EP0025694B1 - Bright nickel plating bath and process and composition therefor - Google Patents
Bright nickel plating bath and process and composition therefor Download PDFInfo
- Publication number
- EP0025694B1 EP0025694B1 EP80303183A EP80303183A EP0025694B1 EP 0025694 B1 EP0025694 B1 EP 0025694B1 EP 80303183 A EP80303183 A EP 80303183A EP 80303183 A EP80303183 A EP 80303183A EP 0025694 B1 EP0025694 B1 EP 0025694B1
- Authority
- EP
- European Patent Office
- Prior art keywords
- sulfonated
- nickel
- acetylenic compound
- compound
- per liter
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
- C25D3/14—Electroplating: Baths therefor from solutions of nickel or cobalt from baths containing acetylenic or heterocyclic compounds
- C25D3/16—Acetylenic compounds
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
Definitions
- This invention relates to improved processes and compositions for the electrodeposition of nickel and alloys thereof.
- this invention relates to an improved process and composition for the preparation of nickel or nickel alloy electrodeposits which comprises passing current from an anode to a cathode through an aqueous acidic electroplating solution containing:
- concentrations of said compounds are with a preferred range of
- Class I brighteners as used herein, and as described in Modern Electroplating, Third Edition, F. Lowenheim, Editor, is meant to include aromatic sulfonates, sulfonamides, sulfonimides, etc., as well as aliphatic or aromatic-aliphatic olefinically unsaturated sulfonates, sulfonamides, sulfonimides, etc. Specific examples of such plating additives are:
- plating additive compounds which may be used singly or in suitable combinations, are desirably employed in amounts ranging from about 0.5 to 10 grams per liter and provide the advantages described in the above reference and which are well known to those skilled in the art of nickel electroplating.
- Class II brighteners as used herein, and as described in Modern Electroplating, Third Edition, F. Lowenheim, Editor, is meant to include plating additive compounds such as reaction products of epoxides with alpha-hydroxy acetylenic alcohols such as diethoxylated 2-butyne-1,4-diol N-heterocyclics, dye-stuffs, acetylenic amines, etc.
- a Class II brightener When used alone or in combination, desirably in amounts ranging from about 5 to 1000 milligrams per liter, a Class II brightener may produce no visual effect on the electrodeposit, or may produce semi-lustrous, fine-grained deposits. However, best results are obtained when Class II brighteners are used with one or more Class I brighteners in order to provide optimum deposit luster, rate of brightening, leveling, bright plate current density range, low current density coverage, etc.
- anti-pitting or wetting agents as used herein is meant to include a material which functions to prevent or minimize gas pitting.
- An anti-pitting agent when used alone or in combination, desirably in amounts ranging from about 0.05 to 1 gram per liter, may also function to make the baths more compatible with contaminants, such as oil, grease, etc. by their emulsifying, dispersing, solubilizing, etc. action on such contaminants and thereby promote attaining of sounder deposits.
- Preferred anti-pitting agents may include sodium lauryl sulfate, sodium lauryl ether-sulfate and sodium di- alkylsulfosucbinates.
- the nickel compounts employed for electrodepositing nickel are typically added as the sulfate, chloride, sulfamate, or fluoborate salts.
- the sulfate, chloride, sulfamate and fluoborate salts of nickel are employed in concentrations sufficient to provide nickel in the electroplating solutions of this invention in concentrations ranging from about 10 to 150 grams per liter.
- the nickel compounds employed for electrodepositing nickel are typically added as the sulfate, grams per liter, preferably about 45 grams per liter of boric acid or other buffering agents to control the pH (e.g.; from about 3.0-5.0, preferably 4.0) and to prevent high current density burning.
- solution agitation may be employed. Air agitation, mechanical stirring, pumping, cathode rod and other means of solution agitation are all satisfactory. Additionally, the solutions may be operated without agitation.
- the operating temperature of the electroplating baths of this invention may range from about 40°C to about 70°C, preferably from about 50°C to 62°C.
- the average cathode current density may range from about 0.5 .to 12 amperes per square decimeter, with 3 to 6 amperes per square decimeter providing an optimum range.
