DE69827389D1 - Photothermischer mikrotechnologisch hergestellter gassensor - Google Patents

Photothermischer mikrotechnologisch hergestellter gassensor

Info

Publication number
DE69827389D1
DE69827389D1 DE69827389T DE69827389T DE69827389D1 DE 69827389 D1 DE69827389 D1 DE 69827389D1 DE 69827389 T DE69827389 T DE 69827389T DE 69827389 T DE69827389 T DE 69827389T DE 69827389 D1 DE69827389 D1 DE 69827389D1
Authority
DE
Germany
Prior art keywords
photothermal
gas sensor
produced gas
microtechnologically
microtechnologically produced
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69827389T
Other languages
English (en)
Other versions
DE69827389T2 (de
Inventor
Andrew Wood
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Honeywell Inc
Original Assignee
Honeywell Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Honeywell Inc filed Critical Honeywell Inc
Application granted granted Critical
Publication of DE69827389D1 publication Critical patent/DE69827389D1/de
Publication of DE69827389T2 publication Critical patent/DE69827389T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/171—Systems in which incident light is modified in accordance with the properties of the material investigated with calorimetric detection, e.g. with thermal lens detection

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
DE69827389T 1997-06-30 1998-06-26 Photothermischer mikrotechnologisch hergestellter gassensor Expired - Lifetime DE69827389T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US08/884,824 US5852308A (en) 1997-06-30 1997-06-30 Micromachined inferential opto-thermal gas sensor
US884824 1997-06-30
PCT/US1998/013230 WO1999000659A1 (en) 1997-06-30 1998-06-26 Micromachined opto-thermal gas sensor

Publications (2)

Publication Number Publication Date
DE69827389D1 true DE69827389D1 (de) 2004-12-09
DE69827389T2 DE69827389T2 (de) 2005-11-24

Family

ID=25385485

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69827389T Expired - Lifetime DE69827389T2 (de) 1997-06-30 1998-06-26 Photothermischer mikrotechnologisch hergestellter gassensor

Country Status (6)

Country Link
US (1) US5852308A (de)
EP (1) EP0993602B1 (de)
JP (1) JP4054069B2 (de)
CA (1) CA2284836A1 (de)
DE (1) DE69827389T2 (de)
WO (1) WO1999000659A1 (de)

