EP0003551A1 - Method for the manufacture of electrically conductive or nonconductive layers for improved adherence of luminescent material to planar or unidirectionally curved substrates for colour picture screens - Google Patents

Method for the manufacture of electrically conductive or nonconductive layers for improved adherence of luminescent material to planar or unidirectionally curved substrates for colour picture screens Download PDF

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Publication number
EP0003551A1
EP0003551A1 EP79100268A EP79100268A EP0003551A1 EP 0003551 A1 EP0003551 A1 EP 0003551A1 EP 79100268 A EP79100268 A EP 79100268A EP 79100268 A EP79100268 A EP 79100268A EP 0003551 A1 EP0003551 A1 EP 0003551A1
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Prior art keywords
layer
silicon
tin
phosphor
planar
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EP79100268A
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German (de)
French (fr)
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EP0003551B1 (en
Inventor
Manfred Dr. Kobale
Rolf Dr. Dipl.-Phys. Wengert
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Siemens AG
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Siemens AG
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/20—Manufacture of screens on or from which an image or pattern is formed, picked up, converted or stored; Applying coatings to the vessel
    • H01J9/22—Applying luminescent coatings
    • H01J9/227—Applying luminescent coatings with luminescent material discontinuously arranged, e.g. in dots or lines
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
    • H01J29/02—Electrodes; Screens; Mounting, supporting, spacing or insulating thereof
    • H01J29/10—Screens on or from which an image or pattern is formed, picked up, converted or stored
    • H01J29/18—Luminescent screens
    • H01J29/22—Luminescent screens characterised by the binder or adhesive for securing the luminescent material to its support, e.g. vessel
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
    • H01J29/02—Electrodes; Screens; Mounting, supporting, spacing or insulating thereof
    • H01J29/10—Screens on or from which an image or pattern is formed, picked up, converted or stored
    • H01J29/18—Luminescent screens
    • H01J29/28—Luminescent screens with protective, conductive or reflective layers

Definitions

  • the present patent application relates to a method for producing electrically conductive or non-conductive layers for improved fluorescent adhesion on planar or unidirectionally curved substrates for color screens and image display devices, in which suspensions with the addition of glass-forming and / or glass-forming agents serving as adhesion promoters are added to the screen glass plate serving as substrate. or additives forming electrical layers are applied.
  • a process for the production of phosphor dots for picture tubes can be found, in which the phosphor dots are applied by a combination of printing and photographic technology, the phosphors mixed with the photosensitive material and glass powder printed, exposed, developed and be fused with the glass.
  • the silicon and / or tin salts of the lower carboxylic acids such as tetraacetoxysilane and / or tetraacetoxystannane in acetoacetic ester, dissolved in alcohol, or to use lower mono- and / or dicarboxylic acids dissolved in alcohol all or part of their anion is substituted by silicon and / or tin halides.
  • organometallic compounds such as. B. halides of silicon and / or tin, which are partially substituted on their anions by acid residues of lower mono- and / or dicarboxylic acids and by hydroxyl or alcohol residues of lower alcohols.
  • Antimony or indium compounds are added as dopants when using organic tin compounds.
  • Alcohols and carboxylic acids that contain fewer or at most four carbon atoms in a chain are used as solvents.
  • the layer thickness of the applied layer is adjusted so that it lies in the range from 100 to 500 nm after drying.
  • the starting layer thickness is set to 1 to 3 / um on average.
  • the layer applied by dipping, spraying or spin coating onto the glass screen plate is dried at 150 ° C., where it is still relatively soft and deformable. Only at temperatures up to approx. 500 ° C does a chemically resistant, hard silicon dioxide layer develop, which can also be electrically conductive through the addition of doped tin oxide.
  • the phosphor suspensions are applied to the layer dried at 150 ° C. by spraying or printing according to the double mask raster process and during the tempering with the z. B. anchored conductive adhesive layer.
  • the SiO 2 coating liquid (Merck, ZLI 902) is a solution of tetraacetoxysilane Si (02C2H3) 4 in acetoacetic ester and ethanol. It is sprayed undiluted and without additives with a drip-free spray gun from above at a distance of approx. 15 cm onto a horizontally lying substrate, so that a layer of approx. 3 / um thickness results.
  • the substrate is a flat or one-way curved screen glass.
  • the substrate After spraying on this adhesive layer, the substrate is dried at a maximum of 150 ° C. Then the phosphor is applied such. B. in the patent application P ........ « (VPA 78 P 1010), according to the double mask raster process. Finally, the substrate is annealed in air at 450 ° C for one to two hours.
  • the phosphor layer 3 is, as shown in the figure, firmly absorbed in the densifying adhesive layer 2, which is formed as an SiO 2 layer, and thus a good adhesive strength of the phosphor layer (2, 3) is achieved on the substrate 1.
  • the tin oxide coating liquid with antimony doping (Merck ZLI 1079) is sprayed on undiluted with a drip-free spray gun, as in exemplary embodiment 1.
  • the substrate 1 is again a screen glass as it is also used in the patent application P ........ together (VPA 78 P 1010).
  • the phosphor coating 3 is carried out as described in example 1.
  • By heating of the screen 1 at 450 0 C in air for 1 to 2 hours condenses the solderable, antimony-doped conductive tin oxide layer 2 and takes over the phosphor layer 3. In this way, good adhesion of the phosphor layer (2, 3) to the substrate 1 is achieved at the same time as building up a conductive layer 2 under the phosphor surfaces (3).

