EP0237622A1 - Coated ceramic-rotary cutting plate - Google Patents

Coated ceramic-rotary cutting plate Download PDF

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Publication number
EP0237622A1
EP0237622A1 EP86114784A EP86114784A EP0237622A1 EP 0237622 A1 EP0237622 A1 EP 0237622A1 EP 86114784 A EP86114784 A EP 86114784A EP 86114784 A EP86114784 A EP 86114784A EP 0237622 A1 EP0237622 A1 EP 0237622A1
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Prior art keywords
titanium
cutting tool
layer
base body
aluminum oxide
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German (de)
French (fr)
Inventor
Ulf Dr. Dipl.-Min. Dworak
Kilian Dr. Dipl.-Ing. Friederich
Werner Dipl.-Chem. Hänni
Hans Erich Dr. Sc.Nat.Eth Hintermann
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Feldmuehle AG
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Feldmuehle AG
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C30/00Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
    • C23C30/005Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process on hard metal substrates

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  • the present invention is based on a cutting tool for machining according to the preamble of the main claim.
  • Coated cutting inserts are described in DE-C-24 43 160.
  • the insert base bodies described there consist of ceramic oxides or wear-resistant ceramic oxides which are mixed with one or more hard carbides and / or nitrides and / or binder metal.
  • the known insert has a coating of ceramic oxides, preferably of the oxides of: Al, Zr, Si, Ca, Mg, Ti and / or Hf.
  • an intermediate layer made of a or more carbides and / or nitrides of Ti, Zr, Hf, V, Nb, Ta, Cr, MO, W, Si and / or B can be arranged.
  • DE-C-31 44 192 provides a method for the PVD coating of cemented carbides or cermets Carbides, nitrides or oxides of metals from Group IVa, Va and VIa of the PSE and / or Al2O3 and Zr2O2 prior to atomization cleaning with hydrogen or other gas mixture to improve the adhesion of the coating on the base body.
  • EP-A- 85 240 provides intermediate layers made of titanium oxide, on which wear layers made of titanium nitride, titanium carbide or titanium carbonitride are applied by the CVD process.
  • DE-A-28 25 009 describes hard metal bodies with an aluminum oxide layer, an intermediate layer made of wear-resistant carbide, nitride, carbonitride and / or boride, etc., being applied before the aluminum oxide layer is applied. made of titanium carbide, titanium nitride and titanium carbonitride.
  • DE-B-25 25 185 also relates to wear-resistant molded parts with basic bodies made of hard metal and, before the wear-resistant layers made of aluminum oxide and / or zirconium oxide are applied, sees the application of inner partial layers made of one or more borides, in particular diborides of the elements titanium, zirconium and hafnium , Vanadium, niobium, tantalum, chromium, molybdenum and tungsten.
  • borides in particular diborides of the elements titanium, zirconium and hafnium , Vanadium, niobium, tantalum, chromium, molybdenum and tungsten.
  • EP-OS 45 291 has already proposed during the deposition of a wear layer consisting essentially of aluminum oxide the substrate made of hard metal or ceramic before adding a controlled amount of sulfur, selenium and / or tellurium.
  • This document provides intermediate layers of carbides, nitrides, carbonitrides and / or borides of one or more of the elements titanium, zirconium, hafnium, vanadium, niobium, tantalum, chromium, molybdenum, tungsten, silicon and / or beryllium.
  • the present invention therefore sees its task in the development of a cutting tool Improved temperature resistance, whereby the wear layer on the substrate has sufficient adhesive strength.
  • the cutting tool should also be able to be produced cost-effectively and reproducibly on an industrial scale without using complex procedural measures using conventional raw materials.
  • the invention provides the characterizing features of claim 1 in a cutting tool according to the preamble of the main claim.
