DE69802185D1 - Vorrichtung mit zwei spiegeln für einen interferometrisch kontrollierten positioniertisch - Google Patents
Vorrichtung mit zwei spiegeln für einen interferometrisch kontrollierten positioniertischInfo
- Publication number
- DE69802185D1 DE69802185D1 DE69802185T DE69802185T DE69802185D1 DE 69802185 D1 DE69802185 D1 DE 69802185D1 DE 69802185 T DE69802185 T DE 69802185T DE 69802185 T DE69802185 T DE 69802185T DE 69802185 D1 DE69802185 D1 DE 69802185D1
- Authority
- DE
- Germany
- Prior art keywords
- mirrors
- positioning table
- controlled positioning
- interferometrically controlled
- interferometrically
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/002—Measuring arrangements characterised by the use of optical techniques for measuring two or more coordinates
- G01B11/005—Measuring arrangements characterised by the use of optical techniques for measuring two or more coordinates coordinate measuring machines
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/26—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Instruments For Measurement Of Length By Optical Means (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US5278997P | 1997-07-08 | 1997-07-08 | |
US09/106,917 US6057921A (en) | 1997-07-08 | 1998-06-29 | Two piece mirror arrangement for interferometrically controlled stage |
PCT/US1998/013434 WO1999002938A2 (en) | 1997-07-08 | 1998-07-01 | Two piece mirror arrangement for interferometrically controlled stage |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69802185D1 true DE69802185D1 (de) | 2001-11-29 |
DE69802185T2 DE69802185T2 (de) | 2002-03-14 |
Family
ID=26731079
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69802185T Expired - Fee Related DE69802185T2 (de) | 1997-07-08 | 1998-07-01 | Vorrichtung mit zwei spiegeln für einen interferometrisch kontrollierten positioniertisch |
Country Status (9)
Country | Link |
---|---|
US (1) | US6057921A (de) |
EP (1) | EP0983481B1 (de) |
JP (1) | JP2002508079A (de) |
KR (1) | KR20010014187A (de) |
CA (1) | CA2296276A1 (de) |
DE (1) | DE69802185T2 (de) |
IL (1) | IL133750A0 (de) |
TW (1) | TW390957B (de) |
WO (1) | WO1999002938A2 (de) |
Families Citing this family (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW429414B (en) * | 1998-08-11 | 2001-04-11 | Nippon Kogaku Kk | Stage apparatus, position detector and exposure device |
DE10195052B3 (de) | 2000-01-25 | 2015-06-18 | Zygo Corp. | Verfahren und Einrichtungen zur Bestimmung einer geometrischen Eigenschaft eines Versuchsgegenstands sowie optisches Profilmesssystem |
US6728016B1 (en) | 2000-06-05 | 2004-04-27 | Calient Networks, Inc. | Safe procedure for moving mirrors in an optical cross-connect switch |
US6587611B1 (en) | 2000-06-06 | 2003-07-01 | Calient Networks, Inc. | Maintaining path integrity in an optical switch |
US6842248B1 (en) * | 2000-11-28 | 2005-01-11 | Nikon Corporation | System and method for calibrating mirrors of a stage assembly |
US6823278B1 (en) | 2001-01-26 | 2004-11-23 | Ta Instruments-Waters, Llc | Method and apparatus for positional calibration of a thermal analysis instrument |
US6760679B1 (en) * | 2001-01-26 | 2004-07-06 | Ta Instruments-Waters, Llc | Method and apparatus for positional calibration of a thermal analysis instrument |
US7330274B2 (en) * | 2002-05-13 | 2008-02-12 | Zygo Corporation | Compensation for geometric effects of beam misalignments in plane mirror interferometers |
