EP1952493A4 - Laser system - Google Patents

Laser system Download PDF

Info

Publication number
EP1952493A4
EP1952493A4 EP06836437.1A EP06836437A EP1952493A4 EP 1952493 A4 EP1952493 A4 EP 1952493A4 EP 06836437 A EP06836437 A EP 06836437A EP 1952493 A4 EP1952493 A4 EP 1952493A4
Authority
EP
European Patent Office
Prior art keywords
laser system
laser
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP06836437.1A
Other languages
German (de)
French (fr)
Other versions
EP1952493A2 (en
Inventor
Alexander I. Ershov
William N. Partlo
Daniel J.W. Brown
Igor V. Fomenkov
Robert A. Bergstedt
Richard L. Sandstrom
Ivan Lalovic
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Cymer LLC
Original Assignee
Cymer LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cymer LLC filed Critical Cymer LLC
Publication of EP1952493A2 publication Critical patent/EP1952493A2/en
Publication of EP1952493A4 publication Critical patent/EP1952493A4/en
Withdrawn legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70583—Speckle reduction, e.g. coherence control or amplitude/wavefront splitting
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/10084—Frequency control by seeding
    • H01S3/10092—Coherent seed, e.g. injection locking
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
    • H01S3/2251—ArF, i.e. argon fluoride is comprised for lasing around 193 nm
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
    • H01S3/0057—Temporal shaping, e.g. pulse compression, frequency chirping
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/034—Optical devices within, or forming part of, the tube, e.g. windows, mirrors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08—Construction or shape of optical resonators or components thereof
    • H01S3/08018—Mode suppression
    • H01S3/08022—Longitudinal modes
    • H01S3/08031—Single-mode emission
    • H01S3/08036—Single-mode emission using intracavity dispersive, polarising or birefringent elements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08—Construction or shape of optical resonators or components thereof
    • H01S3/08059—Constructional details of the reflector, e.g. shape
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/105—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the mutual position or the reflecting properties of the reflectors of the cavity, e.g. by controlling the cavity length
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
    • H01S3/2308—Amplifier arrangements, e.g. MOPA
    • H01S3/2325—Multi-pass amplifiers, e.g. regenerative amplifiers
    • H01S3/2333—Double-pass amplifiers

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Lasers (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
EP06836437.1A 2005-11-01 2006-10-20 Laser system Withdrawn EP1952493A4 (en)

Applications Claiming Priority (13)

Application Number Priority Date Filing Date Title
US73268805P 2005-11-01 2005-11-01
US81442406P 2006-06-16 2006-06-16
US81429306P 2006-06-16 2006-06-16
US52190406A 2006-09-14 2006-09-14
US52190506A 2006-09-14 2006-09-14
US52185806A 2006-09-14 2006-09-14
US52183506A 2006-09-14 2006-09-14
US52183306A 2006-09-14 2006-09-14
US52183406A 2006-09-14 2006-09-14
US52186006A 2006-09-14 2006-09-14
US52205206A 2006-09-14 2006-09-14
US52190606A 2006-09-14 2006-09-14
PCT/US2006/041107 WO2007053335A2 (en) 2005-11-01 2006-10-20 Laser system

Publications (2)

Publication Number Publication Date
EP1952493A2 EP1952493A2 (en) 2008-08-06
EP1952493A4 true EP1952493A4 (en) 2017-05-10

Family

ID=38006377

Family Applications (1)

Application Number Title Priority Date Filing Date
EP06836437.1A Withdrawn EP1952493A4 (en) 2005-11-01 2006-10-20 Laser system

Country Status (5)

Country Link
US (1) US7822092B2 (en)
EP (1) EP1952493A4 (en)
JP (2) JP5506194B2 (en)
KR (2) KR101194231B1 (en)
WO (1) WO2007053335A2 (en)

