DK3786703T3 - Tilstandsstyring af fotoniske krystalfiberbaserede bredbåndslyskilder - Google Patents

Tilstandsstyring af fotoniske krystalfiberbaserede bredbåndslyskilder Download PDF

Info

Publication number
DK3786703T3
DK3786703T3 DK20191997.4T DK20191997T DK3786703T3 DK 3786703 T3 DK3786703 T3 DK 3786703T3 DK 20191997 T DK20191997 T DK 20191997T DK 3786703 T3 DK3786703 T3 DK 3786703T3
Authority
DK
Denmark
Prior art keywords
light sources
mode control
photonic crystal
broadband light
crystal fiber
Prior art date
Application number
DK20191997.4T
Other languages
English (en)
Inventor
Peter Maximilian Götz
Sebastian Thomas Bauerschmidt
Patrick Sebastian Uebel
Ronald Franciscus Herman Hugers
Jan Adrianus Boer
Edwin Johannes Cornelis Bos
Andreas Johannes Antonius Brouns
Vitaliy Prosyentsov
Eijk Paul William Scholtes-Van
Paulus Antonius Andreas Teunissen
Mahesh Upendra Ajgaonkar
Original Assignee
Asml Netherlands Bv
Asml Holding Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from EP19194974.2A external-priority patent/EP3786702A1/en
Application filed by Asml Netherlands Bv, Asml Holding Nv filed Critical Asml Netherlands Bv
Application granted granted Critical
Publication of DK3786703T3 publication Critical patent/DK3786703T3/da

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08—Construction or shape of optical resonators or components thereof
    • H01S3/08018—Mode suppression
    • H01S3/0804—Transverse or lateral modes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/24—Coupling light guides
    • G02B6/42—Coupling light guides with opto-electronic elements
    • G02B6/4201—Packages, e.g. shape, construction, internal or external details
    • G02B6/4219—Mechanical fixtures for holding or positioning the elements relative to each other in the couplings; Alignment methods for the elements, e.g. measuring or observing methods especially used therefor
    • G02B6/422—Active alignment, i.e. moving the elements in response to the detected degree of coupling or position of the elements
    • G02B6/4225—Active alignment, i.e. moving the elements in response to the detected degree of coupling or position of the elements by a direct measurement of the degree of coupling, e.g. the amount of light power coupled to the fibre or the opto-electronic element
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/70625—Dimensions, e.g. line width, critical dimension [CD], profile, sidewall angle or edge roughness
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/30—Testing of optical devices, constituted by fibre optics or optical waveguides
    • G01M11/35—Testing of optical devices, constituted by fibre optics or optical waveguides in which light is transversely coupled into or out of the fibre or waveguide, e.g. using integrating spheres
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/26—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes
    • G01B11/27—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes for testing the alignment of axes
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/02—Details
    • G01J1/04—Optical or mechanical part supplementary adjustable parts
    • G01J1/0407—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings
    • G01J1/0425—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings using optical fibers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
    • G01J1/4257—Photometry, e.g. photographic exposure meter using electric radiation detectors applied to monitoring the characteristics of a beam, e.g. laser beam, headlamp beam
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/30—Testing of optical devices, constituted by fibre optics or optical waveguides
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/30—Testing of optical devices, constituted by fibre optics or optical waveguides
    • G01M11/33—Testing of optical devices, constituted by fibre optics or optical waveguides with a light emitter being disposed at one fibre or waveguide end-face, and a light receiver at the other end-face
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/02—Optical fibres with cladding with or without a coating
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/70525—Controlling normal operating mode, e.g. matching different apparatus, remote control or prediction of failure
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/7065—Defects, e.g. optical inspection of patterned layer for defects
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
    • H01S3/0092—Nonlinear frequency conversion, e.g. second harmonic generation [SHG] or sum- or difference-frequency generation outside the laser cavity
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
    • G01J2001/4247—Photometry, e.g. photographic exposure meter using electric radiation detectors for testing lamps or other light sources
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/002—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of materials engineered to provide properties not available in nature, e.g. metamaterials
    • G02B1/005—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of materials engineered to provide properties not available in nature, e.g. metamaterials made of photonic crystals or photonic band gap materials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/02—Optical fibres with cladding with or without a coating
    • G02B6/02295—Microstructured optical fibre
    • G02B6/02309—Structures extending perpendicularly or at a large angle to the longitudinal axis of the fibre, e.g. photonic band gap along fibre axis
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/35—Non-linear optics
    • G02F1/365—Non-linear optics in an optical waveguide structure
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2202/00—Materials and properties
    • G02F2202/32—Photonic crystals

