EP1378322B1 - Method and tumbling apparatus with two oscillating movements - Google Patents
Method and tumbling apparatus with two oscillating movements Download PDFInfo
- Publication number
- EP1378322B1 EP1378322B1 EP02405561A EP02405561A EP1378322B1 EP 1378322 B1 EP1378322 B1 EP 1378322B1 EP 02405561 A EP02405561 A EP 02405561A EP 02405561 A EP02405561 A EP 02405561A EP 1378322 B1 EP1378322 B1 EP 1378322B1
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- EP
- European Patent Office
- Prior art keywords
- polishing
- tank
- movement
- piece
- product
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B31/00—Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor
- B24B31/02—Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor involving rotary barrels
- B24B31/027—Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor involving rotary barrels with additional oscillating movement
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B31/00—Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor
- B24B31/06—Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor involving oscillating or vibrating containers
- B24B31/064—Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor involving oscillating or vibrating containers the workpieces being fitted on a support
Definitions
- the present invention relates to a method of polishing parts more particularly but not exclusively metal, and a polishing device adapted to implement this method, according to the preamble of claims 1 and 5 respectively.
- Document WO 0029171 describes a polishing method, as well as a polishing device according to the preamble of claims 1 and 5 respectively.
- the standards concerning mechanical engineering describe different degrees of surface state or roughness or polishing of a metal part.
- the VSM standards 10230 and 10231 define twelve degrees of roughness ranging from N1 to N12, the degree N1 corresponding to the finest polishing while N12 corresponds to a coarse surface state.
- Current polishing machines make it possible to reach the degree N4 or N3, the degrees N2 or N1 being currently obtainable only by covering the surface to be polished with a metal layer, for example by chromium plating. Such a method of lap polishing has several disadvantages.
- a first object of the invention is therefore to propose a polishing process making it possible to obtain, by mechanical means, which can be automated, a high degree of polishing, for example at least the degree N1, this for a metal part of any shape, all polishing surfaces can be completed in the same degree of polishing and without the need to take the piece for a subsequent recovery operation such as a chromium recovery operation.
- Another object of the invention is to propose a polishing device which makes it possible to carry out the preceding method, said device possibly comprising means allowing a fully automated operation of a polishing cycle.
- the subject of the invention is a polishing method according to claims 1.
- the invention also relates to a device for implementing the method according to claim 5.
- the invention relates to a method of polishing at least one part 2 with a polishing product contained in a tank 1, at least one surface of the part 2 being exposed in contact with said product of polishing 10.
- the polishing product 10 comprises polishing particles and a liquid in which these particles bathe.
- polishing product is not the subject of the invention, the composition of this product will not be detailed.
- At least one induced movement B, C, of a substantially circular nature is caused.
- a polishing product is used which generates a mechanical action and a chemical action.
- a vessel 1 having a substantially vertical side wall and a substantially flat and horizontal bottom is chosen.
- the part support is constituted by using the wall of the vessel 1 in an area which is exposed in contact with the polishing product 10, and at least a first oscillatory movement A is imposed on said vessel 1 in such a way that the part 2 is displaced in the polishing product 10.
- the part support is constituted by using a member 100 separate from the vessel 1 and it is to this member 100 that at least said first oscillatory movement A is imposed, while this member 100 keeps the part 2 in contact with said product. polishing 10.
- the polishing tank 1 is subjected to the action of a displacement device 3, said polishing device 3.
- the tank is animated with movements intended to induce movements of the polishing product 10.
- the tank 1 is driven by a first oscillatory movement A carried out in a substantially horizontal plane.
- This first movement can be illustrated by the path of each of the constituent points of the vessel 1, for example the four corners, on a circle, in a direction represented by the arrows A, in a plane parallel to the plane of the drawing, a given face of the vessel remaining always parallel to itself during this movement.
- Another position of the vessel 1 during this first movement has been represented in 1A.
- This first oscillatory movement A is completed by a second movement made in a direction perpendicular to the horizontal, that is to say in a substantially vertical direction. The manner in which these movements are produced will be described later.
- the mixture 10 that it contains is animated with induced movements of substantially circular nature as shown in FIG. 1.
- a main displacement B, substantially central, is distinguished.
- secondary displacements C substantially peripheral.
- the principle of the method therefore consists in imposing a compound oscillatory movement on the vessel 1 such that displacements are created in the polishing product 10. It is understood that if a metal part 2 is fixed in the vessel 1, - see FIG. it is covered with the polishing product 10 and that the movement described further to the tank is printed, it will create a plurality of displacements around the part 2, these displacements coming from the movement imposed on the vessel 1 in cooperation with the irregularities of shape of the piece facing irregularities of shape of the vessel. Preferably the part 2 will not be disposed in the center of the tank, first to create an unbalance, thereby increasing the amplitude of the translational movement in rotation, and then to increase the substantially circular effect.
- Displacements B and C shown in Figure 1 correspond to movements produced when the tank does not contain the part 2 to be polished; it can be seen that when one or more pieces are arranged in the tank, there are still other displacements as well as displacements along axes different from those represented, resulting from the irregularities of shape of the pieces as well as the movement of oscillation perpendicular to the plane of the figure mentioned above.
- the polishing product 10 effecting the polishing under the action of the displacements described can be any known polishing product, in liquid or pasty form.
- the polishing device 3 consists of a frame 30 resting on shock absorbers known to the art on the ground, this in order to limit the transmission of vibrations to the environment.
- a motor 32 preferably an electric motor, rotates a vertical axis 33, via two pulleys and a belt according to the embodiment shown.
- the vertical axis 33 is composed of two portions, a lower portion 33A and an upper portion 33B, the lower portion 33A rotating the upper portion 33B, but the upper portion being axially slidable relative to the lower portion 33A.
- the upper part of the lower portion 33A consists of a tube, in which the lower part of the upper portion 33B is slidably engaged, a key ensuring the transmission of the rotational movement between the two axis portions. without preventing the axial relative sliding of the two axis portions.
- the lower portion of the lower portion 33A of the shaft 33 is held by a first bearing 34 whose outer cage is held rigidly by a support fixed to the frame 30.
- the upper portion of the upper portion 33B of the shaft 33 projects out of frame 30 by an opening of its upper face and is held in a second bearing 35, the outer cage is maintained on a swash plate 36.
- the swash plate 36 is fixed to the frame 30 by means of spring means, for example a plurality of relatively rigid coil springs 37, arranged on the periphery of the swash plate 36, so as to keep it in a substantially horizontal plane.
- spring means for example a plurality of relatively rigid coil springs 37, arranged on the periphery of the swash plate 36, so as to keep it in a substantially horizontal plane.
- An unbalance flyweight 38 is attached to the upper portion of axis 33B.
- the tank 1 is fixed to the upper face of the swash plate 36 by detachable fixing means 11.
- the axis of rotation 33 pivots between the two bearings 34 and 35. Since only one of these bearings, and precisely that of the bottom referenced 34 is fixed to the frame and that the other, that referenced 35 is fixed to the swash plate 36, in turn connected only by the springs 37 to the frame 30, the axis 33 will tend to take a rotational movement oscillating around the vertical direction, the oscillation component being transmitted said swash plate 36. The presence of the weight 38 near the upper end of the axis 33 tends to increase this oscillation movement.
- the period of rotation of the translation movement in rotation corresponds to the speed of rotation of the axis 33 while its amplitude depends on the moving masses and in particular the unbalance they represent with respect to the vertical axis.
- the springs 37 are chosen with sufficient rigidity to limit the range of motion. The rotation of the device as described above, thus imposing the translation movement in rotation along a substantially horizontal plane described above, imposes constraints on the springs 37 which then impose, in addition to the first oscillatory movement A in a substantially horizontal plane. , a second oscillatory movement D in a substantially vertical direction such as a slight oscillation movement as indicated in D.
- the frequency and amplitude of this second oscillatory movement D depend essentially on the moving masses, the characteristics of the springs, as well as the amplitude and frequency of the first oscillatory movement A of the tank.
- the relative sliding of the two axis portions 33A and 33B is intended to absorb the second movement oscillatory D as well as to compensate for the bending of the springs 37 when the swash plate 36 is loaded with the vessel 1 containing the parts to be polished as well as the polishing product 10.
- the device 3 is completed with an electronic part 39A, possibly programmable, controlling the motor 32, as well as a control panel 39B schematically with a keyboard and two push buttons.
- the tank 1 can be closed by a cover (not shown in the figure).
- the second functional means 60 for imposing at least the first oscillating movement on the arm 100 is advantageously of the same nature as the first functional means 50.
- the polishing device comprises two independent motors 32.
- the polishing device 3 comprises a means 101 controlled for multi-directional movement of at least the part of the arm 100 which supports at least one piece 2, so as to constitute a means of handling at least one such room 2.
- This technical feature allows the mechanical manipulation of at least one part 2 for its loading and unloading in the tank 1, namely, at the beginning and end of the cycle.
- This mechanization of loading and unloading can advantageously be automated.
- a complete polishing cycle which does not form part of the invention, comprising a step of preparation of the tank 1.
- one or more pieces to be polished 2 are placed so that they are not directly in contact with each other or with the walls of the tank.
- the parts are fixed inside the tank, by any suitable means 12, so that they are fixed rigidly and that their attachment is not destroyed under the effect of vibration.
- the fasteners will support the parts to be polished by surfaces of said parts that do not require polishing; if this would not be possible, it will be appropriate later, after having polished a first part of the part, to disassemble the assembly, to modify the fixation of this part so that it presses on a portion already polished and to take again the polishing to polish the surface portions previously masked by the fastener.
- one or more portions of surfaces should not be polished, it is possible to protect them by covering them with a protective wax or even more simply an adhesive tape.
- the tank is filled with the polishing product 10 so as to cover the parts to be polished.
- the tank 1 is then disposed on the swash plate 36, which is fixed thereto by the fastening means 11, and then the polishing cycle is controlled via the control panel 39B.
- This control panel 39B can be very simple, controlling only the start or stop of the motor and its speed and direction of rotation. Other parameters can also be introduced by this control panel or by other means, for example taking into account the mass of the parts to be polished and the initial surface state, it is possible to determine the duration of the cycle of polishing and control one or more changes of direction of rotation and speed of the motor during the cycle.
- the tank 1 is removed from the plate 36, the polishing product is removed from the tank, the polished pieces are also removed from the tank and are then thoroughly washed.
- the liquid components of the polishing product are removed from the mixture and are then regenerated or destroyed if they can not be recovered.
- the particles are also washed and recovered for future use.
