EP1473156B1 - Wärmeempfindlicher Flachdruckplattenvorläufer - Google Patents

Wärmeempfindlicher Flachdruckplattenvorläufer Download PDF

Info

Publication number
EP1473156B1
EP1473156B1 EP20040100162 EP04100162A EP1473156B1 EP 1473156 B1 EP1473156 B1 EP 1473156B1 EP 20040100162 EP20040100162 EP 20040100162 EP 04100162 A EP04100162 A EP 04100162A EP 1473156 B1 EP1473156 B1 EP 1473156B1
Authority
EP
European Patent Office
Prior art keywords
group
product
printing plate
plate precursor
lithographic printing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
EP20040100162
Other languages
English (en)
French (fr)
Other versions
EP1473156A2 (de
EP1473156A3 (de
Inventor
Geert AGFA-GEVAERT Deroover
Marc AGFA-GEVAERT Van Damme
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Agfa NV
Original Assignee
Agfa Graphics NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agfa Graphics NV filed Critical Agfa Graphics NV
Priority to EP20040100162 priority Critical patent/EP1473156B1/de
Publication of EP1473156A2 publication Critical patent/EP1473156A2/de
Publication of EP1473156A3 publication Critical patent/EP1473156A3/de
Application granted granted Critical
Publication of EP1473156B1 publication Critical patent/EP1473156B1/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
    • B41C1/1016—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials characterised by structural details, e.g. protective layers, backcoat layers or several imaging layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/02—Positive working, i.e. the exposed (imaged) areas are removed
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/06—Developable by an alkaline solution
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/14—Multiple imaging layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/22—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by organic non-macromolecular additives, e.g. dyes, UV-absorbers, plasticisers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/24—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions involving carbon-to-carbon unsaturated bonds, e.g. acrylics, vinyl polymers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/26—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions not involving carbon-to-carbon unsaturated bonds
    • B41C2210/262—Phenolic condensation polymers, e.g. novolacs, resols

