DK2856258T3 - Fremgangsmåde til fremstilling af en nanostruktureret artikel under anvendelse af nanotrykningslitografi, nanostruktureret artikel og anvendelse deraf - Google Patents

Fremgangsmåde til fremstilling af en nanostruktureret artikel under anvendelse af nanotrykningslitografi, nanostruktureret artikel og anvendelse deraf Download PDF

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Publication number
DK2856258T3
DK2856258T3 DK13726428.9T DK13726428T DK2856258T3 DK 2856258 T3 DK2856258 T3 DK 2856258T3 DK 13726428 T DK13726428 T DK 13726428T DK 2856258 T3 DK2856258 T3 DK 2856258T3
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DK
Denmark
Prior art keywords
nanostructured article
producing
application
nanostructured
article
Prior art date
Application number
DK13726428.9T
Other languages
English (en)
Inventor
Hakki Hakan Atasoy
Gabi Grützner
Marko Vogler
Original Assignee
Micro Resist Tech Gesellschaft Fuer Chemische Materialien Spezieller Photoresistsysteme Mbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Application filed by Micro Resist Tech Gesellschaft Fuer Chemische Materialien Spezieller Photoresistsysteme Mbh filed Critical Micro Resist Tech Gesellschaft Fuer Chemische Materialien Spezieller Photoresistsysteme Mbh
Application granted granted Critical
Publication of DK2856258T3 publication Critical patent/DK2856258T3/da

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
    • Y10T428/24612—Composite web or sheet

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Mathematical Physics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
DK13726428.9T 2012-05-25 2013-05-24 Fremgangsmåde til fremstilling af en nanostruktureret artikel under anvendelse af nanotrykningslitografi, nanostruktureret artikel og anvendelse deraf DK2856258T3 (da)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201261651745P 2012-05-25 2012-05-25
PCT/EP2013/001537 WO2013174522A1 (en) 2012-05-25 2013-05-24 Composition suitable for use as a release-optimized material for nanoimprint processes and uses thereof

Publications (1)

Publication Number Publication Date
DK2856258T3 true DK2856258T3 (da) 2021-04-06

Family

ID=48570056

Family Applications (1)

Application Number Title Priority Date Filing Date
DK13726428.9T DK2856258T3 (da) 2012-05-25 2013-05-24 Fremgangsmåde til fremstilling af en nanostruktureret artikel under anvendelse af nanotrykningslitografi, nanostruktureret artikel og anvendelse deraf

Country Status (4)

Country Link
US (1) US10126648B2 (da)
EP (1) EP2856258B1 (da)
DK (1) DK2856258T3 (da)
WO (1) WO2013174522A1 (da)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9575226B2 (en) * 2014-09-22 2017-02-21 The Chinese University Of Hong Kong Positive microcontact printing
AT516558B1 (de) 2014-12-10 2018-02-15 Joanneum Res Forschungsgmbh Prägelack, Verfahren zum Prägen sowie mit dem Prägelack beschichtete Substratoberfläche
CN108026330B (zh) * 2015-09-08 2020-12-22 佳能株式会社 在纳米压印光刻中的基材预处理和蚀刻均匀性
KR20170038988A (ko) 2015-09-30 2017-04-10 삼성디스플레이 주식회사 실란 커플링제 및 이를 이용한 와이어 그리드 패턴의 제조 방법
FR3075800B1 (fr) 2017-12-21 2020-10-09 Arkema France Couches anti adhesives pour les procedes d'impression par transfert
DE102019107090A1 (de) * 2019-03-20 2020-09-24 Joanneum Research Forschungsgesellschaft Mbh Mikrostruktur mit thermoplastischer Prägelackschicht und Herstellungsverfahren
US11884977B2 (en) 2021-03-12 2024-01-30 Singular Genomics Systems, Inc. Nanoarrays and methods of use thereof
EP4263868A1 (en) 2021-03-12 2023-10-25 Singular Genomics Systems, Inc. Nanoarrays and methods of use thereof
EP4294920A1 (en) 2021-04-27 2023-12-27 Singular Genomics Systems, Inc. High density sequencing and multiplexed priming
WO2023034920A2 (en) 2021-09-03 2023-03-09 Singular Genomics Systems, Inc. Amplification oligonucleotides
WO2023172665A2 (en) 2022-03-10 2023-09-14 Singular Genomics Systems, Inc. Nucleic acid delivery scaffolds

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6067954B2 (ja) 2003-12-19 2017-01-25 ザ ユニバーシティ オブ ノース カロライナ アット チャペル ヒルＴｈｅ Ｕｎｉｖｅｒｓｉｔｙ Ｏｆ Ｎｏｒｔｈ Ｃａｒｏｌｉｎａ Ａｔ Ｃｈａｐｅｌ Ｈｉｌｌ ナノサイズ物品、及びソフトリソグラフィー又はインプリントリソグラフィーを用いる分離構造の作製方法によって製造されたナノサイズ物品
US20080055581A1 (en) * 2004-04-27 2008-03-06 Rogers John A Devices and methods for pattern generation by ink lithography
US20080000373A1 (en) 2006-06-30 2008-01-03 Maria Petrucci-Samija Printing form precursor and process for preparing a stamp from the precursor
US7955516B2 (en) * 2006-11-02 2011-06-07 Applied Materials, Inc. Etching of nano-imprint templates using an etch reactor
US8128393B2 (en) 2006-12-04 2012-03-06 Liquidia Technologies, Inc. Methods and materials for fabricating laminate nanomolds and nanoparticles therefrom
US7604836B2 (en) 2006-12-13 2009-10-20 Hitachi Global Storage Technologies Netherlands B.V. Release layer and resist material for master tool and stamper tool
US20080315459A1 (en) * 2007-06-21 2008-12-25 3M Innovative Properties Company Articles and methods for replication of microstructures and nanofeatures
EP2199855B1 (en) * 2008-12-19 2016-07-20 Obducat Methods and processes for modifying polymer material surface interactions
EP2221664A1 (en) 2009-02-19 2010-08-25 Solvay Solexis S.p.A. Nanolithography process
WO2010128969A1 (en) * 2009-05-08 2010-11-11 Hewlett-Packard Development Company, L.P. Functionalized perfluoropolyether material as a hydrophobic coating
CN101923282B (zh) * 2009-06-09 2012-01-25 清华大学 纳米压印抗蚀剂及采用该纳米压印抗蚀剂的纳米压印方法

Also Published As

Publication number Publication date
US10126648B2 (en) 2018-11-13
WO2013174522A1 (en) 2013-11-28
US20150079351A1 (en) 2015-03-19
EP2856258B1 (en) 2021-01-06
EP2856258A1 (en) 2015-04-08

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