EP1305566B1 - Konfokales abbildungssystem mit geteiltem retroreflektor - Google Patents
Konfokales abbildungssystem mit geteiltem retroreflektor Download PDFInfo
- Publication number
- EP1305566B1 EP1305566B1 EP01953908A EP01953908A EP1305566B1 EP 1305566 B1 EP1305566 B1 EP 1305566B1 EP 01953908 A EP01953908 A EP 01953908A EP 01953908 A EP01953908 A EP 01953908A EP 1305566 B1 EP1305566 B1 EP 1305566B1
- Authority
- EP
- European Patent Office
- Prior art keywords
- confocal imaging
- imaging system
- retroreflector
- micromirrors
- mirrors
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/026—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness by measuring distance between sensor and object
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/0004—Microscopes specially adapted for specific applications
- G02B21/002—Scanning microscopes
- G02B21/0024—Confocal scanning microscopes (CSOMs) or confocal "macroscopes"; Accessories which are not restricted to use with CSOMs, e.g. sample holders
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/0004—Microscopes specially adapted for specific applications
- G02B21/002—Scanning microscopes
- G02B21/0024—Confocal scanning microscopes (CSOMs) or confocal "macroscopes"; Accessories which are not restricted to use with CSOMs, e.g. sample holders
- G02B21/0036—Scanning details, e.g. scanning stages
- G02B21/0048—Scanning details, e.g. scanning stages scanning mirrors, e.g. rotating or galvanomirrors, MEMS mirrors
Definitions
- the invention relates to a confocal imaging system for Generation of height values or height images.
- the invention is based on the object confocal imaging systems in terms of their data rate and reliability to optimize.
- the finding of the invention lies in the separation of the previously used, interconnected mirrors, so that separate Micromirror are present, which are also 90 ° to each other are employed.
- the representation as a micromirror reduced the mass to be vibrated.
- the drive can be electrostatic be.
- the achievable frequencies are significant higher than in the prior art, for example at 10 kHz or higher.
- the micromirrors become common with the springy Suspension preferably integrally formed in silicon. In addition to the relatively low vibration energy in combination with the smaller surfaces is the sound radiation significantly reduced. It also sets crystalline silicon is an ideal spring material can reduce the life of the mechanical oscillator in the Compared to electromagnetic drives significantly extended and the hysteresis of the way / time behavior becomes essential improved.
- FIG. 1 schematically shows a variable deflecting reflector consisting of micromachined micromirrors 1, 11.
- the mode of operation of the micromirrors corresponds to the previously known mode of operation in that the mirrors are rotated or turned relative to one another by 90 °, are placed in the beam path of the confocal imaging system.
- Both mirrors 1, 11 oscillate synchronously.
- the mirrors oscillate at their resonant frequency f R.
- the drive of these mirrors happens electrostatically.
- the double arrows entered in FIG. 1 represent the oscillation direction.
- the common voltage U- is used to stimulate bieder mirror.
- the micromirror system can also be operated under vacuum with increased operating voltages. In this case, higher voltages and higher field strengths can be used.
- FIG. 2 shows a laser 5, its rays through the confocal imaging system be guided.
- the system is confocal because the illumination source and the photoreceptor 6 are punctiform designed.
- the beam path of the confocal imaging system is such designed that this offset by a retroreflector 3 by 180 ° is reflected back.
- the vibration of the retroreflector 3 takes place in the direction of the optical axis of the system this place. Illuminating beam and measuring beam become as far as possible guided by the same optics.
- back-reflected measuring beam is before it on the Laser 5 hits, via a splitter mirror on a photoreceiver 6 decoupled.
- the key element in this imaging system becomes a real intermediate between the mirrors formed the punctiform light source.
- the intermediate image moves between the mirrors and hence the focus in the object area.
- the scattered on the object Light passes through the beam path in the opposite direction relative to the beam of illumination and eventually becomes one punctiform detector, photoreceiver 6, focused.