Definitions

  • Lithographic printing presses use a so-called printing master such as a printing plate which is mounted on a cylinder of the printing press.
  • the master carries a lithographic image on its surface and a print is obtained by applying ink to said image and then transferring the ink from the master onto a receiver material, which is typically paper.
  • ink as well as an aqueous fountain solution also called dampening liquid
  • the lithographic image which consists of oleophilic (or hydrophobic, i.e. ink-accepting, water-repelling) areas as well as hydrophilic (or oleophobic, i.e. water-accepting, ink-repelling) areas.
  • so-called driographic printing the lithographic image consists of ink-accepting and ink-abhesive (ink-repelling) areas and during driographic printing, only ink is supplied to the master.
  • Printing masters are generally obtained by the so-called computer-to-film method wherein various pre-press steps such as typeface selection, scanning, color separation, screening, trapping, layout and imposition are accomplished digitally and each color selection is transferred to graphic arts film using an image-setter.
  • the film can be used as a mask for the exposure of an imaging material called plate precursor and after plate processing, a printing plate is obtained which can be used as a master.
  • a typical printing plate precursor for computer-to-film methods comprise a hydrophilic support and an image-recording layer of a photosensitive polymer layers which include UV-sensitive diazo compounds, dichromate-sensitized hydrophilic colloids and a large variety of synthetic photopolymers. Particularly diazo-sensitized systems are widely used.
  • Upon image-wise exposure typically by means of a film mask in a UV contact frame, the exposed image areas become insoluble and the unexposed areas remain soluble in an aqueous alkaline developer.
  • the plate is then processed with the developer to remove the diazonium salt or diazo resin in the unexposed areas.
  • the exposed areas define the image areas (printing areas) of the printing master, and such printing plate precursors are therefore called 'negative-working'.
  • positive-working materials wherein the exposed areas define the non-printing areas, are known, e.g. plates having a novolac/naphtoquinone-diazide coating which dissolves in the developer only at exposed areas.
  • heat-sensitive printing plate precursors are known. Such materials offer the advantage of daylight stability and are especially used in the so-called computer-to-plate method wherein the plate precursor is directly exposed, i.e. without the use of a film mask.
  • the material is exposed to heat or to infrared light and the generated heat triggers a (physico-)chemical process, such as ablation, polymerization, insolubilization by cross-linking of a polymer or by particle coagulation of a thermoplastic polymer latex, and solubilization by the destruction of intermolecular interactions.
  • a (physico-)chemical process such as ablation, polymerization, insolubilization by cross-linking of a polymer or by particle coagulation of a thermoplastic polymer latex, and solubilization by the destruction of intermolecular interactions.
  • EP-A 864420 describes a positive-working heat-sensitive printing plate precursor comprising a support, a first layer containing an oleophilic polymer that is soluble in an aqueous alkaline developer and an IR-sensitive top layer of which the penetrability by or solubility in the aqueous alkaline developer is changed upon exposure to IR light.
  • WO 97/39894 describes a positive-working heat-sensitive printing plate precursor which is sensitive to IR light but not to UV light comprising a support and an IR-sensitive coating comprising an oleophilic polymer that is soluble in an aqueous alkaline developer and a dissolution inhibitor which reduces the solubility of the polymer in the developer.
  • WO99/21725 and WO99/21715 describe a positive-working heat sensitive printing plate precursor of which the coating comprises a compound which increases the developer resistance thereof.
  • Said compound is selected from the group of poly(alkylene oxide), siloxanes and esters or amides of polyhydric alcohols.
  • US 5 491 046 describes a method for imaging a positive and/or negative lithographic printing plate precursor wherein the imaging layer comprises a resole resin, a novolac resin, a latent Bronsted acid and an IR absorber.
  • the imaging layer comprises a resole resin, a novolac resin, a latent Bronsted acid and an IR absorber.
  • a cyanine dye with a pentafluoropropionate counter ion is described.
  • EP 1 256 444 discloses a positive-working printing plate precursor comprising a coating having a first layer containing an oleophilic phenolic resin and a second layer which prevents the penetration of an aqueous alkaline developer into the first layer during a time period t2, and which upon exposure to light and/or heat allows the dissolution of the first layer into the aqueous alkaline developer which occurs during a time period t1 and wherein t2 > t1 and t2 - t1 is at least 10 seconds.
  • the lithographic printing plate precursor of the present invention contains a support having a hydrophilic surface and a coating provided thereon.
  • the coating comprises at least two layers, designated herein as first and second layer, the first layer being closest to the support, i.e. located between the support and the second layer.