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Formation Of Various Coating Films On Cathode Ray Tubes And Lamps (AREA)
  • Surface Treatment Of Glass (AREA)

Abstract

Für ein Verfahren zum Herstellen gut haftender Leuchtstoffschichten (3) für Farb-Bildschirme und Farb-Bildanzeigegeräte wird erfindungsgemäß vorgeschlagen, die innere Oberfläche des Schirmglases (1) mit einer Siliciumdioxidschicht und/oder dotierten Zinnoxidschicht zu versehen, wobei als Ausgangsmaterialien alkoholische Lösungen von sauerstoffreichen organischen Silicium- und/oder Zinnverbindungen verwendet werden, und zwischen dem Trocknen und Tempern dieser Schicht (2) die Leuchtstoffschichten (3) aufzubringen.For a method for producing well-adhering phosphor layers (3) for color screens and color image display devices, the invention proposes to provide the inner surface of the screen glass (1) with a silicon dioxide layer and / or doped tin oxide layer, using alcoholic solutions of oxygen-rich organic as starting materials Silicon and / or tin compounds are used, and the phosphor layers (3) are applied between the drying and annealing of this layer (2).

Description

Die vorliegende Patentanmeldung betrifft ein Verfahren zur Herstellung von elektrisch leitenden oder nichtleitenden Schichten für verbesserte Leuchtstoffhaftung auf planen oder in einer Richtung gekrümmten Substraten für Farbbildschirme und -Bildanzeigegeräte, bei dem auf die als Substrat dienende Schirmglasplatte Suspensionen unter Zusatz von als Haftvermittler dienenden, glasbildenden und/oder elektrische Schichten bildenden Zusätzen aufgebracht werden.The present patent application relates to a method for producing electrically conductive or non-conductive layers for improved fluorescent adhesion on planar or unidirectionally curved substrates for color screens and image display devices, in which suspensions with the addition of glass-forming and / or glass-forming agents serving as adhesion promoters are added to the screen glass plate serving as substrate. or additives forming electrical layers are applied.

