DK1892576T3 - Eksponeringsindretning til at fremstille serigrafiskabeloner - Google Patents
Eksponeringsindretning til at fremstille serigrafiskabelonerInfo
- Publication number
- DK1892576T3 DK1892576T3 DK06405369.7T DK06405369T DK1892576T3 DK 1892576 T3 DK1892576 T3 DK 1892576T3 DK 06405369 T DK06405369 T DK 06405369T DK 1892576 T3 DK1892576 T3 DK 1892576T3
- Authority
- DK
- Denmark
- Prior art keywords
- screen printing
- exposure device
- printing templates
- produce screen
- templates
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/12—Production of screen printing forms or similar printing forms, e.g. stencils
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
- G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
- G03F7/2055—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser for the production of printing plates; Exposure of liquid photohardening compositions
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/24—Curved surfaces
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP06405369.7A EP1892576B1 (de) | 2006-08-25 | 2006-08-25 | Belichtungsvorrichtung zur Herstellung von Siebdruckschablonen |
Publications (1)
Publication Number | Publication Date |
---|---|
DK1892576T3 true DK1892576T3 (da) | 2013-09-16 |
Family
ID=37714290
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DK06405369.7T DK1892576T3 (da) | 2006-08-25 | 2006-08-25 | Eksponeringsindretning til at fremstille serigrafiskabeloner |
Country Status (5)
Country | Link |
---|---|
US (1) | US20080047445A1 (da) |
EP (1) | EP1892576B1 (da) |
CN (1) | CN101506738B (da) |
DK (1) | DK1892576T3 (da) |
WO (1) | WO2008022485A1 (da) |
Families Citing this family (30)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5351272B2 (ja) * | 2008-09-22 | 2013-11-27 | エーエスエムエル ネザーランズ ビー.ブイ. | リソグラフィ装置及びデバイス製造方法 |
TWI448830B (zh) | 2010-02-09 | 2014-08-11 | Asml Netherlands Bv | 微影裝置及元件製造方法 |
KR101419330B1 (ko) | 2010-02-23 | 2014-07-15 | 에이에스엠엘 네델란즈 비.브이. | 리소그래피 장치 및 디바이스 제조 방법 |
EP2360528A1 (de) | 2010-02-23 | 2011-08-24 | XPOSE Holding AG | Belichtungsvorrichtung zur Herstellung von Druckvorlagen und Verwendung einer Belichtungsvorrichtung. |
CN102770811B (zh) | 2010-02-25 | 2015-05-20 | Asml荷兰有限公司 | 光刻设备和器件制造方法 |
KR101537289B1 (ko) | 2010-04-12 | 2015-07-16 | 에이에스엠엘 네델란즈 비.브이. | 기판 핸들링 장치 및 리소그래피 장치 |
KR101501967B1 (ko) | 2010-12-08 | 2015-03-12 | 에이에스엠엘 네델란즈 비.브이. | 리소그래피 장치 및 디바이스 제조 방법 |
NL2008329A (en) | 2011-03-29 | 2012-10-02 | Asml Netherlands Bv | Lithographic apparatus, method for measuring radiation beam spot position, device manufacturing method, and radiation detector system for a lithographic apparatus. |
JP5731063B2 (ja) | 2011-04-08 | 2015-06-10 | エーエスエムエル ネザーランズ ビー.ブイ. | リソグラフィ装置、プログラマブル・パターニングデバイス、及びリソグラフィ方法 |
JP2014514764A (ja) | 2011-04-21 | 2014-06-19 | エーエスエムエル ネザーランズ ビー.ブイ. | リソグラフィ装置、リソグラフィ装置をメンテナンスするための方法、及びデバイス製造方法 |
CN103765316B (zh) | 2011-08-18 | 2016-06-29 | Asml荷兰有限公司 | 光刻设备和器件制造方法 |
NL2009342A (en) | 2011-10-31 | 2013-05-07 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method. |
NL2009761A (en) | 2011-11-29 | 2013-05-30 | Asml Netherlands Bv | Lithographic apparatus, device manufacturing method and computer program. |
KR101633758B1 (ko) | 2011-11-29 | 2016-06-27 | 에이에스엠엘 네델란즈 비.브이. | 프로그래머블 패터닝 디바이스에 데이터를 제공하는 장치 및 방법, 리소그래피 장치, 및 디바이스 제조 방법 |
US9341960B2 (en) | 2011-12-05 | 2016-05-17 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
NL2009817A (en) | 2011-12-06 | 2013-06-10 | Asml Netherlands Bv | A lithography apparatus, an apparatus for providing setpoint data, a device manufacturing method, a method of calculating setpoint data and a computer program. |