  • the base body consists essentially of: aluminum oxide, zirconium oxide, a mixture of aluminum oxide with up to 20% by volume of zirconium oxide, with additional amounts of 2 to 15% by volume being preferred; Furthermore, from a silicon nitride containing the usual sintering aids, which is either sintered or hot-pressed without pressure, and from sintered or hot-pressed silicon nitride, to which hard materials, preferably titanium carbide, titanium nitride, titanium boride, niobium boride, niobium carbide and silicon carbide are added, as well as from metal sintered silicon and none Silicon carbide, also made of aluminum oxide with an addition of 1 to 40 vol.% Titanium carbide.
  • the base bodies are ground on all sides before the intermediate layer of silicon dioxide is applied to form the standardized geometries.
  • Intermediate layers and wear layers each with a thickness of 0.1 to 5 ⁇ m, have proven to be well suited. Due to their less pronounced glass character, intermediate layers with a thickness of ⁇ 1 ⁇ m have proven to be particularly suitable. Intermediate layers of this thickness are therefore considered to be particularly preferred because the high brittleness of silicon dioxide is hardly noticeable from a negative point of view with these small layer thicknesses.
  • the use of the CVD or PVD method, in particular the CVD method has proven to be particularly suitable.
  • the application of the silicon dioxide layer can take place, for example, in accordance with the method described in US Pat. No. 4,099,990 for the application of SiO 2 layers to the inner surface of reactor tubes.
  • a base body made of, for example, Al2O3, but without the preoxidation described in the aforementioned US-A-4099990 is coated directly with SiO2 by the action of an atmosphere of a nitrogen carrier gas containing 0.5% H2O, which acts as a Si carrier Contains 0.5% TEOS (tetraethyl orthosilicate) and deposited a 50 ⁇ m thick SiO2 layer at 50 mbar and 780 ° C for a treatment period of 1 h. Another treatment follows in a water vapor atmosphere of 1 bar at 1000 ° C. for 30 minutes.
  • the deposition of the wear layer is carried out according to the known CVD process for the application of TiC-Al2O3, TiC, TiN, Ti (C, N).
  • a base body made of a mixture of aluminum oxide and 12 vol.% Zirconium oxide was provided with a layer of silicon dioxide with a thickness of 0.5 ⁇ m applied by the CVD method and then in the same reactor with a layer of titanium carbonitride with a thickness of 1.5 ⁇ m coated.
  • the adhesive strength of the titanium carbonitride layer was 23 N.
  • the adhesive strength was measured using the REVETEST method, in which the substrate is moved under a diamond tip subjected to increasing loads.
  • the same titanium carbonitride layer was applied to the base body made of aluminum oxide with 12 vol.% Zirconium oxide, without the application of an intermediate silicon dioxide layer.
  • the adhesive strength determined was only 4 N.
  • base bodies were made of: aluminum oxide with the addition of magnesium oxide and silicon dioxide as sintering aids, Aluminum oxide with an addition of 20 vol.% Titanium carbide Silicon nitride with additions of magnesium oxide and yttrium oxide as well as calcium oxide as a sintering aid Silicon nitride, which contains 20% by volume of titanium carbide in addition to the aforementioned sintering aids, Silicon nitride, which contains 20% by volume of titanium nitride in addition to the aforementioned sintering aids, Silicon nitride, which in addition to the aforementioned sintering aids each contains 10% by volume of titanium diboride and titanium carbide, Silicon carbide with an intermediate layer made of: SiO2 and wear layers made of: aluminum oxide, titanium carbide, titanium nitride and titanium carbonitride.
  • the adhesive strength of the wear layer on the substrate or the intermediate layer was in each case more than 20 N.
  • the accompanying figure shows a schematic representation - in cross section - of a section of a cutting tool.
  • the cutting plate (1) shown in the figure consists of a base body (2) made of aluminum oxide, on which an intermediate layer (4) made of silicon dioxide is arranged, which is covered with the wear layer (3) made of titanium carbonitride.