- the overall configuration The arrangement can be designed so that the mirror system at low mass by means of an oscillator is movable at high speed and accordingly Record extremely fast focus movements or height detections can.
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Optics & Photonics (AREA)
- Microscoopes, Condenser (AREA)
- Optical Elements Other Than Lenses (AREA)
- Micromachines (AREA)
- Mechanical Light Control Or Optical Switches (AREA)
- Lenses (AREA)
- Length Measuring Devices By Optical Means (AREA)
Description
Claims (5)
- Konfokales Abbildungssystem zur Aufnahme von Abstandswerten, bestehend aus:einer konfokalen Abbildungsoptik zur Abbildung eines Fokuspunktes auf einem Objekt (7),einer Beleuchtungseinheit zur Beleuchtung des Objektes (7) über die konfokale Abbildungsoptik,einem Fotoempfänger (6) zur Detektion des von dem Objekt zurückgestreuten Lichtes und zu dessen optoelektrischer Umwandlung,einem im optischen Strahlengang befindlichen und zur Bewegung des Fokuspunktes in Richtung der optischen Achse in Richtung der optischen Achse schwingenden Retroreflektors (3) aus mindestens zwei um 90° gegeneinander angestellten und synchron miteinander schwingenden Mikrospiegeln (1, 11),wobei die Mikrospiegel in Form einer Anordnung integral aus Silizium hergestellt sind und Spiegel (1, 11) und Federelemente (8) zwischen Spiegeln und Halterung (2) beinhalten.
- Konfokales Abbildungssystem nach Anspruch 1, wobei die Mikrospiegelanordnung aus kristallinen Silizium besteht.
- Konfokales Abbildungssystem nach einem der vorhergehenden Ansprüche, wobei die Mikrospiegel (1, 11) in Resonanz schwingen.
- Konfokales Abbildungssystem nach einem der vorhergehenden Ansprüche, wobei die Mikrospiegelanordnung elektrostatisch antreibbar ist.
- Konfokales Abbildungssystem nach einem der vorhergehenden Ansprüche, wobei die Mikrospiegelanordnung im Vakuum oder bei vermindertem Druck betreibbar ist.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10034250 | 2000-07-14 | ||
DE10034250A DE10034250C2 (de) | 2000-07-14 | 2000-07-14 | Konfokales Abbildungssystem |
PCT/DE2001/002573 WO2002008688A1 (de) | 2000-07-14 | 2001-07-10 | Konfokales abbildungssystem mit geteiltem retroreflektor |
Publications (2)
Publication Number | Publication Date |
---|---|
EP1305566A1 EP1305566A1 (de) | 2003-05-02 |
EP1305566B1 true EP1305566B1 (de) | 2005-03-23 |
Family
ID=7648907
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP01953908A Expired - Lifetime EP1305566B1 (de) | 2000-07-14 | 2001-07-10 | Konfokales abbildungssystem mit geteiltem retroreflektor |
Country Status (7)
Country | Link |
---|---|
US (1) | US6791698B2 (de) |
EP (1) | EP1305566B1 (de) |
JP (1) | JP4705309B2 (de) |
CN (1) | CN1182366C (de) |
AT (1) | ATE291729T1 (de) |
DE (2) | DE10034250C2 (de) |
WO (1) | WO2002008688A1 (de) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10125885B4 (de) * | 2001-05-28 | 2004-09-16 | Siemens Ag | Sensorvorrichtung zur schnellen optischen Abstandsmessung nach dem konfokalen optischen Abbildungsprinzip |
ES2671574T3 (es) * | 2003-03-31 | 2018-06-07 | John Zink Company, Llc | Método y aparato para la monitorización y el control de combustión |