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Nonlinear Science (AREA)
  • Electromagnetism (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Engineering & Computer Science (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Lasers (AREA)
  • Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
DK20191997.4T 2019-09-02 2020-08-20 Tilstandsstyring af fotoniske krystalfiberbaserede bredbåndslyskilder DK3786703T3 (da)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
EP19194974.2A EP3786702A1 (en) 2019-09-02 2019-09-02 Mode control of photonic crystal fiber based broadband light sources
EP19215183 2019-12-11
EP20152635 2020-01-20
EP20165824 2020-03-26

Publications (1)

Publication Number Publication Date
DK3786703T3 true DK3786703T3 (da) 2023-07-10

Family

ID=72086881

Family Applications (1)

Application Number Title Priority Date Filing Date
DK20191997.4T DK3786703T3 (da) 2019-09-02 2020-08-20 Tilstandsstyring af fotoniske krystalfiberbaserede bredbåndslyskilder

Country Status (8)

Country Link
US (3) US11360396B2 (da)
EP (2) EP3786703B1 (da)
KR (1) KR20220044532A (da)
CN (1) CN114430875A (da)
DK (1) DK3786703T3 (da)
IL (1) IL289928A (da)
TW (1) TWI780475B (da)
WO (1) WO2021043593A1 (da)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102592778B1 (ko) * 2017-01-09 2023-10-24 막스-플랑크-게젤샤프트 츄어 푀르더룽 데어 비쎈샤프텐 에.파우. 광대역 광원장치 및 광대역 광 펄스 생성 방법
US11835842B2 (en) * 2019-04-12 2023-12-05 Regents of the Univ of Colorado, a body corporate Processor-controlled high harmonic optimization with optimal gas handling
US20220269077A1 (en) * 2020-04-27 2022-08-25 Google Llc Systems, devices, and methods for inputting light from a scanning laser projector into a waveguide
EP4205286A1 (en) 2020-08-28 2023-07-05 ISCO International, LLC Method and system for mitigating passive intermodulation (pim) by performing polarization adjusting
EP4105696A1 (en) * 2021-06-15 2022-12-21 ASML Netherlands B.V. Optical element for generation of broadband radiation
US20240201561A1 (en) * 2021-05-03 2024-06-20 Asml Netherlands B.V. Optical element for generation of broadband radiation
US11502404B1 (en) 2022-03-31 2022-11-15 Isco International, Llc Method and system for detecting interference and controlling polarization shifting to mitigate the interference
US11476585B1 (en) 2022-03-31 2022-10-18 Isco International, Llc Polarization shifting devices and systems for interference mitigation
US11476574B1 (en) 2022-03-31 2022-10-18 Isco International, Llc Method and system for driving polarization shifting to mitigate interference
EP4258051A1 (en) 2022-04-08 2023-10-11 NKT Photonics A/S Tunable supercontinuum system
EP4258052A1 (en) 2022-04-08 2023-10-11 NKT Photonics A/S Supercontinuum system with spectral detection
US11515652B1 (en) 2022-05-26 2022-11-29 Isco International, Llc Dual shifter devices and systems for polarization rotation to mitigate interference
US11509071B1 (en) 2022-05-26 2022-11-22 Isco International, Llc Multi-band polarization rotation for interference mitigation
US11509072B1 (en) 2022-05-26 2022-11-22 Isco International, Llc Radio frequency (RF) polarization rotation devices and systems for interference mitigation
US11956058B1 (en) 2022-10-17 2024-04-09 Isco International, Llc Method and system for mobile device signal to interference plus noise ratio (SINR) improvement via polarization adjusting/optimization
US11990976B2 (en) 2022-10-17 2024-05-21 Isco International, Llc Method and system for polarization adaptation to reduce propagation loss for a multiple-input-multiple-output (MIMO) antenna
US11985692B2 (en) 2022-10-17 2024-05-14 Isco International, Llc Method and system for antenna integrated radio (AIR) downlink and uplink beam polarization adaptation
US11949489B1 (en) 2022-10-17 2024-04-02 Isco International, Llc Method and system for improving multiple-input-multiple-output (MIMO) beam isolation via alternating polarization
CN116502545B (zh) * 2023-06-26 2023-09-26 国科大杭州高等研究院 一种面向广角耦合结构的遗传算法、应用及微结构光探针