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Cutting Tools, Boring Holders, And Turrets (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

A cutting tool (1) for machining has a parent body (2) which is composed of sintered ceramic materials to which a silicon dioxide intermediate layer (4) is applied. The latter is in turn provided with an external ceramic wear layer (3), the wear layer (3) being composed essentially of aluminium oxide, zirconium oxide, hafnium oxide, mixtures thereof or of a titanium carbonitride. <IMAGE>

Description

Die vorliegende Erfindung geht aus von einem Schneidwerkzeug für die spanabhebende Bearbeitung nach der Gattung des Hauptanspruchs.The present invention is based on a cutting tool for machining according to the preamble of the main claim.

Beschichtete Schneidplatten sind in der DE-C- 24 43 160 beschrieben. Die dort beschriebenen Schneidplatten-Grundkörper bestehen aus keramischen Oxiden oder aus verschleißfesten keramischen Oxiden, die mit einem oder mehreren Hartkarbiden und/oder Nitriden und/oder Bindemetall gemischt sind. Zur Verbesserung der Verschleißfestigkeit weist die bekannte Schneidplatte eine Beschichtung aus keramischen Oxiden auf, vorzugsweise aus den Oxiden von: Al, Zr, Si, Ca, Mg, Ti und/oder Hf. Zwischen der oxidischen Verschleißschicht und dem Grundkörper kann zusätzlich eine Zwischenschicht aus einem oder mehreren Karbiden und/oder Nitriden von Ti, Zr, Hf, V, Nb, Ta, Cr, MO, W, Si und/oder B angeordnet sein.Coated cutting inserts are described in DE-C-24 43 160. The insert base bodies described there consist of ceramic oxides or wear-resistant ceramic oxides which are mixed with one or more hard carbides and / or nitrides and / or binder metal. To improve the wear resistance, the known insert has a coating of ceramic oxides, preferably of the oxides of: Al, Zr, Si, Ca, Mg, Ti and / or Hf. Between the oxidized wear layer and the base body, an intermediate layer made of a or more carbides and / or nitrides of Ti, Zr, Hf, V, Nb, Ta, Cr, MO, W, Si and / or B can be arranged.

Die DE-C- 31 44 192 sieht bei einem Verfahren zur PVD-Beschichtung von Sinterkarbiden oder Cermets mit Karbiden, Nitriden oder Oxiden von Metallen aus der Gruppe IVa, Va und VIa des PSE und/oder Al₂O₃ und Zr₂O₂ eine Zerstäubungsreinigung mit Wasserstoff oder anderem Gasgemisch zur Verbesserung der Haftung der Beschichtung auf den Grundkörpern vor.DE-C-31 44 192 provides a method for the PVD coating of cemented carbides or cermets Carbides, nitrides or oxides of metals from Group IVa, Va and VIa of the PSE and / or Al₂O₃ and Zr₂O₂ prior to atomization cleaning with hydrogen or other gas mixture to improve the adhesion of the coating on the base body.

Für aus Al₂O₃ oder eine Al₂O₃-Schicht aufweisende Substrate sieht die EP-A- 85 240 Zwischenlagen aus Titanoxid vor, auf der Nutzschichten aus Titannitrid, Titankarbid oder Titancarbonitrid nach dem CVD-Verfahren aufgetragen werden.For substrates comprising Al₂O₃ or an Al₂O₃ layer, EP-A- 85 240 provides intermediate layers made of titanium oxide, on which wear layers made of titanium nitride, titanium carbide or titanium carbonitride are applied by the CVD process.

In der DE-A- 28 25 009 werden Hartmetallkörper mit einer Aluminiumoxidschicht beschrieben, wobei vor Auftrag der Aluminiumoxidschicht noch eine Zwischenschicht aus verschleißfestem Karbid, Nitrid, Carbonitrid und/oder Borid, u.a. aus Titankarbid, Titannitrid und Titancarbonitrid aufgebracht wird.DE-A-28 25 009 describes hard metal bodies with an aluminum oxide layer, an intermediate layer made of wear-resistant carbide, nitride, carbonitride and / or boride, etc., being applied before the aluminum oxide layer is applied. made of titanium carbide, titanium nitride and titanium carbonitride.

Die DE-B- 25 25 185 betrifft ebenfalls verschleißfeste Formteile mit Grundkörpern aus Hartmetall und sieht vor Aufbringung der verschleißfesten Schichten aus Aluminiumoxid und/oder Zirkonoxid den Auftrag von inneren Teilschichten aus einem oder mehreren Boriden, insbesondere von Diboriden der Elemente Titan, Zirkonium, Hafnium, Vanadium, Niob, Tantal, Chrom, Molybdän und Wolfram vor.DE-B-25 25 185 also relates to wear-resistant molded parts with basic bodies made of hard metal and, before the wear-resistant layers made of aluminum oxide and / or zirconium oxide are applied, sees the application of inner partial layers made of one or more borides, in particular diborides of the elements titanium, zirconium and hafnium , Vanadium, niobium, tantalum, chromium, molybdenum and tungsten.