US7768638B2 (en) * | 2005-03-18 | 2010-08-03 | Illumina, Inc. | Systems for and methods of facilitating focusing an optical scanner |
DE102005025385B4 (de) * | 2005-04-20 | 2007-03-22 | Von Ardenne Anlagentechnik Gmbh | Vakuumbeschichtungsanlage zur Beschichtung flächiger Substrate mit einer Messeinrichtung zur Transmissions- oder/und Reflexionsmessung |
US9055867B2 (en) * | 2005-05-12 | 2015-06-16 | Caliber Imaging & Diagnostics, Inc. | Confocal scanning microscope having optical and scanning systems which provide a handheld imaging head |
CN109765541B (zh) * | 2019-01-14 | 2020-11-24 | 上海禾赛科技股份有限公司 | 扫描装置和激光雷达 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4632548A (en) * | 1985-01-18 | 1986-12-30 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Projection lens scanning laser velocimeter system |
GB8729246D0 (en) * | 1987-12-15 | 1988-01-27 | Renishaw Plc | Opto-electronic scale-reading apparatus |
US5030710A (en) * | 1990-04-10 | 1991-07-09 | Texaco Chemical Company | Nylon-6 modified with low molecular weight polyethylene glycol diamines |
US5589936A (en) * | 1992-09-14 | 1996-12-31 | Nikon Corporation | Optical measuring apparatus for measuring physichemical properties |
US5295014A (en) * | 1992-11-12 | 1994-03-15 | The Whitaker Corporation | Two-dimensional laser beam scanner using PVDF bimorph |
DE19608468C2 (de) * | 1996-03-01 | 1998-01-22 | Siemens Ag | Optischer Abstandssensor |
JP2962581B2 (ja) * | 1995-06-30 | 1999-10-12 | シーメンス アクチエンゲゼルシヤフト | 光距離センサ |
US5936728A (en) * | 1998-04-14 | 1999-08-10 | Noran Instruments, Inc. | Flash photolysis method and apparatus |
DE19837249A1 (de) * | 1998-08-17 | 2000-02-24 | Siemens Ag | Mikroskop mit hoher Schärfentiefe |
US6327038B1 (en) * | 1999-09-21 | 2001-12-04 | Ut-Battelle, Llc | Linear and angular retroreflecting interferometric alignment target |
US6392807B1 (en) * | 2000-12-22 | 2002-05-21 | Avanex Corporation | Tunable chromatic dispersion compensator utilizing a virtually imaged phased array and folded light paths |
-
2000
- 2000-07-14 DE DE10034250A patent/DE10034250C2/de not_active Expired - Fee Related
-
2001
- 2001-07-10 US US10/332,849 patent/US6791698B2/en not_active Expired - Lifetime
- 2001-07-10 JP JP2002514333A patent/JP4705309B2/ja not_active Expired - Fee Related
- 2001-07-10 DE DE50105707T patent/DE50105707D1/de not_active Expired - Lifetime
- 2001-07-10 CN CNB01812688XA patent/CN1182366C/zh not_active Expired - Lifetime
- 2001-07-10 AT AT01953908T patent/ATE291729T1/de not_active IP Right Cessation
- 2001-07-10 WO PCT/DE2001/002573 patent/WO2002008688A1/de active IP Right Grant
- 2001-07-10 EP EP01953908A patent/EP1305566B1/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
ATE291729T1 (de) | 2005-04-15 |
EP1305566A1 (de) | 2003-05-02 |
DE50105707D1 (de) | 2005-04-28 |
WO2002008688A1 (de) | 2002-01-31 |
CN1441894A (zh) | 2003-09-10 |
CN1182366C (zh) | 2004-12-29 |
DE10034250C2 (de) | 2003-04-17 |
JP4705309B2 (ja) | 2011-06-22 |
US6791698B2 (en) | 2004-09-14 |
JP2004504617A (ja) | 2004-02-12 |
US20040080760A1 (en) | 2004-04-29 |
DE10034250A1 (de) | 2002-02-07 |
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