EP1369001A1 - Verfahren zum plasmaschweissen - Google Patents

Verfahren zum plasmaschweissen

Info

Publication number
EP1369001A1
EP1369001A1 EP02717991A EP02717991A EP1369001A1 EP 1369001 A1 EP1369001 A1 EP 1369001A1 EP 02717991 A EP02717991 A EP 02717991A EP 02717991 A EP02717991 A EP 02717991A EP 1369001 A1 EP1369001 A1 EP 1369001A1
Authority
EP
European Patent Office
Prior art keywords
plasma
microwave
tube
transparent tube
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP02717991A
Other languages
German (de)
English (en)
French (fr)
Inventor
Erwin Bayer
Philip Betz
Jörg Höschele
Friedrich ÖFFINGER
Jürgen STEINWANDEL
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
MTU Aero Engines AG
Original Assignee
MTU Aero Engines GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by MTU Aero Engines GmbH filed Critical MTU Aero Engines GmbH
Publication of EP1369001A1 publication Critical patent/EP1369001A1/de
Withdrawn legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • H05H1/26Plasma torches
    • H05H1/30Plasma torches using applied electromagnetic fields, e.g. high frequency or microwave energy
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • H05H1/26Plasma torches
    • H05H1/32Plasma torches using an arc
    • H05H1/34Details, e.g. electrodes, nozzles
    • H05H1/3421Transferred arc or pilot arc mode
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • H05H1/26Plasma torches
    • H05H1/32Plasma torches using an arc
    • H05H1/34Details, e.g. electrodes, nozzles
    • H05H1/3484Convergent-divergent nozzles

