DE69937867D1 - Trägerstruktur für Gaslaserkammer und -Optik - Google Patents

Trägerstruktur für Gaslaserkammer und -Optik

Info

Publication number
DE69937867D1
DE69937867D1 DE69937867T DE69937867T DE69937867D1 DE 69937867 D1 DE69937867 D1 DE 69937867D1 DE 69937867 T DE69937867 T DE 69937867T DE 69937867 T DE69937867 T DE 69937867T DE 69937867 D1 DE69937867 D1 DE 69937867D1
Authority
DE
Germany
Prior art keywords
optics
carrier structure
gas laser
laser chamber
chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69937867T
Other languages
English (en)
Other versions
DE69937867T2 (de
Inventor
Xiaojiang J Pan
James K Howey
Curtiss L Mixon
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Cymer Inc
Original Assignee
Cymer Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cymer Inc filed Critical Cymer Inc
Application granted granted Critical
Publication of DE69937867D1 publication Critical patent/DE69937867D1/de
Publication of DE69937867T2 publication Critical patent/DE69937867T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • General Physics & Mathematics (AREA)
  • Lasers (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
DE69937867T 1998-10-16 1999-10-14 Trägerstruktur für Gaslaserkammer und -Optik Expired - Lifetime DE69937867T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/174,155 US6109574A (en) 1996-01-05 1998-10-16 Gas laser chamber/optics support structure
US174155 1998-10-16

Publications (2)

Publication Number Publication Date
DE69937867D1 true DE69937867D1 (de) 2008-02-14
DE69937867T2 DE69937867T2 (de) 2009-01-02

Family

ID=22635066

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69937867T Expired - Lifetime DE69937867T2 (de) 1998-10-16 1999-10-14 Trägerstruktur für Gaslaserkammer und -Optik

Country Status (4)

Country Link
US (1) US6109574A (de)
EP (1) EP0994541B1 (de)
JP (1) JP2000183426A (de)
DE (1) DE69937867T2 (de)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6586757B2 (en) 1997-05-12 2003-07-01 Cymer, Inc. Plasma focus light source with active and buffer gas control
US6757316B2 (en) 1999-12-27 2004-06-29 Cymer, Inc. Four KHz gas discharge laser
US6795474B2 (en) * 2000-11-17 2004-09-21 Cymer, Inc. Gas discharge laser with improved beam path
US6801560B2 (en) 1999-05-10 2004-10-05 Cymer, Inc. Line selected F2 two chamber laser system
US7856044B2 (en) 1999-05-10 2010-12-21 Cymer, Inc. Extendable electrode for gas discharge laser
US6590922B2 (en) 1999-09-27 2003-07-08 Cymer, Inc. Injection seeded F2 laser with line selection and discrimination
US6556600B2 (en) 1999-09-27 2003-04-29 Cymer, Inc. Injection seeded F2 laser with centerline wavelength control
US6466601B1 (en) 2001-04-13 2002-10-15 Cymer, Inc. Beam seal for line narrowed production laser
US7180081B2 (en) * 2000-06-09 2007-02-20 Cymer, Inc. Discharge produced plasma EUV light source
US6425559B1 (en) 2000-09-29 2002-07-30 Cymer, Inc. Gas laser chamber with vertical vibration isolator
US6839372B2 (en) * 2000-11-17 2005-01-04 Cymer, Inc. Gas discharge ultraviolet laser with enclosed beam path with added oxidizer
US6928093B2 (en) * 2002-05-07 2005-08-09 Cymer, Inc. Long delay and high TIS pulse stretcher
US7671349B2 (en) * 2003-04-08 2010-03-02 Cymer, Inc. Laser produced plasma EUV light source
US20040101018A1 (en) * 2002-08-28 2004-05-27 Syb Leijenaar Suspension system for laser discharge unit
US20050271110A1 (en) * 2003-08-22 2005-12-08 Rainer Paetzel Excimer laser system with stable beam output
US7064908B2 (en) * 2004-04-21 2006-06-20 The Boeing Company Laser beam jitter reduction device on a laser optical bench
US20050286599A1 (en) * 2004-06-29 2005-12-29 Rafac Robert J Method and apparatus for gas discharge laser output light coherency reduction
US8379687B2 (en) 2005-06-30 2013-02-19 Cymer, Inc. Gas discharge laser line narrowing module
US7321607B2 (en) * 2005-11-01 2008-01-22 Cymer, Inc. External optics and chamber support system
US7812329B2 (en) * 2007-12-14 2010-10-12 Cymer, Inc. System managing gas flow between chambers of an extreme ultraviolet (EUV) photolithography apparatus
US7655925B2 (en) * 2007-08-31 2010-02-02 Cymer, Inc. Gas management system for a laser-produced-plasma EUV light source
US8519366B2 (en) * 2008-08-06 2013-08-27 Cymer, Inc. Debris protection system having a magnetic field for an EUV light source
JP5687488B2 (ja) 2010-02-22 2015-03-18 ギガフォトン株式会社 極端紫外光生成装置
CN103259159B (zh) * 2013-04-26 2016-05-04 中国科学院光电研究院 光机分离式双腔准分子激光器整机框架***
CN104595642B (zh) * 2015-01-06 2016-05-04 山东大学 一种二自由度压电驱动纳米定位平台

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4760583A (en) * 1983-05-06 1988-07-26 Coherent, Inc. Laser delivery system
US4534047A (en) * 1984-01-06 1985-08-06 The Perkin-Elmer Corporation Mask ring assembly for X-ray lithography
US4719641A (en) * 1985-11-08 1988-01-12 Summit Technology, Inc. Multiple chamber laser containment system
US4818089A (en) * 1987-04-24 1989-04-04 Coherent, Inc. Kinematic resonator support
DE3917408A1 (de) * 1988-06-06 1989-12-07 Takenaka Corp Daempfungssockel
US5040953A (en) * 1988-09-19 1991-08-20 Copeland Corporation Mounting system
DE4313675C1 (de) * 1993-04-22 1994-05-26 Mannesmann Ag Lichtsetzgerät
US5863017A (en) * 1996-01-05 1999-01-26 Cymer, Inc. Stabilized laser platform and module interface

Also Published As

Publication number Publication date
EP0994541A3 (de) 2002-09-25
EP0994541B1 (de) 2008-01-02
US6109574A (en) 2000-08-29
DE69937867T2 (de) 2009-01-02
JP2000183426A (ja) 2000-06-30
EP0994541A2 (de) 2000-04-19

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition