DE69904073T2 - Oximderivate und ihre verwendung als latente saüre - Google Patents

Oximderivate und ihre verwendung als latente saüre

Info

Publication number
DE69904073T2
DE69904073T2 DE69904073T DE69904073T DE69904073T2 DE 69904073 T2 DE69904073 T2 DE 69904073T2 DE 69904073 T DE69904073 T DE 69904073T DE 69904073 T DE69904073 T DE 69904073T DE 69904073 T2 DE69904073 T2 DE 69904073T2
Authority
DE
Germany
Prior art keywords
oxime derivatives
latent acid
latent
oxime
derivatives
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69904073T
Other languages
English (en)
Other versions
DE69904073D1 (de
Inventor
Hitoshi Yamato
Toshikage Asakura
Jean-Luc Birbaum
Kurt Dietliker
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF Schweiz AG
Original Assignee
Ciba Spezialitaetenchemie Holding AG
Ciba SC Holding AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Spezialitaetenchemie Holding AG, Ciba SC Holding AG filed Critical Ciba Spezialitaetenchemie Holding AG
Application granted granted Critical
Publication of DE69904073D1 publication Critical patent/DE69904073D1/de
Publication of DE69904073T2 publication Critical patent/DE69904073T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C255/00—Carboxylic acid nitriles
    • C07C255/63—Carboxylic acid nitriles containing cyano groups and nitrogen atoms further bound to other hetero atoms, other than oxygen atoms of nitro or nitroso groups, bound to the same carbon skeleton
    • C07C255/64—Carboxylic acid nitriles containing cyano groups and nitrogen atoms further bound to other hetero atoms, other than oxygen atoms of nitro or nitroso groups, bound to the same carbon skeleton with the nitrogen atoms further bound to oxygen atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D333/00—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom
    • C07D333/02—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings
    • C07D333/04—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom
    • C07D333/26—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D333/30—Hetero atoms other than halogen
    • C07D333/36—Nitrogen atoms
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/117—Free radical
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Heterocyclic Compounds Containing Sulfur Atoms (AREA)
DE69904073T 1998-10-29 1999-10-18 Oximderivate und ihre verwendung als latente saüre Expired - Lifetime DE69904073T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP98811084 1998-10-29
PCT/EP1999/007876 WO2000026219A1 (en) 1998-10-29 1999-10-18 Oxime derivatives and the use thereof as latent acids

Publications (2)

Publication Number Publication Date
DE69904073D1 DE69904073D1 (de) 2003-01-02
DE69904073T2 true DE69904073T2 (de) 2003-07-17

Family

ID=8236416

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69904073T Expired - Lifetime DE69904073T2 (de) 1998-10-29 1999-10-18 Oximderivate und ihre verwendung als latente saüre

Country Status (8)

Country Link
US (1) US6485886B1 (de)
EP (1) EP1124832B1 (de)
JP (1) JP2002528550A (de)
KR (1) KR100634037B1 (de)
CN (2) CN1205215C (de)
AU (1) AU6340899A (de)
DE (1) DE69904073T2 (de)
WO (1) WO2000026219A1 (de)