Family Cites Families (45)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6690459B2 (en) * 2001-03-05 2004-02-10 Trex Enterprises, Corp. Method and apparatus for fiber alignment using light leaked from cladding
WO2003030409A1 (en) 2001-09-28 2003-04-10 Protodel International Limited Monitor for an optical fibre and multi-guide optical fibre circuits and methods of making them
US6829421B2 (en) 2002-03-13 2004-12-07 Micron Technology, Inc. Hollow core photonic bandgap optical fiber
DE60319462T2 (de) 2002-06-11 2009-03-12 Asml Netherlands B.V. Lithographischer Apparat und Verfahren zur Herstellung eines Artikels
SG2010050110A (en) 2002-11-12 2014-06-27 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
CN100555086C (zh) 2003-01-14 2009-10-28 Asml荷兰有限公司 用于光刻装置的水平传感器
WO2004106999A1 (en) * 2003-05-28 2004-12-09 Corning Incorporated Methods of generating and transporting short wavelength radiation and apparati used therein
US7265364B2 (en) 2004-06-10 2007-09-04 Asml Netherlands B.V. Level sensor for lithographic apparatus
US7791727B2 (en) 2004-08-16 2010-09-07 Asml Netherlands B.V. Method and apparatus for angular-resolved spectroscopic lithography characterization
US7218440B2 (en) * 2005-08-25 2007-05-15 Northrop Grumman Corporation Photonic bandgap fiber for generating near-diffraction-limited optical beam comprising multiple coaxial wavelengths
US7791724B2 (en) 2006-06-13 2010-09-07 Asml Netherlands B.V. Characterization of transmission losses in an optical system
US7701577B2 (en) 2007-02-21 2010-04-20 Asml Netherlands B.V. Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
IL194839A0 (en) 2007-10-25 2009-08-03 Asml Netherlands Bv Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
NL1036123A1 (nl) 2007-11-13 2009-05-14 Asml Netherlands Bv Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method.
NL1036245A1 (nl) 2007-12-17 2009-06-18 Asml Netherlands Bv Diffraction based overlay metrology tool and method of diffraction based overlay metrology.
WO2009095023A2 (en) 2008-01-31 2009-08-06 Koheras A/S System, device and method for stabilizing the optical output power of an optical system
JP5600601B2 (ja) * 2008-02-07 2014-10-01 イムラ アメリカ インコーポレイテッド 高出力並列ファイバアレイ
NL1036684A1 (nl) 2008-03-20 2009-09-22 Asml Netherlands Bv Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method.
NL1036685A1 (nl) 2008-03-24 2009-09-25 Asml Netherlands Bv Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method.
NL1036734A1 (nl) 2008-04-09 2009-10-12 Asml Netherlands Bv A method of assessing a model, an inspection apparatus and a lithographic apparatus.
NL1036857A1 (nl) 2008-04-21 2009-10-22 Asml Netherlands Bv Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method.
JP2011525713A (ja) 2008-06-26 2011-09-22 エーエスエムエル ネザーランズ ビー．ブイ． オーバレイ測定装置、リソグラフィ装置、及びそのようなオーバレイ測定装置を用いたデバイス製造方法
US8891061B2 (en) 2008-10-06 2014-11-18 Asml Netherlands B.V. Lithographic focus and dose measurement using a 2-D target
EP2228685B1 (en) 2009-03-13 2018-06-27 ASML Netherlands B.V. Level sensor arrangement for lithographic apparatus and device manufacturing method
NL2006229A (en) 2010-03-18 2011-09-20 Asml Netherlands Bv Inspection method and apparatus, and associated computer readable product.
JP2011215409A (ja) * 2010-03-31 2011-10-27 Fujikura Ltd 調心方法および調心装置
WO2012022584A1 (en) 2010-08-18 2012-02-23 Asml Netherlands B.V. Substrate for use in metrology, metrology method and device manufacturing method
NL2009004A (en) 2011-07-20 2013-01-22 Asml Netherlands Bv Inspection method and apparatus, and lithographic apparatus.
JP2013057854A (ja) * 2011-09-09 2013-03-28 Olympus Corp 光伝送装置
NL2010717A (en) 2012-05-21 2013-11-25 Asml Netherlands Bv Determining a structural parameter and correcting an asymmetry property.
US20130343748A1 (en) 2012-05-23 2013-12-26 Conolog Corporation Apparatus and method for monitoring optical signal transmission in optical fibers
US9606442B2 (en) 2012-07-30 2017-03-28 Asml Netherlands B.V. Position measuring apparatus, position measuring method, lithographic apparatus and device manufacturing method
WO2015003715A1 (en) * 2013-07-10 2015-01-15 Nkt Photonics A/S Microstructured optical fiber, supercontinuum light source comprising microstructured optical fiber and use of such light source
CN203720405U (zh) * 2013-12-18 2014-07-16 湖南理工学院 一种基于薄膜型空间滤波器的波导模式控制器
EP3129814A4 (en) 2014-04-11 2017-04-12 Lockheed Martin Corporation System and method for non-contact optical-power measurement
US9160137B1 (en) 2014-05-09 2015-10-13 Max-Planck-Gesellschaft zur Förderung der Wissenschaften e. V. Method and device for creating supercontinuum light pulses
CN110553602B (zh) 2014-11-26 2021-10-26 Asml荷兰有限公司 度量方法、计算机产品和***
US10241425B2 (en) 2014-12-22 2019-03-26 Asml Netherlands B.V. Level sensor, lithographic apparatus and device manufacturing method
US10365434B2 (en) 2015-06-12 2019-07-30 Pacific Biosciences Of California, Inc. Integrated target waveguide devices and systems for optical coupling
WO2016202695A1 (en) 2015-06-17 2016-12-22 Asml Netherlands B.V. Recipe selection based on inter-recipe consistency
EP3136143B1 (en) 2015-08-26 2020-04-01 Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V. Hollow-core fibre and method of manufacturing thereof
CN206096546U (zh) * 2016-08-26 2017-04-12 武汉锐科光纤激光技术股份有限公司 一种光纤高阶模式剥离器件
KR102592778B1 (ko) 2017-01-09 2023-10-24 막스-플랑크-게젤샤프트 츄어 푀르더룽 데어 비쎈샤프텐 에.파우. 광대역 광원장치 및 광대역 광 펄스 생성 방법
US10436655B2 (en) * 2017-07-14 2019-10-08 Saudi Arabian Oil Company Fluorophore enhanced multidimensional photonic sensors
US10630043B1 (en) * 2019-05-14 2020-04-21 Ii-Vi Delaware, Inc. Methods and devices for laser beam parameters sensing and control with fiber-tip integrated systems