  • the printing plate precursor is positive-working, i.e. after exposure by light and development the exposed areas of the coating are removed from the support and define hydrophilic (non-printing) areas, whereas the unexposed coating is not removed from the support and defines an oleophilic (printing) area.
  • the second layer is believed to act as a barrier that prevents penetration of the aqueous alkaline developer into the oleophilic resin of the first layer at unexposed areas.
  • the barrier function of the second layer can be reduced due to the exposure and dissolution of the coating at those areas can be increased upon immersion in an aqueous alkaline developer.
  • This reduction of the barrier function of the second layer upon exposure can be tested e.g. by measuring the water uptake, due to swelling of the oleophilic resin, of an exposed and a non-exposed sample: typically, the exposed sample absorbs a small amount of water whereas the average water-uptake of non-exposed samples is within statistical error not different from zero.
  • the barrier function of the second layer arises from the presence of a water-repellent compound.
  • a water-repellent compound Suitable examples thereof are polymers comprising siloxane and/or perfluoroalkyl units or block- or graft-copolymers comprising a poly- or oligo(alkylene oxide) block and a block of poly- or oligosiloxane and/or perfluoroalkyl units.
  • the water-repellent polymer may be present in an amount of e.g. between 0.5 and 15 mg/m 2 , preferably between 0.5 and 10 mg/m 2 , more preferably between 0.5 and 5 mg/m 2 and most preferably between 0.5 and 2 mg/m 2 .
  • the block comprising the siloxane and/or perfluoroalkyl units may be a linear, branched, cyclic or complex cross-linked polymer or copolymer.
  • the perfluoroalkyl unit is e.g. a -(CF 2 )- unit.
  • the number of such units may be larger than 10, preferably larger than 20.
  • the term polysiloxane compound shall include any compound which contains more than one siloxane group -Si(R,R')-O-, wherein R and R' are optionally substituted alkyl or aryl groups.
  • Preferred siloxanes are phenylalkylsiloxanes and dialkylsiloxanes, e.g.
  • the number of siloxane groups -Si(R,R')-O- in the (co-)polymer is at least 2, preferably at least 10, more preferably at least 20. It may be less than 100, preferably less than 60.
  • the alkylene block preferably includes units of the formula -C n H 2n -O- wherein n is preferably an integer in the range 2 to 5.
  • the moiety - C n H 2n - may include straight or branched chains.
  • the alkylene moiety may also comprise optional substituents. Preferred embodiments and explicit examples of such polymers have been disclosed in WO99/21725 .
  • a suitable water-repellent polysiloxane compound is preferably a random or blockcopolymer comprising siloxane and alkyleneoxide groups, suitably comprising about 15 to 25 siloxane units and 50 to 70 alkyleneoxide groups.
  • Preferred polysiloxanes include a copolymer of dimethyldichlorosilane, ethylene oxide and propylene oxide. Specific compounds are the following: wherein o, p, q, r and s are integers >1.
  • the second layer may contain the oleophilic resin as well as the water-repellent compound.
  • block- or graft-copolymers comprising a poly- or oligo(alkylene oxide) block and a block of poly- or oligosiloxane and/or perfluoroalkyl units due to their bifunctional structure, position themselves during coating at the interface between the coating solution and air and thereby automatically form a separate layer, corresponding to the second layer of the present invention, even when applied as an ingredient of the coating solution of the oleophilic layer.
  • the water-repellent compound can be applied in a second solution, coated on top of the first layer.
  • a solvent in the second coating solution that is not capable of dissolving in the ingredients present in the first layer so that a phase of highly concentrated water-repellent polymer is obtained at the top of the material.
  • the oleophilic resin is preferably a polymer that is soluble in an aqueous developer, more preferably an aqueous alkaline developing solution with a pH between 7.5 and 14.
  • Preferred polymers are phenolic resins e.g. novolac, resoles, polyvinyl phenols and carboxy substituted polymers. Typical examples of these polymers are described in DE-A-4007428 , DE-A-4027301 and DE-A-4445820 .
  • the coating comprises an IR dye containing a perfluoroalkyl group, which sensitizes the material to the IR light used during the exposure. It is preferably a compound having an absorption maximum in the wavelength range between 750 and 1500 nm, so that a daylight stable material is obtained which can be handled without the need for darkroom conditions. Daylight stable material means that no substantial dissolution in the developer is induced by exposure to visible light.
  • the IR light absorbing dyes of the present invention carry a charge and at least one perfluoroalkyl group is included in a counterion and contains at least 6 fluorine atoms.
  • the IR light absorbing dyes may further contain a covalentely linked perfluoroalkyl group.
