DK619887A - HARDWARE COMPOSITION LAYER ON SILICATIVE SUBSTRATES AND PROCEDURE FOR THEIR PREPARATION - Google Patents

HARDWARE COMPOSITION LAYER ON SILICATIVE SUBSTRATES AND PROCEDURE FOR THEIR PREPARATION

Info

Publication number
DK619887A
DK619887A DK619887A DK619887A DK619887A DK 619887 A DK619887 A DK 619887A DK 619887 A DK619887 A DK 619887A DK 619887 A DK619887 A DK 619887A DK 619887 A DK619887 A DK 619887A
Authority
DK
Denmark
Prior art keywords
substrates
silicative
procedure
preparation
composition layer
Prior art date
Application number
DK619887A
Other languages
Danish (da)
Other versions
DK619887D0 (en
Inventor
Heinz Schicht
Wilfried Kaiser
Manfred Krueger
Hans-Joachim Becker
Siegfried Schiller
Guenter Beister
Bernd Hoffmann
Joachim Finster
Armin Meisel
Original Assignee
Torgau Flachglas
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Torgau Flachglas filed Critical Torgau Flachglas
Publication of DK619887D0 publication Critical patent/DK619887D0/en
Publication of DK619887A publication Critical patent/DK619887A/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0015—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterized by the colour of the layer
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/225—Nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/18—Metallic material, boron or silicon on other inorganic substrates
    • C23C14/185—Metallic material, boron or silicon on other inorganic substrates by cathodic sputtering
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/29—Mixtures
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/154—Deposition methods from the vapour phase by sputtering
    • C03C2218/155—Deposition methods from the vapour phase by sputtering by reactive sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Silicon Compounds (AREA)
  • Surface Treatment Of Glass (AREA)
  • Saccharide Compounds (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Aftertreatments Of Artificial And Natural Stones (AREA)
  • Silicates, Zeolites, And Molecular Sieves (AREA)
  • Glass Compositions (AREA)
  • Ceramic Products (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)

Abstract

Various functional and decorative effects on glass and other silicate-type substrates can be achieved with these tribologically and chemically extremely resistant sintered composite coatings. According to the invention, the sintered composite layers, consisting of discrete regions of the individual components, of the type TiN0.3...1.1, TiO2.0...1.5, TiCO1.0...3.0 are applied in vacuo by means of reactive d.c. high-rate sputtering of a Ti target in a working gas atmosphere of argon/nitrogen/oxygen/hydrocarbon. According to the process, this is carried out by adjusting the residual gas in the high-vacuum region before the formation of the working gas to a content of oxygen (O2) and hydrocarbons (HC) in a ratio of the relative mass numbers of 02:HC >/= 7.0.
DK619887A 1986-12-01 1987-11-26 HARDWARE COMPOSITION LAYER ON SILICATIVE SUBSTRATES AND PROCEDURE FOR THEIR PREPARATION DK619887A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DD29688386 1986-12-01

Publications (2)

Publication Number Publication Date
DK619887D0 DK619887D0 (en) 1987-11-26
DK619887A true DK619887A (en) 1988-06-02

Family

ID=5584363

Family Applications (1)

Application Number Title Priority Date Filing Date
DK619887A DK619887A (en) 1986-12-01 1987-11-26 HARDWARE COMPOSITION LAYER ON SILICATIVE SUBSTRATES AND PROCEDURE FOR THEIR PREPARATION

Country Status (6)

Country Link
EP (1) EP0270024B1 (en)
AT (1) ATE76111T1 (en)
DE (1) DE3779060D1 (en)
DK (1) DK619887A (en)
HU (1) HUT47509A (en)
YU (1) YU216287A (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4221864C2 (en) * 1992-07-03 1995-02-09 Ver Glaswerke Gmbh Method for producing a glass pane provided with a partially reflecting layer of hard material
CZ20002811A3 (en) * 2000-08-02 2002-02-13 Irisa, Výrobní Dru®Stvo Process for producing Christmas decorations and fixtures for attaching thereof when making this process

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1521157C3 (en) * 1965-09-21 1978-12-21 Balzers Hochvakuum Gmbh, 6201 Nordenstadt Process for increasing the strength of the bond between thin layers
CA959004A (en) * 1970-11-02 1974-12-10 Gene F. Wakefield Low temperature metal carbonitride coatings
JPS5779169A (en) * 1980-11-06 1982-05-18 Sumitomo Electric Ind Ltd Physical vapor deposition method
US4645715A (en) * 1981-09-23 1987-02-24 Energy Conversion Devices, Inc. Coating composition and method

Also Published As

Publication number Publication date
EP0270024A1 (en) 1988-06-08
EP0270024B1 (en) 1992-05-13
DE3779060D1 (en) 1992-06-17
ATE76111T1 (en) 1992-05-15
HUT47509A (en) 1989-03-28
YU216287A (en) 1989-10-31
DK619887D0 (en) 1987-11-26

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Legal Events

Date Code Title Description
AHB Application shelved due to non-payment