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AU6340899A (en) * 1998-10-29 2000-05-22 Ciba Specialty Chemicals Holding Inc. Oxime derivatives and the use thereof as latent acids
NL1014545C2 (nl) * 1999-03-31 2002-02-26 Ciba Sc Holding Ag Oxim-derivaten en de toepassing daarvan als latente zuren.
KR100875612B1 (ko) * 2001-06-01 2008-12-24 시바 홀딩 인크 치환된 옥심 유도체 및 이를 포함하는 조성물
US7098463B2 (en) * 2003-03-03 2006-08-29 Heuris Pharma, Llc Three-dimensional dosimeter for penetrating radiation and method of use
WO2004081664A2 (en) * 2003-03-11 2004-09-23 Arch Specialty Chemicals, Inc. Novel photosensitive resin compositions
US20070020793A1 (en) * 2004-03-01 2007-01-25 Adamovics John A Three-dimensional shaped solid dosimeter and method of use
EP1789188A2 (de) * 2004-07-21 2007-05-30 CIBA SPECIALTY CHEMICALS HOLDING INC. Patent Departement Verfahren zur photoaktivierung und verwendung eines katalysators mittels invertiertem zweistufigem verfahren
JP4548617B2 (ja) * 2006-06-09 2010-09-22 信越化学工業株式会社 化学増幅レジスト材料用光酸発生剤、及び該光酸発生剤を含有するレジスト材料、並びにこれを用いたパターン形成方法
US8466096B2 (en) * 2007-04-26 2013-06-18 Afton Chemical Corporation 1,3,2-dioxaphosphorinane, 2-sulfide derivatives for use as anti-wear additives in lubricant compositions
GB2450975B (en) 2007-07-12 2010-02-24 Ciba Holding Inc Yellow radiation curing inks
WO2010112408A1 (en) 2009-03-30 2010-10-07 Basf Se Uv-dose indicator films
KR101542648B1 (ko) 2009-09-18 2015-08-06 헨켈 아이피 앤드 홀딩 게엠베하 포스포네이트 결합 조성물
US9125829B2 (en) 2012-08-17 2015-09-08 Hallstar Innovations Corp. Method of photostabilizing UV absorbers, particularly dibenzyolmethane derivatives, e.g., Avobenzone, with cyano-containing fused tricyclic compounds
US9145383B2 (en) 2012-08-10 2015-09-29 Hallstar Innovations Corp. Compositions, apparatus, systems, and methods for resolving electronic excited states
US9867800B2 (en) 2012-08-10 2018-01-16 Hallstar Innovations Corp. Method of quenching singlet and triplet excited states of pigments, such as porphyrin compounds, particularly protoporphyrin IX, with conjugated fused tricyclic compounds have electron withdrawing groups, to reduce generation of reactive oxygen species, particularly singlet oxygen
ES2706881T3 (es) 2014-05-30 2019-04-01 Igm Resins Italia Srl Fotoiniciadores de óxido de acilfosfina multifuncionales
WO2016174043A1 (de) 2015-04-29 2016-11-03 Bsn Medical Gmbh Mehrstufiges verfahren zur no-herstellung
BR112017023170B1 (pt) 2015-04-29 2022-08-16 Bsn Medical Gmbh Dispositivo de banho medicinal e seu uso
DE102016111590A1 (de) 2016-06-24 2017-12-28 Delo Industrie Klebstoffe Gmbh & Co. Kgaa Einkomponentenmasse auf Basis von Alkoxysilanen und Verfahren zum Fügen oder Vergießen von Bauteilen unter Verwendung der Masse
US11226560B2 (en) * 2017-02-23 2022-01-18 Hd Microsystems, Ltd. Photosensitive resin composition, cured pattern production method, cured product, interlayer insulating film, cover coat layer, surface protective layer, and electronic component
DE102017126215A1 (de) 2017-11-09 2019-05-09 Delo Industrie Klebstoffe Gmbh & Co. Kgaa Verfahren zur Erzeugung opaker Beschichtungen, Verklebungen und Vergüsse sowie härtbare Masse zur Verwendung in dem Verfahren
US11555081B2 (en) 2018-09-07 2023-01-17 Igm Resins Italia S.R.L. Multifunctional bisacylphosphine oxide photoinitiators
DE102018127854A1 (de) 2018-11-08 2020-05-14 Delo Industrie Klebstoffe Gmbh & Co. Kgaa Feuchtigkeitshärtbare Einkomponentenmasse und Verfahren zum Fügen, Vergießen und Beschichten unter Verwendung der Masse
CN113518805B (zh) 2018-12-28 2023-08-08 意大利艾坚蒙树脂有限公司 光引发剂
CN114829348A (zh) 2019-10-11 2022-07-29 意大利艾坚蒙树脂有限公司 用于led光固化的香豆素乙醛酸酯
IT202000023815A1 (it) 2020-10-09 2022-04-09 Igm Resins Italia Srl Ketoquinolones as photonitiators
IT202100014885A1 (it) 2021-06-08 2022-12-08 Igm Resins Italia Srl Fotoiniziatori a base di silicio bifunzionali
IT202100025868A1 (it) 2021-10-08 2023-04-08 Igm Resins Italia Srl Nuovi fotoiniziatori
WO2023161049A1 (en) 2022-02-24 2023-08-31 Igm Resins Italia S.R.L. Photoinitiators
DE102022106647A1 (de) 2022-03-22 2023-09-28 Delo Industrie Klebstoffe Gmbh & Co. Kgaa Niedertemperaturhärtende Massen auf Basis von Glycidylethern
WO2023214013A1 (en) 2022-05-06 2023-11-09 Igm Group B. V. Photoinitiator package comprising phosphine oxide photoinitiators, coumarin-based sensitizers and amine additives
WO2023214012A1 (en) 2022-05-06 2023-11-09 Igm Group B. V. Photoinitiator package comprising phosphine oxide photoinitiators, oxazole-based sensitizers and amine additives
EP4273200A1 (de) 2022-05-06 2023-11-08 IGM Group B.V. Photoinitiatorpaket mit speziellen bisacylphosphinoxid-photoinitiatoren und optischen aufheller-sensibilisatoren
WO2024074945A1 (en) 2022-10-05 2024-04-11 Igm Resins Italia S.R.L. Polymeric (meth)acrylate photoinitiators