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Abstract
Description
La présente invention concerne un procédé de polissage de pièces plus particulièrement mais non exclusivement métalliques, ainsi qu'un dispositif de polissage apte à mettre en oeuvre ce procédé, selon le préambule des revendications 1 et 5 respectivement. Document WO 0029171 décrit un procédé de polissage, ainsi qu'un dispositif de polissage selon le préambule des revendications 1 et 5 respectivement.The present invention relates to a method of polishing parts more particularly but not exclusively metal, and a polishing device adapted to implement this method, according to the preamble of
Les normes concernant la construction mécanique, en particulier les normes VSM (Vereins Schweizerischer Maschinen-Industieller) décrivent différents degrés d'état de surface ou de rugosité, respectivement de polissage, d'une pièce métallique. Les normes VSM 10230 et 10231 définissent douze degrés de rugosité allant de N1 à N12, le degré N1 correspondant au polissage le plus fin alors que N12 correspond à un état de surface grossier. Les machines de polissage actuelles permettent d'atteindre le degré N4 ou N3, les degrés N2 ou N1 ne pouvant être obtenus actuellement que par recouvrement de la surface à polir avec une couche métallique, par exemple par chromage. Un tel procédé de polissage par recouvrement présente plusieurs inconvénients. Notamment après un polissage mécanique de la pièce, il est nécessaire de reprendre cette pièce en effectuant une opération ultérieure de trempage dans un bain de chromage. Cette manière de procéder augmente les coûts de production et, de plus, l'épaisseur de chrome aussi faible soit-elle, modifie les dimensions mécaniques de la pièce qu'il est virtuellement impossible de retoucher par usinage.The standards concerning mechanical engineering, in particular the VSM standards (Vereins Schweizerischer Maschinen-Industieller), describe different degrees of surface state or roughness or polishing of a metal part. The VSM standards 10230 and 10231 define twelve degrees of roughness ranging from N1 to N12, the degree N1 corresponding to the finest polishing while N12 corresponds to a coarse surface state. Current polishing machines make it possible to reach the degree N4 or N3, the degrees N2 or N1 being currently obtainable only by covering the surface to be polished with a metal layer, for example by chromium plating. Such a method of lap polishing has several disadvantages. In particular after a mechanical polishing of the part, it is necessary to take this piece back by performing a subsequent soaking operation in a chromium plating bath. This way of proceeding increases the production costs and, moreover, the thickness of chromium as small as it is, modifies the mechanical dimensions of the part that is virtually impossible to retouch by machining.
On sait que les surfaces utiles de moules destinés à l'injection de pièces en matériau synthétique, doivent avoir un état de surface aussi parfait que possible, la durée de vie du moule, et corrélativement le coût des pièces moulées, étant directement fonction de cet état de polissage.It is known that the useful surfaces of molds intended for the injection of parts made of synthetic material must have a surface state that is as perfect as possible, the service life of the mold, and correspondingly the cost of the molded parts, being directly a function of this polishing state.
On peut aussi noter que pour certaines pièces moulées de forme complexe il est très difficile d'obtenir un état de surface uniformément satisfaisant, par exemple au niveau des portions en creux ou des faces intérieures, sur lesquelles il est par ailleurs difficile d'effectuer un chromage.It may also be noted that for some molded parts of complex shape it is very difficult to obtain a uniformly satisfactory surface state, for example at the level of the recessed portions or the internal faces, on which it is moreover difficult to carry out a chroming.
Un premier but de l'invention est donc de proposer un procédé de polissage permettant d'obtenir, par des moyens mécaniques pouvant être automatisés, un haut degré de polissage, par exemple au moins le degré N1, ceci pour une pièce métallique de forme quelconque, toutes les surfaces à polir pouvant être terminées selon le même degré de polissage et sans qu'il soit nécessaire de reprendre la pièce pour une opération ultérieure de recouvrement telle une opération de recouvrement par chromage.A first object of the invention is therefore to propose a polishing process making it possible to obtain, by mechanical means, which can be automated, a high degree of polishing, for example at least the degree N1, this for a metal part of any shape, all polishing surfaces can be completed in the same degree of polishing and without the need to take the piece for a subsequent recovery operation such as a chromium recovery operation.
Un autre but de l'invention est de proposer un dispositif de polissage qui permet de réaliser le procédé précédent, ledit dispositif pouvant comprendre des moyens permettant une conduite entièrement automatisée d'un cycle de polissage.Another object of the invention is to propose a polishing device which makes it possible to carry out the preceding method, said device possibly comprising means allowing a fully automated operation of a polishing cycle.
A cet effet, l'invention a pour objet un procédé de polissage selon les revendications 1.For this purpose, the subject of the invention is a polishing method according to
L'invention a également pour objet un dispositif pour la mise en oeuvre du procédé selon la revendication 5.The invention also relates to a device for implementing the method according to claim 5.
L'invention sera mieux comprise à la lecture de la description ci-après faite à titre d'exemple non limitatif en regard du dessin ci-annexé qui représente schématiquement :
- Figure 1 : vue de dessus, cuve de polissage d'un dispositif mettant en oeuvre le procédé de polissage de l'invention,
- Figure 2 : dispositif de polissage selon l'état de la technique.
- Figure 3 : une forme de réalisation préférentielle d'un dispositif de polissage selon l'invention
- FIG. 1: top view, polishing tank of a device implementing the polishing method of the invention,
- Figure 2: polishing device according to the state of the art.
- Figure 3: a preferred embodiment of a polishing device according to the invention
Tel que cela été annoncé, l'invention est relative à un procédé de polissage d'au moins une pièce 2 avec un produit de polissage 10 contenu dans une cuve 1, au moins une surface de la pièce 2 étant exposée au contact dudit produit de polissage 10.As has been announced, the invention relates to a method of polishing at least one
Bien que cela n'apparaisse pas sur les dessins, le produit de polissage 10 comprend des particules à action polissante et un liquide dans lequel ces particules baignent.Although it does not appear in the drawings, the
Le produit de polissage n'étant pas l'objet de l'invention, la composition de ce produit ne sera pas détaillée.As the polishing product is not the subject of the invention, the composition of this product will not be detailed.
