DE69821206D1 - Rasterprobenmikroskop mit integriertem Ablenkungssensor - Google Patents

Rasterprobenmikroskop mit integriertem Ablenkungssensor

Info

Publication number
DE69821206D1
DE69821206D1 DE69821206T DE69821206T DE69821206D1 DE 69821206 D1 DE69821206 D1 DE 69821206D1 DE 69821206 T DE69821206 T DE 69821206T DE 69821206 T DE69821206 T DE 69821206T DE 69821206 D1 DE69821206 D1 DE 69821206D1
Authority
DE
Germany
Prior art keywords
deflection sensor
scanning sample
sample microscope
integrated deflection
integrated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69821206T
Other languages
English (en)
Other versions
DE69821206T2 (de
Inventor
Hiroshi Takahashi
Yoshiharu Shirakawabe
Nobuhiro Shimizu
Michel Despont
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi High Tech Science Corp
International Business Machines Corp
Original Assignee
Seiko Instruments Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Instruments Inc filed Critical Seiko Instruments Inc
Application granted granted Critical
Publication of DE69821206D1 publication Critical patent/DE69821206D1/de
Publication of DE69821206T2 publication Critical patent/DE69821206T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q60/00—Particular types of SPM [Scanning Probe Microscopy] or microscopes; Essential components thereof
    • G01Q60/24—AFM [Atomic Force Microscopy] or apparatus therefor, e.g. AFM probes
    • G01Q60/38—Probes, their manufacture, or their related instrumentation, e.g. holders
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y35/00—Methods or apparatus for measurement or analysis of nanostructures
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q20/00—Monitoring the movement or position of the probe
    • G01Q20/04—Self-detecting probes, i.e. wherein the probe itself generates a signal representative of its position, e.g. piezoelectric gauge
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q70/00—General aspects of SPM probes, their manufacture or their related instrumentation, insofar as they are not specially adapted to a single SPM technique covered by group G01Q60/00
    • G01Q70/06—Probe tip arrays
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00—Nanotechnology
    • Y10S977/84—Manufacture, treatment, or detection of nanostructure
    • Y10S977/849—Manufacture, treatment, or detection of nanostructure with scanning probe
    • Y10S977/86—Scanning probe structure
    • Y10S977/873—Tip holder

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • Radiology & Medical Imaging (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Analytical Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Length Measuring Devices With Unspecified Measuring Means (AREA)
  • Pressure Sensors (AREA)
DE69821206T 1997-11-20 1998-11-20 Rasterprobenmikroskop mit integriertem Ablenkungssensor Expired - Lifetime DE69821206T2 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP32018497 1997-11-20
JP32018497 1997-11-20
JP16117598 1998-06-09
JP16117598A JP3883699B2 (ja) 1997-11-20 1998-06-09 自己検知型ｓｐｍプローブ及びｓｐｍ装置

Publications (2)

Publication Number Publication Date
DE69821206D1 true DE69821206D1 (de) 2004-02-26
DE69821206T2 DE69821206T2 (de) 2004-06-17

Family

ID=26487406

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69821206T Expired - Lifetime DE69821206T2 (de) 1997-11-20 1998-11-20 Rasterprobenmikroskop mit integriertem Ablenkungssensor

Country Status (4)

Country Link
US (1) US6388252B1 (de)
EP (1) EP0922930B1 (de)
JP (1) JP3883699B2 (de)
DE (1) DE69821206T2 (de)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10058886C1 (de) * 2000-11-27 2002-05-23 Infineon Technologies Ag Verfahren zur Herstellung eines integrierten Halbleiter-Produkts
JP4598307B2 (ja) * 2001-05-31 2010-12-15 エスアイアイ・ナノテクノロジー株式会社 自己検知型ｓｐｍプローブ
JP4845308B2 (ja) * 2001-09-26 2011-12-28 日本電産コパル電子株式会社 半導体センサ及びその製造方法
DE50200467D1 (de) * 2002-03-20 2004-06-24 Nanoworld Ag Neuchatel SPM-Sensor und Verfahren zur Herstellung desselben
EP1550850A1 (de) * 2003-12-29 2005-07-06 STMicroelectronics S.r.l. Lese-/-Schreib-Gerät für Massenspeichergerät und Lese-/-Schreibverfahren dafür
US7421370B2 (en) * 2005-09-16 2008-09-02 Veeco Instruments Inc. Method and apparatus for measuring a characteristic of a sample feature
JP5044146B2 (ja) * 2006-06-01 2012-10-10 オンセミコンダクター・トレーディング・リミテッド 半導体装置
WO2008089950A1 (en) * 2007-01-22 2008-07-31 Nanofactory Instruments Ab Mems sensor for in situ tem atomic force microscopy
JP5242347B2 (ja) * 2008-11-11 2013-07-24 独立行政法人産業技術総合研究所 検出センサ
JP5226481B2 (ja) * 2008-11-27 2013-07-03 株式会社日立ハイテクサイエンス 自己変位検出型カンチレバーおよび走査型プローブ顕微鏡
GB2505467A (en) 2012-08-31 2014-03-05 Ibm Dynamic logic gate comprising a nano-electro-mechanical switch
GB201215512D0 (en) 2012-08-31 2012-10-17 Ibm Four terminal nano-electromechanical switch with a single mechanical contact

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4506283A (en) 1981-05-08 1985-03-19 Rockwell International Corporation Small area high value resistor with greatly reduced parasitic capacitance
US5172205A (en) 1990-09-26 1992-12-15 Nissan Motor Co., Ltd. Piezoresistive semiconductor device suitable for use in a pressure sensor
JPH05196458A (ja) 1991-01-04 1993-08-06 Univ Leland Stanford Jr 原子力顕微鏡用ピエゾ抵抗性片持ばり構造体
US5386720A (en) 1992-01-09 1995-02-07 Olympus Optical Co., Ltd. Integrated AFM sensor
US5444244A (en) 1993-06-03 1995-08-22 Park Scientific Instruments Corporation Piezoresistive cantilever with integral tip for scanning probe microscope
DE19710487A1 (de) * 1996-03-13 1997-09-18 Toshiba Kawasaki Kk Halbleitervorrichtung
EP0802394B1 (de) * 1996-04-18 2003-06-11 Seiko Instruments Inc. Halbleiterdehnungssensoren mit pn Übergang, Rastersondenmikroskop
KR100273220B1 (ko) * 1997-07-31 2000-12-15 김영환 반도체소자의제조방법

Also Published As

Publication number Publication date
DE69821206T2 (de) 2004-06-17
EP0922930A1 (de) 1999-06-16
JPH11211736A (ja) 1999-08-06
US6388252B1 (en) 2002-05-14
JP3883699B2 (ja) 2007-02-21
EP0922930B1 (de) 2004-01-21

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: SII NANO TECHNOLOGY INC., CHIBA, JP

Owner name: IBM CORP., ARMONK, N.Y., US