Definitions

  • the invention relates to a method for plasma welding according to claim 1.
  • Tungsten inert gas welding Tungsten inert gas welding
  • MAG metal active gas welding
  • an arc burns between a non-melting tungsten electrode and the workpiece, whereby the workpiece is melted.
  • the arc has a divergence angle of approximately 45 °. This means that the distance between the TIG torch and the workpiece has a significant influence on the power density and that it is comparatively small overall. Due to the high thermal conductivity of the metals, a significant proportion of the heat flows into the vicinity of the weld. With a current intensity limited by the life of the electrode and thus also limited arc power, this results in relatively low welding speeds.
  • the plasma jet can be constricted in various plasma welding processes, which can reduce the arc divergence to approx. 10 ° (visually). This results in a higher power density at the usual technical distances between the plasma torch and the workpiece and, as a result, a higher welding speed with identical arc power.
  • the more stable and less divergent plasma beam compared to the conventional TIG process also means that the welding parameters have less influence on the arc shape. If the arc is supplied with significantly more energy with a suitable electrode arrangement by increasing the current strength, the so-called taphole effect occurs. If the thickness is appropriate, the workpiece is melted in the shape of an eyelet, and if the plasma torch is fed continuously, the molten metal flows around the plasma jet and back together again behind it.
  • a disadvantage of the described methods is that the possible current intensity is limited by the life of the electrodes and thus the welding speed is limited. This leads to a high thermal load on the component, wide heat-affected zones and, in addition, considerable distortion of the workpiece.
  • Another disadvantage of the conventional plasma welding process is the restricted access and the possibility of observing the welding point due to a relatively large nozzle diameter with a small workpiece distance (approx. 5 mm).
  • the object of the invention is to provide a method for plasma welding in which the disadvantages of the prior art are avoided. This object is achieved by the method of claim 1.
  • Advantageous embodiments of the invention are the subject of dependent claims.
  • a free microwave-induced plasma beam is used for plasma welding, which is generated as follows: in a high-frequency microwave source, microwaves are generated which are guided in a waveguide.
  • the process gas is introduced into a microwave-transparent tube, which comprises a gas inlet opening and a gas outlet opening, at a pressure p> 1 bar through the gas inlet opening of the tube such that it has a tangential flow component.
  • a plasma is generated in the microwave-transparent tube, which is introduced into the working space through a metallic expansion nozzle arranged at the gas outlet opening of the tube, as a result of which the plasma jet is generated.
  • the electrodeless plasma welding method according to the invention results in particularly advantageous plasma properties. This increases the specific enthalpy of the plasma and the associated enthalpy flux density of the plasma. In connection with this, the plasma temperature of the plasma and the plasma jet is increased. This results in advantages over the welding processes of the prior art in terms of an increased welding speed and lower weld seam costs. With the plasma welding process according to the invention, an electrode-less welding process is thus specified which offers considerable economic and application-related advantages with a wide range of uses for the welding process.
  • the properties of the plasma jet with respect to a reduced diameter and a reduced beam angle divergence are improved.
  • the cylinder-symmetrical plasma beam spreads parallel in the method according to the invention as a result of which the influence of the change in distance between the torch and the workpiece on the penetration shape of the Plasma jets in the workpiece is reduced.
  • Another advantage is that it improves the accessibility to the plasma jet - caused by a larger possible distance between the torch and the workpiece.
  • distances between the torch and the workpiece are thus possible from 30 mm to 100 mm, with a plasma beam diameter of 1 mm to 3 mm on the workpiece.
  • power densities above 1.5 10 5 W / cm 2 can be generated.
  • the tangential feeding of the process gas into the microwave-transparent tube supports the generation of a plasma jet according to the invention with a low beam angle divergence. Due to the radial acceleration caused by the tangential feed of the process gas, which is further intensified by the cross-sectional narrowing of the expansion nozzle in the direction of the nozzle outlet, the non-uniformly accelerated free charge carriers move in the direction of the expansion nozzle outlet on ever narrower spiral paths, which increases the centripetal acceleration of the charge carriers. This movement is maintained by the load carriers even after they exit the expansion nozzle into the work area.
  • the plasma jet can be generated by means of inexpensive and robust high-frequency systems, for example magnetron or klystron.
  • high-frequency systems microwave sources in the required power range up to 100 kW and frequency range from 0.95 GHz to 35 GHz are advantageously accessible.
  • microwaves with a frequency of 2.46 GHz can be used because they are these are inexpensive microwave sources that are widely used in industry and household applications.
  • the energy efficiency is also increased compared to conventional plasma welding processes. It is thus possible to generate microwave-induced plasmas in which the power coupling from the radiation field of the microwave sources is greater than 90%. This results in a 1.5 times higher energy efficiency compared to welding processes with high-performance diodes and a 20 times higher energy efficiency compared to laser welding processes.
  • the coupling of the high-frequency energy of the microwave source into the relevant process gases required for plasma generation depends on the electromagnetic substance constants of the relevant process gases, in particular on the complex dielectric constant (DK) ⁇ :
  • the complex DK is a non-linear function of temperature and a linear function of frequency.
  • the relationship between the imaginary part and the real part of the complex DC is called the dielectric loss angle ⁇ and defines an absorption probability of the process medium for high-frequency energy:
  • volume-specific absorption of high-frequency energy by a generally high-frequency absorbing medium is given as follows:
  • v is the frequency of the absorbed high-frequency radiation with the electric field strength E in the absorbing volume. If the absorption losses of the high-frequency radiation in the absorbing volume can mainly be defined via the (frequency-dependent) electrical conductivity ⁇ in ( ⁇ m) "1 , whereby magnetic effects are negligible, the following applies:
  • the method according to the invention thus solves the problem of the prior art that in the case of electrode-induced plasmas there are reactions of the process gases used with the electrode materials, for example the formation of tungsten oxide or tungsten nitride in the case of tungsten electrodes or hydrogen embrittlement. It is thus possible to increase the specific enthalpy of the plasma in connection with an improved heat conduction between the plasma and the workpiece by a suitable choice of gases or gas mixtures suitable for the process.