- Typical aqueous nickel-containing electroplating solutions include the following wherein all concentrations are in grams per liter (g/l) unless otherwise indicated.
- the pH may normally tend to rise and may be adjusted with acids such as hydrochloric acid, sulfuric acid, etc.
- Anodes used in the above baths may be electrolytic or sulfur containing nickel bars, strips or small chunks in titanium baskets. All anodes are usually suitably covered with cloth or plastic bags of desired porosity to minimize introduction into the bath of metal particles, anode slime, etc. which may migrate to the cathode either mechanically or electrophoretically to give roughness in cathode deposits.
- the substrates on which the nickel electrodeposits of this invention may be applied may be metal or metal alloys such as are commonly electrodeposited and used in the art of electroplating such as nickel, cobalt, nickel-cobalt, copper, tin, brass, etc.
- Other typical substrate basis metals from which articles to be plated are manufactured may include ferrous metals such as iron, steel, alloy steels, copper, tin and alloys thereof such as with lead, alloys of copper such as brass, bronze, etc., zinc, particularly in the form of zinc-base die castings; all of which may bear plates of other metals, such as copper, etc.
- Basis metal substrates may have a variety of surface finishes depending on the final appearance desired, which in turn depends on such factors as luster, brilliance, leveling, thickness, etc. of the nickel electroplate applied on such substrates.
Abstract
Description
- This invention relates to improved processes and compositions for the electrodeposition of nickel and alloys thereof.
- It has been found that the presence of zinc impurities tends to produce plating defects during the electrodeposition of nickel electroplates using compositions containing primary and secondary brighteners. The problem is especially acute during plating when the secondary brightener is saccharin (o-benzoyl sulfimide). In this case inadequate basis metal coverage may occur in low current density areas; unsightly striated (ribbed) deposits may occur; and dark, thin non-metallic appearing deposits may be produced which not only detract from the final appearance of the article being plated, but may also interfere with the receptivity, appearance, luster, etc. of subsequent deposits such as chromium plate.
- In order to overcome the deleterious effects of zinc in the presence of saccharin, the use of sulfinic acids or hydroxy-sulfonates has been used.
- While these compounds do reduce the problem, their use also reduces the overall brightness and levelling of the deposit. This results in having to use thicker nickel deposits or higher levels of the primary additives in order to obtain commercially acceptable deposits.
- An alternative approach has been to replace saccharin with another Class I additive, i.e., sodium benzene sulfonamide, sodium toluene sulfonate. These Class I additives while not as sensitive to zinc impurities as is saccharin, are inferior to saccharin with respect to stress reduction, luster building (in cooperation with Class II additives), sulfur contribution (especially important in duplex plating).
- It is an object of this invention to provide processes and compositions for depositing electrodeposits of nickel in the presence of saccharin and zinc impurities. It is also an object of this invention to accomplish this without affecting the brightness or levelling of the deposit.
- In accordance with certain of its aspects, this invention relates to an improved process and composition for the preparation of nickel or nickel alloy electrodeposits which comprises passing current from an anode to a cathode through an aqueous acidic electroplating solution containing:
- (1) at least one nickel compound
- (2) saccharin
- (3) zinc ions
-
- Examples of sulfonated acetylenics of this invention, but not restricted thereto, are
- 2-butyne-1,4-disulfonic acid
- 2-butyne sulfonic acid
- propyne sulfonic acid
- 1-butyne sulfonic acid
- 1-pentyne sulfonic acid
- The baths of this invention may also contain an effective amount of at least one member selected from the group consisting of:
- (a) other Class I brighteners in addition to saccharin
- (b) Class brighteners
- (c) anti-pitting or wetting agents.
