DE69918592D1 - Linsenfassung und Projektor mit Ausrichtanordnung - Google Patents

Linsenfassung und Projektor mit Ausrichtanordnung

Info

Publication number
DE69918592D1
DE69918592D1 DE69918592T DE69918592T DE69918592D1 DE 69918592 D1 DE69918592 D1 DE 69918592D1 DE 69918592 T DE69918592 T DE 69918592T DE 69918592 T DE69918592 T DE 69918592T DE 69918592 D1 DE69918592 D1 DE 69918592D1
Authority
DE
Germany
Prior art keywords
projector
lens holder
alignment arrangement
alignment
arrangement
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69918592T
Other languages
English (en)
Other versions
DE69918592T3 (de
DE69918592T2 (de
Inventor
Yuji Sudoh
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=26452400&utm_source=***_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE69918592(D1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Canon Inc filed Critical Canon Inc
Application granted granted Critical
Publication of DE69918592D1 publication Critical patent/DE69918592D1/de
Publication of DE69918592T2 publication Critical patent/DE69918592T2/de
Publication of DE69918592T3 publication Critical patent/DE69918592T3/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
    • G02B27/0037—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration with diffracting elements
    • G02B27/0043—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration with diffracting elements in projection exposure systems, e.g. microlithographic systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
    • G02B27/4205—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive optical element [DOE] contributing to image formation, e.g. whereby modulation transfer function MTF or optical aberrations are relevant
    • G02B27/4222—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive optical element [DOE] contributing to image formation, e.g. whereby modulation transfer function MTF or optical aberrations are relevant in projection exposure systems, e.g. photolithographic systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
    • G02B27/4272—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having plural diffractive elements positioned sequentially along the optical path
    • G02B27/4277—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having plural diffractive elements positioned sequentially along the optical path being separated by an air space
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Lens Barrels (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Projection Apparatus (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
DE69918592T 1998-04-23 1999-04-23 Linsenfassung und Projektor mit Ausrichtanordnung Expired - Lifetime DE69918592T3 (de)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP12952398 1998-04-23
JP12952398 1998-04-23
JP11341399 1999-04-21
JP11113413A JP3031375B2 (ja) 1998-04-23 1999-04-21 レンズ鏡筒及びそれを用いた投影露光装置
EP99108057A EP0952490B2 (de) 1998-04-23 1999-04-23 Linsenfassung und Projektor mit Ausrichtanordnung

Publications (3)

Publication Number Publication Date
DE69918592D1 true DE69918592D1 (de) 2004-08-19
DE69918592T2 DE69918592T2 (de) 2005-07-28
DE69918592T3 DE69918592T3 (de) 2011-07-28

Family

ID=26452400

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69918592T Expired - Lifetime DE69918592T3 (de) 1998-04-23 1999-04-23 Linsenfassung und Projektor mit Ausrichtanordnung

Country Status (4)

