EP1071112A3 - Scanning charged-particle beam instrument - Google Patents
Scanning charged-particle beam instrument Download PDFInfo
- Publication number
- EP1071112A3 EP1071112A3 EP00305774A EP00305774A EP1071112A3 EP 1071112 A3 EP1071112 A3 EP 1071112A3 EP 00305774 A EP00305774 A EP 00305774A EP 00305774 A EP00305774 A EP 00305774A EP 1071112 A3 EP1071112 A3 EP 1071112A3
- Authority
- EP
- European Patent Office
- Prior art keywords
- center
- stage
- image
- mechanical rotation
- distance
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000002245 particle Substances 0.000 title abstract 2
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
- H01J2237/202—Movement
- H01J2237/20242—Eucentric movement
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Abstract
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20426699 | 1999-07-19 | ||
JP20426699A JP3859396B2 (en) | 1999-07-19 | 1999-07-19 | Sample image observation method and scanning charged particle beam apparatus in scanning charged particle beam apparatus |
Publications (3)
Publication Number | Publication Date |
---|---|
EP1071112A2 EP1071112A2 (en) | 2001-01-24 |
EP1071112A3 true EP1071112A3 (en) | 2001-04-18 |
EP1071112B1 EP1071112B1 (en) | 2006-07-05 |
Family
ID=16487632
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP00305774A Expired - Lifetime EP1071112B1 (en) | 1999-07-19 | 2000-07-07 | Scanning charged-particle beam instrument |
Country Status (4)
Country | Link |
---|---|
US (1) | US6444991B1 (en) |
EP (1) | EP1071112B1 (en) |
JP (1) | JP3859396B2 (en) |
DE (1) | DE60029166T2 (en) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3934854B2 (en) * | 2000-05-29 | 2007-06-20 | 株式会社日立製作所 | Scanning electron microscope |
GB2381947B (en) * | 2001-11-09 | 2004-01-07 | Leica Microsys Lithography Ltd | Electron beam lithography machine |
US6777688B2 (en) * | 2002-09-16 | 2004-08-17 | National University Of Singapore | Rotational stage for high speed, large area scanning in focused beam systems |
JP4691391B2 (en) | 2005-05-12 | 2011-06-01 | 独立行政法人理化学研究所 | electronic microscope |
JP2007164992A (en) * | 2005-12-09 | 2007-06-28 | Sii Nanotechnology Inc | Compound charged particle beam device |
JP5268324B2 (en) * | 2007-10-29 | 2013-08-21 | 株式会社日立ハイテクノロジーズ | Charged particle beam microscope and microscope method |
JP5479950B2 (en) * | 2010-03-03 | 2014-04-23 | オリンパス株式会社 | Microscope device and observation position reproduction method |
JP5624815B2 (en) * | 2010-07-02 | 2014-11-12 | 株式会社キーエンス | Magnification observation apparatus and magnification observation method |
JP5788719B2 (en) | 2011-06-09 | 2015-10-07 | 株式会社日立ハイテクノロジーズ | Stage device and control method of stage device |
JP5851218B2 (en) * | 2011-11-29 | 2016-02-03 | 日本電子株式会社 | Sample analyzer |
JP5934521B2 (en) * | 2012-03-01 | 2016-06-15 | 日本電子株式会社 | Sample analyzer |
DE102012205317B4 (en) | 2012-03-30 | 2018-06-28 | Carl Zeiss Microscopy Gmbh | Method for adjusting a position of a carrier element in a particle beam device, computer program product and particle beam device |
JP2016205899A (en) * | 2015-04-17 | 2016-12-08 | 株式会社ミツトヨ | Control method and device of turntable |
JP7360978B2 (en) * | 2020-03-18 | 2023-10-13 | 株式会社日立ハイテクサイエンス | Charged particle beam device |
CZ309943B6 (en) | 2020-08-07 | 2024-02-21 | Tescan Group, A.S. | Method of operation of an equipment with a beam of charged particles |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4627009A (en) * | 1983-05-24 | 1986-12-02 | Nanometrics Inc. | Microscope stage assembly and control system |
US4803358A (en) * | 1987-03-18 | 1989-02-07 | Hitachi, Ltd. | Scanning electron microscope |
US5684856A (en) * | 1991-09-18 | 1997-11-04 | Canon Kabushiki Kaisha | Stage device and pattern transfer system using the same |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4833903B1 (en) * | 1969-04-08 | 1973-10-17 | ||
JPS6376251A (en) | 1986-09-17 | 1988-04-06 | Toshiba Corp | Sample stage for scanning electron microscope |
US5481111A (en) * | 1994-01-03 | 1996-01-02 | Philips Electronics North America Corporation | Electron microscope having a goniometer controlled from the image frame of reference |
JP3014274B2 (en) * | 1994-06-29 | 2000-02-28 | 株式会社日立製作所 | Biaxial tilt sample fine-movement device and image relief correction method |
JP3544438B2 (en) * | 1996-09-30 | 2004-07-21 | セイコーインスツルメンツ株式会社 | Processing equipment using ion beam |
-
1999
- 1999-07-19 JP JP20426699A patent/JP3859396B2/en not_active Expired - Fee Related
-
2000
- 2000-07-07 EP EP00305774A patent/EP1071112B1/en not_active Expired - Lifetime
- 2000-07-07 DE DE60029166T patent/DE60029166T2/en not_active Expired - Fee Related
- 2000-07-19 US US09/619,450 patent/US6444991B1/en not_active Expired - Fee Related
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4627009A (en) * | 1983-05-24 | 1986-12-02 | Nanometrics Inc. | Microscope stage assembly and control system |
US4803358A (en) * | 1987-03-18 | 1989-02-07 | Hitachi, Ltd. | Scanning electron microscope |
US5684856A (en) * | 1991-09-18 | 1997-11-04 | Canon Kabushiki Kaisha | Stage device and pattern transfer system using the same |
Also Published As
Publication number | Publication date |
---|---|
EP1071112B1 (en) | 2006-07-05 |
JP3859396B2 (en) | 2006-12-20 |
DE60029166T2 (en) | 2007-06-06 |
DE60029166D1 (en) | 2006-08-17 |
US6444991B1 (en) | 2002-09-03 |
JP2001035433A (en) | 2001-02-09 |
EP1071112A2 (en) | 2001-01-24 |
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