DK643688D0 - BLOOD-EXHAUSTABLE THIN FILM IN A SINGLE OR MULTIPLE METALLIZATION - Google Patents

BLOOD-EXHAUSTABLE THIN FILM IN A SINGLE OR MULTIPLE METALLIZATION

Info

Publication number
DK643688D0
DK643688D0 DK643688A DK643688A DK643688D0 DK 643688 D0 DK643688 D0 DK 643688D0 DK 643688 A DK643688 A DK 643688A DK 643688 A DK643688 A DK 643688A DK 643688 D0 DK643688 D0 DK 643688D0
Authority
DK
Denmark
Prior art keywords
exhaustable
blood
thin film
multiple metallization
metallization
Prior art date
Application number
DK643688A
Other languages
Danish (da)
Other versions
DK643688A (en
Inventor
Wilfried Hinueber
Joachim Schumann
Armin Heinrich
Bernd Mueller
Wolfgang Jarcak
Lutz Bierbrauer
Ullrich Heisig
Rolf Pfannkuchen
Karl-Heinz Baether
Original Assignee
Teltow Elektron Bauelemente
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Teltow Elektron Bauelemente filed Critical Teltow Elektron Bauelemente
Publication of DK643688D0 publication Critical patent/DK643688D0/en
Publication of DK643688A publication Critical patent/DK643688A/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/498Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
    • H01L23/49866Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers characterised by the materials
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Photovoltaic Devices (AREA)
  • Die Bonding (AREA)
  • Parts Printed On Printed Circuit Boards (AREA)
DK643688A 1987-11-18 1988-11-17 BLOOD-EXHAUSTABLE THIN FILM IN A SINGLE OR MULTIPLE METALLIZATION DK643688A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DD30916687A DD274967A3 (en) 1987-11-18 1987-11-18 Solderable thin film in a single or multi-layer metallization

Publications (2)

Publication Number Publication Date
DK643688D0 true DK643688D0 (en) 1988-11-17
DK643688A DK643688A (en) 1989-05-19

Family

ID=5594019

Family Applications (1)

Application Number Title Priority Date Filing Date
DK643688A DK643688A (en) 1987-11-18 1988-11-17 BLOOD-EXHAUSTABLE THIN FILM IN A SINGLE OR MULTIPLE METALLIZATION

Country Status (4)

Country Link
EP (1) EP0316950A3 (en)
DD (1) DD274967A3 (en)
DK (1) DK643688A (en)
FI (1) FI885350A (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5476726A (en) * 1992-01-22 1995-12-19 Hitachi, Ltd. Circuit board with metal layer for solder bonding and electronic circuit device employing the same
US5969423A (en) 1997-07-15 1999-10-19 Micron Technology, Inc. Aluminum-containing films derived from using hydrogen and oxygen gas in sputter deposition
US6222271B1 (en) 1997-07-15 2001-04-24 Micron Technology, Inc. Method of using hydrogen gas in sputter deposition of aluminum-containing films and aluminum-containing films derived therefrom

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4463059A (en) * 1982-06-30 1984-07-31 International Business Machines Corporation Layered metal film structures for LSI chip carriers adapted for solder bonding and wire bonding
JPS60214544A (en) * 1984-04-06 1985-10-26 インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション Method of bonding by contacting metal with insulating material

Also Published As

Publication number Publication date
EP0316950A3 (en) 1990-12-05
EP0316950A2 (en) 1989-05-24
FI885350A (en) 1989-05-19
DK643688A (en) 1989-05-19
DD274967A3 (en) 1990-01-10
FI885350A0 (en) 1988-11-18

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Legal Events

Date Code Title Description
AHB Application shelved due to non-payment