DK142625C - METHOD AND APPARATUS FOR MANUFACTURING SEMICONDUCTOR RODS BY THERMAL DIVISION OF A SEMICONDUCTOR CONNECTION - Google Patents

METHOD AND APPARATUS FOR MANUFACTURING SEMICONDUCTOR RODS BY THERMAL DIVISION OF A SEMICONDUCTOR CONNECTION

Info

Publication number
DK142625C
DK142625C DK163272A DK163272A DK142625C DK 142625 C DK142625 C DK 142625C DK 163272 A DK163272 A DK 163272A DK 163272 A DK163272 A DK 163272A DK 142625 C DK142625 C DK 142625C
Authority
DK
Denmark
Prior art keywords
semiconductor
rods
connection
thermal division
manufacturing semiconductor
Prior art date
Application number
DK163272A
Other languages
Danish (da)
Other versions
DK142625B (en
Inventor
H Stut
Original Assignee
Siemens Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens Ag filed Critical Siemens Ag
Publication of DK142625B publication Critical patent/DK142625B/en
Application granted granted Critical
Publication of DK142625C publication Critical patent/DK142625C/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/24—Deposition of silicon only
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/02—Silicon
    • C01B33/021—Preparation
    • C01B33/027—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material
    • C01B33/035—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material by decomposition or reduction of gaseous or vaporised silicon compounds in the presence of heated filaments of silicon, carbon or a refractory metal, e.g. tantalum or tungsten, or in the presence of heated silicon rods on which the formed silicon is deposited, a silicon rod being obtained, e.g. Siemens process

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Silicon Compounds (AREA)
  • Chemical Vapour Deposition (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
DK163272A 1971-04-06 1972-04-05 METHOD AND APPARATUS FOR MANUFACTURING SEMICONDUCTOR RODS BY THERMAL DIVISION OF A SEMICONDUCTOR CONNECTION DK142625C (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19712116746 DE2116746C3 (en) 1971-04-06 1971-04-06 Process for producing semiconductor rods by thermal decomposition of a semiconductor compound
DE2116746 1971-04-06

Publications (2)

Publication Number Publication Date
DK142625B DK142625B (en) 1980-12-01
DK142625C true DK142625C (en) 1981-08-03

Family

ID=5804021

Family Applications (1)

Application Number Title Priority Date Filing Date
DK163272A DK142625C (en) 1971-04-06 1972-04-05 METHOD AND APPARATUS FOR MANUFACTURING SEMICONDUCTOR RODS BY THERMAL DIVISION OF A SEMICONDUCTOR CONNECTION

Country Status (12)

Country Link
JP (1) JPS5312358B1 (en)
AT (1) AT324429B (en)
BE (1) BE778746A (en)
CA (1) CA969839A (en)
CS (1) CS169753B2 (en)
DD (1) DD100404A5 (en)
DE (1) DE2116746C3 (en)
DK (1) DK142625C (en)
FR (1) FR2132404B1 (en)
GB (1) GB1378302A (en)
IT (1) IT950953B (en)
NL (1) NL7201633A (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2609564A1 (en) * 1976-03-08 1977-09-15 Siemens Ag PROCESS FOR SEPARATING ELEMENTAL SILICON FROM THE GAS PHASE
DE102007041803A1 (en) * 2007-08-30 2009-03-05 Pv Silicon Forschungs Und Produktions Gmbh Process for producing polycrystalline silicon rods and polycrystalline silicon rod
CN101224888B (en) * 2007-10-23 2010-05-19 四川永祥多晶硅有限公司 Silicon mandrel heating starting method for polysilicon hydrogen reduction furnace
DE102009010086B4 (en) * 2009-01-29 2013-04-11 Centrotherm Sitec Gmbh Arrangement and method for measuring the temperature and the thickness growth of silicon rods in a silicon deposition reactor
US20120322175A1 (en) * 2011-06-14 2012-12-20 Memc Electronic Materials Spa Methods and Systems For Controlling SiIicon Rod Temperature

Also Published As

Publication number Publication date
DE2116746B2 (en) 1978-04-13
DE2116746A1 (en) 1972-10-19
PL73356B1 (en) 1974-08-30
IT950953B (en) 1973-06-20
CA969839A (en) 1975-06-24
NL7201633A (en) 1972-10-10
CS169753B2 (en) 1976-07-29
GB1378302A (en) 1974-12-27
FR2132404A1 (en) 1972-11-17
BE778746A (en) 1972-05-16
JPS5312358B1 (en) 1978-04-28
AT324429B (en) 1975-08-25
DD100404A5 (en) 1973-09-20
FR2132404B1 (en) 1974-08-02
DE2116746C3 (en) 1978-12-07
DK142625B (en) 1980-12-01

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