Zur Verbesserung der Gleichmäßigkeit bei der Aufbringung der Beschichtung mittels des CVD-Verfahrens wurde in der EP-OS 45 291 auch bereits vorgeschlagen, während der Abscheidung einer im wesentlichen aus Aluminiumoxid bestehenden Nutzschicht dem aus Hartmetall oder Keramik bestehenden Substrat vor, eine kontrollierte Menge von Schwefel, Selen und/oder Tellur zuzufügen. Diese Schrift sieht Zwischenschichten aus Karbiden, Nitriden, Carbonitriden und/oder Boriden von einem oder mehreren der Elemente Titan, Zirkonium, Hafnium, Vanadium, Niob, Tantal, Chrom, Molybdän, Wolfram, Silizium und/oder Beryllium vor.In order to improve the uniformity when applying the coating by means of the CVD process, EP-OS 45 291 has already proposed during the deposition of a wear layer consisting essentially of aluminum oxide the substrate made of hard metal or ceramic before adding a controlled amount of sulfur, selenium and / or tellurium. This document provides intermediate layers of carbides, nitrides, carbonitrides and / or borides of one or more of the elements titanium, zirconium, hafnium, vanadium, niobium, tantalum, chromium, molybdenum, tungsten, silicon and / or beryllium.

Von den vorstehend beschriebenen Schneidwerkzeugen haben im wesentlichen nur diejenigen mit einem Grundkörper auf Basis von Hartmetallen eine gewisse Verbreitung erfahren. Im Vergleich zu keramischen Werkstoffen haben Hartmetalle infolge ihres Bindemetallanteils aber eine geringere Temperaturbeständigkeit, so daß hier noch gewisse Nachteile, insbesondere bei infolge von hohen Schnittgeschwindigkeiten verursachtem Temperaturanstieg bestehen. Als nachteilig müssen auch komplizierte Verfahrenbedingungen angesehen werden, wie z.B. der Schwefelzusatz beim Abscheiden der Beschichtung oder die Bildung einer TiO-Schicht aus zuvor abgeschiedenem TiO₂, da eine reproduzierbare Arbeitsweise im Produktionsmaßstab dabei nicht immer möglich ist.Of the cutting tools described above, essentially only those with a base body based on hard metals have experienced a certain spread. Compared to ceramic materials, hard metals have a lower temperature resistance due to their binder metal content, so that there are still certain disadvantages, especially when the temperature rises as a result of high cutting speeds. Complicated process conditions, such as e.g. the addition of sulfur when depositing the coating or the formation of a TiO layer from previously deposited TiO₂, since a reproducible way of working on a production scale is not always possible.

Die Nachteile der bisher bekannten Zwischenschichten auf Borid-, Karbid-, Nitrid- und Carbonitridbasis bestehen in der noch nicht ausreichenden Haftfestigkeitsverbesserung.The disadvantages of the previously known intermediate layers based on boride, carbide, nitride and carbonitride are the insufficient improvement in adhesive strength.

Die vorliegende Erfindung sieht deshalb ihre Aufgabe in der Entwicklung eines Schneidwerkzeuges mit verbesserter Temperaturbeständigkeit, wobei die Nutzschicht auf dem Substrat über eine ausreichende Haftungfestigkeit verfügt.Das Schneidwerkzeug soll ferner unter Verzicht auf aufwendige Verfahrensmaßnahmen unter Rückgriff auf übliche Rohstoffe kostengünstig und im industriellen Maßstab reproduzierbar herstellbar sein.The present invention therefore sees its task in the development of a cutting tool Improved temperature resistance, whereby the wear layer on the substrate has sufficient adhesive strength. The cutting tool should also be able to be produced cost-effectively and reproducibly on an industrial scale without using complex procedural measures using conventional raw materials.

Zur Lösung dieser Aufgabe sieht die Erfindung bei einem Schneidwerkzeug gemäß dem Gattungsbegriff des Hauptanspruches die kennzeichnenden Merkmale von Anspruch 1 vor.To achieve this object, the invention provides the characterizing features of claim 1 in a cutting tool according to the preamble of the main claim.