D'une manière notable :
- on fixe chaque
pièce 2 destinée à être polie à un support de 1, 100 qui maintient cettepièce pièce 2 au contact du produit depolissage 10, et - on impose à au moins l'un des deux éléments que sont ledit support de
1, 100 et ledit produit depièce polissage 10, au moins un premier mouvement oscillatoire A dont on choisit préalablement l'orientation, l'amplitude et la fréquence de manière à provoquer dans ledit produit depolissage 10 au moins un mouvement induit B, C qui engendre son déplacement au contact de lapièce 2.
- each
piece 2 intended to be polished is fixed to a 1, 100 which holds thisworkpiece support workpiece 2 in contact with thepolishing product 10, and - at least one of the two elements such as said
1, 100 and saidworkpiece support polishing product 10 is subjected to at least a first oscillatory movement A, the orientation, amplitude and frequency of which are previously chosen. in causing saidpolishing product 10 to induce at least one induced movement B, C which causes it to move in contact with theworkpiece 2.
Le respect de ces particularités techniques permet d'accentuer notablement l'action de polissage du produit de polissage 10, par rapport à une technique de polissage qui autorise un déplacement libre de la pièce 2 pendant la réalisation d'un mouvement induit de polissage quelconque qui est imposé au produit de polissage 10.The respect of these technical particularities makes it possible to significantly accentuate the polishing action of the
On provoque au moins un mouvement induit B, C, de nature sensiblement circulaire.At least one induced movement B, C, of a substantially circular nature is caused.
Lors de la fixation de la pièce 2 sur le support de pièce 1, 100, on supprime tous les degrés de liberté de la pièce 2 par rapport audit support 1, 100.When fixing the
Selon une variante, lors de la fixation de la pièce 2 sur le support de pièce 1, 100, on supprime tous les degrés de liberté de la pièce 2 par rapport audit support 1, 100, à l'exception d'un degré de liberté en rotation autour d'un axe d'orientation prédéterminée.According to a variant, during the attachment of the
On met en oeuvre un produit de polissage qui génère une action mécanique et une action chimique.A polishing product is used which generates a mechanical action and a chemical action.
On impose à au moins l'un des deux éléments que sont ledit support 1, 100 et ledit produit de polissage 10, deux mouvements oscillatoires dont :
- un premier mouvement oscillatoire A réalisé dans un premier plan d'orientation déterminée par rapport à un plan horizontal et
- un deuxième mouvement oscillatoire D réalisé au moins dans une direction d'orientation déterminée par rapport audit premier plan.
- a first oscillatory movement A made in a first plane of orientation determined with respect to a horizontal plane and
- a second oscillatory movement D made at least in a direction of orientation determined relative to said first plane.
Ces particularités techniques accroissent l'effet de polissage par rapport à un procédé selon lequel seul un mouvement dans un plan est mis en oeuvre.
- D'une part, on choisit une
cuve 1 de forme telle que, lorsqu'elle est en situation d'être utilisée pour le polissage, elle présente dans différents plans horizontaux, une section transversale de forme polygonale ou sensiblement circulaire et, - d'autre part, on impose à au moins l'un des deux éléments que sont ledit
1, 100 et ledit produit desupport polissage 10, au moins ledit premier mouvement oscillatoire A desdits premier et deuxième mouvements oscillatoires.
- On the one hand, a
tank 1 of a shape such that, when it is in a position to be used for polishing, it has, in different horizontal planes, a transverse section of polygonal or substantially circular shape and, - on the other hand, at least one of the two elements, namely said
1, 100 and said polishingsupport product 10, is imposed on at least said first oscillatory movement A of said first and second oscillatory movements.
On choisit une cuve 1 présentant une paroi latérale sensiblement verticale et un fond sensiblement plan et horizontal.A
On constitue le support de pièce en utilisant la paroi de la cuve 1 dans une zone qui est exposée au contact du produit de polissage 10 et on impose à la dite cuve 1 au moins un premier mouvement oscillatoire A de manière telle que la pièce 2 soit déplacée dans le produit de polissage 10.The part support is constituted by using the wall of the
On constitue le support de pièce en utilisant un organe 100 distinct de la cuve 1 et, c'est à cet organe 100 qu'on impose au moins ledit premier mouvement oscillatoire A, cependant que cet organe 100 maintient la pièce 2 au contact dudit produit de polissage 10.The part support is constituted by using a
Suivant l'invention, on constitue le support de pièce en utilisant un organe 100 distinct de la paroi de la cuve 1 et,
- d'une part, on impose à la
cuve 1 au moins un premier mouvement oscillatoire A et, - d'autre part, on impose également à l'organe 100 qui constitue le support de pièce au moins un autre premier mouvement oscillatoire A choisi de manière telle que ce mouvement de l'organe 100 se combine au mouvement de la
cuve 1, en vue de renforcer l'action de polissage.
- on the one hand, at least one first oscillatory movement A is imposed on the
vessel 1 and, - on the other hand, it also imposes on the
member 100 which constitutes the workpiece support at least one other first oscillatory movement A chosen from such that this movement of themember 100 is combined with the movement of thevessel 1, to enhance the polishing action.
Ci-après ce trouve décrit un mode de construction d'un dispositif de polissage 3 dont les caractéristiques techniques essentielles viennent d'être définies.Hereinafter, it describes a method of construction of a polishing device 3 whose essential technical characteristics have just been defined.