Für die hohe Lebensdauer von Leuchtschirmen ist eine gute Haftung der Leuchtstoff(Phosphor)-Schicht auf dem Bildschirm Voraussetzung. Außerdem ist erwünscht, die Weichglasoberfläche auf der dem Phosphor zugewandten Seite zu vergüten, um z. B. Gas-Ionen-Ausbrüche während des ElektronenbeschuBes zu reduzieren. Ein weiteres Ziel ist der Aufbau leitfähiger Unterschichten zur elektrischen Ableitung, um eine elektrostatische Aufladung der Glasoberfläche zu verhindern.Good adhesion of the phosphor (phosphor) layer on the screen is a prerequisite for the long service life of fluorescent screens. In addition, it is desirable to temper the soft glass surface on the side facing the phosphorus in order, for. B. gas ion outbreaks during to reduce electron bombardment. Another goal is to build conductive sublayers for electrical dissipation to prevent electrostatic charging of the glass surface.

Es ist bekannt, durch Zusatz von Wasserglas (K2Si03) zu Leuchtstoffsuspensionen die Haftfestigkeit der dadurch hergestellten Leuchtstoffschichten auf den als Substrat dienenden Schirmgläsern zu verbessern und gleichzeitig dieKohäsion der Leuchtstoffschicht in sich zu erhöhen. Nach dem Tempern sind die einzelnen Leuchtstoffpartikel sowohl untereinander als auch mit der Glasoberfläche durch eine dünne alkalische Glasschicht verbunden.It is known, by adding water glass (K 2 Si0 3 ) to phosphor suspensions, to improve the adhesive strength of the phosphor layers produced thereby on the screen glasses serving as substrate and at the same time to increase the cohesion of the phosphor layer. After annealing, the individual phosphor particles are connected to each other as well as to the glass surface by a thin, alkaline glass layer.

Zur Glasvergtituag wurde auch vorgeschlagen, das Schirmglas mit Siliciumdioxid zu bedampfen oder zu besputtern.At Glasvergtituag, it was also proposed to vapor-coat or sputter the screen glass with silicon dioxide.

Aus der DT-OS 25 40 132 ist ein Verfahren zur Herstellung von Leuchtstoffpunkten für Bildröhren zu entnehmen, bei dem die Leuchtstoffpunkte durch eine Kombination Druck- und Fototechnik aufgebracht werden, wobei die Leuchtstoffe mit dem lichtempfindlichen Material und Glaspulver gemischt aufgedruckt, belichtet, entwickelt und mit dem Glas verschmolzen werden.From DT-OS 25 40 132 a process for the production of phosphor dots for picture tubes can be found, in which the phosphor dots are applied by a combination of printing and photographic technology, the phosphors mixed with the photosensitive material and glass powder printed, exposed, developed and be fused with the glass.

Die Erfindung stellt sich nun die Aufgabe, einen Bildschirm herzustellen, bei dem neben den drei zu erfüllenden Forderungen:

  • 1. Vergütung der Glasoberfläche,
  • 2. Einbau wirksamer Haftvermittler in die Leuchtstoffschicht und
  • 3. Leitfähigkeit der Unterschicht, auch die Phosphorschicht in ihren Leuchteigenschaften, insbesondere in Bezug auf niederenergetische Kathodenstrahl-Anregung (kleiner 10 keV) nicht verschlechtert wird.
The object of the invention is now to produce a screen in which, in addition to the three requirements to be met:
  • 1. coating of the glass surface,
  • 2. Installation of effective adhesion promoters in the phosphor layer and
  • 3. Conductivity of the lower layer, also the phosphor layer in its luminous properties, in particular in relation to low-energy cathode ray excitation (less than 10 keV) is not deteriorated.

Zur Lösung dieser Aufgabe wird erfindungsgemäß vorgeschlagen, die Oberfläche der Schirmglasplatte vor der Leuchtstoffbeschichtung mit einer alkoholischen Lösung von sauerstoffreichen organischen Silicium- und/oder mit Dotierungsatomen versehenen Zinnverbindungen zu beschichten, nach dem Antrocknen dieser Schicht die Leuchtstoffbeschichtung durchzuführen und dann in einem Temperprozeß die Leuchtstoffe in der beim Tempern gebildeten Siliciumdioxidschicht und/oder dotierten Zinnoxidschicht zu verankern.To achieve this object, it is proposed according to the invention to coat the surface of the screen glass plate before the phosphor coating with an alcoholic solution of oxygen-rich organic silicon and / or tin compounds provided with doping atoms, to carry out the phosphor coating after this layer has dried and then to carry out the phosphors in an annealing process to anchor the silicon dioxide layer and / or doped tin oxide layer formed during the tempering.

