 3, characterized in that it comprises the following steps: activation of the high voltage source, first shot of the laser , focused between the electrodes, on the common axis (5) of the electrode holes, second firing of the laser, focused beyond the second electrode, on the same common axis, activation of the power signal generator up to the end of the issue period.
EP07712164A 2006-02-07 2007-02-07 Device for coupling between a plasma antenna and a power signal generator Active EP1982347B1 (en)

Applications Claiming Priority (2)

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FR0601075A FR2897207B1 (en) 2006-02-07 2006-02-07 DEVICE FOR COUPLING BETWEEN A PLASMA ANTENNA AND A POWER SIGNAL GENERATOR
PCT/EP2007/051177 WO2007090850A1 (en) 2006-02-07 2007-02-07 Device for coupling between a plasma antenna and a power signal generator

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EP1982347B1 EP1982347B1 (en) 2009-09-30

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AT (1) ATE444560T1 (en)
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WO2016014790A1 (en) * 2014-07-23 2016-01-28 Georgia Tech Research Corporation Electrically short antennas with enhanced radiation resistance
US11024950B2 (en) * 2018-11-30 2021-06-01 United States Of America As Represented By The Secretary Of The Navy Wideband laser-induced plasma filament antenna with modulated conductivity

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US3404403A (en) * 1966-01-20 1968-10-01 Itt Laser beam antenna
US6169520B1 (en) * 1999-03-23 2001-01-02 The United States Of America As Represented By The Secretary Of The Navy Plasma antenna with currents generated by opposed photon beams
US6087993A (en) * 1999-05-21 2000-07-11 The United States Of America As Represented By The Secretary Of The Navy Plasma antenna with electro-optical modulator
US20030145790A1 (en) * 2002-02-05 2003-08-07 Hitoshi Sakamoto Metal film production apparatus and metal film production method
US6842146B2 (en) * 2002-02-25 2005-01-11 Markland Technologies, Inc. Plasma filter antenna system
US6710746B1 (en) * 2002-09-30 2004-03-23 Markland Technologies, Inc. Antenna having reconfigurable length
FR2863782B1 (en) 2003-10-17 2007-01-05 France Etat Armement METHOD FOR TRANSMITTING AN ELECTROMAGNETIC SIGNAL AND ANTENNA THEREFOR

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FR2897207A1 (en) 2007-08-10
WO2007090850A1 (en) 2007-08-16
CA2641764C (en) 2015-03-31
EP1982347B1 (en) 2009-09-30
IL193280A (en) 2011-11-30
IL193280A0 (en) 2009-02-11
DE602007002616D1 (en) 2009-11-12
CA2641764A1 (en) 2007-08-16
ES2333177T3 (en) 2010-02-17
ATE444560T1 (en) 2009-10-15
FR2897207B1 (en) 2008-04-04
US7965241B2 (en) 2011-06-21

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