En se reportant aux figures on voit, une cuve de polissage 1 d'au moins une pièce 2 au moyen d'un produit de polissage 10 fluide. La cuve de polissage 1 est soumise à l'action d'un dispositif de déplacement 3 dit dispositif de polissage 3. Lorsque le dispositif de polissage 3 fonctionne, la cuve est animée de mouvements destinés à induire des mouvements du produit de polissage 10. En figure 1, afin de mieux illustrer les mouvements du produit de polissage 10 à l'intérieur de la cuve 1, aucune pièce mécanique à polir n'a été représentée. La cuve 1 est animée d'un premier mouvement oscillatoire A réalisé selon un plan sensiblement horizontal. Ce premier mouvement peut être illustré par le parcours de chacun des points constitutifs de la cuve 1, par exemple les quatre coins, sur un cercle, selon une direction représentée par les flèches A, dans un plan parallèle au plan du dessin, une face donnée de la cuve restant toujours parallèle à elle-même au cours de ce mouvement. Une autre position de la cuve 1 au cours de ce premier mouvement a été représentée en 1A. Ce premier mouvement oscillatoire A est complété par un second mouvement réalisé selon une direction perpendiculaire à l'horizontale, c'est-à-dire selon une direction sensiblement verticale. La manière dont sont produits ces mouvements sera décrite plus après.Referring to the figures we see, a
Pour une amplitude donnée et pour une vitesse déterminée du premier mouvement de la cuve 1, le mélange 10 qu'elle contient est animé de mouvements induits de nature sensiblement circulaire comme cela est représenté en figure 1. On distingue un déplacement principal B, sensiblement central, et des déplacements C secondaires, sensiblement périphériques.For a given amplitude and for a determined speed of the first movement of the
Le principe du procédé consiste donc à imposer un mouvement oscillatoire composé à la cuve 1 tel que des déplacements soient créés dans le produit de polissage 10. On comprend que si on fixe une pièce métallique 2 dans la cuve 1, - voir figure 2 -, qu'on la recouvre du produit de polissage 10 et qu'on imprime le mouvement décrit plus avant à la cuve, il se créera une pluralité de déplacements autour de la pièce 2, ces déplacements provenant du mouvement imposé à la cuve 1 en coopération avec les irrégularités de forme de la pièce en regard des irrégularités de forme de la cuve. De préférence la pièce 2 ne sera pas disposée au centre de la cuve, tout d'abord pour créer un balourd, augmentant de ce fait l'amplitude du mouvement de translation en rotation, puis pour augmenter l'effet sensiblement circulaire. Les déplacements B et C représentés sur la figure 1 correspondent à des déplacements produits lorsque la cuve ne contient pas la pièce 2 à polir ; on peut constater que lorsqu'une ou plusieurs pièces sont disposées dans la cuve, il se produit encore d'autres déplacements de même que des déplacements selon des axes différents de ceux représentés, provenant des irrégularités de forme des pièces ainsi que du mouvement d'oscillation perpendiculaire au plan de la figure mentionnée précédemment.The principle of the method therefore consists in imposing a compound oscillatory movement on the
Le produit de polissage 10 effectuant le polissage sous l'action des déplacements décrits peut être n'importe quel produit de polissage connu, se présentant sous forme liquide ou pâteuse.The polishing
Un dispositif permettant la mise en mouvement de la cuve de polissage selon les mouvements induits sensiblement circulaires qui ont été mentionnés est décrit plus après et se trouve représenté à la figure 2. Le dispositif de polissage 3 est constitué d'un bâti 30 reposant par des amortisseurs 31 connus de la technique sur le sol, ceci afin de limiter la transmission des vibrations à l'environnement. Un moteur 32, de préférence un moteur électrique, entraîne en rotation un axe vertical 33, par l'intermédiaire de deux poulies et d'une courroie selon la forme d'exécution représentée. L'axe vertical 33 est composé de deux portions, une portion inférieure 33A et une portion supérieure 33B, la portion inférieure 33A entraînant en rotation la portion supérieure 33B, mais cette portion supérieure pouvant coulisser axialement par rapport à la portion inférieure 33A. Par exemple, la partie supérieure de la portion inférieure 33A est constituée d'un tube, dans lequel la partie inférieure de la portion supérieure 33B est engagée de manière coulissante, une clavette assurant la transmission du mouvement de rotation entre les deux portions d'axe sans empêcher le coulissement relatif axial des deux portions d'axes. La partie inférieure de la portion inférieure 33A de l'axe 33 est maintenue par un premier roulement 34 dont la cage extérieure est maintenue rigidement par un support fixé au bâti 30. La partie supérieure de la portion supérieure 33B de l'axe 33 fait saillie hors de bâti 30 par une ouverture de sa face supérieure et est maintenue dans un deuxième roulement 35 dont la cage extérieure est maintenue sur un plateau oscillant 36. Le plateau oscillant 36 est fixé au bâti 30 par l'intermédiaire de moyens à ressort, par exemple une pluralité de ressorts à boudin relativement rigides 37, disposés sur la périphérie du plateau oscillant 36, de manière à le conserver dans un plan sensiblement horizontal. Une masselotte de déséquilibrage 38 est fixée à la portion supérieure d'axe 33B. La cuve 1 est fixée à la face supérieure du plateau oscillant 36 par des moyens de fixation démontables 11.A device enabling the polishing tank to be set in motion according to the substantially circular induced movements that have been mentioned is described below and is shown in FIG. 2. The polishing device 3 consists of a
L'axe de rotation 33, mis en rotation comme indiqué par le moteur 32, pivote entre les deux roulements 34 et 35. Etant donné qu'un seul de ces roulements, et précisément celui du bas référencé 34 est fixé au bâti et que l'autre, celui référencé 35 est fixé au plateau oscillant 36, quant à lui relié uniquement par les ressorts 37 au bâti 30, l'axe 33 aura tendance à prendre un mouvement de rotation oscillant autour de la direction verticale, la composante oscillation étant transmise au dit plateau oscillant 36. La présence de la masselotte 38 à proximité de l'extrémité supérieure de l'axe 33 a tendance à augmenter ce mouvement d'oscillation. La période de rotation du mouvement de translation en rotation correspond à la vitesse de rotation de l'axe 33 alors que son amplitude dépend des masses en mouvement et en particulier du balourd qu'elles représentent par rapport à l'axe vertical. Les ressorts 37 sont choisis avec une rigidité suffisante pour limiter l'amplitude du mouvement. La mise en rotation du dispositif comme décrite ci-dessus, imposant ainsi le mouvement de translation en rotation selon un plan sensiblement horizontal décrit précédemment, impose des contraintes aux ressorts 37 lesquels imposent alors, en plus du premier mouvement oscillatoire A dans un plan sensiblement horizontal, un deuxième mouvement oscillatoire D dans une direction sensiblement verticale tel un léger mouvement d'oscillation comme repéré en D. La fréquence et l'amplitude de ce deuxième mouvement oscillatoire D dépendent essentiellement des masses en mouvement, des caractéristiques des ressorts, ainsi que de l'amplitude et de la fréquence du premier mouvement oscillatoire A de la cuve. Le coulissement relatif des deux portions d'axe 33A et 33B est destiné à absorber le deuxième mouvement oscillatoire D ainsi qu'à compenser le fléchissement des ressorts 37 lorsque le plateau oscillant 36 est chargé de la cuve 1 contenant les pièces à polir ainsi que le produit de polissage 10.The axis of