  • the sensitizing dye may be present in the first layer, in the second layer discussed above or in an optional other layer. It is believed that the perfluoroalkyl group comprised in the IR light absorbing dye makes the dye more compatible with the water-repellent compound and thereby promotes the tendency of the dye to position itself preferentially in the second layer, i.e. further away from the support. As a result, the heat generated by the exposure is concentrated in the second layer and a high sensitivity is observed.
  • the concentration of the IR absorbing compound in the coating is typically between 0.25 and 10.0 wt.%, more preferably between 0.5 and 7.5 wt.%.
  • Preferred IR absorbing compounds for use in this invention are represented by the general formula III: wherein
  • the IR light absorbing dye carries a negative or positive charge and at least one counter ion X comprising a perfluoroalkyl group with opposite charge is present to neutralize the compound.
  • the dye can be anionic or cationic as the chromophore and/or fluorine containing substituents on the chromophore and/or other substituents on the chromophore can have an electrical charge.
  • the unit of charge of the dye is determined by the sum of the positive and/or negative charges of the substituents on the dye and one or more counter ions with equal sum of opposite charge is present to neutralize the dye.
  • the unit of charge of the counter ions can be mono or multiple and/or positive or negative.
  • Suitable development accelerators are described in e.g. EP-A 933682 .
  • Such compounds act as dissolution promoters because they are capable of reducing the dissolution time of the first layer.
  • cyclic acid anhydrides, phenols or organic acids can be used in order to improve the aqueous developability.
  • cyclic acid anhydride examples include phtalic anhydride, tetrahydrophtalic anhydride, hexahydrophtalic anhydride, 3,6-endoxy 4-tertrahydrophalic anhydride, tetrachlorophtalic anhydride, maleic anhydride, chloromaleic anhydride, alpha-phenylmaleic anhydride, succinic anhydride, alpha-phenylmaleic anhydride, succinic anhydride, and pyromellitic anhydride, as described in U.S. Patent No. 4,115,128 .
  • phenols examples include bisphenol A, p-nitrophenol, p-ethoxyphenol, 2,4,4'-trihydroxybenzophenone, 2,3,4-trihydroxy-benzophenone, 4-hydroxyphenone, 4,4',4"-trihydroxytriphenylmethane, and 4,4',3",4"-tetrahydroxy-3,5,3',5'-tetramethyltriphenyl-methane, and the like.
  • organic acids include sulfonic acids, sulfinic acids, alkylsulfuric acids, phosphonic acids, phosphates, and carboxylic acids, as described in, for example, JP-A Nos. 60-888,942 and 2-96,755 .
  • organic acids include p-toluenesulfonic acid, dodecylbenzenesylfonic acid, p-tolenesulfinic acid, ethylsulfuric acid, phenylphosphonic acid, phenylphosphinic acid, phenyl phosphate, diphenyl phosphate, benzoic acid, isophtalic acid, adipic acid, p-toluic acid, 3,4-dimethylmethoxybenzoic acid, phtalic acid, terephtalic acid, 4-cyclohexene-1,2-dicarboxylic acid, erucic acid, lauric acid, n-undecanoic acid, and ascorbic acid.
  • the amount of the cyclic acid anhydride, phenol, or organic acid contained in the image forming composition is preferably in the range of 0.05 to 20% by weight.
  • a particularly preferred lithographic support is an electrochemically grained and anodized aluminum support.
  • the anodized aluminum support may be treated to improve the hydrophilic properties of its surface.
  • the aluminum support may be silicated by treating its surface with a sodium silicate solution at elevated temperature, e.g. 95°C.
  • a phosphate treatment may be applied which involves treating the aluminum oxide surface with a phosphate solution that may further contain an inorganic fluoride.
  • the aluminum oxide surface may be rinsed with a citric acid or citrate solution. This treatment may be carried out at room temperature or may be carried out at a slightly elevated temperature of about 30 to 50°C.
  • a further interesting treatment involves rinsing the aluminum oxide surface with a bicarbonate solution.
  • the aluminum oxide surface may be treated with polyvinylphosphonic acid, polyvinylmethylphosphonic acid, phosphoric acid esters of polyvinyl alcohol, polyvinylsulfonic acid, polyvinylbenzenesulfonic acid, sulfuric acid esters of polyvinyl alcohol, and acetals of polyvinyl alcohols formed by reaction with a sulfonated aliphatic aldehyde. It is further evident that one or more of these post treatments may be carried out alone or in combination.
  • the support can also be a flexible support, which is provided with a hydrophilic layer, hereinafter called 'base layer'.
  • the flexible support is e.g. paper, plastic film, thin aluminum or a laminate thereof.
  • Preferred examples of plastic film are polyethylene terephthalate film, polyethylene naphthalate film, cellulose acetate film, polystyrene film, polycarbonate film, etc.
  • the plastic film support may be opaque or transparent.
  • the hydrophilic binder for use in the base layer is e.g. a hydrophilic (co)polymer such as homopolymers and copolymers of vinyl alcohol, acrylamide, methylol acrylamide, methylol methacrylamide, acrylate acid, methacrylate acid, hydroxyethyl acrylate, hydroxyethyl methacrylate or maleic anhydride/vinylmethylether copolymers.
  • the hydrophilicity of the (co)polymer or (co)polymer mixture used is preferably the same as or higher than the hydrophilicity of polyvinyl acetate hydrolyzed to at least an extent of 60% by weight, preferably 80% by weight.