Families Citing this family (51)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5162139B2 (en) * 2007-02-07 2013-03-13 株式会社小松製作所 Narrow band laser equipment for exposure equipment
JP5096035B2 (en) * 2007-05-01 2012-12-12 ギガフォトン株式会社 Optical pulse stretching device and discharge excitation laser device for exposure
US7714986B2 (en) 2007-05-24 2010-05-11 Asml Netherlands B.V. Laser beam conditioning system comprising multiple optical paths allowing for dose control
US8164739B2 (en) * 2007-09-28 2012-04-24 Asml Holding N.V. Controlling fluctuations in pointing, positioning, size or divergence errors of a beam of light for optical apparatus
JP2010087388A (en) * 2008-10-02 2010-04-15 Ushio Inc Aligner
EP2204695B1 (en) * 2008-12-31 2019-01-02 ASML Holding N.V. Etendue adjuster for a pulsed beam
US8014432B2 (en) * 2009-03-27 2011-09-06 Cymer, Inc. Regenerative ring resonator
USRE45957E1 (en) 2009-03-27 2016-03-29 Cymer, Llc Regenerative ring resonator
WO2011066440A1 (en) * 2009-11-24 2011-06-03 Applied Energetics Inc. Axial and off axis walk off multi-pass amplifiers
JP5410344B2 (en) * 2010-03-15 2014-02-05 ギガフォトン株式会社 Laser equipment
US9136668B2 (en) * 2010-10-29 2015-09-15 Lawrence Livermore National Security, Llc Method and system for compact efficient laser architecture
US8873596B2 (en) 2011-07-22 2014-10-28 Kla-Tencor Corporation Laser with high quality, stable output beam, and long life high conversion efficiency non-linear crystal
JP5789527B2 (en) 2012-01-18 2015-10-07 株式会社アマダホールディングス Laser processing apparatus and laser oscillation control method
US9008144B2 (en) * 2012-01-20 2015-04-14 Henry Yang Pang Low noise optically pumped laser structures utilizing dispersion elements
DE102012205308B4 (en) * 2012-03-30 2018-05-30 Trumpf Lasersystems For Semiconductor Manufacturing Gmbh Device for amplifying a laser beam
US9042006B2 (en) 2012-09-11 2015-05-26 Kla-Tencor Corporation Solid state illumination source and inspection system
WO2014045889A1 (en) * 2012-09-18 2014-03-27 ギガフォトン株式会社 Slab type amplifier, laser device equipped with same, and extreme ultraviolet light generating device
DK2937954T3 (en) * 2012-12-20 2020-10-19 Rainbow Source Laser Excimer laser combination resonator
US8929406B2 (en) 2013-01-24 2015-01-06 Kla-Tencor Corporation 193NM laser and inspection system
JP6242917B2 (en) 2013-02-08 2017-12-06 カール・ツァイス・エスエムティー・ゲーエムベーハー Beam reversing module and optical power amplifier having such a beam reversing module
US9529182B2 (en) 2013-02-13 2016-12-27 KLA—Tencor Corporation 193nm laser and inspection system
US9608399B2 (en) 2013-03-18 2017-03-28 Kla-Tencor Corporation 193 nm laser and an inspection system using a 193 nm laser
CN103427316B (en) * 2013-08-22 2015-09-16 中国科学院上海光学精密机械研究所 Laser pulse stretching device
CN103545705B (en) 2013-11-05 2016-01-20 深圳市华星光电技术有限公司 Regulate method and the laser frequency regulating system of laser frequency
US9804101B2 (en) 2014-03-20 2017-10-31 Kla-Tencor Corporation System and method for reducing the bandwidth of a laser and an inspection system and method using a laser