US7025498B2 (en) * | 2003-05-30 | 2006-04-11 | Asml Holding N.V. | System and method of measuring thermal expansion |
US7286240B2 (en) * | 2003-06-19 | 2007-10-23 | Zygo Corporation | Compensation for geometric effects of beam misalignments in plane mirror interferometer metrology systems |
US7102736B2 (en) * | 2004-06-29 | 2006-09-05 | Asml Netherlands B.V. | Method of calibration, calibration substrate, and method of device manufacture |
US7511816B2 (en) * | 2005-06-16 | 2009-03-31 | Kla-Tencor Technologies Corp. | Methods and systems for determining drift in a position of a light beam with respect to a chuck |
GB2443644B (en) * | 2006-11-09 | 2010-01-20 | Vistec Lithography Ltd | Component mounting in movement sensitive equipment |
US20100020331A1 (en) * | 2008-07-25 | 2010-01-28 | Micronic Laser Systems Ab | Laser interferometer systems and methods with suppressed error and pattern generators having the same |
RU2446380C1 (ru) * | 2010-12-23 | 2012-03-27 | Государственное образовательное учреждение высшего профессионального образования "Санкт-Петербургский государственный электротехнический университет "ЛЭТИ" | Способ оценивания отклонения от перпендикулярности двух осей |
CN105043269B (zh) * | 2015-07-08 | 2017-09-29 | 上海与德通讯技术有限公司 | 一种物体尺寸的测量方法及电子设备 |
KR101694674B1 (ko) | 2015-09-14 | 2017-01-10 | 주식회사 힘스 | 검사용 카메라의 캘리브레이션 장치 |
CN105629678B (zh) * | 2016-01-25 | 2017-09-19 | 苏州苏大维格光电科技股份有限公司 | 一种直写***运动平台的正交性测定方法 |
CN110345870B (zh) * | 2019-08-09 | 2020-12-04 | 合肥工业大学 | 一种精密直线位移台的五自由度误差测量装置 |
CN112066961B (zh) * | 2020-09-15 | 2021-04-13 | 山东鑫诚精密机械有限公司 | 精密测量阿贝误差控制*** |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB8730169D0 (en) * | 1987-12-24 | 1988-02-03 | Renishaw Plc | Optical apparatus for use with interferometric measuring devices |
US5151749A (en) * | 1989-06-08 | 1992-09-29 | Nikon Corporation | Method of and apparatus for measuring coordinate position and positioning an object |
US5363196A (en) * | 1992-01-10 | 1994-11-08 | Ultratech Stepper, Inc. | Apparatus for measuring a departure from flatness or straightness of a nominally-plane mirror for a precision X-Y movable-stage |
JP3282233B2 (ja) * | 1992-08-18 | 2002-05-13 | 株式会社ニコン | 距離測定装置、及びそれを用いた投影露光装置 |
-
1998
- 1998-06-29 US US09/106,917 patent/US6057921A/en not_active Expired - Fee Related
- 1998-07-01 WO PCT/US1998/013434 patent/WO1999002938A2/en not_active Application Discontinuation
- 1998-07-01 JP JP50870899A patent/JP2002508079A/ja active Pending
- 1998-07-01 DE DE69802185T patent/DE69802185T2/de not_active Expired - Fee Related
- 1998-07-01 KR KR19997012262A patent/KR20010014187A/ko not_active Application Discontinuation
- 1998-07-01 IL IL13375098A patent/IL133750A0/xx unknown
- 1998-07-01 EP EP98931685A patent/EP0983481B1/de not_active Expired - Lifetime
- 1998-07-01 CA CA002296276A patent/CA2296276A1/en not_active Abandoned
- 1998-07-07 TW TW087110998A patent/TW390957B/zh not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
WO1999002938A3 (en) | 1999-04-22 |
EP0983481A2 (de) | 2000-03-08 |
TW390957B (en) | 2000-05-21 |
EP0983481B1 (de) | 2001-10-24 |
WO1999002938A2 (en) | 1999-01-21 |
CA2296276A1 (en) | 1999-01-21 |
US6057921A (en) | 2000-05-02 |
KR20010014187A (ko) | 2001-02-26 |
DE69802185T2 (de) | 2002-03-14 |
IL133750A0 (en) | 2001-04-30 |
JP2002508079A (ja) | 2002-03-12 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee | ||
8327 | Change in the person/name/address of the patent owner |
Owner name: APPLIED MATERIALS, INC. (N.D.GES.D. STAATES DELAWA |