Dabei liegt es im Rahmen des Erfindungsgedankens, die Silicium- und/oder Zinnsalze der niederen Karbonsäuren, wie Tetraacetoxysilan und/oder Tetraacetoxystannan in Acetessigester, in Alkohol gelöst, aufzubringen oder auch in Alkohol gelöste niedere Mono- und/oder Dicarbonsäuren zu verwenden, die an ihrem Anion ganz oder teilweise durch Silicium- und/oder Zinnhalogenide substituiert sind.It is within the scope of the inventive concept to apply the silicon and / or tin salts of the lower carboxylic acids, such as tetraacetoxysilane and / or tetraacetoxystannane in acetoacetic ester, dissolved in alcohol, or to use lower mono- and / or dicarboxylic acids dissolved in alcohol all or part of their anion is substituted by silicon and / or tin halides.

Es ist aber auch möglich, andere metallorganische Verbindungen zu verwenden, wie z. B. Halogenide von Silicium und/oder Zinn, die an ihren Anionen teilweise durch Säurereste von niederen Mono- und/oder Dicarbonsäuren und durch Hydroxyl- oder Alkoholreste niederer Alkohole substituiert sind.But it is also possible to use other organometallic compounds, such as. B. halides of silicon and / or tin, which are partially substituted on their anions by acid residues of lower mono- and / or dicarboxylic acids and by hydroxyl or alcohol residues of lower alcohols.

Als Dotierstoffe werden bei Verwendung organischer Zinnverbindungen Antimon- oder Indiumverbindungen beigemischt.Antimony or indium compounds are added as dopants when using organic tin compounds.

Als Lösungsmittel werden Alkohole und Karbonsäuren verwendet, die weniger oder maximal vier Kohlenstoffatome in einer Kette enthalten.Alcohols and carboxylic acids that contain fewer or at most four carbon atoms in a chain are used as solvents.

In einer Weiterbildung des Erfindungsgedankens ist vorgesehen, die Schichtdicke der aufgebrachten Schicht so einzustellen, daß sie nach dem Trocknen im Bereich von 100 bis 500 nm liegt. Dabei wird die Ausgangsschichtdicke im Mittel auf 1 bis 3/um eingestellt.In a further development of the inventive concept, it is provided that the layer thickness of the applied layer is adjusted so that it lies in the range from 100 to 500 nm after drying. The starting layer thickness is set to 1 to 3 / um on average.

Gemäß einem Ausführungsbeispiel nach der Lehre der Erfindung wird die durch Tauchen, Besprühen oder Aufschleudern auf die Schirmglasplatte aufgebrachte Schicht bei 150°C getrocknet, wo sie noch verhältnismäßig weich und verformbar ist. Erst bei Temperaturen bis ca. 500°C entsteht dann eine chemisch-widerstandsfähige, harte Siliciumdioxidschicht, die durch den Zusatz von dotiertem Zinnoxid auch elektrisch leitfähig sein kann.According to an embodiment according to the teaching of the invention, the layer applied by dipping, spraying or spin coating onto the glass screen plate is dried at 150 ° C., where it is still relatively soft and deformable. Only at temperatures up to approx. 500 ° C does a chemically resistant, hard silicon dioxide layer develop, which can also be electrically conductive through the addition of doped tin oxide.

Vor dieser Temperung werden auf die bei 150°C getrocknete Schicht die Leuchtstoffsuspensionen durch Sprühen oder Drucken nach dem Doppelmasken-Rasterverfahren aufgebracht und bei der Temperung mit der z. B. leitfähigen Haftschicht verankert.Before this tempering, the phosphor suspensions are applied to the layer dried at 150 ° C. by spraying or printing according to the double mask raster process and during the tempering with the z. B. anchored conductive adhesive layer.