US9525265B2 (en) * 2014-06-20 2016-12-20 Kla-Tencor Corporation Laser repetition rate multiplier and flat-top beam profile generators using mirrors and/or prisms
KR102215750B1 (en) * 2014-07-15 2021-02-17 삼성디스플레이 주식회사 Laser anneal apparatus and laser anneal method using the same
US9419407B2 (en) 2014-09-25 2016-08-16 Kla-Tencor Corporation Laser assembly and inspection system using monolithic bandwidth narrowing apparatus
US9748729B2 (en) 2014-10-03 2017-08-29 Kla-Tencor Corporation 183NM laser and inspection system
JP6653096B2 (en) * 2014-11-28 2020-02-26 大学共同利用機関法人自然科学研究機構 Translucent living body indwelling device and use thereof
KR101700392B1 (en) * 2015-05-26 2017-02-14 삼성디스플레이 주식회사 Laser annealing apparatus and method for manufacturing display apparatus using the same
JP2018525819A (en) * 2015-07-22 2018-09-06 中国科学院光▲電▼研究院 Excimer laser system with annular chamber structure
NL2017928A (en) 2015-12-18 2017-06-28 Univ Amsterdam Inspection apparatus and method
US9945730B2 (en) 2016-09-02 2018-04-17 Cymer, Llc Adjusting an amount of coherence of a light beam
JP6261057B1 (en) * 2016-09-07 2018-01-17 大学共同利用機関法人自然科学研究機構 Selective amplification device
US10175555B2 (en) 2017-01-03 2019-01-08 KLA—Tencor Corporation 183 nm CW laser and inspection system
US10451890B2 (en) * 2017-01-16 2019-10-22 Cymer, Llc Reducing speckle in an excimer light source
WO2018138819A1 (en) 2017-01-26 2018-08-02 ギガフォトン株式会社 Laser system
JP2017143308A (en) * 2017-05-15 2017-08-17 カール・ツァイス・エスエムティー・ゲーエムベーハー Beam inversion module and optical power amplifier with the same
US10096969B1 (en) * 2017-09-14 2018-10-09 Cymer, Llc Method for dither free adaptive and robust dose control for photolithography
CN112368063B (en) * 2018-06-13 2023-01-06 西默有限公司 Gas monitoring system
KR102068125B1 (en) * 2018-11-28 2020-01-20 주식회사 한화 Wavelength selection device
CN109672079A (en) * 2018-12-03 2019-04-23 中国科学院光电技术研究所 A kind of quasi-molecule laser pulse method for widening and device based on two-stage series connection
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CN114072977A (en) 2019-08-07 2022-02-18 极光先进雷射株式会社 Optical pulse stretcher, laser device, and method for manufacturing electronic device
TW202248769A (en) * 2019-10-16 2022-12-16 美商希瑪有限責任公司 Series of stacked confocal pulse stretchers for speckle reduction
JP7413535B2 (en) * 2019-12-20 2024-01-15 サイマー リミテッド ライアビリティ カンパニー Directed gas purge to reduce dust buildup on excimer discharge chamber windows
JP7412562B2 (en) 2019-12-31 2024-01-12 サイマー リミテッド ライアビリティ カンパニー Undercut electrode for gas discharge laser chamber
CN115427892A (en) * 2020-05-27 2022-12-02 极光先进雷射株式会社 Laser device, pulse width expanding device, and method for manufacturing electronic device
RU200568U1 (en) * 2020-07-07 2020-10-29 Николай Андреевич Губкин LASER LIGHT
KR102357576B1 (en) * 2020-08-28 2022-02-07 한국과학기술원 Stretched pulse mode locking wavelength swept laser device and operation method thereof