  • the process gas it is possible for the process gas to be supplied with powder before it enters the microwave-transparent tube. This makes it possible, for example, to use the method according to the invention as a powder build-up welding method. It is of course also possible to supply the powder to the plasma jet after it has emerged from the expansion nozzle.
  • Another advantage of the plasma welding method according to the invention is that the heat-affected zone of the plasma jet on the workpiece is significantly reduced, which results in less heat input, less workpiece distortion and a reduction in material damage.
  • the plasma welding method according to the invention enables low-error welding with regard to lower edge notches and low porosity of the weld seam.
  • the process gas is introduced into the microwave-transparent tube through a nozzle such that the process gas flowing into the tube has a tangential and an axial flow component directed in the direction of the gas outlet opening of the tube.
  • the metallic expansion nozzle viewed in the flow direction of the plasma, has a convergent inlet on the plasma side and a free or divergent outlet on the plasma jet side. This makes it possible to improve the properties of the plasma beam in terms of reducing the beam angle divergence.
  • the jet diameter can be limited by means of the opening cross section of the expansion nozzle. Due to the high plasma temperatures the metallic expansion nozzle can be cooled in an advantageous embodiment of the invention.
  • the waveguide available for guiding the microwaves is narrowed in cross section in an advantageous embodiment of the invention.
  • the waveguide is preferably narrowed at the point at which the microwave-transparent tube is guided through the waveguide.
  • the waveguide and the tube are aligned perpendicular to one another.
  • a spark gap it is also possible for a spark gap to be used to ignite the plasma.
  • FIG. 2 shows a device for carrying out the method according to the invention in a sectional view with a waveguide, expansion nozzle, microwave-transparent tube and a feed unit for the process gas
  • Fig. 4 shows a feed unit for the process gas in plan view.
  • microwave-induced thermal plasmas are generated by means of the method according to the invention. These plasmas are characterized by a local thermodynamic equilibrium (LTG) of the different enthalpies contributions from the plasma.
  • LTG local thermodynamic equilibrium
  • the total enthalpy of the plasma is determined depending on the molecular nature of the process gases by the following contributions:
  • thermodynamics can be used to calculate the temperature-dependent total enthalpy H (T) and the temperature-dependent heat capacity C P (T) that can be determined from this in a first derivative based on the temperature.
  • the respective molecular degrees of freedom must be taken into account in the status sums for translation, rotation and vibration.
  • the corresponding state sums can be calculated from the respective equilibrium constants in the presence of dissociation and ionization (not detailed).
  • FIG. 1 shows the calculated temperature-dependent enthalpy of a nitrogen plasma, which was generated by means of the method steps according to the invention.
  • the diagram shows a very steep rise (logarithmic representation of the ordinate) of the enthalpy up to a temperature of 20,000 K.
  • Fig. 2 shows a sectional view of an apparatus for performing the method according to the invention.
  • the illustration shows a microwave-transparent tube 2, which is guided vertically through a waveguide 1, which transports the microwaves generated by a microwave source, not shown.
  • the microwave-transparent tube 2 is guided through an opening 14 located at the top of the waveguide 1 and an opening 15 located at the bottom of the waveguide 1.
  • the microwave-transparent tube 2 has a gas inlet opening 4 for the process gas and a gas outlet opening 3 for the plasma 7. In the area 12, in which the microwave-transparent tube 2 runs through the waveguide 1, the plasma 7 is generated by microwave absorption.
  • a gas supply unit 6 is attached to the gas inlet opening 4 on the microwave transparent tube 2, e.g. by means of a crimp connection to avoid destroying the microwave-transparent tube.
  • this gas supply unit 6 there are nozzles (not shown) through which the process gas is fed into the microwave-transparent tube 2.
  • the nozzles are arranged such that the inflowing process gas has a tangential and an axial flow component directed in the direction of the gas outlet opening 3.
  • the process gas is guided on spiral paths within the microwave-transparent tube. This leads to a strong centripetal acceleration of the gas in the direction of the inner surface of the microwave-transparent tube 2 and to the formation of a negative pressure on the tube axis. This negative pressure also facilitates the ignition of the plasma.
  • the plasma can by means of a spark gap, not shown, e.g. an arc discharge or a spark can be ignited.
  • a spark gap not shown, e.g. an arc discharge or a spark can be ignited.
  • an independent plasma ignition is also possible.
  • a metallic expansion nozzle 5 is attached to the gas outlet opening 3 of the microwave-transparent tube 2.
  • the expansion nozzle 5 is arranged such that the opening 14 of the waveguide 1 is closed.
  • a groove or a web 11 is incorporated into the underside of the expansion nozzle 5.
  • the web 11 protrudes only a few millimeters into the waveguide space, thereby preventing the microwave field from being disturbed within the waveguide 1.
  • the expansion nozzle 5 has a convergent inlet on its underside, ie on the side facing the plasma 7. This constriction further accelerates the charge carriers in the plasma 7 up to the outlet opening 17.
  • the plasma 7 then enters the working space 16 as a plasma jet 8 through the outlet opening 17.
  • the outlet of the expansion nozzle 5 is shown in the present illustration as a free outlet. A divergent outlet is also possible.
  • the centripetal acceleration of the charge carriers in the plasma 7 continues after exiting through the expansion nozzle 5 in the free plasma jet 8. Due to the centripetal acceleration of the charge carriers in the plasma jet 8, as described in the introduction to the description, an axial magnetic field is induced in the plasma jet 8, whereby the constriction of the flow also continues beyond the outlet opening 17 of the expansion nozzle 5. A plasma beam 8 with a low beam angle divergence is thus generated.
  • Fig. 3 shows an exemplary expansion nozzle in a sectional view.
  • a web 11 for fixing the microwave-transparent tube (not shown) is incorporated on the lower surface of the expansion nozzle 5.
  • the web 11 is particularly circular and has an inner radius that corresponds to the outer radius of the microwave-transparent tube.
  • the inlet area 9 of the expansion nozzle 5 is designed to be convergent, which leads to an increase in the flow velocity of the charge carriers of the plasma up to the outlet opening 17.
  • the outlet area 10 of the expansion nozzle 5 is designed to be divergent.
  • FIG. 4 shows a top view of a gas supply unit for supplying the process gas into the microwave-transparent tube 2.
  • the gas supply unit 6 two nozzles 18 are designed which feed the process gas into the microwave-transparent tube 2 in two opposite directions. A tangential feed of the process gas is thereby achieved.

