EP1227515A3 - Condensateur ensillonné pour circuits intégrés - Google Patents

Condensateur ensillonné pour circuits intégrés Download PDF

Info

Publication number
EP1227515A3
EP1227515A3 EP02250519A EP02250519A EP1227515A3 EP 1227515 A3 EP1227515 A3 EP 1227515A3 EP 02250519 A EP02250519 A EP 02250519A EP 02250519 A EP02250519 A EP 02250519A EP 1227515 A3 EP1227515 A3 EP 1227515A3
Authority
EP
European Patent Office
Prior art keywords
buried type
capacitor
integrated circuits
type capacitor
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP02250519A
Other languages
German (de)
English (en)
Other versions
EP1227515A2 (fr
Inventor
Takashi Iwamoto
Makoto Yoshimura
Kenichi Hashizume
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nokia Oyj
Original Assignee
Nokia Oyj
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nokia Oyj filed Critical Nokia Oyj
Publication of EP1227515A2 publication Critical patent/EP1227515A2/fr
Publication of EP1227515A3 publication Critical patent/EP1227515A3/fr
Withdrawn legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/66007Multistep manufacturing processes
    • H01L29/66075Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/0203Particular design considerations for integrated circuits
    • H01L27/0248Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Ceramic Engineering (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
EP02250519A 2001-01-26 2002-01-25 Condensateur ensillonné pour circuits intégrés Withdrawn EP1227515A3 (fr)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2001019003 2001-01-26
JP2001019003 2001-01-26
JP2001369182A JP2002299462A (ja) 2001-01-26 2001-12-03 半導体装置
JP2001369182 2001-12-03

Publications (2)

Publication Number Publication Date
EP1227515A2 EP1227515A2 (fr) 2002-07-31
EP1227515A3 true EP1227515A3 (fr) 2008-07-23

Family

ID=26608369

Family Applications (1)

Application Number Title Priority Date Filing Date
EP02250519A Withdrawn EP1227515A3 (fr) 2001-01-26 2002-01-25 Condensateur ensillonné pour circuits intégrés

Country Status (3)

Country Link
US (1) US6784519B2 (fr)
EP (1) EP1227515A3 (fr)
JP (1) JP2002299462A (fr)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6043119A (en) * 1997-08-04 2000-03-28 Micron Technology, Inc. Method of making a capacitor
JP4467721B2 (ja) * 2000-06-26 2010-05-26 富士通マイクロエレクトロニクス株式会社 コンタクタ及びコンタクタを使用した試験方法
CN1875647B (zh) 2003-10-31 2011-11-09 京瓷株式会社 传输速度决定方法和利用该方法的基站装置、终端装置
WO2007054870A1 (fr) * 2005-11-08 2007-05-18 Nxp B.V. Dispositif condensateur a tranchee pour applications de decouplage dans une operation haute frequence
DE102007009383A1 (de) * 2007-02-20 2008-08-21 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Halbleiteranordnung und Verfahren zu deren Herstellung
KR100879375B1 (ko) * 2007-09-28 2009-01-20 삼성전기주식회사 캐비티 캐패시터가 내장된 인쇄회로기판
KR100947923B1 (ko) * 2007-11-16 2010-03-15 주식회사 동부하이텍 반도체 소자의 캐패시터 및 그 형성 방법
US8722505B2 (en) * 2010-11-02 2014-05-13 National Semiconductor Corporation Semiconductor capacitor with large area plates and a small footprint that is formed with shadow masks and only two lithography steps
US8502340B2 (en) 2010-12-09 2013-08-06 Tessera, Inc. High density three-dimensional integrated capacitors
JP6409211B2 (ja) * 2013-12-20 2018-10-24 独立行政法人国立高等専門学校機構 電子回路要素の製造装置および製造方法
JP6867889B2 (ja) * 2017-06-14 2021-05-12 株式会社豊田中央研究所 半導体装置
WO2019032100A1 (fr) * 2017-08-09 2019-02-14 Intel Corporation Composants de circuit intégré avec cavités de substrat
US11342379B2 (en) * 2019-05-10 2022-05-24 Taiwan Semiconductor Manufacturing Company, Ltd. Trench formation scheme for programmable metallization cell to prevent metal redeposit

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5275974A (en) * 1992-07-30 1994-01-04 Northern Telecom Limited Method of forming electrodes for trench capacitors
WO1998019337A1 (fr) * 1996-10-29 1998-05-07 Trusi Technologies, Llc Circuits integres et procedes de fabrication correspondants
JPH10163632A (ja) * 1996-11-26 1998-06-19 Sony Corp プリント配線板及びその製造方法
US5811868A (en) * 1996-12-20 1998-09-22 International Business Machines Corp. Integrated high-performance decoupling capacitor

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1593863A (en) * 1977-03-25 1981-07-22 Plessey Co Ltd Circuit arrangements
US5780335A (en) * 1994-08-26 1998-07-14 International Business Machines Corporation Method of forming a buried-sidewall-strap two transistor one capacitor trench cell
US5745333A (en) * 1994-11-21 1998-04-28 International Business Machines Corporation Laminar stackable circuit board structure with capacitor
DE19843641A1 (de) * 1998-09-23 2000-04-20 Siemens Ag Grabenkondensator mit Isolationskragen und entsprechendes Herstellungsverfahren
JP2000353779A (ja) * 1999-06-10 2000-12-19 Toshiba Corp 化合物半導体装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5275974A (en) * 1992-07-30 1994-01-04 Northern Telecom Limited Method of forming electrodes for trench capacitors
WO1998019337A1 (fr) * 1996-10-29 1998-05-07 Trusi Technologies, Llc Circuits integres et procedes de fabrication correspondants
JPH10163632A (ja) * 1996-11-26 1998-06-19 Sony Corp プリント配線板及びその製造方法
US5811868A (en) * 1996-12-20 1998-09-22 International Business Machines Corp. Integrated high-performance decoupling capacitor

Also Published As

Publication number Publication date
JP2002299462A (ja) 2002-10-11
EP1227515A2 (fr) 2002-07-31
US20020109175A1 (en) 2002-08-15
US6784519B2 (en) 2004-08-31

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