EP1453991A4 - Appareil et procede de traitement electrolytique - Google Patents
Appareil et procede de traitement electrolytiqueInfo
- Publication number
- EP1453991A4 EP1453991A4 EP02788797A EP02788797A EP1453991A4 EP 1453991 A4 EP1453991 A4 EP 1453991A4 EP 02788797 A EP02788797 A EP 02788797A EP 02788797 A EP02788797 A EP 02788797A EP 1453991 A4 EP1453991 A4 EP 1453991A4
- Authority
- EP
- European Patent Office
- Prior art keywords
- processing apparatus
- electrolytic processing
- electrolytic
- processing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F7/00—Constructional parts, or assemblies thereof, of cells for electrolytic removal of material from objects; Servicing or operating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23H—WORKING OF METAL BY THE ACTION OF A HIGH CONCENTRATION OF ELECTRIC CURRENT ON A WORKPIECE USING AN ELECTRODE WHICH TAKES THE PLACE OF A TOOL; SUCH WORKING COMBINED WITH OTHER FORMS OF WORKING OF METAL
- B23H3/00—Electrochemical machining, i.e. removing metal by passing current between an electrode and a workpiece in the presence of an electrolyte
- B23H3/02—Electric circuits specially adapted therefor, e.g. power supply, control, preventing short circuits
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23H—WORKING OF METAL BY THE ACTION OF A HIGH CONCENTRATION OF ELECTRIC CURRENT ON A WORKPIECE USING AN ELECTRODE WHICH TAKES THE PLACE OF A TOOL; SUCH WORKING COMBINED WITH OTHER FORMS OF WORKING OF METAL
- B23H5/00—Combined machining
- B23H5/06—Electrochemical machining combined with mechanical working, e.g. grinding or honing
- B23H5/08—Electrolytic grinding
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F3/00—Electrolytic etching or polishing
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3205—Deposition of non-insulating-, e.g. conductive- or resistive-, layers on insulating layers; After-treatment of these layers
- H01L21/321—After treatment
- H01L21/32115—Planarisation
- H01L21/3212—Planarisation by chemical mechanical polishing [CMP]
- H01L21/32125—Planarisation by chemical mechanical polishing [CMP] by simultaneously passing an electrical current, i.e. electrochemical mechanical polishing, e.g. ECMP
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001380641 | 2001-12-13 | ||
JP2001380641A JP3995463B2 (ja) | 2001-12-13 | 2001-12-13 | 電解加工方法 |
JP2002067393A JP2003266245A (ja) | 2002-03-12 | 2002-03-12 | 電解加工装置及び方法 |
JP2002067393 | 2002-03-12 | ||
PCT/JP2002/012973 WO2003054255A1 (fr) | 2001-12-13 | 2002-12-11 | Appareil et procede de traitement electrolytique |
Publications (2)
Publication Number | Publication Date |
---|---|
EP1453991A1 EP1453991A1 (fr) | 2004-09-08 |
EP1453991A4 true EP1453991A4 (fr) | 2007-12-05 |
Family
ID=26625046
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP02788797A Withdrawn EP1453991A4 (fr) | 2001-12-13 | 2002-12-11 | Appareil et procede de traitement electrolytique |
Country Status (4)
Country | Link |
---|---|
US (1) | US20050051432A1 (fr) |
EP (1) | EP1453991A4 (fr) |
TW (1) | TWI283196B (fr) |
WO (1) | WO2003054255A1 (fr) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7638030B2 (en) | 2001-06-18 | 2009-12-29 | Ebara Corporation | Electrolytic processing apparatus and electrolytic processing method |
TW592859B (en) * | 2001-09-11 | 2004-06-21 | Ebara Corp | Electrolytic processing apparatus and method |
TWI277473B (en) | 2002-01-31 | 2007-04-01 | Ebara Corp | Electrolytic processing apparatus and method, fixing method, fixing structure for ion exchanging member |
US7476303B2 (en) * | 2003-08-11 | 2009-01-13 | Ebara Corporation | Electrolytic processing apparatus and electrolytic processing method |
WO2007035408A1 (fr) * | 2005-09-19 | 2007-03-29 | Applied Materials, Inc. | Procede de polissage stabilise |
US20070108066A1 (en) * | 2005-10-28 | 2007-05-17 | Applied Materials, Inc. | Voltage mode current control |
MD3808G2 (ro) * | 2007-05-25 | 2009-08-31 | Институт Прикладной Физики Академии Наук Молдовы | Instalaţie de prelucrare electrică a metalelor |
CN104419975A (zh) * | 2013-09-05 | 2015-03-18 | 通用电气公司 | 控制电化学剥离过程的***和方法 |
CN109594119B (zh) * | 2018-12-11 | 2020-08-14 | 大连理工大学 | 一种电致化学抛光装置及其工作方法 |
Family Cites Families (32)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4072119A (en) * | 1977-03-21 | 1978-02-07 | Williams Barney V | Vertical rising boat lift |
US4226202A (en) * | 1977-11-23 | 1980-10-07 | Conrad Edward G | Floating lash barge lifting device |
US4615289A (en) * | 1978-08-14 | 1986-10-07 | Bloxham Roger W | Floating dry dock |