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4540598A (en) 1983-08-17 1985-09-10 Ciba-Geigy Corporation Process for curing acid-curable finishes
JPH04362647A (ja) * 1991-06-10 1992-12-15 Konica Corp 感光性組成物
DE59309494D1 (de) 1992-05-22 1999-05-12 Ciba Geigy Ag Hochauflösender I-Linien Photoresist mit höherer Empfindlichkeit
JPH0990627A (ja) * 1995-09-27 1997-04-04 Toray Ind Inc 感光性ポリイミド前駆体組成物
JP3830183B2 (ja) * 1995-09-29 2006-10-04 東京応化工業株式会社 オキシムスルホネート化合物及びレジスト用酸発生剤
MY117352A (en) 1995-10-31 2004-06-30 Ciba Sc Holding Ag Oximesulfonic acid esters and the use thereof as latent sulfonic acids.
JP3591743B2 (ja) * 1996-02-02 2004-11-24 東京応化工業株式会社 化学増幅型レジスト組成物
CN1133901C (zh) 1996-09-02 2004-01-07 西巴特殊化学品控股有限公司 用于高感光的高分辨性i-谱线光致抗蚀剂的烷基磺酰肟化合物
JP3655030B2 (ja) 1996-12-10 2005-06-02 東京応化工業株式会社 ネガ型化学増幅型レジスト組成物
TW550439B (en) 1997-07-01 2003-09-01 Ciba Sc Holding Ag New oxime sulfonates as latent acids and compositions and photoresists comprising said oxime sulfonates
AU6340899A (en) * 1998-10-29 2000-05-22 Ciba Specialty Chemicals Holding Inc. Oxime derivatives and the use thereof as latent acids
ES2201703T3 (es) * 1999-03-05 2004-03-16 Exxonmobil Research And Engineering Company Ferrierita intercambiada con ion de metal de tierras raras.

Also Published As

Publication number Publication date
EP1124832B1 (de) 2002-11-20
AU6340899A (en) 2000-05-22
CN1325401A (zh) 2001-12-05
CN1636971A (zh) 2005-07-13
KR20010081100A (ko) 2001-08-27
CN1205215C (zh) 2005-06-08
EP1124832A1 (de) 2001-08-22
WO2000026219A1 (en) 2000-05-11
KR100634037B1 (ko) 2006-10-17
JP2002528550A (ja) 2002-09-03
US6485886B1 (en) 2002-11-26
DE69904073D1 (de) 2003-01-02

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8328 Change in the person/name/address of the agent

Representative=s name: PFENNING MEINIG & PARTNER GBR, 80339 MUENCHEN

8327 Change in the person/name/address of the patent owner

Owner name: CIBA HOLDING INC., BASEL, CH

8328 Change in the person/name/address of the agent

Representative=s name: MAIWALD PATENTANWALTSGESELLSCHAFT MBH, 80335 MUENC