Wenngleich auch noch nicht geklärt ist, worin die hervorragende Eignung von Siliziumdioxid als Zwischenschicht begründet ist, muß die Auswahl von Siliziumdioxid als Glücksgriff verstanden werden, denn aufgrund der minimalen thermischen Ausdehnung von nur 0,5 × 10⁻⁶ K⁻¹ dieser Substanz im Vergleich zu der wesentlich höheren thermischen Ausdehnung der Gundkörperwerkstoffe - Al₂O₃: 8 × 10⁻⁶ K⁻¹ - mußte eigentlich damit gerechnet werden, daß sich das abgeschiedene SiO₂ beim Abkühlen nach der Beschichtung vom Grundkörper mit höherer thermischer Ausdehnung lösen und damit die Haftung eher vermindern als steigern würde. Unerwarteterweise stellte sich jedoch heraus, daß SiO₂ entgegen dieser Überlegung zu einer guten Haftung zwischen einem aus keramischen Werkstoffen bestehenden Grundkörper und einer Nutzschicht, die im wesentlichen aus Aluminiumoxid, Zirkoniumoxid, Hafniumoxid, deren Mischung oder aus einem Titancarbonitrid der allgemeinen Formel Ti (Cx, N1-x), wobei x = 0 bis 1 ist, besteht, führt.Although it has not yet been clarified what the excellent suitability of silicon dioxide as an intermediate layer is, the selection of silicon dioxide must be understood as a stroke of luck, because due to the minimal thermal expansion of only 0.5 × 10⁻⁶ K⁻¹ this substance in comparison to the much higher thermal expansion of the base body materials - Al₂O₃: 8 × 10⁻⁶ K⁻¹ - one actually had to reckon with the fact that the deposited SiO₂ dissolve after cooling from the base body with higher thermal expansion and thus reduce the adhesion rather than would increase. It was unexpectedly found, however, that SiO₂, contrary to this consideration, leads to good adhesion between a base body made of ceramic materials and a wear layer, which consists essentially of aluminum oxide, zirconium oxide, hafnium oxide, their mixture or a titanium carbonitride of the general formula Ti (C x , N 1-x ), where x = 0 to 1, leads.

Gemäß einer bevorzugten Ausführungsform der Erfindung besteht der Grundkörper im wesentlichen aus: Aluminiumoxid, Zirkoniumoxid, einer Mischung von Aluminiumoxid mit bis zu 20 Vol.% Zirkoniumoxid, wobei insbesondere Zusatzmengen von 2 bis 15 Vol.% bevorzugt sind; ferner aus einem die üblichen Sinterhilfsmittel enthaltenden Siliziumnitrid, das entweder drucklos gesintert oder heißgepreßt ist, sowie aus gesintertem oder heißgepreßtem Siliziumnitrid, dem Hartstoffe, vorzugsweise Titankarbid, Titannitrid, Titanborid, Niobborid, Niobkarbid und Siliziumkarbid zugesetzt sind, sowie aus gesintertem und kein metallisches Silizium enthaltendem Siliziumkarbid, ferner aus Aluminiumoxid mit einem Zusatz von 1 bis 40 Vol.% Titankarbid. Vor dem Auftrag der Zwischenschicht aus Siliziumdioxid werden die Grundkörper gemäß einer bevorzugten Ausführungsform zur Ausbildung der genormten Geometrien allseitig geschliffen.According to a preferred embodiment of the invention, the base body consists essentially of: aluminum oxide, zirconium oxide, a mixture of aluminum oxide with up to 20% by volume of zirconium oxide, with additional amounts of 2 to 15% by volume being preferred; Furthermore, from a silicon nitride containing the usual sintering aids, which is either sintered or hot-pressed without pressure, and from sintered or hot-pressed silicon nitride, to which hard materials, preferably titanium carbide, titanium nitride, titanium boride, niobium boride, niobium carbide and silicon carbide are added, as well as from metal sintered silicon and none Silicon carbide, also made of aluminum oxide with an addition of 1 to 40 vol.% Titanium carbide. According to a preferred embodiment, the base bodies are ground on all sides before the intermediate layer of silicon dioxide is applied to form the standardized geometries.

Zwischenschichten sowie Nutzschichten, jeweils mit einer Dicke von 0,1 bis 5 µm haben sich als gut geeignet erwiesen. Als besonders geeignet erwiesen haben sich infolge ihres weniger stark ausgeprägten Glascharakters jedoch Zwischenschichten einer Dicke < 1µm. Zwischenschichten dieser Dicke gelten daher als besonders bevorzugt, weil die hohe Sprödigkeit von Siliziumdioxid sich bei diesen geringen Schichtdicken in negativer Hinsicht kaum bemerkbar macht. Um gleichmäßige Schichten dieser geringen Dicke erzeugen zu können, hat sich die Anwendung des CVD oder PVD-Verfahrens, insbesondere des CVD-Verfahrens als besonders geeignet erwiesen.Intermediate layers and wear layers, each with a thickness of 0.1 to 5 µm, have proven to be well suited. Due to their less pronounced glass character, intermediate layers with a thickness of <1 µm have proven to be particularly suitable. Intermediate layers of this thickness are therefore considered to be particularly preferred because the high brittleness of silicon dioxide is hardly noticeable from a negative point of view with these small layer thicknesses. In order to be able to produce uniform layers of this small thickness, the use of the CVD or PVD method, in particular the CVD method, has proven to be particularly suitable.

Der Auftrag der Siliziumdioxidschicht kann beispielsweise erfolgen in Anlehnung an das in der US-A- 4099990 beschriebene Verfahren zum Auftrag von SiO₂-Schichten auf die innere Oberfläche von Reaktorröhren.The application of the silicon dioxide layer can take place, for example, in accordance with the method described in US Pat. No. 4,099,990 for the application of SiO 2 layers to the inner surface of reactor tubes.

Bei der Herstellung der erfindungsgemäßen Schneidplatte wird ein Grundkörper aus z.B. Al₂O₃, jedoch ohne die in der vorerwähnten US-A- 4099990 beschriebene Voroxidierung, direkt mit SiO₂ beschichtet durch Einwirkung einer Atmosphäre aus einem 0,5 % H₂O enthaltendem Stickstoffträgergas, das als Si-Träger 0,5 % TEOS (Tetraethylorthosilikat) enthält und bei 50 mbar und 780 °C während einer Behandlungsdauer von 1 h eine SiO₂-Schicht von 0,5 µm Dicke abgeschieden. Es folgt eine nochmalige Behandlung in einer Wasserdampfatmosphäre von 1 bar bei 1000 °C während 30 min. Die Abscheidung der Nutzschicht erfolgt nach den bekannten CVD-Verfahren zum Auftrag von TiC-Al₂O₃, TiC, TiN, Ti(C,N).In the manufacture of the cutting insert according to the invention, a base body made of, for example, Al₂O₃, but without the preoxidation described in the aforementioned US-A-4099990, is coated directly with SiO₂ by the action of an atmosphere of a nitrogen carrier gas containing 0.5% H₂O, which acts as a Si carrier Contains 0.5% TEOS (tetraethyl orthosilicate) and deposited a 50 µm thick SiO₂ layer at 50 mbar and 780 ° C for a treatment period of 1 h. Another treatment follows in a water vapor atmosphere of 1 bar at 1000 ° C. for 30 minutes. The deposition of the wear layer is carried out according to the known CVD process for the application of TiC-Al₂O₃, TiC, TiN, Ti (C, N).

Die nachfolgenden Beispiele dienen der näheren Erklärung der Erfindung:The following examples serve to explain the invention in more detail:

Beispiel 1:Example 1:

Ein Grundkörper aus einer Mischung von Aluminiumoxid und 12 Vol.% Zirkoniumoxid wurde mit einer nach dem CVD-Verfahren aufgebrachten Schicht aus Siliziumdioxid mit einer Dicke von 0,5 µm versehen und anschließend im gleichen Reaktor mit einer Schicht aus Titancarbonitrid einer Dicke von 1,5 µm beschichtet. Die Haftfestigkeit der Titancarbonitrid-Schicht betrug 23 N.A base body made of a mixture of aluminum oxide and 12 vol.% Zirconium oxide was provided with a layer of silicon dioxide with a thickness of 0.5 μm applied by the CVD method and then in the same reactor with a layer of titanium carbonitride with a thickness of 1.5 µm coated. The adhesive strength of the titanium carbonitride layer was 23 N.

Die Messung der Haftfestigkeit erfolgte nach dem REVETEST-Verfahren, bei der das Substrat unter einer mit steigender Last beaufschlagten Diamantspitze fortbewegt wird.The adhesive strength was measured using the REVETEST method, in which the substrate is moved under a diamond tip subjected to increasing loads.

Zum Vergleich wurde die gleiche Titancarbonitridschicht auf dem Grundkörper aus Aluminiumoxid mit 12 Vol.% Zirkoniumoxid, ohne Auftrag einer Siliziumdioxidzwischenschicht aufgebracht. Die dabei ermittelte Haftfestigkeit betrug nur 4 N.For comparison, the same titanium carbonitride layer was applied to the base body made of aluminum oxide with 12 vol.% Zirconium oxide, without the application of an intermediate silicon dioxide layer. The adhesive strength determined was only 4 N.

