EP1433518A1 - Process for removing harmful organometallic compounds from a gas - Google Patents
Process for removing harmful organometallic compounds from a gasInfo
- Publication number
- EP1433518A1 EP1433518A1 EP03027222.3A EP03027222A EP1433518A1 EP 1433518 A1 EP1433518 A1 EP 1433518A1 EP 03027222 A EP03027222 A EP 03027222A EP 1433518 A1 EP1433518 A1 EP 1433518A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- gas
- organometallic compounds
- removing harmful
- harmful
- organometallic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 150000002902 organometallic compounds Chemical class 0.000 title 1
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2002376411A JP4048108B2 (en) | 2002-12-26 | 2002-12-26 | How to clean harmful gases |
JP2002376411 | 2002-12-26 |
Publications (2)
Publication Number | Publication Date |
---|---|
EP1433518A1 true EP1433518A1 (en) | 2004-06-30 |
EP1452220A1 EP1452220A1 (en) | 2004-09-01 |
Family
ID=32463567
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP03027222A Withdrawn EP1452220A1 (en) | 2002-12-26 | 2003-11-28 | Process for removing harmful organometallic compounds from a gas |
Country Status (5)
Country | Link |
---|---|
US (1) | US20040129138A1 (en) |
EP (1) | EP1452220A1 (en) |
JP (1) | JP4048108B2 (en) |
CN (1) | CN1511616A (en) |
TW (1) | TW200413084A (en) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5696348B2 (en) * | 2008-08-09 | 2015-04-08 | 東京エレクトロン株式会社 | Metal recovery method, metal recovery apparatus, exhaust system, and film forming apparatus using the same |
US20140322124A1 (en) * | 2013-04-26 | 2014-10-30 | Japan Pionics Co., Ltd. | Method of processing discharge gas discharged from production process of gallium nitride compound semiconductor |
JP2014214060A (en) * | 2013-04-26 | 2014-11-17 | 日本パイオニクス株式会社 | Hydrogen recovery method, and hydrogen reuse method using the same |
JP2015000842A (en) * | 2013-06-18 | 2015-01-05 | 日本パイオニクス株式会社 | Recovery method of ammonia and reuse method of ammonia using the same |
CN106345289A (en) * | 2016-08-28 | 2017-01-25 | 桂林市晶准测控技术有限公司 | Harmful gas purifier and preparation method thereof |
US11173451B1 (en) * | 2020-10-29 | 2021-11-16 | Air Products And Chemicals, Inc. | Removal of hydrogen impurity from gas streams |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5949822A (en) * | 1982-09-14 | 1984-03-22 | Nippon Sanso Kk | Treatment of gas comtaining volatile inorganic hydride or the like |
DE3869480D1 (en) * | 1987-06-01 | 1992-04-30 | Japan Pionics | METHOD FOR PURIFYING EXHAUST GAS. |
US5853678A (en) * | 1993-03-17 | 1998-12-29 | Nipon Sanso Corporation | Method for removing hydrides, alkoxides and alkylates out of a gas using cupric hydroxide |
WO1994021355A1 (en) * | 1993-03-17 | 1994-09-29 | Nippon Sanso Corporation | Methods of removing and detecting harmful component |
JP3340510B2 (en) * | 1993-05-19 | 2002-11-05 | 日本パイオニクス株式会社 | Hazardous gas purification method |
JP3347478B2 (en) * | 1994-06-13 | 2002-11-20 | 日本パイオニクス株式会社 | Exhaust gas purification method |
JP2998002B2 (en) * | 1996-01-11 | 2000-01-11 | 日本酸素株式会社 | Organometallic compound abatement agent and harmful gas abatement method |
GB9614848D0 (en) * | 1996-07-15 | 1996-09-04 | Boc Group Plc | Processes for the scrubbing of noxious substances |
SG111909A1 (en) * | 1999-01-21 | 2005-06-29 | Mitsui Chemicals Inc | Agent for and process of treating exhaust gas |
US6447576B1 (en) * | 1999-10-29 | 2002-09-10 | Japan Pionics Co., Ltd. | Cleaning agent and cleaning process of harmful gas |
JP2001219033A (en) * | 1999-11-30 | 2001-08-14 | Japan Pionics Co Ltd | Method and device for cleaning harmful gas |
TW510820B (en) * | 1999-11-30 | 2002-11-21 | Japan Pionics | Method of cleaning of harmful gas and cleaning apparatus |
US6805728B2 (en) * | 2002-12-09 | 2004-10-19 | Advanced Technology Materials, Inc. | Method and apparatus for the abatement of toxic gas components from a semiconductor manufacturing process effluent stream |
-
2002
- 2002-12-26 JP JP2002376411A patent/JP4048108B2/en not_active Expired - Fee Related
-
2003
- 2003-11-28 EP EP03027222A patent/EP1452220A1/en not_active Withdrawn
- 2003-12-22 US US10/740,613 patent/US20040129138A1/en not_active Abandoned
- 2003-12-23 CN CNA2003101230036A patent/CN1511616A/en active Pending
- 2003-12-25 TW TW092136798A patent/TW200413084A/en unknown
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