Weitere Einzelheiten der Erfindung sollen anhand von zwei Ausführungsbeispielen und der in der Zeichnung befindlichen Figur noch näher erläutert werden.Further details of the invention will be explained in more detail with reference to two exemplary embodiments and the figure in the drawing.

Ausführungsbeispiel 1Embodiment 1

Die SiO2-Beschichtungsflüssigkeit (Merck, ZLI 902) ist eine Lösung von Tetraacetoxysilan Si(02C2H3)4 in Acetessigester und Äthanol. Sie wird unverdünnt und ohne Zusätze mit einer tropffreien Sprühpistole von oben aus in einem Abstand von ca. 15 cm fein zerstäubt auf ein waagerecht liegendes Substrat gesprüht, so daß sich eine Schicht von ca. 3/um Dicke ergibt. Das Substrat ist ein planes oder in einer Richtung gekrümmtes Schirmglas.The SiO 2 coating liquid (Merck, ZLI 902) is a solution of tetraacetoxysilane Si (02C2H3) 4 in acetoacetic ester and ethanol. It is sprayed undiluted and without additives with a drip-free spray gun from above at a distance of approx. 15 cm onto a horizontally lying substrate, so that a layer of approx. 3 / um thickness results. The substrate is a flat or one-way curved screen glass.

Nach dem Aufsprühen dieser Haftschicht wird das Substrat bei maximal 150°C getrocknet. Anschließend erfolgt der Leuchtstoff-Auftrag wie z. B. in der Patentanmeldung P.............. (VPA 78 P 1010) beschrieben, nach dem Doppelmasken-Rasterverfahren. Schließlich wird das Substrat an Luft bei 450°C für ein bis zwei Stunden getempert. Die Leuchtstoffschicht 3 wird dabei, wie in der Fig. abgebildet, in der sich verdichtenden Haftschicht 2, die sich als Si02-Schicht ausbildet, fest aufgenommen und somit eine gute Haftfestigkeit der Leuchtstoffschicht (2, 3) auf dem Substrat 1 erreicht.After spraying on this adhesive layer, the substrate is dried at a maximum of 150 ° C. Then the phosphor is applied such. B. in the patent application P .............. (VPA 78 P 1010), according to the double mask raster process. Finally, the substrate is annealed in air at 450 ° C for one to two hours. The phosphor layer 3 is, as shown in the figure, firmly absorbed in the densifying adhesive layer 2, which is formed as an SiO 2 layer, and thus a good adhesive strength of the phosphor layer (2, 3) is achieved on the substrate 1.

Ausführungsbeispiel 2Embodiment 2

Die Zinnoxid-Beschichtungsflüssigkeit mit Antimon-Dotierung (Merck ZLI 1079) wird mit einer tropffreien Sprühpistole unverdünat, wie im Ausführungsbeispiel 1, aufgesprüht. Das Substrat 1 ist wieder ein Schirmglas wie es auch in der Patentanmeldung P.............. (VPA 78 P 1010) verwendet wird. Nach dem Trocknen der Schicht 2 bei ca. 100°C erfolgt die Leuchtstoffbeschichtung 3 wie in Beispiel 1 beschrieben. Durch Temperung des Schirmes 1 bei 4500C an Luft für 1 bis 2 Stunden verdichtet sich die lötfähige, antimondotierte, leitfähige Zinnoxidschicht 2 und nimmt die Leuchtstoffschicht 3 auf. Damit ist gleichzeitig zum Aufbau einer leitfähigen Schicht 2 unter den Leuchtstoffflächen (3) eine gute Haftfestigkeit der Leuchtstoffschicht (2, 3) auf dem Substrat 1 erreicht.The tin oxide coating liquid with antimony doping (Merck ZLI 1079) is sprayed on undiluted with a drip-free spray gun, as in exemplary embodiment 1. The substrate 1 is again a screen glass as it is also used in the patent application P .............. (VPA 78 P 1010). After layer 2 has dried at approximately 100 ° C., the phosphor coating 3 is carried out as described in example 1. By heating of the screen 1 at 450 0 C in air for 1 to 2 hours condenses the solderable, antimony-doped conductive tin oxide layer 2 and takes over the phosphor layer 3. In this way, good adhesion of the phosphor layer (2, 3) to the substrate 1 is achieved at the same time as building up a conductive layer 2 under the phosphor surfaces (3).