- The term "Class I brighteners" as used herein, and as described in Modern Electroplating, Third Edition, F. Lowenheim, Editor, is meant to include aromatic sulfonates, sulfonamides, sulfonimides, etc., as well as aliphatic or aromatic-aliphatic olefinically unsaturated sulfonates, sulfonamides, sulfonimides, etc. Specific examples of such plating additives are:
- (1) disodium 1,5-naphthalene disulfonate
- (2) trisodium 1,3,6-naphthalene trisulfonate
- ' (3) sodium benzene monosulfonate
- (4) dibenzene sulfonimide
- (5) sodium 3-chloro-2-butene-1-sulfonate
- (6) sodium ß-styrene sulfonate
- (7) sodium allyl sulfonate
- (8) monoallyl sulfamide
- (9) diallyl sulfamide
- (10) allyl sulfonamide
- Such plating additive compounds, which may be used singly or in suitable combinations, are desirably employed in amounts ranging from about 0.5 to 10 grams per liter and provide the advantages described in the above reference and which are well known to those skilled in the art of nickel electroplating.
- The term "Class II brighteners" as used herein, and as described in Modern Electroplating, Third Edition, F. Lowenheim, Editor, is meant to include plating additive compounds such as reaction products of epoxides with alpha-hydroxy acetylenic alcohols such as diethoxylated 2-butyne-1,4-diol N-heterocyclics, dye-stuffs, acetylenic amines, etc.
- Specific examples of such plating additives are:
- (1) 1,4-di-(ß-hydroxyethoxy)-2-butyne
- (2) 1,4-di-(β-hydroxy-γ-chloropropoxy)-2-butyne
- (3) 1,4-di-(β-,γ-epoxypropoxy)-2-butyne
- (4) 1,3-di-(β-hydroxy-γ-butenoxy)-2-butyne
- (5) 1,4-di-(2'-hydroxy-4'-oxa-6'-heptenoxy)-2-butyne
- (6) N-(2,3-dichloro-2-propenyl) pyridinium chloride
- (7) 2,4,6-trimethyl N-propargyl pyridinium bromide
- (8) N-allylquinaldinium bromide
- (9) 2-butyne-1,4-diol
- (10) propargyl alcohol
- (11) 2-methyl-3-butyn-2-ol
- (12) quinaldyl-N-propanesulfonic acid betaine
- (13) butynoxy ethane sulfonic acids
- (14) propynoxy ethane sulfonic acids
- (15) quinaldine dimethyl sulfate
- (16) N-allylpyridinium bromide
- (17) isoquinaldyl-N-propanesulfonic acid betaine
- (18) isoquinaldine dimethyl sulfate
- (19) N-allylisoquinaldine bromide
- (20) 1,4-di-(β-sulfoethoxy)-2-butyne
- (21) 3-(β-hydroxyethoxy)-propyne
- (22) 3-(β-hydroxypropoxy)-propyne
- (23) 3-(β-sulfoethoxy)-propyne
- (24) phenosafranin
- (25) fuchsin
- (26) propargyl amine
- (27) 1-diethylamino-2-propyne
- (28) 5-dimethyiamino-2-methyi-3-pentyn-2-ol
- (29) 1-dimethylamino-2-pentyne
- (30) 1-dimethylamino-2-butyne
- When used alone or in combination, desirably in amounts ranging from about 5 to 1000 milligrams per liter, a Class II brightener may produce no visual effect on the electrodeposit, or may produce semi-lustrous, fine-grained deposits. However, best results are obtained when Class II brighteners are used with one or more Class I brighteners in order to provide optimum deposit luster, rate of brightening, leveling, bright plate current density range, low current density coverage, etc.
- The term "anti-pitting or wetting agents" as used herein is meant to include a material which functions to prevent or minimize gas pitting. An anti-pitting agent, when used alone or in combination, desirably in amounts ranging from about 0.05 to 1 gram per liter, may also function to make the baths more compatible with contaminants, such as oil, grease, etc. by their emulsifying, dispersing, solubilizing, etc. action on such contaminants and thereby promote attaining of sounder deposits. Preferred anti-pitting agents may include sodium lauryl sulfate, sodium lauryl ether-sulfate and sodium di- alkylsulfosucbinates.
- The nickel compounts employed for electrodepositing nickel are typically added as the sulfate, chloride, sulfamate, or fluoborate salts. The sulfate, chloride, sulfamate and fluoborate salts of nickel are employed in concentrations sufficient to provide nickel in the electroplating solutions of this invention in concentrations ranging from about 10 to 150 grams per liter.