NL2009902A (en) | 2011-12-27 | 2013-07-01 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method. |
KR101633759B1 (ko) | 2012-01-12 | 2016-06-27 | 에이에스엠엘 네델란즈 비.브이. | 리소그래피 장치, 세트포인트 데이터를 제공하는 장치, 디바이스 제조 방법, 세트포인트 데이터를 제공하는 방법, 및 컴퓨터 프로그램 |
WO2013107595A1 (en) | 2012-01-17 | 2013-07-25 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
WO2013124114A1 (en) | 2012-02-23 | 2013-08-29 | Asml Netherlands B.V. | Device, lithographic apparatus, method for guiding radiation and device manufacturing method |
NL2012052A (en) | 2013-01-29 | 2014-08-04 | Asml Netherlands Bv | A radiation modulator for a lithography apparatus, a lithography apparatus, a method of modulating radiation for use in lithography, and a device manufacturing method. |
US9649837B2 (en) | 2013-03-15 | 2017-05-16 | M&R Printing Equipment, Inc. | Method and apparatus for preparing a screen printing screen |
CN105954974A (zh) * | 2016-06-27 | 2016-09-21 | 深圳劲嘉集团股份有限公司 | 丝网版激光制版设备及其制版方法 |
CN106647184B (zh) * | 2016-12-31 | 2019-06-14 | 江苏九迪激光装备科技有限公司 | 一种直写式丝网制版设备的曝光方法 |
CN106647185A (zh) * | 2016-12-31 | 2017-05-10 | 江苏九迪激光装备科技有限公司 | 一种丝网印刷直接制版***及制版方法 |
US10576733B2 (en) | 2017-02-14 | 2020-03-03 | M&R Printing Equipment, Inc. | Tuneable flat panel UV exposure system for screen printing |
JP7118394B2 (ja) * | 2018-01-31 | 2022-08-16 | ミタニマイクロニクス株式会社 | スクリーンマスクの製造方法 |
CN111391475A (zh) * | 2020-04-18 | 2020-07-10 | 杨林 | 一种印刷丝网印版线形流动曝光装置 |
CN112644145A (zh) * | 2020-12-18 | 2021-04-13 | 林青仕 | 一种不干胶网版便捷制作用辅助环保设备 |
CN112937077A (zh) * | 2021-04-16 | 2021-06-11 | 赵成刚 | 高精度丝网印刷激光制版机 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5580698A (en) * | 1988-05-05 | 1996-12-03 | Mografo A/S | Scanner system for successive irradiation of a working surface, particularly for ultra-violet exposure of a photo emulsion on a serigraphic printing frame |
EP0770495B1 (en) * | 1995-10-24 | 2002-06-19 | Agfa-Gevaert | A method for making a lithographic printing plate involving on press development |
DE59608890D1 (de) * | 1996-12-31 | 2002-04-18 | Friedrich Luellau | Verfahren zur ansteuerung einer belichtungsvorrichtung |
ES2213311T3 (es) * | 1998-04-29 | 2004-08-16 | Cst Gmbh | Procedimiento para la fabricacion de moldes de serigrafia, asi como dispositivo de iluminacion para el mismo. |
JP2002202442A (ja) * | 2000-11-06 | 2002-07-19 | Fuji Photo Film Co Ltd | 合波レーザー光源および露光装置 |
US20020192569A1 (en) * | 2001-05-15 | 2002-12-19 | The Chromaline Corporation | Devices and methods for exposure of photoreactive compositions with light emitting diodes |
US7115353B2 (en) * | 2001-07-11 | 2006-10-03 | Gary Baxter | Computer screen imaging system for the preparation of print screens |
US7033450B2 (en) * | 2002-10-17 | 2006-04-25 | Kodak Graphic Communications Canada Company | Flexographic printing method |
TWI269125B (en) * | 2003-10-29 | 2006-12-21 | Fuji Photo Film Co Ltd | Image recording device and image recording method |
US20060001849A1 (en) * | 2004-07-01 | 2006-01-05 | Ray Kevin B | Imaging a violet sensitive printing plate using multiple low power light sources |
-
2006
- 2006-08-25 EP EP06405369.7A patent/EP1892576B1/de active Active
- 2006-08-25 DK DK06405369.7T patent/DK1892576T3/da active
-
2007
- 2007-08-23 WO PCT/CH2007/000419 patent/WO2008022485A1/de active Application Filing
- 2007-08-23 CN CN2007800315372A patent/CN101506738B/zh not_active Expired - Fee Related
- 2007-08-24 US US11/895,646 patent/US20080047445A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
US20080047445A1 (en) | 2008-02-28 |
CN101506738A (zh) | 2009-08-12 |
CN101506738B (zh) | 2011-08-10 |
WO2008022485A1 (de) | 2008-02-28 |
EP1892576A1 (de) | 2008-02-27 |
EP1892576B1 (de) | 2013-06-12 |
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