Country Link
US (2) US6285512B1 (de)
EP (1) EP0952490B2 (de)
JP (1) JP3031375B2 (de)
DE (1) DE69918592T3 (de)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001075501A1 (fr) * 2000-03-31 2001-10-11 Nikon Corporation Procede et dispositif de soutien d'un element optique, dispositif optique, appareil d'exposition, et procede de fabrication d'un dispositif
JP2001343582A (ja) * 2000-05-30 2001-12-14 Nikon Corp 投影光学系、当該投影光学系を備えた露光装置、及び当該露光装置を用いたマイクロデバイスの製造方法
JP2002090606A (ja) * 2000-09-18 2002-03-27 Olympus Optical Co Ltd 光学機器
CN1227717C (zh) 2000-11-10 2005-11-16 株式会社尼康 光学单元、曝光设备和器件制造法
US20020089758A1 (en) * 2001-01-05 2002-07-11 Nikon Corporation Optical component thickness adjustment method, optical component, and position adjustment method for optical component
JP2004526331A (ja) * 2001-05-15 2004-08-26 カール・ツアイス・エスエムテイ・アーゲー フッ化物結晶レンズを含む対物レンズ
DE10123725A1 (de) * 2001-05-15 2002-11-21 Zeiss Carl Projektionsbelichtungsanlage der Mikrolithographie, Optisches System und Herstellverfahren
US7239447B2 (en) * 2001-05-15 2007-07-03 Carl Zeiss Smt Ag Objective with crystal lenses
DE10162796B4 (de) * 2001-12-20 2007-10-31 Carl Zeiss Smt Ag Verfahren zur Optimierung der Abbildungseigenschaften von mindestens zwei optischen Elementen sowie photolithographisches Fertigungsverfahren
TWI223863B (en) * 2002-04-22 2004-11-11 Nikon Corp Support apparatus, optical apparatus, exposure apparatus and manufacturing method of device
WO2003092696A1 (en) * 2002-04-30 2003-11-13 Novartis Ag Method for decreasing capillary permeability in the retina
FR2861470B1 (fr) * 2003-10-24 2006-02-10 Optogone Sa Systeme optique a composants optiques en espace libre maintenus au moyens d'une ceinture
US7581305B2 (en) 2004-04-12 2009-09-01 Carl Zeiss Smt Ag Method of manufacturing an optical component
JP4013928B2 (ja) * 2004-07-15 2007-11-28 セイコーエプソン株式会社 照明装置、非球面レンズの設計方法、非球面レンズ及びプロジェクタ
DE102005019716A1 (de) * 2005-04-28 2006-11-02 Carl Zeiss Smt Ag Optisches System mit einem optischen Element
TW201312297A (zh) * 2011-09-12 2013-03-16 Mapper Lithography Ip Bv 用於提供二個或以上模組之調準堆疊之組件以及包含此組件之微影系統或顯微系統
US9254538B2 (en) * 2013-04-16 2016-02-09 Corning Incorporated Method of minimizing stacking element distortions in optical assemblies
DE102015106184B4 (de) * 2015-04-22 2021-09-02 Friedrich-Schiller-Universität Jena Verfahren zur Formgebung und/oder Formkorrektur mindestens eines optischen Elements
US10859784B2 (en) 2017-02-06 2020-12-08 Lite-On Electronics (Guangzhou) Limited Optical assembly and camera module
JP7178932B2 (ja) 2019-03-12 2022-11-28 キヤノン株式会社 露光装置、および物品製造方法
CN115023638A (zh) * 2020-03-31 2022-09-06 株式会社藤仓 光运算装置、以及光运算装置的制造方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4043644A (en) 1976-07-15 1977-08-23 Humphrey Instruments, Inc. Elastically compensated off-axis mirror
JPS60170812A (ja) 1984-02-15 1985-09-04 Olympus Optical Co Ltd 光学素子の保持装置
JPS61278141A (ja) 1985-05-31 1986-12-09 Canon Inc 投影倍率調整方法
US5428482A (en) * 1991-11-04 1995-06-27 General Signal Corporation Decoupled mount for optical element and stacked annuli assembly
JPH0817719A (ja) 1994-06-30 1996-01-19 Nikon Corp 投影露光装置
US5557469A (en) 1994-10-28 1996-09-17 Ultratech Stepper, Inc. Beamsplitter in single fold optical system and optical variable magnification method and system
US5774274A (en) * 1995-05-12 1998-06-30 Schachar; Ronald A. Variable focus lens by small changes of the equatorial lens diameter
DE19623418C2 (de) 1996-06-12 2001-04-19 Zeiss Carl Jena Gmbh Selbstzentrierende Halterung für mindestens eine Linsenbaugruppe
JPH10133150A (ja) 1996-10-29 1998-05-22 Canon Inc 回折光学装置及びこれを用いた露光装置
JP3037163B2 (ja) * 1996-11-26 2000-04-24 キヤノン株式会社 光学素子支持装置、光学機器及びステッパー
JPH10186196A (ja) 1996-12-20 1998-07-14 Canon Inc 光学素子支持装置およびこれを備えた光学機器、露光装置
JP3703251B2 (ja) 1997-04-30 2005-10-05 キヤノン株式会社 回折光学素子を有した光学系
JPH10256142A (ja) 1997-03-07 1998-09-25 Canon Inc 投影露光装置、その組立方法及びその調整方法並びにそれを用いたデバイス製造方法

Also Published As

Publication number Publication date
EP0952490B2 (de) 2011-03-02
DE69918592T3 (de) 2011-07-28
DE69918592T2 (de) 2005-07-28
US6285512B1 (en) 2001-09-04
EP0952490A2 (de) 1999-10-27
EP0952490B1 (de) 2004-07-14
JP2000009980A (ja) 2000-01-14
US6563652B2 (en) 2003-05-13
EP0952490A3 (de) 1999-12-08
US20010038497A1 (en) 2001-11-08
JP3031375B2 (ja) 2000-04-10

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Legal Events

Date Code Title Description
8363 Opposition against the patent
8366 Restricted maintained after opposition proceedings