- The nickel compounds employed for electrodepositing nickel are typically added as the sulfate, grams per liter, preferably about 45 grams per liter of boric acid or other buffering agents to control the pH (e.g.; from about 3.0-5.0, preferably 4.0) and to prevent high current density burning.
- In order to prevent "burning" of high current density areas, and provide for more even temperature control of the solution, solution agitation may be employed. Air agitation, mechanical stirring, pumping, cathode rod and other means of solution agitation are all satisfactory. Additionally, the solutions may be operated without agitation.
- The operating temperature of the electroplating baths of this invention may range from about 40°C to about 70°C, preferably from about 50°C to 62°C.
- The average cathode current density may range from about 0.5 .to 12 amperes per square decimeter, with 3 to 6 amperes per square decimeter providing an optimum range.
-
- During bath operation, the pH may normally tend to rise and may be adjusted with acids such as hydrochloric acid, sulfuric acid, etc.
- Anodes used in the above baths may be electrolytic or sulfur containing nickel bars, strips or small chunks in titanium baskets. All anodes are usually suitably covered with cloth or plastic bags of desired porosity to minimize introduction into the bath of metal particles, anode slime, etc. which may migrate to the cathode either mechanically or electrophoretically to give roughness in cathode deposits.
- The substrates on which the nickel electrodeposits of this invention may be applied may be metal or metal alloys such as are commonly electrodeposited and used in the art of electroplating such as nickel, cobalt, nickel-cobalt, copper, tin, brass, etc. Other typical substrate basis metals from which articles to be plated are manufactured may include ferrous metals such as iron, steel, alloy steels, copper, tin and alloys thereof such as with lead, alloys of copper such as brass, bronze, etc., zinc, particularly in the form of zinc-base die castings; all of which may bear plates of other metals, such as copper, etc. Basis metal substrates may have a variety of surface finishes depending on the final appearance desired, which in turn depends on such factors as luster, brilliance, leveling, thickness, etc. of the nickel electroplate applied on such substrates.
- It is in the electroplating of zinc base die castings that the application of this invention is very useful, as die castings fall into the electroplating solution and cause high levels of zinc impurities. These impurities in the presence of saccharin cause the unsightly electrodeposits mentioned previously and can result in high operating costs.
- The addition or inclusion of specified amounts of a sulfonated acetylenic compound or salts thereof, where the acetylenic bond and the sulfonate radical are connected by a carbon chain where C = 1-6, to an aqueous acidic nickel electroplating containing saccharin and zinc impurities, will result in a bright, well leveled deposit free from the previously mentioned defects.
-
- The conditions for plating the panels from the above aqueous nickel electroplating compositions were as follows:
- A zinc coated steel test panel was stripped in 50% hydrochloric acid, rinsed and then scribed with a horizontal single pass of 4/0 grit emery polishing paper and another scribe in a similar manner with #2 grit emery polishing paper. The cleaned panel was then plated in a 267 ml Hull Cell using the aforementioned compositions for 10 minutes at 2 amps. cell current, using cathode rod agitation.
-
- Panel 1 - Shows a bright, well leveled deposit, with low current density skip plate, severe darkness and striations.
- Panel 2 - Shows a bright, well leveled deposit, free from defects, over the entire current density range.
- Panel 3 - Shows a bright, well leveled deposit with only a very small amount of low current density darkness.
the improvement comprising the presence of a sulfonated acetylenic compound or salts thereof, where the acetylenic bond and the sulfonate radical are connected directly by a carbon atom or a carbon chain of not more than six carbon atoms.