Beispiel 2:Example 2:

In weiteren Versuchen wurden Grundkörper aus: Aluminiumoxid mit Zusatz von Magnesiumoxid und Siliziumdioxid als Sinterhilfsmittel,

Aluminiumoxid mit einem Zusatz von 20 Vol.% Titankarbid

Siliziumnitrid mit Zusätzen von Magnesiumoxid und Yttriumoxid sowie Kalziumoxid als Sinterhilfsmittel

Siliziumnitrid, das außer den vorerwähnten Sinterhilfsmitteln noch 20 Vol.% Titankarbid enthält,

Siliziumnitrid, das außer den vorerwähnten Sinterhilfsmitteln noch 20 Vol.% Titannitrid enthält,

Siliziumnitrid, das außer den vorerwähnten Sinterhilfsmitteln noch je 10 Vol.% Titandiborid und Titankarbid enthält,

Siliziumkarbid
mit einer Zwischenschicht aus: SiO₂
und Nutzschichten aus jeweils: Aluminiumoxid, Titankarbid, Titannitrid und Titancarbonitrid versehen.
Die Haftfestigkeit der Nutzschicht auf dem Substrat bzw. der Zwischenschicht betrug in jedem Fall mehr als 20 N.
In further experiments, base bodies were made of: aluminum oxide with the addition of magnesium oxide and silicon dioxide as sintering aids,

Aluminum oxide with an addition of 20 vol.% Titanium carbide

Silicon nitride with additions of magnesium oxide and yttrium oxide as well as calcium oxide as a sintering aid

Silicon nitride, which contains 20% by volume of titanium carbide in addition to the aforementioned sintering aids,

Silicon nitride, which contains 20% by volume of titanium nitride in addition to the aforementioned sintering aids,

Silicon nitride, which in addition to the aforementioned sintering aids each contains 10% by volume of titanium diboride and titanium carbide,

Silicon carbide
with an intermediate layer made of: SiO₂
and wear layers made of: aluminum oxide, titanium carbide, titanium nitride and titanium carbonitride.
The adhesive strength of the wear layer on the substrate or the intermediate layer was in each case more than 20 N.

Die beiliegende Figur zeigt in schematischer Darstellung - im Querschnitt - einen Ausschnitt eines Schneidwerkzeuges.The accompanying figure shows a schematic representation - in cross section - of a section of a cutting tool.

Die in der Figur gezeigte Schneidplatte (1) besteht aus einem Grundkörper (2) aus Aluminiumoxid, auf dem eine Zwischenschicht (4) aus Siliziumdioxid angeordnet ist, die mit der Nutzschicht (3) aus Titancarbonitrid abgedeckt ist.The cutting plate (1) shown in the figure consists of a base body (2) made of aluminum oxide, on which an intermediate layer (4) made of silicon dioxide is arranged, which is covered with the wear layer (3) made of titanium carbonitride.

Claims (6)