Le dispositif 3 est complété d'une partie électronique 39A, éventuellement programmable, commandant le moteur 32, ainsi que d'un tableau de commande 39B schématisé avec un clavier et deux boutons poussoirs.The device 3 is completed with an
La cuve 1 peut être fermée par un couvercle (non représenté sur la figure).The
Suivant l'invention, le dispositif de polissage comprend :
un organe 100 qui, distinct de la cuve 1, constitue le support de pièce, et,- un premier moyen
fonctionnel 50 pour imposer à la cuve 1 au moins le premier mouvement oscillatoire A et, - un deuxième moyen fonctionnel 60 pour imposer à l'organe 100 qui constitue le support de pièce au moins un autre premier mouvement oscillatoire A choisi de manière telle que ce mouvement de l'organe 100 se combine au mouvement de la cuve 1, en vue de renforcer l'action de polissage.
- an
element 100 which, distinct from thetank 1, constitutes the part support, and, - first functional means 50 for imposing on the
vessel 1 at least the first oscillatory movement A and, - a second functional means 60 for imposing on the
member 100 which constitutes the workpiece support at least one other oscillatory first movement A chosen in such a way that this movement of themember 100 is combined with the movement of thevessel 1, in order to strengthen the polishing action.
Le deuxième moyen fonctionnel 60 pour imposer au moins le premier mouvement oscillant au bras 100 est avantageusement de même nature que le premier moyen fonctionnel 50.The second functional means 60 for imposing at least the first oscillating movement on the
Avantageusement, mais de manière non limitative, le dispositif de polissage comprend deux moteurs 32 indépendants.Advantageously, but without limitation, the polishing device comprises two
De manière remarquable, le dispositif de polissage 3 comprend un moyen 101 commandé de déplacement multi-directionnel d'au moins la partie du bras 100 qui supporte au moins une pièce 2, de manière à constituer un moyen de manipulation d'au moins une telle pièce 2.Remarkably, the polishing device 3 comprises a
Cette particularité technique permet la manipulation mécanique d'au moins une pièce 2 en vue de son chargement et déchargement dans la cuve 1, à savoir, en début et en fin de cycle.This technical feature allows the mechanical manipulation of at least one
Egalement, l'existence d'un tel moyen 101 de manipulation permet de faciliter la réalisation d'un contrôle en cours de cycle de polissage.Also, the existence of such a
Cette mécanisation du chargement et du déchargement peut avantageusement être automatisée.This mechanization of loading and unloading can advantageously be automated.
Ci-après se trouve décrit un cycle complet de polissage qui ne fait pas partie de l'invention, comportant une étape de préparation de la cuve 1. Dans une cuve 1 vide, on place une ou plusieurs pièces à polir 2 de manière à ce qu'elles ne soient pas directement en contact entre elles ni avec les parois de la cuve. Les pièces sont fixées à l'intérieur de la cuve, par tout moyen convenable 12, de telle manière à ce qu'elles soient fixées rigidement et que leur fixation ne soit pas détruite sous l'effet des vibrations. De préférence les pièces de fixation appuieront sur les pièces à polir par des surfaces desdites pièces ne nécessitant pas de polissage ; si cela ne s'avérerait pas possible, il conviendra ultérieurement, après avoir poli une première partie de la pièce, de démonter l'assemblage, de modifier la fixation de cette pièce afin qu'elle appuie sur une portion déjà polie et de reprendre le polissage afin de polir les portions de surface auparavant masquées par la fixation. Lorsqu'une ou des portions de surfaces ne doivent pas être polies, il est possible de les protéger en les recouvrant d'une cire de protection ou plus simplement encore d'un ruban adhésif. Lorsque les pièces 2 sont bien fixées dans la cuve 1, on remplit la cuve avec le produit de polissage 10, de manière à recouvrir les pièces à polir. La cuve 1 est ensuite disposée sur le plateau oscillant 36, qui y est fixée par les moyens de fixation 11, et ensuite le cycle de polissage est commandé via le tableau de commande 39B. Ce tableau de commande 39B peut être très simple, ne commandant que la mise en route ou l'arrêt du moteur ainsi que sa vitesse et son sens de rotation. D'autres paramètres peuvent aussi être introduits par ce tableau de commande ou par d'autres moyens par exemple tenant compte de la masse des pièces à polir et de l'état de surface de départ, on peut déterminer la durée du cycle de polissage et commander un ou plusieurs changements de sens de rotation et de vitesse du moteur durant le cycle.Hereinafter is described a complete polishing cycle which does not form part of the invention, comprising a step of preparation of the
En fin de cycle de polissage, la cuve 1 est retirée du plateau 36, le produit de polissage est retiré de la cuve, les pièces polies sont aussi retirées de la cuve et sont ensuite soigneusement lavées. Les composants liquides du produit de polissage sont retirés du mélange et sont ensuite régénérés ou détruits s'ils ne peuvent pas être récupérés. Les particules sont aussi lavées et récupérées pour un prochain usage.At the end of the polishing cycle, the
Avec un procédé de polissage, et un dispositif de polissage tels que décrits ci-dessus, il est possible d'obtenir un polissage correspondant à un degré de rugosité au moins égal à N1 de pièces métalliques de toutes formes, ceci par des moyens mécaniques relativement simples pouvant être automatisés.With a polishing method, and a polishing device as described above, it is possible to obtain a polishing corresponding to a degree of roughness at least equal to N1 of metal parts of all shapes, this by relatively mechanical means. simple that can be automated.