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001061798A1 (en) * 1999-12-10 2001-08-23 Cymer, Inc. Injection seeded f2 lithography laser
US20020154668A1 (en) * 1999-12-10 2002-10-24 Knowles David S. Very narrow band, two chamber, high rep rate gas discharge laser system
WO2004095661A1 (en) * 2003-04-22 2004-11-04 Komatsu Ltd. 2-stage laser device for exposure

Family Cites Families (78)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3530388A (en) * 1965-04-21 1970-09-22 Westinghouse Electric Corp Light amplifier system
US3566128A (en) * 1968-06-17 1971-02-23 Bell Telephone Labor Inc Optical communication arrangement utilizing a multimode optical regenerative amplifier for pilot frequency amplification
US3646469A (en) * 1970-03-20 1972-02-29 United Aircraft Corp Travelling wave regenerative laser amplifier
US3646468A (en) * 1970-03-20 1972-02-29 United Aircraft Corp Servo aided injection phase-locked laser oscillator
US3969685A (en) * 1974-12-06 1976-07-13 United Technologies Corporation Enhanced radiation coupling from unstable laser resonators
US4019157A (en) * 1976-04-06 1977-04-19 The United States Of America As Represented By The United States Energy Research And Development Administration Method and apparatus for tuning high power lasers
US4107628A (en) * 1977-05-02 1978-08-15 Canadian Patents And Development Limited CW Brillouin ring laser
US4135787A (en) * 1977-07-27 1979-01-23 United Technologies Corporation Unstable ring resonator with cylindrical mirrors
US4247831A (en) * 1977-11-30 1981-01-27 The Secretary Of State For Defence In Her Britannic Majesty's Government Of The United Kingdom Of Great Britain And Northern Ireland Ring lasers
US4227159A (en) * 1978-01-24 1980-10-07 Allied Chemical Corporation Common-resonator pre-locked laser
US4229106A (en) * 1978-05-18 1980-10-21 Raytheon Company Electromagnetic wave ring resonator
US4239341A (en) * 1978-10-30 1980-12-16 The United States Of America As Represented By The Secretary Of The Army Unstable optical resonators with tilted spherical mirrors
US4268800A (en) * 1979-03-02 1981-05-19 Coherent, Inc. Vertex-mounted tipping Brewster plate for a ring laser
US4264870A (en) * 1979-10-18 1981-04-28 Jersey Nuclear-Avco Isotopes, Inc. Automatic locking system for an injection locked laser
EP0075964B1 (en) * 1980-04-05 1987-08-05 ELTRO GmbH Gesellschaft für Strahlungstechnik Laser device
US4490823A (en) * 1983-03-07 1984-12-25 Northrop Corporation Injection-locked unstable laser
US4689794A (en) * 1985-01-28 1987-08-25 Northrop Corporation Injection locking a xenon chloride laser at 308.4 nm
US4606034A (en) * 1985-02-19 1986-08-12 Board Of Trustees, University Of Illinois Enhanced laser power output
US4982406A (en) * 1989-10-02 1991-01-01 The United States Of America As Represented By The Secretary Of The Air Force Self-injection locking technique
FR2655485B1 (en) * 1989-12-01 1992-02-21 Thomson Csf RING CAVITY LASER DEVICE.
US5233460A (en) * 1992-01-31 1993-08-03 Regents Of The University Of California Method and means for reducing speckle in coherent laser pulses
US5239551A (en) * 1992-02-19 1993-08-24 Roberts Rosemary S Microwave-driven UV solid-state laser
GB9517755D0 (en) 1995-08-31 1995-11-01 Council Cent Lab Res Councils Multiple pass optical system
US5940418A (en) * 1996-06-13 1999-08-17 Jmar Technology Co. Solid-state laser system for ultra-violet micro-lithography
GB2315360B (en) * 1996-07-13 2001-06-06 Secr Defence Laser device
US5835520A (en) 1997-04-23 1998-11-10 Cymer, Inc. Very narrow band KrF laser
WO1999014631A1 (en) * 1997-09-17 1999-03-25 Kabushiki Kaisya Ushiosougougizyutsukenkyusyo Light source
IL138374A (en) * 1998-03-11 2004-07-25 Nikon Corp Ultraviolet laser apparatus and exposure apparatus comprising the ultraviolet laser apparatus
US6201608B1 (en) * 1998-03-13 2001-03-13 Optical Biopsy Technologies, Inc. Method and apparatus for measuring optical reflectivity and imaging through a scattering medium
JPH11330592A (en) * 1998-05-19 1999-11-30 Nikon Corp Laser optical source and aligner having the same
US6160832A (en) * 1998-06-01 2000-12-12 Lambda Physik Gmbh Method and apparatus for wavelength calibration
US6373869B1 (en) * 1998-07-30 2002-04-16 Actinix System and method for generating coherent radiation at ultraviolet wavelengths
US6031854A (en) * 1998-08-31 2000-02-29 Ming; Lai Diode-pumped cascade laser for deep UV generation
US6067311A (en) * 1998-09-04 2000-05-23 Cymer, Inc. Excimer laser with pulse multiplier
US6567450B2 (en) * 1999-12-10 2003-05-20 Cymer, Inc. Very narrow band, two chamber, high rep rate gas discharge laser system
US6191887B1 (en) * 1999-01-20 2001-02-20 Tropel Corporation Laser illumination with speckle reduction
JP2000223408A (en) * 1999-02-03 2000-08-11 Hitachi Ltd Semiconductor manufacturing device, and manufacture of semiconductor device
US6549551B2 (en) * 1999-09-27 2003-04-15 Cymer, Inc. Injection seeded laser with precise timing control
US6865210B2 (en) * 2001-05-03 2005-03-08 Cymer, Inc. Timing control for two-chamber gas discharge laser system
