EP1789752A4 - Thin film interference filter and bootstrap method for interference filter thin film deposition process control - Google Patents

Thin film interference filter and bootstrap method for interference filter thin film deposition process control

Info

Publication number
EP1789752A4
EP1789752A4 EP05816196A EP05816196A EP1789752A4 EP 1789752 A4 EP1789752 A4 EP 1789752A4 EP 05816196 A EP05816196 A EP 05816196A EP 05816196 A EP05816196 A EP 05816196A EP 1789752 A4 EP1789752 A4 EP 1789752A4
Authority
EP
European Patent Office
Prior art keywords
thin film
interference filter
process control
deposition process
bootstrap method
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP05816196A
Other languages
German (de)
French (fr)
Other versions
EP1789752A2 (en
Inventor
Michael L Myrick
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
University of South Carolina
Original Assignee
University of South Carolina
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by University of South Carolina filed Critical University of South Carolina
Publication of EP1789752A2 publication Critical patent/EP1789752A2/en
Publication of EP1789752A4 publication Critical patent/EP1789752A4/en
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0683—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating measurement during deposition or removal of the layer
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0625—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection
EP05816196A 2004-09-13 2005-09-13 Thin film interference filter and bootstrap method for interference filter thin film deposition process control Withdrawn EP1789752A4 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US60940604P 2004-09-13 2004-09-13
PCT/US2005/032420 WO2006031733A2 (en) 2004-09-13 2005-09-13 Thin film interference filter and bootstrap method for interference filter thin film deposition process control

Publications (2)

Publication Number Publication Date
EP1789752A2 EP1789752A2 (en) 2007-05-30
EP1789752A4 true EP1789752A4 (en) 2009-11-04

Family

ID=36060610

Family Applications (1)

Application Number Title Priority Date Filing Date
EP05816196A Withdrawn EP1789752A4 (en) 2004-09-13 2005-09-13 Thin film interference filter and bootstrap method for interference filter thin film deposition process control

Country Status (3)

Country Link
EP (1) EP1789752A4 (en)
JP (1) JP2008512730A (en)
WO (1) WO2006031733A2 (en)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1699422A4 (en) 2003-12-31 2009-04-29 Univ South Carolina Thin-layer porous optical sensors for gases and other fluids
US20070201136A1 (en) 2004-09-13 2007-08-30 University Of South Carolina Thin Film Interference Filter and Bootstrap Method for Interference Filter Thin Film Deposition Process Control
US20070166245A1 (en) 2005-11-28 2007-07-19 Leonard Mackles Propellant free foamable toothpaste composition
US8345234B2 (en) 2005-11-28 2013-01-01 Halliburton Energy Services, Inc. Self calibration methods for optical analysis system
EP1974201A1 (en) 2005-11-28 2008-10-01 University of South Carolina Optical analysis system for dynamic, real-time detection and measurement
EP1969326B1 (en) 2005-11-28 2020-06-10 Ometric Corporation Optical analysis system and method for real time multivariate optical computing
US9170154B2 (en) 2006-06-26 2015-10-27 Halliburton Energy Services, Inc. Data validation and classification in optical analysis systems
WO2008057912A2 (en) 2006-11-02 2008-05-15 University Of South Carolina Multi-analyte optical computing system
US8184295B2 (en) 2007-03-30 2012-05-22 Halliburton Energy Services, Inc. Tablet analysis and measurement system
EP2140238B1 (en) 2007-03-30 2020-11-11 Ometric Corporation In-line process measurement systems and methods
US8213006B2 (en) 2007-03-30 2012-07-03 Halliburton Energy Services, Inc. Multi-analyte optical computing system
US8283633B2 (en) 2007-11-30 2012-10-09 Halliburton Energy Services, Inc. Tuning D* with modified thermal detectors
US8212213B2 (en) 2008-04-07 2012-07-03 Halliburton Energy Services, Inc. Chemically-selective detector and methods relating thereto
US10718881B2 (en) 2013-07-09 2020-07-21 Halliburton Energy Services, Inc. Integrated computational elements with laterally-distributed spectral filters
MX364526B (en) 2013-07-09 2019-04-30 Halliburton Energy Services Inc Integrated computational elements with frequency selective surface.
EP2901135B1 (en) 2013-12-24 2016-08-24 Halliburton Energy Services, Inc. Real-time monitoring of fabrication of integrated computational elements
BR112016011057A8 (en) 2013-12-24 2020-04-22 Halliburton Energy Services Inc method and system
MX359927B (en) 2013-12-24 2018-10-16 Halliburton Energy Services Inc Fabrication of critical layers of integrated computational elements.
MX362272B (en) 2013-12-24 2019-01-10 Halliburton Energy Services Inc Adjusting fabrication of integrated computational elements.
US11274365B2 (en) 2013-12-30 2022-03-15 Halliburton Energy Services, Inc. Determining temperature dependence of complex refractive indices of layer materials during fabrication of integrated computational elements
EP2929319A4 (en) 2013-12-31 2016-12-21 Halliburton Energy Services Inc Fabrication of integrated computational elements using substrate support shaped to match spatial profile of deposition plume
MX359196B (en) 2014-02-14 2018-09-19 Halliburton Energy Services Inc In-situ spectroscopy for monitoring fabrication of integrated computational elements.
BR112016016251B1 (en) 2014-03-21 2020-11-17 Halliburton Energy Services, Inc optical analysis tool and well profiling system
EP3129592A4 (en) 2014-06-13 2017-11-29 Halliburton Energy Services, Inc. Integrated computational element with multiple frequency selective surfaces
KR20200076691A (en) * 2017-10-20 2020-06-29 쓰리엠 이노베이티브 프로퍼티즈 컴파니 Optical film and polarizing beam splitter

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3892490A (en) * 1974-03-06 1975-07-01 Minolta Camera Kk Monitoring system for coating a substrate
EP0754932A2 (en) * 1995-07-17 1997-01-22 Seiko Epson Corporation Optical film thickness measurement method, film formation method, and semiconductor laser fabrication method
US20040130726A1 (en) * 2002-06-20 2004-07-08 Hakon Mikkelsen Method for determining layer thickness ranges

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6573999B1 (en) * 2000-07-14 2003-06-03 Nanometrics Incorporated Film thickness measurements using light absorption

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3892490A (en) * 1974-03-06 1975-07-01 Minolta Camera Kk Monitoring system for coating a substrate
EP0754932A2 (en) * 1995-07-17 1997-01-22 Seiko Epson Corporation Optical film thickness measurement method, film formation method, and semiconductor laser fabrication method
US20040130726A1 (en) * 2002-06-20 2004-07-08 Hakon Mikkelsen Method for determining layer thickness ranges

Also Published As

Publication number Publication date
WO2006031733A2 (en) 2006-03-23
JP2008512730A (en) 2008-04-24
EP1789752A2 (en) 2007-05-30
WO2006031733A3 (en) 2007-02-22

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Legal Events

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Effective date: 20091006

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