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US6322670B2 (en) 1996-12-31 2001-11-27 Honeywell International Inc. Flexible high performance microbolometer detector material fabricated via controlled ion beam sputter deposition process
KR100377946B1 (ko) * 2000-07-15 2003-03-29 한국과학기술원 덴드리머를 이용한 단분자막의 제조방법
US20060125092A1 (en) * 2000-07-18 2006-06-15 Marshall Paul N High density integrated circuit package architecture
US6474138B1 (en) 2000-11-28 2002-11-05 Honeywell International Inc. Adsorption based carbon monoxide sensor and method
US6550310B1 (en) 2000-11-28 2003-04-22 Honeywell International Inc. Catalytic adsorption and oxidation based carbon monoxide sensor and detection method
US6631638B2 (en) 2001-01-30 2003-10-14 Rosemount Aerospace Inc. Fluid flow sensor
US6885786B2 (en) * 2001-02-07 2005-04-26 Shipley Company, L.L.C. Combined wet and dry etching process for micromachining of crystalline materials
US6907150B2 (en) * 2001-02-07 2005-06-14 Shipley Company, L.L.C. Etching process for micromachining crystalline materials and devices fabricated thereby
US20030021572A1 (en) * 2001-02-07 2003-01-30 Steinberg Dan A. V-groove with tapered depth and method for making
US6964804B2 (en) * 2001-02-14 2005-11-15 Shipley Company, L.L.C. Micromachined structures made by combined wet and dry etching
US20020195417A1 (en) * 2001-04-20 2002-12-26 Steinberg Dan A. Wet and dry etching process on <110> silicon and resulting structures
JP2002328115A (ja) * 2001-04-27 2002-11-15 Yamatake Corp 光音響ガスセンサ用ガス拡散フィルタの製造方法
JP2002328116A (ja) * 2001-04-27 2002-11-15 Yamatake Corp 光音響ガスセンサ
JP2002328118A (ja) * 2001-04-27 2002-11-15 Yamatake Corp 光音響ガスセンサ用ガス拡散フィルタの製造方法
US7530257B2 (en) * 2002-09-27 2009-05-12 Honeywell International Inc. Phased micro analyzer VIII
US6792794B2 (en) * 2002-09-27 2004-09-21 Honeywell International Inc. Low power gas leak detector
TWI254025B (en) 2003-05-23 2006-05-01 Rohm & Haas Elect Mat Etching process for micromachining crystalline materials and devices fabricated thereby
CN100468029C (zh) * 2005-03-03 2009-03-11 清华大学 标准漏孔及其制作方法
US7518380B2 (en) * 2005-05-17 2009-04-14 Honeywell International Inc. Chemical impedance detectors for fluid analyzers
DE102007006153A1 (de) * 2007-02-07 2008-08-21 Tyco Electronics Raychem Gmbh Optische Gassensoranordnung in monolithisch integrierter Bauweise
SE534685C2 (sv) * 2008-12-12 2011-11-15 Senseair Ab Gassensorarrangemang för kretskort
SE533551C2 (sv) * 2009-02-12 2010-10-26 Senseair Ab En ljusdetektor anpassad att som diskret enhet fästas på en bärare
US9759610B2 (en) * 2012-08-01 2017-09-12 General Electric Company Method and device for dissolved gas analysis
EP2762857B1 (de) * 2012-12-19 2018-05-02 General Electric Company Verfahren und Vorrichtung zur Analyse von aufgelöstem Gas
DE102014200583B3 (de) * 2014-01-15 2015-05-13 Robert Bosch Gmbh Verfahren zum herstellen eines integrierten mikromechanischen fluidsensor-bauteils, integriertes mikromechanisches fluidsensor-bauteil und verfahren zum detektieren eines fluids mittels eines integrierten mikromechanischen fluidsensor-bauteils
DE102016103646B4 (de) * 2016-01-22 2023-03-02 Infineon Technologies Ag Integriertes photoakustisches gassensormodul
US9927360B2 (en) 2016-08-29 2018-03-27 Apple Inc. Electronic devices with environmental sensors
WO2019079878A1 (en) * 2017-10-27 2019-05-02 Rostrum Medical Innovations Inc. AIR QUALITY AND AIR COMPOSITION SENSOR
CN114325997B (zh) * 2021-11-24 2023-10-27 中国航空工业集团公司洛阳电光设备研究所 宽温范围精确温控的超窄带滤光片温控构型及其装调方法
DE102022128472A1 (de) * 2022-10-27 2024-05-02 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung eingetragener Verein Anordnung und Verfahren zur Bestimmung der Konzentration eines oder mehrerer Stoffe in einem flüssigen oder gasförmigen Medium

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DE4208135A1 (de) * 1992-03-13 1993-09-16 Siemens Ag Vorrichtung zur messung einer gas- oder fluessigkeitsstroemung
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US5550373A (en) * 1994-12-30 1996-08-27 Honeywell Inc. Fabry-Perot micro filter-detector
FI102696B1 (fi) * 1995-02-22 1999-01-29 Instrumentarium Oy Kaksoissäteilylähdekokoonpano ja mittausanturi
US5650624A (en) * 1995-04-13 1997-07-22 Engelhard Sensor Technologies, Inc. Passive infrared analysis gas sensor

Also Published As

Publication number Publication date
US5852308A (en) 1998-12-22
DE69827389T2 (de) 2005-11-24
EP0993602B1 (de) 2004-11-03
JP4054069B2 (ja) 2008-02-27
CA2284836A1 (en) 1999-01-07
WO1999000659A1 (en) 1999-01-07
JP2002511936A (ja) 2002-04-16
EP0993602A1 (de) 2000-04-19

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Legal Events

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8364 No opposition during term of opposition