Claims (10)

1. Verfahren zur Herstellung von elektrisch leitenden oder nichtleitenden Schichten für verbesserte Leuchtstoffhaftung auf planen oder in einer Richtung gekrümmten Substraten für Farbbildschirme und -Bildanzeigegeräte, bei dem auf die als Substrat dienende Schirmglasplatte Suspensionen unter Zusatz von als Haftvermittler dienenden, glasbildenden und/oder elektrische Leitschichten bildenden Zusätzen aufgebracht werden, d a - durch gekennzeichnet , daB die Oberfläche der Schirmglasplatte vor der Leuchtstoffbeschichtung mit einer alkoholischen Lösung von sauerstoffreichen, organischen Silicium- und/oder mit Dotierungsatomen versehenen Zinnverbindungen beschichtet wird, daß nach Antrocknen dieser Schicht die Leuchtstoffbeschichtung durchgeführt wird und daß dann in einem TemperprozeB die Leuchtstoffe in der beim Tempern gebildeten Siliciumdioxidschicht und/oder dotierten Zinnoxidschicht verankert werden.1. A process for the production of electrically conductive or non-conductive layers for improved fluorescent adhesion on planar or unidirectionally curved substrates for color screens and image display devices, in which suspensions are added to the screen glass plate serving as substrate with the addition of glass-forming and / or electrical conductive layers serving as adhesion promoters forming additives are applied, characterized in that the surface of the screen glass plate is coated with an alcoholic solution of oxygen-rich, organic silicon and / or tin compounds provided with doping atoms before the phosphor coating, that after this layer has dried, the phosphor coating is carried out and then in a tempering process, the phosphors are anchored in the silicon dioxide layer and / or doped tin oxide layer formed during the tempering. 2. Verfahren nach Anspruch 1, dadurch gekennzeichnet, daß die Silicium- und/oder Zinnsalze der niederen Karbonsäuren, wie Tetraacetoxysilan und/oder Tetraacetoxystannan in Acetessigester, in Alkohol gelöst, aufgebracht werden.2. The method according to claim 1, characterized in that the silicon and / or tin salts of the lower carboxylic acids, such as tetraacetoxysilane and / or tetraacetoxystannane in acetoacetic ester, dissolved in alcohol, are applied. 3. Verfahren nach Anspruch 1, dadurch gekennzeichnet, daß niedere Mono- und/oder Dicarbonsäuren verwendet werden, die an ihrem Anion ganz oder teilweise durch Silicium- und/oder Zinnhalogenide substituiert sind, in Alkohol gelöst, verwendet werden.3. The method according to claim 1, characterized in that lower mono- and / or dicarboxylic acids are used which are entirely or partially substituted on their anion by silicon and / or tin halides, dissolved in alcohol, used. 4. Verfahren nach Anspruch 1, dadurch gekennzeichnet, daß Halogenide von Silicium und/oder Zinn, die an ihren Anionen teilweise durch Säurereste von niederen Mono- und/oder Dicarbonsäuren substituiert sind, oder Halogenide von Silicium und/oder Zinn, die an ihren Anionen teilweise durch Säurereste von niederen Mono- und/oder Dicarbonsäuren und durch Hydroxyl- oder Alkoholreste niederer Alkohole substituiert sind, verwendet werden.4. The method according to claim 1, characterized in that halides of silicon and / or tin, which are partially substituted on their anions by acid residues of lower mono- and / or dicarboxylic acids, or halides of silicon and / or tin, which on their anions are partially substituted by acid residues of lower mono- and / or dicarboxylic acids and by hydroxyl - or alcohol residues of lower alcohols are used. 5. Verfahren nach Anspruch 1 bis 4, dadurch gekennzeichnet, daß als Dotierstoffe bei Verwendung organischer Zinnverbindungen Antimon- oder Indiumverbindungen beigemischt werden.5. The method according to claim 1 to 4, characterized in that antimony or indium compounds are added as dopants when using organic tin compounds. 