Claims (12)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
AT80303183T ATE6873T1 (en) | 1979-09-13 | 1980-09-10 | BRIGHT NICKEL PLATING BATH AND METHOD AND COMPOSITION THEREOF. |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US7495379A | 1979-09-13 | 1979-09-13 | |
US74953 | 1979-09-13 |
Publications (2)
Publication Number | Publication Date |
---|---|
EP0025694A1 EP0025694A1 (en) | 1981-03-25 |
EP0025694B1 true EP0025694B1 (en) | 1984-03-28 |
Family
ID=22122633
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP80303183A Expired EP0025694B1 (en) | 1979-09-13 | 1980-09-10 | Bright nickel plating bath and process and composition therefor |
Country Status (11)
Country | Link |
---|---|
EP (1) | EP0025694B1 (en) |
JP (1) | JPS5647583A (en) |
AT (1) | ATE6873T1 (en) |
AU (1) | AU532948B2 (en) |
BR (1) | BR8005852A (en) |
DE (1) | DE3067275D1 (en) |
ES (1) | ES8205437A1 (en) |
HK (1) | HK80384A (en) |
MX (1) | MX153967A (en) |
NZ (1) | NZ194923A (en) |
ZA (1) | ZA805658B (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4699696A (en) * | 1986-04-15 | 1987-10-13 | Omi International Corporation | Zinc-nickel alloy electrolyte and process |
DE3632514A1 (en) * | 1986-09-22 | 1988-03-24 | Schering Ag | (ALPHA) -HYDROXI PROPINE SULPHONIC ACID AND ITS SALTS, ACID NICKELBEDER CONTAINING THESE COMPOUNDS AND METHOD FOR THE PRODUCTION THEREOF |
WO2018015168A1 (en) | 2016-07-18 | 2018-01-25 | Basf Se | Composition for cobalt plating comprising additive for void-free submicron feature filling |
EP3680366A4 (en) * | 2017-09-06 | 2021-06-09 | Kanto Denka Kogyo Co., Ltd. | Electrode and production method therefor, and production method for regenerated electrode |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3719568A (en) * | 1970-12-11 | 1973-03-06 | Oxy Metal Finishing Corp | Nickel electroplating composition and process |
US3825478A (en) * | 1972-10-30 | 1974-07-23 | Oxy Metal Finishing Corp | Electrolyte and method for electrodepositing microporous chromium-nickel composite coatings |
US3884773A (en) * | 1973-08-17 | 1975-05-20 | Metalux Corp | Electrodeposition of nickel |
BR7410536D0 (en) * | 1973-12-27 | 1975-09-02 | Du Pont | BATH BRIGHTENING ADDITIVE AND ELECTRODEPOSITION PROCESS WELL AS A PROCESS TO MANUFACTURE THE ADDITIVE ADDITIVE |
US4016051A (en) * | 1975-05-02 | 1977-04-05 | Starlite Chemicals, Inc. | Additives for bright plating nickel, cobalt and nickel-cobalt alloys |
CA1069850A (en) * | 1975-12-04 | 1980-01-15 | Mcgean Chemical Company | Low temperature bright nickel and bright nickel alloy plating |
-
1980
- 1980-09-10 DE DE8080303183T patent/DE3067275D1/en not_active Expired
- 1980-09-10 EP EP80303183A patent/EP0025694B1/en not_active Expired
- 1980-09-10 AT AT80303183T patent/ATE6873T1/en not_active IP Right Cessation
- 1980-09-11 JP JP12661080A patent/JPS5647583A/en active Granted
- 1980-09-11 NZ NZ194923A patent/NZ194923A/en unknown
- 1980-09-12 ZA ZA00805658A patent/ZA805658B/en unknown
- 1980-09-12 ES ES495007A patent/ES8205437A1/en not_active Expired
- 1980-09-12 BR BR8005852A patent/BR8005852A/en unknown
- 1980-09-12 AU AU62365/80A patent/AU532948B2/en not_active Ceased
- 1980-09-12 MX MX183921A patent/MX153967A/en unknown
-
1984
- 1984-10-25 HK HK803/84A patent/HK80384A/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
JPS6252035B2 (en) | 1987-11-02 |
ES495007A0 (en) | 1982-06-01 |
BR8005852A (en) | 1981-03-24 |
ATE6873T1 (en) | 1984-04-15 |
MX153967A (en) | 1987-03-03 |
EP0025694A1 (en) | 1981-03-25 |
JPS5647583A (en) | 1981-04-30 |
ES8205437A1 (en) | 1982-06-01 |
NZ194923A (en) | 1982-05-25 |
AU6236580A (en) | 1981-03-19 |
DE3067275D1 (en) | 1984-05-03 |
AU532948B2 (en) | 1983-10-20 |
ZA805658B (en) | 1982-03-31 |
HK80384A (en) | 1984-11-02 |
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