DE69801106D1 - Verfahren und vorrichtung zur niederdruckzerstäubung - Google Patents

Verfahren und vorrichtung zur niederdruckzerstäubung

Info

Publication number
DE69801106D1
DE69801106D1 DE69801106T DE69801106T DE69801106D1 DE 69801106 D1 DE69801106 D1 DE 69801106D1 DE 69801106 T DE69801106 T DE 69801106T DE 69801106 T DE69801106 T DE 69801106T DE 69801106 D1 DE69801106 D1 DE 69801106D1
Authority
DE
Germany
Prior art keywords
low pressure
pressure spraying
spraying
low
pressure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69801106T
Other languages
English (en)
Other versions
DE69801106T2 (de
Inventor
D Lantsman
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Application granted granted Critical
Publication of DE69801106D1 publication Critical patent/DE69801106D1/de
Publication of DE69801106T2 publication Critical patent/DE69801106T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3471—Introduction of auxiliary energy into the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
DE69801106T 1997-05-22 1998-05-21 Verfahren und vorrichtung zur niederdruckzerstäubung Expired - Lifetime DE69801106T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/861,958 US5830330A (en) 1997-05-22 1997-05-22 Method and apparatus for low pressure sputtering
PCT/US1998/010417 WO1998053116A1 (en) 1997-05-22 1998-05-21 Method and apparatus for low pressure sputtering

Publications (2)

Publication Number Publication Date
DE69801106D1 true DE69801106D1 (de) 2001-08-16
DE69801106T2 DE69801106T2 (de) 2001-10-31

Family

ID=25337215

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69801106T Expired - Lifetime DE69801106T2 (de) 1997-05-22 1998-05-21 Verfahren und vorrichtung zur niederdruckzerstäubung

Country Status (7)

Country Link
US (1) US5830330A (de)
EP (1) EP0983394B1 (de)
JP (1) JP3706148B2 (de)
KR (1) KR100436950B1 (de)
CN (1) CN1223697C (de)
DE (1) DE69801106T2 (de)
WO (1) WO1998053116A1 (de)

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US8696875B2 (en) * 1999-10-08 2014-04-15 Applied Materials, Inc. Self-ionized and inductively-coupled plasma for sputtering and resputtering
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KR101603798B1 (ko) * 2007-10-26 2016-03-15 에바텍 어드벤스드 테크놀로지스 아크티엔게젤샤프트 관통 실리콘 비아 금속화에 대한 고전력 마그네트론 스퍼터링의 적용
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Also Published As

Publication number Publication date
EP0983394A1 (de) 2000-03-08
KR20010012829A (ko) 2001-02-26
WO1998053116A1 (en) 1998-11-26
DE69801106T2 (de) 2001-10-31
JP2002503289A (ja) 2002-01-29
JP3706148B2 (ja) 2005-10-12
CN1223697C (zh) 2005-10-19
US5830330A (en) 1998-11-03
KR100436950B1 (ko) 2004-06-23
EP0983394B1 (de) 2001-07-11
CN1260842A (zh) 2000-07-19

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