6. Verfahren nach Anspruch 1 bis 5, dadurch gekennzeichnet, daß Alkohole und Karbonsäuren verwendet werden, die weniger oder maximal vier Kohlenstoffatome in einer Kette enthalten.6. The method according to claim 1 to 5, characterized in that alcohols and carboxylic acids are used which contain fewer or a maximum of four carbon atoms in a chain. 7. Verfahren nach Anspruch 1 bis 6, dadurch gekennzeichnet, daß die Schichtdicke der aufgebrachten Schicht so eingestellt wird, daß sie nach dem Trocknen im Bereich von 100 bis 500 nm liegt.7. The method according to claim 1 to 6, characterized in that the layer thickness of the applied layer is adjusted so that it is in the range of 100 to 500 nm after drying. 8. Verfahren nach Anspruch 1 bis 7, dadurch gekennzeichnet, daß die Schicht durch Tauchen, Sprühen oder Aufschleudern aufgebracht wird.8. The method according to claim 1 to 7, characterized in that the layer is applied by dipping, spraying or spin coating. 9. Verfahren nach Anspruch 1 bis 8, dadurch gekennzeichnet, daß die Leuchtstoffschicht(en) nach dem Doppelmasken-Rasterverfahren aufgebracht werden.9. The method according to claim 1 to 8, characterized in that the phosphor layer (s) are applied by the double mask raster process. 10. Verfahren nach Anspruch 1 bis 9, dadurch gekennzeichnet, daß die Schicht bei 150°C getrocknet und mit der Leuchtstoffschicht bei ca. 500°C in ca. einer Stunde an Luft getempert wird.10. The method according to claim 1 to 9, characterized in that the layer is dried at 150 ° C and is annealed with the phosphor layer at about 500 ° C in about an hour in air.
EP79100268A 1978-02-02 1979-01-30 Method for the manufacture of electrically conductive or nonconductive layers for improved adherence of luminescent material to planar or unidirectionally curved substrates for colour picture screens Expired EP0003551B1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE2804494 1978-02-02
DE19782804494 DE2804494A1 (en) 1978-02-02 1978-02-02 PROCESS FOR THE MANUFACTURING OF ELECTRICALLY CONDUCTIVE OR NON-CONDUCTIVE LAYERS FOR IMPROVED LUMINOUS ADHESION ON PLANKS OR UNI-DIRECTIONAL CURVED SUBSTRATES FOR COLOR SCREENS AND IMAGE DISPLAY DEVICES

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EP0003551A1 true EP0003551A1 (en) 1979-08-22
EP0003551B1 EP0003551B1 (en) 1981-04-29

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Publication number Priority date Publication date Assignee Title
FR2647591A1 (en) * 1989-05-23 1990-11-30 Thomson Tubes Electroniques High-lifetime cathodoluminescent screen for cathode-ray tubes
EP0655767A1 (en) * 1993-11-29 1995-05-31 Corning Incorporated Preventing electron discoloration of glass

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Publication number Priority date Publication date Assignee Title
KR100773993B1 (en) * 2006-03-10 2007-11-08 (주)케이디티 Photoluminescent sheet

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EP0003551B1 (en) 1981-04-29
US4242372A (en) 1980-12-30
DE2804494A1 (en) 1979-08-09
JPS54121663A (en) 1979-09-20

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