US6590922B2 (en) * 1999-09-27 2003-07-08 Cymer, Inc. Injection seeded F2 laser with line selection and discrimination
WO2000074185A1 (en) * 1999-06-01 2000-12-07 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Optical amplifier arrangement for a solid state laser
JP2001024265A (en) * 1999-07-05 2001-01-26 Komatsu Ltd Very narrow-band fluorine laser device
JP2001077453A (en) * 1999-09-07 2001-03-23 Komatsu Ltd Super narrow band width laser device
WO2001020651A1 (en) * 1999-09-10 2001-03-22 Nikon Corporation Exposure device with laser device
US6560263B1 (en) * 2000-06-09 2003-05-06 Cymer, Inc. Discharge laser having electrodes with sputter cavities and discharge peaks
US6904073B2 (en) * 2001-01-29 2005-06-07 Cymer, Inc. High power deep ultraviolet laser with long life optics
US6577663B2 (en) * 2000-06-19 2003-06-10 Lambda Physik Ag Narrow bandwidth oscillator-amplifier system
US6693939B2 (en) * 2001-01-29 2004-02-17 Cymer, Inc. Laser lithography light source with beam delivery
AUPQ901400A0 (en) * 2000-07-26 2000-08-17 Macquarie Research Limited A stable solid state raman laser and a method of operating same
US6690704B2 (en) * 2001-04-09 2004-02-10 Cymer, Inc. Control system for a two chamber gas discharge laser
US7009140B2 (en) * 2001-04-18 2006-03-07 Cymer, Inc. Laser thin film poly-silicon annealing optical system
US7061959B2 (en) * 2001-04-18 2006-06-13 Tcz Gmbh Laser thin film poly-silicon annealing system
US7167499B2 (en) * 2001-04-18 2007-01-23 Tcz Pte. Ltd. Very high energy, high stability gas discharge laser surface treatment system
US7415056B2 (en) * 2006-03-31 2008-08-19 Cymer, Inc. Confocal pulse stretcher
US6928093B2 (en) * 2002-05-07 2005-08-09 Cymer, Inc. Long delay and high TIS pulse stretcher
JP2003008119A (en) * 2001-06-26 2003-01-10 Komatsu Ltd Injection synchronized or mopa laser
US7830934B2 (en) * 2001-08-29 2010-11-09 Cymer, Inc. Multi-chamber gas discharge laser bandwidth control through discharge timing
US6700096B2 (en) * 2001-10-30 2004-03-02 Semiconductor Energy Laboratory Co., Ltd. Laser apparatus, laser irradiation method, manufacturing method for semiconductor device, semiconductor device, production system for semiconductor device using the laser apparatus, and electronic equipment
US6816520B1 (en) * 2001-11-30 2004-11-09 Positive Light Solid state system and method for generating ultraviolet light
JP3888673B2 (en) * 2001-12-28 2007-03-07 ウシオ電機株式会社 Fluorine molecular laser system for exposure
JP3830036B2 (en) * 2002-02-22 2006-10-04 株式会社小松製作所 Narrow band gas laser system
JP4169187B2 (en) * 2002-05-17 2008-10-22 株式会社小松製作所 Two stage laser system
JP4393457B2 (en) * 2002-07-31 2010-01-06 サイマー インコーポレイテッド Control system for two-chamber discharge gas laser
US20040202220A1 (en) * 2002-11-05 2004-10-14 Gongxue Hua Master oscillator-power amplifier excimer laser system
US6940880B2 (en) * 2003-03-11 2005-09-06 Coherent, Inc. Optically pumped semiconductor ring laser
US7184204B2 (en) * 2003-07-01 2007-02-27 Lambda Physik Ag Master-oscillator power-amplifier (MOPA) excimer or molecular fluorine laser system with long optics lifetime
US7087914B2 (en) * 2004-03-17 2006-08-08 Cymer, Inc High repetition rate laser produced plasma EUV light source
US7006547B2 (en) * 2004-03-31 2006-02-28 Cymer, Inc. Very high repetition rate narrow band gas discharge laser system
US20050286599A1 (en) * 2004-06-29 2005-12-29 Rafac Robert J Method and apparatus for gas discharge laser output light coherency reduction
JP5382975B2 (en) * 2004-07-06 2014-01-08 株式会社小松製作所 High power gas laser equipment
US7418022B2 (en) * 2004-07-09 2008-08-26 Coherent, Inc. Bandwidth-limited and long pulse master oscillator power oscillator laser systems
JP4798687B2 (en) * 2004-07-09 2011-10-19 株式会社小松製作所 Narrow band laser equipment
US7643522B2 (en) * 2004-11-30 2010-01-05 Cymer, Inc. Method and apparatus for gas discharge laser bandwidth and center wavelength control
US20060222034A1 (en) * 2005-03-31 2006-10-05 Cymer, Inc. 6 Khz and above gas discharge laser system
US7471708B2 (en) * 2005-03-31 2008-12-30 Cymer, Inc. Gas discharge laser output light beam parameter control
US7633989B2 (en) * 2005-06-27 2009-12-15 Cymer, Inc. High pulse repetition rate gas discharge laser
US7653095B2 (en) * 2005-06-30 2010-01-26 Cymer, Inc. Active bandwidth control for a laser
US7433372B2 (en) * 2006-06-05 2008-10-07 Cymer, Inc. Device and method to stabilize beam shape and symmetry for high energy pulsed laser applications

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001061798A1 (en) * 1999-12-10 2001-08-23 Cymer, Inc. Injection seeded f2 lithography laser
US20020154668A1 (en) * 1999-12-10 2002-10-24 Knowles David S. Very narrow band, two chamber, high rep rate gas discharge laser system
WO2004095661A1 (en) * 2003-04-22 2004-11-04 Komatsu Ltd. 2-stage laser device for exposure
US20070091968A1 (en) * 2003-04-22 2007-04-26 Komatsu Ltd. Two-stage laser system for aligners

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KR20080066974A (en) 2008-07-17
EP1952493A2 (en) 2008-08-06

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