Also Published As

Publication number Publication date
EP4224250A3 (en) 2023-09-06
WO2021043593A1 (en) 2021-03-11
US20220269183A1 (en) 2022-08-25
TW202115459A (zh) 2021-04-16
IL289928A (en) 2022-03-01
EP3786703B1 (en) 2023-05-17
EP4224250A2 (en) 2023-08-09
US20210063894A1 (en) 2021-03-04
TWI780475B (zh) 2022-10-11
KR20220044532A (ko) 2022-04-08
EP3786703A1 (en) 2021-03-03
US11687009B2 (en) 2023-06-27
CN114430875A (zh) 2022-05-03
US11360396B2 (en) 2022-06-14
US20230280660A1 (en) 2023-09-07

Similar Documents

Publication Publication Date Title
DK3786703T3 (da) Tilstandsstyring af fotoniske krystalfiberbaserede bredbåndslyskilder
DK3485141T3 (da) Udrulning af optiske fibre
DK3491441T3 (da) Fleksibelt optisk fiberbånd
DK3740325T3 (da) Fremgangsmåder til fremstilling af optiske effektlag
DK3649090T3 (da) Fremgangsmåde til fremstilling af en optisk fiberpræform
DK3289832T3 (da) Opgradering af lyskilde
DK3414605T3 (da) Optiske fibre med få modi til multiplexing ved modusdeling
FR3042606B1 (fr) Fibre optique
FR3069336B1 (fr) Fibre optique
EP3899352A4 (en) LASER INDUCED AND FIBER EMITTED WHITE LIGHT SYSTEM
FR3058411B1 (fr) Fibre optique
EP3842395A4 (en) OPTICAL FIBER
IL285518A (en) Optical element-based core-hollow photonic crystal fibers for broadband radiation generation
EP3764133A4 (en) OPTICAL FIBER
DK3764134T3 (da) Optisk fiber
EP3783409A4 (en) OPTICAL FIBER
IL288520A (en) An optical component based on hollow photonic crystal fibers to create broadband radiation
DK3647282T3 (da) Fremgangsmåde til fremstilling af en glaspræform til optiske fibre
DK3435126T3 (da) Optisk fiber
EP3430379A4 (en) LOW-SCALE LIGHT SOURCE FOR FIBER OPTIC SENSORS IN HIGH-TEMPERATURE ENVIRONMENTS
DK3655357T3 (da) Optisk fiberspole
EP3878880A4 (en) OPTICAL FIBER
EP3762676A4 (en) RETICLE WITH FIBER OPTICAL LIGHTING
EP4080163A4 (en) LIGHT SOURCE DEVICE FOR FIBER OPTIC GYRO AND FIBER OPTIC GYRO THEREOF
DK3414604T3 (da) Optiske fibre med få modi til multipleksering med modusdeling