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Electromagnetism (AREA)
  • Plasma Technology (AREA)
EP02717991A 2001-03-15 2002-03-06 Verfahren zum plasmaschweissen Withdrawn EP1369001A1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE10112494 2001-03-15
DE10112494A DE10112494C2 (de) 2001-03-15 2001-03-15 Verfahren zum Plasmaschweißen
PCT/DE2002/000813 WO2002076158A1 (de) 2001-03-15 2002-03-06 Verfahren zum plasmaschweissen

Publications (1)

Publication Number Publication Date
EP1369001A1 true EP1369001A1 (de) 2003-12-10

Family

ID=7677583

Family Applications (1)

Application Number Title Priority Date Filing Date
EP02717991A Withdrawn EP1369001A1 (de) 2001-03-15 2002-03-06 Verfahren zum plasmaschweissen

Country Status (5)

Country Link
US (1) US6982395B2 (ja)
EP (1) EP1369001A1 (ja)
JP (1) JP4250422B2 (ja)
DE (1) DE10112494C2 (ja)
WO (1) WO2002076158A1 (ja)

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DE102004026636B3 (de) * 2004-06-01 2005-07-21 Daimlerchrysler Ag Vorrichtung und Verfahren zum Umschmelzen von metallischen Oberflächen
GB2442990A (en) * 2004-10-04 2008-04-23 C Tech Innovation Ltd Microwave plasma apparatus
DE102004048611B4 (de) * 2004-10-06 2008-04-10 Daimler Ag Verfahren zum Verbinden von Bauteilen
US20080314877A1 (en) * 2004-11-05 2008-12-25 Rolf Cremerius Plasma Keyhole Welding of Hardenable Steel
FR2923466B1 (fr) 2007-11-13 2011-08-26 S2F Flexico Sachet a curseur pourvu d'un element en debord et curseur correspondant.
GB2490355B (en) * 2011-04-28 2015-10-14 Gasplas As Method for processing a gas and a device for performing the method
US10477665B2 (en) * 2012-04-13 2019-11-12 Amastan Technologies Inc. Microwave plasma torch generating laminar flow for materials processing
US9221121B2 (en) * 2013-03-27 2015-12-29 General Electric Company Welding process for welding three elements using two angled energy beams
US10828728B2 (en) * 2013-09-26 2020-11-10 Illinois Tool Works Inc. Hotwire deposition material processing system and method
JP2022508353A (ja) 2018-08-23 2022-01-19 トランスフォーム マテリアルズ エルエルシー 気体を処理するための系および方法
US11633710B2 (en) 2018-08-23 2023-04-25 Transform Materials Llc Systems and methods for processing gases
US20200312629A1 (en) 2019-03-25 2020-10-01 Recarbon, Inc. Controlling exhaust gas pressure of a plasma reactor for plasma stability
US11776804B2 (en) * 2021-04-23 2023-10-03 Kla Corporation Laser-sustained plasma light source with reverse vortex flow

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US5180435A (en) * 1987-09-24 1993-01-19 Research Triangle Institute, Inc. Remote plasma enhanced CVD method and apparatus for growing an epitaxial semiconductor layer
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Also Published As

Publication number Publication date
WO2002076158A1 (de) 2002-09-26
DE10112494A1 (de) 2002-10-02
JP2004523869A (ja) 2004-08-05
US20040149700A1 (en) 2004-08-05
US6982395B2 (en) 2006-01-03
DE10112494C2 (de) 2003-12-11
JP4250422B2 (ja) 2009-04-08

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