Claims (12)
- Method of polishing at least one piece (2) with a polishing product (10) contained in a tank (1), at least one surface of the piece (2) being exposed to the contact of said polishing product (10), according to which- each piece (2) intended to be polished is fixed to a piece support (1, 100) which holds this piece (2) in contact with the polishing product (10);- imparted to at least one of the two elements, which are said piece support (1, 100) and said polishing product (10), is at least a first oscillatory movement (A) of which the orientation, the amplitude and the frequency is selected beforehand in such a way as to bring about in said polishing product (10) at least one induced movement (B, C) which engenders its displacement in contact with the piece (2);- the piece support is formed by using an element (100) separate from the wall of the tank (1);- on the one hand, at least a first oscillatory movement (A) is imparted to the tank (1);this method being characterised in that- on the other hand, likewise imparted to the element (100) which constitutes the piece support is at least one other first oscillatory movement (A) selected such that this movement of the element (100) combines with the movement of the tank (1), with a view to reinforcing the action of polishing.
- Polishing method according to claim 1, characterised in that imparted to at least one of the two elements, which are said support (1, 100) and said polishing product (10), are two oscillatory movements, being:- a first oscillatory movement (A) achieved in a first plane of predetermined orientation with respect to a horizontal plane, and- a second oscillatory movement (D) achieved at least in a predetermined direction of orientation with respect to said first plane.
- Polishing method according to one of the claims 1 or 2, characterised in that:- a tank (1) is selected of shape such that when it is in position to be used for the polishing, it has in different horizontal planes a cross section of polygonal or substantially circular shape.
- Polishing method according to claim 3, characterised in that a tank (1) is selected having a substantially vertical lateral wall and a substantially flat and horizontal bottom.
- Device for implementing the method according to any one of the claims 1 to 4, comprising a tank (1) containing a polishing product (10) and a first functional means (50) for imparting to the tank (1) at least a first oscillatory movement (A), and- an element (100) which, separate from the tank (1), constitutes the piece support; and characterised in that it comprises- a second functional means (60) for imparting to the element (100) which constitutes the piece support at least one other first oscillatory movement (A) selected such that this movement of the element (100) combines itself with the movement of the tank (1), with a view to reinforcing the action of polishing.
- Polishing device according to claim 5 characterised in that it comprises a first functional means (50) for imparting to at least one of two elements which are said support and the polishing product, two oscillatory movements, being:- a first oscillatory movement (A) achieved in a first plane of predetermined orientation with respect to a horizontal plane,- a second oscillatory movement (D) achieved at least in a direction of predetermined orientation with respect to said first plane, andthe amplitudes and frequencies of these first and second movements being predetermined in such a way as to bring about in said polishing product (10) at least one induced movement (B, C) which engenders its displacement in contact with the piece (2).
- Polishing device according to claim 5 or 6, characterised in that it comprises a frame (30) and at least one of said first and second functional means (50, 60), at least one of these functional means (50, 60) including means of driving in rotation (32) a substantially vertical shaft (33), an end portion (33A) of said shaft being held by a first rolling device (34) whose outer cage is fixed to the frame (30), the other end (33B) of said shaft protruding through an opening in the upper face of the frame and supporting an oscillating plate (36), disposed horizontally, through the agency of a second rolling device (35) whose outer cage is fixed to said plate, said plate being, on the other hand, connected to the frame by spring means (37) and being provided with a means of fixing a piece support (2) such as the tank (1) or the support element (100).
- Polishing device according to claim 7, characterised in that the substantially vertical shaft (33) comprises an imbalance weight (38) disposed in proximity to its upper end (33B).
- Polishing device according to one of the claims 7 or 8, characterised in that the substantially vertical shaft (33) is made up of two shaft portions (33A, 33B), in prolongation one of the other, and being able to slide, one with respect to the other, in the axial direction.
- Polishing device according to one of the claims 7 to 9 characterised in that the motorised means (32) are able to drive the shaft (33), or respectively the oscillating plate (36) and the polishing tank (1) in two directions of rotation.
- Polishing device according to one of the claims 6 to 10, characterised in that it further comprises means of automatic control (39A, 39B) of polishing cycles.
- Polishing device according to one of the claims 6 to 11, characterised in that it comprises a controlled means (101) of multi-directional displacement of at least the part of the arm (100) which supports at least one piece (2), so as to constitute a means of manipulation of at least one such piece (2) and to permit the mechanical manipulation of at least one piece (2) with a view to its loading and unloading in the tank (1), i.e. in particular at the beginning and at the end of the polishing cycle, as well as during the cycle with a view to achieving a control in the course of said cycle.