  • the amount of hardening agent, in particular tetraalkyl orthosilicate, is preferably at least 0.2 parts per part by weight of hydrophilic binder, more preferably between 0.5 and 5 parts by weight, most preferably between 1 parts and 3 parts by weight.
  • the hydrophilic base layer may also contain substances that increase the mechanical strength and the porosity of the layer.
  • colloidal silica may be used.
  • the colloidal silica employed may be in the form of any commercially available water dispersion of colloidal silica for example having an average particle size up to 40 nm, e.g. 20 nm.
  • inert particles of larger size than the colloidal silica may be added e.g. silica prepared according to Stöber as described in J. Colloid and Interface Sci., Vol. 26, 1968, pages 62 to 69 or alumina particles or particles having an average diameter of at least 100 nm which are particles of titanium dioxide or other heavy metal oxides.
  • the surface of the hydrophilic base layer is given a uniform rough texture consisting of microscopic hills and valleys, which serve as storage places for water in background areas.
  • hydrophilic base layers for use in accordance with the present invention are disclosed in EP-A- 601 240 , GB-P- 1 419 512 , FR-P- 2 300 354 , US-P- 3 971 660 , and US-P- 4 284 705 .
  • the amount of silica in the adhesion improving layer is between 200 mg/m 2 and 750 mg/m 2 .
  • the ratio of silica to hydrophilic binder is preferably more than 1 and the surface area of the colloidal silica is preferably at least 300 m 2 /gram, more preferably at least 500 m 2 /gram.
  • the printing plate precursor of the present invention can be exposed to light, e.g. by means of LEDs or a laser head.
  • one or more lasers or a laser diode are used.
  • the light used for the exposure is infrared light having a wavelength in the range from about 750 to about 1500 nm and preferably a laser such as a semiconductor laser diode, a Nd:YAG or a Nd:YLF laser is used.
  • the required laser power depends on the sensitivity of the image-recording layer, the pixel dwell time of the laser beam, which is determined by the spot diameter (typical value of modern plate-setters at 1/e 2 of maximum intensity : 10-25 ⁇ m), the scan speed and the resolution of the exposure apparatus (i.e. the number of addressable pixels per unit of linear distance, often expressed in dots per inch or dpi; typical value : 1000-4000 dpi).
  • ITD plate-setters for thermal plates are typically characterized by a very high scan speed up to 1500 m/sec and may require a laser power of several Watts.
  • the Agfa Galileo T (trademark of Agfa Gevaert N.V.) is a typical example of a plate-setter using the ITD-technology.
  • XTD plate-setters operate at a lower scan speed typically from 0.1 m/sec to 20 m/sec and have a typical laser-output-power per beam from 20 mW up to 500 mW.
  • the Creo Trendsetter plate-setter family (trademark of Creo) and the Agfa Excalibur plate-setter family (trademark of Agfa Gevaert N.V.) both make use of the XTD-technology.
  • the known plate-setters can be used as an off-press exposure apparatus, which offers the benefit of reduced press down-time.
  • XTD plate-setter configurations can also be used for on-press exposure, offering the benefit of immediate registration in a multi-color press. More technical details of on-press exposure apparatuses are described in e.g. US 5,17 ,205 and US 5,163,368 .
  • the non-exposed areas of the coating are removed by immersion in an aqueous alkaline developer, which may be combined with mechanical rubbing, e.g. by a rotating brush.
  • the development step may be followed by a drying step, a rinsing step, a gumming step, and/or a post-baking step.
  • the printing plate thus obtained can be used for conventional, so-called wet offset printing, in which ink and an aqueous dampening liquid is supplied to plate.
  • Another suitable printing method uses so-called single-fluid ink without a dampening liquid.
  • Single-fluid inks which are suitable for use in the method of the present invention have been described in US 4,045,232 and US 4,981,517 .
  • the single-fluid ink comprises an ink phase, also called the hydrophobic or oleophilic phase, and a polyol phase as described in WO 00/32705 .
  • the foil was subsequently subjected to anodic oxidation in an aqueous solution containing 200 g/l of sulfuric acid at a temperature of 45°C, a voltage of about 10 V and a current density of 150 A/m 2 for about 300 seconds to form an anodic oxidation film of 3.00 g/m 2 of Al 2 O 3 then washed with demineralized water, post-treated with a solution containing polyvinylphosphonic acid and subsequently with a solution containing aluminum trichloride, rinsed with demineralized water at 20°C during 120 seconds and dried.
  • the IR-sensitivity of the different compositions corresponds to the minimum energy density setting that is required to obtain a 50% reduction of the light absorption of the coating, measured on the developed plate at the wavelength maximum of the contrast dye, in areas which have been exposed with a dot area of a 50% screen (@200 lpi).
  • the support was prepared as described in examples 1 to 6.
  • the IR-sensitivity of the different compositions corresponds to the minimum energy density setting that is required to obtain a 50% reduction of the light absorption of the coating, measured on the developed plate at the wavelength maximum of the contrast dye, in areas which have been exposed with a dot area of a 50% screen (@200 lpi).

