DE69942909D1 - Laserkammer zur zerstreuung von druckwellen - Google Patents

Laserkammer zur zerstreuung von druckwellen

Info

Publication number
DE69942909D1
DE69942909D1 DE69942909T DE69942909T DE69942909D1 DE 69942909 D1 DE69942909 D1 DE 69942909D1 DE 69942909 T DE69942909 T DE 69942909T DE 69942909 T DE69942909 T DE 69942909T DE 69942909 D1 DE69942909 D1 DE 69942909D1
Authority
DE
Germany
Prior art keywords
pressure waves
laser chamber
dispersing pressure
dispersing
laser
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69942909T
Other languages
English (en)
Inventor
James H Azzola
Paul R Marsden
Richard C Ujazdowski
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Cymer Inc
Original Assignee
Cymer Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cymer Inc filed Critical Cymer Inc
Application granted granted Critical
Publication of DE69942909D1 publication Critical patent/DE69942909D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/036—Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering, replenishing; Means for circulating the gas, e.g. for equalising the pressure within the tube

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Lasers (AREA)
DE69942909T 1998-10-09 1999-09-30 Laserkammer zur zerstreuung von druckwellen Expired - Lifetime DE69942909D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/169,195 US6212211B1 (en) 1998-10-09 1998-10-09 Shock wave dissipating laser chamber
PCT/US1999/022977 WO2000030221A2 (en) 1998-10-09 1999-09-30 Shock wave dissipating laser chamber

Publications (1)

Publication Number Publication Date
DE69942909D1 true DE69942909D1 (de) 2010-12-16

Family

ID=22614582

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69942909T Expired - Lifetime DE69942909D1 (de) 1998-10-09 1999-09-30 Laserkammer zur zerstreuung von druckwellen

Country Status (5)

Country Link
US (1) US6212211B1 (de)
EP (1) EP1051780B1 (de)
AU (1) AU3342200A (de)
DE (1) DE69942909D1 (de)
WO (1) WO2000030221A2 (de)