US4509446A (en) * | 1982-12-21 | 1985-04-09 | Marine Concepts, Inc. | Drydocking device having a moment resisting arrangement |
US4732102A (en) * | 1986-03-10 | 1988-03-22 | Holman Clifford W | Portable, self-contained, self-adjustable craft lift and wet/dry storage system |
US5099778A (en) * | 1990-02-27 | 1992-03-31 | Palen Richard L | Craft lift |
JP3013377B2 (ja) * | 1990-03-07 | 2000-02-28 | 日産自動車株式会社 | 半導体基板のエッチング方法 |
US5036015A (en) * | 1990-09-24 | 1991-07-30 | Micron Technology, Inc. | Method of endpoint detection during chemical/mechanical planarization of semiconductor wafers |
US5499733A (en) * | 1992-09-17 | 1996-03-19 | Luxtron Corporation | Optical techniques of measuring endpoint during the processing of material layers in an optically hostile environment |
US5240347A (en) * | 1992-12-08 | 1993-08-31 | Shorethings, Inc. | Collapsible boat lift |
US5413941A (en) * | 1994-01-06 | 1995-05-09 | Micron Technology, Inc. | Optical end point detection methods in semiconductor planarizing polishing processes |
DE19548115C2 (de) * | 1994-12-27 | 2002-08-29 | Nissan Motor | Elektrochemisches Ätzverfahren für ein Halbleitersubstrat sowie Vorrichtung zur Durchführung des Verfahrens |
US5702563A (en) * | 1995-06-07 | 1997-12-30 | Advanced Micro Devices, Inc. | Reduced chemical-mechanical polishing particulate contamination |
US6131528A (en) * | 1996-06-24 | 2000-10-17 | Michael Kilpatrick Meek | Docking apparatus |
JP3837783B2 (ja) * | 1996-08-12 | 2006-10-25 | 森 勇蔵 | 超純水中の水酸基による加工方法 |
JP2913473B2 (ja) * | 1997-01-31 | 1999-06-28 | 株式会社チップトン | 間隙調整機能を有する渦流バレル加工機及び退避層成形方法並びに間隙調整方法 |
US6171467B1 (en) * | 1997-11-25 | 2001-01-09 | The John Hopkins University | Electrochemical-control of abrasive polishing and machining rates |
TW593731B (en) * | 1998-03-20 | 2004-06-21 | Semitool Inc | Apparatus for applying a metal structure to a workpiece |
US6121152A (en) * | 1998-06-11 | 2000-09-19 | Integrated Process Equipment Corporation | Method and apparatus for planarization of metallized semiconductor wafers using a bipolar electrode assembly |
WO2000034995A1 (fr) * | 1998-12-07 | 2000-06-15 | Japan Science And Technology Corporation | Procede d'usinage/nettoyage avec des ions hydroxyde dans de l'eau ultrapure |
US6032601A (en) * | 1999-03-05 | 2000-03-07 | Gates; Craig D. | Combination boat lift and dock |
JP2001064799A (ja) * | 1999-08-27 | 2001-03-13 | Yuzo Mori | 電解加工方法及び装置 |
JP4513145B2 (ja) * | 1999-09-07 | 2010-07-28 | ソニー株式会社 | 半導体装置の製造方法および研磨方法 |
US6379223B1 (en) * | 1999-11-29 | 2002-04-30 | Applied Materials, Inc. | Method and apparatus for electrochemical-mechanical planarization |
TW562878B (en) * | 2000-06-30 | 2003-11-21 | Ebara Corp | Copper-plating liquid, plating method and plating apparatus |
JP4141114B2 (ja) * | 2000-07-05 | 2008-08-27 | 株式会社荏原製作所 | 電解加工方法及び装置 |
US7101465B2 (en) * | 2001-06-18 | 2006-09-05 | Ebara Corporation | Electrolytic processing device and substrate processing apparatus |
US7638030B2 (en) * | 2001-06-18 | 2009-12-29 | Ebara Corporation | Electrolytic processing apparatus and electrolytic processing method |
JP4043234B2 (ja) * | 2001-06-18 | 2008-02-06 | 株式会社荏原製作所 | 電解加工装置及び基板処理装置 |
US6592742B2 (en) * | 2001-07-13 | 2003-07-15 | Applied Materials Inc. | Electrochemically assisted chemical polish |
US6884724B2 (en) * | 2001-08-24 | 2005-04-26 | Applied Materials, Inc. | Method for dishing reduction and feature passivation in polishing processes |
JP2003205428A (ja) * | 2002-01-08 | 2003-07-22 | Ebara Corp | 電解加工装置及び方法 |
-
2002
- 2002-12-11 WO PCT/JP2002/012973 patent/WO2003054255A1/fr active Application Filing
- 2002-12-11 US US10/498,042 patent/US20050051432A1/en not_active Abandoned
- 2002-12-11 EP EP02788797A patent/EP1453991A4/fr not_active Withdrawn
- 2002-12-12 TW TW091135927A patent/TWI283196B/zh not_active IP Right Cessation
Non-Patent Citations (1)
Title |
---|
No further relevant documents disclosed * |
Also Published As
Publication number | Publication date |
---|---|
WO2003054255A1 (fr) | 2003-07-03 |
TWI283196B (en) | 2007-07-01 |
US20050051432A1 (en) | 2005-03-10 |
TW200301171A (en) | 2003-07-01 |
EP1453991A1 (fr) | 2004-09-08 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
17P | Request for examination filed |
Effective date: 20040527 |
|
AK | Designated contracting states |
Kind code of ref document: A1 Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR IE IT LI LU MC NL PT SE SI SK TR |
|
A4 | Supplementary search report drawn up and despatched |
Effective date: 20071107 |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE APPLICATION HAS BEEN WITHDRAWN |
|
18W | Application withdrawn |
Effective date: 20090810 |