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Thermal Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Claims (9)

  1. Eine wärmeempfindliche lithografische Druckplattenvorstufe mit einem Träger mit einer hydrophilen Oberfläche und einer auf die hydrophile Oberfläche angebrachten Beschichtung, wobei die Beschichtung der Reihe nach eine erste Schicht, die ein oleophiles, in wässrig-alkalischem Entwickler lösliches Harz enthält, und eine zweite Schicht, die in der Lage ist, Durchdringung des Entwicklers in die erste Schicht in unbelichteten Bereichen zu verhindern, umfasst, wobei die zweite Schicht eine wasserabstoßende Verbindung aus folgender Gruppe enthält :
    - einem Polymer mit Siloxanmonomereinheiten und/oder Perfluoralkylmonomereinheiten und
    - einem Blockcopolymer oder Pfropfcopolymer mit einem Poly(alkylenoxid) oder Oligo(alkylenoxid) und einem Polymer oder Oligomer mit Siloxanmonomereinheiten und/oder Perfluoralkylmonomereinheiten, und
    wobei die Alkalilöslichkeit der Beschichtung durch Erwärmung gesteigert wird und die Beschichtung einen zumindest eine Perfluoralkylgruppe enthaltenden Infrarot-Farbstoff enthält, dadurch gekennzeichnet, dass der Infrarot-Farbstoff elektrisch geladen ist und zumindest eine zumindest 6 Fluoratome tragende Perfluoralkylgruppe in einem Gegenion enthalten ist.
  2. Lithografische Druckplattenvorstufe nach Anspruch 1, dadurch gekennzeichnet, dass der Infrarot-Farbstoff ferner zumindest eine kovalent gebundene Perfluoralkylgruppe enthält.
  3. Lithografische Druckplattenvorstufe nach einem der vorstehenden Ansprüche, dadurch gekennzeichnet, dass der Infrarot-Farbstoff ein Squaryliumfarbstoff, ein Croconatfarbstoff, ein Merocyaninfarbstoff, ein Cyaninfarbstoff, ein Indolizinfarbstoff, ein Pyriliumfarbstoff oder ein Metalldithiolinfarbstoff ist.
  4. Lithografische Druckplattenvorstufe nach einem der vorstehenden Ansprüche, dadurch gekennzeichnet, dass die wasserabstoßende Verbindung in einer Menge zwischen 0,5 und 15 mg/m2 in der Beschichtung verwendet wird.
  5. Lithografische Druckplattenvorstufe nach einem der vorstehenden Ansprüche, dadurch gekennzeichnet, dass die zweite Schicht im Wesentlichen aus der wasserabstoßenden Verbindung und dem Infrarot-Farbstoff zusammengesetzt ist.
  6. Lithografische Druckplattenvorstufe nach einem der vorstehenden Ansprüche, dadurch gekennzeichnet, dass der Infrarot-Farbstoff folgender Formel entspricht :
    Figure imgb0058
     in der :
    -L1- und -L2- unabhängig voneinander eine zweiwertige Verbindungsgruppe bedeuten,
    -E1 und -E2 unabhängig voneinander eine neutrale, anionische oder kationische Endgruppe aus der Gruppe bestehend aus Alkyl, -OH, -H, -Cl, -Br, -F (neutrale Gruppen), -SO3 -, -SO4 -, -PO3 2-, -PO4 2-, -COO- (anionische Gruppen) und -[NRaRbRc]+ (kationische Gruppe) bedeuten,
    wobei Ra, Rb und Rc unabhängig voneinander ein Wasserstoffatom oder eine Alkylgruppe bedeuten,
    -A1- und -A2- unabhängig voneinander -CVF2v-, -[(CF2)2-O]w-, eine langkettige, zumindest vier Kohlenstoffatome enthaltende Alkylgruppe oder eine gegebenenfalls substituierte Alkylgruppe, Alkenylgruppe, Arylgruppe oder Aralkylgruppe bedeuten,
    wobei p1 und p2 0 oder 1 bedeuten,
    wobei v und w 2 oder eine ganze Zahl über 2 bedeuten,
    -Y1- und -Y2- unabhängig voneinander -CR9R10-, -S-, -Se-, -NR11-, -CH=CH- oder -O- bedeuten,
    R1 bis R11 unabhängig voneinander jeweils ein Wasserstoffatom, eine gegebenenfalls substituierte Alkylgruppe, Alkenylgruppe, Arylgruppe oder Aralkylgruppe oder ein Halogenatom, -NO2, -O-Rd, -CO-Rd, -CO-O-Rd, -O-CO-Rd, -CO-NRdRe, -NRdRe, -NRd-CO-Re, -NRd-CO-O-Re, -NRd-CO-NReRf, -SRd, -SO-Rd, -SO2-Rd, -SO2-O-Rd, - SO2NRdRe oder eine Perfluoralkylgruppe bedeuten, wobei jede der besagten Gruppen gegebenenfalls eine oben als -E1 und -E2 definierte Endgruppe E umfassen kann und/oder zwei Nachbargruppen aus der Gruppe bestehend aus R1, R2, R3, R4, R5, R6, R7, R8, Y1 und Y2 gemeinsam einen gegebenenfalls substituierten 5-gliedrigen oder 6-gliedrigen Ring bilden,
    wobei Rd, Re und Rf unabhängig voneinander ein Wasserstoffatom oder eine gegebenenfalls substituierte Alkylgruppe, Alkenylgruppe, Arylgruppe oder Aralkylgruppe bedeuten,
    Z1 und Z3 unabhängig voneinander jeweils ein Wasserstoffatom oder eine Alkylgruppe oder gemeinsam die zur Vervollständigung eines gegebenenfalls substituierten 5-gliedrigen oder 6-gliedrigen Ringes benötigten Atome bedeuten,
    Z2 einen Substituenten aus der Gruppe bestehend aus einem Wasserstoffatom, einem Halogenatom und einer gegebenenfalls substituierten Alkylgruppe, Aminogruppe, Arylthiogruppe, Alkylthiogruppe, Aryloxygruppe, Alkoxygruppe, Barbitursäuregruppe oder Thiobarbitursäuregruppe bedeutet,
    X ein oder mehrere Gegenionen mit einer der Ladung des Farbstoffes entgegengesetzten Gesamtladung bedeutet und zumindest ein Gegenion X eine zumindest 6 Fluoratome enthaltende Perfluoralkylgruppe enthält.
  7. Druckplattenvorstufe nach Anspruch 6, dadurch gekennzeichnet, dass Z1 -(CH2)2- oder -(CH2)3- bedeutet.
  8. Lithografische Druckplattenvorstufe nach Anspruch 7, dadurch gekennzeichnet, dass der Infrarot-Farbstoff einer der folgenden Formeln entspricht :
    Figure imgb0059
    Figure imgb0060
    Figure imgb0061
    Figure imgb0062
     in denen p1, p2, -L1-, -L2-, -A1- -A2-, -E1, -E2, R9, R10 Z2 und X die diesen Symbolen in Anspruch 6 zugemessene Bedeutung haben.
  9. Lithografische Druckplattenvorstufe nach einem der Ansprüche 7 und 8, dadurch gekennzeichnet, dass der Infrarot-Farbstoff einer der folgenden Formeln entspricht :
    Figure imgb0063
    Figure imgb0064
    Figure imgb0065
    Figure imgb0066
     in denen :
    m 2 oder eine ganze Zahl über 2 bedeutet,
    R14 -(CH2)2-OCO-(CH2)2-(CF2)k-CF3 bedeutet,
    wobei k 2 oder eine ganze Zahl über 2 bedeutet, und
    G SO3-, SO4- oder COO- bedeutet.
EP20040100162 2003-01-27 2004-01-20 Wärmeempfindlicher Flachdruckplattenvorläufer Expired - Fee Related EP1473156B1 (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
EP20040100162 EP1473156B1 (de) 2003-01-27 2004-01-20 Wärmeempfindlicher Flachdruckplattenvorläufer

