DE69804179D1 - Photoempfindliche Zusammensetzung - Google Patents

Photoempfindliche Zusammensetzung

Info

Publication number
DE69804179D1
DE69804179D1 DE69804179T DE69804179T DE69804179D1 DE 69804179 D1 DE69804179 D1 DE 69804179D1 DE 69804179 T DE69804179 T DE 69804179T DE 69804179 T DE69804179 T DE 69804179T DE 69804179 D1 DE69804179 D1 DE 69804179D1
Authority
DE
Germany
Prior art keywords
photosensitive composition
photosensitive
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69804179T
Other languages
English (en)
Other versions
DE69804179T2 (de
Inventor
Koichiro Aono
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Application granted granted Critical
Publication of DE69804179D1 publication Critical patent/DE69804179D1/de
Publication of DE69804179T2 publication Critical patent/DE69804179T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/016Diazonium salts or compounds
    • G03F7/021Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G03F7/0212Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
    • G03F7/0217Polyurethanes; Epoxy resins

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polyurethanes Or Polyureas (AREA)
DE1998604179 1997-09-10 1998-08-28 Photoempfindliche Zusammensetzung Expired - Lifetime DE69804179T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24547097 1997-09-10

Publications (2)

Publication Number Publication Date
DE69804179D1 true DE69804179D1 (de) 2002-04-18
DE69804179T2 DE69804179T2 (de) 2002-11-28

Family

ID=17134146

Family Applications (1)

Application Number Title Priority Date Filing Date
DE1998604179 Expired - Lifetime DE69804179T2 (de) 1997-09-10 1998-08-28 Photoempfindliche Zusammensetzung

Country Status (2)

Country Link
EP (1) EP0902325B1 (de)
DE (1) DE69804179T2 (de)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6638679B2 (en) 2001-07-12 2003-10-28 Kodak Polychrome Graphics, Llc Photosensitive compositions having mixtures of alkoxy and non-alkoxy diazonium salt containing compounds
JP7097482B1 (ja) * 2021-07-26 2022-07-07 東京応化工業株式会社 表面処理剤、表面処理方法及び基板表面の領域選択的製膜方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62175734A (ja) * 1986-01-30 1987-08-01 Fuji Photo Film Co Ltd 感光性組成物
JP3142185B2 (ja) * 1993-03-04 2001-03-07 富士写真フイルム株式会社 感光性平版印刷版の製造方法

Also Published As

Publication number Publication date
EP0902325A3 (de) 1999-07-21
DE69804179T2 (de) 2002-11-28
EP0902325B1 (de) 2002-03-13
EP0902325A2 (de) 1999-03-17

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: FUJIFILM CORP., TOKIO/TOKYO, JP