1. Schneidwerkzeug für die spanabhebende Bearbeitung mit einem im wesentlichen aus gesinterten keramischen Werkstoffen bestehenden Grundkörper, einer auf den Grundkörper aufgetragenen keramischen Zwischenschicht und einer äußeren keramischen Nutzschicht, dadurch gekennzeichnet, daß die auf dem Grundkörper (2) angeordnete Zwischenschicht (4) aus Siliziumdioxid und die äußere Nutzschicht (3) im wesentlichen aus Aluminiumoxid, Zirkoniumoxid, Hafniumoxid, deren Mischung oder aus einem Titancarbonitrid der allgemeinen Formel: Ti (Cx, N1-x) besteht, wobei x = 0 bis 1 ist.1. Cutting tool for machining with a base body consisting essentially of sintered ceramic materials, a ceramic intermediate layer applied to the base body and an outer ceramic wear layer, characterized in that the intermediate layer (4) arranged on the base body (2) made of silicon dioxide and the outer wear layer (3) consists essentially of aluminum oxide, zirconium oxide, hafnium oxide, their mixture or a titanium carbonitride of the general formula: Ti (C x , N 1-x ), where x = 0 to 1. 2. Schneidwerkzeug nach Anspruch 1, dadurch gekennzeichnet, daß der Grundkörper (2) im wesentlichen besteht: aus Aluminiumoxid oder Zirkonoxid, aus einer Mischung von Aluminiumoxid mit bis zu 20 Vol.% Zirkoniumoxid, aus Siliziumnitrid, aus Siliziumkarbid, einer Siliziumnitrid und Hartstoffe umfassenden Zusammensetzung oder aus einer Mischung aus Aluminiumoxid mit 1 bis 40 Vol.% Titankarbid.2. Cutting tool according to claim 1, characterized in that the base body (2) consists essentially of: aluminum oxide or zirconium oxide, a mixture of aluminum oxide with up to 20 vol.% Zirconium oxide, silicon nitride, silicon carbide, a silicon nitride and hard materials Composition or from a Mixture of aluminum oxide with 1 to 40 vol.% Titanium carbide. 3. Schneidwerkzeug nach Anspruch 2, dadurch gekennzeichnet, daß die Hartstoffe Titankarbid, Titannitrid, Titanborid, Niobborid, Niobkarbid und Siliziumkarbid sind.3. Cutting tool according to claim 2, characterized in that the hard materials are titanium carbide, titanium nitride, titanium boride, niobium boride, niobium carbide and silicon carbide. 4. Schneidwerkzeug nach einem der Ansprüche 1 bis 3, dadurch gekennzeichnet, daß die Zwischenschicht (4) eine Dicke von 0,1 bis 5 µm hat.4. Cutting tool according to one of claims 1 to 3, characterized in that the intermediate layer (4) has a thickness of 0.1 to 5 µm. 5. Schneidwerkzeug nach einem der Ansprüche 1 bis 4, dadurch gekennzeichnet, daß die Nutzschicht (3) eine Dicke von 0,1 bis 5 µm hat.5. Cutting tool according to one of claims 1 to 4, characterized in that the wear layer (3) has a thickness of 0.1 to 5 µm. 6. Schneidwerkzeug nach einem der Ansprüche 1 bis 5, dadurch gekennzeichnet, daß die Zwischenschicht (4) und Nutzschicht (3) nach dem CVD oder PVD-Verfahren aufgetragen sind.6. Cutting tool according to one of claims 1 to 5, characterized in that the intermediate layer (4) and wear layer (3) are applied by the CVD or PVD method.
EP86114784A 1986-03-15 1986-10-24 Coated ceramic-rotary cutting plate Withdrawn EP0237622A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE3608734 1986-03-15
DE19863608734 DE3608734C1 (en) 1986-03-15 1986-03-15 Coated ceramic indexable insert

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EP0237622A1 true EP0237622A1 (en) 1987-09-23

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US5264297A (en) * 1990-03-09 1993-11-23 Kennametal Inc. Physical vapor deposition of titanium nitride on a nonconductive substrate
US5595814A (en) * 1994-06-01 1997-01-21 Ykk Corporation Wear resistant film

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DE10109523A1 (en) * 2001-02-28 2002-09-05 Ceram Tec Ag Innovative Cerami Component used for processing workpieces has hard material coating comprising intermediate layer between layers
DE102008026358A1 (en) * 2008-05-31 2009-12-03 Walter Ag Tool with metal oxide coating

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FR2243754A1 (en) * 1973-09-17 1975-04-11 Sandvik Ab
JPS57145088A (en) * 1981-02-27 1982-09-07 Hitachi Metals Ltd Clad ceramic tool
JPS5874585A (en) * 1981-10-26 1983-05-06 三菱マテリアル株式会社 Surface clad silicon nitride base sintered member for high speed cutting
JPS60127905A (en) * 1983-12-09 1985-07-08 Ngk Spark Plug Co Ltd High touchness ceramic tool

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FR2243754A1 (en) * 1973-09-17 1975-04-11 Sandvik Ab
JPS57145088A (en) * 1981-02-27 1982-09-07 Hitachi Metals Ltd Clad ceramic tool
JPS5874585A (en) * 1981-10-26 1983-05-06 三菱マテリアル株式会社 Surface clad silicon nitride base sintered member for high speed cutting
JPS60127905A (en) * 1983-12-09 1985-07-08 Ngk Spark Plug Co Ltd High touchness ceramic tool

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5264297A (en) * 1990-03-09 1993-11-23 Kennametal Inc. Physical vapor deposition of titanium nitride on a nonconductive substrate
US5595814A (en) * 1994-06-01 1997-01-21 Ykk Corporation Wear resistant film

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DE3608734C1 (en) 1987-01-02

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