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP03100154 2003-01-27
EP03100154 2003-01-27
EP20040100162 EP1473156B1 (de) 2003-01-27 2004-01-20 Wärmeempfindlicher Flachdruckplattenvorläufer

Publications (3)

Publication Number Publication Date
EP1473156A2 EP1473156A2 (de) 2004-11-03
EP1473156A3 EP1473156A3 (de) 2005-03-23
EP1473156B1 true EP1473156B1 (de) 2008-02-20

Family

ID=33522367

Family Applications (1)

Application Number Title Priority Date Filing Date
EP20040100162 Expired - Fee Related EP1473156B1 (de) 2003-01-27 2004-01-20 Wärmeempfindlicher Flachdruckplattenvorläufer

Country Status (3)

Country Link
EP (1) EP1473156B1 (de)
JP (1) JP2004341484A (de)
DE (1) DE602004011853T2 (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7087359B2 (en) * 2003-01-27 2006-08-08 Agfa-Gevaert Heat-sensitive lithographic printing plate precursor
WO2006137261A1 (ja) * 2005-06-21 2006-12-28 Konica Minolta Medical & Graphic, Inc. 感光性組成物、感光性平版印刷版材料および平版印刷版材料の画像形成方法
CN102010515A (zh) * 2010-10-21 2011-04-13 浙江大学 双疏天然纤维素材料的制备方法
JP5782797B2 (ja) * 2010-11-12 2015-09-24 信越化学工業株式会社 近赤外光吸収色素化合物、近赤外光吸収膜形成材料、及びこれにより形成される近赤外光吸収膜

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6455229B1 (en) * 1999-02-02 2002-09-24 Agfa-Gevaert Method for making positive working printing plates
JP4335416B2 (ja) * 2000-06-06 2009-09-30 富士フイルム株式会社 画像形成材料及び赤外線吸収色素
EP1256444B1 (de) * 2001-04-09 2004-06-30 Agfa-Gevaert Positivarbeitende lithographische Druckplattenvorläufer