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PT02405561T PT1378322E (en) | 2002-07-04 | 2002-07-04 | Method and tumbling apparatus with two oscillating movements |
EP02405561A EP1378322B1 (en) | 2002-07-04 | 2002-07-04 | Method and tumbling apparatus with two oscillating movements |
AT02405561T ATE338611T1 (en) | 2002-07-04 | 2002-07-04 | METHOD AND MOVING DEVICE WITH TWO VIBRATIONAL MOVEMENTS |
DE60214528T DE60214528T2 (en) | 2002-07-04 | 2002-07-04 | Method and moving device with two oscillatory movements |
ES02405561T ES2272657T3 (en) | 2002-07-04 | 2002-07-04 | PROCEDURE AND POLISHING DEVICE FOR ABRASION OF SURFACES "IN DRUM" WITH TWO OSCILLATORY MOVEMENTS. |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP02405561A EP1378322B1 (en) | 2002-07-04 | 2002-07-04 | Method and tumbling apparatus with two oscillating movements |
Publications (2)
Publication Number | Publication Date |
---|---|
EP1378322A1 EP1378322A1 (en) | 2004-01-07 |
EP1378322B1 true EP1378322B1 (en) | 2006-09-06 |
Family
ID=29719809
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP02405561A Expired - Lifetime EP1378322B1 (en) | 2002-07-04 | 2002-07-04 | Method and tumbling apparatus with two oscillating movements |
Country Status (5)
Country | Link |
---|---|
EP (1) | EP1378322B1 (en) |
AT (1) | ATE338611T1 (en) |
DE (1) | DE60214528T2 (en) |
ES (1) | ES2272657T3 (en) |
PT (1) | PT1378322E (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102011116562A1 (en) | 2011-10-21 | 2013-04-25 | Otec Präzisionsfinish GmbH | Method for surface processing of work pieces, involves immersing work piece in packed bed of grinding- or polishing granules, where packed bed is present in container |
EP4372484A1 (en) | 2022-11-16 | 2024-05-22 | Richemont International S.A. | Hollow middle for a timepiece case and corresponding manufacturing method |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100991059B1 (en) * | 2008-06-05 | 2010-10-29 | 김정수 | Apparatus and Method for Polishing Surface of Die-Casting Product |
DE102009044234A1 (en) * | 2009-10-12 | 2011-05-12 | Walther Trowal Gmbh & Co. Kg | Device and method for the surface treatment of workpieces |
IT1401855B1 (en) | 2010-10-19 | 2013-08-28 | Mingot | EQUIPMENT FOR THE TREATMENT OF A PRODUCT. |
US20140220869A1 (en) * | 2013-02-01 | 2014-08-07 | Southern Taiwan University Of Science And Technology | Subtle vortex polishing apparatus |
CN103612192A (en) * | 2013-11-06 | 2014-03-05 | 梧州学院 | Surface grinding and polishing method for superhard material |
CN108044490A (en) * | 2018-01-09 | 2018-05-18 | 河南共达机械有限公司 | A kind of automotive hub burnishing device |
DE102019112665A1 (en) * | 2019-05-15 | 2020-11-19 | Bayerische Motoren Werke Aktiengesellschaft | Method for grinding and / or polishing a component |
CN112677029B (en) * | 2019-11-17 | 2022-03-18 | 东莞市卓宇五金科技有限公司 | Drum-type polishing machine |
CN115213805B (en) * | 2022-07-20 | 2023-12-15 | 邵东市鸿伟工具有限公司 | Automatic processing equipment for adjustable wrench and use method thereof |
CN115870872B (en) * | 2023-01-05 | 2023-05-12 | 苏州思科赛德电子科技有限公司 | Vibrating binding post burnishing machine |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
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US4012869A (en) * | 1975-05-02 | 1977-03-22 | Roto-Finish Company | Reciprocal finishing apparatus |
US4067147A (en) * | 1976-09-03 | 1978-01-10 | Wheelabrator-Frye, Inc. | Method and apparatus for bowl type vibratory finishing |
EP0922530B1 (en) * | 1997-12-10 | 2005-03-23 | Shuji Kawasaki | Barrel-polishing apparatus |
WO2000029171A1 (en) * | 1998-11-14 | 2000-05-25 | MTU MOTOREN- UND TURBINEN-UNION MüNCHEN GMBH | System for the precision machining of rotationally symmetrical components |
-
2002
- 2002-07-04 PT PT02405561T patent/PT1378322E/en unknown
- 2002-07-04 DE DE60214528T patent/DE60214528T2/en not_active Expired - Lifetime
- 2002-07-04 ES ES02405561T patent/ES2272657T3/en not_active Expired - Lifetime
- 2002-07-04 EP EP02405561A patent/EP1378322B1/en not_active Expired - Lifetime
- 2002-07-04 AT AT02405561T patent/ATE338611T1/en active
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102011116562A1 (en) | 2011-10-21 | 2013-04-25 | Otec Präzisionsfinish GmbH | Method for surface processing of work pieces, involves immersing work piece in packed bed of grinding- or polishing granules, where packed bed is present in container |
EP4372484A1 (en) | 2022-11-16 | 2024-05-22 | Richemont International S.A. | Hollow middle for a timepiece case and corresponding manufacturing method |
Also Published As
Publication number | Publication date |
---|---|
ES2272657T3 (en) | 2007-05-01 |
ATE338611T1 (en) | 2006-09-15 |
PT1378322E (en) | 2007-01-31 |
DE60214528T2 (en) | 2007-06-06 |
DE60214528D1 (en) | 2006-10-19 |
EP1378322A1 (en) | 2004-01-07 |
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