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US6466599B1 (en) 1999-04-07 2002-10-15 Lambda Physik Ag Discharge unit for a high repetition rate excimer or molecular fluorine laser
US6804285B2 (en) * 1998-10-29 2004-10-12 Canon Kabushiki Kaisha Gas supply path structure for a gas laser
US7856044B2 (en) 1999-05-10 2010-12-21 Cymer, Inc. Extendable electrode for gas discharge laser
US6801560B2 (en) * 1999-05-10 2004-10-05 Cymer, Inc. Line selected F2 two chamber laser system
US6570901B2 (en) * 2000-02-24 2003-05-27 Lambda Physik Ag Excimer or molecular fluorine laser having lengthened electrodes
US6847671B1 (en) 2000-03-29 2005-01-25 Lambda Physik Ag Blower for gas laser
US6834066B2 (en) 2000-04-18 2004-12-21 Lambda Physik Ag Stabilization technique for high repetition rate gas discharge lasers
US7180081B2 (en) * 2000-06-09 2007-02-20 Cymer, Inc. Discharge produced plasma EUV light source
US6711202B2 (en) * 2000-06-09 2004-03-23 Cymer, Inc. Discharge laser with porous insulating layer covering anode discharge surface
US6904073B2 (en) * 2001-01-29 2005-06-07 Cymer, Inc. High power deep ultraviolet laser with long life optics
US6704340B2 (en) 2001-01-29 2004-03-09 Cymer, Inc. Lithography laser system with in-place alignment tool
US20050025882A1 (en) * 2001-01-29 2005-02-03 Partlo William N. Optical elements with protective undercoating
US6704339B2 (en) 2001-01-29 2004-03-09 Cymer, Inc. Lithography laser with beam delivery and beam pointing control
US7230964B2 (en) * 2001-04-09 2007-06-12 Cymer, Inc. Lithography laser with beam delivery and beam pointing control
US7079564B2 (en) * 2001-04-09 2006-07-18 Cymer, Inc. Control system for a two chamber gas discharge laser
US7039086B2 (en) * 2001-04-09 2006-05-02 Cymer, Inc. Control system for a two chamber gas discharge laser
US7009140B2 (en) * 2001-04-18 2006-03-07 Cymer, Inc. Laser thin film poly-silicon annealing optical system
US7167499B2 (en) * 2001-04-18 2007-01-23 Tcz Pte. Ltd. Very high energy, high stability gas discharge laser surface treatment system
US7061959B2 (en) * 2001-04-18 2006-06-13 Tcz Gmbh Laser thin film poly-silicon annealing system
US6928093B2 (en) * 2002-05-07 2005-08-09 Cymer, Inc. Long delay and high TIS pulse stretcher
US20050259709A1 (en) * 2002-05-07 2005-11-24 Cymer, Inc. Systems and methods for implementing an interaction between a laser shaped as a line beam and a film deposited on a substrate
US7830934B2 (en) * 2001-08-29 2010-11-09 Cymer, Inc. Multi-chamber gas discharge laser bandwidth control through discharge timing
US20050100072A1 (en) * 2001-11-14 2005-05-12 Rao Rajasekhar M. High power laser output beam energy density reduction
US7671349B2 (en) * 2003-04-08 2010-03-02 Cymer, Inc. Laser produced plasma EUV light source
US6798812B2 (en) 2002-01-23 2004-09-28 Cymer, Inc. Two chamber F2 laser system with F2 pressure based line selection
US7741639B2 (en) * 2003-01-31 2010-06-22 Cymer, Inc. Multi-chambered excimer or molecular fluorine gas discharge laser fluorine injection control
US7277188B2 (en) * 2003-04-29 2007-10-02 Cymer, Inc. Systems and methods for implementing an interaction between a laser shaped as a line beam and a film deposited on a substrate
US7209507B2 (en) * 2003-07-30 2007-04-24 Cymer, Inc. Method and apparatus for controlling the output of a gas discharge MOPA laser system
US7277464B2 (en) * 2003-12-18 2007-10-02 Cymer, Inc. Method and apparatus for controlling the output of a gas discharge laser system
US7006547B2 (en) * 2004-03-31 2006-02-28 Cymer, Inc. Very high repetition rate narrow band gas discharge laser system
US7522650B2 (en) * 2004-03-31 2009-04-21 Cymer, Inc. Gas discharge laser chamber improvements
US20050286599A1 (en) * 2004-06-29 2005-12-29 Rafac Robert J Method and apparatus for gas discharge laser output light coherency reduction
US7215695B2 (en) 2004-10-13 2007-05-08 Gigaphoton Discharge excitation type pulse laser apparatus
US20060222034A1 (en) * 2005-03-31 2006-10-05 Cymer, Inc. 6 Khz and above gas discharge laser system
US7633989B2 (en) * 2005-06-27 2009-12-15 Cymer, Inc. High pulse repetition rate gas discharge laser
US20070071047A1 (en) * 2005-09-29 2007-03-29 Cymer, Inc. 6K pulse repetition rate and above gas discharge laser system solid state pulse power system improvements
US7706424B2 (en) * 2005-09-29 2010-04-27 Cymer, Inc. Gas discharge laser system electrodes and power supply for delivering electrical energy to same
US7679029B2 (en) * 2005-10-28 2010-03-16 Cymer, Inc. Systems and methods to shape laser light as a line beam for interaction with a substrate having surface variations
US7317179B2 (en) * 2005-10-28 2008-01-08 Cymer, Inc. Systems and methods to shape laser light as a homogeneous line beam for interaction with a film deposited on a substrate
US7307237B2 (en) * 2005-12-29 2007-12-11 Honeywell International, Inc. Hand-held laser welding wand nozzle assembly including laser and feeder extension tips
US8803027B2 (en) * 2006-06-05 2014-08-12 Cymer, Llc Device and method to create a low divergence, high power laser beam for material processing applications
US8814522B2 (en) * 2007-06-15 2014-08-26 Cymer, Llc Cross-flow fan impeller for a transversley excited, pulsed, gas discharge laser
US7655925B2 (en) * 2007-08-31 2010-02-02 Cymer, Inc. Gas management system for a laser-produced-plasma EUV light source
US7812329B2 (en) * 2007-12-14 2010-10-12 Cymer, Inc. System managing gas flow between chambers of an extreme ultraviolet (EUV) photolithography apparatus
US8519366B2 (en) * 2008-08-06 2013-08-27 Cymer, Inc. Debris protection system having a magnetic field for an EUV light source
US7995637B2 (en) * 2008-10-21 2011-08-09 Cymer, Inc. Gas discharge laser chamber
US7720120B2 (en) * 2008-10-21 2010-05-18 Cymer, Inc. Method and apparatus for laser control in a two chamber gas discharge laser
US7756171B2 (en) * 2008-10-21 2010-07-13 Cymer, Inc. Method and apparatus for laser control in a two chamber gas discharge laser
US7751453B2 (en) * 2008-10-21 2010-07-06 Cymer, Inc. Method and apparatus for laser control in a two chamber gas discharge laser
JP5687488B2 (ja) 2010-02-22 2015-03-18 ギガフォトン株式会社 極端紫外光生成装置
CN102779706B (zh) * 2011-10-20 2015-07-22 中国科学院光电研究院 一种放电腔内的气动结构

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US4835785A (en) * 1987-09-30 1989-05-30 Spectra-Physics, Inc. Isolator for laser optical assemblies
US4959840A (en) * 1988-01-15 1990-09-25 Cymer Laser Technologies Compact excimer laser including an electrode mounted in insulating relationship to wall of the laser
US4894582A (en) * 1988-10-12 1990-01-16 Spectra-Physics, Inc. Method and apparatus for enhancing spark channel recovery by spark-generated unsteady flows
JPH0685350A (ja) * 1992-09-02 1994-03-25 Toshiba Corp ガスレーザ発振装置
US5924975A (en) * 1995-08-30 1999-07-20 International Business Machines Corporation Linear pump
US5592504A (en) * 1995-10-10 1997-01-07 Cameron; Harold A. Transversely excited non waveguide RF gas laser configuration
US5978405A (en) * 1998-03-06 1999-11-02 Cymer, Inc. Laser chamber with minimized acoustic and shock wave disturbances

Also Published As

Publication number Publication date
WO2000030221A2 (en) 2000-05-25
WO2000030221A3 (en) 2000-09-08
EP1051780A2 (de) 2000-11-15
EP1051780B1 (de) 2010-11-03
US6212211B1 (en) 2001-04-03
AU3342200A (en) 2000-06-05
EP1051780A4 (de) 2006-02-01

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