Also Published As

Publication number Publication date
DE602004011853D1 (de) 2008-04-03
EP1473156A2 (de) 2004-11-03
EP1473156A3 (de) 2005-03-23
JP2004341484A (ja) 2004-12-02
DE602004011853T2 (de) 2009-04-30

Similar Documents

Publication Publication Date Title
EP1736312B1 (de) Wärmeempfindliches Bildaufzeichnungselement
EP1554347B1 (de) Polymer für wärmeemfindlicher lithographischer druckplattevorläufer
EP1554117B1 (de) Wärmeempfindlicher vorläufer für eine lithographische druckplatte
EP1554346B1 (de) Polymer für wärmeempfindliche lithographische druckplattenvorläufer
EP1554324B1 (de) Polymer für wärmeempfindlichen vorläufer einer lithographischen druckplatte
EP1738901B1 (de) Wärmeempfindlicher lithographischer Druckplattenvorläufer
US7041427B2 (en) Heat-sensitive lithographic printing plate precursor
US7087359B2 (en) Heat-sensitive lithographic printing plate precursor
EP1738900B1 (de) Wärmeempfindlicher Flachdruckplattenvorläufer
EP1473156B1 (de) Wärmeempfindlicher Flachdruckplattenvorläufer
US6953652B2 (en) Heat-sensitive lithographic printing plate precursor
EP1297950B1 (de) Wärmeempfindlicher lithographischer Druckplattenvorläufer
US20040048195A1 (en) Heat-sensitive lithographic printing plate precursor
EP1256444B1 (de) Positivarbeitende lithographische Druckplattenvorläufer
US6846613B2 (en) Positive-working lithographic printing plate precursors
EP1440797B1 (de) Wärmeempfindlicher Flachdruckplattenvorläufer
US7294447B2 (en) Positive-working lithographic printing plate precursor
EP1396338B1 (de) Wärmeempfindlicher Flachdruckplattenvorläufer
EP1295717B1 (de) Wärmeempfindlicher positiv arbeitender Flachdruckplattenvorläufer
EP1543959B1 (de) Wärmeempfindlicher lithographischer Druckplattevorläufer
US20070003869A1 (en) Heat-sensitive lithographic printing plate-precursor

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

AK Designated contracting states

Kind code of ref document: A2

Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LI LU MC NL PT RO SE SI SK TR

AX Request for extension of the european patent

Extension state: AL LT LV MK

PUAL Search report despatched

Free format text: ORIGINAL CODE: 0009013

AK Designated contracting states

Kind code of ref document: A3

Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LI LU MC NL PT RO SE SI SK TR

AX Request for extension of the european patent

Extension state: AL LT LV MK

RIC1 Information provided on ipc code assigned before grant

Ipc: 7B 41N 1/08 B

Ipc: 7B 41C 1/10 A

17P Request for examination filed

Effective date: 20050923

AKX Designation fees paid

Designated state(s): DE FR GB IT NL

17Q First examination report despatched

Effective date: 20060405

RAP1 Party data changed (applicant data changed or rights of an application transferred)

Owner name: AGFA GRAPHICS N.V.

GRAP Despatch of communication of intention to grant a patent

Free format text: ORIGINAL CODE: EPIDOSNIGR1

GRAS Grant fee paid

Free format text: ORIGINAL CODE: EPIDOSNIGR3

GRAA (expected) grant

Free format text: ORIGINAL CODE: 0009210

AK Designated contracting states

Kind code of ref document: B1

Designated state(s): DE FR GB IT NL

REG Reference to a national code

Ref country code: GB

Ref legal event code: FG4D

REF Corresponds to:

Ref document number: 602004011853

Country of ref document: DE

Date of ref document: 20080403

Kind code of ref document: P

EN Fr: translation not filed
PLBE No opposition filed within time limit

Free format text: ORIGINAL CODE: 0009261

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT

26N No opposition filed

Effective date: 20081121

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: FR

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20081212

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: IT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20080220

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: GB

Payment date: 20101216

Year of fee payment: 8

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: NL

Payment date: 20111220

Year of fee payment: 9

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: DE

Payment date: 20111214

Year of fee payment: 9

REG Reference to a national code

Ref country code: NL

Ref legal event code: V1

Effective date: 20130801

GBPC Gb: european patent ceased through non-payment of renewal fee

Effective date: 20130120

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: DE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20130801

Ref country code: NL

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20130801

REG Reference to a national code

Ref country code: DE

Ref legal event code: R119

Ref document number: 602004011853

Country of ref document: DE

Effective date: 20130801

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: GB

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20130120